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2024
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Invention
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Cmp composition including anionic and cationic inhibitors.
A chemical mechanical polishing compo... |
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Invention
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Dual-cure resin for preparing chemical mechanical polishing pads.
A dual-cure resin formulation ... |
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Invention
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Dual-cure resin for preparing chemical mechanical polishing pads. A dual-cure resin formulation h... |
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Invention
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Chemical mechanical planarization pads with constant groove volume.
A chemical mechanical polish... |
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Invention
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Nitride inhibitors for high selectivity of tin—sin cmp applications. The invention provides a che... |
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2023
|
Invention
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Positively charged abrasive with negatively charged ionic oxidizer for polishing application.
Th... |
|
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Invention
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Titanium dioxide chemical-mechanical polishing composition for polishing nickel substrates.
The ... |
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Invention
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Chemical-mechanical polishing composition for heavily-doped boron silicon films. The invention pr... |
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Invention
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Chemical-mechanical polishing composition for heavily-doped boron silicon films.
The invention p... |
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Invention
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Chemical mechanical polishing pads with a disulfide bridge.
A precursor for preparing a chemical... |
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Invention
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Chemical mechanical polishing pads with a disulfide bridge. A precursor for preparing a chemical ... |
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Invention
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Tungsten cmp composition including a sulfur containing anionic surfactant.
A chemical mechanical... |
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Invention
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Tungsten cmp composition including a sulfur containing anionic surfactant. A chemical mechanical ... |
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Invention
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Dual-cure resin for preparing chemical mechanical polishing pads.
The invention provides a compo... |
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|
Invention
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Uv-curable resins for chemical mechanical polishing pads.
The invention provides a composition f... |
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|
Invention
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Uv-curable resins for chemical mechanical polishing pads. The invention provides a composition fo... |
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|
Invention
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Dual-cure resin for preparing chemical mechanical polishing pads. The invention provides a compos... |
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|
Invention
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Dual additive polishing composition for glass substrates.
A chemical mechanical polishing compos... |
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Invention
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Endpoint window with controlled texture surface.
A chemical mechanical polishing pad window havi... |
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2022
|
Invention
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Amine-based compositions for use in cmp with high polysilicon rate.
The invention provides a che... |
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|
Invention
|
Composition and method for cobalt cmp.
A chemical mechanical polishing composition for polishing... |
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Invention
|
Silica-based slurry compositions containing high molecular weight polymers for use in cmp of diel... |
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Invention
|
Textured cmp pad comprising polymer particles.
A chemical mechanical polishing pad comprising a ... |
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|
Invention
|
Cmp composition including an anionic abrasive.
A chemical mechanical polishing composition compr... |
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|
Invention
|
Silicon carbonitride polishing composition and method.
A chemical mechanical polishing compositi... |
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|
Invention
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Ceria-based slurry compositions for selective and nonselective cmp of silicon oxide, silicon nitr... |
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|
Invention
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Composition and method for polishing boron doped polysilicon.
The invention provides a method of... |
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2021
|
Invention
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Self-stopping polishing composition and method for high topological selectivity. The invention pr... |
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|
Invention
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Uv-curable resins used for chemical mechanical polishing pads. The invention provides a UV-curabl... |
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|
Invention
|
Chemical mechanical planarization pad with a release liner comprising a pull tab.
A chemical mec... |
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|
Invention
|
Silica-based slurry for selective polishing of carbon-based films. The invention provides a chemi... |
|
|
Invention
|
Titanium dioxide containing ruthenium chemical mechanical polishing slurry. a in a range from abo... |
|
|
Invention
|
Cmp composition including anionic and cationic inhibitors. A chemical mechanical polishing compos... |
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|
Invention
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Silicon wafer polishing composition and method.
A chemical mechanical polishing composition for ... |
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P/S
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Machines and machine tools for treatment of materials and for manufacturing; Cutting, drilling, a... |
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Invention
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Cmp composition including a novel abrasive. A chemical mechanical polishing composition includes ... |
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P/S
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Polishing pads for polishing machines for use in the manufacture of integrated circuit wafers, se... |
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2020
|
Invention
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Derivatized polyamino acids. A composition comprises, consists of, or consists essentially of a p... |
|
|
Invention
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Polishing composition and method with high selectivity for silicon nitride and polysilicon over s... |
|
|
Invention
|
Composition and method for dielectric cmp.
A chemical mechanical polishing composition for polis... |
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|
Invention
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Composition and method for silicon oxide and carbon doped silicon oxide cmp.
A chemical mechanic... |
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|
Invention
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Self-stopping polishing composition and method.
A chemical mechanical polishing composition for ... |
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|
Invention
|
Composition and method for selective oxide cmp.
A chemical mechanical polishing composition for ... |
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|
Invention
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Composition and method for polysilicon cmp. A chemical mechanical polishing composition for polis... |
|
|
Invention
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Polishing pad employing polyamine and cyclohexanedimethanol curatives. A chemical-mechanical poli... |
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|
Invention
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Solid polymer electrolyte compositions and methods of preparing same. A solid polymer electrolyte... |
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|
Invention
|
Secondary battery cell with solid polymer electrolyte. A secondary battery cell includes a cathod... |
|
|
Invention
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Chemical-mechanical polishing pad with textured platen adhesive.
A chemical-mechanical polishing... |
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2019
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P/S
|
Polishing slurry for semiconductors; polishing consumables, namely, polishing slurries, for use i... |
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P/S
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Chemical slurry for polishing semiconductors; Chemical slurries for polishing semiconductors, sil... |
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|
Invention
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Method to increase barrier film removal rate in bulk tungsten slurry. The invention relates to a ... |
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2017
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P/S
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Polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integra... |
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2014
|
P/S
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Chemical mechanical polishing slurries used for the treatment of semiconductors to planarize, smo... |
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2008
|
P/S
|
polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integra... |
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2007
|
P/S
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Chemical compositions used for planarizing the surface portion of metals, namely, aluminum, coppe... |
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2006
|
P/S
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Cleaner for use in electronic industries, pad cleaning solution for use in the manufacturing or p... |
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P/S
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Chemical additives, namely, abrasive dispersions for use in the manufacture of electronic compone... |
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2004
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P/S
|
Polishing slurries used for the treatment of semiconductors to planarize, smooth or otherwise mod... |
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2002
|
P/S
|
Chemicals used in industry and science; polishing slurry for semiconductors. |
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|
P/S
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Chemicals used in industry, science and photography, as well as in agriculture, horticulture and ... |
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2001
|
P/S
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Polishing slurry for semiconductors |
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1998
|
P/S
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Polishing pads for polishing machines, primarily for use in the semiconductor and electronic indu... |
|
|
P/S
|
Polishing Pads for Polishing Machines, Primarily for Use in the Semiconductor and Electronic Indu... |
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1994
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P/S
|
aqueous metal oxide dispersions for use in semiconductor polishing |
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1990
|
P/S
|
fumed silica dispensed in water used to polish semiconductors |
