DuPont Electronic Materials International, LLC

États‑Unis d’Amérique

 
Quantité totale PI 365
Rang # Quantité totale PI 3 495
Note d'activité PI 2,9/5.0    124
Rang # Activité PI 5 547
Classe Nice dominante Produits chimiques destinés à l'...

Brevets

Marques

363 2
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Dernier brevet 2024 - Compounds, monomers, polymers, p...
Premier brevet 2004 - Methods, photoresists and substr...
Dernière marque 2003 - EPIC
Première marque 2002 - SIBER

Industrie (Classification de Nice)

Derniers inventions, produits et services

2024 Invention Underlayer compositions and patterning methods. An underlayer composition, comprising a polymer ...
2023 Invention Polymers useful as surface leveling agents. Disclosed herein is a copolymer comprising first pol...
Invention Metallization method. Disclosed herein is a metallization method, comprising (a) providing a pho...
Invention Photoacid generators, photoresist compositions, and pattern formation methods. A photoacid gener...
Invention Photoactive compounds, photoresist compositions including the same, and pattern formation methods...
Invention Uv curable silicone composition and an encapsulant or a sheet film thereof. A UV curable silicone...
Invention Compounds, monomers, polymers, photoresist compositions and pattern formation methods. Compounds...
Invention Silver electroplating compositions and methods for electroplating rough matt silver. Silver elec...
Invention Method of filling through-holes to reduce voids. Through-holes of a substrate are initially plat...
Invention Silver electroplating compositions and methods for electroplating silver with low coefficients of...
2022 Invention Photoresist compositions and pattern formation methods. A photoresist composition, comprising: a...
Invention Photoresist topcoat compositions and pattern formation methods. Photoresist topcoat compositions...
Invention Photoresist underlayer composition. A method of forming a pattern, the method comprising: applyi...
Invention Photoresist compositions and pattern formation methods. Photoresist compositions comprise: an ac...
Invention Silver electroplating compositions and methods for electroplating rough matt silver. Silver elect...
Invention Metallization method. Disclosed herein is a metallization method, comprising (a) forming on a fi...
Invention Compounds and photoresist compositions including the same. A compound represented by Formula (1)...
Invention Composite materials for dielectric applications. There is provided a dielectric composite materia...
Invention Polymeric resin for dielectric applications. There is provided a resin composition from a mixtur...
Invention Silver coating for high temperature applications. An article and a method of making the article ...
Invention Method of enhancing copper electroplating. Crystal plane orientation enrichment compounds are app...
Invention Method of inhibiting tarnish formation and corrosion. A method of inhibiting tarnish formation o...
2021 Invention Photoresist compositions and pattern formation methods. Disclosed herein is a pattern formation m...
Invention Photoresist topcoat compositions and pattern formation methods. A topcoat composition, comprisin...
Invention Photoresist compositions and pattern formation methods. A photoresist composition, comprising a ...
Invention Acidic aqueous binary silver-bismuth alloy electroplating compositions and methods. Aqueous acid...
Invention Photoresist compositions and pattern formation methods. A polymer, comprising a first repeating ...
Invention Iodine-containing acid cleavable compounds, polymers derived therefrom, and photoresist compositi...
Invention Photoresist underlayer composition. A photoresist underlayer composition, comprising a first mat...
Invention Photoresist compositions and pattern formation methods. A photoresist composition comprises a fi...
Invention High refractive index materials. Disclosed is a formulation comprising a copolymer comprising on...
Invention Coated underlayer for overcoated photoresist. A method of forming a pattern, the method comprisi...
Invention Photoresist compositions and pattern formation methods. A photoresist composition comprising: a ...
Invention Bisbenzocyclobutene formulations. Compositions for forming polymer layers useful in the manufact...
Invention Composition for photoresist underlayer. A photoresist underlayer composition, comprising: a firs...
Invention Method for manufactunring a multilayer circuit structure having embedded trace layers. Provided ...
Invention Photoresist compositions and pattern formation methods. A photoresist composition comprises a fir...
2020 Invention Polymers useful as surface leveling agents. Disclosed herein is a copolymer comprising first poly...
Invention Adhesion promoting photoresist underlayer composition. A photoresist underlayer composition comp...
Invention Photoresist underlayer compositions and patterning methods. A method of forming a pattern on a s...
Invention Photoresist compositions and pattern formation methods. A photoresist composition, comprising an ...
Invention Photoresist pattern trimming compositions and methods of trimming photoresist patterns. Photores...
Invention Coating composition for photoresist underlayer. A photoresist underlayer composition, comprising ...
2003 P/S Chemicals for use in the manufacture of semiconductors, printed circuit boards and computer hard ...
2002 P/S Electronic chemicals for the manufacture of semiconductor devices, namely, photoresist compositions