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2024
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Invention
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Chemical mechanical polishing pad.
A chemical mechanical polishing pad comprising a polishing la... |
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Invention
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Chemical mechanical polishing pad.
A chemical mechanical polishing pad comprising a photocured p... |
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Invention
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Cmp polishing pad.
A polishing pad has a polishing layer comprising a polymer matrix comprising ... |
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2023
|
Invention
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Chemical mechanical polishing pad.
A chemical mechanical polishing pad includes a polishing laye... |
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Invention
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Method of polishing using chemical mechanical polishing pad.
A method of polishing comprises pro... |
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Invention
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Polishing pad formed from dual curative.
A chemical mechanical polishing pad comprising a polish... |
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Invention
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Chemical mechanical polishing composition and method for preventing polishing pad groove clogging... |
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Invention
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Cmp polishing pad with protruding structures having engineered open void space.
A polishing pad ... |
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2022
|
Invention
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Chemical mechanical planarization pad having polishing layer with multi-lobed embedded features. ... |
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Invention
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Method of making low specific gravity polishing pads.
A polishing pad for chemical mechanical po... |
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Invention
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Cmp pad having polishing layer of low specific gravity.
A polishing pad for chemical mechanical ... |
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Invention
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Cmp pad having ultra expanded polymer microspheres.
A polishing pad for chemical mechanical poli... |
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Invention
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Pad for chemical mechanical polishing.
A polishing pad suitable for polishing at least one of se... |
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Invention
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Composite pad for chemical mechanical polishing.
A chemical mechanical polishing pad comprising ... |
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Invention
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Surface modified silanized colloidal silica particles.
Modified silanized colloidal silica parti... |
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Invention
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Chemical mechanical polishing composition and method.
Chemical mechanical polishing compositions... |
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Invention
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Chemical mechanical polishing composition containing composite silica particles, method of making... |
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2021
|
Invention
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Chemical mechanical polishing pad and preparation thereof. The present invention concerns a chemi... |
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Invention
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Method of enhancing the removal rate of polysilicon. A method of enhancing the removal rate of po... |
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Invention
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Heterogeneous fluoropolymer mixture polishing pad. The invention provides a polishing pad suitabl... |
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Invention
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Fluorinated polyurea copolymer pad.
The invention provides a polishing pad suitable for polishin... |
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Invention
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Compressible non-reticulated polyurea polishing pad. The invention provides a polishing pad suita... |
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Invention
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Polishing composition and method of polishing a substrate having enhanced defect reduction. An aq... |
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Invention
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Polishing composition and method of polishing a substrate having enhanced defect inhibition. An a... |
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Invention
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Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten. A neutra... |
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Invention
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Formulations for chemical mechanical polishing pads and cmp pads made therewith. CMP polishing pa... |
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|
Invention
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Chemical mechanical polishing pad and polishing method. CMP polishing pads or layers made from a ... |
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Invention
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Formulations for high porosity chemical mechanical polishing pads with high hardness and cmp pads... |
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2020
|
Invention
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Cmp polishing pad with uniform window. A polishing pad useful in chemical mechanical polishing co... |
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|
Invention
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Method of forming leveraged poromeric polishing pad. The invention provides a method of forming p... |
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Invention
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Offset pore poromeric polishing pad.
The invention provides a porous polyurethane polishing pad ... |
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Invention
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Leveraged poromeric polishing pad.
The invention provides a porous polyurethane polishing pad th... |
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Invention
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Cmp polishing pad with polishing elements on supports. A polishing pad useful in chemical mechani... |
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Invention
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Chemical mechanical polishing of tungsten using a method and composition containing quaternary ph... |
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2019
|
Invention
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Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silic... |
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Invention
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Thin film fluoropolymer composite cmp polishing pad.
The invention provides a polymer-polymer co... |
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Invention
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Fluopolymer composite cmp polishing method. The invention provides a method for polishing or plan... |
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Invention
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Cationic fluoropolymer composite polishing pad. The invention provides a polymer-polymer composit... |
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Invention
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Thin film fluoropolymer composite cmp polishing method. The invention provides a polymer-polymer ... |
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Invention
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Low-debris fluopolymer composite cmp polishing pad. The invention provides a polymer-polymer comp... |
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Invention
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Cationic fluoropolymer composite polishing method. The invention provides a method for polishing ... |
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Invention
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Cmp polishing pad with lobed protruding structures. A polishing pad useful in chemical mechanical... |
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Invention
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Acid polishing composition and method of polishing a substrate having enhanced defect inhibition.... |
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2018
|
Invention
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Chemical mechanical polishing pad and polishing method. The present invention concerns a chemical... |
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Invention
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Chemical mechanical polishing composition and method for tungsten. A composition and method for c... |
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2016
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P/S
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Chemicals used in the manufacture of electronic circuits. |
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P/S
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Abrasive polishing chemical slurries used in the manufacturing of silicone semiconductors and ele... |
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2011
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P/S
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Power-driven polishing tool pads; polishing pads for polishing machines. |
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2009
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P/S
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Machines for polishing and planarizing and pads for use in connection with same. |
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P/S
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Pads for polishing and planarizing machines |
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2008
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P/S
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Polishing pads sold as a component of polishing machines and holders for the pads; machine parts,... |
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P/S
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Chemicals and chemical slurries for polishing semiconductors; abrasive and non-abrasive based pol... |
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P/S
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Chemicals and chemical slurries for polishing semiconductors; abrasive polishing slurries and non... |
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1995
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P/S
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fabric finish or surface preparation sold as a component part of treated or coated textiles and n... |
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1994
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P/S
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power-driven polishing tool pads; polishing pads for polishing machines |
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1964
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P/S
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POLISHING CLOTH |
