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2015
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Invention
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Coated compressive subpad for chemical mechanical polishing. Coated compressive subpads for polis... |
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Invention
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Polishing pad having porogens with liquid filler. Polishing pads having porogens with liquid fill... |
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2014
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Invention
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Low density polishing pad. Low density polishing pads and methods of fabricating low density poli... |
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Invention
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Polishing pad having polishing surface with continuous protrusions having tapered sidewalls. Poli... |
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Invention
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Polishing pad having polishing surface with continuous protrusions. A polishing pad (200, 800, 10... |
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2013
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Invention
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Polishing pad with polishing surface layer having an aperture or opening above a transparent foun... |
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2012
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Invention
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Polishing pad with aperture. Polishing pads with apertures are described. Methods of fabricating ... |
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Invention
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Polishing pad with foundation layer and polishing surface layer. Polishing pads with foundation l... |
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Invention
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Polishing pad with homogeneous body having discrete protrusions thereon. Polishing pads with homo... |
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Invention
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Polishing pad with alignment feature. Polishing pads with alignment marks are described. Methods ... |
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Invention
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Polishing pad with concentric or approximately concentric polygon groove pattern. Polishing pads ... |
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2011
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Invention
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Polishing pad with multi-modal distribution of pore diameters. Polishing pads with multi-modal di... |
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Invention
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Polishing pad for eddy current end-point detection. Polishing pads for polishing semiconductor su... |
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Invention
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Polishing pad with homogeneous body having discrete protrusions thereon.
Polishing pads with hom... |
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Invention
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Soft polishing pad for polishing a semiconductor substrate. Soft polishing pads for polishing sem... |
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Invention
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Cmp pad with local area transparency. A CMP polishing pad comprising (a) a polishing layer having... |
