Nova Measuring Instruments Ltd.

Israël

 
Quantité totale PI 67
Quantité totale incluant filiales 140 (+ 73 pour les filiales)
Rang # Quantité totale PI 20 083
Note d'activité PI 1,9/5.0    12
Rang # Activité PI 73 099
Activité incl filiales 2/5.0    27
Symbole boursier
ISIN IL0010845571
Capitalisation 21.0B  (ILA)
Industrie Semiconductor Equipment & Materials
Secteur Technology

Brevets

Marques

4 0
0 0
63 0
0
 
Dernier brevet 2021 - Optical phase measurement method...
Premier brevet 1994 - Device for measuring the thickne...

Filiales

4 subsidiaries with IP (11 patents, 62 trademarks)

2 subsidiaries without IP

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Derniers inventions, produits et services

2021 Invention Optical phase measurement method and system. A measurement system for use in measuring parameter...
Invention Measuring local critical dimension uniformity of an array of two-dimensional structural elements....
Invention Integrated metrology system. An integrated metrology system for evaluating semiconductor wafers, ...
Invention Detecting outliers and anomalies for ocd metrology machine learning. A system and methods for OCD...
Invention Self-supervised representation learning for interpretation of ocd data. A system and methods for ...
2020 Invention Combining physical modeling and machine learning. A system and methods for OCD metrology are prov...
Invention Combined ocd and photoreflectance method and system. A combined OCD and photoreflectance system a...
Invention Method and system for broadband photoreflectance spectroscopy. Photoreflectance (PR) spectroscopy...
Invention Accurate raman spectroscopy. A method, a system, and a non-transitory computer readable medium fo...
Invention Model based control of wafer non-uniformity. Optical metrology may be used to examine substrates ...
Invention Semiconductor device manufacture with in-line hotspot detection. Controlling semiconductor device...
2019 Invention Integrated measurement system. A measurement system is presented configured for integration with ...
Invention Optical phase measurement system and method. A method for use in optical measurements on patterne...
Invention Optical technique for material characterization. A polarized Raman Spectrometric system for defin...
Invention Time-domain optical metrology and inspection of semiconductor devices. Semiconductor device metro...
Invention Metrology and process control for semiconductor manufacturing. A semiconductor metrology system i...
2018 Invention Metrology method and system. A control system for use in measuring one or more parameters of a pa...
Invention X-ray based measurements in patterned structure. A method and system are presented for use in X-r...
Invention Raman spectroscopy based measurement system. A method and system are presented for use in measuri...
Invention Tem-based metrology method and system. A control system is presented for use in measuring one or ...
Invention An apparatus and method for electrical test prediction. A test site and method are herein disclos...
Invention Method and system for optimizing optical inspection of patterned structures. A system and method...
2017 Invention Layer detection for high aspect ratio etch control. Controlling an etch process applied to a mult...
Invention Lateral shift measurement using an optical technique. Alignment of layers during manufacture of ...
2016 Invention Method and system for processing patterned structures. A system and method are presented for cont...
Invention Raman spectroscopy based measurements in patterned structures. A method and system are presented ...
Invention Hybrid metrology method and system. A method and system are presented for use in measuring charac...
Invention Optical system and method for measuring parameters of patterned structures in microelectronic dev...
Invention Hybrid measurement system and method for measuring in thin films. A measurement method and system...
Invention Method for use in process control of manufacture of patterned sample. A method and system are pre...
Invention Method for use in process control of manufacture of patterned samples. A method and system are pr...
Invention Optical system and method for measurements of samples. A measurement system is presented for use ...
2015 Invention Test structure for use in metrology measurements of patterns. A test structure and method of its ...
Invention Method and system for measuring patterned structures. A method and system are presented for dete...
Invention Method and system for optical metrology in patterned structures. A data analysis method and syste...
Invention Scatterometry method and system. A method and system are presented for use in model-based optical...
Invention Metrology test structure design and measurement scheme for measuring in patterned structures. A t...
Invention Optical method and system for defects detection in three-dimensional structures. An inspection sy...
Invention Test structure design for metrology measurements in patterned samples. A test structure is prese...
Invention Test structure design for metrology measurements in patterned samples. A test structure is presen...
Invention Optical phase measurement method and system. A measurement system for use in measuring parameters...
Invention Test structures and metrology technique utilizing the test structures for measuring in patterned ...
Invention Method and system for planning metrology measurements. A method for use in planning metrology mea...
Invention Optical critical dimension metrology. A metrology system is presented for measuring parameters of...
Invention Overlay design optimization. A sample comprising an overlay target is presented. The overlay targ...
2014 Invention Surface planarization system and method. A surface planarization system is presented. The system ...
Invention Hybrid metrology technique. A computerized system and method are provided for use in measuring at...
Invention Method and system for optical characterization of patterned samples. A method and system are pre...
2013 Invention Method and system for use in optical measurements in deep three-dimensional structures. A measur...