- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/227 - Measuring photoelectric effect , e.g. photoelectron emission microscopy [PEEM]
Patent holdings for IPC class G01N 23/227
Total number of patents in this class: 95
10-year publication summary
|
11
|
7
|
8
|
9
|
4
|
4
|
4
|
3
|
3
|
3
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Scienta Omicron AB | 20 |
9 |
| KLA-Tencor Corporation | 2518 |
5 |
| Nova Measuring Instruments Inc. | 68 |
5 |
| The University of Tokyo | 4352 |
4 |
| Hitachi High-Tech Corporation | 5819 |
4 |
| ReVera Incorporated | 7 |
3 |
| ULVAC-PHI, Inc. | 13 |
3 |
| Hitachi, Ltd. | 16071 |
2 |
| National Institute of Advanced Industrial Science and Technology | 3790 |
2 |
| EMPA Eidgenössische Materialprüfungs-und Forschungsanstalt | 202 |
2 |
| Inter-University Research Institute Corporation High Energy Accelerator Research Organization | 70 |
2 |
| JEOL Ltd. | 622 |
2 |
| National Institute for Materials Science | 1087 |
2 |
| National University Corporation Nagoya University | 787 |
2 |
| National University Corporation Nara Institute of Science and Technology | 223 |
2 |
| Nova Measuring Instruments Ltd. | 67 |
2 |
| Oxide Corporation | 18 |
2 |
| Tokyo Institute of Technology | 1312 |
2 |
| Drilliant Ltd. | 5 |
2 |
| General Electric Company | 13888 |
1 |
| Other owners | 37 |