- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/28 - Phase shift masks [PSM]PSM blanksPreparation thereof with three or more diverse phases on the same PSMPreparation thereof
Patent holdings for IPC class G03F 1/28
Total number of patents in this class: 19
10-year publication summary
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2
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3
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2
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0
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0
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1
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0
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1
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1
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0
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| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 49677 |
3 |
| Dai Nippon Printing Co., Ltd. | 4298 |
3 |
| SK Hynix Inc. | 12798 |
2 |
| Shin-Etsu Chemical Co., Ltd. | 6186 |
2 |
| ULVAC Coating Corporation | 15 |
2 |
| Shanghai Chuanxin Semiconductor Co., Ltd. | 19 |
2 |
| Samsung Electronics Co., Ltd. | 159978 |
1 |
| Panasonic Intellectual Property Management Co., Ltd. | 34724 |
1 |
| Eulitha AG | 31 |
1 |
| Kioxia Corporation | 11029 |
1 |
| Panasonic Semiconductor Solutions Co., Ltd. | 716 |
1 |
| Other owners | 0 |