- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/004 - Photosensitive materials
Patent holdings for IPC class G03F 7/004
Total number of patents in this class: 10338
10-year publication summary
|
564
|
558
|
573
|
623
|
638
|
648
|
714
|
814
|
926
|
627
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 30594 |
1949 |
| Shin-Etsu Chemical Co., Ltd. | 6120 |
684 |
| JSR Corporation | 2552 |
636 |
| Tokyo Ohka Kogyo Co., Ltd. | 1569 |
562 |
| Sumitomo Chemical Company, Limited | 8968 |
308 |
| Toray Industries, Inc. | 7139 |
279 |
| Samsung SDI Co., Ltd. | 10719 |
244 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48560 |
210 |
| Resonac Corporation | 3610 |
172 |
| Samsung Electronics Co., Ltd. | 158442 |
153 |
| Hitachi Chemical Company, Ltd. | 2236 |
145 |
| Mitsubishi Chemical Corporation | 4734 |
130 |
| Tokyo Electron Limited | 13871 |
129 |
| DuPont Electronic Materials International, LLC | 431 |
128 |
| LG Chem, Ltd. | 17950 |
116 |
| Jicc-02 Co., Ltd. | 268 |
115 |
| Mitsubishi Gas Chemical Company, Inc. | 3634 |
107 |
| Merck Patent GmbH | 5735 |
101 |
| Taiyo Ink Mfg. Co., Ltd. | 200 |
101 |
| Inpria Corporation | 145 |
100 |
| Other owners | 3969 |