- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
Patent holdings for IPC class G03F 7/038
Total number of patents in this class: 3479
10-year publication summary
|
308
|
322
|
330
|
294
|
291
|
255
|
254
|
273
|
284
|
14
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 28506 |
839 |
| Shin-Etsu Chemical Co., Ltd. | 5439 |
284 |
| JSR Corporation | 2475 |
205 |
| Tokyo Ohka Kogyo Co., Ltd. | 1509 |
187 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 40539 |
99 |
| Toray Industries, Inc. | 6843 |
91 |
| Sumitomo Chemical Company, Limited | 8976 |
71 |
| Mitsubishi Gas Chemical Company, Inc. | 3343 |
66 |
| LG Chem, Ltd. | 17632 |
50 |
| Sumitomo Bakelite Co., Ltd. | 1469 |
49 |
| DuPont Electronic Materials International, LLC | 365 |
46 |
| Nippon Kayaku Kabushiki Kaisha | 1427 |
44 |
| Samsung Electronics Co., Ltd. | 138518 |
39 |
| Merck Patent GmbH | 5847 |
35 |
| Central Glass Company, Limited | 1245 |
34 |
| Nissan Chemical Industries, Ltd. | 1762 |
31 |
| Resonac Corporation | 2392 |
31 |
| Eastman Kodak Company | 3044 |
28 |
| Boe Technology Group Co., Ltd. | 38777 |
26 |
| San-Apro Limited | 77 |
25 |
| Other owners | 1199 |