- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/105 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Patent holdings for IPC class G03F 7/105
Total number of patents in this class: 393
10-year publication summary
|
29
|
65
|
47
|
20
|
27
|
21
|
18
|
32
|
36
|
14
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 30653 |
68 |
| Samsung SDI Co., Ltd. | 10782 |
58 |
| DONGWOO FINE-CHEM Co., Ltd. | 1441 |
36 |
| LG Chem, Ltd. | 17967 |
28 |
| Duk San Neolux Co., Ltd. | 703 |
17 |
| Boe Technology Group Co., Ltd. | 44549 |
13 |
| Toray Industries, Inc. | 7145 |
9 |
| Eastman Kodak Company | 2584 |
8 |
| Samsung Display Co., Ltd. | 39012 |
7 |
| Merck Patent GmbH | 5742 |
7 |
| Agfa NV | 674 |
7 |
| Samsung Electronics Co., Ltd. | 158842 |
6 |
| Dai Nippon Printing Co., Ltd. | 4263 |
6 |
| Cheil Industries Inc. | 807 |
5 |
| Resonac Corporation | 3641 |
5 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48760 |
4 |
| Shin-Etsu Chemical Co., Ltd. | 6134 |
4 |
| Datalase Ltd. | 106 |
4 |
| Samyang Corporation | 427 |
4 |
| Polaroid IP B.V. | 174 |
4 |
| Other owners | 93 |