• All sections
  • H - Electricity
  • H01L - Semiconductor devices not covered by class
  • H01L 21/228 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regionsRedistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a liquid phase, e.g. alloy diffusion processes

Patent holdings for IPC class H01L 21/228

Total number of patents in this class: 70

10-year publication summary

10
7
6
4
3
2
1
3
2
2
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
Tokyo Ohka Kogyo Co., Ltd.
1547
5
Fuji Electric Co., Ltd.
5253
4
Evonik Degussa GmbH
1460
3
Screen Holdings Co., Ltd.
2932
3
International Business Machines Corporation
61721
2
Intel Corporation
46460
2
Tokyo Electron Limited
13136
2
The Regents of the University of Michigan
4780
2
ASM Japan K.K.
83
2
Dynaloy, LLC
13
2
Gigaphoton Inc.
1269
2
Kyushu University, National University Corporation
1667
2
Toyo Aluminium Kabushiki Kaisha
344
2
Kokusai Electric Corporation
2103
2
Maxeon Solar Pte. Ltd.
706
2
Xerox Corporation
6922
1
E. I. du Pont de Nemours and Company
3899
1
Honeywell International Inc.
13568
1
Varian Semiconductor Equipment Associates, Inc.
1226
1
Mitsubishi Electric Corporation
46926
1
Other owners 28