- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/228 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regionsRedistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a liquid phase, e.g. alloy diffusion processes
Patent holdings for IPC class H01L 21/228
Total number of patents in this class: 70
10-year publication summary
|
10
|
7
|
6
|
4
|
3
|
2
|
1
|
3
|
2
|
2
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Ohka Kogyo Co., Ltd. | 1547 |
5 |
| Fuji Electric Co., Ltd. | 5253 |
4 |
| Evonik Degussa GmbH | 1460 |
3 |
| Screen Holdings Co., Ltd. | 2932 |
3 |
| International Business Machines Corporation | 61721 |
2 |
| Intel Corporation | 46460 |
2 |
| Tokyo Electron Limited | 13136 |
2 |
| The Regents of the University of Michigan | 4780 |
2 |
| ASM Japan K.K. | 83 |
2 |
| Dynaloy, LLC | 13 |
2 |
| Gigaphoton Inc. | 1269 |
2 |
| Kyushu University, National University Corporation | 1667 |
2 |
| Toyo Aluminium Kabushiki Kaisha | 344 |
2 |
| Kokusai Electric Corporation | 2103 |
2 |
| Maxeon Solar Pte. Ltd. | 706 |
2 |
| Xerox Corporation | 6922 |
1 |
| E. I. du Pont de Nemours and Company | 3899 |
1 |
| Honeywell International Inc. | 13568 |
1 |
| Varian Semiconductor Equipment Associates, Inc. | 1226 |
1 |
| Mitsubishi Electric Corporation | 46926 |
1 |
| Other owners | 28 |