• All sections
  • H - Electricity
  • H01L - Semiconductor devices not covered by class
  • H01L 21/228 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regionsRedistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a liquid phase, e.g. alloy diffusion processes

Patent holdings for IPC class H01L 21/228

Total number of patents in this class: 70

10-year publication summary

7
6
4
3
2
1
3
2
2
0
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
Tokyo Ohka Kogyo Co., Ltd.
1542
5
Fuji Electric Co., Ltd.
5373
4
Evonik Degussa GmbH
1424
3
Screen Holdings Co., Ltd.
3086
3
International Business Machines Corporation
62148
2
Intel Corporation
46673
2
Tokyo Electron Limited
13465
2
The Regents of the University of Michigan
4890
2
ASM Japan K.K.
80
2
Dynaloy, LLC
13
2
Gigaphoton Inc.
1298
2
Kyushu University, National University Corporation
1692
2
Toyo Aluminium Kabushiki Kaisha
345
2
Kokusai Electric Corporation
2173
2
Maxeon Solar Pte. Ltd.
704
2
Xerox Corporation
5694
1
E. I. du Pont de Nemours and Company
3713
1
Honeywell International Inc.
13543
1
Varian Semiconductor Equipment Associates, Inc.
1198
1
Mitsubishi Electric Corporation
47522
1
Other owners 28