Abstract

Disclosed is a phase measurement device, comprising: a first wave plate, a first polarization splitting prism, a fourth wave plate, a retroreflector, a third wave plate, a reflector, a second wave plate, a polarizer, a second polarization splitting prism, a third polarization splitting prism, a first photoelectric detector, a second photoelectric detector, and a base, wherein the first to third polarization splitting prisms and the first and second photoelectric detectors are fixed on the base; the first to fourth wave plates are respectively arranged around the periphery of the first polarization splitting prism; the polarizer is arranged on an emitting surface of the third polarization splitting prism; the retroreflector is arranged on an outer side of the fourth wave plate; and the reflector is arranged on an outer side of the third wave plate. An interferometric signal is resolved to obtain a measurement light beam phase.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G01J 9/02 - Measuring optical phase differenceDetermining degree of coherenceMeasuring optical wavelength by interferometric methods
• G02B 5/18 - Diffracting gratings
• G02B 27/28 - Optical systems or apparatus not provided for by any of the groups , for polarising

Abstract

A temperature measurement method and apparatus based on synchronous detection. The method comprises: acquiring an excitation signal and a measurement signal (S1); performing synchronous detection processing on the excitation signal and the measurement signal, so as to obtain a first direct-current component (S2); extracting the amplitude of the excitation signal, so as to obtain a second direct-current component (S3); according to the first direct-current component and the second direct-current component, determining a third direct-current component (S4); and according to the third direct-current component and the excitation signal, calculating a temperature value corresponding to the measurement signal (S5). In the temperature measurement method and apparatus based on synchronous detection, data which is passed back by a temperature measurement circuit is processed by using a synchronous detection principle, such that the impact of noise on a temperature signal can be better eliminated, and the impact of pulse noise and periodic noise on the temperature signal can be reduced, thereby measuring the temperature of the position of a temperature sensor in a complicated electromagnetic environment more accurately.

IPC Classes  ?

• G01K 7/24 - Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat using resistive elements the element being a non-linear resistance, e.g. thermistor in a specially-adapted circuit, e.g. bridge circuit

Abstract

Hydrophobic patterned adhesive tape (100) and a manufacturing method therefor. The hydrophobic patterned adhesive tape (100) comprises: a patterned layer (10) having an upper surface (11) and a lower surface (12), the patterned layer (10) having a stepped structure; a hydrophobic film layer (20) provided on the upper surface (11) of the patterned layer (10); an adhesive layer (30) disposed on the lower surface (12) of the patterned layer (10); a release film layer (40) provided on the adhesive layer (30); and a hydrophobic protective layer (50) provided on the hydrophobic film layer (20). The stepped structure of the patterned layer (10) allows the adhesive layer (30) arranged on the lower surface (12) of the patterned layer (10) to bond to and cover an adhesive surface (201) of a different height located on a component (200) to be sealed, thereby sealing a gap (300) between different-height upper end surfaces (2011) of two adjacent components (200) to be sealed. Thus, the application range of the hydrophobic patterned adhesive tape (100) is expanded. At the same time, the invention solves the problem in the related art whereby adhesive tape having a flat belt structure has a poor sealing effect for a gap (300) between two different-height components (200) to be sealed.

IPC Classes  ?

• C09J 7/20 - Adhesives in the form of films or foils characterised by their carriers
• B32B 3/10 - Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shapeLayered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. apertured or formed of separate pieces of material
• B60J 10/00 - Sealing arrangements
• B60J 10/27 - Sealing arrangements characterised by the shape having projections, grooves or channels in the longitudinal direction

Abstract

An exposure light beam phase measurement method for laser interference photolithography comprises: separating a measurement light from an exposure light beam and inputting light into a laser phase measurement interferometer to carry out phase measurement on the exposure light beam; inputting a reference light beam homologous with the exposure light beam into the laser phase measurement interferometer; processing the reference light beam to form an interference measurement optical signal; calculating to obtain the phase of the exposure light beam. A laser interference photolithography system using the method comprises a laser phase measurement interferometer, a controller and phase modulators, the laser phase measurement interferometer measures whether the phase of an exposure light beam drifts, the controller controls phase modulators to carry out phase modulation, to achieve locking of exposure stripe phase drift and manufacturing of a high-precision variable-period optical grating.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor

Abstract

A friction force compensation method and compensation apparatus for a linear guide rail displacement system. The method comprises: establishing a friction force-speed model, collecting moving speeds and driving force of a movable platform, and screening the speed and the driving force of a uniform-motion section therefrom, the driving force being used as the friction force of the uniform-motion section; by means of a compression factor particle swarm algorithm, solving model parameters of the friction force-speed model to obtain a complete friction force-speed model; writing into a feedforward compensator the complete friction force-speed model, and according to the friction force-speed model, calculating a dynamic friction force and a corresponding friction force feedforward current signal on the basis of an instruction speed; and providing to a servo controller the friction force feedforward current signal as feedforward compensation data, and performing friction force compensation. The method can improve the control performance of heavy-load precision displacement devices, and reduce influences caused by nonlinear friction forces on tracking errors and system stability in linear guide rail servo systems.

IPC Classes  ?

• G05B 13/04 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
• H02P 23/00 - Arrangements or methods for the control of AC motors characterised by a control method other than vector control

Abstract

An apparatus for measuring the heat dissipation of a liquid-cooling device, the apparatus comprising: a cavity (1), which is used for placing a liquid-cooling device (200), wherein the cavity (1) is provided with an air inlet and an air outlet; a data collection module, which comprises temperature sensors (17, 18) and a flow sensor, wherein the temperature sensors (17, 18) measure temperatures at the surface of the liquid-cooling device (200), the air inlet and the air outlet, and the flow sensor measures mass flow rates at the air inlet and the air outlet; and a heat dissipation calculation module, which determines the heat dissipation rate of the liquid-cooling device (200) according to the specific heat capacity of air, the mass flow rate at the air outlet, and the difference between the temperatures of air at the air inlet and the air outlet. By means of placing a liquid-cooling device (200) in a cavity (1), the apparatus can determine the heat dissipation of the liquid-cooling device (200) by means of measuring heat absorbed by air that passes through the cavity (1), which heat is dissipated by the liquid-cooling device (200); and according to whether the average surface temperature of the liquid-cooling device (200) when operating without being placed in the cavity (1) is obtained in advance, sensor data can be obtained by using different measurement methods, so as to respectively obtain the heat dissipation of the liquid cooling device (200).

IPC Classes  ?

• G01K 17/08 - Measuring quantity of heat conveyed by flowing media, e.g. in heating systems based upon measurement of temperature difference
• G01K 17/10 - Measuring quantity of heat conveyed by flowing media, e.g. in heating systems based upon measurement of temperature difference between an inlet and an outlet point, combined with measurement of rate of flow of the medium

Abstract

A laser interference photolithography system, comprising a laser device, a first reflector, a grating beam-splitter, a second reflector, a first universal reflector, a first lens, a second universal reflector, a second lens, a beam splitting prism, a control module, an angle measurement module, a third lens and a substrate. The control module comprises a signal processing terminal, a controller, and a driver. The signal processing terminal is connected to the angle measurement module, the controller is connected to both the signal processing terminal and the driver, and the driver is connected to both the first universal reflector and the second universal reflector. The laser emits a laser light that is split into two beams of light by the system, and the two beams of light are focused on the substrate for exposure.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A laser interference lithography system, which relates to the technical field of laser interference lithography. The system comprises: a laser device (1), an optical path system, a phase detection apparatus and a substrate (15), wherein the laser device (1) is used for generating a laser light source, and the laser light source is split by the optical path system to form reference light (S3), first measurement light (S1) and second measurement light (S2), which are incident to the phase detection apparatus; the phase detection apparatus is used for obtaining the phase difference between the first measurement light (S1) and the second measurement light (S2) on the basis of the reference light (S3), the first measurement light (S1) and the second measurement light (S2), and feeding back a compensation instruction to the optical path system on the basis of the phase difference; and the optical path system is further used for receiving the compensation instruction, and eliminating the phase difference on the basis of the compensation instruction, so as to obtain two exposure beams with no phase difference, wherein the two exposure beams with no phase difference are used for forming a preset pattern on the substrate (15).

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G01J 9/02 - Measuring optical phase differenceDetermining degree of coherenceMeasuring optical wavelength by interferometric methods

Abstract

A motion table acceleration safety protection method, and an apparatus. The method comprises: acquiring vertical acceleration data and height data of a motion table (S102); according to the vertical acceleration data and the height data, determining whether the following limiting conditions are simultaneously met: a sustained acceleration limiting condition, an absolute acceleration limiting condition, and a height limiting condition (S104); and if yes, triggering motion table acceleration protection (S106). Whilst the acceleration protection sensitivity is ensured, the reliability of acceleration checkers is ensured and the possibility of false triggering is reduced, providing necessary conditions for the safe and stable operation of lithography machines.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G01D 21/02 - Measuring two or more variables by means not covered by a single other subclass

Abstract

An exposure period adjustment device and method, relating to the field of ultra-precision measurement. The exposure period adjustment device comprises: a control module (900); and first, second, third and fourth electric mirror groups (110, 120, 130, 140), first and second position detectors (710, 720), and a period measurement module (800), which are connected to the control module (900). The exposure period adjustment device further comprises first and second beam splitters (200, 400) and first and second decoupling lenses (610, 620). A first incident light beam can sequentially pass through the second electric mirror group (120), the first electric mirror group (110), and the first beam splitter (200); a second incident light beam can sequentially pass through the fourth electric mirror group (140), the third electric mirror group (130), and the first beam splitter (200); points of incidence of the two incident light beams on the first beam splitter (200) are the same; one path of the light beam split by the first beam splitter (200) is incident to the period measurement module (800), and the other path passes through the second beam splitter (400); one path of the light beam split by the second beam splitter (400) passes through the first decoupling lens (610) and then reaches the first position detector (710), and the other path passes through the second decoupling lens (620) and then reaches the second position detector (720). The exposure period adjustment device has high adjustment precision and a wide range of application.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

An optical fiber winding device, comprising an optical fiber arranging plate (14). The optical fiber arranging plate (14) is provided with an inlet area, a winding area, and an outlet area which are sequentially arranged in a wiring direction; a plurality of inlets (31, 32, 33, 34) are provided in the inlet area; a plurality of winding grooves are provided in the winding area; a plurality of outlets (41, 42, 43, 44) are provided in the outlet area; the number of the inlets, the number of the winding grooves, and the number of the outlets are the same; inlet ends of the plurality of winding grooves are respectively communicated in one-to-one correspondence with the plurality of inlets (31, 32, 33, 34), and outlet ends of the plurality of winding grooves are respectively communicated in one-to-one correspondence with the plurality of outlets (41, 42, 43, 44); the plurality of inlets (31, 32, 33, 34) are respectively configured to allow for entry of optical fibers of a plurality of reading heads (12, 11, 16, 15); and the plurality of winding grooves are configured to enable a plurality of optical fibers to have a same length at the corresponding outlets (41, 42, 43, 44). The optical fiber winding device can classify and manage four reading head fiber pigtails (13).

IPC Classes  ?

• G02B 6/44 - Mechanical structures for providing tensile strength and external protection for fibres, e.g. optical transmission cables

Abstract

A photoresist cleaning solution, as well as a preparation method therefor and a cleaning method thereof in the technical field of photoresist cleaning. The photoresist cleaning solution comprises: a cleaning agent, a metal corrosion inhibitor and water; the cleaning agent comprises a first cleaning agent and/or a second cleaning agent, the first cleaning agent comprising a pyrrolidinone compound; the second cleaning agent comprises alkyl ammonium hydroxide; the metal corrosion inhibitor comprises benzotriazole and a derivative thereof. The photoresist cleaning solution can completely remove a photoresist without corroding a metal film, especially a chromium film, and may achieve repeated photoresist coating and utilization of a chromium-plated substrate, thus having remarkable economic benefits.

IPC Classes  ?

• G03F 7/42 - Stripping or agents therefor

Abstract

A workpiece clamping device, comprising an integrated frame (1) and at least two clamping fixtures (3), wherein the integrated frame comprises a mounting plate (11) and a cam turntable (12); the cam turntable is pivotally connected to the center of the mounting plate, and the cam turntable can at least rotate between a workpiece releasing position and a workpiece locking position; the clamping fixtures are movably connected to the integrated frame; and each clamping fixture has one end cooperating with the cam turntable and radially moving as the cam turntable rotates, so that the other end of the clamping fixture clamps or releases the workpiece. Also disclosed is a method for transferring a workpiece. The workpiece clamping device is suitable for clamping and transferring a large-aperture plane grating, can solve the problem of cumbersome and high-risk operation during a loading process in the existing method, can achieve quick loading, stable transfer, convenient operation and stable clamping without touching the surface of the grating, and can also achieve the fine adjustment and locking of clamping.

IPC Classes  ?

• B25B 11/00 - Work holders or positioners not covered by groups , e.g. magnetic work holders, vacuum work holders

Abstract

A positioning apparatus (030) for loading and unloading and a lithography device, relating to the technical field of lithography and being designed to solve the problem of low positioning precision during a silicon wafer handover process in the prior art. The positioning apparatus (030) for loading and unloading comprises a base (100), a first positioning structure (200) and a second positioning structure (300). The base (100) comprises a base body (110) and a frame body (120) surrounding the base body (110). The frame body (120) is fixedly connected to part of the base body (110), and the frame body (120) has a degree of freedom of elastic deformation in the X direction and the Y direction relative to the base body (110). The first positioning structure (200) is fixedly arranged on the frame body (120), the first positioning structure (200) being configured to be in positioning fit with a loading and unloading manipulator (010). The second positioning structure (300) is fixedly arranged on the first positioning structure (200), the second positioning structure (300) being configured to be in positioning fit with a wafer table (020), and the wafer table (020) being configured to support a material. The second positioning structure (300) has a degree of freedom of elastic deformation in the Z direction relative to the base body (110). The positioning apparatus (030) for loading and unloading improves the positioning precision during the silicon wafer handover process.

IPC Classes  ?

• B65G 47/90 - Devices for picking-up and depositing articles or materials
• B65G 47/24 - Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles

Abstract

Disclosed is a heterodyne grating interferometry system based on secondary diffraction, including a single-frequency laser, an input optical fiber, an acousto-optic modulator, a reading head, and a measurement grating, an output optical fiber, a photoelectric conversion unit and an electronic signal processing unit, wherein the single-frequency laser emits a single-frequency laser, which enters the acousto-optic modulator through the input optical fiber, and is divided into a reference light and measurement light to be input to the reading head, wherein the reading head and the measurement grating convert the reference light and measurement light into a reference interference optical signal and a measurement interference optical signal and send them to the photoelectric conversion unit through the output optical fiber and wherein the photoelectric conversion unit converts the measurement interference optical signal and the reference interference optical signal into a measurement interference electrical signal and a reference interference electrical signal.

IPC Classes  ?

• G01B 9/02002 - Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
• G01B 9/02 - Interferometers
• G01B 9/02003 - Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
• G01B 9/02015 - Interferometers characterised by the beam path configuration
• G01B 9/02055 - Reduction or prevention of errorsTestingCalibration
• G01B 9/02056 - Passive reduction of errors
• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness
• G02B 27/28 - Optical systems or apparatus not provided for by any of the groups , for polarising

Abstract

A silicon wafer bearing device in a photoetching device. The silicon wafer bearing device comprising a bearing body (100), a water channel being formed in the bearing body (100), wherein the water channel is provided with a front-end water channel section (110), a middle water channel section and a rear-end water channel section (130) which are in communication in sequence; the front-end water channel section (110) extends to the middle of the bearing body (100) from an edge part close to the bearing body (100); the end of the front-end water channel section (110) that is close to the edge of the bearing body (100) is a cooling liquid inlet (111), and the other end of the front-end water channel section (110) is in communication with one end of the middle water channel section; the other end of the middle water channel section is in communication with one end of the rear-end water channel section (130), and the other end of the rear-end water channel section (130) is a cooling liquid outlet (131); the rear-end water channel section (130) surrounds the periphery of the middle water channel section; and the front-end water channel section (110) is internally provided with a first barrier strip (112), which is arranged in an extending direction of the front-end water channel section (110) and divides the front-end water channel section (110) into at least two first shunt channels (113).

IPC Classes  ?

• H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
• F25D 17/02 - Arrangements for circulating cooling fluidsArrangements for circulating gas, e.g. air, within refrigerated spaces for circulating liquids, e.g. brine

Abstract

The present application relates to the technical field of silicon wafer bearing, and in particular to a silicon wafer bearing device in a photoetching apparatus. The silicon wafer bearing device in the photoetching apparatus comprises a bearing body, wherein the top of the bearing body is configured to bear a silicon wafer; a blocking ring is fixedly connected to an edge of the top of the bearing body; the blocking ring surrounds a bearing region of the bearing body, and an annular channel exists between the part of the blocking ring that is close to the inner ring and the bearing body; the bearing body is provided with a first air channel which has a first inlet and a first outlet; the first inlet is configured to be connected to a vacuum pump; the first outlet comprises a plurality of main outlets and several auxiliary outlets; the main outlets are opposite the blocking ring and are in communication with the annular channel; the auxiliary outlets are opposite an edge of the bearing region; and the sum of the cross sectional area of the main outlets is greater than the sum of the cross sectional area of the auxiliary outlets. According to the silicon wafer bearing device in the photoetching apparatus provided by the present application, when the silicon wafer is held in place by suction, the silicon wafer is not prone to warping, and the liquid loss speed above the silicon wafer can be reduced, thereby guaranteeing the exposure precision of the silicon wafer.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof

Abstract

An accelerometer, relating to the technical field of inertia measurement instruments, and comprising: a laser interferometer, an instrument head, and an acceleration resolving module. The instrument head comprises: a housing (1), a mass block (2), and an elastic support member (3); the mass block (2) is arranged inside the housing (1), and the mass block (2) is connected to the housing (1) by means of the elastic support member (3); the housing (1) is fixedly connected to an object to be tested; the laser interferometer is used for generating reference light and measurement light; the measurement light is transmitted to the interior of the housing (1) by means of an optical fiber (9), and is emitted to the surface of the mass block (2); the surface of the mass block (2) is used for reflecting measurement light to form reflected light; the laser interferometer is further used for receiving the reflected light and making the reflected light interfere with the reference light to form interference light; the laser interferometer is further used for converting the interference light into an interference signal and sending the interference signal to the acceleration resolving module for resolving so as to obtain an acceleration value of the object.

IPC Classes  ?

• G01P 15/03 - Measuring accelerationMeasuring decelerationMeasuring shock, i.e. sudden change of acceleration by making use of inertia forces by using non-electrical means
• G01P 15/093 - Measuring accelerationMeasuring decelerationMeasuring shock, i.e. sudden change of acceleration by making use of inertia forces with conversion into electric or magnetic values by photoelectric pick-up

Abstract

An anti-collision apparatus, relating to the technical field of ultra-precision equipment protection, and for use in solving the problem that existing anti-collision apparatuses cannot achieve an effective anti-collision protection effect on ultra-precision equipment. The anti-collision apparatus comprises a fixed end (100) and a floating end (200), the floating end (200) being configured to be fixedly connected to equipment to be protected (010); a first force assembly (300) and a second force assembly (400) are provided between the fixed end (100) and the floating end (200), wherein the first force assembly (300) is configured to provide an acting force enabling the floating end (200) to be close to the fixed end (100), and the second force assembly (400) is configured to provide an acting force enabling the floating end (200) to be away from the fixed end (100); and in a state that said equipment (010) is not subjected to collision force, a positioning structure configured to limit the relative position of the fixed end and the floating end is further provided between the fixed end (100) and the floating end (200). The anti-collision apparatus can play an effective anti-collision protection role on the ultra-precision equipment.

IPC Classes  ?

• F16F 15/03 - Suppression of vibrations of non-rotating, e.g. reciprocating, systemsSuppression of vibrations of rotating systems by use of members not moving with the rotating system using electromagnetic means
• F16F 15/04 - Suppression of vibrations of non-rotating, e.g. reciprocating, systemsSuppression of vibrations of rotating systems by use of members not moving with the rotating system using elastic means
• F16F 15/067 - Suppression of vibrations of non-rotating, e.g. reciprocating, systemsSuppression of vibrations of rotating systems by use of members not moving with the rotating system using elastic means with metal springs using only wound springs
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A grading control method for a workpiece table, a system, a device, and a storage medium. The method comprises: obtaining fault code information of a workpiece table; parsing the fault code information to obtain a parsing result; when it is determined, according to the parsing result, that the fault level of the workpiece table is a first-level fault, controlling the workpiece table to stop running on the basis of a first-level control strategy; and when it is determined, according to the parsing result, that the fault level of the workpiece table is a second-level fault, controlling the workpiece table to stop running on the basis of a second-level control strategy. The fault code information of the workpiece table is detected in real time and uploaded to an upper computer, and faults of the workpiece table are divided into different fault levels and correspond to different fault processing modes, so that the workpiece table is protected as much as possible without dangerous operation when the workpiece table fails.

IPC Classes  ?

• G05B 19/042 - Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors

Abstract

A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G01B 11/00 - Measuring arrangements characterised by the use of optical techniques
• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
• G02B 27/12 - Beam splitting or combining systems operating by refraction only

Abstract

A safe parking method and apparatus for a magnetic levitation platform, a control device, and a safe parking system. The method comprises: when an abnormality occurs to a magnetic levitation platform, determining whether the magnetic levitation platform is suitable for safe parking control (S101); in response to being suitable for safe parking control, obtaining a current state of the magnetic levitation platform (S102); generating a target parking trajectory on the basis of the current state (S103); and controlling the magnetic levitation platform to perform safe parking according to the target parking trajectory (S104).

IPC Classes  ?

• G05B 9/02 - Safety arrangements electric
• G05B 7/02 - Arrangements for obtaining smooth engagement or disengagement of automatic control electric

Abstract

Disclosed in the present invention are a method and apparatus for switching a high-precision motion platform between different precision modes. The method comprises: in a process that a motion platform operates in a servo mode s1, the motion platform receives a mode switching instruction and transmits same to a mode state machine, wherein the servo mode s1 corresponds to a first precision sensor and a controller A, and a servo mode s2 corresponds to a second precision sensor and a controller B; the mode state machine completes state switching corresponding to switching from the servo mode s1 to the servo mode s2 within the current servo period T1, and transmits the mode switching instruction to a controller output keeper, and the controller output keeper latches, for a period, the output CtrA(T1) of the controller A of the servo mode s1 within the period T1; and the first precision controller is switched to the second precision controller, the controller A is switched to the controller B, and the controller B performs servo control on the basis of the output CtrA(T1) of the controller A within the period T1. According to the present invention, the switched controller continues to output on an inherited output signal, so that non-delay switching is realized.

IPC Classes  ?

• H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

Abstract

Embodiments of the present application disclose a six-degree-of-freedom motion mechanism capable of multi-layer heat dissipation, comprising a base, and a mover assembly and a stator assembly which are provided on the base. The mover assembly comprises a magnetic steel framework assembled on the stator assembly, and when a motor coil is powered on, the mover assembly is in a magnetic suspension state relative to the stator assembly; the stator assembly comprises a stator framework; four groups of horizontal motor assemblies and vertical motor assemblies which are perpendicular to each other and are electrically connected to a control system are uniformly distributed and fixed in the circumferential direction of the stator framework, and cooling water is circulated among the horizontal motor assemblies and the vertical motor assemblies to absorb heat emitted by the motor coil; horizontal position sensors and vertical position sensors which are respectively correspondingly connected to the horizontal motor assemblies and the vertical motor assemblies to identify the position directions of the horizontal motor assemblies and the vertical motor assemblies and form a closed loop with the control system so as to implement six-degree-of-freedom posture simulation are fixedly provided on the base. According to the embodiments of the present application, the structure is compact, motion posture calculation is easy, and heat dissipation is instant.

IPC Classes  ?

• H02K 41/02 - Linear motorsSectional motors
• H02K 41/035 - DC motorsUnipolar motors
• H02K 33/00 - Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
• H02K 9/19 - Arrangements for cooling or ventilating for machines with closed casing and closed-circuit cooling using a liquid cooling medium, e.g. oil
• H02K 11/21 - Devices for sensing speed or position, or actuated thereby
• H02K 3/24 - Windings characterised by the conductor shape, form or construction, e.g. with bar conductors with channels or ducts for cooling medium between the conductors
• H02K 3/46 - Fastening of windings on the stator or rotor structure
• H02N 15/00 - Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for

Abstract

An optical fiber (4) guide-in device used for a vacuum chamber, and an optical fiber (4) guide-in method, which relate to the technical field of vacuum chambers. Provided are an optical fiber (4) guide-in device and an optical fiber (4) guide-in method, which have higher air tightness when an optical fiber (4) is guided into a vacuum chamber. The optical fiber (4) guide-in device comprises a blocking plate (1), an adhesive filling base (2), a vacuum potting adhesive layer and a sealing adhesive layer (8), wherein an edge of the blocking plate (1) is provided with a first slot body (11); an inner wall of the adhesive filling base (2) is provided with a first annular boss (24) and a second annular boss (27); the edge of the first annular boss (24) close to a central hole (21) is provided with a second slot body (22); the blocking plate (1) is placed on the first annular boss (24); the blocking plate (1) is connected to the first annular boss (24); the first slot body (11) and the second slot body (22) which correspond to each other form a fixing slot that is configured to accommodate a bare wire of an optical fiber (4); the vacuum potting adhesive layer covers the blocking plate (1); and the sealing adhesive layer (8) covers the vacuum potting adhesive layer.

IPC Classes  ?

• G02B 7/00 - Mountings, adjusting means, or light-tight connections, for optical elements

Abstract

A multi-stage vibration isolation system and method for a precision instrument. In the system, a first deep groove vibration isolation trench is surroundingly provided in a foundation, so that the first deep groove vibration isolation trench is used to divide the foundation into an outer foundation and an inner foundation. The precision instrument is provided on the inner foundation, and first vibration isolation media (8, 9) are filled in the first deep groove vibration isolation trench, so that vibration reduction is carried out in multiple aspects. Vibration excited by a moving member may be decoupled from low-frequency random vibration of the ground. Vibration on a main substrate (1) is reduced from a vibration source by blocking a transmission path of disturbance force of the moving member, and different high-damping vibration isolation materials are selected as the first vibration isolation media (8, 9) respectively for broadband and narrowband vibrations. The first deep groove vibration isolation trench is filled by using a series connection means, so that high-precision requirements of silicon wafer positioning is met. As such, not only is the moving member separated from the main substrate (1) by means of a vibration isolator (2), but the vibration source can also be reduced, thereby greatly reducing vibration and improving the motion positioning precision of a silicon wafer in a photoetching machine.

IPC Classes  ?

• E02D 31/08 - Protective arrangements for foundations or foundation structuresGround foundation measures for protecting the soil or the subsoil water, e.g. preventing or counteracting oil pollution against transmission of vibrations or movements in the foundation soil

Abstract

A displacement measurement system, which relates to the technical field of grating measurement. The system comprises a grating mounting plate (300), and an exposure position grating (120) and a pre-treatment position grating (110), which are sequentially arranged on the grating mounting plate (300) in a first direction (Y), wherein the exposure position grating (120) and the pre-treatment position grating (110) each comprise a hollow square grating. The system further comprises a workpiece stage (200), and detection mechanisms, which are arranged at intervals on the surface of the workpiece stage (200), wherein the workpiece stage (200) and the grating mounting plate (300) are arranged in a manner of being spaced apart in a second direction (Z); the detection mechanisms cooperate with the exposure position grating (120) and the pre-treatment position grating (110), and are configured to provide a measurement reference of the displacement measurement system; the first direction (Y) is perpendicular to the second direction (Z); and during a stage exchange operation of the workpiece stage (200) in the first direction (Y) from a pre-treatment position to an exposure position, the detection mechanisms only need to pass through a slit between the exposure position grating (120) and the pre-treatment position grating (110). During switching, measurement can be completed by means of a relatively simple calculation process, thereby simplifying edge switching of a planar grating measurement system. Further disclosed is a photolithography device.

IPC Classes  ?

• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness
• G03F 7/20 - ExposureApparatus therefor

Abstract

The present invention provides a Lorentz motor, a magnetic field optimization method, and a photolithography apparatus, and relates to the technical field of semiconductor processing. The Lorentz motor comprises a first magnetic circuit module (400) configured to provide a first magnetic circuit (600), a second magnetic circuit module (500) configured to provide a second magnetic circuit (700), and a coil (200) for generating an interaction force with the first magnetic circuit (600) and the second magnetic circuit (700); wherein, the first magnetic circuit (600) is closed by a magnetic conductor of the first magnetic circuit module, by a primary magnet, and by an air gap inside the first magnetic circuit module (400); auxiliary magnets of the second magnetic circuit module (500) are arranged in a Halbach array, and some or all of the auxiliary magnets have a magnetization direction which is inclined relative to an X-axis and Y-axis, the angle of incline causing the second magnetic circuit (700) to be closed by the second magnetic circuit module (500) and by an air gap in the second magnetic circuit module (500). When the Lorentz motor is in operation, there is a low amount of magnetic flux leakage and a relatively small impact on surrounding elements, thus allowing the photolithography apparatus to maintain higher operating efficiency and operating precision.

IPC Classes  ?

• H02K 41/035 - DC motorsUnipolar motors

Abstract

Disclosed is a plane grating calibration system, comprising an optical subsystem, a frame, first vibration isolator, a vacuum chuck, a workpiece stage, second vibration isolator, a base platform and a controller; the optical subsystem is mounted on the frame, and the frame is isolated from vibration by the first vibration isolator; the vacuum chuck is rotatably mounted on the workpiece stage, the workpiece stage is positioned on the base platform, and the base platform is isolated from vibration by the second vibration isolator. A displacement interferometer is integrated into the optical subsystem, and the entire optical subsystem adopts a method of sharing a light source, thereby avoiding the problems of low wavelength precision and poor coherence of separate light sources.

IPC Classes  ?

• G01M 11/02 - Testing optical properties
• G01M 11/04 - Optical benches therefor
• G02B 5/18 - Diffracting gratings
• G02B 7/00 - Mountings, adjusting means, or light-tight connections, for optical elements
• G02B 27/10 - Beam splitting or combining systems
• G02B 27/28 - Optical systems or apparatus not provided for by any of the groups , for polarising
• G02B 27/30 - Collimators
• G02F 1/11 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves

Abstract

A heterodyne fiber interferometer displacement measuring system, comprising a laser light source assembly (10) for simultaneously emitting measuring light and reference light; a first photoelectric detector (20), a first fiber coupler (31), a fiber ferrule (50), a plano-convex lens (70), a first polarizing beam splitting prism (81), and a first reflecting device (100) which are sequentially provided on an optical path of the measuring light on the basis of first single mode fibers (41, 43); and a second photoelectric detector (21), a second fiber coupler (30), a collimator (60), a second polarizing beam splitting prism (80), and a second reflecting device (90) which are sequentially provided on an optical path of the reference light on the basis of second single mode fibers (40, 42). An object to be measured is fixed on the first reflecting device (100); the reference light and the measuring light are processed to form a measurement signal and a reference signal; and displacement information of said object is determined according to the measurement signal and the reference signal. High-precision displacement measurement can be achieved. Further provided is a heterodyne fiber interferometer displacement measuring method.

IPC Classes  ?

• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness

Abstract

An interferometer displacement measurement system and method. Measurement light returns to a first photodetector (30) and a second photodetector (31) after being processed by a first polarizing beam splitting prism (20), a first 1/4 wave plate (40), a first beam splitting prism (50), an optical waveguide assembly (60), and a reflecting device (70); reference light returns to the first photodetector (30) and the second photodetector (31) after being processed by a second polarizing beam splitting prism (21), a second 1/4 wave plate (41), a second beam splitting prism (51), and a reflecting mirror (80); the first photodetector (30) forms a measurement signal according to the processed measurement light and reference light, and the second photodetector (31) forms a reference signal according to the processed measurement light and reference light; and displacement information of an object to be measured is determined according to the measurement signal and the reference signal. According to the present invention, a displacement measurement error can be decreased, and measurement accuracy and a measurement range are increased.

IPC Classes  ?

• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness

Abstract

Provided is a heterodyne grating interferometry system based on secondary diffraction, comprising a single-frequency laser, an input optical fiber, an acousto-optic modulator, a reading head, a measurement grating, an output optical fiber, a photoelectric conversion unit, and an electronic signal processing part. A single-frequency laser ray emitted by the single-frequency laser enters the acousto-optic modulator by means of the input optical fiber, and is divided into a reference ray and a measurement ray to be input into the reading head. The reading head and the measurement grating allow the reference ray and the measurement ray to form a reference interference signal and a measurement interference signal to be sent to the photoelectric conversion unit by means of the output optical fiber. The photoelectric conversion unit converts a measurement interference electro-optical signal and a reference interference optical signal into a measurement interference electrical signal and a reference interference electrical signal to be sent to the electronic signal processing part for calculating the two-degree-of-freedom linear displacement of the measurement grating. The present system uses secondary diffraction light as a measurement signal, and achieves the purpose of subdividing a signal four times.

IPC Classes  ?

• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness
• G01B 9/02 - Interferometers
• G02B 27/28 - Optical systems or apparatus not provided for by any of the groups , for polarising

Abstract

A silicon wafer adsorption unit and a silicon wafer conveying device, which relate to the technical field of semiconductor manufacturing equipment and are designed to solve the problem of the large amount of space occupied by an existing silicon wafer conveying device. The silicon wafer adsorption unit comprises a stator assembly and a mover assembly, wherein the stator assembly comprises a base (110), and the base (110) is provided with a guide portion; the mover assembly comprises a moving portion and an adsorption head (220), the moving portion is fitted to the guide portion in an insertion manner, and a circumferential limiting structure is provided between the moving portion and the guide portion for limiting the relative rotation of the moving portion and the guide portion; and the adsorption head (220) is fixedly arranged at the moving portion, and the adsorption head and the moving portion are arranged in an insertion direction of the moving portion and the guide portion. The silicon wafer conveying device comprises the silicon wafer adsorption unit. The silicon wafer adsorption unit and the silicon wafer conveying device omit the configuration of a rotation limiting structure in the lateral direction of suction cups in a multi-suction-cup integrated structure, thereby achieving a compact overall structure of the silicon wafer adsorption unit.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A device and method for regulating and controlling an incident angle of a light beam in laser interference lithography. The device comprises: a beam splitter prism (11), a first decoupling lens (12), a first position detector (13) and a feedback control system (16), wherein the beam splitter prism (11) is located between a first lens (8) and a second lens (9); the first decoupling lens (12) is located between the first position detector (13) and the beam splitter prism (11); the feedback control system (16) is connected to the first position detector (13) and a first universal reflecting mirror (602); the beam splitter prism (11) is used for reflecting first incident light that passes through the first universal reflecting mirror (602); the first decoupling lens (12) is used for enabling first reflected light of the beam splitter prism (11) to be incident to the first position detector (13); the first position detector (13) is used for measuring the position of a light beam and transmitting a measurement result to the feedback control system (16); and the feedback control system (16) is used for outputting a control instruction according to the measurement result, and for adjusting a mirror base of the first universal reflecting mirror (602), thereby regulating and controlling an incident angle of an exposure light beam. The incident angle of a light beam can thus be accurately regulated and controlled.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A notched part fatigue life prediction method and prediction device, relating to the field of multi-axis fatigue strength theories. The method comprises: building a finite element model of a notched part by using finite element analysis software (S1); performing convergence analysis on the number of grids of the finite element model of the notched part (S2); determining a virtual strain process at a notch by means of a linear elastic theory or linear elastic finite element analysis (S4); determining a virtual equivalent shear strain amplitude on a critical plane (S5); determining a relationship between a shear-type virtual equivalent strain and a real equivalent stress by using a shear-type Neuber rule and a cyclical stress-strain relationship of a material (S6); calculating a real equivalent strain amplitude by means of a real equivalent stress amplitude and the shear-type Neuber rule (S8); and calculating the fatigue life of the notched part by applying a Manson-Coffin equation (S9). According to the method, the fatigue life of the notched part under a multi-axis load can be well predicted.

IPC Classes  ?

• G06F 30/23 - Design optimisation, verification or simulation using finite element methods [FEM] or finite difference methods [FDM]

Abstract

A notched member fatigue life prediction method and prediction apparatus based on a primary load mode. The method comprises: establishing a finite element model of a notched member; carrying out convergence analysis on the number of grids of the finite element model of the notched member; counting all repetitions by using a multi-axis cycle counting algorithm; deducing a relationship between the virtual equivalent strain and real equivalent stress by means of a cyclic stress-strain relationship of a material and a Neuber method; respectively replacing a virtual equivalent strain amplitude with tensile-type and shear-type Shang-Wang multi-axis fatigue damage parameters to solve a real equivalent stress amplitude on a critical plane; calculating real tensile-compressive and shear equivalent strain amplitudes on the critical plane by means of the real equivalent stress amplitude and a Neuber rule, and respectively calculating the tensile-compressive fatigue life and the shear fatigue life of the notched member by using a Manson-Coffin equation; and selecting the greater value of a tensile-compressive fatigue damage value and a shear fatigue damage value as the fatigue damage of each counted repetition, and accumulating the fatigue damage by using a Miner rule and predicting the fatigue life.

IPC Classes  ?

• G06F 30/23 - Design optimisation, verification or simulation using finite element methods [FEM] or finite difference methods [FDM]

Abstract

A fatigue life prediction method and apparatus based on a weighted average maximum shear stress plane, which belong to the field of multi-axis fatigue strength theories. The method comprises the following steps: (1) synthesizing a multi-axis variable-amplitude load process into an equivalent stress process by means of a von Mises equivalent stress formula, and carrying out cyclic counting on a von Mises equivalent stress process by means of a Wang-Brown multi-axis cyclic counting method; (2) using a proposed weighted average maximum shear stress plane as a critical plane under a high-cycle multi-axis variable-amplitude load; (3) calculating a fatigue damage parameter on the critical plane in each repetition obtained by means of counting; (4) carrying out fatigue damage calculation by using a Zhang-Shang model; and (5) accumulating, by using a Miner linear accumulation rule, the damage calculated in each repetition, and finally calculating the fatigue life of the entire multi-axis variable-amplitude load process. In a weight function proposed in the method, the main fatigue damage mechanism under multi-axis loading can be taken into consideration. A life prediction result indicates that a fatigue life under multi-axis constant-amplitude and variable-amplitude loading can be better predicted by means of the life prediction method.

IPC Classes  ?

• G01N 3/24 - Investigating strength properties of solid materials by application of mechanical stress by applying steady shearing forces
• G01M 13/00 - Testing of machine parts
• G06F 17/15 - Correlation function computation

Abstract

A five-degree-of-freedom heterodyne grating interferometry system comprises: a single-frequency laser for emitting single-frequency laser light, the single-frequency laser light can be split into a reference light beam and a measurement light beam; an interferometer lens set and a measurement grating for converting the reference light and the measurement light into a reference interference signal and a measurement interference signal; and multiple optical fiber bundles respectively receiving the measurement interference signal and the reference interference signal, wherein each optical fiber bundle has multiple multi-mode optical fibers respectively receiving interference signals at different positions on the same plane. The system is not over-sensitive to the environment, is small and light, and is easy to arrange. Six-degree-of-freedom ultra-precision measurement can be achieved by arranging multiple five-degree-of-freedom interferometry systems and using redundant information, thereby meeting the needs of a lithography machine worktable for six-degree-of-freedom position and orientation measurement.

IPC Classes  ?

• G01D 5/353 - Mechanical means for transferring the output of a sensing memberMeans for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for convertingTransducers not specially adapted for a specific variable using optical means, i.e. using infrared, visible or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells influencing the transmission properties of an optical fibre
• G01D 5/34 - Mechanical means for transferring the output of a sensing memberMeans for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for convertingTransducers not specially adapted for a specific variable using optical means, i.e. using infrared, visible or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells

Abstract

A two-degree-of-freedom heterodyne grating interferometry measurement system, comprising: a single-frequency laser device for emitting a single-frequency laser, and the single-frequency laser can be split into a beam of reference light and a beam of measurement light; an interferometer mirror group and a measurement grating for forming a reference interference signal and a measurement interference signal from the reference light and the measurement light; and a receiving optical fiber for receiving the reference interference signal and the measurement interference signal, wherein a core diameter of the receiving optical fiber is smaller than a width of an interference fringe of the reference interference signal and the measurement interference signal, so that the receiving optical fiber receives a part of the reference interference signal and the measurement interference signal. The measurement system has advantages of insensitivity to grating rotation angle error, small volume, light weight, and a facilitating arrangement.

IPC Classes  ?

• G01B 9/02003 - Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
• G01B 9/02015 - Interferometers characterised by the beam path configuration
• G01B 11/06 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness for measuring thickness
• G01B 9/02 - Interferometers

Abstract

Disclosed is an exposure light beam phase measurement method in laser interference photolithography, the method comprising: separating measurement light from an exposure light beam for laser interference photolithography and inputting the measurement light into a laser phase measurement interferometer (1) to carry out phase measurement on the exposure light beam for laser interference photolithography; then introducing a reference light beam homologous with the exposure light beam for laser interference photolithography, and inputting the reference light beam into the laser phase measurement interferometer (1); processing the reference light beam by means of the laser phase measurement interferometer (1) to form an interference measurement optical signal; and performing resolving to obtain the phase of the exposure light beam for laser interference photolithography. Disclosed is a laser interference photolithography system, comprising a laser phase measurement interferometer (1), a controller (2), and phase modulators (8, 9), wherein by means of the exposure light beam phase measurement method in laser interference photolithography, the laser phase measurement interferometer (1) is used for measuring whether the phase of an exposure light beam drifts, and the controller (2) controls the phase modulators (8, 9) to carry out phase modulation, such that the locking of exposure stripe phase drift is completed, and the manufacturing of a high-precision variable-period optical grating is achieved.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G01J 9/02 - Measuring optical phase differenceDetermining degree of coherenceMeasuring optical wavelength by interferometric methods

Abstract

A laser interference photolithography system, comprising a laser (1), a first reflector (2), a grating beam splitter (3), a second reflector (401), a first universal reflector (402), a first lens (403), a second universal reflector (501), a second lens (502), a splitter prism (6), a control module (8), an angle measurement module (9), a third lens (10), and a substrate (11). The control module (8) comprises a signal processing end (801), a controller (802), and a driver (803). The signal processing end (801) is connected to the angle measurement module (9), the controller (802) is connected to both the signal processing end (801) and the driver (803), and the driver (803) is connected to both the first universal reflector (402) and the second universal reflector (501). The laser (1) emits a light source that is split into two beams by the described system, which are focused on the substrate (11) for exposure. By adjusting the exposure angle, a gradient periodic large-area grating is fabricated. Since the size of a grating made by using scanning interference photolithography is not limited by the size of an exposure light spot, a large-size gradient periodic grating can be fabricated.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A scanning interference lithographic system, comprising a heterodyne optical path, a first interference optical path, a second interference optical path, a motion platform (21) and a control subsystem. A base (11) is carried on the motion platform (21), a displacement measurement interferometer (23) is used to measure the displacement of the motion platform (21), and first light and second light are focused on the base (11) for interference exposure. The control subsystem generates instructions according to various measurement information, adjusts angles of corresponding devices or the phase of a light beam, and locks the phase shift of interference exposure fringes of the first light and the second light. The scanning interference lithographic system has a high precision of fringe pattern locking and a high laser utilization rate. A heterodyne phase meter (7) is used to measure the phase of an exposure light beam, the displacement measurement interferometer (23) measures a motion error of the motion platform (21), and the control subsystem is used to perform compensation control on the exposure interference fringe. The scanning interference lithographic system can be used for manufacturing a large-area high-precision dense grating line gradient periodic grating.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

Disclosed are a phase measurement device for a laser interference photolithography system, and method for using same, the phase measurement device comprising a first wave plate (302), a first polarization splitting prism (301), a fourth wave plate (303), a backward reflector (304), a third wave plate (305), a reflector (306), a second wave plate (307), a polarizing film (309), a second polarization splitting prism (308), a third polarization splitting prism (310), a first photoelectric detector (312), a second photoelectric detector (313), and a base (2), wherein the first polarization splitting prism (301), the second polarization splitting prism (308), the third polarization splitting prism (310), the first photoelectric detector (312), and the second photoelectric detector (313) are fixed on the base (2); the first wave plate (302), the second wave plate (307), the third wave plate (305), and the fourth wave plate (303) are respectively arranged around the periphery of the first polarization splitting prism (301); the polarizing film (309) is arranged on an emitting face of the third polarization splitting prism (310); the backward reflector (304) is arranged on an outer side of the fourth wave plate (303); and the reflector (306) is arranged on an outer side of the third wave plate (305), such that a phase measurement optical path system is formed. An interferometric signal is resolved to obtain a measurement light phase for variable-period interference exposure fringe control.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G02B 27/28 - Optical systems or apparatus not provided for by any of the groups , for polarising

Abstract

A plane grating (25) calibration system, said system comprising an optical subsystem, a frame (24), first vibration isolators (22), a vacuum chuck (19), a workpiece table (18), second vibration isolators (21), a substrate (20) and a controller (23); the optical subsystem is mounted on the frame (24), and the frame (24) uses the first vibration isolators (22) for vibration isolation; the vacuum chuck (19) is rotatably mounted on the workpiece table (18), the workpiece table (18) is located on the substrate (20), and the substrate (20) uses the second vibration isolators (21) for vibration isolation. A displacement interferometer assembly (17) is incorporated into the optical subsystem, the entire optical subsystem adopts a method of sharing a light source, thereby avoiding the problems of low wavelength precision and poor coherence of separate light sources. In addition, the optical subsystem and the workpiece table (18) adopt a method of independent vibration isolation, preventing vibration generated when the workpiece table (18) moves from being transferred to the optical subsystem, eliminating an error generated due to the vibration of the optical subsystem, thereby improving the precision of calibrating the plane grating (25).

IPC Classes  ?

• G01M 11/04 - Optical benches therefor
• G01M 11/02 - Testing optical properties
• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness

Goods & Services

Semi-conductors; integrated circuit chips, namely, semi-conductors; wafers for integrated circuits; precision measuring apparatus, namely, apparatus used to measure nanoscale properties of materials for non-medical purposes; data processing apparatus; optical apparatus and instruments, namely, exposure meters for photographic devices; computer programs, namely, downloadable software for use in the designing and manufacturing of semi-conductors and integrated circuit chips; batteries, electric; radios; integrated circuits Research on semiconductor equipment technology; conducting technical project feasibility studies in the field of new semiconductor manufacturing machinery technology; research and development of new products for others; engineering; scientific laboratory services; mechanical research; material testing; computer programming; computer software design; maintenance of computer software

Abstract

A five-degree-of-freedom heterodyne grating interferometry system comprises: a single-frequency laser (1), used to emit single-frequency laser light, wherein the single-frequency laser light can be split into a reference light beam and a measurement light beam; an interferometer lens set (3) and a measurement grating (4), used to convert the reference light and the measurement light into a reference interference signal and a measurement interference signal; and multiple optical fiber bundles (5), respectively receiving the measurement interference signal and the reference interference signal, wherein each optical fiber bundle (5) has multiple multi-mode optical fibers respectively receiving interference signals at different positions on the same plane. The measurement system is not over-sensitive to the environment, is small and light, and is easy to arrange. Six-degree-of-freedom ultra-precision measurement can be achieved by arranging multiple five-degree-of-freedom interferometry systems and using redundant information, thereby meeting the needs of a lithography machine workpiece table for six-degree-of-freedom position and orientation measurement.

IPC Classes  ?

• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness

Abstract

Disclosed is a two-degree-of-freedom heterodyne grating interferometry measurement system, comprising: a single-frequency laser device (1) for emitting a single-frequency laser, wherein the single-frequency laser can be split into a beam of reference light and a beam of measurement light; an interferometer mirror group (3) and a measurement grating (4) for forming a reference interference signal and a measurement interference signal from the reference light and the measurement light; and a receiving optical fiber (5) for receiving the reference interference signal and the measurement interference signal, wherein a core diameter of the receiving optical fiber (5) is less than the width of an interference fringe of the reference interference signal and the measurement interference signal, so that the receiving optical fiber (5) receives a part of the reference interference signal and the measurement interference signal. The measurement system has the advantages of insensitivity to a grating rotation angle error, a small volume, a light weight, facilitating arrangement, etc., and is particularly suitable for a scenario with a higher requirement for an installation error in industrial application.

IPC Classes  ?

• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness

Abstract

Disclosed is a magnetic-fluid momentum sphere, which is used for satellite attitude adjustment. The magnetic-fluid momentum sphere comprises stators and a spherical shell. The stators are classified into three groups, axes of the three groups of stators are orthogonal to each other, each group comprises two stators arranged symmetrically about the center of the spherical shell, and the inner surfaces of the stators are spherical surfaces. The spherical shell is formed by combining two hemispherical shells, the material of the spherical shell is a non-ferromagnetic material, the inner surfaces of the stators closely adhere to the outer surface of the spherical shell, there is no relative movement between the spherical shell and the inner surfaces of the stators, and the spherical shell is filled with magnetic fluid. The magnetic-fluid momentum sphere achieves a small size and mass, low costs, and small coupling among the axes.

IPC Classes  ?

• G01C 19/30 - Erection devices, i.e. devices for restoring rotor axis to a desired position
• G01C 19/46 - Erection devices for restoring rotor axis to a desired position
• B64G 1/28 - Guiding or controlling apparatus, e.g. for attitude control using inertia or gyro effect
• H02K 16/04 - Machines with one rotor and two stators
• H02K 41/03 - Synchronous motorsMotors moving step by stepReluctance motors
• H02K 16/00 - Machines with more than one rotor or stator
• G01C 19/24 - SuspensionsBearings using magnetic or electrostatic fields
• H02K 5/128 - Casings or enclosures characterised by the shape, form or construction thereof specially adapted for operating in liquid or gas using air-gap sleeves or air-gap discs

Abstract

A magnetic levitation reaction sphere includes a spherical-housing-shaped rotor and three groups of stators. Each group includes two stators using the sphere center of the rotor as a symcenter. Axes of the three groups are mutually orthogonal. Each stator comprises a stator core and a coil array. An air gap is reserved between an inner surface of each stator core and the outer surface of the rotor. Through grooves are radially formed in the stator cores. The coil arrays are disc-type motor stator windings. Two effective sides of each coil in each coil array are respectively placed in two through grooves of the corresponding stator core. The magnetic levitation reaction sphere has low cost; levitation and rotation driving are integrated; the magnetic levitation reaction sphere has a simple and compact structure, a small size and a low mass, and relates to inherent stable levitation; and the levitation control is simple.

IPC Classes  ?

• G01C 19/00 - GyroscopesTurn-sensitive devices using vibrating massesTurn-sensitive devices without moving massesMeasuring angular rate using gyroscopic effects
• B64G 1/24 - Guiding or controlling apparatus, e.g. for attitude control
• H02N 15/00 - Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for
• H02K 16/00 - Machines with more than one rotor or stator
• G05D 1/08 - Control of attitude, i.e. control of roll, pitch, or yaw

Abstract

A six-degree-of-freedom displacement measurement method for an exposure region on a wafer stage, the wafer stage comprises a coil array and a movable platform. A planar grating is fixed below a permanent magnet array of the movable platform. A reading head is fixed in a gap of the coil array. A measurement region is formed on the planar grating by an incident measurement light beam of the reading head. The reading head measures the six-degree-of-freedom displacement of the measurement region, so that the six-degree-of-freedom displacement of the exposure region is obtained through calculation. In the method, the six-degree-of-freedom displacement of the exposure region at any time is measured; the measurement complexity is reduced and the measurement precision is improved, and especially, the six-degree-of-freedom displacement of the exposure region can be precisely measured at any time even if the movable platform has high flexibility.

IPC Classes  ?

• G01B 11/14 - Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
• G01N 11/04 - Investigating flow properties of materials, e.g. viscosity or plasticityAnalysing materials by determining flow properties by measuring flow of the material through a restricted passage, e.g. tube, aperture
• G01D 5/28 - Mechanical means for transferring the output of a sensing memberMeans for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for convertingTransducers not specially adapted for a specific variable using optical means, i.e. using infrared, visible or ultraviolet light with deflection of beams of light, e.g. for direct optical indication
• G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Abstract

An electrostatic chuck device, relating to the technical field of semiconductor wafer processing. The electrostatic chuck device comprises: a first insulation layer (4), a second insulation layer (6), an electrode layer (5), and a metal layer (7), wherein the first insulation layer (4) is provided above the second insulation layer (6); the electrode layer (5) is provided between the first insulation layer (4) and the second insulation layer (6); the second insulation layer (6) is provided on the metal layer (7); and the first insulation layer (4) is made of a sapphire material. The electrostatic chuck device improves the surface plasma ablation resisting capability, and overcomes the difficulty of sintering a ceramic layer of the conventional electrostatic chunk under high temperature.

IPC Classes  ?

• H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping

Abstract

A coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100) of the reticle stage, a balance mass (200), a drive motor, a mask plate (101, 102), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A magnetic-fluid momentum sphere is used for satellite attitude adjustment. The magnetic-fluid momentum sphere comprises stators and a spherical shell. The stators are classified into three groups, axes of the three groups of stators are orthogonal to each other, each group comprises two stators, two stators in each group are arranged symmetrically about the center of the spherical shell, and inner surfaces of the stators are spherical surfaces. The spherical shell is formed by combining two hemispherical shells, the material of the spherical shell is a non-ferromagnetic material, the inner surfaces of the stators closely adhere to the outer surface of the spherical shell, there is no relative movement between the spherical shell and the inner surfaces of the stators, and the spherical shell is filled with magnetic fluid. The magnetic-fluid momentum sphere adjusts an attitude of a satellite by means of rotation of the magnetic fluid, and features a small size and mass, low costs, and small coupling among the axes. The spherical shell of the magnetic-fluid momentum sphere does not rotate, so that the manufacture is simple and the structure is compact. Friction between the magnetic fluid and the spherical shell is small, contributing to low consumption, high reliability, and high efficiency.

IPC Classes  ?

• H02K 16/00 - Machines with more than one rotor or stator
• B64G 1/24 - Guiding or controlling apparatus, e.g. for attitude control

Abstract

A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A six-degree-of-freedom displacement measurement method for an exposure region (10) on a silicon wafer stage, applied in the six-degree-of-freedom displacement measurement of the exposure region (10) on the silicon wafer stage. The silicon wafer stage comprises a coil array (4) and a movement bench (3). A planar optical grating (9) is fixed below a magnetic steel array (8) of the movement bench (3). A reading head (5) is fixed in a gap of the coil array (4), and a central line of the reading head (5) coincides with a central line of a lens (1). A measurement region (11) is formed on the planar optical grating (9) by an incident measurement light beam (6) from the reading head (5), and the center of the measurement region (11) and the center of an exposure region (2) are located at a same vertical line. One part of the movement bench covered by the exposure region (2) is an approximately rigid body; and when the movement bench (3) is deformed due to movement or vibration, the reading head (5) measures the six-degree-of-freedom displacement of the exposure region, so that the six-degree-of-freedom displacement of the exposure region (2) is obtained by means of calculation. In the method, the six-degree-of-freedom displacement of the exposure region (2) at any time during the movement of the silicon wafer stage is measured; the measurement complexity is reduced and the measurement precision is improved, and especially, the six-degree-of-freedom displacement of the exposure region (2) can at any time be precisely measured even if the movement bench (3) has high flexibility.

IPC Classes  ?

• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness
• G03F 7/20 - ExposureApparatus therefor

Abstract

A magnetic levitation momentum sphere, used for spacecraft attitude adjustment. The magnetic levitation momentum sphere comprises a spherical-housing-shaped rotor (4) and multiple stators (1). There are three groups of stators (1). Each group of stators (1) comprises two stators (1) using the sphere center of the rotor (4) as a symcenter, and axes of the three groups of stators (1) are mutually orthogonal. Each stator (1) comprises a stator core (2) and a coil array (3). An inner surface of each stator core (2) fitted to the rotor (4) is a spherical surface, and an air gap is reserved between the spherical surface and the outer surface of the rotor (4). Through grooves (6) are radially formed in the stator cores (2), and are evenly distributed on the circumferences of the stator cores (2). The coil arrays (3) are disc-type motor stator windings. Two effective sides (8) of each coil (7) in each coil array (3) are placed in two through grooves (6) of the corresponding stator core (2) respectively. The magnetic levitation momentum sphere has low cost; suspension and rotation driving are integrated; the magnetic levitation momentum sphere has a simple and compact structure, a small size and a low mass, and relates to inherent stable levitation; and the levitation control is simple.

IPC Classes  ?

• H02K 16/00 - Machines with more than one rotor or stator
• H02N 15/00 - Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for
• B64G 1/24 - Guiding or controlling apparatus, e.g. for attitude control

Abstract

A displacement measurement system utilizing rotational grating in measurement, comprising: a laser (1), a convex lens (2), refractive elements (6a,6b,6c), a grating (3), a photoelectric converter (4), and an electronic signal processing component (5); the system realizes displacement measurement based on grating diffraction, an optical Doppler effect and beat principle, a displacement measurement function is not limited by rotation about a fixed direction of an object to be detected, when the grating (3) comparatively to the laser (1) makes a planar motion or rotates about a laser optical axis, measurement system outputs displacement information of a desired measurement direction, without influence of grating (3) translation or rotation within a plane. The measurement system has a flexible mounting method, a convenient adjustment method, a low sensitivity to the environment, and an easy to be processed measurement signal, and resolution and precision of the measurement system reach sub-nanometer or even higher. The measurement system provides position displacement measurement for a lithography tool ultra-precision workpiece table, enhances workpiece table overall performance, and also can be applied in multi-degree-of-freedom displacement precision measurement for a workpiece table of a precision machine tool, a three-coordinate measuring machine, a semiconductor detection device, etc.

IPC Classes  ?

• G01B 11/02 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness
• G01D 5/38 - Forming the light into pulses by diffraction gratings

Abstract

An integrated magnetic suspension coarse and fine moving mask table driven by a planar motor comprises an integrated coarse and fine moving mask table movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system. The vibration isolation system (500) is located between the balance mass (200) and the base (001), and the mask plate (101) is mounted on the integrated coarse and fine moving mask table movable platform (100). The drive motor of the mask table movable platform (100) is a moving-iron type planar motor (300), a rotor (301) of the planar motor is a permanent magnet array mounted on a top surface of the integrated coarse and fine moving mask table movable platform (100), and a stator (302) of the planar motor is a coil array mounted on the balance mass (200). The integrated magnetic suspension coarse and fine moving mask table driven by the planar motor can lower the design complexity of the drive motor of the mask table movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the integrated coarse and fine moving mask table movable platform is more compact, the inherent frequency and the control bandwidth of the integrated coarse and fine moving mask table movable platform are improved, and thus control precision is improved.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

An integrated coarse and fine moving mask table driven by a planar motor. The integrated coarse and fine moving mask table comprises an integrated coarse and fine moving mask table movable platform (100), a balance mass (200), a drive motor, mask plates (101, 102), a base (001), a vibration isolation system (500), and a measuring system. The vibration isolation system (500) is located between the balance mass (200) and the base (001), and the mask plates (101, 102) are mounted on the integrated coarse and fine moving mask table movable platform (100). The drive motor of the mask table movable platform (100) is a moving-iron type planar motor (300), a rotor (301) of the planar motor is a permanent magnet array mounted on a top surface of the integrated coarse and fine moving mask table movable platform (100), and a stator (302) of the planar motor is a coil array mounted on the balance mass (200). The integrated coarse and fine moving mask table driven by the planar motor can lower the design complexity of the drive motor of the mask table movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the integrated coarse and fine moving mask table movable platform is more compact, the inherent frequency and the control bandwidth of the integrated coarse and fine moving mask table movable platform are improved, and thus control precision is improved.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor