Abstract

The invention relates to a method for producing a laminating component or a hologram component. A holographic material, such as a holographic film, is connected either to a laminating agent in order to form a laminating component or to a transparent reinforcing material in order to form a hologram component In order to produce a composite glass, the laminating component or the hologram component can then be laminated between two glass panes, which can be curved in particular. By virtue of the laminating agent of the laminating component or the reinforcing material of the hologram component, damage to the hologram imprinted in the holographic material can be prevented or reduced.

IPC Classes  ?

• B32B 17/10 - Layered products essentially comprising sheet glass, or fibres of glass, slag or the like comprising glass as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
• B32B 1/00 - Layered products having a non-planar shape
• B32B 7/12 - Interconnection of layers using interposed adhesives or interposed materials with bonding properties
• B32B 38/00 - Ancillary operations in connection with laminating processes
• G03H 1/02 - Holographic processes or apparatus using light, infrared, or ultraviolet waves for obtaining holograms or for obtaining an image from themDetails peculiar thereto Details

Abstract

A holding device holds an optical component having an optical surface with a polygonal border and having a cylindrical substrate body with a cylinder lateral wall with a polygonal cross section corresponding to the border of the optical surface. The holding device has a holding frame. At least two bearing bodies of the holding device make bearing contact with the lateral wall of the substrate body by way of bearing portions of the lateral wall. At least one pressing body of the holding device exerts a bearing pressure that presses the substrate body against the bearing body. The holding device can securely hold optical components having an optical surface with a polygonal border and having a cylindrical substrate body and moreover enables positionally accurate mounting.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• B25J 15/00 - Gripping heads
• G02B 7/00 - Mountings, adjusting means, or light-tight connections, for optical elements

Abstract

The techniques disclosed herein relate to an arrangement, a method and a computer program product for system-integrated calibration of the facet mirrors of a microlithographic illumination system. Calibration beam paths leading via the facet mirrors between a calibration radiation source and a calibration radiation sensor are defined, only one pivotable micromirror of the single facet mirror constructed from micromirrors being involved in each of said calibration beam paths. By pivoting the micromirror involved in a defined calibration beam path, a specific optimum pivot position, whose underlying orientation of the micromirror can also be calculated geometrically, can be found on the basis of the calibration radiation sensor. By comparing the calculated orientation with the orientation determined by an orientation sensor at the micromirror, the orientation sensor of the micromirror of the facet mirror can be calibrated.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

An optical system for a metrology system serves to measure an object. An optical focusing component is arranged in the beam path of illumination light between a light source and an object field and serves to create an illumination focus. A detection device serves to capture the illumination light in the beam path downstream of the object field. The optical focusing component is embodied as a zone plate with at least two zones. Portions of the illumination light that are incident on the zones interact with each other by diffraction. Depending on the embodiment of the zone plate, the zones of the zone plate are arranged in such a way that the zone plate is chromatically corrected for the illumination light, the zone plate is aspherically corrected for the illumination light, the zones of the zone plate have a reflective embodiment for the illumination light, and/or the zones of the zone plate are arranged in such a way that at least one order of diffraction of the illumination light is preferred as predetermined order of diffraction in comparison with at least one further order of diffraction as regards the used illumination light intensity guided by the zone plate. This results in an optical system in which the zone plate design options for the optical focusing component are optimized in order to improve application options for the metrology system.

IPC Classes  ?

• G02B 21/00 - Microscopes
• G02B 21/26 - StagesAdjusting means therefor

Abstract

A computer implemented method for defect recognition in an imaging dataset of a wafer in a charged particle beam system comprising an embedded system, the method comprising: i) obtaining an imaging dataset of a wafer; ii) obtaining model data for a model architecture of a machine learning model for defect recognition in the imaging dataset of the wafer, the model architecture being implemented in the embedded system; iii) transferring the model data to a programmable memory of the embedded system; and iv) applying the machine learning model to an imaging dataset of a wafer to recognize defects, comprising executing the embedded system implemented model architecture with the transferred model data.

IPC Classes  ?

• G06T 7/00 - Image analysis

Abstract

A radiation source unit (10) for carrying out an optical measurement has a radiation source (12), an optical conductor (13) for guiding radiation generated by the radiation source (12), and a substrate (16). The optical conductor (13) is designed to conduct a propagating mode. The radiation source unit (10) has a reference measuring device (14, 15) for carrying out a reference measurement, by means of which a change in a spectral characteristic of the radiation source (12) can be detected. The reference measuring device (14, 15) has a wavelength reference (14) which is arranged along at least one part of the optical conductor (13) in such a way that an evanescent field of the propagating mode enters the wavelength reference (14).

IPC Classes  ?

• G01J 3/02 - SpectrometrySpectrophotometryMonochromatorsMeasuring colours Details
• G01J 3/10 - Arrangements of light sources specially adapted for spectrometry or colorimetry
• G01J 9/02 - Measuring optical phase differenceDetermining degree of coherenceMeasuring optical wavelength by interferometric methods
• G02B 6/12 - Light guidesStructural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
• G02B 6/293 - Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means

Abstract

A masking device (100) for masking a spectacle lens product (102) in a coating device (118) is provided. The masking device (100) includes a holder element (104) for holding the spectacle lens product (102) relative to a carrier (106) of the coating device (118). The masking device (100) also includes a supporting frame (108) being mountable or mounted on the carrier (106) of the coating device (118), where the supporting frame (108) is rotatable about a rotational axis (114) when mounted at the carrier (106) and where the supporting frame (108) at least partially surrounds the holder element (104) when mounted at the carrier (106). The masking device (100) also includes a masking stencil (110) mounted at the supporting frame (108) such that the masking stencil (110) is movable from a masking position (112) to a hiding position (116) and vice versa by rotating the supporting frame (108) around the rotational axis (114).

IPC Classes  ?

• C23C 14/04 - Coating on selected surface areas, e.g. using masks
• B29D 11/00 - Producing optical elements, e.g. lenses or prisms
• C23C 14/50 - Substrate holders

Abstract

The present invention relates to a method being configured for calculating, by a computer, data of a spectacle lens for the purpose of a use of the data for a manufacture of the spectacle lens, the method comprising the step of generating data of a randomly modulated surface for said spectacle lens and the method being characterized in that said data of said randomly modulated surface resulting from an application of a continuous random surface modulation function or a scaled continuous random surface modulation function to a predefined surface for said spectacle lens.

IPC Classes  ?

• G02C 7/02 - LensesLens systems

Abstract

The present invention refers to a method for manufacturing a spectacle lens, the method comprising the step of curing a structured coating material on a surface of a spectacle lens, said structured coating material resulting in a structured coating on said surface of said spectacle lens, a structure of said structured coating providing a reduced light reflection to said spectacle lens, said structured coating material being a coating material, said coating material resulting in a coating providing an enhanced hydrophobicity to said spectacle lens, irrespective of said structure of said structured coating, the method being characterized in that said coating material resulting in said coating provides an enhanced abrasion resistance to said spectacle lens, irrespective of said structure of said structured coating.

IPC Classes  ?

• B29D 11/00 - Producing optical elements, e.g. lenses or prisms
• G02B 1/14 - Protective coatings, e.g. hard coatings
• G02B 1/18 - Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
• G02B 1/118 - Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures

Abstract

The invention relates to a method for replicating a hologram into a light-sensitive composite web, comprising the following steps: Providing a master element comprising a substrate part and at least one master hologram; optionally providing an incoupling element; providing an adhesive composite web comprising a light-sensitive composite web and an optical adhesive film; applying the adhesive composite web to a surface of the master element or a surface of the optional incoupling element; exposing the master element in order to replicate the at least one master hologram into the light-sensitive composite web, the optical adhesive film establishing optical contact between the light-sensitive composite web and the master element, or between the light-sensitive composite web and an incoupling element, wherein an incoupling element is optionally used for the exposure; and detaching the adhesive composite web from the master element or the incoupling element.

IPC Classes  ?

• G03H 1/02 - Holographic processes or apparatus using light, infrared, or ultraviolet waves for obtaining holograms or for obtaining an image from themDetails peculiar thereto Details
• B32B 7/12 - Interconnection of layers using interposed adhesives or interposed materials with bonding properties
• G03H 1/20 - Copying holograms by holographic means
• B32B 7/06 - Interconnection of layers permitting easy separation

Abstract

The invention relates to a method for protecting an adhesive layer (20) on an optical component (11), in particular on an optical component (11) for wavefront deformation, from stray radiation (22), in particular from stray radiation (22) in the UV wavelength range. The method involves protecting the adhesive layer (20) from the stray radiation (22) by introducing internal engraving (23) into a material of the optical component (11) and/or protecting the adhesive layer (20) from the stray radiation (22) by applying at least one protective layer (24) onto at least one surface (19a) of the optical component (11) not covered by the adhesive layer (20). The invention also relates to an optical component (11) and a semiconductor technology installation.

IPC Classes  ?

• G02B 1/14 - Protective coatings, e.g. hard coatings
• G02B 5/02 - Diffusing elementsAfocal elements
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A magnifying imaging optical unit is part of a metrology system for examining objects. The magnifying imaging optical unit has at most four mirrors which image an object field in an object plane into an image field in an image plane. According to one aspect, an entrance pupil of the magnifying imaging optical unit has a boundary shape which deviates from an ellipse and the aspect ratio of which is not equal to 1. In accordance with a further aspect, reflection surfaces of small-area mirrors which are used for guiding imaging light along an imaging beam path deviate from a spherical shape by at most 10 μm. This results in a magnifying imaging optical unit in which an imaging result which satisfies the stringent requirements of a metrology system results for a given manufacturing outlay.

IPC Classes  ?

• G02B 21/04 - Objectives involving mirrors
• G02B 21/00 - Microscopes

Abstract

A bipod for adjusting an optical element of an optical system for a projection exposure apparatus, having a mechanism which is couplable to the optical element to adjust the optical element, a base portion, a first tower portion extending out of the base portion, and a second tower portion different from the first tower portion and extending out of the base portion. The mechanism is between the first and second tower portions. The first and second tower portions are connected to each other facing away from the base portion to increase the stiffness of the bipod.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A method for checking a lithography mask for a repair of the lithography mask, the lithography mask having a plurality of edges between partial regions of the lithography mask and the object of the repair lying in an adjustment of a profile of a selected edge in a repair portion of the selected edge, comprises: a) capturing an image representation of a repair region of the lithography mask comprising the repair portion of the selected edge, b) determining the profile of the selected edge in the repair portion on the basis of the captured image representation of the repair region, b1) determining a reference profile on the basis of a profile of an edge corresponding to the selected edge, the corresponding edge being an edge which should not be repaired or a portion of the selected edge which should not be repaired, the corresponding edge being determined on the basis of the captured image representation of the repair region, and c) comparing the determined profile of the selected edge with a reference profile.

IPC Classes  ?

• G03F 1/72 - Repair or correction of mask defects
• G03F 1/22 - Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masksPreparation thereof
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

An assembly of an optical system, comprising at least one mirror with a mirror main body, in which there is a fluid channel arrangement with at least one fluid channel through which a fluid can flow. The fluid channel arrangement is coupled to a fluid line system via a detachable flange connection. The flange connection comprises a flange interface formed on the mirror main body and a flange force-lockingly mounted on the flange interface. A seal is formed between the flange and the flange interface in order to provide a differential vacuum.

IPC Classes  ?

• G02B 7/18 - Mountings, adjusting means, or light-tight connections, for optical elements for prismsMountings, adjusting means, or light-tight connections, for optical elements for mirrors
• G02B 7/182 - Mountings, adjusting means, or light-tight connections, for optical elements for prismsMountings, adjusting means, or light-tight connections, for optical elements for mirrors for mirrors
• G02B 17/00 - Systems with reflecting surfaces, with or without refracting elements
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

An apparatus for stress-reduced mounting of MEMS-based micromirrors on a metallic support structure comprises a plate extending in a main plane of extent and a plurality of compensation elements which are connected to the plate and have connecting elements which extend across the main plane of extent and a plurality of base elements. A respective group with a plurality of connecting elements is connected to a common base element. The apparatus is produced using MEMS technology.

IPC Classes  ?

• B81B 7/00 - Microstructural systems
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The invention relates to a device (50) for sampling for determining a corrosion state of a module (30) for semiconductor lithography, which is characterised in that the device (50) comprises a rinsing device (64) and a sample collector (56). The invention also relates to an arrangement having a device (50) for sampling a module (30) for semiconductor technology and a module (30) for semiconductor lithography, wherein the module (30) comprises a fluid channel (40) and a releasable connection element (32) for connecting a fluid line to the fluid channel (40) and wherein an interface (42) is formed between the connection element (32) and the module (30). The arrangement is characterised in that the device (50) for sampling has a rinsing device (64), wherein a sample collector (56) of the device (50), arranged downstream of the rinsing device (64) in the introduction direction, is at least partially, optionally completely, introduced into the fluid channel (40). The invention also relates to a method for determining a corrosion state of an interface (42) between a module (30) of a projection exposure system (1,101) and a connection element (32) releasably connected to the module (30), said method comprising the following steps: - sampling the interface (42), - analysing the sample (70.1) taken, - determining the state of the interface (42) based on the analysis.

IPC Classes  ?

• G01N 1/02 - Devices for withdrawing samples

Abstract

A method and a manufacturing installation for producing a plurality of workpieces comprises a manufacturing machine (12) having a moveable machine element (16), a machine controller (14) to control the moveable machine element (16) on the basis of a control program, and a metrology device (24) for recording a plurality of measurement values on a produced workpiece to determine workpiece characteristics. The control program comprises a plurality of control commands and a plurality of numerical control parameters determining a kinematic behavior of the moveable machine element (16). A plurality of workpieces are produced in a plurality of individual production runs (58). Individual control parameters are deliberately varied (46) from one individual production run (58) to another in order to establish a data set (54) representing characteristic machine behavior.

IPC Classes  ?

• G05B 19/404 - Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia

Abstract

The invention relates to a method for smoothing a surface (2) of a substrate (1) made of brittle hard material, in particular glass or glass-ceramic, comprising: smoothing the surface (2) using a brush tool (3), wherein the smoothing is carried out on an optical surface (2) of the substrate (1) until the optical surface (2) can be interferometrically measured. The brush tool (3) can have diamond-carrying filaments (4) which are preferably formed from an elastic material.

IPC Classes  ?

• B24B 7/22 - Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfacesAccessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
• B24B 7/24 - Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfacesAccessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
• B24B 13/015 - Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other workAccessories therefor of televison picture tube viewing panels, headlight reflectors or the like
• B24B 29/00 - Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
• B24D 13/10 - Wheels having flexibly-acting working parts, e.g. buffing wheelsMountings therefor acting by their periphery comprising assemblies of brushes
• B24D 13/14 - Wheels having flexibly-acting working parts, e.g. buffing wheelsMountings therefor acting by the front face

Abstract

The invention relates to a laser light source, in particular for use in a microlithography projection exposure system. A laser light source has a laser module (105, 305) for generating a plurality of light pulses and an optical pulse stretcher (110, 310) for stretching the pulse length of the light pulses generated by the laser module (105, 305), wherein the optical pulse stretcher (110, 310) has a plurality of mirrors (111, 112, 113, 114, 200, 250, 311, 312, 313, 314), each of which comprises a mirror substrate (210, 250) and a reflective layer system (220, 270), and at least one of the mirrors (250) has an intermediate layer (265) between the mirror substrate (260) and the reflective layer system (270), said intermediate layer forming a diffusion barrier in order to prevent components of the reflective layer system (270) from being diffused to the mirror substrate (260).

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range

Abstract

A method of operating an optical component having a mirror element, a substrate for carrying the mirror element, an actuator device for tilting the mirror element about one or two tilt axes, and a sensor device having a sensor electrode structure for detecting a tilt angle of the mirror element based on changes in capacitance. The sensor electrode structure in this case comprises a plurality of active sensor electrodes and a plurality of passive sensor electrodes. According to the disclosure, the passive sensor electrodes are subjected to different voltages during operation of the optical component.

IPC Classes  ?

• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A method adjusts an illumination beam path within an illumination optics having a first facet mirror with a plurality of mirror facets being tiltable via respective actuators and further having a second facet mirror with a plurality of micro mirrors, each being equipped with a thermal load sensor. The micro mirrors are groupable in micro mirror groups, each of these being attributed to one of the plurality of mirror facets.

IPC Classes  ?

• G02B 26/12 - Scanning systems using multifaceted mirrors
• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light

Abstract

The present invention relates to a method for producing a cooling element (11) for an optical arrangement, in particular for an optical arrangement for microlithography, in which a heat sink (12) having at least one cooling channel (16) having at least one inlet and at least one outlet (14) for a cooling medium that can flow through the at least one cooling channel (16) is formed preferably by joining, in particular soldering and/or welding, and/or by an additive manufacturing method with layer-by-layer deposition of material, wherein each deposited layer is formed according to an associated cross-section of the heat sink (12) and wherein after the heat sink (12) has been formed, a corrosion-resistant coating is produced in the at least one cooling channel (16) by atomic layer deposition. The invention also relates to a corresponding cooling element (11) and to an optical arrangement comprising a corresponding cooling element (11), and to the operation thereof.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• F28D 1/03 - Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with the heat-exchange conduits immersed in the body of fluid with plate-like or laminated conduits
• F28D 21/00 - Heat-exchange apparatus not covered by any of the groups

Abstract

The invention relates to a method for placing and securing at least one MMA array (10) and/or at least one sub-group (80) thereof on a support layer (18), having the following steps: a) positioning the at least one MMA array (10) or the at least one sub-group (80) thereof on a grid structure (46) of a handling device (40, 42); b) aligning the at least one MMA array (10) or the at least one sub-group (80) thereof positioned in step a) by means of a joining aid (54) which can be retracted into the handling device (40, 42); c) lifting the handling device (40, 42) and lifting up the at least one MMA array (10) and/or the at least one sub-group (80) thereof aligned in step b) from the joining aid (54); d) depositing the at least one MMA array (10) and/or the at least one sub-group (80) thereof onto a support surface (19) provided with an adhesive layer (78); and e) detaching and laterally removing the grid structure (46) made of cutouts (58) and/or gaps (64) below the at least one MMA array (10) or the at least one sub-group (80) thereof.

IPC Classes  ?

• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
• H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
• H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
• B81B 7/04 - Networks or arrays of similar microstructural devices
• B81B 7/00 - Microstructural systems

Abstract

A wavefront manipulator includes a holographic assembly which has at least two holographic elements, which are arranged directly behind one another in the beam path, at least in sections, and are designed to be reflective for at least one fixed wavelength and a fixed irradiation angle range. A first holographic element includes at least one hologram which is assigned to a hologram of a second holographic element for reflection purposes. The wavefront manipulator is designed for at least one fixed object plane to generate an image plane of a virtual image which is tilted about a fixed tilt angle θ with respect to a plane arranged perpendicular to the optical axis in the region of the image plane of a virtual image. The holographic arrangement is designed for at least partial correction of at least one imaging error of a virtual image generated in the tilted image plane.

IPC Classes  ?

• G02B 27/01 - Head-up displays

Abstract

A transparent display, comprising a holographic diffuser extending substantially in a two-dimensional diffuser plane, and comprising an enlarging reflective element, wherein the holographic diffuser and the reflective element are part of a one-piece optical unit, and wherein image rays, reflected by the reflective element, are guided inside the optical unit to the holographic diffuser.

IPC Classes  ?

• G02B 27/01 - Head-up displays

Abstract

An individual mirror of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus is mounted so as to be pivotable about two pivot axes. A ratio of the pivotability of the individual mirror about the two pivot axes is at least 2:1.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G01D 5/14 - Mechanical means for transferring the output of a sensing memberMeans for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for convertingTransducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
• G02B 26/12 - Scanning systems using multifaceted mirrors

Abstract

An illumination system for a lithography system, such as a projection exposure apparatus, for illuminating a reticle of the lithography system with a used radiation from a radiation source apparatus, comprises an optics device having at least one optical element and at least one mixing device. An interface device is provided for input coupling a plurality of individual radiations, which form the used radiation, into the mixing device. A source étendue of the radiation source apparatus fills at least 50 percent, such as at least 80 percent, of an optics étendue of the optics device and/or mixing device.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G02B 3/00 - Simple or compound lenses
• G02B 19/00 - Condensers

Abstract

Microelectromechanical device with a carrier substrate having a substrate surface (100a), and plural MEMS modules (120. Each module includes an ASIC layer (140) having a front side (140a) and a rear side (140b). A baseplate (160) has a front side (160a) and a rear side (160b), a plurality of microelectromechanical components (130) have rear sides (130b). The baseplate rear side is cohesively connected to the ASIC layer front side with electrical contacts (144). The components are arranged on the baseplate front side with their component rear sides. The contacts are partly encompassed by a frame (195) arranged between baseplate and ASIC layer. The ASIC layer has an ASIC controlling the components. The ASIC is electrically connected to the components using a portion of the contacts. The modules are arranged on the substrate surface and the ASIC layer rear sides of the modules are connected to the substrate surface.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• B81C 99/00 - Subject matter not provided for in other groups of this subclass
• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light

Abstract

The invention relates to a method for crosstalk modelling in a multi-mirror array (31) having movable individual mirrors (32), the method comprising the following steps: providing a multi-mirror array (32), having N movable individual mirrors (32) and a control device (35) for positioning the individual mirrors (32); predefining an activation pattern (34) for positioning at least some of the individual mirrors (32*); positioning the individual mirrors (32*) by activating same by means of the activation pattern (34); detecting the actual positions of the individual mirrors (32*) actually resulting from the activation by the activation pattern (34); determining a coefficient matrix having coefficients for quantifying a crosstalk behaviour; adjusting the control device (35); wherein the activation pattern acts as a predictor of a training data set (33) for a neural network for predicting a relationship between an activation pattern (34) and the actual positions, resulting therefrom, of the individual mirrors (32); and wherein the coefficients of the determined coefficient matrix act as targets of the training data set.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The invention relates to devices comprising a holographic material and a holographic marking (13) provided in the holographic material. The holographic marking (13) here is only sensitive to light at a predefined wavelength and/or to light from a predefined direction, and/or is configured to diffract light only in a further predefined direction. The device can further contain a main hologram (12). The invention additionally relates to corresponding master plates for producing such devices, methods and production devices.

IPC Classes  ?

• G03H 1/02 - Holographic processes or apparatus using light, infrared, or ultraviolet waves for obtaining holograms or for obtaining an image from themDetails peculiar thereto Details
• G03H 1/20 - Copying holograms by holographic means
• G03H 1/22 - Processes or apparatus for obtaining an optical image from holograms
• G03H 1/30 - Processes or apparatus specially adapted to produce multiple holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
• G03H 1/00 - Holographic processes or apparatus using light, infrared, or ultraviolet waves for obtaining holograms or for obtaining an image from themDetails peculiar thereto
• G03H 1/04 - Processes or apparatus for producing holograms

Abstract

An intermediate product for producing an optical element for a projection exposure apparatus (1) has a substrate (20) for specifying a basic topography of an optical surface, wherein a plurality of etchable layers including a layer (22i) to be structured and a contrast layer (23i) are applied to the substrate (20), wherein the layer (22i) to be structured and the contrast layer (23i) have different chemical properties such that a removal of the contrast layer (23i) can be detected in situ.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

1212222i2111) of the first optical component (110).

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image

Abstract

A measuring apparatus (10) for measuring a telecentricity (68) of an optical imaging system (12) comprises: an illuminating device (22) which is configured to radiate measurement radiation (32) onto an object plane (14) of the optical imaging system; an intensity detector (28) which has a plurality of non-overlapping detection portions, is offset to an image plane (16) of the optical imaging system and is configured to sense, for at least two field points (18-1, 18-2) in the image plane, angle-resolved intensity distributions (50) present at the field points by means of a particular one of the detection portions (42-1, 42-2) of the intensity detector; a movement device (30) which is configured to set different measurement positions (54) by changing a position of the intensity detector relative to the optical imaging system in at least one rigid-body degree of freedom such that the intensity distribution (50-2) of at least one of the field points can be sensed before and after the change in relative position by means of two different non-overlapping detection portions (42-2, 42-1) of the intensity detector; and an evaluation device (48) which is configured to determine the telecentricity (68) of the optical imaging system at each of the at least two field points on the basis of angle-resolved intensity distributions (50-1, 50-2) recorded at the different measurement positions (54).

IPC Classes  ?

• G01M 11/02 - Testing optical properties
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The present invention relates to an apparatus (110) and a method (210) configured determining a choroidal topography (218) over a region (114, 114') on a retina (116) of an eye (117) of a person as well as to a use of the apparatus (110) for determining an effect of at least one ophthalmic lens design on the choroidal topography (218). Herein, the apparatus (110) comprises: - at least two individual displays (122, 122') each configured for providing a retinal stimulus (112, 112'), thereby providing two independent retinal stimuli (112, 112'); - at least two optical transfer elements, comprising a first optical transfer element and a second optical transfer element, each configured for projecting at least one of the retinal stimulus (112, 112') or a phase map to a region on a retina of an eye of a person, wherein the phase map comprises a modified retinal stimulus; - a measuring device (142) for capturing a choroidal topography (218) over the region (114, 114') on the retina (116) of the eye (117) of the person by using reflected light received from the region (114, 114') on the retina (116) of the eye (117) of the person; - an optical filter (152) configured for separating the reflected light received from the region (114, 114') on the retina (116) of the eye (117) of the person from the phase map projected to the region (114, 114') on the retina of the eye of the person, wherein the second optical transfer element is further configured for simultaneously projecting each of the at least two individual phase maps at a different retinal eccentricity to each of at least two separate regions (134, 134') on the retina (116) of the eye (117) of the person, wherein the separate regions (134, 134') comprise a peripheral region and a foveal region on the retina (116) of the eye (117) of the person.

IPC Classes  ?

• A61B 3/10 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions
• A61B 3/103 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions for determining refraction, e.g. refractometers, skiascopes

Abstract

The invention relates to a computer implemented method for generating an aerial image of a photolithography mask in an image space, the method comprising: obtaining a representation of a design of the photolithography mask; applying a trained conditional diffusion model that is configured to sequentially revert a stochastic process to an initial sample in order to generate an aerial image of the photolithography mask, wherein the trained conditional diffusion model is conditioned on the representation of the design of the photolithography mask. The invention also relates to computer implemented methods for defect localization, alignment, repair shape generation, training data generation and corresponding systems.

IPC Classes  ?

• G06T 7/00 - Image analysis
• G06T 7/30 - Determination of transform parameters for the alignment of images, i.e. image registration
• G06T 11/00 - 2D [Two Dimensional] image generation

Abstract

A method for producing workpieces using a manufacturing installation includes obtaining a data set defining desired workpiece characteristics of workpieces. The method includes producing a first workpiece in first successive manufacturing steps using a first manufacturing machine. The method includes repeatedly recording first process parameters during the first successive manufacturing steps. The method includes mapping the first process parameter sequences onto the first successive manufacturing steps to obtain first sequential mapping data. The method includes inspecting the first workpiece using a metrology device to obtain actual first workpiece characteristics. The method includes comparing the actual first workpiece characteristics with the desired workpiece characteristics to determine deviations. The method includes determining second control commands based on the deviations, at least one of the first control commands and the data set, and the first sequential mapping data. The method includes producing a second workpiece using the second control commands.

IPC Classes  ?

• B23P 19/04 - Machines for simply fitting together or separating metal parts or objects, or metal and non-metal parts, whether or not involving some deformationTools or devices therefor so far as not provided for in other classes for assembling or disassembling parts
• G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]

Abstract

The invention relates to a method for connecting a holding element (1) to an, in particular rotationally symmetric, optical element (2) by means of a connecting material (3), comprising the steps of: arranging the connecting material (3) between the holding element (1) and the optical element (2); and curing the connecting material (3), wherein, for the purpose of curing, the connecting material (3) is irradiated with radiation (4) for curing the connecting material (3). The problem of providing a method by means of which a holding element can be connected to an optical element in a safe process, which method allows flexible optical designs and is cost effective, is solved in that the radiation (4) for curing the connecting material (3) is coupled into the connecting material (3) by means of a deflection device (5) for deflecting the radiation (4), wherein the radiation (4) initially impinges on a deflection element (5a) of the deflection device (5) before the radiation (4) enters the optical element (2), wherein the radiation (4) is deflected by means of the deflection element (5a) transversely through the optical element (2), in particular towards the connecting material (3) or a further deflection element (5b).

IPC Classes  ?

• G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses
• B29C 65/14 - Joining of preformed partsApparatus therefor by heating, with or without pressure using wave energy or particle radiation
• B29C 65/48 - Joining of preformed partsApparatus therefor using adhesives
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The lighting device comprises an optical block having a coupling portion with a coupling face which is arranged to couple light into the optical block and a waveguide portion extending away from the coupling portion and designed to guide the light by multiple reflection between an upper face and a lower face of the waveguide portion. The optical block also comprises a holographical optical element that is formed in the waveguide portion and is designed to reconstruct a hologram by means of the light.

IPC Classes  ?

• F21S 43/20 - Signalling devices specially adapted for vehicle exteriors, e.g. brake lamps, direction indicator lights or reversing lights characterised by refractors, transparent cover plates, light guides or filters
• B60Q 1/32 - Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor the devices being primarily intended to indicate the vehicle, or parts thereof, or to give signals, to other traffic for indicating vehicle sides
• F21S 43/14 - Light emitting diodes [LED]
• F21S 43/235 - Light guides
• F21S 43/31 - Optical layout thereof
• F21S 43/40 - Signalling devices specially adapted for vehicle exteriors, e.g. brake lamps, direction indicator lights or reversing lights characterised by the combination of reflectors and refractors

Abstract

An actuator device for a tiltable micro-optical element comprises a plurality of stacked comb drives.

IPC Classes  ?

• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light

Abstract

The invention relates to a method for manufacturing an EUV mirror component (M1-M6, 40), in which method a multilayer coating system (31) is applied to a surface of a mirror body substrate (30, 37) in order to form an optical surface that is highly reflective for EUV radiation. A temporary protective layer structure (36) is created on the multilayer coating system (31). The protective layer structure (36) comprises a protective layer (35) and a sacrificial layer (34) located between the protective layer (35) and the multilayer coating system (31). The sacrificial layer (34) is a layer produced by oxidising a layer of the multilayer coating system (31). The temporary protective layer structure (36) is removed before the EUV mirror component is put into operation. The invention also relates to an intermediate product of an EUV mirror component.

IPC Classes  ?

• G21K 1/06 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction, or reflection, e.g. monochromators

Abstract

The present invention relates to a system for replicating an object in holography, comprising: means for irradiating the object with a beam at a set angle of incidence; means for adapting an extent of the beam before the beam is incident on the object, based at least in part on the set angle of incidence. Furthermore, the invention relates to a corresponding device and method and a corresponding computer program.

IPC Classes  ?

• G03H 1/20 - Copying holograms by holographic means
• G02B 27/09 - Beam shaping, e.g. changing the cross-sectioned area, not otherwise provided for
• G03H 1/26 - Processes or apparatus specially adapted to produce multiple holograms or to obtain images from them, e.g. multicolour technique
• G02B 5/10 - Mirrors with curved faces
• G02B 26/12 - Scanning systems using multifaceted mirrors
• G02B 23/06 - Telescopes, e.g. binocularsPeriscopesInstruments for viewing the inside of hollow bodiesViewfindersOptical aiming or sighting devices involving prisms or mirrors having a focusing action, e.g. parabolic mirror
• G02B 17/06 - Catoptric systems, e.g. image erecting and reversing system using mirrors only

Abstract

A waveguide for displaying an image includes a transparent base body having a coupling-in region and a coupling-out region which is spaced apart therefrom in a first direction. The coupling-out region has an image hologram having an imprinted image. The coupling-in region deflects at least some of the radiation originating from a light source such that the deflected part propagates as a coupled-in beam bundle in the base body by reflection as far as the coupling-out region and impinges on the image hologram. The image hologram deflects at least part of the impinging beam bundle in order to reconstruct the imprinted image such that the deflected part exits the base body via the front face or rear face such that the imprinted image is perceptible for a viewer.

IPC Classes  ?

• F21V 8/00 - Use of light guides, e.g. fibre optic devices, in lighting devices or systems
• B60Q 3/62 - Arrangement of lighting devices for vehicle interiorsLighting devices specially adapted for vehicle interiors characterised by optical aspects using light guides
• G03H 1/26 - Processes or apparatus specially adapted to produce multiple holograms or to obtain images from them, e.g. multicolour technique

Abstract

A method of characterizing a fault in a scanning electron microscope, wherein the scanning electron microscope is suitable for analysing and/or processing a sample, especially a lithography mask, with the aid of an electron beam, wherein the method has the following steps: a) putting the scanning electron microscope in an equilibrium state, b) introducing a trigger event into the scanning electron microscope that disrupts the equilibrium state, c) detecting a response behaviour of the scanning electron microscope (100) to the trigger event, and d) comparing the response behaviour detected with an expected response behaviour for characterization of the fault.

IPC Classes  ?

• H01J 37/244 - DetectorsAssociated components or circuits therefor
• H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams

Abstract

A drive device for driving at least one actuator for actuating an optical element of an optical system, wherein the drive device comprises an end stage configured to boost an input voltage using a quiescent current of the end stage to a drive voltage for the actuator. The drive device also comprises a supply device configured to adjust the quiescent current for the end stage depending on a specific dynamics request for the end stage.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light

Abstract

The invention relates to a holographic display system comprising a waveguide, an optical in-coupling element and an optical out-coupling element. The in-coupling element is designed to deflect light incident on the in-coupling element to the optical out-coupling element via the waveguide. Moreover, the out-coupling element is designed to interact with at least one controllable light source in such a way that, when the in-coupling element is illuminated with a controllable light signal from the at least one light source, an image is generated based at least in part on the light signal.

IPC Classes  ?

• G03H 1/26 - Processes or apparatus specially adapted to produce multiple holograms or to obtain images from them, e.g. multicolour technique
• G03H 1/30 - Processes or apparatus specially adapted to produce multiple holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
• G02B 5/32 - Holograms used as optical elements
• G02B 27/01 - Head-up displays
• G03H 1/02 - Holographic processes or apparatus using light, infrared, or ultraviolet waves for obtaining holograms or for obtaining an image from themDetails peculiar thereto Details
• G03H 1/04 - Processes or apparatus for producing holograms
• G03H 1/22 - Processes or apparatus for obtaining an optical image from holograms

Abstract

A method for adjusting at least one sensor (23) for a projection exposure apparatus (1) is presented and described, the method comprising the following steps: a) providing at least one primary sensor (23) and at least one optical module (21) for a projection exposure apparatus (1), at least one measurement reference (22) being arranged on the optical module (21), the primary sensor (23) being configured to detect a change in the position and/or the orientation of the optical module (21) and/or the measurement reference (22) and/or the primary sensor (23) being configured to detect the position and/or the orientation of the optical module (21) and/or the measurement reference (22), b) performing a measurement using the primary sensor (23), the optical module (21) being moved, in particular displaced, tilted and/or rotated, relative to the primary sensor (23) and/or the primary sensor (23) being moved, in particular displaced, tilted and/or rotated, relative to the optical module (21) during the measurement, c) performing a final adjustment of the primary sensor (23) using the measurement performed in step b), the primary sensor (23) being arranged in a final position and/or a final orientation. The described method is proposed in order to provide the best possible orientation of the primary sensor.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G02B 7/182 - Mountings, adjusting means, or light-tight connections, for optical elements for prismsMountings, adjusting means, or light-tight connections, for optical elements for mirrors for mirrors

Abstract

M9M10M9M10M10WM10W) between the last mirror (M10) in the beam path and the image field at the same time. In one embodiment of the imaging optical unit, the stop is fastened to a component of the imaging optical unit by way of a securing element which at least in portions extends along the beam path between the penultimate mirror and the last mirror. In a further embodiment of the imaging optical unit, the stop is part of an enveloping component of the imaging optical unit surrounding the beam path or is fastened to an enveloping component of the imaging optical unit surrounding the beam path or to a frame component of the imaging optical unit or to the penultimate mirror in the beam path or to the last mirror in the beam path. This results in each case in an imaging optical unit that is well defined with regard to its pupil and is optimized for projection lithography.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The invention relates to a method for producing an element (2, 2a), in particular an element (2, 2a) of a semiconductor technology system, very particularly an optical element (2) of a lithography system, in particular of a projection exposure system (100, 200), comprising a substrate (125) and a surface (4), in particular an optical surface, on the substrate (125), wherein at least one hollow structure region (5) for conducting a temperature-controlled fluid (128) is formed in the substrate (125). According to the invention, the hollow structure region (5) is generated by die-sinking EDM using an electrode (7) for producing sparks, the electrode (7) being advanced by means of an advancing device (8) along an at least partially curved path (9) so as to bore through the substrate (125) in order to produce the hollow structure region (5).

IPC Classes  ?

• G02B 7/18 - Mountings, adjusting means, or light-tight connections, for optical elements for prismsMountings, adjusting means, or light-tight connections, for optical elements for mirrors
• B23H 7/26 - Apparatus for moving or positioning electrode relatively to workpieceMounting of electrode
• B23H 9/14 - Making holes

Abstract

A computer implemented method for automatically designing a workflow for semiconductor inspection comprises: receiving input data to be processed by the workflow; receiving a natural language text describing at least a desired output of the workflow; using the natural language text as input to a trained workflow proposal machine learning model that generates one or more workflow proposals, each comprising a sequence of action items to generate the desired output when applied to the input data; prompting a user to confirm a workflow proposal; and applying the confirmed workflow proposal to the input data to perform a semiconductor inspection task. Corresponding computer programs, computer-readable media and systems are provided.

IPC Classes  ?

• G06Q 10/0633 - Workflow analysis
• G06N 20/00 - Machine learning

Abstract

A test system for a camera, comprising a camera and a first capture plate. The camera comprises a camera housing and a vacuum flange formed on the camera housing. The vacuum flange is adapted for attaching the camera to a vacuum chamber. The camera housing supports an image sensor. The image sensor comprises an image sensor surface layer. The first capture plate comprises a first capture plate surface layer. The first capture plate surface layer corresponds to the image sensor surface layer. The invention also relates to a mask inspection system and to a method for testing a camera, in particular, an EUV camera.

IPC Classes  ?

• H04N 17/00 - Diagnosis, testing or measuring for television systems or their details
• G03F 1/22 - Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masksPreparation thereof
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The disclosed techniques relate to a residual gas analyzer, in particular for analyzing a residual gas in an EUB projection exposure apparatus, including a mass spectrometer and an admission device for admitting ionized constituents of the residual gas from a vacuum environment into the mass spectrometer. The admission device includes an ion decelerator, with the ion decelerator having an adjustable deceleration voltage in order to subject the ionized constituents to selection with respect to kinetic energy before being transferred into the mass spectrometer. The disclosed techniques also relate to a projection exposure apparatus including such a residual gas analyzer, and a method for residual gas analysis.

IPC Classes  ?

• H01J 49/44 - Energy spectrometers, e.g. alpha-, beta-spectrometers
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01J 49/00 - Particle spectrometers or separator tubes
• H01J 49/04 - Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locksArrangements for external adjustment of electron- or ion-optical components
• H01J 49/40 - Time-of-flight spectrometers

Abstract

The present application relates to a method and a device for correcting at least one image error when scanning a charged particle beam of a scanning particle microscope over a sample, the method comprising the steps of: (a) dividing a scanned region of the charged particle beam into at least two partial regions, with each of the at least two partial regions containing at least one structure element; (b) determining a correction value for the at least one structure element with regards to a target position of the at least one structure element for each of the at least two partial regions; and (c) correcting a beam deflection of the charged particle beam for at least one of the at least two partial regions using the determined correction value.

IPC Classes  ?

• H01J 37/22 - Optical or photographic arrangements associated with the tube
• H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path

Abstract

A wavefront manipulator which comprises a holographic assembly and an optical element is provided. The optical element includes at least one surface, which is totally reflective for an ascertained range of incidence angles, for emitting light waves onto the holographic assembly. The holographic assembly includes at least one reflection hologram for reflecting light waves emitted onto the holographic assembly via the optical element. The optical element includes a coupling device for coupling light waves into the wavefront manipulator. The coupling device includes at least one prism.

IPC Classes  ?

• G02B 27/01 - Head-up displays
• G02B 5/04 - Prisms
• G02B 5/32 - Holograms used as optical elements
• G02B 6/34 - Optical coupling means utilising prism or grating

Abstract

The techniques disclosed herein relate to a lens element for a microlithographic projection exposure apparatus designed for operation in the DUV, and a method and an arrangement for forming an antireflection layer. In accordance with one aspect, in the case of a lens element according to the disclosed techniques, an antireflection layer is formed on a lens substrate, the antireflection layer comprising a first material of relatively lower refractive index and a second material of relatively higher refractive index, and a mixture ratio between the first material and the second material carrying in a lateral direction and/or in a vertical direction.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

This disclosure is directed to a residual gas analyser, in particularly, a residual gas analyser for analysing a residual gas in a microlithography projection exposure apparatus. The residual gas analyser includes a mass spectrometer and an admission device for admitting constituents of the residual gas from a vacuum environment into the mass spectrometer. The admission device includes a switchable ion source. The ion source in a first switching state allows ionized constituents of the residual gas to pass through. The ion source in a second switching state ionizes neutral constituents of the residual gas. The disclosed techniques also relate to a projection exposure apparatus including such a residual gas analyser and to a method of residual gas analysis.

IPC Classes  ?

• H01J 49/04 - Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locksArrangements for external adjustment of electron- or ion-optical components
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01J 49/06 - Electron- or ion-optical arrangements
• H01J 49/16 - Ion sourcesIon guns using surface ionisation, e.g. field-, thermionic- or photo-emission
• H01J 49/40 - Time-of-flight spectrometers

Abstract

A method for determining a measure of an image distortion of a charged particle beam imaging device comprises providing a plurality of images of a region of a sample using the charged ion beam device, and determining the measure of the image distortion based on displacements of corresponding objects between the plurality of images. A method of setting one or more parameters of a charged particle beam imaging device based on a measure of the image distortion as well as corresponding devices and systems is provided.

IPC Classes  ?

• H01J 37/26 - Electron or ion microscopesElectron- or ion-diffraction tubes
• H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams

Abstract

The invention relates to a lithography system, in particular an EUV lithography system, comprising: a temperature-control device that has at least one line for a liquid to flow through. The line comprises two line portions (31a, 31b) which are connected to one another by means of a coupling (33). The coupling (33) has two detachably connected coupling parts (33a, 33b), into each of which one line end (35a, 35b) of one of the two line portions (34a, 34b) opens. The coupling parts (33a, 33b) each have a ball valve (37a, 37b) for shutting off or opening the associated line end (35a, 35b), or the coupling parts (33a, 33b) together form a ball valve (37). The invention also relates to a method for leak testing the coupling (33).

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G02B 5/08 - Mirrors
• G02B 7/00 - Mountings, adjusting means, or light-tight connections, for optical elements
• F16L 29/00 - Joints with fluid cut-off means
• F16L 37/28 - Couplings of the quick-acting type with fluid cut-off means
• F16L 37/407 - Couplings of the quick-acting type with fluid cut-off means with fluid cut-off means in only one of two pipe-end fittings with a lift valve being opened automatically when the coupling is applied the lift valve being of the ball type

Abstract

The present invention relates to a system (110), a spectacle frame (112), a computer- implemented method, and a computer program for controlling a progression of myopia in at least one eye of a person, wherein the system comprises: - a spectacle frame (112) comprising a pair of spectacle lenses (114, 114') and at least one of the spectacle lenses (114, 114') incorporated by the spectacle frame (112), wherein the spectacle frame (114) or at least one of the spectacle lenses (114, 114') are configured for applying a treatment process during a period of time, wherein the treatment process is designed for reducing the progression of myopia in at least one eye of a person, wherein the treatment process is determined by at least one characteristic parameter, wherein the treatment process is selected from a class of treatment processes comprising: ∙ an optical treatment of the at least one eye of the person; ∙ a radiation treatment of the at least one eye of the person; ∙ a pharmaceutical treatment of the at least one eye of the person; and ∙ a behavioral treatment of the person, and - a processing device (116) configured for determining at least one result of the treatment process on the progression of the myopia in the at least one eye of the person, wherein the spectacle frame (112) or at least one of the spectacle lenses (114, 114') are configured for applying at least two treatment processes, each selected from a different class, simultaneously to the person during a first period of time (210).

IPC Classes  ?

• G02C 7/08 - Auxiliary lensesArrangements for varying focal length
• A61F 9/00 - Methods or devices for treatment of the eyesDevices for putting in contact-lensesDevices to correct squintingApparatus to guide the blindProtective devices for the eyes, carried on the body or in the hand
• G02C 7/10 - Filters, e.g. for facilitating adaptation of the eyes to the darkSunglasses
• G02C 11/04 - Illuminating means
• G02C 11/00 - Non-optical adjunctsAttachment thereof
• G02C 5/00 - Constructions of non-optical parts
• A61N 5/06 - Radiation therapy using light
• A61B 3/103 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions for determining refraction, e.g. refractometers, skiascopes
• A61F 9/02 - Goggles

Abstract

scsc (216) of the eye (112) of the person; - a meridian direction (220) of an astigmatism of the eye (112) of the person; - a distance (140) between the eye (112) of the person and at least one visual stimulus (118) displayed to the eye (112) of the person, wherein the at least one visual stimulus (118) is simultaneously aligned in the meridian direction (220) of the astigmatism and a direction perpendicular thereto; b) generating outcome data (222) configured to comprise - at least one refractive value (212) of the eye (112) of the person, wherein the at least one refractive value (212) of the eye (112) of the person is determined by evaluating the input data (214), wherein the distance (140) between the eye (112) of the person and the at least one visual stimulus (118) is determined from response of the person indicating that the at least one visual stimulus (118) has been perceived by the person to have an equivalent blur in the meridian direction (220) of the astigmatism and in the direction perpendicular thereto. The present invention provides a fast, easy, versatile, reliable and accurate approach for determining at least one refractive value (212) of an eye (112) of a person.

IPC Classes  ?

• G02C 7/02 - LensesLens systems

Abstract

An apparatus provides sensor data from at least one sensor of an optical system of a lithography apparatus. The apparatus comprises an analogue-to-digital converter and a digital filter device connected downstream of the analogue-to-digital converter. The analogue-to-digital converter is configured to convert an analogue signal sequence, which is provided via a number N of channels and includes a number N of analogue sensor signals from the number N of sensors of the optical system, into a digital signal sequence including N digital sensor signals. The analogue-to-digital converter and the digital filter device have the same frequency-synchronized system clock. The digital filter device is configured to filter the N digital sensor signals of the digital signal sequence in a channel-specific manner for providing and storing a respective filtered digital sensor signal for each of the N channels.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H03H 17/02 - Frequency-selective networks
• H03M 1/12 - Analogue/digital converters

Abstract

The invention relates to a heating head (26) for heating an optical element, comprising: a housing (30) and at least one heating unit (29), which is accommodated in the housing (30), for supplying a surface of the optical element with thermal radiation (28). The heating unit (29) has a thermal screen (43) for absorbing scattered radiation (44). The thermal screen (43) comprises at least one screen opening for the passage of thermal radiation (28). The invention also relates to a heating device comprising: at least one heating head (26) which is designed as described above, and at least one thermal radiation source for generating thermal radiation (28) for the at least one heating unit (29) of the heating head (26). The invention also relates to an optical system which includes an optical element and a heating head (26) for heating the optical element.

IPC Classes  ?

• G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses
• G02B 7/18 - Mountings, adjusting means, or light-tight connections, for optical elements for prismsMountings, adjusting means, or light-tight connections, for optical elements for mirrors
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The present invention refers to a method (218), a computer program, and an apparatus (110) for determining at least one refractive value (216) of an eye (112) of a person (114) and to a related method (210) for producing at least one ophthalmic lens (212) for the eye (112) of the person (114). The method (218) comprises the following steps: a) (220) displaying a visual stimulus (120) to an eye (112) of a person (114), wherein the visual stimulus (120) comprises a plurality of concentric radial lines (126, 126',...), wherein each radial line (126, 126',...) has a different angular value (128, 128',...) with respect to a center (130) of the visual stimulus (120); b) (224) recording a reaction by the person (114) to the visual stimulus (120); and c) (226) determining at least one refractive value (216) of the eye (112) of the person (114) by evaluating the reaction by the person (114) to the visual stimulus (120), wherein step a) (220) comprises that each radial line (126, 126',...) is projected at a particular defocus plane to the eye (112) of the person (114), whereby a particular dioptric power is provided to the eye (112) of the person (114), and wherein step b) (224) comprises that recording the reaction by the person (114) to the visual stimulus (120) indicates that a particular radial line (144) at a particular angular value (146) has an appearance of maximum sharpness (148) to the eye (112) of the person (114).

IPC Classes  ?

• A61B 3/032 - Devices for presenting test symbols or characters, e.g. test chart projectors
• A61B 3/036 - Subjective types, i.e. testing apparatus requiring the active assistance of the patient for testing visual acuitySubjective types, i.e. testing apparatus requiring the active assistance of the patient for determination of refraction, e.g. phoropters for testing astigmatism

Abstract

The present invention relates to a spectacle lens comprising a plurality of ring-shaped structures, each ring-shaped structure having a uniform width, one ring-shaped structure or more ring-shaped structures of said plurality of ring-shaped structures each having a varying power, the spectacle lens being characterized in that a variation of a surface mean power comprises one random component or more random components, said variation being along a ring-shaped path within said one ring-shaped structure or along a ring-shaped path within a same ring-shaped structure of each of said more ring- shaped structures.

IPC Classes  ?

• G02C 7/02 - LensesLens systems

Abstract

The invention relates to a method (100) for determining at least one manipulator degree of freedom for correcting at least one imaging error of at least one wavefront in a projection exposure apparatus. In order to obtain a fast and/or satisfactory correction of imaging errors, it is proposed that the at least one manipulator degree of freedom for adapting the position and/or orientation of at least one manipulable element of the projection exposure apparatus, as determined in step 3a), is provided should the at least one imaging error function be a function of third degree or less, and/or the at least one manipulator degree of freedom for deforming at least one manipulable element of the projection exposure apparatus, as determined in step 3a), is provided should the at least one imaging error function be a function of fourth degree or higher.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

Different examples relate to techniques in order to actively or passively stabilize the temperature of a holographic optical element. To this end, heat-conducting elements, e.g. silver nanowires or carbon nanotubes, are provided.

IPC Classes  ?

• G02B 7/00 - Mountings, adjusting means, or light-tight connections, for optical elements
• G02B 5/32 - Holograms used as optical elements

Abstract

The invention relates to a computer implemented method for defect detection comprising: obtaining an imaging dataset and a reference dataset of an object comprising integrated circuit patterns; and detecting defects in the imaging dataset using the imaging dataset and the reference dataset, wherein a machine learning model for defect highlighting is applied to the imaging dataset as input and generates a highlighted defect dataset as output, and wherein the machine learning model for defect highlighting comprises at least one attention mechanism. The invention also relates to computer programs, computer-readable media and corresponding systems.

IPC Classes  ?

• G01N 21/88 - Investigating the presence of flaws, defects or contamination
• G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
• G06T 7/00 - Image analysis
• H01L 21/66 - Testing or measuring during manufacture or treatment

Abstract

Disclosed is an optical inspection device for elements pertaining to semiconductor lithography, comprising an imaging device for generating an image of an element, said imaging device being arranged in a first partial volume, and a second partial volume comprising a holding device for receiving the element. A separating element is arranged between the two partial volumes. Included is a position measuring device comprising reference marks for emission of electromagnetic radiation used in the position measuring device and the reference marks are respectively connected to the imaging device and the holding device. The separating element comprises a partition wall having an opening. The opening serves for image recording by the imaging device and the electromagnetic radiation which emanates from the reference mark mounted on the imaging device and proceeds in the position measuring device passes through the opening.

IPC Classes  ?

• G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
• G03F 1/22 - Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masksPreparation thereof
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A device for setting an optical transmission comprises a first side, a second side and an optical component between the first and second sides. The optical component comprises a first optical element and an adjustment mechanism for moving at least the first optical element. The adjustment mechanism is designed to modify the transmission of the optical component by moving at least the first optical element between the first and second sides such that a light intensity on the second side can be set by the movement of the at least first optical element. The adjustment mechanism is designed to move at least the first optical element such that the optical transmission can be adapted with a switching time of less than 1 s, such as less than 1 ms, for example less than 1 μs. A system comprises such a device and light source that emits light in a beam path.

IPC Classes  ?

• H01S 3/106 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Abstract

iiiii), respectively. An inspection system results enabling an inspection of an object with fast image data acquisition.

IPC Classes  ?

• G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
• H01J 29/50 - Electron guns two or more guns being arranged in a single vacuum space, e.g. for plural-ray tubes
• H01J 35/06 - Cathodes

Abstract

A modular metrology apparatus comprises a vacuum chamber housing with an opening having a mechanical interface for sealed attachment of modular adapters. A sample stage inside the vacuum chamber positions a sample for processing. One or more charged-particle scanning systems scan particle beams across the sample. The mechanical interface enables integration of removable interchangeable modular adapters containing different configurations of process modules. The process modules are sealed within adapters and extend from outside to inside the vacuum housing towards the sample stage. Modular adapters are interchangeable to reconfigure installed process modules. Configurations may include scanning electron beams, focused ion beams, interferometers, detectors, and other process modules. The modular architecture provides a configurable mechanical framework to optimize the metrology apparatus by swapping adapters with customized sets of process modules.

IPC Classes  ?

• H01J 37/16 - VesselsContainers
• H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams

Abstract

For adjustment of an illumination system of a projection exposure apparatus, said illumination system having a light source and an illumination optical unit, firstly a maximum object field illumination angle (S) to be set is predefined, at which angle an object field (6a), in which an object to be imaged is arrangeable, is illuminated by means of the illumination optical unit. A distance between axicon elements of an axicon module of the illumination optical unit is set in order to predefine a raw object field illumination angle (R), which is different than the maximum object field illumination angle (S) to be set. The light source, which generates illumination light, is adjusted along an optical axis of the illumination optical unit until, proceeding from the predefined raw object field illumination angle (R), the maximum object field illumination angle (S) to be set is attained. The result is an adjustment method in which an improvement in a transmission of the illumination system, i.e. in an illumination light throughput, is made possible for a maximum object field illumination angle to be set.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The invention relates to a method for producing a surface coating (200), which reflects EUV radiation, on a substrate (300), wherein the surface coating (200) comprises a multi-ply layer system (210), and the substrate (300) has a micro-electromechanical system on the face to be provided with the surface coating (200). The method has the steps of: a) producing the surface coating (200) on a support (100) in the inverse order of the layers of the multi-ply layer system (210); b) connecting the produced surface coating (200) to the substrate (300) on the face remote from the support (100); and c) releasing and removing the support (100) from the surface coating (300).

IPC Classes  ?

• G21K 1/06 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction, or reflection, e.g. monochromators

Abstract

Provided is a computer-implemented method (200) for providing an occupation order (100) for transferring lens blanks (18) from a first carrier (10) to a second carrier (14). The method (200) comprises receiving (202) carrier identification information about the first carrier (10) having a first number of slots (12) and the second carrier (14) having a second number of slots (16), wherein each of the slots (14) is adapted to carry a lens blank (18). The method further comprises determining (204) an arrangement of the first number of slots (12) at the first carrier (10) and an arrangement of the second number of slots (16) at the second carrier (14) based on the received information. Moreover, the method comprises defining (206) an assignment of at least a part of the first number of slots (12) of the first carrier (10) to a corresponding number of the second number of slots (16) of the second carrier (14), and providing (208) a control signal and/or instructions for transferring multiple lens blanks (18) from at least the part of the first number of slots (12) of the first carrier (10) to the corresponding number of the second number (16) of slots of the second carrier (14) according to the defined assignment.

IPC Classes  ?

• B24B 13/00 - Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other workAccessories therefor
• B24B 41/00 - Component parts of grinding machines or devices, such as frames, beds, carriages or headstocks
• B65G 29/00 - Rotary conveyors, e.g. rotating discs, arms, star-wheels or cones
• B65G 35/06 - Mechanical conveyors not otherwise provided for comprising a load-carrier moving along a path, e.g. a closed path, and adapted to be engaged by any one of a series of traction elements spaced along the path
• B65G 37/02 - Flow sheets for conveyor combinations in warehouses, magazines or workshops
• B65G 47/53 - Devices for transferring articles or materials between conveyors, i.e. discharging or feeding devices between conveyors which cross one another

Abstract

The invention relates to an imaging system comprising a diffraction-based incoupling element, a diffraction-based outcoupling element, the IE being configured to deflect light incident on the IE from a field of view of the IE to the OE at least in part, the OE being configured to outcouple the deflected light at least in part and the deflected light from different regions of the field of view of the IE traversing different optical path lengths through the imaging system, and at least one non-rotationally symmetric refractive element that is configured to reduce a path length-dependent aberration.

IPC Classes  ?

• G02B 17/00 - Systems with reflecting surfaces, with or without refracting elements
• G02B 27/00 - Optical systems or apparatus not provided for by any of the groups ,
• G02B 27/01 - Head-up displays
• G02B 27/42 - Diffraction optics

Abstract

An X-ray inspection system serves for inspection of an object. An X-ray source of the system generates X-rays to propagate through a region of interest of the object. An object mount holds the object to be inspected such that the ROI is accessible for the generated X-rays. A detection system detects the X-rays after propagation through the ROI. The X-ray source generates a plurality of separate X-ray light bundles to propagate through the ROI. Chief rays of at least two of the generated separate X-ray light bundles impinge on the ROI of the object with different chief ray illumination angles. The detection system comprises separate detection areas to detect the separate X-ray light bundles, respectively. Such an inspection system can exhibit relatively fast image data acquisition.

IPC Classes  ?

• G01N 23/044 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material using laminography or tomosynthesis
• G01N 23/083 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and measuring the absorption the radiation being X-rays

Abstract

A method for examining a blank of a microlithographic photomask, including the steps of: a) arranging the blank on a first stage of a first examination apparatus such that a first and a second edge of the blank rest against stops of the first stage, b) ascertaining an examination location on the blank in a first coordinate system with the aid of the first examination apparatus, c) arranging the blank on a second stage of a second examination apparatus having an image recording unit, d) recording at least one image of the blank using the image recording unit such that the first and second edge are captured at least in part, and e) ascertaining a transformation rule on the basis of the first and second edge captured in the at least one image, in order to transform the examination location captured in the first coordinate system into a second coordinate system (142) of the second examination apparatus.

IPC Classes  ?

• G03F 1/84 - Inspecting
• G03F 1/44 - Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales

Abstract

The present invention relates to a projection system for a projection exposure apparatus for micro-lithography, in particular for EUV lithography, comprising an optical element. The problem of providing a projection system for a projection exposure apparatus for micro-lithography, in particular for EUV lithography, in which thermally induced, oscillating aberrations are minimised is solved in that the projection system comprises a radiation-absorbing element which is configured to temporarily interrupt the beam path of the projection system behind the optical element.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A projection exposure apparatus has a heating device for heating at least one element of the projection exposure apparatus via electromagnetic radiation. The heating device comprises an illumination optical unit having a housing and at least one optical element, arranged within the housing, for influencing the electromagnetic radiation. The at least one optical element is fixed within the housing by way of at least one elastic element.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A computer-implemented method of determining a base curve value representing a base curve for a front surface of a spectacle lens is disclosed. The method includes receiving individual prescription data and determining the base curve value for the front surface of the spectacle lens based on the prescription data. In particular, the base curve value is calculated from the received prescription data based on a functional relationship between one or more values included in the prescription data and the base curve value.

IPC Classes  ?

• G02C 7/02 - LensesLens systems
• G02C 7/06 - LensesLens systems bifocalLensesLens systems multifocal

Abstract

A facet mirror assembly has a carrier body for a plurality of individual mirrors. Reflection surfaces of the individual mirrors are individually tiltable, via assigned tilt actuators, about at least one tilt axis within an individual mirror tilt angle range around a neutral tilt position between a maximum angle and a minimum angle. The individual mirrors have at least two different neutral tilt positions in a range around a mean value of a total tilt angle range. The result can be a facet mirror assembly having improved properties with respect to a tilt actuator system of the facet mirror assembly.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G02B 5/09 - Multifaceted or polygonal mirrors

Abstract

The invention relates to an EUV mirror system comprising a vacuum chamber (23), an EUV mirror (17, 28, M1-M6) arranged in the vacuum chamber (23) and a heating device (35) for the EUV mirror (17, 28, M1-M6). The EUV mirror (17, 28, M1-M6) comprises a mirror body (30) and an optical surface (32) formed on the mirror body (30). A separating wall (28) used to delimit a mini environment (29) adjacent to the optical surface (32) of the EUV mirror (17, 28, M1-M6) from a main space (34) of the vacuum chamber is arranged in the vacuum chamber (23). The heating device (35) comprises a radiation source (26) and a mirror element (31) such that heating radiation (36) emitted by the radiation source (26) is reflected off the mirror element (31) and guided to the optical surface (32) of the EUV mirror (17, 28, M1-M6). The mirror element (31) is arranged outside of the mini environment (29). The mirror element (31) is designed as a MEMS mirror module. The heating radiation (36), coming from the MEMS mirror module, is guided through the separating wall (28) to the optical surface (32). The invention also relates to a method for operating an EUV mirror system.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G02B 7/18 - Mountings, adjusting means, or light-tight connections, for optical elements for prismsMountings, adjusting means, or light-tight connections, for optical elements for mirrors

Abstract

The invention relates to an adaptive optical module (38A) for a microlithographic projection exposure system (10; 210), comprising: an optical surface (32) for interacting with exposure radiation (14) of the projection exposure system; and a plurality of actuators (36n-1, 36n, 36n+1) for modifying a shape of the optical surface. The adaptive optical module comprises a dielectric medium (48) that can be deformed by applying an electric voltage (68), and each of the actuators comprises a separate control electrode (62n-1, 62n, 62n+1) which in each case is designed to generate an electric field in a layer of the dielectric medium. The control electrodes are connected to one another by means of a weakly conductive structure (60) having an electrical conductivity of at least 0.1 mS/m, and, in order to measure an impedance (86n-1, 86n, 86n+1) of at least one of the actuators, a measurement electrode (58n-1, 58n, 58n+1) is arranged between the control electrode of the actuator being measured and the dielectric medium.

IPC Classes  ?

• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light

Abstract

0HHT00 (60) during the operation of the micromirror field (10).

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G01K 7/16 - Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat using resistive elements
• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
• H05B 1/02 - Automatic switching arrangements specially adapted to heating apparatus

Abstract

An optical system is used to guide illuminating and imaging light (7) from a light source (5; 42) to an image field (34) in which a substrate (36) can be disposed. An optical assembly (31a, 32) is used to guide the illuminating and imaging light (7) along a beam path between the light source (5) and the image field (34) via at least one field plane (38, 33, 35) and via at least one pupil plane (23, 39). The light source (42) and/or a chromatic filter (37) disposed downstream of the light source (5) in the beam path is designed such that, for the imaging light (7) generated by means of the light source (5; 42), a wavelength bandwidth between a total wavelength bandwidth and a reduction wavelength bandwidth which is at least 10% smaller than the total wavelength bandwidth can be defined. The result is an optical system which improves the imaging performance for imaging in particular objects that have structures having different imaging requirements.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

An optical rod (19) is used to mix illumination light in an illumination optical unit of a lithographic projection exposure system. A cylindrical rod main part (19a) is divided into at least two cylindrical main part portions (39, 40). Between the two main part portions is at least one partial reflection layer (41) for the illumination light, said partial reflection layer being positioned between an inlet surface (18) and an outlet surface (20) of the rod main part (19a). End-face cross-sections of the main part portions (39, 40) complement each other in order to form the rod cross-section of the rod main part (19a). The result is an optical rod with an improved light mixing function.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G02B 27/09 - Beam shaping, e.g. changing the cross-sectioned area, not otherwise provided for

Abstract

The invention relates to a method for controlling the temperature of a sensor frame (27) in a microlithographic projection system (20) with optical elements (23, 40, Mi) fastened to a support frame (24), at least one sensor (28) fastened to the sensor frame (27) for determining, in a non-contact manner, a relative position of at least one of the optical elements (23, 40, Mi) and with at least one fluid line (50, 51, 52, 53) guided at least in some portions along the sensor frame (27) for actively controlling the temperature of at least one of the optical elements (23, 40, Mi), wherein the projection system (20) is located in a vacuum chamber (101). According to the invention, the following steps are carried out: – using the fluid line (50, 51, 52, 53) as a thermal actuator for introducing thermal energy into the sensor frame (27) by conducting a thermal fluid through the fluid line (50, 51, 52, 53); – evacuating the vacuum chamber (101) starting from an initial pressure down to a predefined minimal pressure; – controlling the thermal actuator such that the temperature of the sensor frame (27) is actively controlled to a predefined target temperature. As a result of the method according to the invention, a wait time needed after the evacuation, within which the sensor frame reaches a target temperature specified for further operation, can be significantly reduced.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The invention relates to methods for producing an optical element (1) for an optical system, the optical element having a target surface shape (1a) and/or a target optical effect during the operation of the optical system, wherein the optical element (1) has a mean operating temperature (F) which during the operation of the optical system is controlled by at least one thermal manipulator (2). The invention also relates to an optical element for an optical system, and to an optical system for a semiconductor technology apparatus.

IPC Classes  ?

• B29D 11/00 - Producing optical elements, e.g. lenses or prisms
• G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses
• G02B 27/00 - Optical systems or apparatus not provided for by any of the groups ,
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Goods & Services

Spectacle lenses

Goods & Services

Instruments and applications for the correction of wafer forms; laser system to correct distorsion of wafers; computer software for inspecting wafers

Abstract

The invention relates to techniques for producing an HOE by replication of a master HOE. In particular, techniques that allow variable surface shape during replication are described. A curved trajectory is used for exposure.

IPC Classes  ?

• G03H 1/04 - Processes or apparatus for producing holograms

Abstract

Provided are a method and a device for generating a set of virtual representation data of a spectacle lens. A set of scanning data of a profile of an edge surface of the spectacle lens is obtained by scanning the edge surface using an optical scanner. Further, a set of imaging data is obtained with a camera facing a front or a back surface of the spectacle lens. Additionally, generating a set of virtual representation data of the spectacle lens is based on the set of scanning data and the set of imaging data. Further, a set of virtual representation data is provided, its use for characterizing an accuracy of fit of the spectacle lens, and/or for monitoring a manufacturing process, as well as a method for manufacturing a spectacle lens. The optical scanner is a laser scanner for scanning a height profile of the edge surface.

IPC Classes  ?

• G02C 13/00 - AssemblingRepairingCleaning
• G01M 11/02 - Testing optical properties

Abstract

The invention relates to a transport and test system for a camera (23), comprising the camera (23), a camera cover (33) and a vacuum connection (35). The camera (23), which can be in particular an EUV camera, comprises a camera housing (25) and an image sensor (24) arranged on the camera housing (25). A vacuum flange (31) intended for connection to a vacuum housing is formed on the camera housing (25). The camera cover (33) has a mating flange (34) which complements the vacuum flange (31). In a connected state, the camera (23), the camera cover (33) and the vacuum connection (35) form a camera unit (38) which encloses an interior (39) in a vacuum-tight manner such that a negative pressure can be applied in the interior (39) via the vacuum connection (35). The invention also relates to a method for testing a camera, in particular an EUV camera.

IPC Classes  ?

• H04N 17/00 - Diagnosis, testing or measuring for television systems or their details
• H04N 23/50 - Constructional details

Abstract

The invention relates to an optical element (25) for reflecting EUV radiation (16), comprising: a substrate (26), a reflective coating (27) for reflecting the EUV radiation (16), and an etchable material (29) which is covered by the reflective coating (27) and is removed on contact with an etching medium (31). In a first aspect, the reflective coating (27) is under mechanical prestress in order to cause a curvature of the reflective coating (27) in the direction of the substrate (26) when the etchable material (29) is removed by the etching medium (31) in the event of damage to the reflective coating (27). In a second aspect, the etchable material (29) is doped with a dopant which is not removed on contact with the etching medium (31) and which accumulates preferably at an etching front of the etchable material when the etchable material (29) is removed by the etching medium (31) in the event of damage to the reflective coating (27). The invention also relates to an EUV lithography system which has at least one such optical element (25) which is exposed to an etching medium (31) during operation of the EUV lithography system.

IPC Classes  ?

• G02B 5/08 - Mirrors

Abstract

A method for processing a defect of a microlithographic photomask is disclosed, wherein a process gas is activated with the aid of a particle beam, wherein a control unit is provided for controlling a deflection unit with a control bandwidth, wherein the deflection unit for deflecting the particle beam is configured to guide the particle beam over the photomask, including the following steps: a) providing an image of at least a portion of the photomask, b) ascertaining a repair shape (in the image on the basis of the control bandwidth, wherein the repair shape comprises the defect, and c) providing the particle beam at m pixels of the repair shape with the aid of the deflection unit, and activating the process gas for the purpose of processing the defect.

IPC Classes  ?

• G03F 1/74 - Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
• G03F 1/86 - Inspecting by charged particle beam [CPB]

Abstract

A measuring assembly for determining at least one distance between a first and a second optical element (2, 3). The first element is translucent as a measuring matrix and has a semi-reflective first surface (7). The second optical element is an EUV mirror and has an at least semi-reflective second surface (8). The first surface lies opposite the second surface at the distance to be detected. A light beam (14) generated by a light beam source (13) is coupled into the first optical element by a surface (11) that is different from the first surface. A first partial light beam (19) is reflected by the first surface and a second partial light beam (16) passing through the first surface is reflected by the second surface and each back into the first optical element. A light beam sensor (21) is arranged to detect both partial light beams, to determine the distance.

IPC Classes  ?

• G01M 11/08 - Testing mechanical properties

Abstract

An optical assembly has an optical element which comprises a main body. At least one actuator serves to deform the main body and is arranged on the back side of the main body. The at least one actuator is connected at a first connecting surface to the back side of the main body. The at least one actuator is connected at a second connecting surface to a back plate. The back plate is mounted exclusively by way of the actuator.

IPC Classes  ?

• G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

The disclosed techniques relate to a method for producing a base element of an optical element for semiconductor lithography, comprising the following steps: firstly, producing a material mixture comprising at least two material components; secondly, producing an intermediate element from the material mixture, wherein the material mixture comprises at least one first material component made of the material of the later base element, and wherein the material mixture comprises a second material component that functions to mechanically stabilise the intermediate element; thirdly, producing the base element from the intermediate element via temporary heating and at least partial removal of the second material component. The disclosed techniques also relate to an optical element produced using the method according to the disclosed techniques, a base element, an optical element, and a projection exposure system for semiconductor lithography provided with the optical element

IPC Classes  ?

• B29C 64/153 - Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
• B33Y 10/00 - Processes of additive manufacturing
• B33Y 70/00 - Materials specially adapted for additive manufacturing
• B33Y 80/00 - Products made by additive manufacturing
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A mirror for a projection exposure apparatus has a spectral filter, embodied as a grating structure, for light reflected by the mirror. The grating structure has at least two grating levels and hence specifies at least two optical path lengths for the reflected light. An overall flank portion of the grating structure is arranged in each case between grating level structure portions of the grating structure, which each specify adjacent grating levels. A lower limit spatial wavelength over a defect-free partial flank portion of the overall flank portion making up at least an extent of 90% of the overall flank portion is in the range from 0.01 μm to 1 μm exclusive.

IPC Classes  ?

• G02B 5/18 - Diffracting gratings
• G02B 5/20 - Filters
• G02B 5/26 - Reflecting filters
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor