Abstract

An inner pod holding device conducive to reducing dust contamination comprises a separator, a plurality of supporters, a first positioning module, and a second positioning module. The separator defines a concealing space and a holding space. The plurality of supporters is disposed in the holding space. The first positioning module includes a first driving member and at least one first positioning member. The first driving member is disposed in the concealing space and configured to move in a first direction. The second positioning module includes a second driving member and at least one second positioning member. The second driving member is disposed in the concealing space and configured to move in a second direction. The first and second positioning members each have a top portion protruding to the holding space. An optical inspection apparatus with the inner pod holding device is further provided.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G01N 21/94 - Investigating contamination, e.g. dust
• G03F 1/66 - Containers specially adapted for masks, mask blanks or pelliclesPreparation thereof

Abstract

An optical inspection device for a surface of a reticle pod includes a carrier platform having a carrier surface, a light source module, a photographic module, and a control module. The light source module includes first and second light sources for irradiating the carrier surface in first and second directions, respectively. An angle of an included angle between the first direction and the carrier surface is greater than an angle of an included angle between the second direction and the carrier surface. The control module is signally connected to the camera module, first light source, and second light source. The control module controls one of the first light source and second light source to turn on and the other one to turn off. An optical inspection method for a surface of a reticle pod is further provided to operate to inspect a reticle pod efficiently and precisely.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G03F 1/66 - Containers specially adapted for masks, mask blanks or pelliclesPreparation thereof
• G03F 1/84 - Inspecting

Abstract

An inspection device for a sub-element of a reticle pod comprises a carrier platform, a light source module, a camera module and a control module. The light source module includes a coaxial light source and a height adjustment mechanism. The height adjustment mechanism is connected to at least one of the coaxial light source and the carrier platform. The camera module is connected to the coaxial light source and has a lens facing the carrier platform. The control module is signally connected to the camera module and the height adjustment mechanism. The control module controls the height adjustment mechanism to adjust a relative distance between the coaxial light source and the carrier platform. The inspection device for a sub-element of a reticle pod performs optical inspection on the sub-element of a reticle pod.

IPC Classes  ?

• G01M 11/02 - Testing optical properties
• G06T 7/00 - Image analysis
• H04N 23/56 - Cameras or camera modules comprising electronic image sensorsControl thereof provided with illuminating means

Abstract

A high-speed surface inspection system for a reticle pod and method comprises a cabinet, a clamping module, a first inspection device, a second inspection device, and a travel stroke controller. An interior of the cabinet is divided into an automated device area, a first inspection area, and a second inspection area. The travel stroke controller controls the clamping module to reciprocate between the automated device area and the first inspection area so as to transport a first portion of the reticle pod, and controls the clamping module to reciprocate between the automated device area and the second inspection area so as to transport a second portion of the reticle pod. A high-speed surface inspection method for a reticle pod is further provided. The present application solves the issue of an inability for efficient surface inspection of a reticle pod.

IPC Classes  ?

• G01N 21/94 - Investigating contamination, e.g. dust

Abstract

A jig for measuring temperature and humidity of a reticle carrier comprises: a jig body, a detection module, a wireless communication module and a capacitor, the jig body has a storage space, at least one air inlet hole and at least one air outlet hole communicated to the storage space; the detection module includes a thermometer and a hygrometer, the thermometer and the hygrometer are disposed in the storage space; the wireless communication module is connected to the thermometer and the hygrometer by signal; the capacitor is electrically connected to the detection module and the wireless communication module. The jig for measuring temperature and humidity of the reticle carrier of the present disclosure is used to keep tabs on the temperature and humidity and the changes inside the reticle carrier.

IPC Classes  ?

• G01K 1/024 - Means for indicating or recording specially adapted for thermometers for remote indication
• G01F 15/061 - Indicating or recording devices for remote indication
• G03F 7/20 - ExposureApparatus therefor

Abstract

A jig for automatically measuring flow rate of a reticle carrier comprises a jig body, a flow rate detection module, a wireless communication module, a capacitor and a wireless charging receiving module. The jig body has a storage space, at least one gas inlet hole and at least one gas outlet hole communicated to the storage space. The flow rate detection module includes a flowmeter and a flow indicator connected to the flowmeter by a signal, the flowmeter is disposed in the storage space. The wireless communication module is connected to the flowmeter by a signal. The capacitor is electrically connected to the flow rate detection module and the wireless communication module. The wireless charging receiving module is disposed at a bottom of the jig body, and electrically connected to the capacitor.

IPC Classes  ?

• G01F 15/061 - Indicating or recording devices for remote indication
• G03F 7/20 - ExposureApparatus therefor
• H02J 7/00 - Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries
• H02J 50/10 - Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling

Abstract

A clamping appliance of a reticle inner pod comprises: two clamping seats and a power member. The two clamping seats face each other in a width direction. The power member adjusts a distance of the two clamping seats in the width direction. The two clamping seats each include a bottom wall, two side walls, a first step and a second step. The two side walls are respectively disposed at two ends of the bottom wall. The first step and the second step are sequentially arranged above the bottom wall along the width direction. The two clamping seats each further include two eaves, the two eaves are respectively perpendicularly connected to the two side walls, so that the eave, the side wall and the bottom wall are clamped to form a cladding space with three-sided cladding.

IPC Classes  ?

• G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Abstract

A gripping mechanism for inspection of a reticle inner pod includes a quadrilateral frame and fourth gripper units. The four gripper units are respectively disposed at four border strips of the quadrilateral frame and are opposite in pairs. Each gripper unit has a body, a first gripping portion and a second gripper portion. The first and second gripping portions are respectively located on different positions of the body. The first gripping portions form a first gripping plane, and the second gripping portions form a second gripping plane. At least two adjacent gripper units have a power member, which is in power connection with the body so as to adjust a distance between two bodies opposite to each other. The gripping mechanism for the inspection of the reticle inner pod is capable of securely gripping the reticle inner pod during transportation or turning of reticles.

IPC Classes  ?

• G03F 1/66 - Containers specially adapted for masks, mask blanks or pelliclesPreparation thereof
• G03F 1/84 - Inspecting

Abstract

A drawer-replaced cleaning apparatus comprises: a box, at least one cleaning module and a lifting power module, the box has an accommodating space and a drawer, the drawer is located in the accommodating space, and may be pulled out from one side of the box, a bottom surface of the drawer has at least one mounting slot, the at least one cleaning module is detachably disposed in the mounting slot, the lifting power module is located in the accommodating space, and disposed below the cleaning module, the lifting power module passes through the mounting slot to push the cleaning module up away from the drawer, and the lifting power module is lowered so that the cleaning module is relocated in the mounting slot. The present disclosure solves the problem that the cleaning module of the prior art is difficult to replace.

IPC Classes  ?

• B08B 13/00 - Accessories or details of general applicability for machines or apparatus for cleaning
• B08B 1/00 - Cleaning by methods involving the use of tools
• B08B 1/02 - Cleaning travelling work, e.g. a web or articles on a conveyor
• G03F 1/82 - Auxiliary processes, e.g. cleaning

Abstract

The present invention provides purge devices having micronozzles and operating methods thereof. The purge device having micronozzles are operated to clean pellicles used in semiconductor manufacturing. The purge devices having micronozzles comprises a base, at least one track configured on the base, a rotation platform, and a micronozzle array, in which the micronozzle array further comprises an air duct and a plurality of nozzles. Additionally, the rotation platform and the micronozzle array are able to move relatively to another along the at least one track.

IPC Classes  ?

• B08B 5/02 - Cleaning by the force of jets, e.g. blowing-out cavities
• H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
• A47L 9/08 - Nozzles with means adapted for blowing

Abstract

Operating methods of purge devices for containers are provided. The operating methods comprise a step of aligning an opening of a container to a first purging unit and placing the container in the purge device. After the container is purged, the container will be heated and filled with extreme clean dry air (XCDA) or nitrogen to finalize the purging process.

IPC Classes  ?

• F26B 21/06 - Controlling, e.g. regulating, parameters of gas supply
• H01L 21/673 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components using specially adapted carriers

Abstract

The present invention relates to a wafer transport system and a method of operating the same. The wafer transport system comprises at least one semiconductor apparatus, a track, a transfer device, a positioning device, a carrier and a cleaning device. The wafer transport system transports wafers along the at least one semiconductor apparatus via the carrier riding on the track. The transfer device transfers the wafers from the carrier to the at least one semiconductor apparatus. The positioning device identifies and controls the position of the carrier on the track. The cleaning device maintains the cleanliness of the wafers. The present invention provides advantages for improving the yield rate of a wafer, shortening the fabrication time of a wafer, and offering the flexibility and the extendibility to a wafer transport system.

IPC Classes  ?

• B08B 3/00 - Cleaning by methods involving the use or presence of liquid or steam
• H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
• H01L 21/673 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components using specially adapted carriers
• H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
• H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
• H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

Abstract

A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the scrubbing unit.

IPC Classes  ?

• G03F 1/82 - Auxiliary processes, e.g. cleaning
• B08B 1/00 - Cleaning by methods involving the use of tools
• B08B 3/02 - Cleaning by the force of jets or sprays

Abstract

A method for cleaning photomasks includes the following steps: provided a cleansing device having a scrubbing unit. The scrubbing unit having a saturated scrubbing surface is use to clean photomasks with the obliquely dispensed fluids. In such a fashion, loosened contaminants are removed. As least one oblique surface is formed on the peripheries of the scrubbing surface to form a channeling region such that fluids can instantly flow away from photomasks after cleaning to prevent re-contamination. The instant disclosure also provides a system for cleaning photomasks.

IPC Classes  ?

• B08B 7/00 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass
• B08B 1/02 - Cleaning travelling work, e.g. a web or articles on a conveyor
• B08B 3/00 - Cleaning by methods involving the use or presence of liquid or steam
• B08B 3/10 - Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
• B08B 1/00 - Cleaning by methods involving the use of tools
• G03F 1/82 - Auxiliary processes, e.g. cleaning

Abstract

The wafer box conveyer includes a chassis, a transverse moving mechanism, a longitudinal moving mechanism, a loading mechanism and a shock reduction mechanism. The chassis includes a frame and a plurality of wheels mounted under the frame. The transverse moving mechanism is movably connected to the frame. The longitudinal moving mechanism is movably connected to the transverse moving mechanism. A moving direction of the longitudinal moving mechanism is perpendicular to that of the transverse moving mechanism. The loading mechanism includes at least one tray for a wafer box. The shock reduction mechanism is disposed between the at least one tray and the frame for absorbing a load of the tray.

IPC Classes  ?

• B62B 3/10 - Hand carts having more than one axis carrying transport wheelsSteering devices thereforEquipment therefor characterised by supports specially adapted to objects of definite shape

Abstract

The present invention provides a temperature and humidity measuring and recording device deployed on substrate for measuring and recording temperature and humidity of the interior of any station for reticles and of any SMIF POD. The temperature and humidity measuring and recording device comprises a substrate with a first surface and a second surface opposite to the first surface on another side of the substrate, a first measurement unit embedded in and fixed to the first surface of the substrate for measuring the temperature and humidity of the surrounding environment, and a second measurement unit embedded in and fixed to the second surface of the substrate for measuring the temperature and humidity of the interior between the substrate and the pellicle film.

IPC Classes  ?

• G01N 19/10 - Measuring moisture content, e.g. by measuring change in length of hygroscopic filamentHygrometers

Abstract

The present invention provides an equipment for measuring the vertical distance or pitch between a plurality of thin substrates inside a container body, including an optical component to transmit a light beam to a thin substrate in the container body and receive light beam reflected from the thin substrate, a scanning device to drive the optical component to move along vertical direction of the thin substrates for measuring the vertical distance or pitch between the plurality of thin substrates in the container body, and a rotation base to carry and rotate the container body to a plurality of angles for the plurality of thin substrates inside the container body to be measured from different angular positions.

IPC Classes  ?

• G08B 21/00 - Alarms responsive to a single specified undesired or abnormal condition and not otherwise provided for

Abstract

The present invention provides a gas filling apparatus and gas filling port thereof. The gas filling apparatus is connected with the air feed apparatus which is introduced the gas into the first inlet port of the semiconductor device or reticle storage apparatus. The gas filling apparatus includes a supporting base which is provided to hold the storage apparatus thereon, and at least one second inlet port which is disposed on the first inlet port of the storage apparatus so as to the gas is flowed into the storage apparatus through the second inlet port. The second inlet port includes a first base, a second base, a first elastic element, a fixing element, and a switch device. Both of the first base and second base have through holes, and opposite to each other. The first elastic element is used to maintain the airtight and is disposed on the second base and opposite to the first inlet port of the storage apparatus used to maintain the airtight. The fixing element is used to fix the elastic element on the second base. The switch device is disposed on the gap in the middle of the first base and the second base, and is provided to control the input or output for the gas of the second inlet port.

IPC Classes  ?

• B65B 31/04 - Evacuating, pressurising or gasifying filled containers or wrappers by means of nozzles through which air or other gas, e.g. an inert gas, is withdrawn or supplied

Abstract

This invention is about a gas filling apparatus for filling a gas into a storage apparatus for storing a semiconductor element or a reticle. The gas filling apparatus comprises a base and a port. The storage apparatus is loaded on the base. The port comprises a receiving part, which is connected with an air entrance of the storage apparatus. The contact portions of both the top of the receiving part and the air entrance of the storage apparatus are cambered surfaces and these two portions contacts in a ring fashion which is formed by the cambered surfaces mated with each other. The port also comprises a hole for the gas to pass through, and a joint port to connect with the air source.

IPC Classes  ?

• B65B 31/00 - Packaging articles or materials under special atmospheric or gaseous conditionsAdding propellants to aerosol containers

Abstract

A photomask cleaner includes a clamp assembly using clamping plates with an elastic buffer device for clamping a photomask to be cleaned positively, a displacement mechanism for moving the clamp assembly among workstations subject to a predetermined track, a cleaning unit installed in one workstation for cleaning the photomask carried by the clamp assembly, and an air dryer installed in one workstation for drying the well-cleaned photomask carried.

IPC Classes  ?

• B08B 3/02 - Cleaning by the force of jets or sprays