Apparatuses and methods therefor generally relate to sensing. In one example of such an apparatus, there is a platform. An optical fiber with Fiber Bragg Grating sensors is located in a trench formed in the platform. The trench has curved sections. The Fiber Bragg Grating sensors are respectively in the curved sections of the trench.
G01L 1/24 - Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis
G01K 11/3206 - Measuring temperature based on physical or chemical changes not covered by group , , , or using changes in transmittance, scattering or luminescence in optical fibres at discrete locations in the fibre, e.g. using Bragg scattering
H01L 21/66 - Testing or measuring during manufacture or treatment
2.
Platform with trench for optical fiber with sensors
Apparatuses and methods therefor generally relate to sensing. In one example of such an apparatus, there is a platform. An optical fiber with Fiber Bragg Grating sensors is located in a trench formed in the platform. The trench has curved sections. The Fiber Bragg Grating sensors are respectively in the curved sections of the trench.
G01L 1/24 - Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis
G01K 11/3206 - Measuring temperature based on physical or chemical changes not covered by group , , , or using changes in transmittance, scattering or luminescence in optical fibres at discrete locations in the fibre, e.g. using Bragg scattering
H01L 21/66 - Testing or measuring during manufacture or treatment
3.
PROCESSING CHAMBER WITH OPTICAL FIBER WITH BRAGG GRATING SENSORS
An apparatuses relating generally to a test wafer, processing chambers, and method relating generally to monitoring or calibrating a processing chamber, are described. In one such an apparatus for a test wafer, there is a platform. An optical fiber with Fiber Bragg Grating sensors is located over the platform. A layer of material is located over the platform and over the optical fiber.
G01J 3/18 - Generating the spectrumMonochromators using diffraction elements, e.g. grating
G01K 1/14 - SupportsFastening devicesArrangements for mounting thermometers in particular locations
G01K 11/3206 - Measuring temperature based on physical or chemical changes not covered by group , , , or using changes in transmittance, scattering or luminescence in optical fibres at discrete locations in the fibre, e.g. using Bragg scattering
G01N 29/14 - Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic wavesVisualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object using acoustic emission techniques
G02B 6/42 - Coupling light guides with opto-electronic elements
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
H01S 5/06 - Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
H01S 5/068 - Stabilisation of laser output parameters
H01S 5/40 - Arrangement of two or more semiconductor lasers, not provided for in groups
4.
TEST WAFER WITH OPTICAL FIBER WITH BRAGG GRATING SENSORS
An apparatuses relating generally to a test wafer, processing chambers, and method relating generally to monitoring or calibrating a processing chamber, are described. In one such an apparatus for a test wafer, there is a platform. An optical fiber with Fiber Bragg Grating sensors is located over the platform. A layer of material is located over the platform and over the optical fiber.
G02B 6/42 - Coupling light guides with opto-electronic elements
G01K 11/32 - Measuring temperature based on physical or chemical changes not covered by group , , , or using changes in transmittance, scattering or luminescence in optical fibres
G01N 29/14 - Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic wavesVisualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object using acoustic emission techniques
G01K 1/14 - SupportsFastening devicesArrangements for mounting thermometers in particular locations
An apparatuses relating generally to a test wafer, processing chambers, and method relating generally to monitoring or calibrating a processing chamber, are described. In one such an apparatus for a test wafer, there is a platform. An optical fiber with Fiber Bragg Grating sensors is located over the platform. A layer of material is located over the platform and over the optical fiber.
G02B 6/42 - Coupling light guides with opto-electronic elements
G01K 11/3206 - Measuring temperature based on physical or chemical changes not covered by group , , , or using changes in transmittance, scattering or luminescence in optical fibres at discrete locations in the fibre, e.g. using Bragg scattering
G01N 29/14 - Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic wavesVisualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object using acoustic emission techniques
G01K 1/14 - SupportsFastening devicesArrangements for mounting thermometers in particular locations
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
H01S 5/06 - Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
H01S 5/068 - Stabilisation of laser output parameters
H01S 5/40 - Arrangement of two or more semiconductor lasers, not provided for in groups
G01J 3/18 - Generating the spectrumMonochromators using diffraction elements, e.g. grating
6.
Test wafer with optical fiber with Bragg Grating sensors
An apparatuses relating generally to a test wafer, processing chambers, and method relating generally to monitoring or calibrating a processing chamber, are described. In one such an apparatus for a test wafer, there is a platform. An optical fiber with Fiber Bragg Grating sensors is located over the platform. A layer of material is located over the platform and over the optical fiber.
G02B 6/42 - Coupling light guides with opto-electronic elements
G01K 11/32 - Measuring temperature based on physical or chemical changes not covered by group , , , or using changes in transmittance, scattering or luminescence in optical fibres
G01N 29/14 - Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic wavesVisualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object using acoustic emission techniques
G01K 1/14 - SupportsFastening devicesArrangements for mounting thermometers in particular locations
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
H01S 5/06 - Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
H01S 5/068 - Stabilisation of laser output parameters
H01S 5/40 - Arrangement of two or more semiconductor lasers, not provided for in groups
G01J 3/18 - Generating the spectrumMonochromators using diffraction elements, e.g. grating
patents