Abstract

Provided is a compound represented by formula (1). [Chemical formula 1] R1represents H, a C1-20 alkyl group, a C1-20 alkoxy group, a C5-10 aryl group which may have a C1-10 alkyl group, a C1-10 alkoxy group, OH or a halogen atom as a substituent, OH, or a halogen atom; R2represents H, a C1-10 alkyl group, a hydroxyalkyl group, a glycidyl ether group, a methyl glycidyl ether group, a glycidyloxyalkyl group, a β-methylglycidyloxyalkyl group, an acryloyloxyalkyl group or a methacryloyloxyalkyl group; n represents a numerical value of 0-4; and X1and X2each represent H or a group represented by general formula (11), wherein at least one of X1and X2is represented by general formula (11). [Chemical formula 2] R3 represents H or a methyl group.

IPC Classes  ?

• C08G 59/00 - Polycondensates containing more than one epoxy group per moleculeMacromolecules obtained by reaction of epoxy polycondensates with monofunctional low-molecular-weight compoundsMacromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
• C07D 407/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing three or more hetero rings
• C08G 59/26 - Di-epoxy compounds heterocyclic

Abstract

Provided is a foamable oil-in-water-type emulsified oil or fat composition that has good flavor, good emulsion stability and good whipping properties without using a milk protein.　This foamable oil-in-water-type emulsified oil or fat composition contains 0.1-10 mass% of a plant-derived protein material, wherein the pH value of an aqueous phase is 7-10. The plant-derived protein material is preferably derived from peas. The foamable oil-in-water-type emulsified oil or fat composition preferably contains an ocean-derived potassium salt. In the foamable oil-in-water-type emulsified oil or fat composition, the content of a non-fat milk solid is preferably less than 3.0 mass%.

IPC Classes  ?

• A23D 7/00 - Edible oil or fat compositions containing an aqueous phase, e.g. margarines
• A23C 11/10 - Milk substitutes, e.g. coffee whitener compositions containing at least one non-milk component as source of fats or proteins containing or not lactose but no other milk components as source of fats, carbohydrates or proteins
• A23J 3/14 - Vegetable proteins
• A23L 9/20 - Cream substitutes
• A23L 11/60 - Drinks from legumes, e.g. lupine drinks
• A23L 11/65 - Soy drinks

Abstract

There is provided a raw material for forming a thin film containing a lanthanum compound represented by general formula (1).　[Formula 1] (In general formula (1), R1, R3, R4, R6, R7, and R9each independently represent a C1-8 aliphatic hydrocarbon or a C1-8 hetero atom-containing hydrocarbon group, and R2, R5, and R8each independently represent a hydrogen atom or a C1-3 alkyl group.　However, lanthanum compounds in which R1and R3, R4and R6, and R 7and R9are all the same groups as each other, and all of R 2, R5, and R8 are the same groups, are excluded).

IPC Classes  ?

• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• C07F 5/00 - Compounds containing elements of Groups 3 or 13 of the Periodic Table

Abstract

The invention provides compounds represented by the formula (1) The invention provides compounds represented by the formula (1) The invention provides compounds represented by the formula (1) wherein X and Y are oxygen atoms or sulfur atoms, Z is a hydroxyl group or the like, R1 and R2 are alkyl groups and the like, R4 and R5 are alkyl groups and the like, R3 and R6 are hydrogen atoms and the like, R7 is a substituted phenyl group or the like, and Q is an aryl group or the like, or salts thereof, pest control agents containing the compounds as active ingredients, and methods for use thereof.

IPC Classes  ?

• A01N 43/40 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
• A01N 25/12 - Powders or granules
• A01N 37/22 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having three bonds to hetero atoms with at the most two bonds to halogen, e.g. carboxylic acids containing the group —CO—N, e.g. carboxylic acid amides or imidesThio-analogues thereof the nitrogen atom being directly attached to an aromatic ring system, e.g. anilides
• A01P 7/04 - Insecticides
• A61K 31/167 - Amides, e.g. hydroxamic acids having aromatic rings, e.g. colchicine, atenolol, progabide having the nitrogen atom of a carboxamide group directly attached to the aromatic ring, e.g. lidocaine, paracetamol
• A61K 31/44 - Non-condensed pyridinesHydrogenated derivatives thereof
• C07C 235/82 - Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups and doubly-bound oxygen atoms bound to the same carbon skeleton with the carbon atom of at least one of the carboxamide groups bound to a carbon atom of a ring other than a six-membered aromatic ring
• C07D 213/75 - Amino or imino radicals, acylated by carboxylic or carbonic acids, or by sulfur or nitrogen analogues thereof, e.g. carbamates

Abstract

The invention provides compounds represented by the formula (1) The invention provides compounds represented by the formula (1) The invention provides compounds represented by the formula (1) wherein X and Y are oxygen atoms or sulfur atoms, Z is a hydroxyl group or the like, R1 is a hydrogen atom or the like, R2, R3 and R4 are hydrogen atoms and the like, and R5 and Q are substituted phenyl groups and the like, or salts thereof, pest control agents containing the compounds as active ingredients, and methods for use thereof.

IPC Classes  ?

• A01N 43/16 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atom with one hetero atom six-membered rings with oxygen as the ring hetero atom
• A01P 7/04 - Insecticides
• A01P 17/00 - Pest repellants
• C07D 309/32 - Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
• C07D 311/96 - Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings spiro-condensed with carbocyclic rings or ring systems

Abstract

333 and a reducing gas; and a raw material for forming a thin film. (In general formula (1), R1represents a hydrogen atom or a hydrocarbon group having 1 to 5 carbon atoms, and R2, R3and R4 each independently represent an alkyl group having 1 to 3 carbon atoms).

IPC Classes  ?

• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• C07F 7/08 - Compounds having one or more C—Si linkages
• C07F 7/10 - Compounds having one or more C—Si linkages containing nitrogen
• C07F 9/94 - Bismuth compounds
• C07F 19/00 - Metal compounds according to more than one of main groups
• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Abstract

The present disclosure provides: a block urethane compound which is formed with a polyisocyanate compound, a polyhydroxy compound, and a blocking agent, wherein the polyhydroxy compound contains one or more compounds selected from the group consisting of unsaturated polyol derivatives, unsaturated polyols, and acrylic polyols; a block urethane material containing the block urethane compound; a composition containing the block urethane compound; a cured product formed from the composition; and a method for producing the cured product.

IPC Classes  ?

• C08G 18/80 - Masked polyisocyanates
• C08G 18/62 - Polymers of compounds having carbon-to-carbon double bonds
• C08G 18/67 - Unsaturated compounds having active hydrogen
• C08G 18/75 - Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic

Abstract

The invention provides compounds represented by the formula (1) The invention provides compounds represented by the formula (1) The invention provides compounds represented by the formula (1) wherein X and Y are oxygen atoms or sulfur atoms, Z is a hydroxyl group or the like, R1 is an alkyl group or the like, R2 and R4 are substituted phenyl groups and the like, R3, R5 and R6 are hydrogen atoms and the like, and R7 is a substituted phenyl group or the like, or salts thereof, pest control agents containing the compounds as active ingredients, and methods for use thereof.

IPC Classes  ?

• C07D 211/90 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
• A01N 43/40 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
• A01N 43/42 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings condensed with carbocyclic rings
• A01N 43/52 - 1,3-DiazolesHydrogenated 1,3-diazoles condensed with carbocyclic rings, e.g. benzimidazoles
• A01N 43/54 - 1,3-DiazinesHydrogenated 1,3-diazines
• A01N 43/56 - 1,2-DiazolesHydrogenated 1,2-diazoles
• A01N 43/60 - 1,4-DiazinesHydrogenated 1,4-diazines
• A01N 43/653 - 1,2,4-TriazolesHydrogenated 1,2,4-triazoles
• A01N 43/66 - 1,3,5-Triazines, not hydrogenated and not substituted at the ring nitrogen atoms
• A01N 43/713 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with four or more nitrogen atoms as the only ring hetero atoms
• A01N 43/78 - 1,3-ThiazolesHydrogenated 1,3-thiazoles
• A01N 43/80 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms five-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,2
• A01N 43/82 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms five-membered rings with three hetero atoms
• A01N 43/84 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms six-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,4
• A01P 7/04 - Insecticides
• C07D 221/20 - Spiro-condensed ring systems
• C07D 401/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring- member bond
• C07D 401/14 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing three or more hetero rings
• C07D 405/10 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
• C07D 413/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings
• C07D 417/10 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a carbon chain containing aromatic rings
• C07D 417/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing three or more hetero rings

Abstract

The objects of the present invention are: (1) to provide an imitation cheese in which an odd taste derived from a vegetable material is less likely to be imparted; (2) to provide an imitation cheese having excellent processing suitability in which during shaping the imitation cheese by shredding, dicing, cleaving, cutting, or the like, the shaped imitation cheese is not attached to another shaped imitation cheese, and during shaping, the imitation cheese does not collapse into a powder or pieces; and (3) to provide an imitation cheese having cheese-like texture and physical properties when the imitation cheese is eaten as it is or after heating. The present invention provides an imitation cheese that includes an oil-in-water emulsion containing the following components A and B, and that satisfies the following condition 1: (Component A) a whole grain ground product of high-carbohydrate beans, provided that the high-carbohydrate beans refer to beans containing 50 to 80% by mass of carbohydrate; (Component B) an oxidized starch (excluding an oxidized starch that has been subjected to a cross-linking treatment); and (Condition 1) a pH thereof is 3.0 to 5.5.

IPC Classes  ?

• A23C 20/02 - Cheese substitutes containing neither milk components, nor caseinate, nor lactose, as sources of fats, proteins or carbohydrates

Abstract

There are provided: a flame retarding composition that is used for allowing a synthetic resin to be flame-retardant and is excellent in flame resistance and water resistance; a flame-retardant resin composition including it; and a molded article thereof. The flame retarding composition is powdery and includes a polyphosphate (A), the rate of particles (p2) having a particle diameter of 80 μm or more and less than 170 μm is 9 to 99.9% by volume in the flame retarding composition, the flame-retardant resin composition includes the flame retarding composition and a thermoplastic resin, and the molded article is formed using the flame-retardant resin composition.

IPC Classes  ?

• C08K 5/52 - Phosphorus bound to oxygen bound to oxygen only
• C08J 3/22 - Compounding polymers with additives, e.g. colouring using masterbatch techniques
• C08L 23/14 - Copolymers of propene
• C09K 21/12 - Organic materials containing phosphorus

Abstract

The purposes of a cereal flour composition according to the present invention are (1) to provide a bakery food product that offers a pleasant wheat-like aroma and flavor even if the cereal flour composition does not contain wheat flour or the wheat flour content is reduced, and (2) to provide a bakery food product having a suitable texture. Provided are: a cereal flour composition containing at least 35 mass% oat flour in terms of the cereal flour ingredients, said oat flour being a whole grain flour and preferably having a viscosity of 400 mPa·s or more as measured after adjusting the temperature of a 16.7 mass% water suspension of the oat flour to 25°C; a bakery dough containing the cereal flour composition; and a bakery food product that is a heated product of the bakery dough.

IPC Classes  ?

• A21D 13/04 - Products made from materials other than rye or wheat flour
• A21D 6/00 - Other treatment of flour or dough before baking, e.g. cooling, irradiating or heating
• A21D 13/02 - Products made from whole mealProducts containing bran or rough-ground grain
• A21D 13/066 - Gluten-free products

Abstract

The present disclosure provides: a blocked isocyanate composition which is characterized by containing a compound represented by formula (1) and a blocked isocyanate; and a resin composition which contains a compound represented by formula (1), a blocked isocyanate, and a thermoplastic resin. (In the formula, each of R1, R2, R3, and R4independently represents an organic group having 1 to 20 carbon atoms, the organic group is a substituted or unsubstituted hydrocarbon group, a group containing a substituted or unsubstituted heterocyclic ring, or a group that is obtained by substituting one or more methylene groups in the hydrocarbon group or the group containing a heterocyclic ring with a divalent group that is selected from the described below, Xb-represents a b-valent anion, a represents an integer of 1 to 3 inclusive, and b represents an integer of 1 to 3 inclusive. consists of -O-, -CO-, -COO-, -OCO-, -NR11-, -NR11CO-, and -S-, and R11 represents a hydrogen atom or a hydrocarbon group having 1 to 15 carbon atoms.)

IPC Classes  ?

• C08G 18/80 - Masked polyisocyanates
• C08G 18/02 - Polymeric products of isocyanates or isothiocyanates of isocyanates or isothiocyanates only
• C08K 5/29 - Compounds containing carbon-to-nitrogen double bonds
• C08K 5/50 - Phosphorus bound to carbon only
• C08L 101/00 - Compositions of unspecified macromolecular compounds

Abstract

Provided is a resin composition comprising: a component (A) that is a specific bismaleimide compound; a component (B) that is one or more compounds selected from the group consisting of a specific furan ring-containing compound and a specific anthracene compound; and a component (C) that is an epoxy compound excluding the component (B).

IPC Classes  ?

• C08G 59/40 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the curing agents used

Abstract

This composition contains a compound (A) having a structure obtained using an esterification reaction of a polybasic acid anhydride with an epoxy addition compound having a structure in which an unsaturated monobasic acid has been added to an epoxy compound represented by general formula (I), an epoxy compound (B), a thiol compound (C), a quaternary ammonium salt (D), a black pigment (E), and a polymerization initiator (F). The epoxy equivalent of the epoxy compound (B) is preferably 80 g/eq. to less than 300 g/eq. (See the description for the symbols in the formula.)

IPC Classes  ?

• C08G 59/40 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the curing agents used
• C08F 290/06 - Polymers provided for in subclass
• C08F 299/02 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
• G03F 7/004 - Photosensitive materials
• G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements

Abstract

The present invention provides an etching liquid composition which is capable of sufficiently etching a copper-containing layer in the depth direction, while sufficiently suppressing side etching.　The present invention specifically provides an etching liquid composition which is used for the purpose of etching a copper-containing layer, and which is an aqueous solution that contains (A) a compound represented by general formula (1) (in general formula (1), each of R1and R2independently represents a hydrogen atom, an amino group, a thiol group, a phenyl group, or a carboxy group, provided that in cases where one of R1and R2 is a hydrogen atom, the other is a thiol group, a phenyl group, or a carboxy group), (B) at least one component that is selected from the group consisting of a cupric ion and a ferric ion, (C) an acid, and water.

IPC Classes  ?

• C23F 1/18 - Acidic compositions for etching copper or alloys thereof
• H05K 3/06 - Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

Abstract

The purpose of the present invention is to provide a flame retardant that uses a small added amount of flame retardant and imparts excellent flame retardancy to a synthetic resin and to provide a method for achieving flame retardancy.　The present invention is a flame retardant for a synthetic resin, wherein the flame retardant contains component (A): an N-alkoxypiperidine compound having a structure represented by general formula (1) and component (B): a metal hydroxide, and the flame retardant is added so that the total content of component (A) and component (B) to the total amount of synthetic resin, component (A), and component (B) is in the 0.2 to 10 mass% range. [Formula 1] In general formula (1), R11represents a C1-30 alkyl group or a C5-12 cycloalkyl group, R12, R13, R14, and R15 each independently represent a C1-4 alkyl group, and * represents a bond.

IPC Classes  ?

• C08L 101/00 - Compositions of unspecified macromolecular compounds
• C08J 3/22 - Compounding polymers with additives, e.g. colouring using masterbatch techniques
• C08K 3/22 - OxidesHydroxides of metals
• C08K 5/3435 - Piperidines
• C09K 21/10 - Organic materials containing nitrogen

Abstract

In this lactic acid fermentation product of a fermentation raw material containing plant milk, the ratio of the content of potassium based on 1 part by mass of contained sodium is 0.5-10.0 parts by mass. The solid content in the lactic acid fermentation product is preferably 1.0%-55.0% by mass. It is also preferable that the fermentation raw material contain a saccharified liquid as the plant milk. It is also preferable that the fermentation raw material contain two or more kinds of plant milk. It is also preferable that 60.0% by mass or more of the solid content in the fermentation raw material be derived from plant milk.

IPC Classes  ?

• A23C 11/10 - Milk substitutes, e.g. coffee whitener compositions containing at least one non-milk component as source of fats or proteins containing or not lactose but no other milk components as source of fats, carbohydrates or proteins
• A23L 11/60 - Drinks from legumes, e.g. lupine drinks
• A23L 11/65 - Soy drinks
• A23L 2/00 - Non-alcoholic beveragesDry compositions or concentrates thereforPreparation or treatment thereof
• A23L 2/38 - Other non-alcoholic beverages
• A23L 5/00 - Preparation or treatment of foods or foodstuffs, in generalFood or foodstuffs obtained therebyMaterials therefor
• A23L 7/10 - Cereal-derived products
• A23L 11/50 - Fermented pulses or legumesFermentation of pulses or legumes based on the addition of microorganisms
• A23L 25/00 - Food consisting mainly of nutmeat or seedsPreparation or treatment thereof
• A21D 2/36 - Vegetable material
• A21D 13/00 - Finished or partly finished bakery products
• A23D 7/00 - Edible oil or fat compositions containing an aqueous phase, e.g. margarines

Abstract

Provided is a plant milk composition that contains a grain liquefied liquid and a grain saccharified liquid. Also provided is a method for producing a plant milk composition, the method being characterized by including mixing a grain liquefied liquid and a grain saccharified liquid. The grain in the grain liquefied liquid or in the grain saccharified liquid preferably contains oats. The raw material grain of the grain liquefied liquid and the raw material grain of the grain saccharified liquid are preferably the same. The solid content of the grain saccharified liquid is preferably 0.01-3 parts by mass with respect to 1 parts by mass of the solid content of the grain liquefied liquid. The grain liquefied liquid preferably has a sugar composition in which the content of the trisaccharide or higher polysaccharide is larger than the combined content of the monosaccharide and the disaccharide, and the grain saccharified liquid preferably has a sugar composition in which the combined content of the monosaccharide and the disaccharide is smaller than the content of the trisaccharide or higher polysaccharide.

IPC Classes  ?

• A23L 7/104 - Fermentation of farinaceous cereal or cereal materialAddition of enzymes or microorganisms
• A23C 11/10 - Milk substitutes, e.g. coffee whitener compositions containing at least one non-milk component as source of fats or proteins containing or not lactose but no other milk components as source of fats, carbohydrates or proteins
• A23L 2/00 - Non-alcoholic beveragesDry compositions or concentrates thereforPreparation or treatment thereof
• A23L 2/38 - Other non-alcoholic beverages
• A23L 2/52 - Adding ingredients
• A23L 2/60 - Sweeteners
• A23L 9/20 - Cream substitutes
• A23L 11/60 - Drinks from legumes, e.g. lupine drinks
• A23L 11/65 - Soy drinks
• A23L 27/00 - SpicesFlavouring agents or condimentsArtificial sweetening agentsTable saltsDietetic salt substitutesPreparation or treatment thereof
• A23L 29/30 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing carbohydrate syrupsFoods or foodstuffs containing additivesPreparation or treatment thereof containing sugarsFoods or foodstuffs containing additivesPreparation or treatment thereof containing sugar alcohols, e.g. xylitolFoods or foodstuffs containing additivesPreparation or treatment thereof containing starch hydrolysates, e.g. dextrin

Abstract

This disclosure provides: an electrode for a non-aqueous electrolyte secondary battery including a collector containing a porous metal and an organosulfur active material; a non-aqueous electrolyte secondary battery including the electrode as a positive electrode or a negative electrode; and an organosulfur active material to be used for production of the electrode.

IPC Classes  ?

• H01M 4/60 - Selection of substances as active materials, active masses, active liquids of organic compounds
• C08F 20/44 - Acrylonitrile
• H01M 4/02 - Electrodes composed of, or comprising, active material
• H01M 4/137 - Electrodes based on electro-active polymers
• H01M 4/66 - Selection of materials
• H01M 4/80 - Porous plates, e.g. sintered carriers
• H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodesLithium-ion batteries

Abstract

The present invention provides a composition comprising a compound having a structure represented by general formula (I), a structure represented by general formula (II), and an unsaturated bond-containing group, with the compound having two or more structures represented by general formula (I). (Where: R represents H, halogen, cyano, amino, OH, nitro, carboxyl, or C1-30 optionally substituted hydrocarbon group or methylene-substituted hydrocarbon group; a is 0-5; b is 0-5; a + b is 1 or greater; D and J each independently represent a single bond, a C1-30 optionally substituted hydrocarbon group or methylene-substituted hydrocarbon group; G and L each independently represent -O-, -S-, -NR101-, -CO-, -CO-O-, -O-CO-, CO-NR101-, -NR101-CO-, -CO-S- or –S-CO-; and R101 represents H, halogen, cyano, amino, OH, nitro, carboxyl, C1-10 hydrocarbon group or C2-10 heterocycle-containing group.)

IPC Classes  ?

• C08G 65/18 - Oxetanes
• C08G 59/12 - Polycondensates containing more than one epoxy group per molecule of polycarboxylic acids with epihalohydrins or precursors thereof

Abstract

Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a ruthenium compound represented by the following general formula (1): Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a ruthenium compound represented by the following general formula (1): Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a ruthenium compound represented by the following general formula (1): wherein R1 represents a hydrogen atom or a methyl group, and R2 and R3 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

IPC Classes  ?

• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Abstract

12122. (In general formula (1), X1, X2, and X3 each independently represent a substituted or unsubstituted phenylene group, and *, **, and *** represent sites that bond with other atoms.)

IPC Classes  ?

• C08L 101/00 - Compositions of unspecified macromolecular compounds
• C08K 5/3492 - Triazines
• C08L 23/00 - Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bondCompositions of derivatives of such polymers

Abstract

The present invention provides a cheese-like food which can achieve the following 1) to 3): 1) having a suppressed odd taste; 2) having a smooth texture and a refreshing sour taste; and 3) having favorable emulsion stability. The cheese-like food includes an emulsified composition containing: 1 to 10% by mass in terms of solid content of beans containing 50 to 90% by mass of a carbohydrate in the solid content; and 1 to 10% by mass of a swelling-inhibiting starch, and the cheese-like food has a pH of 3.5 to 7.5 and a water content of 45 to 70% by mass.

IPC Classes  ?

• A23C 20/02 - Cheese substitutes containing neither milk components, nor caseinate, nor lactose, as sources of fats, proteins or carbohydrates
• A23J 3/14 - Vegetable proteins

Abstract

The purpose of the present invention is to provide a novel external parasite control agent for animals and a novel internal parasite control agent for animals.　The present invention provides: a compound represented by general formula (1) (the symbols of which are as defined in the description) or a salt thereof; a pest control agent including said compound as an active ingredient; and a usage method therefor.

IPC Classes  ?

• C07D 213/38 - Radicals substituted by singly-bound nitrogen atoms having only hydrogen or hydrocarbon radicals attached to the substituent nitrogen atom
• A01N 35/06 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having two bonds to hetero atoms with at the most one bond to halogen, e.g. aldehyde radical containing keto or thioketo groups as part of a ring, e.g. cyclohexanone, quinoneDerivatives thereof, e.g. ketals
• A01N 43/10 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atom with one hetero atom five-membered rings with sulfur as the ring hetero atom
• A01N 43/16 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atom with one hetero atom six-membered rings with oxygen as the ring hetero atom
• A01N 43/40 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
• A01N 43/46 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom rings with more than six members
• A01N 43/54 - 1,3-DiazinesHydrogenated 1,3-diazines
• A01N 43/56 - 1,2-DiazolesHydrogenated 1,2-diazoles
• A01N 43/58 - 1,2-DiazinesHydrogenated 1,2-diazines
• A01N 43/78 - 1,3-ThiazolesHydrogenated 1,3-thiazoles
• A01N 43/80 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms, as ring hetero atoms five-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,2
• A01N 47/02 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid the carbon atom having no bond to a nitrogen atom
• A01N 47/06 - Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid the carbon atom having no bond to a nitrogen atom containing —O—CO—O— groupsThio-analogues thereof
• A01N 47/16 - Carbamic acid derivatives, i.e. containing the group —O—CO—NThio-analogues thereof the nitrogen atom being part of a heterocyclic ring
• A01P 5/00 - Nematocides
• A01P 7/04 - Insecticides
• A61K 31/136 - Amines, e.g. amantadine having aromatic rings, e.g. methadone having the amino group directly attached to the aromatic ring, e.g. benzeneamine
• A61K 31/341 - Heterocyclic compounds having oxygen as the only ring hetero atom, e.g. fungichromin having five-membered rings with one oxygen as the only ring hetero atom, e.g. isosorbide not condensed with another ring, e.g. ranitidine, furosemide, bufetolol, muscarine
• A61K 31/343 - Heterocyclic compounds having oxygen as the only ring hetero atom, e.g. fungichromin having five-membered rings with one oxygen as the only ring hetero atom, e.g. isosorbide condensed with a carbocyclic ring, e.g. coumaran, bufuralol, befunolol, clobenfurol, amiodarone
• A61K 31/351 - Heterocyclic compounds having oxygen as the only ring hetero atom, e.g. fungichromin having six-membered rings with one oxygen as the only ring hetero atom not condensed with another ring
• A61K 31/381 - Heterocyclic compounds having sulfur as a ring hetero atom having five-membered rings
• A61K 31/42 - Oxazoles
• A61K 31/426 - 1,3-Thiazoles
• A61K 31/4402 - Non-condensed pyridinesHydrogenated derivatives thereof only substituted in position 2, e.g. pheniramine, bisacodyl
• A61K 31/4439 - Non-condensed pyridinesHydrogenated derivatives thereof containing further heterocyclic ring systems containing a five-membered ring with nitrogen as a ring hetero atom, e.g. omeprazole
• A61K 31/444 - Non-condensed pyridinesHydrogenated derivatives thereof containing further heterocyclic ring systems containing a six-membered ring with nitrogen as a ring hetero atom, e.g. amrinone
• A61K 31/4965 - Non-condensed pyrazines
• A61K 31/497 - Non-condensed pyrazines containing further heterocyclic rings
• A61K 31/505 - PyrimidinesHydrogenated pyrimidines, e.g. trimethoprim
• A61K 31/506 - PyrimidinesHydrogenated pyrimidines, e.g. trimethoprim not condensed and containing further heterocyclic rings
• A61P 33/00 - Antiparasitic agents
• C07C 225/18 - Compounds containing amino groups and doubly-bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly-bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings the carbon skeleton containing also rings other than six-membered aromatic rings
• C07D 213/50 - Ketonic radicals
• C07D 213/69 - Two or more oxygen atoms
• C07D 213/74 - Amino or imino radicals substituted by hydrocarbon or substituted hydrocarbon radicals
• C07D 223/10 - Oxygen atoms attached in position 2
• C07D 231/12 - Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
• C07D 231/38 - Nitrogen atoms
• C07D 237/20 - Nitrogen atoms
• C07D 239/26 - Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
• C07D 239/42 - One nitrogen atom
• C07D 239/47 - One nitrogen atom and one oxygen or sulfur atom, e.g. cytosine
• C07D 241/12 - Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
• C07D 241/20 - Nitrogen atoms
• C07D 261/08 - Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings having two or more double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
• C07D 261/14 - Nitrogen atoms
• C07D 263/32 - Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
• C07D 277/28 - Radicals substituted by nitrogen atoms
• C07D 307/14 - Radicals substituted by nitrogen atoms not forming part of a nitro radical
• C07D 307/52 - Radicals substituted by nitrogen atoms not forming part of a nitro radical
• C07D 307/81 - Radicals substituted by nitrogen atoms not forming part of a nitro radical
• C07D 309/04 - Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
• C07D 311/74 - Benzo [b] pyrans, hydrogenated in the carbocyclic ring
• C07D 333/20 - Radicals substituted by singly bound hetero atoms other than halogen by nitrogen atoms
• C07D 333/22 - Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
• C07D 401/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring- member bond
• C07D 401/12 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
• C07D 401/14 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing three or more hetero rings
• C07D 403/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings directly linked by a ring-member-to-ring- member bond
• C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
• C07D 409/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
• C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
• C07D 413/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
• C07D 413/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings
• C07D 417/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
• C07D 417/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing three or more hetero rings

Abstract

A thin-film forming raw material contains a molybdenum compound represented by the following general formula (1), a method of forming a thin-film through use of the thin-film forming raw material, and a molybdenum compound having a specific structure: A thin-film forming raw material contains a molybdenum compound represented by the following general formula (1), a method of forming a thin-film through use of the thin-film forming raw material, and a molybdenum compound having a specific structure: where R1 represents an alkyl group having 1 to 5 carbon atoms or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, L1 represents a group represented by the following general formula (L-1) or (L-2), and “n” represents an integer of from 1 to 4, provided that when “n” represents 4, R1 represents a fluorine atom-containing alkyl group having 1 to 5 carbon atoms; A thin-film forming raw material contains a molybdenum compound represented by the following general formula (1), a method of forming a thin-film through use of the thin-film forming raw material, and a molybdenum compound having a specific structure: where R1 represents an alkyl group having 1 to 5 carbon atoms or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, L1 represents a group represented by the following general formula (L-1) or (L-2), and “n” represents an integer of from 1 to 4, provided that when “n” represents 4, R1 represents a fluorine atom-containing alkyl group having 1 to 5 carbon atoms; where R2 to R12 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, and * represents a bonding site.

IPC Classes  ?

• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• C07F 11/00 - Compounds containing elements of Groups 6 or 16 of the Periodic Table
• C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
• C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Goods & Services

Chemicals; antioxidants; nucleating agents as additives for synthetic resins; clarifying agents as additives for synthetic resins; chemical additives for lubricating synthetic resins; light stabilizers; ultraviolet absorbers; fire retardants; antistatic agents (excluding household use); heavy metal deactivator.

Goods & Services

Chemicals; antioxidants; nucleating agents as additives for synthetic resins; clarifying agents as additives for synthetic resins; chemical additives for lubricating synthetic resins; light stabilizers; ultraviolet absorbers; fire retardants; antistatic agents (excluding household use); heavy metal deactivator.

Abstract

The purpose of the present invention is to provide: a plasticizer that imparts excellent plasticity to a biodegradable resin; and a composition and a molded article that contain the plasticizer.　The present invention provides a plasticizer that contains a dibenzoate compound represented by general formula (1), has a hydroxyl value of 0.1-20 mgKOH/g, and is used in biodegradable resin. In the formula, R1represents a C1-8 alkanediyl group, and n represents an integer of 1-8.　R1 preferably represents a C2-3 alkylene group, and n preferably represents an integer of 1-3.

IPC Classes  ?

• C08L 101/00 - Compositions of unspecified macromolecular compounds
• C08K 5/103 - EstersEther-esters of monocarboxylic acids with polyalcohols
• C08L 101/16 - Compositions of unspecified macromolecular compounds the macromolecular compounds being biodegradable

Abstract

A clathrate compound obtained by mixing an imidazole compound (A) and a polyhydric phenol compound (B), wherein the clathrate compound has an average particle size (X) of 7 μm or less, and a maximum particle size (Y) of 40 μm or less. The imidazole compound (A) is preferably at least one selected from compounds represented by the following formula (1), A clathrate compound obtained by mixing an imidazole compound (A) and a polyhydric phenol compound (B), wherein the clathrate compound has an average particle size (X) of 7 μm or less, and a maximum particle size (Y) of 40 μm or less. The imidazole compound (A) is preferably at least one selected from compounds represented by the following formula (1), where R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group that has 1 to 20 carbon atoms and may have a substituent, or an aryl group that has 6 to 20 carbon atoms and may have a substituent, and the substituent is at least one selected from a halogen atom, a hydroxy group, and a nitrile group.

IPC Classes  ?

• C08G 59/62 - Alcohols or phenols
• C08G 59/40 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the curing agents used
• C08K 5/13 - PhenolsPhenolates
• C08K 5/3445 - Five-membered rings

Abstract

The purpose of the present invention is to provide a flame retardant that uses an N-alkyl type hindered amine compound and imparts excellent flame retardancy to a synthetic resin.　The present invention provides a flame retardant containing a hindered amine compound (A), wherein the hindered amine compound (A) is a compound represented by general formula (1).　In general formula (1), R1represents a carbonyl group or the like, R2represents a hydrocarbon group having 1-18 carbon atoms, and R3to R6 each independently represent an alkyl group having 1-4 carbon atoms.

IPC Classes  ?

• C09K 21/10 - Organic materials containing nitrogen
• C08K 5/17 - AminesQuaternary ammonium compounds
• C08K 5/51 - Phosphorus bound to oxygen
• C08K 5/3432 - Six-membered rings
• C08K 5/5313 - Phosphinic compounds, e.g. R2=P(:O)OR'
• C08K 5/5333 - Esters of phosphonic acids
• C08L 101/00 - Compositions of unspecified macromolecular compounds
• C09K 21/12 - Organic materials containing phosphorus

Abstract

The present invention provides: a compound which is represented by general formula (1); a starting material for thin film formation, the starting material comprising the compound; and a method for producing a thin film.　[Chemical formula 1] (In the formula, R1and R2each independently represent an alkyl group having 1 to 5 carbon atoms, A1represents an alkanediyl group having 1 to 8 carbon atoms, L1represents a group that is represented by general formula (L-1) or (L-2), M1represents a molybdenum atom or a tungsten atom; and α, β, and γ each independently represent an integer of 1 or more, wherein the sum of 2α, β, and γ is 6.)　[Chemical formula 2] (In the formula, R11to R13 each independently represent an alkyl group having 1 to 5 carbon atoms, and * represents a bond.)

IPC Classes  ?

• C07F 11/00 - Compounds containing elements of Groups 6 or 16 of the Periodic Table
• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Abstract

The purpose of the present invention is to improve richness of a wide variety of food or beverage products including a plant-based food product. This flavor improving agent contains 1-15 parts by mass of olive oil with respect to 1 part by mass of a fermentation by-product. The fermentation by-product is preferably a fermentation by-product of an alcoholic beverage. The olive oil is preferably unrefined olive oil. The flavor improving agent contains unsaponifiable matter preferably in an amount of 0.2-3.5 mass%, and preferably contains plant milk. A food or beverage product of the present invention contains 1-15 parts by mass of olive oil with respect to 1 part by mass of a fermentation by-product, and is preferably a plant-based food product. A method for improving the flavor of a food or beverage product of the present invention comprises a step for including a fermentation by-product and olive oil in a food or beverage product.

IPC Classes  ?

• A23L 27/00 - SpicesFlavouring agents or condimentsArtificial sweetening agentsTable saltsDietetic salt substitutesPreparation or treatment thereof
• A21D 2/14 - Organic oxygen compounds
• A21D 2/36 - Vegetable material
• A21D 13/00 - Finished or partly finished bakery products
• A21D 13/80 - Pastry not otherwise provided for elsewhere, e.g. cakes, biscuits or cookies
• A23D 7/00 - Edible oil or fat compositions containing an aqueous phase, e.g. margarines
• A23D 7/005 - Edible oil or fat compositions containing an aqueous phase, e.g. margarines characterised by ingredients other than fatty acid triglycerides
• A23L 7/10 - Cereal-derived products
• A23L 35/00 - Foods or foodstuffs not provided for in groups Preparation or treatment thereof

Goods & Services

Chemicals; antioxidants; nucleating agents as additives for synthetic resins; clarifying agents as additives for synthetic resins; chemical additives for lubricating synthetic resins; light stabilizers; ultraviolet absorbers; fire retardants; antistatic agents (excluding household use); heavy metal deactivator.

Goods & Services

Chemicals; antioxidants; nucleating agents as additives for synthetic resins; clarifying agents as additives for synthetic resins; chemical additives for lubricating synthetic resins; light stabilizers; ultraviolet absorbers; fire retardants; antistatic agents (excluding household use); heavy metal deactivator.

Abstract

An oil-in-water emulsion satisfies all of the following four criteria: the protein content is from 0.1 to 10 mass %; a marine-derived potassium salt is contained; the mass ratio between sodium and potassium (Na:K) is from 1:0.5 to 1:10; and the oil component content is from 0.3 to 49 mass %. Preferably, the non-fat milk solids content is less than 3 mass %. It is also preferable that the oil-in-water emulsion contains a plant-based milk, or contains a plant-derived protein material.

IPC Classes  ?

• A23C 11/10 - Milk substitutes, e.g. coffee whitener compositions containing at least one non-milk component as source of fats or proteins containing or not lactose but no other milk components as source of fats, carbohydrates or proteins
• A23L 9/20 - Cream substitutes
• A23L 27/20 - Synthetic spices, flavouring agents or condiments

Abstract

The present invention provides a composition, a coating composition, an article, a method for producing a composition, a light stabilizer monomer component, and a light stabilizer polymer. The present invention specifically provides a composition which is characterized by containing: a polymer that is obtained by polymerizing a monomer component containing a compound that is represented by general formula (1); and an aqueous dispersion medium. (In general formula (1), n1 represents 1 or 2; in cases where n1 is 1, X1represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 30 carbon atoms, or the like; in cases where n1 is 2, X1represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like; Y1represents a single bond or the like; Z1represents a single bond or the like; R3to R8each independently represent a substituted or unsubstituted monovalent hydrocarbon group having 1 to 30 carbon atoms; and at least one of X1and R1is a group that contains a vinyl group.) (In general formula (2), * denotes a site bonded to an oxygen atom, and R2 represents a hydrogen atom or the like.)

IPC Classes  ?

• C09D 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
• C09D 5/02 - Emulsion paints

Abstract

Provided is a reactive material, including a compound represented by the following general formula (1) or (2). Provided is a reactive material, including a compound represented by the following general formula (1) or (2). Provided is a reactive material, including a compound represented by the following general formula (1) or (2). In the formula (1), R1, R2, R3, and R4 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R1, R2, R3, or R4 represents the electron-withdrawing group. Provided is a reactive material, including a compound represented by the following general formula (1) or (2). In the formula (1), R1, R2, R3, and R4 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R1, R2, R3, or R4 represents the electron-withdrawing group. Provided is a reactive material, including a compound represented by the following general formula (1) or (2). In the formula (1), R1, R2, R3, and R4 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R1, R2, R3, or R4 represents the electron-withdrawing group. In the formula (2), R5 and R6 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R5 or R6 represents the electron-withdrawing group.

IPC Classes  ?

• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
• C23C 16/02 - Pretreatment of the material to be coated
• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Abstract

The present invention provides a metal alkoxide compound represented by the following general formula (1), a thin-film-forming raw material containing the same, and a thin film production method of forming a metal-containing thin film using the raw material: The present invention provides a metal alkoxide compound represented by the following general formula (1), a thin-film-forming raw material containing the same, and a thin film production method of forming a metal-containing thin film using the raw material:

IPC Classes  ?

• C07F 5/00 - Compounds containing elements of Groups 3 or 13 of the Periodic Table
• C23C 16/40 - Oxides
• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Abstract

A material for forming a film for a semiconductor provides a film having excellent heat resistance and solvent resistance. It contains: a compound represented by general formula (I) and having at least one reactive group, or a polymer including, as a monomer, a compound represented by general formula (I) below and having at least one reactive group; and a solvent. In the formula, A represents a hydrocarbon ring having 6 carbon atoms, X1 and X2 each represent an aryl group having 6-30 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R1-R4 and R6-R9 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R5 and R10 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group. A material for forming a film for a semiconductor provides a film having excellent heat resistance and solvent resistance. It contains: a compound represented by general formula (I) and having at least one reactive group, or a polymer including, as a monomer, a compound represented by general formula (I) below and having at least one reactive group; and a solvent. In the formula, A represents a hydrocarbon ring having 6 carbon atoms, X1 and X2 each represent an aryl group having 6-30 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R1-R4 and R6-R9 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R5 and R10 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group.

IPC Classes  ?

• C08J 5/18 - Manufacture of films or sheets
• C07D 487/04 - Ortho-condensed systems
• C08G 61/12 - Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule

Abstract

Provided is a cobalt compound represented by the following general formula (1): Provided is a cobalt compound represented by the following general formula (1): Provided is a cobalt compound represented by the following general formula (1): where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the following general formula (L-2); Provided is a cobalt compound represented by the following general formula (1): where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the following general formula (L-2); Provided is a cobalt compound represented by the following general formula (1): where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the following general formula (L-2); where R8 to R10 each independently represent an alkyl group having 1 to 5 carbon atoms, A1 and A2 each independently represent an alkanediyl group having 1 to 5 carbon atoms, and * represents a bonding site.

IPC Classes  ?

• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• C07F 15/06 - Cobalt compounds
• C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Abstract

The problem of the present invention is to provide a composition from which a cured product excellent in photoresist properties, mechanical properties (low curl, high adhesion), and heat resistance is obtained.　The present invention is: a composition containing a polyimide precursor having a radically polymerizable group and an acrylamide compound; a patterning material containing the composition; a cured product of the composition and a method for producing same; and an electronic component having the cured product. The composition preferably contains a latent additive having a structure in which the hydroxyl group of a phenolic antioxidant is protected. It is also preferable that the composition contain a radical polymerization initiator.

IPC Classes  ?

• C08F 283/04 - Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass on to polycarbonamides, polyesteramides or polyimides
• C08F 290/14 - Polymers provided for in subclass
• C08G 73/12 - Unsaturated polyimide precursors
• C08K 5/04 - Oxygen-containing compounds
• C08L 79/08 - PolyimidesPolyester-imidesPolyamide-imidesPolyamide acids or similar polyimide precursors
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

This antibacterial composition contains a photocationic polymerization initiator. The antibacterial composition preferably further contains an epoxy compound or an acrylic compound. The epoxy compound preferably contains an alicyclic epoxy compound, and an aromatic epoxy compound and/or an aliphatic epoxy compound. The epoxy compound preferably does not contain an alicyclic epoxy compound but contains an aromatic epoxy compound and an aliphatic epoxy compound. The acrylic compound preferably contains a compound which has a skeleton derived from dipentaerythritol and which includes three or more functional groups as the total of acrylic groups and methacrylic groups.

IPC Classes  ?

• A01N 25/00 - Biocides, pest repellants or attractants, or plant growth regulators, characterised by their forms, or by their non-active ingredients or by their methods of applicationSubstances for reducing the noxious effect of the active ingredients to organisms other than pests
• A01N 25/10 - Macromolecular compounds
• A01N 29/00 - Biocides, pest repellants or attractants, or plant growth regulators containing halogenated hydrocarbons
• A01N 31/08 - Oxygen or sulfur directly attached to an aromatic ring system
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• C08G 59/68 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the catalysts used
• C09D 4/02 - Acrylmonomers
• C09D 163/00 - Coating compositions based on epoxy resinsCoating compositions based on derivatives of epoxy resins
• C09D 201/00 - Coating compositions based on unspecified macromolecular compounds

Abstract

Provided is a urethane prepolymer composition which contains a urethane prepolymer obtained by reacting at least one polyol compound with at least one isocyanate compound, the urethane prepolymer composition being characterized in that the polyol compound contains a hydroxyl group-containing compound having an NSSN bond.

IPC Classes  ?

• C08G 18/38 - Low-molecular-weight compounds having hetero atoms other than oxygen
• C08G 18/10 - Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
• C08G 18/32 - Polyhydroxy compoundsPolyaminesHydroxy amines

Abstract

Provided is a resin composition containing: a component (A) which is composed of an epoxy resin that is in a solid state at 25°C; and a component (B) which is composed of one or more compounds selected from the group consisting of a polyether polyurethane prepolymer and a polyether polyurethane. Also provided is a method for producing a metal laminate, the method comprising: a step in which the resin composition is applied to the surface of a first metal plate so as to form a coating film; and a step in which a second metal plate is superposed on the coating film of the first metal plate so as to form a metal laminate.

IPC Classes  ?

• C08L 63/00 - Compositions of epoxy resinsCompositions of derivatives of epoxy resins
• B32B 15/08 - Layered products essentially comprising metal comprising metal as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
• C08G 18/08 - Processes
• C08G 18/10 - Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
• C08G 18/48 - Polyethers
• C08L 75/08 - Polyurethanes from polyethers
• C09D 163/00 - Coating compositions based on epoxy resinsCoating compositions based on derivatives of epoxy resins
• C09D 175/08 - Polyurethanes from polyethers
• C09J 163/00 - Adhesives based on epoxy resinsAdhesives based on derivatives of epoxy resins
• C09J 175/08 - Polyurethanes from polyethers

Abstract

The present invention provides: a method for producing a bio-derived ester compound having reduced odor; a bio-derived ester compound produced by the production method; a cosmetic or detergent containing the ester compound; and a method for reducing odor of an ester compound.

IPC Classes  ?

• C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
• C07B 61/00 - Other general methods
• C07C 29/34 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring increasing the number of carbon atoms by reactions without formation of hydroxy groups by condensation involving hydroxy groups or the mineral ester groups derived therefrom, e.g. Guerbet reaction
• C07C 31/125 - Monohydroxylic acyclic alcohols containing five to twenty-two carbon atoms
• C07C 69/24 - Esters of acyclic saturated monocarboxylic acids having the carboxyl group bound to an acyclic carbon atom or to hydrogen having three or more carbon atoms in the acid moiety esterified with monohydroxylic compounds
• C07C 69/84 - Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring

Abstract

A composition containing a compound (A) having a carboxyl group, an epoxy compound (B), a thiol compound (C), a tertiary amine compound (D) having a condensed ring and no NH group, a colorant (E), and a polymerization initiator (F). The epoxy equivalent of the epoxy compound (B) is preferably 80 g/eq. to less than 300 g/eq. The thiol compound (C) is preferably a secondary thiol compound. The colorant (E) is preferably sulfonic acid-treated carbon black.

IPC Classes  ?

• C08F 2/44 - Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
• C08F 290/06 - Polymers provided for in subclass
• C08G 59/50 - Amines
• C08G 59/66 - Mercaptans
• C08G 75/045 - Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
• G03F 7/004 - Photosensitive materials
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• G03F 7/031 - Organic compounds not covered by group

Abstract

A hybrid gel comprising a particulate decellularized tissue (obtained by pulverizing animal-derived biological tissues that are decellularized (decellularized biological tissues)), fibrinogen and thrombin; a cell culture material comprising the hybrid gel; a method for preparing the hybrid gel; and a kit comprising a particulate decellularized tissue and a biological tissue adhesive are provided. The hybrid gel of the present invention exerts the effect to promote differentiation and gain of function of stem cells and the therapeutic effect to a variety of diseases.

IPC Classes  ?

• A61L 27/52 - Hydrogels or hydrocolloids
• A61K 35/22 - UrineUrinary tract, e.g. kidney or bladderIntraglomerular mesangial cellsRenal mesenchymal cellsAdrenal gland
• A61K 35/30 - NervesBrainEyesCorneal cellsCerebrospinal fluidNeuronal stem cellsNeuronal precursor cellsGlial cellsOligodendrocytesSchwann cellsAstrogliaAstrocytesChoroid plexusSpinal cord tissue
• A61K 35/34 - MusclesSmooth muscle cellsHeartCardiac stem cellsMyoblastsMyocytesCardiomyocytes
• A61K 35/407 - LiverHepatocytes
• A61K 35/42 - Respiratory system, e.g. lungs, bronchi or lung cells
• A61K 38/36 - Blood coagulation or fibrinolysis factors
• A61K 38/48 - Hydrolases (3) acting on peptide bonds (3.4)
• A61L 27/22 - Polypeptides or derivatives thereof
• A61L 27/26 - Mixtures of macromolecular materials
• A61L 27/36 - Materials for prostheses or for coating prostheses containing ingredients of undetermined constitution or reaction products thereof
• A61L 27/54 - Biologically active materials, e.g. therapeutic substances
• C12N 5/00 - Undifferentiated human, animal or plant cells, e.g. cell linesTissuesCultivation or maintenance thereofCulture media therefor

Abstract

This compound has: at least one structure selected from a structure represented by general formula (I-I) and a structure represented by general formula (I-II); a structure represented by general formula (II); and a structure represented by general formula (III). X1and X2each independently represent a direct bond, C(R10122, O, CO, S or NR102; Y1each independently represent C(R20122, O, CO, S, N, or NR202. Note that when Y1 is N, a double bond is formed along the dotted line of formula (II). Other symbols in the formulas are as defined in the description.

IPC Classes  ?

• C07D 417/04 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing two hetero rings directly linked by a ring-member-to-ring- member bond
• C08L 101/00 - Compositions of unspecified macromolecular compounds
• G03F 7/004 - Photosensitive materials
• G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
• G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Abstract

A compound is represented by the following general formula (1), a thin-film forming raw material including the compound, a thin-film, and a method of producing a thin-film: A compound is represented by the following general formula (1), a thin-film forming raw material including the compound, a thin-film, and a method of producing a thin-film: wherein R1 to R4 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R5 and R6 each independently represent an alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 5 carbon atoms, L represents a group represented by the general formula (L-1) or (L-2) described herein, and M represents a hafnium atom, a zirconium atom, or a titanium atom, provided that in a case of a compound in which R5 and R6 each represent a methyl group, A represents an alkanediyl group having 2 carbon atoms, and M represents a titanium atom, L represents a group represented by the general formula (L-2).

IPC Classes  ?

• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

Abstract

A curing resin composition well balanced in curing properties and storage stability. The composition contains (A) an epoxy resin, (B) a curing agent, and (C) at least one of imide compounds represented by formulae (1-1), (1-2), and (1-3), wherein R11 represents an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.; R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group with 1 to 10 carbon atoms, etc.; and R12 and R13 each independently represent a hydrogen atom, an optionally substituted alkyl group with 1 to 10 carbon atoms, etc. A curing resin composition well balanced in curing properties and storage stability. The composition contains (A) an epoxy resin, (B) a curing agent, and (C) at least one of imide compounds represented by formulae (1-1), (1-2), and (1-3), wherein R11 represents an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.; R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group with 1 to 10 carbon atoms, etc.; and R12 and R13 each independently represent a hydrogen atom, an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.

IPC Classes  ?

• C08K 5/3415 - Five-membered rings
• C08G 59/50 - Amines

Abstract

A composition of the present invention contains a polyfunctional acrylic compound (A) having a condensed ring, a monofunctional acrylate compound (B), an epoxy compound (C), an oxetane compound (D), a cationic polymerization initiator (E), and a radical polymerization initiator (F), wherein the epoxy compound (C) contains an epoxy compound (C1) having a condensed ring, and the content of the epoxy compound (C1) relative to the epoxy compound (C) is 1-30 mass%. The polyfunctional acrylic compound (A) having a condensed ring is preferably a compound (A1) having a tricyclodecane skeleton.

IPC Classes  ?

• C08G 59/68 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the catalysts used
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• C08G 59/20 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the epoxy compounds used
• C08G 65/18 - Oxetanes

Abstract

Provided are: a nucleating agent composition capable of imparting excellent mechanical properties to a molded article containing a polyolefin-based resin; a resin composition containing the nucleating agent composition; the molded article having excellent mechanical properties; and a method for manufacturing the resin composition. The nucleating agent composition is characterized by containing at least one type of a nucleating agent for a polyolefin-based resin, wherein a β crystal fraction ranges from 0.2% to 71% as calculated by the following method. Through the use of a sample sampled from the pellets of the resin composition containing the nucleating agent composition, differential scanning calorimetry is performed according to a predetermined program to find a DSC curve, Q=f(θ), with the horizontal axis being temperature θ(° C.) and the vertical axis being heat flow rate Q(mW), and a baseline, g(θ), thereby obtaining a baseline-corrected DSC curve, Q′=h(θ)=f(θ)−g(θ). Subsequently, according to a predetermined procedure, a line area St and a β crystal area Sβ are found, thereby calculating the β crystal fraction (%). Provided are: a nucleating agent composition capable of imparting excellent mechanical properties to a molded article containing a polyolefin-based resin; a resin composition containing the nucleating agent composition; the molded article having excellent mechanical properties; and a method for manufacturing the resin composition. The nucleating agent composition is characterized by containing at least one type of a nucleating agent for a polyolefin-based resin, wherein a β crystal fraction ranges from 0.2% to 71% as calculated by the following method. Through the use of a sample sampled from the pellets of the resin composition containing the nucleating agent composition, differential scanning calorimetry is performed according to a predetermined program to find a DSC curve, Q=f(θ), with the horizontal axis being temperature θ(° C.) and the vertical axis being heat flow rate Q(mW), and a baseline, g(θ), thereby obtaining a baseline-corrected DSC curve, Q′=h(θ)=f(θ)−g(θ). Subsequently, according to a predetermined procedure, a line area St and a β crystal area Sβ are found, thereby calculating the β crystal fraction (%). β ⁢ crystal ⁢ fraction = S β / S t × 100 ⁢ ( % )

IPC Classes  ?

• B29B 7/28 - Component parts, details or accessoriesAuxiliary operations for measuring, controlling or regulating, e.g. viscosity control
• B29B 7/18 - MixingKneading non-continuous, with mechanical mixing or kneading devices, i.e. batch type with movable mixing or kneading devices rotary with more than one shaft
• B29B 7/82 - Heating or cooling
• B29B 9/10 - Making granules by moulding the material, i.e. treating it in the molten state
• B29K 23/00 - Use of polyalkenes as moulding material
• C08K 5/098 - Metal salts of carboxylic acids
• C08K 5/134 - Phenols containing ester groups
• C08K 5/3437 - Six-membered rings condensed with carbocyclic rings
• C08K 5/524 - Esters of phosphorous acids, e.g. of H3PO3

Abstract

The present invention achieves a bakery food that is crispy yet soft and smooth in the mouth, and also provides bakery dough demonstrating good physical properties when producing the bakery food. This bakery food improver contains 50% to 90% by mass of degreased concentrated milk having a solid content of 35% by mass or more, wherein among all particles of the improver, particles having a particle size in the range of 0.2 to 1.0 μm constitute 70% or more, according to a laser diffraction particle size distribution measurement.

IPC Classes  ?

• A21D 2/34 - Animal material
• A21D 2/14 - Organic oxygen compounds
• A21D 2/26 - Proteins
• A21D 10/00 - Batters, dough or mixtures before baking
• A21D 13/00 - Finished or partly finished bakery products

Abstract

Provided is a thin-film forming raw material, including an alkoxide compound represented by the following general formula (1): Provided is a thin-film forming raw material, including an alkoxide compound represented by the following general formula (1): Provided is a thin-film forming raw material, including an alkoxide compound represented by the following general formula (1): where R1 to R4 each independently represent an alkyl group having 1 to 5 carbon atoms, M represents a rare earth metal atom, and “n” represents a valence of the rare earth metal atom.

IPC Classes  ?

• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

Abstract

An epoxy material that provides a cured product having a reduced modulus of elasticity and thereby maintaining reliability even under conditions of wide environmental variation. The epoxy resin composition provided includes (A) an epoxy compound A of formula (1) below, (B) phenyl glycidyl ether substituted with a C6-20 hydrocarbon group, and (C) a curing agent. In formula (1), R1 and R2 each independently represent C2-4 alkylene; R3 represents methylene or —C(CH3)2—; and a and b each independently represent a number of 1 to 10. An epoxy material that provides a cured product having a reduced modulus of elasticity and thereby maintaining reliability even under conditions of wide environmental variation. The epoxy resin composition provided includes (A) an epoxy compound A of formula (1) below, (B) phenyl glycidyl ether substituted with a C6-20 hydrocarbon group, and (C) a curing agent. In formula (1), R1 and R2 each independently represent C2-4 alkylene; R3 represents methylene or —C(CH3)2—; and a and b each independently represent a number of 1 to 10.

IPC Classes  ?

• C08G 59/22 - Di-epoxy compounds
• C08G 59/24 - Di-epoxy compounds carbocyclic
• C08G 59/50 - Amines
• C08G 59/66 - Mercaptans

Abstract

The present invention addresses the problem of providing a resin additive having excellent heat resistance and excellent resin stabilization performance.　The present invention is a resin additive containing a compound represented by general formula (1). In general formula (1): R1represents an alkyl group having 26-40 carbon atoms, an alkenyl group having 26-40 carbon atoms, or a group represented by general formula (2); and n represents an integer of 1 or 2. When n is 2, the plurality of R1s may be the same or different from each other. In general formula (2): R2 represents a hydrogen atom or an alkyl group having 1-18 carbon atoms; m represents an integer that makes the number-average molecular weight of the group represented by general formula (2) equal to 100-10,000; and * represents a bond.

IPC Classes  ?

• C08L 101/00 - Compositions of unspecified macromolecular compounds
• C07F 9/09 - Esters of phosphoric acids
• C08K 5/521 - Esters of phosphoric acids, e.g. of H3PO4

Abstract

A thermoplastic resin composition for FDM additive manufacturing containing 100 parts by mass of a thermoplastic resin, 0.01 to 5 parts by mass of a primary antioxidant, and 0.01 to 1.4 parts by mass of a secondary antioxidant. The thermoplastic resin is a condensation thermoplastic resin. The primary antioxidant is a phenol antioxidant having at least one structure represented by formula (1). The secondary antioxidant is at least one of a phosphorus antioxidant represented by formula (2), (3), or (4) given in the description and a thioether antioxidant represented by formula (5) or (6) given in the description. A thermoplastic resin composition for FDM additive manufacturing containing 100 parts by mass of a thermoplastic resin, 0.01 to 5 parts by mass of a primary antioxidant, and 0.01 to 1.4 parts by mass of a secondary antioxidant. The thermoplastic resin is a condensation thermoplastic resin. The primary antioxidant is a phenol antioxidant having at least one structure represented by formula (1). The secondary antioxidant is at least one of a phosphorus antioxidant represented by formula (2), (3), or (4) given in the description and a thioether antioxidant represented by formula (5) or (6) given in the description. A thermoplastic resin composition for FDM additive manufacturing containing 100 parts by mass of a thermoplastic resin, 0.01 to 5 parts by mass of a primary antioxidant, and 0.01 to 1.4 parts by mass of a secondary antioxidant. The thermoplastic resin is a condensation thermoplastic resin. The primary antioxidant is a phenol antioxidant having at least one structure represented by formula (1). The secondary antioxidant is at least one of a phosphorus antioxidant represented by formula (2), (3), or (4) given in the description and a thioether antioxidant represented by formula (5) or (6) given in the description. In formula (1), R11 and R12 each independently represent hydrogen or methyl; and * indicates a bond.

IPC Classes  ?

• C08K 5/13 - PhenolsPhenolates
• B33Y 70/00 - Materials specially adapted for additive manufacturing
• C08K 5/12 - EstersEther-esters of cyclic polycarboxylic acids
• C08K 5/1575 - Six-membered rings
• C08K 5/372 - Sulfides
• C08K 5/524 - Esters of phosphorous acids, e.g. of H3PO3
• C08K 5/527 - Cyclic esters

Abstract

The present invention pertains to a thin film manufacturing method and a thin film forming material, by which a bismuth metal thin film or an antimony metal thin film is formed by using a compound represented by general formula (1) and a compound represented by general formula (2). (In general formula (1), M1represents a trivalent bismuth or a trivalent antimony.) (In general formula (2), M2represents a trivalent bismuth or a trivalent antimony, and L1, L2, and L3each independently represent an alkyl group having 1-10 carbon atoms, a halogen atom, an alkoxy group having 1-10 carbon atoms, or a group represented by general formula (3). However, M1and M2are the same metal.) (In general formula (3), R1and R2each independently represent a hydrogen atom, an alkyl group having 1-10 carbon atoms, or -SiR3R4R5, R3, R4, and R5each independently represent an alkyl group having 1-10 carbon atoms, and * represents a binding site with respect to M2.)

IPC Classes  ?

• C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
• C07F 9/90 - Antimony compounds
• C07F 9/94 - Bismuth compounds
• C07F 19/00 - Metal compounds according to more than one of main groups

Abstract

Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof. Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof. A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1): Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof. A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1): Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof. A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1): (in the formula (1), R1 to R4 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 9 carbon atoms, and R5 represents an alkylidene group having 1 to 4 carbon atoms) and a fatty acid sodium salt (B) represented by the following general formula (2): Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof. A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1): (in the formula (1), R1 to R4 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 9 carbon atoms, and R5 represents an alkylidene group having 1 to 4 carbon atoms) and a fatty acid sodium salt (B) represented by the following general formula (2): Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof. A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1): (in the formula (1), R1 to R4 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 9 carbon atoms, and R5 represents an alkylidene group having 1 to 4 carbon atoms) and a fatty acid sodium salt (B) represented by the following general formula (2): (in the formula (2), R6 represents a group introduced from an aliphatic organic acid having 7 to 30 carbon atoms), and the mass ratio of (B)/(A) is 0.55 to 2.0.

IPC Classes  ?

• C08K 5/521 - Esters of phosphoric acids, e.g. of H3PO4
• C08F 10/06 - Propene
• C08F 210/02 - Ethene
• C08F 220/10 - Esters
• C08K 3/34 - Silicon-containing compounds
• C08K 5/098 - Metal salts of carboxylic acids
• C08K 5/524 - Esters of phosphorous acids, e.g. of H3PO3
• C08K 5/527 - Cyclic esters
• C08K 13/02 - Organic and inorganic ingredients
• C08L 23/00 - Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bondCompositions of derivatives of such polymers
• C08L 31/00 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid, or of a haloformic acidCompositions of derivatives of such polymers
• C08L 101/00 - Compositions of unspecified macromolecular compounds

Abstract

The present invention provides: a resin composition which has excellent weather resistance and heat resistance; a molded article; a waterproof sheet; a method for producing a resin composition; a method for improving the weather resistance and the heat resistance of a resin composition; and a light stabilizer.　A resin composition according to the present invention is characterized by containing (A) a synthetic resin, (B) a hindered amine light stabilizer and (C) a benzoate light stabilizer, and is also characterized in that: the synthetic resin (A) contains a polyolefin resin; the polyolefin resin contains a polyolefin plastomer; and the content of the polyolefin plastomer in the polyolefin resin is 40% by mass or more of the total amount of the polyolefin resin.

IPC Classes  ?

• C08L 23/02 - Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bondCompositions of derivatives of such polymers not modified by chemical after-treatment
• C08J 5/18 - Manufacture of films or sheets
• C08K 5/134 - Phenols containing ester groups
• C08K 5/3432 - Six-membered rings
• C08L 23/14 - Copolymers of propene
• C08L 101/00 - Compositions of unspecified macromolecular compounds

Abstract

The present invention provides: an etching liquid composition which is capable of forming a layer having excellent surface flatness by etching a layer that contains ruthenium; and an etching method and a method for producing a base material, each using this composition. Provided is an etching liquid composition which is used for the purpose of etching a layer that contains ruthenium. This etching liquid composition contains (A) a ferricyanide, (B) at least one substance that is selected from the group consisting of sodium hydroxide and potassium hydroxide, and water. Also provided are an etching method and a method for producing a base material, each of which comprises a step of etching a layer that contains ruthenium with use of this composition.

IPC Classes  ?

• H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
• C23F 1/40 - Alkaline compositions for etching other metallic material
• H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching

Abstract

The present disclosure provides a compound represented by general formula (1), a raw material for thin film formation containing said compound, a thin film formed from the material for thin film formation, and a method for producing a thin film. (In the formula, R1and R2each independently represent a C1-8 alkyl group, and R3represents a hydrogen atom or a C1-5 alkyl group. However, R1and R2 are different groups.)

IPC Classes  ?

• C07C 257/12 - Compounds containing carboxyl groups, the doubly-bound oxygen atom of a carboxyl group being replaced by a doubly-bound nitrogen atom, this nitrogen atom not being further bound to an oxygen atom, e.g. imino-ethers, amidines with replacement of the other oxygen atom of the carboxyl group by nitrogen atoms, e.g. amidines having carbon atoms of amidino groups bound to hydrogen atoms
• C07F 5/00 - Compounds containing elements of Groups 3 or 13 of the Periodic Table
• C23C 16/06 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
• C23C 16/34 - Nitrides
• C23C 16/40 - Oxides

Abstract

There is provided a composition that makes it possible to produce a cured product having a low volume resistance value, a cured product obtained by curing the composition, and a method for producing a cured product using the composition. The composition contains a component (A): at least metal particles selected from the group consisting of copper particles and silver particles, a component (B): at least one cashew component selected from the group consisting of cashew oils and cashew oil-modified resins, and a component (C): a curing agent. The cured product is obtained by curing the composition. The method for producing a cured product includes a coating step of coating a substrate with the composition and a curing step of heating the substrate coated with the composition to cure the composition.

IPC Classes  ?

• C08K 3/08 - Metals
• C08J 7/04 - Coating
• C08K 5/00 - Use of organic ingredients
• C08K 9/04 - Ingredients treated with organic substances
• C08L 63/00 - Compositions of epoxy resinsCompositions of derivatives of epoxy resins

Abstract

Provided is a composition containing (A) at least one selected from the group consisting of compounds represented by general formula (1) and compounds represented by general formula (2), (B) at least one selected from the group consisting of methacrylate compounds and acrylate compounds that are different from said (A), and (C) a photoradical initiator.　[Chem. 1] R11and R12each independently represent a hydrogen atom or a methyl group, and X11and X12each independently represent a direct bond, an aliphatic hydrocarbon group having 1-20 carbon atoms, or the like. n1 represents an integer of 1-5.　[Chem. 2] R21, R22, R23, and R24 each independently represent a hydrogen atom, an aliphatic hydrocarbon group having 1-20 carbon atoms, or the like. n2 represents an integer of 1-10.

IPC Classes  ?

• C08F 220/38 - Esters containing sulfur
• C08F 220/20 - Esters of polyhydric alcohols or phenols
• C08F 290/06 - Polymers provided for in subclass
• C09D 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen

Abstract

This flame-retardant composition contains: one or more melamine salt (A) components selected from the group consisting of melamine orthophosphate, melamine pyrophosphate, and melamine polyphosphate; one or more piperazine salt (B) components selected from the group consisting of piperazine orthophosphate, piperazine pyrophosphate, and piperazine polyphosphate; and one or more dialkylphosphinate compound (C) components represented by general formula (1). The content of the (C) component is 0.2 mass% to 39 mass% in 100 mass% of the total of the (A) component, the (B) component, and the (C) component.

IPC Classes  ?

• C09K 21/12 - Organic materials containing phosphorus
• C08K 5/52 - Phosphorus bound to oxygen bound to oxygen only
• C08L 101/00 - Compositions of unspecified macromolecular compounds

Abstract

The purpose of the present invention is to provide a decellularized graft that can be easily produced.　The present invention provides: a decellularized cell aggregate in which decellularization is applied to a cultured cell aggregate, the decellularized cell aggregate having 3-45 surface pores having pore diameters equal to or greater than 5 µm per aggregate surface of 11088 μm2; and/or a decellularized cell aggregate in which decellularization is applied to a cultured cell aggregate, the decellularized cell aggregate containing 10 pg/mg or more of lamin. The above problem can be solved by said decellularized cell aggregates.

IPC Classes  ?

• C12N 1/00 - Microorganisms, e.g. protozoaCompositions thereofProcesses of propagating, maintaining or preserving microorganisms or compositions thereofProcesses of preparing or isolating a composition containing a microorganismCulture media therefor
• A61L 27/36 - Materials for prostheses or for coating prostheses containing ingredients of undetermined constitution or reaction products thereof
• A61L 27/38 - Animal cells
• A61L 27/40 - Composite materials, i.e. layered or containing one material dispersed in a matrix of the same or different material
• C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus
• C12N 5/10 - Cells modified by introduction of foreign genetic material, e.g. virus-transformed cells

Abstract

Provided is imitation cheese that has good flavor, excellent processability, remains stable for a long time so that the processability is not readily lost as time passes after production, and has good heat melting properties by which the cheese melts when heated but becomes gooey just to the extent that it does not flow out. The imitation cheese contains (A) nuts and seeds, (B) oxidatively treated starch, (C) hydroxypropylated starch, and (D) oil/fat. The imitation cheese satisfies the following condition 1 and has a pH of 3.0 to 6.0. (Condition 1) The content of tri-saturated triglyceride in a triglyceride composition of the oil phase, the tri-saturated triglyceride being composed only of C12-22 saturated fatty acid residues, is 30.0 to 70.0 mass%.

IPC Classes  ?

• A23C 20/02 - Cheese substitutes containing neither milk components, nor caseinate, nor lactose, as sources of fats, proteins or carbohydrates
• A23J 3/00 - Working-up of proteins for foodstuffs

Abstract

Provided is a tin compound, which is represented by the following general formula (1): Provided is a tin compound, which is represented by the following general formula (1): in the formula (1), R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms or an alkylsilyl group having 3 to 12 carbon atoms, R3 and R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and R5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

IPC Classes  ?

• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
• C07F 7/22 - Tin compounds
• C23C 16/40 - Oxides
• C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

Abstract

Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1): Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1): M(R1)x1[A1-N(R2)(R3)]y1   (1) Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1): M(R1)x1[A1-N(R2)(R3)]y1   (1) in the formula (1), R1, R2, and R3 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms, A1 represents a linear or branched alkylene group having 1 to 5 carbon atoms, x1 represents an integer of from 0 to 2, y1 represents an integer of from 1 to 3, and M represents an indium atom or a zinc atom, provided that when M represents an indium atom, a compound in which x1 represents 2, y1 represents 1, and R1, R2, and R3 each represent a methyl group is excluded.

IPC Classes  ?

• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Abstract

The present invention provides a sulfur-containing material for positive electrode active materials for lithium ion secondary batteries; and this sulfur-containing material for positive electrode active materials is characterized by containing a sulfur-modified compound and by being used while setting the end-of-discharge potential of the positive electrode to less than 1.0 V (Li+/Li) in the charge and discharge cycle of a lithium ion secondary battery.

IPC Classes  ?

• H01M 4/60 - Selection of substances as active materials, active masses, active liquids of organic compounds
• H01M 4/136 - Electrodes based on inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy
• H01M 4/137 - Electrodes based on electro-active polymers
• H01M 4/1397 - Processes of manufacture of electrodes based on inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy
• H01M 4/1399 - Processes of manufacture of electrodes based on electro-active polymers
• H01M 4/38 - Selection of substances as active materials, active masses, active liquids of elements or alloys
• H01M 10/052 - Li-accumulators
• H01M 10/058 - Construction or manufacture

Abstract

Provided is a lithium ion secondary battery manufacturing method that is characterized by having: a charge/discharge processing step for performing charge/discharge processing of a first lithium ion secondary battery that includes a positive electrode, a first liquid electrolyte, and a negative electrode, said positive electrode having a positive electrode active material layer that includes a sulfur-modified compound; and an exchange step for exchanging the first liquid electrolyte for a second liquid electrolyte after the charge/discharge processing step, to obtain a second lithium ion secondary battery, wherein the first liquid electrolyte includes a solvent selected from the group consisting of saturated cyclic carbonate compounds and saturated straight-chain carbonate compounds, and the second liquid electrolyte includes a solvent selected from the group consisting of saturated cyclic ether compounds and saturated straight-chain ether compounds.

IPC Classes  ?

• H01M 10/058 - Construction or manufacture
• H01M 4/137 - Electrodes based on electro-active polymers
• H01M 4/60 - Selection of substances as active materials, active masses, active liquids of organic compounds
• H01M 10/052 - Li-accumulators
• H01M 10/0569 - Liquid materials characterised by the solvents

Abstract

A curing resin composition including (A) a cyanate ester resin, (B) an epoxy resin, (C) an active hydrogen-containing amine latent curing agent, and (D) an ion scavenger. The cyanate ester resin (A) is preferably at least one of a compound of formula (1) below, a compound of formula (2) below, and a polymer of at least one of these compounds (1) and (2). A curing resin composition including (A) a cyanate ester resin, (B) an epoxy resin, (C) an active hydrogen-containing amine latent curing agent, and (D) an ion scavenger. The cyanate ester resin (A) is preferably at least one of a compound of formula (1) below, a compound of formula (2) below, and a polymer of at least one of these compounds (1) and (2). NC—O-A1-Y1-A2-O—CN  (1) wherein the symbols are as defined in the description. A curing resin composition including (A) a cyanate ester resin, (B) an epoxy resin, (C) an active hydrogen-containing amine latent curing agent, and (D) an ion scavenger. The cyanate ester resin (A) is preferably at least one of a compound of formula (1) below, a compound of formula (2) below, and a polymer of at least one of these compounds (1) and (2). NC—O-A1-Y1-A2-O—CN  (1) wherein the symbols are as defined in the description. wherein the symbols are as defined in the description.

IPC Classes  ?

• C08G 59/24 - Di-epoxy compounds carbocyclic
• C08G 59/28 - Di-epoxy compounds containing acyclic nitrogen atoms
• C08G 59/34 - Epoxy compounds containing three or more epoxy groups obtained by epoxidation of an unsaturated polymer
• C08G 59/50 - Amines
• C08G 59/56 - Amines together with other curing agents
• C08K 3/08 - Metals
• C08K 3/36 - Silica
• C08L 61/14 - Modified phenol-aldehyde condensates
• C09J 163/08 - Epoxidised polymerised polyenes

Abstract

Disclosed is a curable resin composition containing: (A) a cyanate ester resin; (B) an epoxy resin essentially including at least a 4-amino-3-methylphenol-type epoxy resin; and (C) a latent curing agent. Preferably, the cyanate ester resin (A) is at least one selected from the group consisting of compounds represented by formula (1) below, compounds represented by formula (2) below, and at least one of polymer of these compounds. Formula (1): NC—O-A1-Y1-A2-O—CN (See the Description for the symbols in the formula). Formula (2): (See the Description for the symbols in the formula).

IPC Classes  ?

• C08G 59/24 - Di-epoxy compounds carbocyclic
• C08G 59/32 - Epoxy compounds containing three or more epoxy groups
• C08G 59/34 - Epoxy compounds containing three or more epoxy groups obtained by epoxidation of an unsaturated polymer
• C08G 59/50 - Amines
• C08G 59/56 - Amines together with other curing agents
• C08K 3/36 - Silica
• C08K 5/5419 - Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
• C08L 61/14 - Modified phenol-aldehyde condensates
• C09J 163/08 - Epoxidised polymerised polyenes

Abstract

A non-aqueous electrolyte power storage device in which a coating material having a silanol group is present at least on a surface of an electrode active material layer and a sulfur-based material is contained in a cell, the electrode active material layer contains an electrode active material and a resin-based binder, the electrode active material is an active material capable of being alloyed with a metal element identical to an ion species responsible for electrical conduction or an active material capable of absorbing ions responsible for electrical conduction, and the coating material having a silanol group is a silicate containing a siloxane bond as a component or a silica fine particle aggregate (containing a siloxane bond as a component).

IPC Classes  ?

• H01M 10/0562 - Solid materials
• H01M 4/04 - Processes of manufacture in general
• H01M 4/36 - Selection of substances as active materials, active masses, active liquids
• H01M 4/02 - Electrodes composed of, or comprising, active material

Abstract

This compound is a compound represented by general formula (I). (In the formula, X represents a hydrogen atom, an optionally substituted cyclic group in which the number of carbon atoms in the cyclic structure is 2-20, an optionally substituted C1-20 chain hydrocarbon group, etc.; R1-R7represent a hydrogen atom, a reactive group selected from < group A >, an optionally substituted C1-20 alkyl group, an optionally substituted C6-20 aromatic cyclic group, etc.; < group A > is a carbon-carbon unsaturated bond-bearing group, cyclic ether group, hydroxyl group, mercapto group, amino group, halogen atom, and cyano group; a represents an integer from 1-10; R1and R2may be bonded to each other to form a ring, R3and R4may be bonded to each other to form a ring, R4and R5may be bonded to each other to form a ring, R5and R6may be bonded to each other to form a ring, and the R7and R7 present in a plurality may be bonded to each other to form a ring; and at least one reactive group selected from < group A > is present in the molecule. Refer to the Description for additional definitions.)

IPC Classes  ?

• C07D 221/18 - Ring systems of four or more rings
• C07D 401/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring- member bond
• C08G 59/40 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the curing agents used

Goods & Services

Adhesives used in industry; unprocessed plastics in primary form; epoxy resins; polyurethane resins; chemical agents; epoxy resin curing agents; curing agents for insulating resins. Resin based electrical insulating materials; electrical insulating materials; plastic semi-worked products; plastic semi-worked products in sheet, film, foil and tape forms; laminated plastic sheets and plastic films; plastic sheets and plastic films with adhesive layers; laminated plastic sheets; laminated plastic films; plastic semi-worked products in the form of polyethylene sheet.

Goods & Services

Adhesives used in industry; unprocessed plastics in primary form; epoxy resins; polyurethane resins; chemical agents; epoxy resin curing agents; curing agents for insulating resins. Resin based electrical insulating materials; electrical insulating materials; plastic semi-worked products; plastic semi-worked products in sheet, film, foil and tape forms; laminated plastic sheets and plastic films; plastic sheets and plastic films with adhesive layers; laminated plastic sheets; laminated plastic films; plastic semi-worked products in the form of polyethylene sheet.

Abstract

Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group represented by any one of the general formulae (L-1) to (L-3), and n represents an integer of from 1 to 5: Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group represented by any one of the general formulae (L-1) to (L-3), and n represents an integer of from 1 to 5: Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group represented by any one of the general formulae (L-1) to (L-3), and n represents an integer of from 1 to 5: where m1 to m3 each independently represent an integer of from 1 to 5, and * represents a bonding site.

IPC Classes  ?

• C07D 251/32 - Cyanuric acidIsocyanuric acid
• C25D 3/38 - ElectroplatingBaths therefor from solutions of copper

Abstract

Provided is a conductive undercoating agent, including: a conductive carbon material; a binding agent; and a solvent, wherein the conductive carbon material is flaked graphite having an average thickness of from 10 nm to 200 nm and a specific surface area of from 10 m2/g to 40 m2/g.

IPC Classes  ?

• H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
• H01M 4/04 - Processes of manufacture in general
• H01M 4/66 - Selection of materials

Abstract

The present invention provides a method for producing a bio-derived branched alkyl glyceryl ether, the method comprising: a step for producing a bio-derived branched primary alcohol having a branched alkyl group having 6 to 12 carbon atoms, the step including dimerizing at least one component selected from the group consisting of a bio-derived linear primary alcohol having a linear alkyl group having 3 to 6 carbon atoms, a bio-derived linear primary alcohol having a linear alkenyl group having 3 to 6 carbon atoms, a bio-derived linear aldehyde having a linear alkyl group having 3 to 6 carbon atoms, and a bio-derived linear aldehyde having a linear alkenyl group having 3 to 6 carbon atoms; and a step for producing a bio-derived branched alkyl glyceryl ether using the bio-derived branched primary alcohol. The present invention also provides a bio-derived branched alkyl glyceryl ether produced by the method.

IPC Classes  ?

• C07C 41/26 - Preparation of ethers by reactions not forming ether-oxygen bonds by introduction of hydroxy or O-metal groups

Abstract

A polymerizable composition includes a water-soluble monofunctional acrylamide compound, a water-soluble photoradical initiator, a water-soluble photosensitizer, and an aqueous solvent.

IPC Classes  ?

• C08F 20/58 - Amides containing oxygen in addition to the carbonamido oxygen
• C09D 4/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
• C09D 11/101 - Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
• C09D 11/106 - Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
• C09D 11/322 - Pigment inks
• C09D 11/38 - Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes

Abstract

Provided is a compound represented by formula (1). (In the formula, R1represents a hydrogen atom or a methyl group; R2represents an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an aryl group which may have a substituent, or a halogen atom; R3represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a hydroxymethyl group, a glycidyl ether group, a methyl glycidyl ether group, an acryloyloxymethyl group or a methacryloyloxymethyl group; R4 represents a hydrogen atom or a methyl group; the substituent is a group selected from an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms and a halogen atom; and n represents a numerical value of 0 to 4.)

IPC Classes  ?

• C07D 407/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
• C08F 20/32 - Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
• C08G 59/20 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the epoxy compounds used

Abstract

Disclosed is a charge transfer complex capable of obtaining a curable resin composition having an excellent balance between curability and storage stability when used as an epoxy-resin curing agent. The charge transfer complex has an imidazole moiety as an electron donor moiety. The charge transfer complex may be an assembly wherein electrons included in a compound (a) having an imidazole moiety are accepted by a compound (b) having an electron acceptor moiety, or may be a compound having an imidazole moiety and an electron acceptor moiety in its molecule, and the electron acceptor moiety accepts electrons included in the imidazole moiety.

IPC Classes  ?

• C07D 403/06 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
• C08G 59/50 - Amines
• H01B 1/12 - Conductors or conductive bodies characterised by the conductive materialsSelection of materials as conductors mainly consisting of other non-metallic substances organic substances

Abstract

Provided is a method for producing a sulfur-containing material, the method having a mechanochemical treatment step for subjecting a starting composition comprising a sulfur component and a sulfur-modified compound to a mechanochemical treatment.

IPC Classes  ?

• H01M 4/60 - Selection of substances as active materials, active masses, active liquids of organic compounds
• H01B 13/00 - Apparatus or processes specially adapted for manufacturing conductors or cables

Abstract

The present invention provides a sulfur-containing material which contains a sulfur modified compound and has a total sulfur content of 50% by mass or more; and with respect to this sulfur-containing material, the ratio (A/B) of the maximum peak intensity (A) within the range where the diffraction angle (2θ) is 23.0° to 23.4° to the maximum peak intensity (B) within the range where the diffraction angle (2θ) is 24.8° to 25.2° is 1.5 or less (A/B ≤ 1.5).

IPC Classes  ?

• C08F 8/34 - Introducing sulfur atoms or sulfur-containing groups
• C08G 75/16 - Polysulfides by polycondensation of organic compounds with inorganic polysulfides
• H01M 4/40 - Alloys based on alkali metals
• H01M 4/60 - Selection of substances as active materials, active masses, active liquids of organic compounds
• H01M 10/052 - Li-accumulators

Abstract

An objective of the invention is to provide a material capable of obtaining a curable resin composition having an excellent balance between curability and storage stability. The invention is a compound represented by formula (1). An objective of the invention is to provide a material capable of obtaining a curable resin composition having an excellent balance between curability and storage stability. The invention is a compound represented by formula (1). An objective of the invention is to provide a material capable of obtaining a curable resin composition having an excellent balance between curability and storage stability. The invention is a compound represented by formula (1). In the formula, R1 to R4 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, a hydroxy group, a nitro group, or a nitrile group; R5 to R7 each independently represent a hydrogen atom or a methyl group; and ring A represents (a1) or (a2) and forms a fused ring with the imide ring at *.

IPC Classes  ?

• C08F 283/10 - Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass on to polymers containing more than one epoxy radical per molecule
• C07D 405/12 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
• C08G 59/14 - Polycondensates modified by chemical after-treatment

Goods & Services

(1) Adhesives used in industry; unprocessed plastics in primary form; epoxy resins; polyurethane resins; chemical agents; epoxy resin curing agents; curing agents for insulating resins. (2) Resin based electrical insulating materials; electrical insulating materials; plastic semi-worked products; plastic semi-worked products in sheet, film, foil and tape forms; laminated plastic sheets and plastic films; plastic sheets and plastic films with adhesive layers; laminated plastic sheets; laminated plastic films; plastic semi-worked products in the form of polyethylene sheet.

Goods & Services

(1) Adhesives used in industry; unprocessed plastics in primary form; epoxy resins; polyurethane resins; chemical agents; epoxy resin curing agents; curing agents for insulating resins. (2) Resin based electrical insulating materials; electrical insulating materials; plastic semi-worked products; plastic semi-worked products in sheet, film, foil and tape forms; laminated plastic sheets and plastic films; plastic sheets and plastic films with adhesive layers; laminated plastic sheets; laminated plastic films; plastic semi-worked products in the form of polyethylene sheet.

Goods & Services

Adhesives used in industry; unprocessed plastics in primary form; unprocessed epoxy resins; unprocessed polyurethane resins; chemical agents for manufacturing dyestuffs; epoxy resin curing agents being curing agents for synthetic resin; curing agents for synthetic resin, namely, curing agents for insulating resins. Resin based electrical insulating materials; electrical insulating materials; semifinished injection molded products of plastic for use in a variety of industries; semi-worked synthetic plastic as semi-finished products in sheet, film, foil and tape forms; adhesive coated plastic sheets and adhesive plastic films for use in commercial or industrial manufacturing

Abstract

The purpose of the present invention is to provide a method for producing a flame-retardant additively manufactured product having excellent flame retardancy and a flame-retardant additively manufactured product obtained by said method.　The present invention is a method for producing a flame-retardant additively manufactured product that includes a step that forms a flame-retardant additively manufactured product by fused deposition modeling, wherein the resin composition is a flame-retardant resin composition containing component (B): a thermoplastic resin and component (C): a phosphorus flame retardant, and the step that forms the flame-retardant additively manufactured product includes a lamination step that performs additive manufacturing under conditions where N and L satisfy formula (I), when the discharge nozzle diameter of the 3D additive manufacturing device used in fused deposition modeling is taken to be N (mm) and the lamination pitch in fused deposition modeling is taken to be L (mm).　2.4

IPC Classes  ?

• B29C 64/118 - Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using filamentary material being melted, e.g. fused deposition modelling [FDM]
• B29C 64/314 - Preparation
• B33Y 80/00 - Products made by additive manufacturing
• C08K 5/49 - Phosphorus-containing compounds
• C08L 101/00 - Compositions of unspecified macromolecular compounds

Goods & Services

Adhesives used in industry; unprocessed plastics in primary form; unprocessed epoxy resins; unprocessed polyurethane resins; chemical agents for manufacturing dyestuffs; epoxy resin curing agents being curing agents for synthetic resin; curing agents for synthetic resin, namely, curing agents for insulating resins. Resin based electrical insulating materials; electrical insulating materials; semifinished injection molded products of plastic for use in a variety of industries; semi-worked synthetic plastic as semi-finished products in sheet, film, foil and tape forms; adhesive coated plastic sheets and adhesive plastic films for use in commercial or industrial manufacturing;

Abstract

The present invention provides: an antistatic agent which is capable of sustainably imparting a synthetic resin with an excellent antistatic effect; an antistatic agent composition which contains this antistatic agent; an antistatic resin composition which contains this antistatic agent or this antistatic agent composition; and a molded body and a film of this antistatic resin composition.　This antistatic agent contains one or more polymer compounds (E) which are obtained by a reaction of a diol (a1), a dicarboxylic acid (a2), a polyether (b) that has hydroxyl groups at both ends, and an epoxy compound (D) that has two or more epoxy groups; the polyether (b) that has hydroxyl groups at both ends is composed of a polyethylene glycol (b1) and a polytetramethylene glycol (b2); and the ratio of the polytetramethylene glycol (b2) relative to the total number of moles of the polyethylene glycol (b1) and the polytetramethylene glycol (b2) is 10% by mole to 80% by mole.

IPC Classes  ?

• C09K 3/16 - Anti-static materials
• C08G 63/672 - Dicarboxylic acids and dihydroxy compounds
• C08G 83/00 - Macromolecular compounds not provided for in groups
• C08K 3/017 - Antistatic agents
• C08L 23/00 - Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bondCompositions of derivatives of such polymers
• C08L 101/00 - Compositions of unspecified macromolecular compounds

Abstract

Provided is an indium compound, which is represented by the following general formula (1): Provided is an indium compound, which is represented by the following general formula (1): Provided is an indium compound, which is represented by the following general formula (1): where R1 and R2 each independently represent, for example, an unsubstituted alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and A represents a group represented by the following general formula (L-1) or (L-2): Provided is an indium compound, which is represented by the following general formula (1): where R1 and R2 each independently represent, for example, an unsubstituted alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and A represents a group represented by the following general formula (L-1) or (L-2): Provided is an indium compound, which is represented by the following general formula (1): where R1 and R2 each independently represent, for example, an unsubstituted alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and A represents a group represented by the following general formula (L-1) or (L-2): where R11, R12, R13, R14, R21 and R22 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and represents a bonding position with C in the general formula (1).

IPC Classes  ?

• C23C 16/40 - Oxides
• C01G 15/00 - Compounds of gallium, indium, or thallium
• C07F 5/00 - Compounds containing elements of Groups 3 or 13 of the Periodic Table
• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Abstract

Provided are: a composition that makes it possible to form a fine pattern having excellent dimensional accuracy with good productivity, while suppressing the occurrence of residue and etching unevenness; and an etching method and a laminate manufacturing method using said composition. The present invention provides a composition containing: (A) hydrogen peroxide; (B) an organic acid; (C) at least one substance selected from the group consisting of diethylaminoethanol, 1-amino-2-propanol, and N-methyldiethanolamine; and water. The present invention also provides an etching method and a laminate manufacturing method including a step for etching a metal layer by using said composition.

IPC Classes  ?

• C23F 1/18 - Acidic compositions for etching copper or alloys thereof
• C23F 1/26 - Acidic compositions for etching refractory metals
• H05K 3/00 - Apparatus or processes for manufacturing printed circuits
• H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
• H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks

Abstract

According to an additive composition which contains: (A) an aromatic phosphate sodium salt represented by the following Formula (1), where R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; (B) a fatty acid sodium salt; and (C) talc, and in which a mass ratio (B)/(A) of the content of the component (B) with respect to the content of the component (A) is 0.1 to 3 and a mass ratio (C)/[(A)+(B)+(C)] of the content of the component (C) with respect to a total content of the components (A), (B), and (C) is 0.2 to 0.8, for example, an additive composition which has excellent powder flowability and can impart excellent mechanical properties and excellent color tone to a molded article can be provided. According to an additive composition which contains: (A) an aromatic phosphate sodium salt represented by the following Formula (1), where R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; (B) a fatty acid sodium salt; and (C) talc, and in which a mass ratio (B)/(A) of the content of the component (B) with respect to the content of the component (A) is 0.1 to 3 and a mass ratio (C)/[(A)+(B)+(C)] of the content of the component (C) with respect to a total content of the components (A), (B), and (C) is 0.2 to 0.8, for example, an additive composition which has excellent powder flowability and can impart excellent mechanical properties and excellent color tone to a molded article can be provided.

IPC Classes  ?

• C08K 3/34 - Silicon-containing compounds
• C08K 5/098 - Metal salts of carboxylic acids
• C08K 5/527 - Cyclic esters

Abstract

An object of the present invention is to provide a composition that gives a cured product excellent in heat resistance and solvent resistance. The present invention provides a compound represented by the general formula (I) below and having at least one reactive group in a molecule. In the formula, A represents a hydrocarbon ring having 6 carbon atoms; X1 and X2 each represent, for example, an aryl group having 6 to 30 carbon atoms and optionally substituted with a reactive group or a group having a reactive group; R1, R2, R3, R4, R6, R7, R8, and R9 each represent, for example, a hydrogen atom, a reactive group, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group; and R5 and R10 each represent, for example, a hydrogen atom, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group. An object of the present invention is to provide a composition that gives a cured product excellent in heat resistance and solvent resistance. The present invention provides a compound represented by the general formula (I) below and having at least one reactive group in a molecule. In the formula, A represents a hydrocarbon ring having 6 carbon atoms; X1 and X2 each represent, for example, an aryl group having 6 to 30 carbon atoms and optionally substituted with a reactive group or a group having a reactive group; R1, R2, R3, R4, R6, R7, R8, and R9 each represent, for example, a hydrogen atom, a reactive group, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group; and R5 and R10 each represent, for example, a hydrogen atom, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group.

IPC Classes  ?

• C07D 487/04 - Ortho-condensed systems
• C08F 122/22 - Esters containing nitrogen

Abstract

Provided is a method of etching a metal oxide film in a laminate including a substrate and the metal oxide film formed on a surface thereof by an atomic layer etching method, the method including: a first step of introducing, into a treatment atmosphere storing the laminate, at least one oxidizable compound selected from the group consisting of: an alcohol compound; an aldehyde compound; and an ester compound; and a second step of introducing an oxidizing gas into the treatment atmosphere after the first step.

IPC Classes  ?

• H01L 21/311 - Etching the insulating layers

Abstract

Provided are: a flame retardant agent composition which has excellent flame retardancy as well as an excellent balance of dust suppression and powder flowability; a flame-retardant resin composition containing the same; and a molded article thereof. The flame retardant agent composition contains at least one phosphate compound represented by Formula (1) or (2). When the loose bulk density of the flame retardant agent composition is defined as d (g/cm3), and the 10% cumulative particle size and the 50% cumulative particle size of the flame retardant agent composition in a volume-based particle size distribution are defined as D10 (μm) and D50 (μm), respectively, d, D10 (μm), and D50 (μm) satisfy 0.030≤d/(D50−D10)≤0.110. Provided are: a flame retardant agent composition which has excellent flame retardancy as well as an excellent balance of dust suppression and powder flowability; a flame-retardant resin composition containing the same; and a molded article thereof. The flame retardant agent composition contains at least one phosphate compound represented by Formula (1) or (2). When the loose bulk density of the flame retardant agent composition is defined as d (g/cm3), and the 10% cumulative particle size and the 50% cumulative particle size of the flame retardant agent composition in a volume-based particle size distribution are defined as D10 (μm) and D50 (μm), respectively, d, D10 (μm), and D50 (μm) satisfy 0.030≤d/(D50−D10)≤0.110.

IPC Classes  ?

• C09K 21/12 - Organic materials containing phosphorus
• C09K 21/04 - Inorganic materials containing phosphorus
• C08K 5/52 - Phosphorus bound to oxygen bound to oxygen only
• C08K 3/32 - Phosphorus-containing compounds

Abstract

Provided is a method of producing a thin-film containing a zirconium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a zirconium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 240° C. or more and 450° C. or less to form the thin-film containing a zirconium atom on the surface of the substrate: Provided is a method of producing a thin-film containing a zirconium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a zirconium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 240° C. or more and 450° C. or less to form the thin-film containing a zirconium atom on the surface of the substrate: Provided is a method of producing a thin-film containing a zirconium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a zirconium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 240° C. or more and 450° C. or less to form the thin-film containing a zirconium atom on the surface of the substrate: wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms, provided that a zirconium compound in which both of R1 and R2 represent hydrogen atoms is excluded.

IPC Classes  ?

• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
• C23C 16/40 - Oxides

Abstract

Provided is a method of producing a thin-film containing a hafnium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a hafnium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 300° C. or more and less than 450° C. to form the thin-film containing a hafnium atom on the surface of the substrate: Provided is a method of producing a thin-film containing a hafnium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a hafnium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 300° C. or more and less than 450° C. to form the thin-film containing a hafnium atom on the surface of the substrate: wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms.

IPC Classes  ?

• C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
• C07F 7/00 - Compounds containing elements of Groups 4 or 14 of the Periodic Table
• C01G 27/02 - Oxides
• C23C 16/40 - Oxides