There is provided a raw material for forming a thin film containing a lanthanum compound represented by general formula (1). [Formula 1] (In general formula (1), R1, R3, R4, R6, R7, and R9each independently represent a C1-8 aliphatic hydrocarbon or a C1-8 hetero atom-containing hydrocarbon group, and R2, R5, and R8each independently represent a hydrogen atom or a C1-3 alkyl group. However, lanthanum compounds in which R1and R3, R4and R6, and R 7and R9are all the same groups as each other, and all of R 2, R5, and R8 are the same groups, are excluded).
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
C07F 5/00 - Composés contenant des éléments des groupes 3 ou 13 du tableau périodique
2.
ARYLCYCLOHEXANEDIONE DERIVATIVE OR SALT THEREOF, PEST CONTROL AGENT CONTAINING SAID COMPOUND, AND METHOD FOR USING SAME
The invention provides compounds represented by the formula (1)
The invention provides compounds represented by the formula (1)
The invention provides compounds represented by the formula (1)
wherein X and Y are oxygen atoms or sulfur atoms, Z is a hydroxyl group or the like, R1 and R2 are alkyl groups and the like, R4 and R5 are alkyl groups and the like, R3 and R6 are hydrogen atoms and the like, R7 is a substituted phenyl group or the like, and Q is an aryl group or the like, or salts thereof, pest control agents containing the compounds as active ingredients, and methods for use thereof.
A01N 43/40 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un atome d'azote comme unique hétéro-atome du cycle des cycles à six chaînons
A01N 37/22 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés organiques comportant un atome de carbone possédant trois liaisons à des hétéro-atomes, avec au plus deux liaisons à un halogène, p. ex. acides carboxyliques contenant le groupe —CO—N, p. ex. amides ou imides d'acide carboxyliqueLeurs thio-analogues l'atome d'azote étant lié directement à un système cyclique aromatique, p. ex. anilides
A61K 31/167 - Amides, p. ex. acides hydroxamiques ayant des cycles aromatiques, p. ex. colchicine, aténolol, progabide ayant l'atome d'azote d'un groupe carboxamide lié directement au cycle aromatique, p. ex. lidocaïne, paracétamol
A61K 31/44 - Pyridines non condenséesLeurs dérivés hydrogénés
C07C 235/82 - Amides d'acides carboxyliques, le squelette carboné de la partie acide étant substitué de plus par des atomes d'oxygène ayant des atomes de carbone de groupes carboxamide et des atomes d'oxygène, liés par des liaisons doubles, liés au même squelette carboné avec l'atome de carbone d'au moins un des groupes carboxamide lié à un atome de carbone d'un cycle autre qu'un cycle aromatique à six chaînons
C07D 213/75 - Radicaux amino ou imino, acylés par un acide carboxylique, par l'acide carbonique ou par leurs analogues du soufre ou de l'azote, p. ex. des carbamates
3.
ARYL DIHYDROPYRAN DERIVATIVE OR SALT THEREOF, PEST CONTROL AGENT CONTAINING SAME, AND METHOD FOR USE THEREOF
The invention provides compounds represented by the formula (1)
The invention provides compounds represented by the formula (1)
The invention provides compounds represented by the formula (1)
wherein X and Y are oxygen atoms or sulfur atoms, Z is a hydroxyl group or the like, R1 is a hydrogen atom or the like, R2, R3 and R4 are hydrogen atoms and the like, and R5 and Q are substituted phenyl groups and the like, or salts thereof, pest control agents containing the compounds as active ingredients, and methods for use thereof.
A01N 43/16 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un ou plusieurs atomes d'oxygène ou de soufre comme uniques hétéro-atomes du cycle avec un hétéro-atome des cycles à six chaînons avec l'oxygène comme hétéro-atome du cycle
C07D 309/32 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome d'oxygène comme unique hétéro-atome du cycle, non condensés avec d'autres cycles comportant deux liaisons doubles entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques
C07D 311/96 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome d'oxygène comme unique hétéro-atome du cycle, condensés avec d'autres cycles condensés en spiro avec des carbocycles ou avec des systèmes carbocycliques
4.
METHOD FOR PRODUCING THIN FILM AND RAW MATERIAL FOR FORMING THIN FILM
333 and a reducing gas; and a raw material for forming a thin film. (In general formula (1), R1represents a hydrogen atom or a hydrocarbon group having 1 to 5 carbon atoms, and R2, R3and R4 each independently represent an alkyl group having 1 to 3 carbon atoms).
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
C07F 7/08 - Composés comportant une ou plusieurs liaisons C—Si
C07F 7/10 - Composés comportant une ou plusieurs liaisons C—Si azotés
C07F 19/00 - Composés métalliques couverts par plus d'un des groupes principaux
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
5.
BLOCK URETHANE MATERIAL, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND BLOCK URETHANE COMPOUND CONTAINED THEREIN
The present disclosure provides: a block urethane compound which is formed with a polyisocyanate compound, a polyhydroxy compound, and a blocking agent, wherein the polyhydroxy compound contains one or more compounds selected from the group consisting of unsaturated polyol derivatives, unsaturated polyols, and acrylic polyols; a block urethane material containing the block urethane compound; a composition containing the block urethane compound; a cured product formed from the composition; and a method for producing the cured product.
The invention provides compounds represented by the formula (1)
The invention provides compounds represented by the formula (1)
The invention provides compounds represented by the formula (1)
wherein X and Y are oxygen atoms or sulfur atoms, Z is a hydroxyl group or the like, R1 is an alkyl group or the like, R2 and R4 are substituted phenyl groups and the like, R3, R5 and R6 are hydrogen atoms and the like, and R7 is a substituted phenyl group or the like, or salts thereof, pest control agents containing the compounds as active ingredients, and methods for use thereof.
C07D 211/90 - Atomes de carbone comportant trois liaisons à des hétéro-atomes avec au plus une liaison à un halogène
A01N 43/40 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un atome d'azote comme unique hétéro-atome du cycle des cycles à six chaînons
A01N 43/42 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un atome d'azote comme unique hétéro-atome du cycle des cycles à six chaînons condensés avec des carbocycles
A01N 43/52 - Diazoles-1,3Diazoles-1,3 hydrogénés condensés avec des carbocycles, p. ex. benzimidazoles
A01N 43/66 - Triazines-1,3,5 non hydrogénées et non substituées sur les atomes d'azote du cycle
A01N 43/713 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec au moins quatre atomes d'azote comme uniques hétéro-atomes du cycle
A01N 43/80 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec des atomes d'azote et des atomes d'oxygène ou de soufre, comme hétéro-atomes du cycle des cycles à cinq chaînons avec un atome d'azote et soit un atome d'oxygène, soit un atome de soufre, en positions 1,2
A01N 43/82 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec des atomes d'azote et des atomes d'oxygène ou de soufre, comme hétéro-atomes du cycle des cycles à cinq chaînons avec trois hétéro-atomes
A01N 43/84 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec des atomes d'azote et des atomes d'oxygène ou de soufre, comme hétéro-atomes du cycle des cycles à six chaînons avec un atome d'azote et soit un atome d'oxygène, soit un atome de soufre, en positions 1,4
C07D 221/20 - Systèmes cycliques condensés en spiro
C07D 401/04 - Composés hétérocycliques contenant plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle, au moins un cycle étant un cycle à six chaînons avec un unique atome d'azote contenant deux hétérocycles liés par une liaison directe de chaînon cyclique à chaînon cyclique
C07D 401/14 - Composés hétérocycliques contenant plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle, au moins un cycle étant un cycle à six chaînons avec un unique atome d'azote contenant au moins trois hétérocycles
C07D 405/10 - Composés hétérocycliques contenant à la fois un ou plusieurs hétérocycles comportant des atomes d'oxygène comme uniques hétéro-atomes du cycle et un ou plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle contenant deux hétérocycles liés par une chaîne carbonée contenant des cycles aromatiques
C07D 413/14 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes d'azote et d'oxygène comme uniques hétéro-atomes du cycle contenant au moins trois hétérocycles
C07D 417/10 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre et d'azote comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant deux hétérocycles liés par une chaîne carbonée contenant des cycles aromatiques
C07D 417/14 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre et d'azote comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant au moins trois hétérocycles
7.
IMITATION CHEESE, METHOD FOR PRODUCING IMITATION CHEESE, AND FOOD PRODUCT
The objects of the present invention are: (1) to provide an imitation cheese in which an odd taste derived from a vegetable material is less likely to be imparted; (2) to provide an imitation cheese having excellent processing suitability in which during shaping the imitation cheese by shredding, dicing, cleaving, cutting, or the like, the shaped imitation cheese is not attached to another shaped imitation cheese, and during shaping, the imitation cheese does not collapse into a powder or pieces; and (3) to provide an imitation cheese having cheese-like texture and physical properties when the imitation cheese is eaten as it is or after heating. The present invention provides an imitation cheese that includes an oil-in-water emulsion containing the following components A and B, and that satisfies the following condition 1:
(Component A) a whole grain ground product of high-carbohydrate beans, provided that the high-carbohydrate beans refer to beans containing 50 to 80% by mass of carbohydrate;
(Component B) an oxidized starch (excluding an oxidized starch that has been subjected to a cross-linking treatment); and
(Condition 1) a pH thereof is 3.0 to 5.5.
A23C 20/02 - Succédanés du fromage ne contenant ni constituants du lait, ni caséinate, ni lactose, en tant que sources de matières grasses, de protéines ou d'hydrates de carbone
8.
FLAME RETARDING COMPOSITION, FLAME-RETARDANT RESIN COMPOSITION, AND MOLDED ARTICLE
There are provided: a flame retarding composition that is used for allowing a synthetic resin to be flame-retardant and is excellent in flame resistance and water resistance; a flame-retardant resin composition including it; and a molded article thereof. The flame retarding composition is powdery and includes a polyphosphate (A), the rate of particles (p2) having a particle diameter of 80 μm or more and less than 170 μm is 9 to 99.9% by volume in the flame retarding composition, the flame-retardant resin composition includes the flame retarding composition and a thermoplastic resin, and the molded article is formed using the flame-retardant resin composition.
The purposes of a cereal flour composition according to the present invention are (1) to provide a bakery food product that offers a pleasant wheat-like aroma and flavor even if the cereal flour composition does not contain wheat flour or the wheat flour content is reduced, and (2) to provide a bakery food product having a suitable texture. Provided are: a cereal flour composition containing at least 35 mass% oat flour in terms of the cereal flour ingredients, said oat flour being a whole grain flour and preferably having a viscosity of 400 mPa·s or more as measured after adjusting the temperature of a 16.7 mass% water suspension of the oat flour to 25°C; a bakery dough containing the cereal flour composition; and a bakery food product that is a heated product of the bakery dough.
The present disclosure provides: a blocked isocyanate composition which is characterized by containing a compound represented by formula (1) and a blocked isocyanate; and a resin composition which contains a compound represented by formula (1), a blocked isocyanate, and a thermoplastic resin. (In the formula, each of R1, R2, R3, and R4independently represents an organic group having 1 to 20 carbon atoms, the organic group is a substituted or unsubstituted hydrocarbon group, a group containing a substituted or unsubstituted heterocyclic ring, or a group that is obtained by substituting one or more methylene groups in the hydrocarbon group or the group containing a heterocyclic ring with a divalent group that is selected from the described below, Xb-represents a b-valent anion, a represents an integer of 1 to 3 inclusive, and b represents an integer of 1 to 3 inclusive. consists of -O-, -CO-, -COO-, -OCO-, -NR11-, -NR11CO-, and -S-, and R11 represents a hydrogen atom or a hydrocarbon group having 1 to 15 carbon atoms.)
Provided is a resin composition comprising: a component (A) that is a specific bismaleimide compound; a component (B) that is one or more compounds selected from the group consisting of a specific furan ring-containing compound and a specific anthracene compound; and a component (C) that is an epoxy compound excluding the component (B).
C08G 59/40 - Macromolécules obtenues par polymérisation à partir de composés contenant plusieurs groupes époxyde par molécule en utilisant des agents de durcissement ou des catalyseurs qui réagissent avec les groupes époxyde caractérisées par les agents de durcissement utilisés
12.
COMPOSITION, BLACK MATRIX, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND DISPLAY DEVICE
This composition contains a compound (A) having a structure obtained using an esterification reaction of a polybasic acid anhydride with an epoxy addition compound having a structure in which an unsaturated monobasic acid has been added to an epoxy compound represented by general formula (I), an epoxy compound (B), a thiol compound (C), a quaternary ammonium salt (D), a black pigment (E), and a polymerization initiator (F). The epoxy equivalent of the epoxy compound (B) is preferably 80 g/eq. to less than 300 g/eq. (See the description for the symbols in the formula.)
C08G 59/40 - Macromolécules obtenues par polymérisation à partir de composés contenant plusieurs groupes époxyde par molécule en utilisant des agents de durcissement ou des catalyseurs qui réagissent avec les groupes époxyde caractérisées par les agents de durcissement utilisés
C08F 299/02 - Composés macromoléculaires obtenus par des interréactions de polymères impliquant uniquement des réactions entre des liaisons non saturées carbone-carbone, en l'absence de monomères non macromoléculaires à partir de polycondensats non saturés
G09F 9/30 - Dispositifs d'affichage d'information variable, dans lesquels l'information est formée sur un support, par sélection ou combinaison d'éléments individuels dans lesquels le ou les caractères désirés sont formés par une combinaison d'éléments individuels
13.
ETCHING LIQUID COMPOSITION, ETCHING METHOD AND METHOD FOR PRODUCING BASE MATERIAL
The present invention provides an etching liquid composition which is capable of sufficiently etching a copper-containing layer in the depth direction, while sufficiently suppressing side etching. The present invention specifically provides an etching liquid composition which is used for the purpose of etching a copper-containing layer, and which is an aqueous solution that contains (A) a compound represented by general formula (1) (in general formula (1), each of R1and R2independently represents a hydrogen atom, an amino group, a thiol group, a phenyl group, or a carboxy group, provided that in cases where one of R1and R2 is a hydrogen atom, the other is a thiol group, a phenyl group, or a carboxy group), (B) at least one component that is selected from the group consisting of a cupric ion and a ferric ion, (C) an acid, and water.
The purpose of the present invention is to provide a flame retardant that uses a small added amount of flame retardant and imparts excellent flame retardancy to a synthetic resin and to provide a method for achieving flame retardancy. The present invention is a flame retardant for a synthetic resin, wherein the flame retardant contains component (A): an N-alkoxypiperidine compound having a structure represented by general formula (1) and component (B): a metal hydroxide, and the flame retardant is added so that the total content of component (A) and component (B) to the total amount of synthetic resin, component (A), and component (B) is in the 0.2 to 10 mass% range. [Formula 1] In general formula (1), R11represents a C1-30 alkyl group or a C5-12 cycloalkyl group, R12, R13, R14, and R15 each independently represent a C1-4 alkyl group, and * represents a bond.
C09K 21/10 - Substances organiques contenant de l'azote
15.
LACTIC ACID FERMENTATION PRODUCT OF FERMENTATION RAW MATERIAL CONTAINING PLANT MILK, METHOD FOR PRODUCING SAME, AND FOOD AND BEVERAGE CONTAINING LACTIC ACID FERMENTATION PRODUCT
In this lactic acid fermentation product of a fermentation raw material containing plant milk, the ratio of the content of potassium based on 1 part by mass of contained sodium is 0.5-10.0 parts by mass. The solid content in the lactic acid fermentation product is preferably 1.0%-55.0% by mass. It is also preferable that the fermentation raw material contain a saccharified liquid as the plant milk. It is also preferable that the fermentation raw material contain two or more kinds of plant milk. It is also preferable that 60.0% by mass or more of the solid content in the fermentation raw material be derived from plant milk.
A23C 11/10 - Succédanés du lait, p. ex. compositions pour remplacer le lait dans le café au lait contenant au moins un composé d'origine non laitière comme source de matières grasses ou de protéines contenant ou non du lactose mais pas d'autres composés d'origine laitière comme sources de matières grasses, d'hydrates de carbone ou de protéines
A23L 11/60 - Boissons à base de légumineuses, p. ex. boissons à base de lupin
Provided is a plant milk composition that contains a grain liquefied liquid and a grain saccharified liquid. Also provided is a method for producing a plant milk composition, the method being characterized by including mixing a grain liquefied liquid and a grain saccharified liquid. The grain in the grain liquefied liquid or in the grain saccharified liquid preferably contains oats. The raw material grain of the grain liquefied liquid and the raw material grain of the grain saccharified liquid are preferably the same. The solid content of the grain saccharified liquid is preferably 0.01-3 parts by mass with respect to 1 parts by mass of the solid content of the grain liquefied liquid. The grain liquefied liquid preferably has a sugar composition in which the content of the trisaccharide or higher polysaccharide is larger than the combined content of the monosaccharide and the disaccharide, and the grain saccharified liquid preferably has a sugar composition in which the combined content of the monosaccharide and the disaccharide is smaller than the content of the trisaccharide or higher polysaccharide.
A23L 7/104 - Fermentation de céréales farineuses ou de produits de céréalesAdjonction d'enzymes ou de micro-organismes
A23C 11/10 - Succédanés du lait, p. ex. compositions pour remplacer le lait dans le café au lait contenant au moins un composé d'origine non laitière comme source de matières grasses ou de protéines contenant ou non du lactose mais pas d'autres composés d'origine laitière comme sources de matières grasses, d'hydrates de carbone ou de protéines
A23L 2/00 - Boissons non alcooliséesCompositions sèches ou concentrés pour les fabriquer Leur préparation ou leur traitement
A23L 27/00 - ÉpicesAgents aromatiques ou condimentsÉdulcorants artificielsSels de tableSubstituts diététiques du selLeur préparation ou leur traitement
A23L 29/30 - Aliments ou produits alimentaires contenant des additifsLeur préparation ou leur traitement contenant des sirops d'hydrate de carboneAliments ou produits alimentaires contenant des additifsLeur préparation ou leur traitement contenant des sucresAliments ou produits alimentaires contenant des additifsLeur préparation ou leur traitement contenant des alcools de sucre, p. ex. du xylitolAliments ou produits alimentaires contenant des additifsLeur préparation ou leur traitement contenant des hydrolysats d'amidon, p. ex. de la dextrine
17.
ELECTRODE FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY COMPRISING COLLECTOR CONTAINING POROUS METAL AND ORGANOSULFUR ACTIVE MATERIAL, NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY CONTAINING SAID ELECTRODE, AND ORGANOSULFUR ACTIVE MATERIAL FOR PRODUCING SAID ELECTRODE
This disclosure provides: an electrode for a non-aqueous electrolyte secondary battery including a collector containing a porous metal and an organosulfur active material; a non-aqueous electrolyte secondary battery including the electrode as a positive electrode or a negative electrode; and an organosulfur active material to be used for production of the electrode.
H01M 4/80 - Plaques poreuses, p. ex. supports frittés
H01M 10/0525 - Batteries du type "rocking chair" ou "fauteuil à bascule", p. ex. batteries à insertion ou intercalation de lithium dans les deux électrodesBatteries à l'ion lithium
18.
COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND POLYMER
The present invention provides a composition comprising a compound having a structure represented by general formula (I), a structure represented by general formula (II), and an unsaturated bond-containing group, with the compound having two or more structures represented by general formula (I). (Where: R represents H, halogen, cyano, amino, OH, nitro, carboxyl, or C1-30 optionally substituted hydrocarbon group or methylene-substituted hydrocarbon group; a is 0-5; b is 0-5; a + b is 1 or greater; D and J each independently represent a single bond, a C1-30 optionally substituted hydrocarbon group or methylene-substituted hydrocarbon group; G and L each independently represent -O-, -S-, -NR101-, -CO-, -CO-O-, -O-CO-, CO-NR101-, -NR101-CO-, -CO-S- or –S-CO-; and R101 represents H, halogen, cyano, amino, OH, nitro, carboxyl, C1-10 hydrocarbon group or C2-10 heterocycle-containing group.)
Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a ruthenium compound represented by the following general formula (1):
Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a ruthenium compound represented by the following general formula (1):
Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a ruthenium compound represented by the following general formula (1):
wherein R1 represents a hydrogen atom or a methyl group, and R2 and R3 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
20.
RESIN COMPOSITION, MOLDED ARTICLE, RESIN ADDITIVE COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, METHOD FOR IMPROVING CRYSTALLINITY OF CRYSTALLINE RESIN, AND MATERIAL FOR RESIN ADDITIVE COMPOSITION
12122. (In general formula (1), X1, X2, and X3 each independently represent a substituted or unsubstituted phenylene group, and *, **, and *** represent sites that bond with other atoms.)
C08L 23/00 - Compositions contenant des homopolymères ou des copolymères d'hydrocarbures aliphatiques non saturés ne possédant qu'une seule liaison double carbone-carboneCompositions contenant des dérivés de tels polymères
The present invention provides a cheese-like food which can achieve the following 1) to 3):
1) having a suppressed odd taste;
2) having a smooth texture and a refreshing sour taste; and
3) having favorable emulsion stability.
The cheese-like food includes an emulsified composition containing: 1 to 10% by mass in terms of solid content of beans containing 50 to 90% by mass of a carbohydrate in the solid content; and 1 to 10% by mass of a swelling-inhibiting starch, and the cheese-like food has a pH of 3.5 to 7.5 and a water content of 45 to 70% by mass.
A23C 20/02 - Succédanés du fromage ne contenant ni constituants du lait, ni caséinate, ni lactose, en tant que sources de matières grasses, de protéines ou d'hydrates de carbone
The purpose of the present invention is to provide a novel external parasite control agent for animals and a novel internal parasite control agent for animals. The present invention provides: a compound represented by general formula (1) (the symbols of which are as defined in the description) or a salt thereof; a pest control agent including said compound as an active ingredient; and a usage method therefor.
C07D 213/38 - Radicaux substitués par des atomes d'azote liés par des liaisons simples comportant uniquement de l'hydrogène, ou des radicaux hydrocarbonés, liés à l'atome d'azote substituant
A01N 35/06 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés organiques comportant un atome de carbone possédant deux liaisons à des hétéro-atomes, avec au plus une liaison à un halogène, p. ex. un radical aldéhyde contenant des groupes cétone ou thiocétone faisant partie d'un cycle, p. ex. cyclohexanone, quinoneLeurs dérivés, p. ex. cétals
A01N 43/10 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un ou plusieurs atomes d'oxygène ou de soufre comme uniques hétéro-atomes du cycle avec un hétéro-atome des cycles à cinq chaînons avec le soufre comme hétéro-atome du cycle
A01N 43/16 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un ou plusieurs atomes d'oxygène ou de soufre comme uniques hétéro-atomes du cycle avec un hétéro-atome des cycles à six chaînons avec l'oxygène comme hétéro-atome du cycle
A01N 43/40 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un atome d'azote comme unique hétéro-atome du cycle des cycles à six chaînons
A01N 43/46 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un atome d'azote comme unique hétéro-atome du cycle des cycles à plus de six chaînons
A01N 43/80 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec des atomes d'azote et des atomes d'oxygène ou de soufre, comme hétéro-atomes du cycle des cycles à cinq chaînons avec un atome d'azote et soit un atome d'oxygène, soit un atome de soufre, en positions 1,2
A01N 47/02 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés organiques comportant un atome de carbone ne faisant pas partie d'un cycle et ne comportant pas de liaison à un atome de carbone ou d'hydrogène, p. ex. dérivés de l'acide carbonique l'atome de carbone ne comportant pas de liaison à un atome d'azote
A01N 47/06 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés organiques comportant un atome de carbone ne faisant pas partie d'un cycle et ne comportant pas de liaison à un atome de carbone ou d'hydrogène, p. ex. dérivés de l'acide carbonique l'atome de carbone ne comportant pas de liaison à un atome d'azote contenant des groupes —O—CO—O—Leurs thio-analogues
A01N 47/16 - Dérivés de l'acide carbamique, c.-à-d. contenant le groupe —O—CO—NLeurs thio-analogues l'atome d'azote faisant partie d'un hétérocycle
A61K 31/136 - Amines, p. ex. amantadine ayant des cycles aromatiques, p. ex. méthadone ayant le groupe amino lié directement au cycle aromatique, p. ex. benzène-amine
A61K 31/341 - Composés hétérocycliques ayant l'oxygène comme seul hétéro-atome d'un cycle, p. ex. fungichromine ayant des cycles à cinq chaînons avec un oxygène comme seul hétéro-atome d'un cycle, p. ex. isosorbide non condensés avec un autre cycle, p. ex. ranitidine, furosémide, bufétolol, muscarine
A61K 31/343 - Composés hétérocycliques ayant l'oxygène comme seul hétéro-atome d'un cycle, p. ex. fungichromine ayant des cycles à cinq chaînons avec un oxygène comme seul hétéro-atome d'un cycle, p. ex. isosorbide condensés avec un carbocycle, p. ex. coumarane, bufaralol, béfunolol, clobenfurol, amiodarone
A61K 31/351 - Composés hétérocycliques ayant l'oxygène comme seul hétéro-atome d'un cycle, p. ex. fungichromine ayant des cycles à six chaînons avec un oxygène comme seul hétéro-atome d'un cycle non condensés avec un autre cycle
A61K 31/381 - Composés hétérocycliques ayant le soufre comme hétéro-atome d'un cycle ayant des cycles à cinq chaînons
A61K 31/4402 - Pyridines non condenséesLeurs dérivés hydrogénés substituées uniquement en position 2, p. ex. phéniramine, bisacodyl
A61K 31/4439 - Pyridines non condenséesLeurs dérivés hydrogénés contenant d'autres systèmes hétérocycliques contenant un cycle à cinq chaînons avec l'azote comme hétéro-atome du cycle, p. ex. oméprazole
A61K 31/444 - Pyridines non condenséesLeurs dérivés hydrogénés contenant d'autres systèmes hétérocycliques contenant un cycle à six chaînons avec l'azote comme hétéro-atome du cycle, p. ex. amrinone
C07C 225/18 - Composés contenant des groupes amino et des atomes d'oxygène, liés par des liaisons doubles, liés au même squelette carboné, au moins un des atomes d'oxygène, liés par des liaisons doubles, ne faisant pas partie d'un groupe —CHO, p. ex. aminocétones ayant des groupes amino liés à des atomes de carbone acycliques du squelette carboné le squelette carboné étant non saturé et contenant des cycles aromatiques à six chaînons le squelette carboné contenant aussi des cycles autres que des cycles aromatiques à six chaînons
C07D 231/12 - Composés hétérocycliques contenant des cycles diazole-1, 2 ou diazole-1, 2 hydrogéné non condensés avec d'autres cycles comportant deux ou trois liaisons doubles entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone du cycle
C07D 239/26 - Composés hétérocycliques contenant des cycles diazine-1, 3 ou diazine-1, 3 hydrogéné non condensés avec d'autres cycles comportant au moins trois liaisons doubles entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone du cycle
C07D 239/47 - Un atome d'azote et un atome d'oxygène ou de soufre, p. ex. cytosine
C07D 241/12 - Composés hétérocycliques contenant des cycles diazine-1,4 ou diazine-1,4 hydrogéné non condensés avec d'autres cycles comportant trois liaisons doubles entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone du cycle
C07D 261/08 - Composés hétérocycliques contenant des cycles oxazole-1, 2 ou oxazole-1, 2 hydrogéné non condensés avec d'autres cycles comportant plusieurs liaisons doubles entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone du cycle
C07D 263/32 - Composés hétérocycliques contenant des cycles oxazole-1, 3 ou oxazole-1, 3 hydrogéné non condensés avec d'autres cycles comportant deux ou trois liaisons doubles entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone du cycle
C07D 277/28 - Radicaux substitués par des atomes d'azote
C07D 307/14 - Radicaux substitués par des atomes d'azote ne faisant pas partie d'un radical nitro
C07D 307/52 - Radicaux substitués par des atomes d'azote ne faisant par partie d'un radical nitro
C07D 307/81 - Radicaux substitués par des atomes d'azote ne faisant pas partie d'un radical nitro
C07D 309/04 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome d'oxygène comme unique hétéro-atome du cycle, non condensés avec d'autres cycles ne comportant pas de liaison double entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques avec uniquement des atomes d'hydrogène, des radicaux hydro-carbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone du cycle
C07D 311/74 - Benzo [b] pyrannes, hydrogénés dans le carbocycle
C07D 333/20 - Radicaux substitués par des hétéro-atomes, autres que les halogènes, liés par des liaisons simples par des atomes d'azote
C07D 333/22 - Radicaux substitués par des hétéro-atomes liés par une liaison double ou par deux hétéro-atomes, autres que des halogènes, liés au même atome de carbone par des liaisons simples
C07D 401/04 - Composés hétérocycliques contenant plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle, au moins un cycle étant un cycle à six chaînons avec un unique atome d'azote contenant deux hétérocycles liés par une liaison directe de chaînon cyclique à chaînon cyclique
C07D 401/12 - Composés hétérocycliques contenant plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle, au moins un cycle étant un cycle à six chaînons avec un unique atome d'azote contenant deux hétérocycles liés par une chaîne contenant des hétéro-atomes comme chaînons
C07D 401/14 - Composés hétérocycliques contenant plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle, au moins un cycle étant un cycle à six chaînons avec un unique atome d'azote contenant au moins trois hétérocycles
C07D 403/04 - Composés hétérocycliques contenant plusieurs hétérocycles, comportant des atomes d'azote comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant deux hétérocycles liés par une liaison directe de chaînon cyclique à chaînon cyclique
C07D 405/14 - Composés hétérocycliques contenant à la fois un ou plusieurs hétérocycles comportant des atomes d'oxygène comme uniques hétéro-atomes du cycle et un ou plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle contenant au moins trois hétérocycles
C07D 409/12 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre comme uniques hétéro-atomes du cycle contenant deux hétérocycles liés par une chaîne contenant des hétéro-atomes comme chaînons
C07D 409/14 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre comme uniques hétéro-atomes du cycle contenant au moins trois hétérocycles
C07D 413/12 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes d'azote et d'oxygène comme uniques hétéro-atomes du cycle contenant deux hétérocycles liés par une chaîne contenant des hétéro-atomes comme chaînons
C07D 413/14 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes d'azote et d'oxygène comme uniques hétéro-atomes du cycle contenant au moins trois hétérocycles
C07D 417/12 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre et d'azote comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant deux hétérocycles liés par une chaîne contenant des hétéro-atomes comme chaînons
C07D 417/14 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre et d'azote comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant au moins trois hétérocycles
23.
THIN-FILM FORMING RAW MATERIAL, METHOD OF PRODUCING THIN-FILM, THIN-FILM, AND MOLYBDENUM COMPOUND
A thin-film forming raw material contains a molybdenum compound represented by the following general formula (1), a method of forming a thin-film through use of the thin-film forming raw material, and a molybdenum compound having a specific structure:
A thin-film forming raw material contains a molybdenum compound represented by the following general formula (1), a method of forming a thin-film through use of the thin-film forming raw material, and a molybdenum compound having a specific structure:
where R1 represents an alkyl group having 1 to 5 carbon atoms or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, L1 represents a group represented by the following general formula (L-1) or (L-2), and “n” represents an integer of from 1 to 4, provided that when “n” represents 4, R1 represents a fluorine atom-containing alkyl group having 1 to 5 carbon atoms;
A thin-film forming raw material contains a molybdenum compound represented by the following general formula (1), a method of forming a thin-film through use of the thin-film forming raw material, and a molybdenum compound having a specific structure:
where R1 represents an alkyl group having 1 to 5 carbon atoms or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, L1 represents a group represented by the following general formula (L-1) or (L-2), and “n” represents an integer of from 1 to 4, provided that when “n” represents 4, R1 represents a fluorine atom-containing alkyl group having 1 to 5 carbon atoms;
where R2 to R12 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, and * represents a bonding site.
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
C07F 11/00 - Composés contenant des éléments des groupes 6 ou 16 du tableau périodique
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
C23C 16/448 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour produire des courants de gaz réactifs, p. ex. par évaporation ou par sublimation de matériaux précurseurs
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
Produits et services
Chemicals; antioxidants; nucleating agents as additives for
synthetic resins; clarifying agents as additives for
synthetic resins; chemical additives for lubricating
synthetic resins; light stabilizers; ultraviolet absorbers;
fire retardants; antistatic agents (excluding household
use); heavy metal deactivator.
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
Produits et services
Chemicals; antioxidants; nucleating agents as additives for
synthetic resins; clarifying agents as additives for
synthetic resins; chemical additives for lubricating
synthetic resins; light stabilizers; ultraviolet absorbers;
fire retardants; antistatic agents (excluding household
use); heavy metal deactivator.
The purpose of the present invention is to provide: a plasticizer that imparts excellent plasticity to a biodegradable resin; and a composition and a molded article that contain the plasticizer. The present invention provides a plasticizer that contains a dibenzoate compound represented by general formula (1), has a hydroxyl value of 0.1-20 mgKOH/g, and is used in biodegradable resin. In the formula, R1represents a C1-8 alkanediyl group, and n represents an integer of 1-8. R1 preferably represents a C2-3 alkylene group, and n preferably represents an integer of 1-3.
A clathrate compound obtained by mixing an imidazole compound (A) and a polyhydric phenol compound (B), wherein the clathrate compound has an average particle size (X) of 7 μm or less, and a maximum particle size (Y) of 40 μm or less. The imidazole compound (A) is preferably at least one selected from compounds represented by the following formula (1),
A clathrate compound obtained by mixing an imidazole compound (A) and a polyhydric phenol compound (B), wherein the clathrate compound has an average particle size (X) of 7 μm or less, and a maximum particle size (Y) of 40 μm or less. The imidazole compound (A) is preferably at least one selected from compounds represented by the following formula (1),
where R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group that has 1 to 20 carbon atoms and may have a substituent, or an aryl group that has 6 to 20 carbon atoms and may have a substituent, and the substituent is at least one selected from a halogen atom, a hydroxy group, and a nitrile group.
C08G 59/40 - Macromolécules obtenues par polymérisation à partir de composés contenant plusieurs groupes époxyde par molécule en utilisant des agents de durcissement ou des catalyseurs qui réagissent avec les groupes époxyde caractérisées par les agents de durcissement utilisés
The purpose of the present invention is to provide a flame retardant that uses an N-alkyl type hindered amine compound and imparts excellent flame retardancy to a synthetic resin. The present invention provides a flame retardant containing a hindered amine compound (A), wherein the hindered amine compound (A) is a compound represented by general formula (1). In general formula (1), R1represents a carbonyl group or the like, R2represents a hydrocarbon group having 1-18 carbon atoms, and R3to R6 each independently represent an alkyl group having 1-4 carbon atoms.
The present invention provides: a compound which is represented by general formula (1); a starting material for thin film formation, the starting material comprising the compound; and a method for producing a thin film. [Chemical formula 1] (In the formula, R1and R2each independently represent an alkyl group having 1 to 5 carbon atoms, A1represents an alkanediyl group having 1 to 8 carbon atoms, L1represents a group that is represented by general formula (L-1) or (L-2), M1represents a molybdenum atom or a tungsten atom; and α, β, and γ each independently represent an integer of 1 or more, wherein the sum of 2α, β, and γ is 6.) [Chemical formula 2] (In the formula, R11to R13 each independently represent an alkyl group having 1 to 5 carbon atoms, and * represents a bond.)
C07F 11/00 - Composés contenant des éléments des groupes 6 ou 16 du tableau périodique
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
The purpose of the present invention is to improve richness of a wide variety of food or beverage products including a plant-based food product. This flavor improving agent contains 1-15 parts by mass of olive oil with respect to 1 part by mass of a fermentation by-product. The fermentation by-product is preferably a fermentation by-product of an alcoholic beverage. The olive oil is preferably unrefined olive oil. The flavor improving agent contains unsaponifiable matter preferably in an amount of 0.2-3.5 mass%, and preferably contains plant milk. A food or beverage product of the present invention contains 1-15 parts by mass of olive oil with respect to 1 part by mass of a fermentation by-product, and is preferably a plant-based food product. A method for improving the flavor of a food or beverage product of the present invention comprises a step for including a fermentation by-product and olive oil in a food or beverage product.
A23L 27/00 - ÉpicesAgents aromatiques ou condimentsÉdulcorants artificielsSels de tableSubstituts diététiques du selLeur préparation ou leur traitement
A21D 13/00 - Produits de boulangerie complètement ou partiellement finis
A21D 13/80 - Pâtisserie non prévue ailleurs, p. ex. gâteaux ou biscuits
A23D 7/00 - Compositions à base d'huiles ou de graisses comestibles contenant une phase aqueuse, p. ex. margarines
A23D 7/005 - Compositions à base d'huiles ou de graisses comestibles contenant une phase aqueuse, p. ex. margarines caractérisées par des ingrédients autres que des triglycérides d'acides gras
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
Produits et services
Chemicals; antioxidants; nucleating agents as additives for synthetic resins; clarifying agents as additives for synthetic resins; chemical additives for lubricating synthetic resins; light stabilizers; ultraviolet absorbers; fire retardants; antistatic agents (excluding household use); heavy metal deactivator.
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
Produits et services
Chemicals; antioxidants; nucleating agents as additives for synthetic resins; clarifying agents as additives for synthetic resins; chemical additives for lubricating synthetic resins; light stabilizers; ultraviolet absorbers; fire retardants; antistatic agents (excluding household use); heavy metal deactivator.
An oil-in-water emulsion satisfies all of the following four criteria: the protein content is from 0.1 to 10 mass %; a marine-derived potassium salt is contained; the mass ratio between sodium and potassium (Na:K) is from 1:0.5 to 1:10; and the oil component content is from 0.3 to 49 mass %. Preferably, the non-fat milk solids content is less than 3 mass %. It is also preferable that the oil-in-water emulsion contains a plant-based milk, or contains a plant-derived protein material.
A23C 11/10 - Succédanés du lait, p. ex. compositions pour remplacer le lait dans le café au lait contenant au moins un composé d'origine non laitière comme source de matières grasses ou de protéines contenant ou non du lactose mais pas d'autres composés d'origine laitière comme sources de matières grasses, d'hydrates de carbone ou de protéines
The present invention provides a composition, a coating composition, an article, a method for producing a composition, a light stabilizer monomer component, and a light stabilizer polymer. The present invention specifically provides a composition which is characterized by containing: a polymer that is obtained by polymerizing a monomer component containing a compound that is represented by general formula (1); and an aqueous dispersion medium. (In general formula (1), n1 represents 1 or 2; in cases where n1 is 1, X1represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 30 carbon atoms, or the like; in cases where n1 is 2, X1represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like; Y1represents a single bond or the like; Z1represents a single bond or the like; R3to R8each independently represent a substituted or unsubstituted monovalent hydrocarbon group having 1 to 30 carbon atoms; and at least one of X1and R1is a group that contains a vinyl group.) (In general formula (2), * denotes a site bonded to an oxygen atom, and R2 represents a hydrogen atom or the like.)
C09D 133/14 - Homopolymères ou copolymères d'esters d'esters contenant des atomes d'halogène, d'azote, de soufre ou d'oxygène en plus de l'oxygène du radical carboxyle
Provided is a reactive material, including a compound represented by the following general formula (1) or (2).
Provided is a reactive material, including a compound represented by the following general formula (1) or (2).
Provided is a reactive material, including a compound represented by the following general formula (1) or (2).
In the formula (1), R1, R2, R3, and R4 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R1, R2, R3, or R4 represents the electron-withdrawing group.
Provided is a reactive material, including a compound represented by the following general formula (1) or (2).
In the formula (1), R1, R2, R3, and R4 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R1, R2, R3, or R4 represents the electron-withdrawing group.
Provided is a reactive material, including a compound represented by the following general formula (1) or (2).
In the formula (1), R1, R2, R3, and R4 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R1, R2, R3, or R4 represents the electron-withdrawing group.
In the formula (2), R5 and R6 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R5 or R6 represents the electron-withdrawing group.
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
36.
METAL ALKOXIDE COMPOUND, THIN FILM FORMING RAW MATERIAL, AND THIN FILM PRODUCTION METHOD
The present invention provides a metal alkoxide compound represented by the following general formula (1), a thin-film-forming raw material containing the same, and a thin film production method of forming a metal-containing thin film using the raw material:
The present invention provides a metal alkoxide compound represented by the following general formula (1), a thin-film-forming raw material containing the same, and a thin film production method of forming a metal-containing thin film using the raw material:
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
37.
FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE
A material for forming a film for a semiconductor provides a film having excellent heat resistance and solvent resistance. It contains: a compound represented by general formula (I) and having at least one reactive group, or a polymer including, as a monomer, a compound represented by general formula (I) below and having at least one reactive group; and a solvent. In the formula, A represents a hydrocarbon ring having 6 carbon atoms, X1 and X2 each represent an aryl group having 6-30 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R1-R4 and R6-R9 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R5 and R10 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group.
A material for forming a film for a semiconductor provides a film having excellent heat resistance and solvent resistance. It contains: a compound represented by general formula (I) and having at least one reactive group, or a polymer including, as a monomer, a compound represented by general formula (I) below and having at least one reactive group; and a solvent. In the formula, A represents a hydrocarbon ring having 6 carbon atoms, X1 and X2 each represent an aryl group having 6-30 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R1-R4 and R6-R9 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R5 and R10 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group.
Provided is a cobalt compound represented by the following general formula (1):
Provided is a cobalt compound represented by the following general formula (1):
Provided is a cobalt compound represented by the following general formula (1):
where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the following general formula (L-2);
Provided is a cobalt compound represented by the following general formula (1):
where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the following general formula (L-2);
Provided is a cobalt compound represented by the following general formula (1):
where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the following general formula (L-2);
where R8 to R10 each independently represent an alkyl group having 1 to 5 carbon atoms, A1 and A2 each independently represent an alkanediyl group having 1 to 5 carbon atoms, and * represents a bonding site.
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
C23C 16/448 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour produire des courants de gaz réactifs, p. ex. par évaporation ou par sublimation de matériaux précurseurs
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
39.
COMPOSITION, PATTERNING MATERIAL, CURED PRODUCT AND METHOD FOR PRODUCING SAME, AND ELECTRONIC COMPONENT
The problem of the present invention is to provide a composition from which a cured product excellent in photoresist properties, mechanical properties (low curl, high adhesion), and heat resistance is obtained. The present invention is: a composition containing a polyimide precursor having a radically polymerizable group and an acrylamide compound; a patterning material containing the composition; a cured product of the composition and a method for producing same; and an electronic component having the cured product. The composition preferably contains a latent additive having a structure in which the hydroxyl group of a phenolic antioxidant is protected. It is also preferable that the composition contain a radical polymerization initiator.
C08F 283/04 - Composés macromoléculaires obtenus par polymérisation de monomères sur des polymères prévus par la sous-classe sur des polycarbonamides, des polyesteramides ou des polyimides
This antibacterial composition contains a photocationic polymerization initiator. The antibacterial composition preferably further contains an epoxy compound or an acrylic compound. The epoxy compound preferably contains an alicyclic epoxy compound, and an aromatic epoxy compound and/or an aliphatic epoxy compound. The epoxy compound preferably does not contain an alicyclic epoxy compound but contains an aromatic epoxy compound and an aliphatic epoxy compound. The acrylic compound preferably contains a compound which has a skeleton derived from dipentaerythritol and which includes three or more functional groups as the total of acrylic groups and methacrylic groups.
A01N 25/00 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, caractérisés par leurs formes, ingrédients inactifs ou modes d'applicationSubstances réduisant les effets nocifs des ingrédients actifs vis-à-vis d'organismes autres que les animaux nuisibles
A01N 29/00 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des hydrocarbures halogénés
A01N 31/08 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés organiques de l'oxygène ou du soufre l'atome d'oxygène ou de soufre étant lié directement à un système cyclique aromatique
C08F 2/50 - Polymérisation amorcée par énergie ondulatoire ou par rayonnement corpusculaire par la lumière ultraviolette ou visible avec des agents sensibilisants
C08G 59/68 - Macromolécules obtenues par polymérisation à partir de composés contenant plusieurs groupes époxyde par molécule en utilisant des agents de durcissement ou des catalyseurs qui réagissent avec les groupes époxyde caractérisées par les catalyseurs utilisés
Provided is a urethane prepolymer composition which contains a urethane prepolymer obtained by reacting at least one polyol compound with at least one isocyanate compound, the urethane prepolymer composition being characterized in that the polyol compound contains a hydroxyl group-containing compound having an NSSN bond.
C08G 18/38 - Composés de bas poids moléculaire contenant des hétéro-atomes autres que l'oxygène
C08G 18/10 - Procédés mettant en œuvre un prépolymère impliquant la réaction d'isocyanates ou d'isothiocyanates avec des composés contenant des hydrogènes actifs, dans une première étape réactionnelle
Provided is a resin composition containing: a component (A) which is composed of an epoxy resin that is in a solid state at 25°C; and a component (B) which is composed of one or more compounds selected from the group consisting of a polyether polyurethane prepolymer and a polyether polyurethane. Also provided is a method for producing a metal laminate, the method comprising: a step in which the resin composition is applied to the surface of a first metal plate so as to form a coating film; and a step in which a second metal plate is superposed on the coating film of the first metal plate so as to form a metal laminate.
C08L 63/00 - Compositions contenant des résines époxyCompositions contenant des dérivés des résines époxy
B32B 15/08 - Produits stratifiés composés essentiellement de métal comprenant un métal comme seul composant ou comme composant principal d'une couche adjacente à une autre couche d'une substance spécifique de résine synthétique
C08G 18/10 - Procédés mettant en œuvre un prépolymère impliquant la réaction d'isocyanates ou d'isothiocyanates avec des composés contenant des hydrogènes actifs, dans une première étape réactionnelle
C08L 75/08 - Polyuréthanes à partir des polyéthers
C09D 163/00 - Compositions de revêtement à base de résines époxyCompositions de revêtement à base de dérivés des résines époxy
C09D 175/08 - Polyuréthanes à partir de polyéthers
C09J 163/00 - Adhésifs à base de résines époxyAdhésifs à base de dérivés des résines époxy
C09J 175/08 - Polyuréthanes à partir de polyéthers
43.
METHOD FOR PRODUCING BIO-DERIVED ESTER COMPOUND, BIO-DERIVED ESTER COMPOUND PRODUCED THEREBY, COSMETIC OR DETERGENT CONTAINING BIO-DERIVED ESTER COMPOUND, AND METHOD FOR REDUCING ODOR OF ESTER COMPOUND
The present invention provides: a method for producing a bio-derived ester compound having reduced odor; a bio-derived ester compound produced by the production method; a cosmetic or detergent containing the ester compound; and a method for reducing odor of an ester compound.
C07C 67/08 - Préparation d'esters d'acides carboxyliques par réaction d'acides carboxyliques ou d'anhydrides symétriques avec le groupe hydroxyle ou O-métal de composés organiques
C07C 29/34 - Préparation de composés comportant des groupes hydroxyle ou O-métal liés à un atome de carbone ne faisant pas partie d'un cycle aromatique à six chaînons par des réactions augmentant le nombre d'atomes de carbone sans formation de groupes hydroxyle par condensation impliquant des groupes hydroxyle, ou leurs esters d'acides minéraux, p. ex. réaction de Guerbet
C07C 31/125 - Alcools monohydroxyliques acycliques contenant de cinq à vingt-deux atomes de carbone
C07C 69/24 - Esters d'acides acycliques monocarboxyliques saturés dont le groupe carboxyle est lié à un atome de carbone acyclique ou à l'hydrogène avec au moins trois atomes de carbone dans la partie acide estérifiés par des composés monohydroxylés
C07C 69/84 - Esters d'acides carboxyliques dont un groupe carboxyle estérifié est lié à un atome de carbone d'un cycle aromatique à six chaînons d'acides hydroxycarboxyliques monocycliques dont les groupes hydroxyle et les groupes carboxyle sont liés à des atomes de carbone d'un cycle aromatique à six chaînons
44.
COMPOSITION, BLACK MATRIX, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND DISPLAY DEVICE
A composition containing a compound (A) having a carboxyl group, an epoxy compound (B), a thiol compound (C), a tertiary amine compound (D) having a condensed ring and no NH group, a colorant (E), and a polymerization initiator (F). The epoxy equivalent of the epoxy compound (B) is preferably 80 g/eq. to less than 300 g/eq. The thiol compound (C) is preferably a secondary thiol compound. The colorant (E) is preferably sulfonic acid-treated carbon black.
NATIONAL UNIVERSITY CORPORATION TOKYO MEDICAL AND DENTAL UNIVERSITY (Japon)
SAPPORO MEDICAL UNIVERSITY (Japon)
ADEKA CORPORATION (Japon)
KM Biologics Co., Ltd. (Japon)
Inventeur(s)
Matsuda, Junichi
Miyabashira, Sumika
Harano, Satomi
Kishida, Akio
Kimura, Tsuyoshi
Negishi, Jun
Higami, Tetsuya
Funamoto, Seiichi
Hiwatari, Ken-Ichiro
Tasaki, Akiko
Abrégé
A hybrid gel comprising a particulate decellularized tissue (obtained by pulverizing animal-derived biological tissues that are decellularized (decellularized biological tissues)), fibrinogen and thrombin; a cell culture material comprising the hybrid gel; a method for preparing the hybrid gel; and a kit comprising a particulate decellularized tissue and a biological tissue adhesive are provided. The hybrid gel of the present invention exerts the effect to promote differentiation and gain of function of stem cells and the therapeutic effect to a variety of diseases.
A61L 27/26 - Mélanges de matériaux macromoléculaires
A61L 27/36 - Matériaux pour prothèses ou pour revêtement de prothèses contenant des constituants de constitution indéterminée ou leurs produits réactionnels
A61L 27/54 - Matériaux biologiquement actifs, p. ex. substances thérapeutiques
C12N 5/00 - Cellules non différenciées humaines, animales ou végétales, p. ex. lignées cellulairesTissusLeur culture ou conservationMilieux de culture à cet effet
This compound has: at least one structure selected from a structure represented by general formula (I-I) and a structure represented by general formula (I-II); a structure represented by general formula (II); and a structure represented by general formula (III). X1and X2each independently represent a direct bond, C(R10122, O, CO, S or NR102; Y1each independently represent C(R20122, O, CO, S, N, or NR202. Note that when Y1 is N, a double bond is formed along the dotted line of formula (II). Other symbols in the formulas are as defined in the description.
C07D 417/04 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre et d'azote comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant deux hétérocycles liés par une liaison directe de chaînon cyclique à chaînon cyclique
C08L 101/00 - Compositions contenant des composés macromoléculaires non spécifiés
A curing resin composition well balanced in curing properties and storage stability. The composition contains (A) an epoxy resin, (B) a curing agent, and (C) at least one of imide compounds represented by formulae (1-1), (1-2), and (1-3), wherein R11 represents an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.; R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group with 1 to 10 carbon atoms, etc.; and R12 and R13 each independently represent a hydrogen atom, an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.
A curing resin composition well balanced in curing properties and storage stability. The composition contains (A) an epoxy resin, (B) a curing agent, and (C) at least one of imide compounds represented by formulae (1-1), (1-2), and (1-3), wherein R11 represents an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.; R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group with 1 to 10 carbon atoms, etc.; and R12 and R13 each independently represent a hydrogen atom, an optionally substituted alkyl group with 1 to 10 carbon atoms, etc.
A compound is represented by the following general formula (1), a thin-film forming raw material including the compound, a thin-film, and a method of producing a thin-film:
A compound is represented by the following general formula (1), a thin-film forming raw material including the compound, a thin-film, and a method of producing a thin-film:
wherein R1 to R4 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R5 and R6 each independently represent an alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 5 carbon atoms, L represents a group represented by the general formula (L-1) or (L-2) described herein, and M represents a hafnium atom, a zirconium atom, or a titanium atom, provided that in a case of a compound in which R5 and R6 each represent a methyl group, A represents an alkanediyl group having 2 carbon atoms, and M represents a titanium atom, L represents a group represented by the general formula (L-2).
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
49.
COMPOSITION, ADHESIVE, CURED PRODUCT MANUFACTURING METHOD, AND CURED PRODUCT
A composition of the present invention contains a polyfunctional acrylic compound (A) having a condensed ring, a monofunctional acrylate compound (B), an epoxy compound (C), an oxetane compound (D), a cationic polymerization initiator (E), and a radical polymerization initiator (F), wherein the epoxy compound (C) contains an epoxy compound (C1) having a condensed ring, and the content of the epoxy compound (C1) relative to the epoxy compound (C) is 1-30 mass%. The polyfunctional acrylic compound (A) having a condensed ring is preferably a compound (A1) having a tricyclodecane skeleton.
C08G 59/68 - Macromolécules obtenues par polymérisation à partir de composés contenant plusieurs groupes époxyde par molécule en utilisant des agents de durcissement ou des catalyseurs qui réagissent avec les groupes époxyde caractérisées par les catalyseurs utilisés
C08F 2/50 - Polymérisation amorcée par énergie ondulatoire ou par rayonnement corpusculaire par la lumière ultraviolette ou visible avec des agents sensibilisants
C08G 59/20 - Macromolécules obtenues par polymérisation à partir de composés contenant plusieurs groupes époxyde par molécule en utilisant des agents de durcissement ou des catalyseurs qui réagissent avec les groupes époxyde caractérisées par les composés époxydés utilisés
Provided are: a nucleating agent composition capable of imparting excellent mechanical properties to a molded article containing a polyolefin-based resin; a resin composition containing the nucleating agent composition; the molded article having excellent mechanical properties; and a method for manufacturing the resin composition. The nucleating agent composition is characterized by containing at least one type of a nucleating agent for a polyolefin-based resin, wherein a β crystal fraction ranges from 0.2% to 71% as calculated by the following method. Through the use of a sample sampled from the pellets of the resin composition containing the nucleating agent composition, differential scanning calorimetry is performed according to a predetermined program to find a DSC curve, Q=f(θ), with the horizontal axis being temperature θ(° C.) and the vertical axis being heat flow rate Q(mW), and a baseline, g(θ), thereby obtaining a baseline-corrected DSC curve, Q′=h(θ)=f(θ)−g(θ). Subsequently, according to a predetermined procedure, a line area St and a β crystal area Sβ are found, thereby calculating the β crystal fraction (%).
Provided are: a nucleating agent composition capable of imparting excellent mechanical properties to a molded article containing a polyolefin-based resin; a resin composition containing the nucleating agent composition; the molded article having excellent mechanical properties; and a method for manufacturing the resin composition. The nucleating agent composition is characterized by containing at least one type of a nucleating agent for a polyolefin-based resin, wherein a β crystal fraction ranges from 0.2% to 71% as calculated by the following method. Through the use of a sample sampled from the pellets of the resin composition containing the nucleating agent composition, differential scanning calorimetry is performed according to a predetermined program to find a DSC curve, Q=f(θ), with the horizontal axis being temperature θ(° C.) and the vertical axis being heat flow rate Q(mW), and a baseline, g(θ), thereby obtaining a baseline-corrected DSC curve, Q′=h(θ)=f(θ)−g(θ). Subsequently, according to a predetermined procedure, a line area St and a β crystal area Sβ are found, thereby calculating the β crystal fraction (%).
β
crystal
fraction
=
S
β
/
S
t
×
100
(
%
)
B29B 7/28 - Éléments constitutifs, détails ou accessoiresOpérations auxiliaires pour mesurer, régler ou réguler, p. ex. réglage de viscosité
B29B 7/18 - MélangeMalaxage discontinu, avec dispositifs mécaniques de mélange ou de malaxage, c.-à-d. de type travaillant par charges avec dispositifs de mélange ou de malaxage mobiles rotatifs avec plus d'un arbre
The present invention achieves a bakery food that is crispy yet soft and smooth in the mouth, and also provides bakery dough demonstrating good physical properties when producing the bakery food. This bakery food improver contains 50% to 90% by mass of degreased concentrated milk having a solid content of 35% by mass or more, wherein among all particles of the improver, particles having a particle size in the range of 0.2 to 1.0 μm constitute 70% or more, according to a laser diffraction particle size distribution measurement.
Provided is a thin-film forming raw material, including an alkoxide compound represented by the following general formula (1):
Provided is a thin-film forming raw material, including an alkoxide compound represented by the following general formula (1):
Provided is a thin-film forming raw material, including an alkoxide compound represented by the following general formula (1):
where R1 to R4 each independently represent an alkyl group having 1 to 5 carbon atoms, M represents a rare earth metal atom, and “n” represents a valence of the rare earth metal atom.
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
An epoxy material that provides a cured product having a reduced modulus of elasticity and thereby maintaining reliability even under conditions of wide environmental variation. The epoxy resin composition provided includes (A) an epoxy compound A of formula (1) below, (B) phenyl glycidyl ether substituted with a C6-20 hydrocarbon group, and (C) a curing agent. In formula (1), R1 and R2 each independently represent C2-4 alkylene; R3 represents methylene or —C(CH3)2—; and a and b each independently represent a number of 1 to 10.
An epoxy material that provides a cured product having a reduced modulus of elasticity and thereby maintaining reliability even under conditions of wide environmental variation. The epoxy resin composition provided includes (A) an epoxy compound A of formula (1) below, (B) phenyl glycidyl ether substituted with a C6-20 hydrocarbon group, and (C) a curing agent. In formula (1), R1 and R2 each independently represent C2-4 alkylene; R3 represents methylene or —C(CH3)2—; and a and b each independently represent a number of 1 to 10.
The present invention addresses the problem of providing a resin additive having excellent heat resistance and excellent resin stabilization performance. The present invention is a resin additive containing a compound represented by general formula (1). In general formula (1): R1represents an alkyl group having 26-40 carbon atoms, an alkenyl group having 26-40 carbon atoms, or a group represented by general formula (2); and n represents an integer of 1 or 2. When n is 2, the plurality of R1s may be the same or different from each other. In general formula (2): R2 represents a hydrogen atom or an alkyl group having 1-18 carbon atoms; m represents an integer that makes the number-average molecular weight of the group represented by general formula (2) equal to 100-10,000; and * represents a bond.
A thermoplastic resin composition for FDM additive manufacturing containing 100 parts by mass of a thermoplastic resin, 0.01 to 5 parts by mass of a primary antioxidant, and 0.01 to 1.4 parts by mass of a secondary antioxidant. The thermoplastic resin is a condensation thermoplastic resin. The primary antioxidant is a phenol antioxidant having at least one structure represented by formula (1). The secondary antioxidant is at least one of a phosphorus antioxidant represented by formula (2), (3), or (4) given in the description and a thioether antioxidant represented by formula (5) or (6) given in the description.
A thermoplastic resin composition for FDM additive manufacturing containing 100 parts by mass of a thermoplastic resin, 0.01 to 5 parts by mass of a primary antioxidant, and 0.01 to 1.4 parts by mass of a secondary antioxidant. The thermoplastic resin is a condensation thermoplastic resin. The primary antioxidant is a phenol antioxidant having at least one structure represented by formula (1). The secondary antioxidant is at least one of a phosphorus antioxidant represented by formula (2), (3), or (4) given in the description and a thioether antioxidant represented by formula (5) or (6) given in the description.
A thermoplastic resin composition for FDM additive manufacturing containing 100 parts by mass of a thermoplastic resin, 0.01 to 5 parts by mass of a primary antioxidant, and 0.01 to 1.4 parts by mass of a secondary antioxidant. The thermoplastic resin is a condensation thermoplastic resin. The primary antioxidant is a phenol antioxidant having at least one structure represented by formula (1). The secondary antioxidant is at least one of a phosphorus antioxidant represented by formula (2), (3), or (4) given in the description and a thioether antioxidant represented by formula (5) or (6) given in the description.
In formula (1), R11 and R12 each independently represent hydrogen or methyl; and * indicates a bond.
The present invention pertains to a thin film manufacturing method and a thin film forming material, by which a bismuth metal thin film or an antimony metal thin film is formed by using a compound represented by general formula (1) and a compound represented by general formula (2). (In general formula (1), M1represents a trivalent bismuth or a trivalent antimony.) (In general formula (2), M2represents a trivalent bismuth or a trivalent antimony, and L1, L2, and L3each independently represent an alkyl group having 1-10 carbon atoms, a halogen atom, an alkoxy group having 1-10 carbon atoms, or a group represented by general formula (3). However, M1and M2are the same metal.) (In general formula (3), R1and R2each independently represent a hydrogen atom, an alkyl group having 1-10 carbon atoms, or -SiR3R4R5, R3, R4, and R5each independently represent an alkyl group having 1-10 carbon atoms, and * represents a binding site with respect to M2.)
C23C 16/18 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique à partir de composés organométalliques
Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof.
Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof.
A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1):
Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof.
A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1):
Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof.
A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1):
(in the formula (1), R1 to R4 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 9 carbon atoms, and R5 represents an alkylidene group having 1 to 4 carbon atoms) and a fatty acid sodium salt (B) represented by the following general formula (2):
Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof.
A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1):
(in the formula (1), R1 to R4 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 9 carbon atoms, and R5 represents an alkylidene group having 1 to 4 carbon atoms) and a fatty acid sodium salt (B) represented by the following general formula (2):
Provided are a resin additive composition which is excellent in fluidity and can impart excellent physical properties to a thermoplastic resin, a thermoplastic resin composition, and a molded article thereof.
A resin additive composition is composed of a phosphoric acid ester compound (A) represented by the following general formula (1):
(in the formula (1), R1 to R4 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 9 carbon atoms, and R5 represents an alkylidene group having 1 to 4 carbon atoms) and a fatty acid sodium salt (B) represented by the following general formula (2):
(in the formula (2), R6 represents a group introduced from an aliphatic organic acid having 7 to 30 carbon atoms), and the mass ratio of (B)/(A) is 0.55 to 2.0.
C08K 13/02 - Ingrédients organiques et inorganiques
C08L 23/00 - Compositions contenant des homopolymères ou des copolymères d'hydrocarbures aliphatiques non saturés ne possédant qu'une seule liaison double carbone-carboneCompositions contenant des dérivés de tels polymères
C08L 31/00 - Compositions contenant des homopolymères ou des copolymères de composés possédant un ou plusieurs radicaux aliphatiques non saturés, chacun ne contenant qu'une seule double liaison carbone-carbone et l'un au moins étant terminé par un radical acyloxy d'un acide carboxylique saturé, d'un acide carbonique ou d'un acide haloformiqueCompositions contenant des dérivés de tels polymères
C08L 101/00 - Compositions contenant des composés macromoléculaires non spécifiés
58.
RESIN COMPOSITION, MOLDED ARTICLE, WATERPROOF SHEET, METHOD FOR PRODUCING RESIN COMPOSITION, METHOD FOR IMPROVING WEATHER RESISTANCE AND HEAT RESISTANCE OF RESIN COMPOSITION, AND LIGHT STABILIZER
The present invention provides: a resin composition which has excellent weather resistance and heat resistance; a molded article; a waterproof sheet; a method for producing a resin composition; a method for improving the weather resistance and the heat resistance of a resin composition; and a light stabilizer. A resin composition according to the present invention is characterized by containing (A) a synthetic resin, (B) a hindered amine light stabilizer and (C) a benzoate light stabilizer, and is also characterized in that: the synthetic resin (A) contains a polyolefin resin; the polyolefin resin contains a polyolefin plastomer; and the content of the polyolefin plastomer in the polyolefin resin is 40% by mass or more of the total amount of the polyolefin resin.
C08L 23/02 - Compositions contenant des homopolymères ou des copolymères d'hydrocarbures aliphatiques non saturés ne possédant qu'une seule liaison double carbone-carboneCompositions contenant des dérivés de tels polymères non modifiées par un post-traitement chimique
The present invention provides: an etching liquid composition which is capable of forming a layer having excellent surface flatness by etching a layer that contains ruthenium; and an etching method and a method for producing a base material, each using this composition. Provided is an etching liquid composition which is used for the purpose of etching a layer that contains ruthenium. This etching liquid composition contains (A) a ferricyanide, (B) at least one substance that is selected from the group consisting of sodium hydroxide and potassium hydroxide, and water. Also provided are an etching method and a method for producing a base material, each of which comprises a step of etching a layer that contains ruthenium with use of this composition.
The present disclosure provides a compound represented by general formula (1), a raw material for thin film formation containing said compound, a thin film formed from the material for thin film formation, and a method for producing a thin film. (In the formula, R1and R2each independently represent a C1-8 alkyl group, and R3represents a hydrogen atom or a C1-5 alkyl group. However, R1and R2 are different groups.)
C07C 257/12 - Composés contenant des groupes carboxyle, l'atome d'oxygène, lié par une liaison double, d'un groupe carboxyle étant remplacé par un atome d'azote lié par une liaison double, cet atome d'azote n'étant pas lié de plus à un atome d'oxygène, p. ex. imino-éthers, amidines avec remplacement de l'autre atome d'oxygène du groupe carboxyle par des atomes d'azote, p. ex. amidines ayant des atomes de carbone de groupes amidino liés à des atomes d'hydrogène
C07F 5/00 - Composés contenant des éléments des groupes 3 ou 13 du tableau périodique
C23C 16/06 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le dépôt d'un matériau métallique
There is provided a composition that makes it possible to produce a cured product having a low volume resistance value, a cured product obtained by curing the composition, and a method for producing a cured product using the composition. The composition contains a component (A): at least metal particles selected from the group consisting of copper particles and silver particles, a component (B): at least one cashew component selected from the group consisting of cashew oils and cashew oil-modified resins, and a component (C): a curing agent. The cured product is obtained by curing the composition. The method for producing a cured product includes a coating step of coating a substrate with the composition and a curing step of heating the substrate coated with the composition to cure the composition.
Provided is a composition containing (A) at least one selected from the group consisting of compounds represented by general formula (1) and compounds represented by general formula (2), (B) at least one selected from the group consisting of methacrylate compounds and acrylate compounds that are different from said (A), and (C) a photoradical initiator. [Chem. 1] R11and R12each independently represent a hydrogen atom or a methyl group, and X11and X12each independently represent a direct bond, an aliphatic hydrocarbon group having 1-20 carbon atoms, or the like. n1 represents an integer of 1-5. [Chem. 2] R21, R22, R23, and R24 each independently represent a hydrogen atom, an aliphatic hydrocarbon group having 1-20 carbon atoms, or the like. n2 represents an integer of 1-10.
C09D 133/14 - Homopolymères ou copolymères d'esters d'esters contenant des atomes d'halogène, d'azote, de soufre ou d'oxygène en plus de l'oxygène du radical carboxyle
63.
FLAME-RETARDANT COMPOSITION, FLAME-RETARDANT RESIN COMPOSITION AND MOLDED ARTICLE
This flame-retardant composition contains: one or more melamine salt (A) components selected from the group consisting of melamine orthophosphate, melamine pyrophosphate, and melamine polyphosphate; one or more piperazine salt (B) components selected from the group consisting of piperazine orthophosphate, piperazine pyrophosphate, and piperazine polyphosphate; and one or more dialkylphosphinate compound (C) components represented by general formula (1). The content of the (C) component is 0.2 mass% to 39 mass% in 100 mass% of the total of the (A) component, the (B) component, and the (C) component.
The purpose of the present invention is to provide a decellularized graft that can be easily produced. The present invention provides: a decellularized cell aggregate in which decellularization is applied to a cultured cell aggregate, the decellularized cell aggregate having 3-45 surface pores having pore diameters equal to or greater than 5 µm per aggregate surface of 11088 μm2; and/or a decellularized cell aggregate in which decellularization is applied to a cultured cell aggregate, the decellularized cell aggregate containing 10 pg/mg or more of lamin. The above problem can be solved by said decellularized cell aggregates.
C12N 1/00 - Micro-organismes, p. ex. protozoairesCompositions les contenantProcédés de culture ou de conservation de micro-organismes, ou de compositions les contenantProcédés de préparation ou d'isolement d'une composition contenant un micro-organismeLeurs milieux de culture
A61L 27/36 - Matériaux pour prothèses ou pour revêtement de prothèses contenant des constituants de constitution indéterminée ou leurs produits réactionnels
A61L 27/40 - Matériaux composites, c.-à-d. en couches ou contenant un matériau dispersé dans une matrice constituée d'un matériau analogue ou différent
C12M 3/00 - Appareillage pour la culture de tissus, de cellules humaines, animales ou végétales, ou de virus
C12N 5/10 - Cellules modifiées par l'introduction de matériel génétique étranger, p. ex. cellules transformées par des virus
65.
IMITATION CHEESE, METHOD FOR PRODUCING IMITATION CHEESE, AND FOOD PRODUCT CONTAINING IMITATION CHEESE
Provided is imitation cheese that has good flavor, excellent processability, remains stable for a long time so that the processability is not readily lost as time passes after production, and has good heat melting properties by which the cheese melts when heated but becomes gooey just to the extent that it does not flow out. The imitation cheese contains (A) nuts and seeds, (B) oxidatively treated starch, (C) hydroxypropylated starch, and (D) oil/fat. The imitation cheese satisfies the following condition 1 and has a pH of 3.0 to 6.0. (Condition 1) The content of tri-saturated triglyceride in a triglyceride composition of the oil phase, the tri-saturated triglyceride being composed only of C12-22 saturated fatty acid residues, is 30.0 to 70.0 mass%.
A23C 20/02 - Succédanés du fromage ne contenant ni constituants du lait, ni caséinate, ni lactose, en tant que sources de matières grasses, de protéines ou d'hydrates de carbone
A23J 3/00 - Traitement des protéines pour l'alimentation
66.
TIN COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN-FILM, METHOD FOR PRODUCING THIN-FILM, AND HALOGEN COMPOUND
Provided is a tin compound, which is represented by the following general formula (1):
Provided is a tin compound, which is represented by the following general formula (1):
in the formula (1), R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms or an alkylsilyl group having 3 to 12 carbon atoms, R3 and R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and R5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
C23C 16/448 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour produire des courants de gaz réactifs, p. ex. par évaporation ou par sublimation de matériaux précurseurs
67.
THIN-FILM FORMING RAW MATERIAL, WHICH IS USED IN ATOMIC LAYER DEPOSITION METHOD, THIN-FILM, METHOD OF PRODUCING THIN-FILM, AND ZINC COMPOUND
Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1):
Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1):
M(R1)x1[A1-N(R2)(R3)]y1 (1)
Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1):
M(R1)x1[A1-N(R2)(R3)]y1 (1)
in the formula (1), R1, R2, and R3 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms, A1 represents a linear or branched alkylene group having 1 to 5 carbon atoms, x1 represents an integer of from 0 to 2, y1 represents an integer of from 1 to 3, and M represents an indium atom or a zinc atom, provided that when M represents an indium atom, a compound in which x1 represents 2, y1 represents 1, and R1, R2, and R3 each represent a methyl group is excluded.
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
68.
SULFUR-CONTAINING MATERIAL FOR POSITIVE ELECTRODE ACTIVE MATERIALS, LITHIUM ION SECONDARY BATTERY, METHOD FOR CHARGING AND DISCHARGING LITHIUM ION SECONDARY BATTERY, AND COMPOSITION FOR FORMING POSITIVE ELECTRODE ACTIVE MATERIAL LAYER
The present invention provides a sulfur-containing material for positive electrode active materials for lithium ion secondary batteries; and this sulfur-containing material for positive electrode active materials is characterized by containing a sulfur-modified compound and by being used while setting the end-of-discharge potential of the positive electrode to less than 1.0 V (Li+/Li) in the charge and discharge cycle of a lithium ion secondary battery.
H01M 4/60 - Emploi de substances spécifiées comme matériaux actifs, masses actives, liquides actifs de composés organiques
H01M 4/136 - Électrodes à base de composés inorganiques autres que les oxydes ou les hydroxydes, p. ex. sulfures, séléniures, tellurures, halogénures ou LiCoFy
H01M 4/137 - Électrodes à base de polymères électro-actifs
H01M 4/1397 - Procédés de fabrication d’électrodes à base de composés inorganiques autres que les oxydes ou les hydroxydes, p. ex. sulfures, séléniures, tellurures, halogénures ou LiCoFy
H01M 4/1399 - Procédés de fabrication d’électrodes à base de polymères électro-actifs
H01M 4/38 - Emploi de substances spécifiées comme matériaux actifs, masses actives, liquides actifs d'éléments simples ou d'alliages
Provided is a lithium ion secondary battery manufacturing method that is characterized by having: a charge/discharge processing step for performing charge/discharge processing of a first lithium ion secondary battery that includes a positive electrode, a first liquid electrolyte, and a negative electrode, said positive electrode having a positive electrode active material layer that includes a sulfur-modified compound; and an exchange step for exchanging the first liquid electrolyte for a second liquid electrolyte after the charge/discharge processing step, to obtain a second lithium ion secondary battery, wherein the first liquid electrolyte includes a solvent selected from the group consisting of saturated cyclic carbonate compounds and saturated straight-chain carbonate compounds, and the second liquid electrolyte includes a solvent selected from the group consisting of saturated cyclic ether compounds and saturated straight-chain ether compounds.
A non-aqueous electrolyte power storage device in which a coating material having a silanol group is present at least on a surface of an electrode active material layer and a sulfur-based material is contained in a cell, the electrode active material layer contains an electrode active material and a resin-based binder, the electrode active material is an active material capable of being alloyed with a metal element identical to an ion species responsible for electrical conduction or an active material capable of absorbing ions responsible for electrical conduction, and the coating material having a silanol group is a silicate containing a siloxane bond as a component or a silica fine particle aggregate (containing a siloxane bond as a component).
A curing resin composition including (A) a cyanate ester resin, (B) an epoxy resin, (C) an active hydrogen-containing amine latent curing agent, and (D) an ion scavenger. The cyanate ester resin (A) is preferably at least one of a compound of formula (1) below, a compound of formula (2) below, and a polymer of at least one of these compounds (1) and (2).
A curing resin composition including (A) a cyanate ester resin, (B) an epoxy resin, (C) an active hydrogen-containing amine latent curing agent, and (D) an ion scavenger. The cyanate ester resin (A) is preferably at least one of a compound of formula (1) below, a compound of formula (2) below, and a polymer of at least one of these compounds (1) and (2).
NC—O-A1-Y1-A2-O—CN (1)
wherein the symbols are as defined in the description.
A curing resin composition including (A) a cyanate ester resin, (B) an epoxy resin, (C) an active hydrogen-containing amine latent curing agent, and (D) an ion scavenger. The cyanate ester resin (A) is preferably at least one of a compound of formula (1) below, a compound of formula (2) below, and a polymer of at least one of these compounds (1) and (2).
NC—O-A1-Y1-A2-O—CN (1)
wherein the symbols are as defined in the description.
wherein the symbols are as defined in the description.
Disclosed is a curable resin composition containing: (A) a cyanate ester resin; (B) an epoxy resin essentially including at least a 4-amino-3-methylphenol-type epoxy resin; and (C) a latent curing agent. Preferably, the cyanate ester resin (A) is at least one selected from the group consisting of compounds represented by formula (1) below, compounds represented by formula (2) below, and at least one of polymer of these compounds. Formula (1): NC—O-A1-Y1-A2-O—CN (See the Description for the symbols in the formula). Formula (2): (See the Description for the symbols in the formula).
This compound is a compound represented by general formula (I). (In the formula, X represents a hydrogen atom, an optionally substituted cyclic group in which the number of carbon atoms in the cyclic structure is 2-20, an optionally substituted C1-20 chain hydrocarbon group, etc.; R1-R7represent a hydrogen atom, a reactive group selected from < group A >, an optionally substituted C1-20 alkyl group, an optionally substituted C6-20 aromatic cyclic group, etc.; < group A > is a carbon-carbon unsaturated bond-bearing group, cyclic ether group, hydroxyl group, mercapto group, amino group, halogen atom, and cyano group; a represents an integer from 1-10; R1and R2may be bonded to each other to form a ring, R3and R4may be bonded to each other to form a ring, R4and R5may be bonded to each other to form a ring, R5and R6may be bonded to each other to form a ring, and the R7and R7 present in a plurality may be bonded to each other to form a ring; and at least one reactive group selected from < group A > is present in the molecule. Refer to the Description for additional definitions.)
C07D 221/18 - Systèmes cycliques d'au moins quatre cycles
C07D 401/04 - Composés hétérocycliques contenant plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle, au moins un cycle étant un cycle à six chaînons avec un unique atome d'azote contenant deux hétérocycles liés par une liaison directe de chaînon cyclique à chaînon cyclique
C08G 59/40 - Macromolécules obtenues par polymérisation à partir de composés contenant plusieurs groupes époxyde par molécule en utilisant des agents de durcissement ou des catalyseurs qui réagissent avec les groupes époxyde caractérisées par les agents de durcissement utilisés
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
17 - Produits en caoutchouc ou en matières plastiques; matières à calfeutrer et à isoler
Produits et services
Adhesives used in industry; unprocessed plastics in primary
form; epoxy resins; polyurethane resins; chemical agents;
epoxy resin curing agents; curing agents for insulating
resins. Resin based electrical insulating materials; electrical
insulating materials; plastic semi-worked products; plastic
semi-worked products in sheet, film, foil and tape forms;
laminated plastic sheets and plastic films; plastic sheets
and plastic films with adhesive layers; laminated plastic
sheets; laminated plastic films; plastic semi-worked
products in the form of polyethylene sheet.
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
17 - Produits en caoutchouc ou en matières plastiques; matières à calfeutrer et à isoler
Produits et services
Adhesives used in industry; unprocessed plastics in primary
form; epoxy resins; polyurethane resins; chemical agents;
epoxy resin curing agents; curing agents for insulating
resins. Resin based electrical insulating materials; electrical
insulating materials; plastic semi-worked products; plastic
semi-worked products in sheet, film, foil and tape forms;
laminated plastic sheets and plastic films; plastic sheets
and plastic films with adhesive layers; laminated plastic
sheets; laminated plastic films; plastic semi-worked
products in the form of polyethylene sheet.
76.
ADDITIVE FOR ELECTROPLATING SOLUTION, ELECTROPLATING SOLUTION, ELECTROPLATING METHOD, AND METHOD OF PRODUCING METAL LAYER
Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group
Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group
Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group
having 1 to 5 carbon atoms, or a group represented by any one of the general formulae (L-1) to (L-3), and n represents an integer of from 1 to 5:
Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group
having 1 to 5 carbon atoms, or a group represented by any one of the general formulae (L-1) to (L-3), and n represents an integer of from 1 to 5:
Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group
having 1 to 5 carbon atoms, or a group represented by any one of the general formulae (L-1) to (L-3), and n represents an integer of from 1 to 5:
where m1 to m3 each independently represent an integer of from 1 to 5, and * represents a bonding site.
Provided is a conductive undercoating agent, including: a conductive carbon material; a binding agent; and a solvent, wherein the conductive carbon material is flaked graphite having an average thickness of from 10 nm to 200 nm and a specific surface area of from 10 m2/g to 40 m2/g.
The present invention provides a method for producing a bio-derived branched alkyl glyceryl ether, the method comprising: a step for producing a bio-derived branched primary alcohol having a branched alkyl group having 6 to 12 carbon atoms, the step including dimerizing at least one component selected from the group consisting of a bio-derived linear primary alcohol having a linear alkyl group having 3 to 6 carbon atoms, a bio-derived linear primary alcohol having a linear alkenyl group having 3 to 6 carbon atoms, a bio-derived linear aldehyde having a linear alkyl group having 3 to 6 carbon atoms, and a bio-derived linear aldehyde having a linear alkenyl group having 3 to 6 carbon atoms; and a step for producing a bio-derived branched alkyl glyceryl ether using the bio-derived branched primary alcohol. The present invention also provides a bio-derived branched alkyl glyceryl ether produced by the method.
C07C 41/26 - Préparation d'éthers par des réactions ne formant pas de liaisons sur l'oxygène de la fonction éther par introduction de groupes hydroxyle ou O-métal
79.
POLYMERIZABLE COMPOSITION, VEHICLE, CURED MATERIAL, AND METHOD OF MANUFACTURING CURED MATERIAL
A polymerizable composition includes a water-soluble monofunctional acrylamide compound, a water-soluble photoradical initiator, a water-soluble photosensitizer, and an aqueous solvent.
C08F 20/58 - Amides contenant de l'oxygène en plus de l'oxygène de la fonction carbonamide
C09D 4/00 - Compositions de revêtement, p. ex. peintures, vernis ou vernis-laques, à base de composés non macromoléculaires organiques ayant au moins une liaison non saturée carbone-carbone polymérisable
C09D 11/101 - Encres spécialement adaptées aux procédés d’imprimerie mettant en œuvre la réticulation par énergie ondulatoire ou par radiation de particules, p. ex. réticulation par UV qui suit l’impression
C09D 11/106 - Encres d’imprimerie à base de résines artificielles contenant des composés macromoléculaires obtenus par des réactions faisant intervenir uniquement des liaisons non saturées carbone-carbone
C09D 11/38 - Encres pour l'impression à jet d'encre caractérisées par des additifs non macromoléculaires autres que les solvants, les pigments ou les colorants
80.
COMPOUND, METHOD FOR PRODUCING SAID COMPOUND, CURABLE MATERIAL, CURABLE COMPOSITION, METHOD FOR PRODUCING CURED ARTICLE, AND CURED ARTICLE
Provided is a compound represented by formula (1). (In the formula, R1represents a hydrogen atom or a methyl group; R2represents an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an aryl group which may have a substituent, or a halogen atom; R3represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a hydroxymethyl group, a glycidyl ether group, a methyl glycidyl ether group, an acryloyloxymethyl group or a methacryloyloxymethyl group; R4 represents a hydrogen atom or a methyl group; the substituent is a group selected from an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms and a halogen atom; and n represents a numerical value of 0 to 4.)
C07D 407/12 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes d'oxygène comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant deux hétérocycles liés par une chaîne contenant des hétéro-atomes comme chaînons
C08F 20/32 - Esters contenant de l'oxygène en plus de l'oxygène de la fonction carboxyle contenant des radicaux époxyde
C08G 59/20 - Macromolécules obtenues par polymérisation à partir de composés contenant plusieurs groupes époxyde par molécule en utilisant des agents de durcissement ou des catalyseurs qui réagissent avec les groupes époxyde caractérisées par les composés époxydés utilisés
Disclosed is a charge transfer complex capable of obtaining a curable resin composition having an excellent balance between curability and storage stability when used as an epoxy-resin curing agent. The charge transfer complex has an imidazole moiety as an electron donor moiety. The charge transfer complex may be an assembly wherein electrons included in a compound (a) having an imidazole moiety are accepted by a compound (b) having an electron acceptor moiety, or may be a compound having an imidazole moiety and an electron acceptor moiety in its molecule, and the electron acceptor moiety accepts electrons included in the imidazole moiety.
C07D 403/06 - Composés hétérocycliques contenant plusieurs hétérocycles, comportant des atomes d'azote comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant deux hétérocycles liés par une chaîne carbonée ne contenant que des atomes de carbone aliphatiques
H01B 1/12 - Conducteurs ou corps conducteurs caractérisés par les matériaux conducteurs utilisésEmploi de matériaux spécifiés comme conducteurs composés principalement d'autres substances non métalliques substances organiques
Provided is a method for producing a sulfur-containing material, the method having a mechanochemical treatment step for subjecting a starting composition comprising a sulfur component and a sulfur-modified compound to a mechanochemical treatment.
The present invention provides a sulfur-containing material which contains a sulfur modified compound and has a total sulfur content of 50% by mass or more; and with respect to this sulfur-containing material, the ratio (A/B) of the maximum peak intensity (A) within the range where the diffraction angle (2θ) is 23.0° to 23.4° to the maximum peak intensity (B) within the range where the diffraction angle (2θ) is 24.8° to 25.2° is 1.5 or less (A/B ≤ 1.5).
An objective of the invention is to provide a material capable of obtaining a curable resin composition having an excellent balance between curability and storage stability. The invention is a compound represented by formula (1).
An objective of the invention is to provide a material capable of obtaining a curable resin composition having an excellent balance between curability and storage stability. The invention is a compound represented by formula (1).
An objective of the invention is to provide a material capable of obtaining a curable resin composition having an excellent balance between curability and storage stability. The invention is a compound represented by formula (1).
In the formula, R1 to R4 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, a hydroxy group, a nitro group, or a nitrile group; R5 to R7 each independently represent a hydrogen atom or a methyl group; and ring A represents (a1) or (a2) and forms a fused ring with the imide ring at *.
C08F 283/10 - Composés macromoléculaires obtenus par polymérisation de monomères sur des polymères prévus par la sous-classe sur des polymères contenant plus d'un radical époxyde par molécule
C07D 405/12 - Composés hétérocycliques contenant à la fois un ou plusieurs hétérocycles comportant des atomes d'oxygène comme uniques hétéro-atomes du cycle et un ou plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle contenant deux hétérocycles liés par une chaîne contenant des hétéro-atomes comme chaînons
C08G 59/14 - Polycondensats modifiés par post-traitement chimique
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
17 - Produits en caoutchouc ou en matières plastiques; matières à calfeutrer et à isoler
Produits et services
(1) Adhesives used in industry; unprocessed plastics in primary form; epoxy resins; polyurethane resins; chemical agents; epoxy resin curing agents; curing agents for insulating resins.
(2) Resin based electrical insulating materials; electrical insulating materials; plastic semi-worked products; plastic semi-worked products in sheet, film, foil and tape forms; laminated plastic sheets and plastic films; plastic sheets and plastic films with adhesive layers; laminated plastic sheets; laminated plastic films; plastic semi-worked products in the form of polyethylene sheet.
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
17 - Produits en caoutchouc ou en matières plastiques; matières à calfeutrer et à isoler
Produits et services
(1) Adhesives used in industry; unprocessed plastics in primary form; epoxy resins; polyurethane resins; chemical agents; epoxy resin curing agents; curing agents for insulating resins.
(2) Resin based electrical insulating materials; electrical insulating materials; plastic semi-worked products; plastic semi-worked products in sheet, film, foil and tape forms; laminated plastic sheets and plastic films; plastic sheets and plastic films with adhesive layers; laminated plastic sheets; laminated plastic films; plastic semi-worked products in the form of polyethylene sheet.
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
17 - Produits en caoutchouc ou en matières plastiques; matières à calfeutrer et à isoler
Produits et services
Adhesives used in industry; unprocessed plastics in primary form; unprocessed epoxy resins; unprocessed polyurethane resins; chemical agents for manufacturing dyestuffs; epoxy resin curing agents being curing agents for synthetic resin; curing agents for synthetic resin, namely, curing agents for insulating resins. Resin based electrical insulating materials; electrical insulating materials; semifinished injection molded products of plastic for use in a variety of industries; semi-worked synthetic plastic as semi-finished products in sheet, film, foil and tape forms; adhesive coated plastic sheets and adhesive plastic films for use in commercial or industrial manufacturing
88.
METHOD FOR PRODUCING FLAME-RETARDANT ADDITIVELY MANUFACTURED PRODUCT AND FLAME-RETARDANT ADDITIVELY MANUFACTURED PRODUCT
The purpose of the present invention is to provide a method for producing a flame-retardant additively manufactured product having excellent flame retardancy and a flame-retardant additively manufactured product obtained by said method. The present invention is a method for producing a flame-retardant additively manufactured product that includes a step that forms a flame-retardant additively manufactured product by fused deposition modeling, wherein the resin composition is a flame-retardant resin composition containing component (B): a thermoplastic resin and component (C): a phosphorus flame retardant, and the step that forms the flame-retardant additively manufactured product includes a lamination step that performs additive manufacturing under conditions where N and L satisfy formula (I), when the discharge nozzle diameter of the 3D additive manufacturing device used in fused deposition modeling is taken to be N (mm) and the lamination pitch in fused deposition modeling is taken to be L (mm). 2.4
B29C 64/118 - Procédés de fabrication additive n’utilisant que des matériaux liquides ou visqueux, p. ex. dépôt d’un cordon continu de matériau visqueux utilisant un matériau filamentaire mis en fusion, p. ex. modélisation par dépôt de fil en fusion [FDM]
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
17 - Produits en caoutchouc ou en matières plastiques; matières à calfeutrer et à isoler
Produits et services
Adhesives used in industry; unprocessed plastics in primary form; unprocessed epoxy resins; unprocessed polyurethane resins; chemical agents for manufacturing dyestuffs; epoxy resin curing agents being curing agents for synthetic resin; curing agents for synthetic resin, namely, curing agents for insulating resins. Resin based electrical insulating materials; electrical insulating materials; semifinished injection molded products of plastic for use in a variety of industries; semi-worked synthetic plastic as semi-finished products in sheet, film, foil and tape forms; adhesive coated plastic sheets and adhesive plastic films for use in commercial or industrial manufacturing;
90.
ANTISTATIC AGENT, ANTISTATIC AGENT COMPOSITION CONTAINING SAME, ANTISTATIC RESIN COMPOSITION CONTAINING SAID ANTISTATIC AGENT OR SAID ANTISTATIC AGENT COMPOSITION, AND MOLDED BODY AND FILM THEREOF
The present invention provides: an antistatic agent which is capable of sustainably imparting a synthetic resin with an excellent antistatic effect; an antistatic agent composition which contains this antistatic agent; an antistatic resin composition which contains this antistatic agent or this antistatic agent composition; and a molded body and a film of this antistatic resin composition. This antistatic agent contains one or more polymer compounds (E) which are obtained by a reaction of a diol (a1), a dicarboxylic acid (a2), a polyether (b) that has hydroxyl groups at both ends, and an epoxy compound (D) that has two or more epoxy groups; the polyether (b) that has hydroxyl groups at both ends is composed of a polyethylene glycol (b1) and a polytetramethylene glycol (b2); and the ratio of the polytetramethylene glycol (b2) relative to the total number of moles of the polyethylene glycol (b1) and the polytetramethylene glycol (b2) is 10% by mole to 80% by mole.
C08L 23/00 - Compositions contenant des homopolymères ou des copolymères d'hydrocarbures aliphatiques non saturés ne possédant qu'une seule liaison double carbone-carboneCompositions contenant des dérivés de tels polymères
C08L 101/00 - Compositions contenant des composés macromoléculaires non spécifiés
91.
INDIUM COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN FILM, AND METHOD OF PRODUCING SAME
Provided is an indium compound, which is represented by the following general formula (1):
Provided is an indium compound, which is represented by the following general formula (1):
Provided is an indium compound, which is represented by the following general formula (1):
where R1 and R2 each independently represent, for example, an unsubstituted alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and A represents a group represented by the following general formula (L-1) or (L-2):
Provided is an indium compound, which is represented by the following general formula (1):
where R1 and R2 each independently represent, for example, an unsubstituted alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and A represents a group represented by the following general formula (L-1) or (L-2):
Provided is an indium compound, which is represented by the following general formula (1):
where R1 and R2 each independently represent, for example, an unsubstituted alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and A represents a group represented by the following general formula (L-1) or (L-2):
where R11, R12, R13, R14, R21 and R22 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and represents a bonding position with C in the general formula (1).
C01G 15/00 - Composés du gallium, de l'indium ou du thallium
C07F 5/00 - Composés contenant des éléments des groupes 3 ou 13 du tableau périodique
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
92.
COMPOSITION, ETCHING METHOD, AND LAMINATE MANUFACTURING METHOD
Provided are: a composition that makes it possible to form a fine pattern having excellent dimensional accuracy with good productivity, while suppressing the occurrence of residue and etching unevenness; and an etching method and a laminate manufacturing method using said composition. The present invention provides a composition containing: (A) hydrogen peroxide; (B) an organic acid; (C) at least one substance selected from the group consisting of diethylaminoethanol, 1-amino-2-propanol, and N-methyldiethanolamine; and water. The present invention also provides an etching method and a laminate manufacturing method including a step for etching a metal layer by using said composition.
According to an additive composition which contains: (A) an aromatic phosphate sodium salt represented by the following Formula (1), where R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; (B) a fatty acid sodium salt; and (C) talc, and in which a mass ratio (B)/(A) of the content of the component (B) with respect to the content of the component (A) is 0.1 to 3 and a mass ratio (C)/[(A)+(B)+(C)] of the content of the component (C) with respect to a total content of the components (A), (B), and (C) is 0.2 to 0.8, for example, an additive composition which has excellent powder flowability and can impart excellent mechanical properties and excellent color tone to a molded article can be provided.
According to an additive composition which contains: (A) an aromatic phosphate sodium salt represented by the following Formula (1), where R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; (B) a fatty acid sodium salt; and (C) talc, and in which a mass ratio (B)/(A) of the content of the component (B) with respect to the content of the component (A) is 0.1 to 3 and a mass ratio (C)/[(A)+(B)+(C)] of the content of the component (C) with respect to a total content of the components (A), (B), and (C) is 0.2 to 0.8, for example, an additive composition which has excellent powder flowability and can impart excellent mechanical properties and excellent color tone to a molded article can be provided.
An object of the present invention is to provide a composition that gives a cured product excellent in heat resistance and solvent resistance. The present invention provides a compound represented by the general formula (I) below and having at least one reactive group in a molecule. In the formula, A represents a hydrocarbon ring having 6 carbon atoms; X1 and X2 each represent, for example, an aryl group having 6 to 30 carbon atoms and optionally substituted with a reactive group or a group having a reactive group; R1, R2, R3, R4, R6, R7, R8, and R9 each represent, for example, a hydrogen atom, a reactive group, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group; and R5 and R10 each represent, for example, a hydrogen atom, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group.
An object of the present invention is to provide a composition that gives a cured product excellent in heat resistance and solvent resistance. The present invention provides a compound represented by the general formula (I) below and having at least one reactive group in a molecule. In the formula, A represents a hydrocarbon ring having 6 carbon atoms; X1 and X2 each represent, for example, an aryl group having 6 to 30 carbon atoms and optionally substituted with a reactive group or a group having a reactive group; R1, R2, R3, R4, R6, R7, R8, and R9 each represent, for example, a hydrogen atom, a reactive group, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group; and R5 and R10 each represent, for example, a hydrogen atom, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group.
Provided is a method of etching a metal oxide film in a laminate including a substrate and the metal oxide film formed on a surface thereof by an atomic layer etching method, the method including: a first step of introducing, into a treatment atmosphere storing the laminate, at least one oxidizable compound selected from the group consisting of: an alcohol compound; an aldehyde compound; and an ester compound; and a second step of introducing an oxidizing gas into the treatment atmosphere after the first step.
Provided are: a flame retardant agent composition which has excellent flame retardancy as well as an excellent balance of dust suppression and powder flowability; a flame-retardant resin composition containing the same; and a molded article thereof. The flame retardant agent composition contains at least one phosphate compound represented by Formula (1) or (2). When the loose bulk density of the flame retardant agent composition is defined as d (g/cm3), and the 10% cumulative particle size and the 50% cumulative particle size of the flame retardant agent composition in a volume-based particle size distribution are defined as D10 (μm) and D50 (μm), respectively, d, D10 (μm), and D50 (μm) satisfy 0.030≤d/(D50−D10)≤0.110.
Provided are: a flame retardant agent composition which has excellent flame retardancy as well as an excellent balance of dust suppression and powder flowability; a flame-retardant resin composition containing the same; and a molded article thereof. The flame retardant agent composition contains at least one phosphate compound represented by Formula (1) or (2). When the loose bulk density of the flame retardant agent composition is defined as d (g/cm3), and the 10% cumulative particle size and the 50% cumulative particle size of the flame retardant agent composition in a volume-based particle size distribution are defined as D10 (μm) and D50 (μm), respectively, d, D10 (μm), and D50 (μm) satisfy 0.030≤d/(D50−D10)≤0.110.
Provided is a method of producing a thin-film containing a zirconium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a zirconium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 240° C. or more and 450° C. or less to form the thin-film containing a zirconium atom on the surface of the substrate:
Provided is a method of producing a thin-film containing a zirconium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a zirconium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 240° C. or more and 450° C. or less to form the thin-film containing a zirconium atom on the surface of the substrate:
Provided is a method of producing a thin-film containing a zirconium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a zirconium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 240° C. or more and 450° C. or less to form the thin-film containing a zirconium atom on the surface of the substrate:
wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms, provided that a zirconium compound in which both of R1 and R2 represent hydrogen atoms is excluded.
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
Provided is a method of producing a thin-film containing a hafnium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a hafnium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 300° C. or more and less than 450° C. to form the thin-film containing a hafnium atom on the surface of the substrate:
Provided is a method of producing a thin-film containing a hafnium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a hafnium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 300° C. or more and less than 450° C. to form the thin-film containing a hafnium atom on the surface of the substrate:
wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms.
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
C07F 7/00 - Composés contenant des éléments des groupes 4 ou 14 du tableau périodique
A polyolefin-based resin composition of the present invention contains a polyolefin-based resin (A) and a light stabilizer (B), in which the light stabilizer (B) includes a predetermined hindered amine compound (B-1) and a predetermined phenol-based antioxidant (B-2), where the polyolefin-based resin composition is composed such that a value of the brightness increase ratio [L* (2,040 h)−L* (0 h)]/L* (0 h) before and after the weather resistance test is −0.05 or more and less than 0.1.
B29C 45/00 - Moulage par injection, c.-à-d. en forçant un volume déterminé de matière à mouler par une buse d'injection dans un moule ferméAppareils à cet effet
100.
CRYSTALLIZATION INHIBITOR FOR POLYOLEFIN RESIN, POLYOLEFIN RESIN COMPOSITION, MOLDED ARTICLE, METHOD FOR PRODUCING POLYOLEFIN RESIN COMPOSITION, AND METHOD FOR INHIBITING CRYSTALLIZATION OF POLYOLEFIN RESIN
Provided are a crystallization inhibitor for polyolefin resins, a polyolefin resin composition, a molded article, a method of producing a polyolefin resin composition, and a method of inhibiting the crystallization of polyolefin resins, which are capable of sufficiently inhibiting the crystallization of polyolefin resins. The crystallization inhibitor for polyolefin resins includes a nucleating agent for polyolefin resins (A) and a lubricant (B). The nucleating agent for polyolefin resins (A) includes an acetal compound (A-1) represented by general formula (1), and the lubricant (B) includes at least one selected from the group consisting of a fatty acid ester (B-1) and a fatty acid amide (B-2).
Provided are a crystallization inhibitor for polyolefin resins, a polyolefin resin composition, a molded article, a method of producing a polyolefin resin composition, and a method of inhibiting the crystallization of polyolefin resins, which are capable of sufficiently inhibiting the crystallization of polyolefin resins. The crystallization inhibitor for polyolefin resins includes a nucleating agent for polyolefin resins (A) and a lubricant (B). The nucleating agent for polyolefin resins (A) includes an acetal compound (A-1) represented by general formula (1), and the lubricant (B) includes at least one selected from the group consisting of a fatty acid ester (B-1) and a fatty acid amide (B-2).
Provided are a crystallization inhibitor for polyolefin resins, a polyolefin resin composition, a molded article, a method of producing a polyolefin resin composition, and a method of inhibiting the crystallization of polyolefin resins, which are capable of sufficiently inhibiting the crystallization of polyolefin resins. The crystallization inhibitor for polyolefin resins includes a nucleating agent for polyolefin resins (A) and a lubricant (B). The nucleating agent for polyolefin resins (A) includes an acetal compound (A-1) represented by general formula (1), and the lubricant (B) includes at least one selected from the group consisting of a fatty acid ester (B-1) and a fatty acid amide (B-2).
In general formula (1), R1 represents a hydrogen atom, etc.; R2, R3, R4, and R5 each independently represent a hydrogen atom, etc., or a C3-C6 alkylene group, etc. with R2 and R3 or R4 and R5 linked to each other; and X represents a single bond, a —CH(OH)— group, or a —CH(OH)CH(OH)— group.