The present invention relates to: a negative electrode active material for a secondary battery; and a negative electrode material and a secondary battery each comprising same, the negative electrode active material comprising silicon particles and a compound on the silicon particles, the compound comprising carbon atoms and at least one of oxygen atoms and nitrogen atoms, wherein the compound has a ratio of the number of carbon atoms: the number of nitrogen atoms or oxygen atoms of 1: 0.35 to 0.85.
SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (Republic of Korea)
Inventor
Nam, Jae Bin
Lee, Min Young
Lee, Joo Cheol
Yang, Hwi Chan
Lim, Hyung Woo
Choi, Jang Wook
Seong, Min Ji
Lee, Tae Yong
Choi, Tae Hoon
Abstract
Disclosed is a negative electrode active material for improving the performance of an electrochemical device. According to one aspect, provided is a negative electrode active material comprising particles and a polymer compound on the particles, wherein the polymer compound contains a fluorine atom.
An etchant composition includes hydrogen peroxide, a carboxylic acid-based compound, a fluorine-based compound, and a nitrogen-based cyclic compound. The hydrogen peroxide is included in an amount of 0.001 to 4 wt %. Additionally or alternatively, the weight ratio between the fluorine-based compound and the nitrogen-based cyclic compound is 1:0.01 to 1:3.
The present techniques provide a precursor compound of chemical formula 1 for thin film formation and a preparation method therefor, wherein a photoresist layer can be prevented from undergoing pattern collapse by reducing the exposure time for pattern formation and minimizing the thickness of a lower layer with an etching selectivity similar to that of a photoresist or omitting the lower layer during post-exposure etching. In chemical formula 1, R0 is Si, Sn, Ge, Sb, In, Hf, Zr, Ti, or Te; R1 is CH3, CF3, CH═CH2, halogen, or phenyl; R2 and R2′ each are each independently alkyl or alkoxy; R3 is amine or halogen; R is hydrogen or halogen; n is an integer of 1-7.
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
5.
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT, AND DISPLAY DEVICE
The present invention relates to: a positive photosensitive resin composition having excellent sensitivity, residual film rate, adhesive strength, chemical resistance, hygroscopicity, and heat resistance; a method for manufacturing an insulating film by using same; an electronic component; and a display device for an organic electroluminescent device.
The present invention relates to a slurry composition for chemical-mechanical polishing, wherein the polishing rate for a low dielectric film is less than the polishing rate for a silicon nitride film.
The present invention relates to a surface-modified carbon nanotube having both excellent conductivity and improved dispersibility, and a dispersion and a secondary battery, which comprise same.
The present invention relates to: modified inorganic particles which comprise a silsesquioxane having an open structure and inorganic particles bonded to the silsesquioxane, and have a refractive index of 1.3 or more; a hard coating composition comprising same; and a coating film thereof.
The present invention relates to a slurry composition for chemical-mechanical polishing, wherein the polishing rate for a low dielectric film is higher than the polishing rate for a silicon nitride film.
Disclosed is a hydrogen gas purification method for increasing the recovery rate and purity of purified hydrogen gas. According to one aspect, provided is a hydrogen gas purification method comprising purifying a mixed gas produced by an electrolysis method and containing chlorine gas and hydrogen gas.
C01B 3/50 - Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
C01B 3/56 - Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solidsRegeneration of used solids
C01B 15/029 - Preparation from hydrogen and oxygen
C25B 15/08 - Supplying or removing reactants or electrolytesRegeneration of electrolytes
B01D 53/14 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by absorption
B01D 53/00 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
One embodiment of the present invention provides an electrode substrate comprising: a substrate; an engraved recess which is provided in the substrate; a first anti-reflection layer which is disposed in the recess; a first electrode layer which is disposed so as to cover the first anti-reflection layer and does not deviate in position from the upper portion of the recess; a second electrode layer which has an area overlapping the first electrode layer and is disposed at the upper surface of the substrate and the side surface of the recess; and a protection layer which is disposed at the recess so as to cover at least a portion of the second electrode layer.
The present invention relates to a coating composition comprising a multifunction acrylate-based oligomer, a thermoplastic polymer, and an organic solvent. The composition can be cured and thermoformed. A coating film made from the composition is capable of being thermoformed and has excellent hardness, durability, and scratch resistance. With the coating film, plastic products, which can be used instead of glass in various industries such as construction, electronic products and automobiles, are provided.
C09D 4/06 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
An embodiment of the present invention provides a catalyst composition comprising: a catalyst comprising a platinum group element; and a support comprising a post-transition metal and a metal oxide. In addition, other embodiments of the present invention provide: an anode comprising the catalyst composition; and water electrolysis comprising the anode.
C25B 11/093 - Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalysts material consisting of at least one catalytic element and at least one catalytic compoundElectrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalysts material consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
An adhesive composition that implements impact resistance and excellent transparency and, simultaneously, exhibits low viscosity is disclosed. According to one aspect, the adhesive composition is provided, the composition comprising: a base material including an acrylic monomer and an oligomer; an initiator; and core-shell rubber particles including a core part and a shell part, wherein the elastic modulus of the core part is 0.1 MPa or more under conditions of 25℃, 5.0% strain, and a frequency of 10.0 Hz on the basis of a dynamic mechanical analysis (DMA) analysis method, and the shell part is chemically bonded to the core part and has a viscosity of 50 cp or less at 25℃ and 1,350 s-1.
C09J 4/00 - Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
C09J 4/06 - Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
C09J 151/00 - Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bondsAdhesives based on derivatives of such polymers
Provided in one embodiment of the present invention is an organic light-emitting device comprising an anode, a cathode and one or more novel compounds.
C07D 491/048 - Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being five-membered
C07F 7/08 - Compounds having one or more C—Si linkages
H10K 85/60 - Organic compounds having low molecular weight
H10K 85/40 - Organosilicon compounds, e.g. TIPS pentacene
The present invention relates to: a photocurable composition; an adhesive comprising same; and a display device comprising an adhesive layer comprising the photocurable composition. The photocurable composition can effectively increase the decap time of a nozzle by suppressing volatilization when applied to an inkjet process and realize excellent adhesive properties.
G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
17.
CONDUCTIVE MATERIAL SLURRY, POSITIVE ELECTRODE, AND SECONDARY BATTERY COMPRISING SAME
Disclosed is a conductive material slurry having excellent dispersion stability. According to one aspect, provided is a conductive material slurry comprising a conductive material, dispersants, and a solvent, wherein the dispersants include a first dispersant and a second dispersant which is different from the first dispersant, the first dispersant comprises a polymer having a heteroatom, and the second dispersant comprises a polymer having a group which is capable of hydrogen bonding.
000={B/(A+B)}x100≤60 wt% In Expression 1, A is the silicon content in the silicon negative electrode active material, and B is the carbon content in the silicon negative electrode active material.
The present invention relates to an organometallic compound into which two kinds of metals having excellent light absorption efficiency are introduced, a semiconductor photoresist composition for EUV having improved sensitivity to EUV and excellent etch resistance by comprising the compound, and a pattern forming method using same.
H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
H01M 4/13 - Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulatorsProcesses of manufacture thereof
H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodesLithium-ion batteries
H01B 1/04 - Conductors or conductive bodies characterised by the conductive materialsSelection of materials as conductors mainly consisting of carbon-silicon compounds, carbon, or silicon
21.
SILICON NEGATIVE ELECTRODE ACTIVE MATERIAL, NEGATIVE ELECTRODE, AND SECONDARY BATTERY COMPRISING SAME
Disclosed is a silicon negative electrode active material which improves the lifespan and efficiency of a secondary battery. According to one aspect, provided is a silicon negative electrode active material comprising: silicon particles; a carbon material on the silicon particles; a conductive material; and an inorganic binder.
Provided is a laminate for a cover window, comprising: a hard coating layer including a cured product of a composition for forming a hard coating layer comprising polysilsesquioxane, an aliphatic urethane (meth)acrylate oligomer, and a heterocyclic compound containing oxygen; and an acrylic coating layer including a cured product of a composition for forming an acrylic coating layer comprising a silane coupling agent in the form of an oligomer, wherein the weight ratio of the aliphatic urethane (meth)acrylate oligomer and the heterocyclic compound containing oxygen in the composition for forming a hard coating layer is 1:1.5 to 7.
C09D 4/06 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
C08K 5/5415 - Silicon-containing compounds containing oxygen containing at least one Si—O bond
G02B 1/10 - Optical coatings produced by application to, or surface treatment of, optical elements
G02B 1/04 - Optical elements characterised by the material of which they are madeOptical coatings for optical elements made of organic materials, e.g. plastics
G06F 1/16 - Constructional details or arrangements
23.
NOVEL COMPOUND FOR CAPPING LAYER, AND ORGANIC LIGHT-EMITTING DEVICE COMPRISING SAME
C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
C07D 413/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings
C07D 417/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing three or more hetero rings
H10K 85/60 - Organic compounds having low molecular weight
A photosensitive resin composition having a coloring function is disclosed. According to one aspect, the provided photosensitive resin composition comprises an alkali-soluble resin and a photoactive compound, wherein the alkali-soluble resin and/or the photoactive compound has an absorption maximum of a wavelength of 400 to 550 nm on the basis of UV-vis spectroscopy.
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
An inkjet resin composition includes about 20% to about 30% by weight of 2-ethylhexyl acrylate, about 20% to about 30% by weight of 4-hydroxybutyl acrylate, about 40% to about 50% by weight of isodecyl acrylate, about 1% to about 10% by weight of urethane acrylate, about 1% to about 5% by weight of an initiator, about 1% to about 5% by weight of a silane coupling agent, and about 0.05% to about 1% by weight of a surface flow control additive.
C09J 133/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
C09J 4/06 - Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
A silicone resin includes a hollow silica structure and a silsesquioxane structure bonded to the hollow silica structure. A hydroxy group is included in an amount of 1.0 wt % or less relative to the total weight of the silicone resin, thereby being able to realize a low refractive index and an excellent coating property. A coating composition contains the silicone resin, and high solution stability is achieved even without a separate dispersion process. A product is cured from the coating composition.
An embodiment of the present invention provides a method for forming a hydrophobic photoresist thin film, comprising the steps of: injecting a first precursor and an oxygen source into a chamber in which a substrate is located, so as to form a thin film having hydrophilic groups included therein; and injecting a second precursor to modify the thin film having the hydrophilic groups included therein and form a modified layer, wherein the photoresist thin film formed thereby does not contain hydroxyl groups and thus exhibits hydrophobicity.
Disclosed is a photopolymerizable composition which improves optical properties as well as inkjet discharge properties. According to an aspect of the present invention, provided is a photopolymerizable composition comprising: a first monomer having a first photocurable functional group; a second monomer having a second photocurable functional group; and an initiator, wherein the first and second monomers satisfy Expression 1.
C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
G02B 1/04 - Optical elements characterised by the material of which they are madeOptical coatings for optical elements made of organic materials, e.g. plastics
The present techniques provide a precursor compound of [chemical formula 1] for thin film formation and a preparation method therefor, wherein a photoresist layer can be prevented from undergoing pattern collapse by reducing the exposure time for pattern formation and minimizing the thickness of a lower layer with an etching selectivity similar to that of a photoresist or omitting the lower layer during post-exposure etching. (In [chemical formula 1], R0is Si, Sn, Ge, Sb, In, Hf, Zr, Ti, or Te; R13322, halogen, or phenyl; R2and R2' each are independently alkyl or alkoxy; R3 is amine or halogen; R is hydrogen or halogen; n is an integer of 1-7)
C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
C07F 7/10 - Compounds having one or more C—Si linkages containing nitrogen
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
30.
METHOD FOR FORMING AN INSULATING LAYER PATTERN, PRECURSORS USED IN PATTERN FORMATION AND A SEMICONDUCTOR DEVICE
A method for forming an insulating layer pattern includes providing a substrate comprising two or more different types of dielectric layer regions; and selectively forming a blocking layer on the substrate to include a first region and a second region. On the first region, the blocking layer is formed, whereas on the second region, no blocking layer is formed or the blocking layer is formed less than in the first region. The difference in water contact angle between the first region and the second region is within the range of 7 to 50 degrees.
H01L 23/532 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
C23C 16/02 - Pretreatment of the material to be coated
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
31.
3D SWITCHABLE DEVICE AND DISPLAY DEVICE COMPRISING THE SAME
A 3D switchable device includes a base substrate; a liquid crystal member including a first liquid crystal electrode disposed on the base substrate, a liquid crystal layer disposed on the first liquid crystal electrode, which selectively blocks or allows 2D polarization and 3D polarization; a lenticular lens member disposed on the liquid crystal member; and a cover substrate disposed on the lenticular lens member.
G02B 30/25 - Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer’s left and right eyes of the stereoscopic type using polarisation techniques
A photoacid generator including an anion having a novel structure having a specific polar functional group such as a sulfonate group is provided. A photoresist composition comprising the same and a method for forming a photoresist pattern are also provided.
A salt compound includes an anion having a specific structure represented by Chemical Formula 1, and a cation represented by Chemical Formula 2. A quencher includes the salt compound; and a photoresist composition includes the salt compound.
A salt compound includes an anion having a specific structure represented by Chemical Formula 1, and a cation represented by Chemical Formula 2. A quencher includes the salt compound; and a photoresist composition includes the salt compound.
A conductive material slurry for a secondary battery electrode, which has low viscosity and low sheet resistance, includes a conductive material and a dispersant that disperses the conductive material. The dispersant includes a cellulose compound and a conductive polymer, and the amount of the conductive material is greater than 0 wt % and equal to or less than 2.5 wt % based on the total weight of the conductive material slurry for a secondary battery electrode.
H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
H01M 4/133 - Electrodes based on carbonaceous material, e.g. graphite-intercalation compounds or CFx
H01M 4/134 - Electrodes based on metals, Si or alloys
H01M 4/136 - Electrodes based on inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy
H01M 4/38 - Selection of substances as active materials, active masses, active liquids of elements or alloys
H01M 4/48 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
H01M 4/58 - Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFySelection of substances as active materials, active masses, active liquids of polyanionic structures, e.g. phosphates, silicates or borates
H01M 4/587 - Carbonaceous material, e.g. graphite-intercalation compounds or CFx for inserting or intercalating light metals
35.
GRAPHITE OXIDE, GRAPHENE OXIDE, AND REDUCED GRAPHENE OXIDE
Graphite oxide, graphene oxide, and reduced graphene oxide are provided. The graphene oxide includes 25 to 45 at % of oxygen (O) and is effectively exfoliated from graphite oxide, and can embody excellent powder conductivity after reduction.
A solar cell and a method of forming the same are provided. The solar cell includes a substrate, and a plurality of unit cells each including a first electrode, an active layer, and a second electrode. The unit cells are spaced from one another to expose the substrate. Accordingly, using an insulating structure or non-power generation area where the unit cells are spaced from one another such that the substrate is exposed, it is possible to minimize leakage current, and to increase power generation efficiency.
Provided is a display apparatus including a display panel having a display element therein, a cover window on the display panel, and an adhesive member between the display panel and the cover window and including a first adhesive layer and a second adhesive layer on the first adhesive layer, wherein the second adhesive layer includes a resin composition including an acrylamide-based compound, an ester-based compound, an acrylate-based compound, and an initiator, the ester-based compound including a first ester-based compound and a second ester-based compound, the first ester-based compound including a heterocycloalkyl group, and the second ester-based compound including an aryl group, and the acrylate-based compound including a urethane acrylate-based compound, a first acrylate-based compound, and a second acrylate-based compound, the first acrylate-based compound including a bicyclic compound, and the second acrylate-based compound including a linear alkyl group.
Provided are a thinner composition, which may be generally used for an extreme ultraviolet (EUV) photoresist as well as KrF and ArF photoresists and exhibits improved performance in reduced resist coating (RRC) and edge bead removal (EBR), and which has an excellent pipe cleaning capability, and a method of treating a substrate surface by using the thinner composition. The thinner composition includes a C2-C4 alkylene glycol C1-C4 alkyl ether acetate, a C2-C3 alkylene glycol C1-C4 alkyl ether, and a cycloketone.
The present invention relates to a composition for preparing an alkali-soluble resin, an alkali-soluble resin prepared therefrom, a photosensitive resin composition containing the alkali-soluble resin, an insulating film prepared from the photosensitive resin composition, and a display device comprising the insulating film, wherein compounds for preparing the alkali-soluble resin include dicarboxylic acid anhydride, tetracarboxylic acid dianhydride, and diamine, and the alkali-soluble resin has a structural unit derived from the dicarboxylic acid anhydride at one end or both ends thereof, and contains 5-40 mol% of dicarboxylic acid anhydride with respect to a total 100 mol% of the diamine, the tetracarboxylic acid dianhydride, and the dicarboxylic acid anhydride.
A novel compound for a capping layer, and an organic light emitting device containing the same are disclosed. The compound for a capping layer is represented by Formula 1 below:
A novel compound for a capping layer, and an organic light emitting device containing the same are disclosed. The compound for a capping layer is represented by Formula 1 below:
C07C 233/58 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C07C 211/53 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring having the nitrogen atom of at least one of the amino groups further bound to a hydrocarbon radical substituted by amino groups
C07C 233/59 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
C07C 233/60 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms
C07C 233/62 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups
C07C 255/46 - Carboxylic acid nitriles having cyano groups bound to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of non-condensed rings
C07D 211/16 - Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with radicals containing only carbon and hydrogen atoms attached to ring carbon atoms with acylated ring nitrogen atom
C07D 295/32 - Nitrogen atoms acylated with carboxylic or carbonic acids, or their nitrogen or sulfur analogues
C07F 7/08 - Compounds having one or more C—Si linkages
H10K 50/858 - Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
41.
NOVEL COMPOUND FOR LIGHT EMITTING DEVICE AND ORGANIC LIGHT EMITTING DEVICE INCLUDING SAME
A novel compound for a light emitting device, and an organic light emitting device containing the same are disclosed. The compound for a light emitting device is represented by Formula 1 below:
A novel compound for a light emitting device, and an organic light emitting device containing the same are disclosed. The compound for a light emitting device is represented by Formula 1 below:
H10K 85/60 - Organic compounds having low molecular weight
C07C 233/58 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C07C 255/46 - Carboxylic acid nitriles having cyano groups bound to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of non-condensed rings
C07C 323/22 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and doubly-bound oxygen atoms bound to the same carbon skeleton
C07D 295/215 - Radicals derived from nitrogen analogues of carbonic acid
C07F 7/08 - Compounds having one or more C—Si linkages
A novel compound for a light emitting device, and an organic light emitting device containing the same are disclosed. The compound for a light emitting device is represented by Formula 1 below:
A novel compound for a light emitting device, and an organic light emitting device containing the same are disclosed. The compound for a light emitting device is represented by Formula 1 below:
The present invention relates to a photocurable composition, a cured film comprising a cured product thereof, and an optical member and a display device comprising the cured film, the photocurable composition having controlled transmittance degradation and haze increase while exhibiting a low-refractive property after curing.
The present disclosure relates to a positive electrode active material composite which is for a battery and is coated with reduced graphene oxide, and specifically, to a positive electrode active material composite comprising: a core portion including a positive electrode active material; and a shell portion surrounding the core portion. The shell portion includes at least one layer of reduced graphene oxide (rGO), thus making it possible to obtain a secondary battery having excellent electronic conductivity and energy density.
A novel compound for a capping layer, and an organic light emitting device containing the same are disclosed. The compound for a capping layer is represented by Formula 1 below:
A novel compound for a capping layer, and an organic light emitting device containing the same are disclosed. The compound for a capping layer is represented by Formula 1 below:
C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
C07D 307/81 - Radicals substituted by nitrogen atoms not forming part of a nitro radical
C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
C07D 413/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings
H10K 50/858 - Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
C07C 233/58 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C07D 213/75 - Amino or imino radicals, acylated by carboxylic or carbonic acids, or by sulfur or nitrogen analogues thereof, e.g. carbamates
C07D 251/18 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to only one ring carbon atom with nitrogen atoms directly attached to the two other ring carbon atoms, e.g. guanamines
C07D 271/113 - 1,3,4-OxadiazolesHydrogenated 1,3,4-oxadiazoles with oxygen, sulfur or nitrogen atoms, directly attached to ring carbon atoms, the nitrogen atoms not forming part of a nitro radical
The present invention relates to a composition for colored coating containing a silsesquioxane polymer binder. The composition according to the present invention comprises a silsesquioxane polymer binder having a reactive functional group, a compatible functional group, and a colorant affinity group, and thus can maintain excellent heat resistance of the silsesquioxane polymer binder and physical properties of a coating film as well as enhance the adhesive strength and dispersion stability between a substrate and a coating layer, which were difficult to achieve by conventional silsesquioxane polymer binders. Furthermore, the present invention relates to a colored film and a display panel each comprising a coating layer formed of the silsesquioxane polymer binder.
Provided in the present invention are a foaming agent additive for reducing formamide, and a foaming agent composition using same, the additive significantly reducing the concentration of formamide generated during foaming of ADCA, and enabling the concentration of formamide remaining in a final product foaming agent to be reduced.
C08J 9/00 - Working-up of macromolecular substances to porous or cellular articles or materialsAfter-treatment thereof
C08J 9/10 - Working-up of macromolecular substances to porous or cellular articles or materialsAfter-treatment thereof using blowing gases generated by a previously added blowing agent by a chemical blowing agent developing nitrogen
49.
CARBON NANOTUBE DISPERSION SOLUTION, SLURRY FOR MANUFACTURING ELECTRODE, AND SECONDARY BATTERY
The present invention relates to: a carbon nanotube dispersion solution; a slurry for manufacturing an electrode, containing carbon nanotubes; and a secondary battery. The performance of a secondary battery comprising carbon nanotubes can be improved by controlling the particle size and amount of the carbon nanotubes.
An embodiment of the present invention provides an electrochromic device comprising a substrate and electrochromic layers, wherein the electrochromic layers include an oxidative color change layer and a reductive color change layer, and the oxidative color change layer and the reductive color change layer are arranged in contact with each other in at least one region.
G02F 1/1514 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
51.
COATING COMPOSITION CONTAINING SILSESQUIOXANE POLYMER, AND FLEXIBLE DISPLAY FILM
The present invention relates to a coating composition for a flexible display, a coating film manufactured therefrom, and a display panel, wherein the coating composition contains a silsesquioxane polymer and can provide a film with excellent elongation and bending durability.
G09F 9/30 - Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
52.
ABRASIVE PARTICLES AND POLISHING SLURRY COMPOSITION USING SAME
The present invention provides surface-modified abrasive particles and a polishing slurry composition comprising same, the abrasive particles having improved polishing performance for an insulating film and a metal film and having high-temperature stability by controlling, to be in a specific range, the content ratio of a modifier to silica during abrasive particle surface modification, the content ratio of carbon of the modifier to silica in a slurry after centrifugation, or the difference in isoelectric point (IEP) of modified abrasive particles in the slurry before and after the centrifugation.
One embodiment of the present invention provides a curable composition comprising a photocurable monomer, a photocuring initiator, and a silicon-based additive, wherein the silicon-based additive comprises a photocurable substituent and an aliphatic substituent, and the ratio of the photocurable substituent to the aliphatic substituent is 2:6 to 6:2.
C08K 5/5415 - Silicon-containing compounds containing oxygen containing at least one Si—O bond
C09D 4/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
A photosensitive resin composition not only has excellent optical density and light resistance, but also has improved transmittance, photoreactivity, and sensitivity. Thus, it can be applicable to form a pixel defining layer pattern of various display devices, such as an organic electroluminescent device. A display device is manufactured using the same.
C09D 4/06 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
A photosensitive resin composition includes an alkali-soluble resin including at least one structure selected from the group consisting of polyamic acid, polyamic ester, and polyimide; two or more thermal crosslinkable compounds; a photosensitizer; and a solvent. The photosensitive resin composition has excellent sensitivity, film residual rate, adhesive force, chemical resistance and heat resistance; and a display device includes a component cured from such a photosensitive resin composition.
Provided is a polymer compound for forming a resist underlayer film that can lower the optimal exposure amount of a resist film without affecting the shape of the resist pattern film after development. According to one aspect, provided is a polymer compound for forming a resist underlayer film, the compound comprising a repeating unit represented by general formula 1.
C08F 220/28 - Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
57.
COMPOUND FOR CAPPING LAYER AND ORGANIC LIGHT EMITTING DEVICE INCLUDING SAME
C07C 233/65 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C07C 233/10 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having nitrogen atoms of carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals with carbon atoms of carboxamide groups bound to carbon atoms of an unsaturated carbon skeleton containing rings other than six-membered aromatic rings
C07C 233/66 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
C07C 233/67 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms
C07C 233/77 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups
C07D 401/12 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 407/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 409/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 413/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 417/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
C07F 7/08 - Compounds having one or more C—Si linkages
H10K 50/858 - Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
H10K 85/60 - Organic compounds having low molecular weight
58.
COMPOUND FOR CAPPING LAYER AND ORGANIC LIGHT EMITTING DEVICE INCLUDING SAME
C07C 233/65 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C07C 233/58 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C07C 233/66 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
C07C 233/74 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a ring other than a six-membered aromatic ring
C07C 233/79 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a ring other than a six-membered aromatic ring
C07C 255/46 - Carboxylic acid nitriles having cyano groups bound to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of non-condensed rings
C07C 321/22 - Thiols, sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of rings other than six-membered aromatic rings
C07D 211/16 - Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with radicals containing only carbon and hydrogen atoms attached to ring carbon atoms with acylated ring nitrogen atom
C07D 239/28 - Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms
C07D 251/24 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
C07D 295/32 - Nitrogen atoms acylated with carboxylic or carbonic acids, or their nitrogen or sulfur analogues
C07F 7/08 - Compounds having one or more C—Si linkages
H10K 50/858 - Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
59.
METHOD FOR FORMING INSULATING FILM PATTERN, AND SEMICONDUCTOR DEVICE
The present invention provides a method for forming an insulating film pattern, comprising the steps of: providing a substrate including two or more different types dielectric film areas; selectively forming a barrier film on the substrate so as to include an a first area in which a barrier film is formed and a second area in which a barrier film is not formed or a barrier film is relatively less formed; selectively forming an insulating film on the second area; and etching a portion of the upper part of the insulating film.
H01L 21/32 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniquesAfter-treatment of these layersSelection of materials for these layers using masks
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
C23C 16/02 - Pretreatment of the material to be coated
C23C 16/04 - Coating on selected surface areas, e.g. using masks
One embodiment of the present invention provides a membrane electrode assembly comprising a first electrode unit, a second electrode unit, and an electrolyte membrane, each electrode unit comprising a catalyst layer and a gas diffusion layer, and the catalyst layer comprising platinum and a carbon support, wherein the platinum load in the electrode unit is 1.5-5 mg/cm2.
Provided is a conductive slurry for a secondary battery electrode that reduces the viscosity of a conductive slurry while simultaneously reducing the surface resistance of a film made from the conductive slurry. One embodiment of the present invention provides a conductive slurry for a secondary battery electrode comprising: a conductive material; and a dispersant, wherein the dispersant comprises a cellulose-based compound and an organic acid salt.
C07C 233/63 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups
C07C 237/26 - Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups having the carbon atom of at least one of the carboxamide groups bound to a carbon atom of a ring other than a six-membered aromatic ring of the carbon skeleton of a ring being part of a condensed ring system formed by at least four rings, e.g. tetracycline
C07C 257/16 - Compounds containing carboxyl groups, the doubly-bound oxygen atom of a carboxyl group being replaced by a doubly-bound nitrogen atom, this nitrogen atom not being further bound to an oxygen atom, e.g. imino-ethers, amidines with replacement of the other oxygen atom of the carboxyl group by nitrogen atoms, e.g. amidines having carbon atoms of amidino groups bound to carbon atoms of rings other than six-membered aromatic rings
C07C 323/62 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
C07C 327/46 - Amides of thiocarboxylic acids having carbon atoms of thiocarboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings
C07D 401/12 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 407/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 409/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 413/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 417/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 519/00 - Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups or
H10K 50/858 - Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
H10K 50/858 - Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
C07C 233/58 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C07C 233/60 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of rings other than six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms
C07C 255/46 - Carboxylic acid nitriles having cyano groups bound to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of non-condensed rings
C07D 209/08 - IndolesHydrogenated indoles with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to carbon atoms of the hetero ring
This invention relates to a positive photosensitive resin composition that includes a siloxane copolymer of two kinds of reactive silane compounds with specific structures wherein residual impurities such as unreacted monomers and catalysts are minimized, and a UV absorber including one or more kinds of phenol hydroxyl groups capable of crosslinking and an alkoxy group. Accordingly, the resin composition exhibits excellent performances such as sensitivity, resolution, and degree of planarization, and also has excellent weatherability and UV absorbance, thereby providing excellent panel reliability.
A curable composition is provided. The curable composition can eliminate or minimize the generation of bubbles inside the cured product after the initiation reaction of the curable monomer, prevent expansion of a material when used to encapsulate a device, and provide a uniform cured product to solve the problem of separation between the upper and lower substrates bonded together, thereby improving device encapsulation performance.
The present disclosure relates to a photo-curable composition, a cured product thereof, and an optical member and a display device comprising same. The photo-curable composition has excellent low refractive index, light transmittance, and low haze characteristics by comprising a first olefinic monomer containing fluorine, a second olefinic monomer having an absolute viscosity of 7 cP or less at 25° C., a photo-polymerization initiator, and an amine compound.
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
G02B 1/04 - Optical elements characterised by the material of which they are madeOptical coatings for optical elements made of organic materials, e.g. plastics
67.
ORGANIC LAYER POLISHING COMPOSITION AND METHOD FOR POLISHING USING SAME
The present disclosure relates to an organic film polishing composition in which a high polishing speed is maintained not only for polymers, an SOC, and an SOH, but also for organic films strongly bonded by covalent bonds such as an amorphous carbon layer (ACL) or a diamond-like carbon (DLC) by including a polishing accelerator containing both a hydrophilic group and a hydrophobic group, and a polishing method using the same.
Provided is a cured film having a novel parameter derived therefor so as to improve device reliability. One embodiment of the present invention provides a cured film made by curing a photosensitive resin composition, wherein the photosensitive resin composition comprises an alkali-soluble resin and a photoactive compound (PAC), and, when the cured film is subjected to purge-and-trap analysis at 250°C for 60 minutes, phenolic gas accounts for 30% (v/v) or less of the total outgassing.
A positive-type photosensitive resin composition, an insulating film made from the same, and a display device including such insulating film are provided. The positive photosensitive resin composition is excellent in sensitivity and has excellent chemical resistance, heat resistance, and hygroscopicity by including a polymer containing a hydroxyl group.
The present invention relates to a display device and a photo-sensitive resin composition that can be applied thereto, and the photo-sensitive resin composition has excellent sensitivity, coatability, bubble defoaming properties, liquid repellency in an exposed portion, and spreadability in a non-exposed portion, etc., and may form an optical member exhibiting improved optical properties, thereby being suitable for forming partition walls for various display devices such as OLEDs.
H10K 59/38 - Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
G03F 7/031 - Organic compounds not covered by group
G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
C08F 265/06 - Polymerisation of acrylate or methacrylate esters on to polymers thereof
Provided is an anode active material, of which conductivity and durability are enhanced by repairing damage to silicon crystals during a secondary granulation process. An embodiment of the present invention provides an anode active material comprising: secondary silicon particles each resulting from aggregation of primary silicon particles; and a carbon layer on the secondary silicon particles, wherein formula 1 is satisfied in the differential capacity plot for a half-cell comprising the anode active material.
The present invention relates to a precursor compound, containing molybdenum, for forming a metal film and a metal film using same, wherein the precursor compound has excellent reactivity with a substrate or a reactive gas and high volatility and can form a metal thin film with a low content of impurities in a wide temperature range, especially, even at a low temperature.
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
A conductive material pre-dispersed slurry for a secondary battery electrode includes: a conductive material; a dispersant for dispersing the conductive material; and a solvent mixed with the conductive material and the dispersant. The dispersant includes a cellulose-based compound and a vinyl-based or acrylic compound, and the cellulose-based compound and the vinyl-based or acrylic compound in the dispersant have a weight ratio of about 25:1 to 1:25.
H01B 1/24 - Conductive material dispersed in non-conductive organic material the conductive material comprising carbon-silicon compounds, carbon, or silicon
Provided is a photosensitive resin composition capable of forming, during pattern formation in a low-temperature curing process, a forward-tapered shape and implementing a cured film with a high hardness. One embodiment of the present invention provides a photosensitive resin composition comprising 100 parts by weight of an alkali-soluble resin, 2-40 parts by weight of an initiator, 2-100 parts by weight of a multifunctional compound, a plasticizer in an amount of greater than 1 part by weight and less than or equal to 30 parts by weight, and an epoxy-based additive in an amount of greater than 0 part by weight and less than or equal to 15 parts by weight.
G03F 7/028 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G03F 7/105 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
A solar cell and a method for forming the solar cell are provided. The solar cell comprises: a substrate; and a plurality of unit cells each including a first electrode, an active layer, and a second electrode, wherein the unit cells are spaced apart from each other to expose the substrate. The present invention has an insulating structure or a non-power generation region in which the unit cells are spaced apart from each other to expose the substrate, thereby minimizing leakage current and increasing the power generation efficiency of a photovoltaic device.
A compound with enhanced etching resistance, gap-filling properties, and heat resistance includes a repeating unit represented by Formula 1.
A compound with enhanced etching resistance, gap-filling properties, and heat resistance includes a repeating unit represented by Formula 1.
The present disclosure relates to a thermosetting composition, an optical member formed therefrom, and a display device, the composition comprising a thermosetting resin, gas-containing particles and a monomer or an oligomer having two or more thermosetting functional groups, thereby having optical effects such as a low refractive index of 1.40 or less on light with a wavelength of 450 nm, high light transmittance, and low haze.
The present invention relates to graphite oxide, graphene oxide, and reduced graphene oxide and, more specifically, to graphite oxide, graphene oxide, and reduced graphene oxide in which graphene oxide includes 25 to 45 at% of oxygen (O) and is effectively exfoliated from graphite oxide, and can embody excellent powder conductivity after reduction.
The present invention provides a method for formation of an insulation film pattern, the method comprising the steps of: providing a substrate including two or more different types of dielectric film regions; selectively forming a blocking film on the substrate to include a first region where a blocking film is formed and a second region where no or relatively little blocking film is formed, whereby a difference in water contact angle between the first region and the second region ranges from 7 to 50 degrees (Deg).
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
81.
SILICONE RESIN, COATING COMPOSITION COMPRISING SAME, AND CURED PRODUCT THEREOF
The present invention relates to a silicone resin, a coating composition comprising same, and a cured product thereof and, more particularly, to a silicone resin, a coating composition comprising same, and a cured product thereof, wherein the silicone resin comprises a hollow silica structure and a silsesquioxane structure bonded to the hollow silica structure, contains 1.0% by weight or less of a hydroxyl group with respect to the total weight of the silicone resin, and can realize a low refractive index, excellent coating properties, and high solution stability without a separate dispersion process.
The present invention provides: an adhesive composition including a curable resin, an initiator, a getter, and a cross-linking agent; a cured body and a dam structure, in which the adhesive composition is cured; and a display device including the dam structure.
C09J 163/00 - Adhesives based on epoxy resinsAdhesives based on derivatives of epoxy resins
C09J 135/00 - Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereofAdhesives based on derivatives of such polymers
The present invention provides a three-dimensional image-varying device and a display device comprising same, the three-dimensional image-varying device comprising: a base material; a liquid crystal unit including a first liquid crystal electrode on the base material and a liquid crystal layer which is on the first liquid crystal electrode and which selectively blocks 2D polarization and 3D polarization; a lenticular lens unit on the liquid crystal unit; and a cover material on the lenticular lens unit.
G02B 30/27 - Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer’s left and right eyes of the autostereoscopic type involving lenticular arrays
G02F 1/1335 - Structural association of cells with optical devices, e.g. polarisers or reflectors
G06F 3/041 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
H04N 13/305 - Image reproducers for viewing without the aid of special glasses, i.e. using autostereoscopic displays using lenticular lenses, e.g. arrangements of cylindrical lenses
A positive photosensitive resin composition and, more specifically, a positive photosensitive resin composition includes an alkali-soluble polymer resin comprising a polyimide precursor comprising a specific chemical structure; a quinone diazide compound; and a solvent. The positive photosensitive resin composition is a suitable matter for next-generation flexible displays and semiconductor packages.
A polyimide-based composition includes a polyimide precursor and a solvent, in which the polyimide precursor includes repeating units represented by Chemical Formula 1 to 3. A polyimide film is also made from the composition.
A polyimide-based composition includes a polyimide precursor and a solvent, in which the polyimide precursor includes repeating units represented by Chemical Formula 1 to 3. A polyimide film is also made from the composition.
Provided is a conductive agent slurry for a secondary battery electrode, which has low viscosity and low sheet resistance. The conductive agent slurry for a secondary battery electrode, according to the present invention, comprises a conductive agent and a dispersant that disperses the conductive agent, wherein the dispersant comprises a cellulose compound and a conductive polymer, and the amount of the conductive agent is more than 0 wt% and not more than 2.5 wt% with respect to the total weight of the conductive agent slurry for a secondary battery electrode.
A method of polishing a substrate having amorphous carbon layer deposited thereon removes protrusions on the ACL surface by using a soft pad with a low hardness and a polishing slurry containing non-spherical modified fumed silica with high friction force with the surface.
The present invention relates to an adhesive composition with excellent transparency and, more specifically, to an adhesive composition, which has excellent adhesion retention while realizing high transparency and low turbidity, through an epoxy-based resin, a cationic initiator, and a low getter content, and thus can be applied to a bezel-less display.
C09J 4/06 - Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
The present invention relates to an adhesive composition having excellent adhesion and adhesion reliability and, more particularly, to an adhesive composition having excellent adhesion and adhesion reliability, comprising: a first resin containing a cation-curable functional group as a heterogeneous resin; and a second resin containing a radical-curable functional group.
C09J 4/06 - Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
The present invention relates to: a photoacid generator having a novel structure including an anion having a particular polar functional group such as a sulfonate group; a photoresist composition comprising same; and a photoresist pattern formation method.
C07C 323/20 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton with singly-bound oxygen atoms bound to carbon atoms of the same non-condensed six-membered aromatic ring
C07C 323/21 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton with the sulfur atom of the thio group bound to a carbon atom of a six-membered aromatic ring being part of a condensed ring system
91.
SALT COMPOUND, AND QUENCHER AND PHOTORESIST COMPOSITION COMPRISING SAME
The present invention relates to: a salt compound comprising a negative ion having a specific structure represented by chemical formula 1, and a positive ion represented by chemical formula 2; a quencher including the salt compound; and a photoresist composition including the salt compound.
C07C 311/06 - Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atoms of the sulfonamide groups bound to hydrogen atoms or to acyclic carbon atoms to acyclic carbon atoms of hydrocarbon radicals substituted by carboxyl groups
C07C 311/14 - Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of rings other than six-membered aromatic rings
C07C 311/17 - Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the sulfonamide groups bound to hydrogen atoms or to an acyclic carbon atom to an acyclic carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms
C07C 321/28 - Sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
C07C 323/22 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and doubly-bound oxygen atoms bound to the same carbon skeleton
C07C 323/66 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfo, esterified sulfo or halosulfonyl groups, bound to the carbon skeleton
C07D 319/20 - 1,4-DioxanesHydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems condensed with one six-membered ring with substituents attached to the hetero ring
A device for producing an azo compound includes a reaction unit in which a first solution comprising a hydrazo compound and at least one type of MaXb; a negative electrode disposed to be in direct contact with the hydrazo compound inside the reaction unit; and a positive electrode disposed inside the reaction unit so as to be in contact with the solution. X is a halogen element, M is at least one selected from the group consisting of hydrogen, Li, Na, K, Mg, Ca, Mn, Fe, Ni, Cu, Ag, Zn, Sn, Zr, and Ti, or at least one selected from the group consisting of a primary ammonium ion, a secondary ammonium ion, and a tertiary ammonium ion, H is hydrogen, and a and b are each independently any one integer between 1 and 4.
C08J 9/10 - Working-up of macromolecular substances to porous or cellular articles or materialsAfter-treatment thereof using blowing gases generated by a previously added blowing agent by a chemical blowing agent developing nitrogen
C07C 245/04 - Azo compounds, i.e. compounds having the free valencies of —N=N— groups attached to different atoms, e.g. diazohydroxides with nitrogen atoms of azo groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
A method for preparing an azo compound includes a first step for producing an Xb molecule by electrolyzing, in a reaction system, a first solution including a hydrazo compound and at least one type of MaXb; a second step for oxidizing the hydrazo compound with the generated Xb molecule to obtain a second solution including an azo compound, MaXb, and HX; a third step for discharging the second solution outside the reaction system, and separating therefrom a third solution including MaXb and HX to obtain a solid azo compound; and a fourth step for introducing the third solution and an additional hydrazo compound equivalent to the hydrazo compound into the reaction system, and electrolyzing a fourth solution including the additional hydrazo compound, MaXb, and HX to produce an Xb molecule.
C07C 281/20 - Derivatives of carbonic acid containing functional groups covered by groups in which at least one nitrogen atom of these functional groups is further bound to another nitrogen atom not being part of a nitro or nitroso group the two nitrogen atoms of the functional groups being doubly-bound to each other, e.g. azoformamide
94.
CURABLE COMPOSITION AND DISPLAY DEVICE INCLUDING DAM STRUCTURE FABRICATED THEREFROM
Disclosed are a curable composition, a dam structure fabricated therefrom, and a display device including the dam structure. The curable composition disclosed in the present invention includes: an acrylate-based compound in the form of at least one of a monomer and an oligomer; a urethane diacrylate-based compound having a repeating unit bearing a urethane group; a curing initiator; and a getter. The curable composition may further include a butadiene urethane diacrylate-based compound. The curable composition may further include a butadiene urethane diacrylate-based compound.
The present disclosure relates to a slurry composition for a secondary battery electrode, and a secondary battery electrode manufactured using same. The slurry composition includes a conductive material including a linear carbon material and a point-type carbon material, a dispersant, and an organic solvent. By adjusting the average size and content of the conductive material in the slurry such that two peaks within a specific range appear in a particle size analysis, the solubility and dispersibility of the carbon-based conductive material are improved, and thus the electrical properties of the electrode are remarkably improved.
The present invention relates to a dual curable composition and a cured product thereof and, more specifically, to: a dual curable composition which, by comprising a compound containing a thiol group and an acrylate group, an acrylic monomer or oligomer, and a photopolymerization initiator, can be both photocured and thermally cured, and which has excellent mechanical properties, heat resistance and light resistance after curing, and has reliability that is stably maintained for a long period of time; and a cured product thereof.
The present disclosure relates to a slurry composition for a secondary battery electrode, and a secondary battery electrode manufactured using the same. The slurry composition includes dispersants of specific components, a carbon-based conductive material, and an organic solvent. The slurry composition has an advantage in that the stability of the carbon-based conductive material is excellent. In addition, due to the presence of a polar functional group in the dispersant, the surface treatment effect for the carbon-based conductive material is excellent, and thus the dispersibility of the carbon-based conductive material is remarkably improved.
The present invention relates to a positive electrode active material composite which is for a battery and is coated with reduced graphene oxide, and specifically, to a positive electrode active material composite comprising: a core portion including a positive electrode active material; and a shell portion surrounding the core portion, wherein the shell portion includes at least one layer of reduced graphene oxide (rGO), thus making it possible to obtain a secondary battery having excellent electronic conductivity and energy density.
H01M 4/36 - Selection of substances as active materials, active masses, active liquids
H01M 4/62 - Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
H01M 4/525 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
H01M 4/505 - Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
C07D 407/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing three or more hetero rings
C07D 413/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings
C07D 417/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group containing three or more hetero rings
C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
H10K 99/00 - Subject matter not provided for in other groups of this subclass
100.
POLYMER COMPOUND FOR FORMING PHOTORESIST UNDERLAYER FILM, AND PHOTORESIST UNDERLAYER FILM COMPOSITION FOR EUV CONTAINING SAME
Provided is a photoresist underlayer film composition for extreme ultraviolet (EUV), which contains a polymer compound that allows reducing exposure energy when forming a photoresist film pattern and improves adhesion to a photoresist film. The photoresist underlayer film composition for EUV according to the present invention comprises, with respect to the total weight of the photoresist underlayer film composition for EUV, 0.02-1.00 wt% of the polymer compound, 0.005-1.0 wt% of a crosslinking agent, and 0.001-0.5 wt% of an acid generator, with the remainder being an organic solvent.
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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