Abstract

Disclosed are a photosensitive polymer including a repeating unit of Chemical Formula 1 or Chemical Formula 2 derived from a vinyl heteroaromatic compound and a resist composition including the same. 2 are hydrogen or a methyl group, X is a carbon, sulfur, or a nitrogen atom, and n is 1 or 2.

IPC Classes  ?

• C08F 226/06 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
• C08F 212/06 - Hydrocarbons
• C08F 220/06 - Acrylic acidMethacrylic acidMetal salts or ammonium salts thereof
• C08F 224/00 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
• G03F 7/004 - Photosensitive materials
• G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
• G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
• G03F 7/20 - ExposureApparatus therefor
• G03F 7/32 - Liquid compositions therefor, e.g. developers
• G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
• G03F 7/40 - Treatment after imagewise removal, e.g. baking

Abstract

Provided is an anti-reflective hardmask composition including: (a) a polymer composed of an indolocarbazole represented by the following Chemical Formula 1 or a polymeric blend containing the same; and (b) an organic solvent.

IPC Classes  ?

• G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
• C08G 14/06 - Condensation polymers of aldehydes or ketones with two or more other monomers covered by at least two of the groups of aldehydes with phenols and monomers containing hydrogen attached to nitrogen
• C09D 5/00 - Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects producedFilling pastes
• C09D 161/34 - Condensation polymers of aldehydes or ketones with monomers covered by at least two of the groups , and

Abstract

An anti-reflective hardmask composition contains: (a) an arylcarbazole derivative polymer represented by the following Chemical Formula 1 or a polymer blend containing the same; and (b) an organic solvent 40) aromatic aryl group and are the same as or different from each other, R is t-butyloxycarbonyl (t-BOC), ethoxyethyl, isopropyloxyethyl, or tetrahydropyranyl, 2 in the presence of an acid catalyst, m/(m+n) is in a range of 0.05 to 0.8, and a weight average molecular weight (Mw) of an the polymer is in a range of 1,000 to 30,000.

IPC Classes  ?

• C09D 161/34 - Condensation polymers of aldehydes or ketones with monomers covered by at least two of the groups , and
• H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or