A method, within a charged particle beam (CPB) microscope, of rapidly switching between a first imaging or data acquisition mode and a second imaging or data acquisition mode, comprises: activating a switchable electrostatic multipole of the CPB microscope to either cause or enable the CPB microscope to generate a first set of one or more images or data sets, the first set of one or more images or data sets comprising information relating to a sample in accordance with the first imaging or data acquisition mode; and de-activating the switchable electrostatic multipole to either cause or enable the CPB microscope to generate a second set of one or more images or data sets, the second set of one or more images or data sets comprising information relating to the sample in accordance with the second imaging or data acquisition mode.
OXFORD UNIVERSITY INNOVATION LIMITED (United Kingdom)
Inventor
Konijnenberg, Albert
Esser, Tim
Fremdling, Paul
Gault, Joe
Rauschenbach, Stephan
Abstract
The present invention relates to a method of preparing a sample of one or more molecule(s) for imaging with a cryo-electron microscope. The method comprises providing a carrier substrate, cryogenically cooling the carrier substrate to form a cryogenically-cooled carrier substrate, generating gas phase ions of the one or more molecule(s) by electrospray ionisation, decelerating the gas phase ions, receiving the gas phase ions on the cryogenically-cooled carrier substrate to form a sample for imaging with a cryo-electron microscope and shielding the cryogenically-cooled carrier substrate after the step of receiving the ions on the cryogenically-cooled carrier substrate. The step of decelerating the ions reduces the energy of each of the ions to be less than 20 eV per charge when received at the cryogenically-cooled carrier substrate. The present invention also relates to an apparatus for preparing a sample of one or more molecule(s) for a cryo-electron microscope.
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
H01J 37/20 - Means for supporting or positioning the object or the materialMeans for adjusting diaphragms or lenses associated with the support
3.
SYSTEM FOR INSTRUMENT OPTIMIZATION USING ANALYTE BASED MASS SPECTROMETER AND ALGORITHM PARAMETERS
Disclosed herein are scientific instrument support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, an apparatus, includes a sample introduction device and mass spectrometer. The mass spectrometer includes first logic to receive a sample from a queue, the sample comprising an analyte; second logic to determine instrument methods and data analysis parameters based on a nature of the analyte; and third logic to process the sample by applying the instrument methods and data analysis parameters. WO
Systems and methods taught herein utilize a single detector to provide both unidimensional data (e.g., for direct topographical imaging) and multidimensional data (e.g., for crystallographic data) for a sample that is interrogated with a charged particle beam. In some examples, unidimensional data can include signal intensity due to backscattered electrons received across the entire detector surface while multidimensional data can include signal intensity due to backscattered electrons as a function of pixel position. By obtaining unidimensional data and multidimensional data from a single detector, the unidimensional data and multidimensional data can be obtained at a same location, at a same time, or both at the same location and same time.
Phase contrast images in a charged-particle beam system are obtained by directing a CPB as modulated by a sample to a phase plate to have a diffraction plane that is displaced from the phase plate. Based on interference fringes in the images, a transverse displacement of the CPB with respect to the phase plate can be estimated and adjusted.
Sample shuttles are operable to electrically contact and secure samples during and after ion beam milling. During sample processing with an ion beam incident to a first sample surface along a first direction, sample electrical characteristics such as voltage or impedance are measured. Based on the measurements, sample electrical characteristics are adjusted by applying a voltage or a current, the sample shuttle is rotated to permit sample milling from a second direction. A non-conductive mask can be situated to reduce redeposition of material from shuttle surfaces on samples.
Methods include acquiring a series of images or spectra of a volume of a model sample, reconstructing a 3D image of the volume of the model sample using the series of images, constructing a 3D model of the volume of the model sample by forming a segmentation of the reconstructed 3D image and fitting one or more primitive geometrical shapes to the segmentation, acquiring test sample images or spectra, and measuring test sample critical dimensions using the constructed 3D model to guide analysis of test spectra or images. Additional methods and related systems are disclosed, optical critical dimension (OCD) methods and systems.
Charged particle microscope systems including multipole optics are described. An ion-optical column can include an aberration correction system. The aberration correction system can be disposed on an axis and can include a multipole condenser. The multipole condenser can include one or more condenser quadrupole-generating elements. The aberration correction system can also include a multipole objective. The multipole objective can include a plurality of objective multipole elements. The ion-optical column can include an objective lens assembly, disposed on the axis. The ion-optical column can also include a deceleration element. The deceleration element can be disposed on the axis between at least a portion of the aberration correction system and a sample position external to the charged particle optical column.
Charged particle microscope systems including multipole optics are described. An ion-optical column can include an aberration correction system. The aberration correction system can be disposed on an axis and can include a multipole condenser. The multipole condenser can include one or more condenser quadrupole-generating elements. The aberration correction system can also include a multipole objective. The multipole objective can include a plurality of objective multipole elements. The ion-optical column can include an objective lens assembly, disposed on the axis. The ion-optical column can also include a deceleration element. The deceleration element can be disposed on the axis between at least a portion of the aberration correction system and a sample position external to the charged particle optical column.
There is provided systems and methods for electron microscopy imaging, including a method for imaging a sample using a charged particle microscope, the method comprising: acquiring an initial image of a surface of the sample using the charged particle microscope; receiving an indication of one or more initial areas of interest for one or more auto-functions for the charged particle microscope; acquiring a series of subsequent images of subsequent surfaces of the sample using the charged particle microscope. Wherein, for each subsequent image, acquiring said subsequent image comprises exposing the respective subsequent surface of the sample; identifying, one or more areas of interest corresponding to the one or more initial areas of interest; and imaging the respective subsequent surface wherein imaging the respective subsequent surface comprises applying the one or more auto-functions based on at least one of the identified areas of interest corresponding to the one or more initial areas of interest.
Embodiments of the present disclosure provide methods and systems for preparing samples for imaging using gradient-based segmented endpointing. A method includes removing a first layer of material from a sample by at least directing a charged particle beam toward a surface of the sample in a pattern where the pattern corresponds to a segment of the sample, generating, after the first layer is removed, a first image that shows at least the segment, determining, based on the image, a variation in material removal between at least two sections of the segment, determining, based on the variation in material removal, a control parameter that varies one or more properties of the charged particle beam across the at least two sections, and removing a second layer of material from the sample by at least directing the charged particle beam in the pattern according to the control parameter.
CPB images are acquired with pulsed exposures of fields of view (FOVs) defined in a region of interest of a sample. Multiple exposures are configured with a time interval greater than a phonon lifetime to reduce sample damage induced by the CPB exposure. FOVs can defined to be spaced apart to control effective irradiation dose based on a combination of direct exposure and evanescent exposure.
Systems/techniques are provided for facilitating large language model resolution of scientific instrument workflow interruptions. In various embodiments, a system can cause a scientific instrument (e.g., charged-particle microscope, chromatograph, mass-spectrometer) to perform a workflow on a specimen. In various aspects, the system can, in response to the scientific instrument generating an error message that interrupts the workflow, retrieve runtime data logged by the scientific instrument during the workflow. In various instances, the system can synthesize, via execution of a large language model on the error message and on the runtime data, first text that explains why the workflow was interrupted.
In an example, a method includes recording a plurality of data frames by performing test location measurements at a plurality of sample test locations and recording response signals. Each test location measurement is characterized by a phase delay. For at least one sample test location, the test location measurement is performed with a repeated phase delay in non-consecutive measurements. In another example, the test location measurement is performed at each sample test location such that different respective phase delays are used at each of two or more different sample test locations. In another example, a CPM system is configured to direct an illumination pulse of a charged particle beam to a sample test location, to apply an excitation stimulus to the sample test location, and to receive one or more response signals. The CPM system includes a controller programmed to execute one or more methods disclosed herein.
Systems or techniques are provided for spectral analysis. In various embodiments, a system can comprise a memory that stores computer executable components and a processor that executes the computer executable components stored in the memory. The computer executable components can comprise a graph generation component that generates a class neighborhood graph for a lamella milling processes, wherein the graph generation component generates the class neighborhood graph by: classifying structures within a region of interest of a design schematic of a sample; and generating a directed graph of the region of interest, wherein the directed graph comprises nodes representing the classified structures and weighted directed edges between the nodes representing distances between the classified structures.
G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
A first grid box assembly for holding a plurality of sample-bearing grids for use in cryo-electron microscopy comprises: a grid box comprising a plurality of compartments, each compartment adapted to hold a respective sample-bearing grid on a sample carrier; and a sample grid stabilization apparatus comprising a plurality of spring arms, wherein each spring arm provides a spring force to a respective sample carrier that secures the position of the sample carrier within its respective compartment. A second grid box assembly for holding a plurality of sample-bearing grids for cryo-electron microscopy comprises: a grid box comprising a plurality of compartments, each compartment adapted to hold a respective sample-bearing grid on a sample carrier; and a lid adapted to cover a top surface of the grid box, wherein a bottom surface of the grid box comprises a plurality of gas dispersion pockets the extend to the perimeter of the grid box.
A device, apparatus, and method for simultaneous imaging in charged particle microscopy. The method also includes directing, by a charged particle beam source, a charged particle beam towards a target, where interactions of the charged particle beam with the target generate charged particle emissions and electromagnetic emissions. The method also includes receiving, by a membrane detector, the charged particle emissions and the electromagnetic emissions, where the membrane detector at least partially absorbs a portion of the charged particle emissions and is at least partially transparent to the electromagnetic emissions. The method also includes outputting, by the membrane detector, charged particle signal data based at least in part on the portion of the charged particle emissions received by the membrane detector. The method also includes outputting, by an electromagnetic emission detector, electromagnetic signal data based at least in part on the electromagnetic emissions that pass through the membrane detector.
An optical bench assembly configured to be positioned in an optics chamber of a charged particle system. The optical bench assembly includes a housing defining a plurality of openings and a channel defining a beam axis for a charged particle beam and a plurality of optical holders. Each optical holder of the plurality of optical holders includes a base portion and one or more arms extending from the base portion, the one or more arms of each optical holder is removably mountable to the housing within a first opening of the plurality of openings, the base portion of each optical holder is configured to house a multipole element, and the base portion of each optical holder is positionable in the channel such that each multipole element is aligned with each other along the beam axis.
Trenches produced in ion beam or laser beam milling of lamella for electron microscopy can be filled by milling trench sidewalls to taper so as to be wider at a top, typically at a workpiece surface, than at a bottom. Taper angles of between 40 and 80 degrees are preferred as measured from a workpiece surface to a trench sidewall. With such tapers, after lamella removal, trenches can be at least 90% filled using ion beam or laser beam assisted deposition.
H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
20.
FOIL LENS CORRECTORS, CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE SAME, AND ASSOCIATED METHODS
Foil lens correctors, charged particle microscope systems including the same, and associated methods. In an example, a foil lens corrector is configured to generate an offsetting spherical aberration in a charged particle beam and includes a graphene foil. In an example, a CPM system includes a charged particle source and a foil lens corrector including a graphene foil. In an example, a method of operating a CPM system includes directing a charged particle beam to a specimen and operating a foil lens corrector to generate an offsetting spherical aberration in the charged particle beam. In an example, the charged particle beam is incident upon a foil of the foil lens corrector with a foil landing energy that is at least 5 keV and at most 80 keV and such that the charged particle beam is transmitted through the foil with a transmission ratio that is at least 20%.
21.
METHODS OF DETERMINING A DEFORMATION CHARACTERISTIC AND ASSOCIATED SYSTEMS
In an example, a method includes determining a characteristic displacement gradient (DG) tensor that characterizes a deformation characteristic. The method includes, in an iterative routine, calculating an objective function value associated with a trial DG tensor based, at least in part, on pixel values within a zone of consideration (ZOC) that is determined automatically based at least in part on the trial DG tensor. In another example, a method includes determining one or more rotational transformation components corresponding to a test image and determining a characteristic DG tensor based at least in part on the rotational transformation component(s). In another example, a system includes an electron optics assembly, a detector assembly, and a controller programmed to determine a characteristic DG tensor. In another example, a non-transitory computer readable medium stores instructions which, when executed by a computer, cause the computer to perform a method of determining a deformation characteristic.
Methods for preparing a sample for analysis by a charged particle microscope (for example by providing a lamella) include removing material from a surface of a sample to provide a newly exposed surface and determining a region of interest (ROI) on the newly exposed surface. A plurality of lines is formed on the newly exposed surface and material from a working surface of the sample, different from the newly exposed surface, is removed a plurality of times. The working surface is imaged a plurality of times to at least capture the plurality of lines and an endpoint is determined based on a relative spatial characteristic between two or more lines of the plurality of lines.
Techniques for electrical characterization of a logical cell. A system can include a plurality of probes, control circuitry, bias circuitry, and machine-readable storage media storing instructions that, when executed by a machine, cause the machine to perform operations including landing the probes on a surface of an integrated circuit, including a plurality of electrically coupled transistors, the logical cell having been electrically isolated from one or more conductive structures of the integrated circuit. The operations can include applying one or more bias voltages to the logical cell via one or more of the probes, performing an operational test of the logical cell using the probes, and generating output data describing one or more logical states of the logical cell over at least a portion of the operational test.
Systems, components, methods, and algorithms encoded as executable instructions for processing a sample using focused ion beams are described. A method includes processing a sample 125 by extracting a beam of ions 310 from a mixture of a first gas and a second gas. The beam can include a composition of relatively heavy ions and relatively light ions. The method can include deflecting 330 the beam of ions in accordance with a deflection pattern and directing the beam through an electromagnetic field 305 that is oblique relative to an axis of the beam. The electromagnetic field can be configured to at least partially disperse 315 the beam in space such that the deflection pattern causes the beam of ions to process a first portion of a sample surface by the relatively light ions and a second portion of the sample surface by the relatively heavy ions.
H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
25.
TECHNIQUES FOR LOCALIZED HYDROGEN CHARGING USING HYDROGEN PLASMA FOCUSED ION BEAMS
Systems, components, methods, algorithms encoded in media, and techniques for localized hydrogen charging of a sample are described. A method of processing a workpiece in a focused ion beam system can include generating a plasma in an ion source gas comprising hydrogen. The method can include extracting a beam of hydrogen ions from the plasma. The method can include directing the beam toward a region of a workpiece, in accordance with a scan pattern. The method can include charging the region of the workpiece with hydrogen. In some embodiments, the method includes decomposing a hydrogen precursor using a charged particle beam, instead of directly irradiating the workpiece with a hydrogen focused ion beam.
G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
A method of preparing a sample for electron microscopy imaging includes providing a substrate in an electron microscopy system comprising a probe for manipulating a freed sample of the substrate, applying a current flow between a stage of the system and the probe, detecting a first change in current flow in connection with contacting the sample with the probe, after detecting the first change in current flow, extracting the sample from the substrate with the probe, detecting a second change in current flow in connection with extracting the sample from the substrate, and confirming the sample is extracted from the substrate based at least in part on the second change in current flow.
Systems/techniques are provided for facilitating text-conditioned anomaly detection for charged-particle microscopy images. In various embodiments, a system can access an image captured by a charged-particle microscope, wherein the image depicts a specimen. In various aspects, the system can localize one or more outlying instantiations of a structure of interest of the specimen, based on feeding both the image and a text prompt to a large language model. In various instances, the text prompt can comprise one or more sentences or sentence fragments that semantically define or describe the one or more outlying instantiations. In various cases, the one or more sentences or sentence fragments can semantically define or describe the one or more outlying instantiations in terms of their sizes, shapes, distances, arrangements, or intensities with respect to other instantiations of the structure of interest.
Systems/techniques are provided for facilitating edge localization via intelligent insertion of image processing calipers. In various embodiments, a system can access an image captured by a charged-particle microscope, wherein the image depicts a specimen. In various aspects, the system can localize, via execution of a deep learning neural network on the image, an approximate boundary of a structure of interest of the specimen. In various instances, the system can localize a true boundary of the structure of interest, based on placing a plurality of image processing calipers along the approximate boundary.
An ion beam milling system includes a vacuum chamber, an ion column for directing an ion beam toward a sample, and a stage disposed inside the vacuum chamber and configured for mounting a holder to support the sample. The stage includes a stage surface disposed at a first angle relative to an axis of the ion column. An electrical bias is applied to the stage to adjust an incident angle of the ion beam with respect to the stage surface. A method for milling a sample using an ion beam milling system includes providing the ion beam milling system applying an electrical bias to the stage for adjusting an incident angle of the ion beam with respect to the stage surface, and, after applying the electrical bias to the stage, milling a sample surface of the sample using the ion beam.
G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
H01J 37/147 - Arrangements for directing or deflecting the discharge along a desired path
H01J 37/26 - Electron or ion microscopesElectron- or ion-diffraction tubes
H01J 37/31 - Electron-beam or ion-beam tubes for localised treatment of objects for cutting or drilling
31.
TECHNIQUES FOR ELECTRON ENERGY LOSS SPECTROSCOPY AT HIGH ENERGY LOSSES WITH MAGNETIC IMMERSION OBJECTIVE
Systems, devices, methods, algorithms, and techniques for energy-loss spectroscopy at relatively large energy losses are described. A method includes modifying an accelerating voltage of a source of the system from a first energy to a second energy. The method can include modifying one or more optical elements of the system, in accordance with a calibration for the second energy. The method can include generating a set of operating conditions for a projection optics system. The method can include modifying one or more elements of the projection optics system in at least partial accordance with the set of operating conditions. The method can include modifying a condenser lens of the system in accordance with focusing a beam of charged particles onto a sample position. The method can also include modifying the accelerating voltage from the second energy to the first energy.
G01N 23/02 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material
G01T 1/36 - Measuring spectral distribution of X-rays or of nuclear radiation
32.
INSULATION GAS FOR HIGH VOLTAGE COMPONENT OF ELECTRON MICROSCOPES
Provided herein is an electron particle system comprising an electron source system comprising a high voltage component housed within a high voltage component volume occupied by an insulation gas, a sample chamber, and an electron beam column. Also provided herein is a charged particle system comprising a charged source system comprising a high voltage component housed within a high voltage component volume occupied by an insulation gas, a sample chamber, and an electron beam column. Further provided herein is a method of using an insulation gas in a high voltage component of an electron particle system.
A charged particle beam (CPB) imaging apparatus intermittently acquires dark frames while the CPB is blanked and updates a dark reference with the intermittently acquired dark frames. The dark reference is used to compensate additive noise components in acquired sample frames, especially additive noise that increases during multiple image acquisitions over extended time periods.
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H01J 37/20 - Means for supporting or positioning the object or the materialMeans for adjusting diaphragms or lenses associated with the support
34.
AUTOMATED CHEMICAL SWITCHING FOR MATERIAL DELAYERING
Provided herein is a method for delayering heterogeneous materials. Also provided herein is a method comprising delayering, at a first time, a multilayered material until a first endpoint condition is satisfied, determining a change to the delayering setting based on the first endpoint condition being satisfied, and delayering, at a second time subsequent to the first time, the multilayered material until a second endpoint condition is satisfied. Further provided herein is a non-transitory computer-readable medium embodying program code comprising instructions which, when executed by a processor, cause the processor to perform operations comprising delayering, at a first time, a multilayered material until a first endpoint condition is satisfied, determining a change to the delayering setting based on the first endpoint condition being satisfied, and delayering, at a second time subsequent to the first time, the multilayered material until a second endpoint condition is satisfied.
Techniques for preparing a powder sample for charged particle beam microanalysis are described. A method for preparing a powder sample includes providing a silicon section configured with an uneven edge. The method includes positioning the silicon section on aluminum foil with the uneven edge adjacent to the foil. The method includes placing a powder sample on the foil. The method includes sliding or pushing the silicon section across the powder sample so that the uneven edge contacts and entrains the powder. The method also includes covering the entrapped powder with a sealant such as silver paint or carbon paint to encapsulate the particles.
A computer-implemented method for generating synthetic data describing a sample can comprise processing, by a system operatively coupled to a processor, sample information describing a set of original features of a sample, resulting in processed model input information, and generating, by an analytical model, synthetic image data, usable to generate a synthetic image, and describing at least a portion of the set of original features and based on the processed model input information. The computer-implemented method further can comprise generating, by the system, the synthetic image of a pseudo-sample, based on the synthetic image data, having at least one pseudo-feature that is different from and based on the set of original features.
Foil lens correctors, charged particle microscope systems including the same, and associated methods. In an example, a foil lens corrector is configured to generate an offsetting spherical aberration in a charged particle beam and includes a graphene foil. In an example, a CPM system includes a charged particle source and a foil lens corrector including a graphene foil. In an example, a method of operating a CPM system includes directing a charged particle beam to a specimen and operating a foil lens corrector to generate an offsetting spherical aberration in the charged particle beam. In an example, the charged particle beam is incident upon a foil of the foil lens corrector with a foil landing energy that is at least 5 keV and at most 80 keV and such that the charged particle beam is transmitted through the foil with a transmission ratio that is at least 20%.
A method comprises determining parameters of a thickness function for estimating a thickness of a sample. The thickness function defines a relationship between the thickness of the sample and a statistical electron characteristic. The method comprises obtaining backscattered electron data of the sample using a direct charged particle detector comprising an array of pixels and configured to count the number of backscattered electrons detected by each pixel of the array when an electron beam is incident upon the sample. Backscattered electron data sets can include the number of backscattered electrons detected by each pixel of the array when the electron beam is incident upon a respective region of the sample. The method further comprises determining, for each data set, a respective statistical electron characteristic, and then fitting the known thicknesses and the determined statistical electron characteristic to the thickness function to determine the parameters of the thickness function.
G01B 15/02 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
39.
LAMELLA LIFT-OUT GEOMETRY BASED ON SAMPLE PLANE ORIENTATION
Systems, methods, or techniques are provided for lamella lift-out based on sample plane orientation. In various embodiments, a method can comprise adjusting, by a scientific instrument, stage tilt and rotation of a sample stage of the scientific instrument based on plane orientation of a sample.
G01N 1/36 - Embedding or analogous mounting of samples
G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
A method including configuring a transmission electron microscope according to first acquisition settings that comprise at least one of a first dose rate or a first operating mode. The method further including operating, during a first time period, the electron microscope to image a radiation-sensitive sample in accordance with the first acquisition settings. The method further including, after the first time period, configuring the electron microscope according to second acquisition settings that comprise at least one of a second dose rate different than the first dose rate or a second operating mode different than the first operating mode. The method further including operating, during a second time period, the electron microscope to image the radiation-sensitive sample in accordance with the second acquisition settings. The method further including generating image data based on first data and second data respectively collected during the first time period and the second time period
H01J 37/22 - Optical or photographic arrangements associated with the tube
H04N 19/30 - Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using hierarchical techniques, e.g. scalability
H04N 19/91 - Entropy coding, e.g. variable length coding [VLC] or arithmetic coding
41.
CHIP NAVIGATION USING VIRTUAL MAP INCLUDING SAMPLE NAVIGATION BASED ON HAND-DRAWN OR DIGITIALLY GENERATED IMAGES
A computer-implemented method, comprising accessing an image of a sample, detecting one or more shapes in the image, constructing a virtual map based on the detected one or more shapes in the image and a set of virtual map construction rules, and based on the virtual map, automatically navigating to a target region of the sample to process the sample with a charged particle beam microscope. Another method includes accessing dynamically obtained shape data associated with an image of a sample, detecting one or more shapes in the image and converting the detected one or more shapes into found shape data, accessing artificial reference shape data, comparing the found shape data and the artificial reference shape data with an object matching optimization to determine an alignment between the found shape data and the artificial reference shape data, and navigating to a target region of the sample based on the alignment.
Methods and systems are provided for a system for supporting a sample. In one embodiment, a system includes a charged particle sample holder configured to hold a sample for analysis and a functionalized sleeve configured to receive the charged particle sample holder into an opening extending along an axis of the functionalized sleeve. When inserted, the functionalized sleeve encases at least a portion of the charged particle sample holder. The functionalized sleeve includes one or more extensions arranged along a top or bottom of the sample, the one or more extensions comprising stimulus and/or detection components
Systems or techniques are provided for magnetic magnification control of electron microscopes. In various embodiments, a system can comprise an electron microscope that diffracts electrons through an analytical sample and modifies, using one or more magnetic immersion fields, trajectories of the electrons onto an electron detector.
Systems, devices, methods, algorithms, and techniques for energy-loss spectroscopy at relatively large energy losses are described. A method includes modifying an accelerating voltage of a source of the system from a first energy to a second energy. The method can include modifying one or more optical elements of the system, in accordance with a calibration for the second energy. The method can include generating a set of operating conditions for a projection optics system. The method can include modifying one or more elements of the projection optics system in at least partial accordance with the set of operating conditions. The method can include modifying a condenser lens of the system in accordance with focusing a beam of charged particles onto a sample position. The method can also include modifying the accelerating voltage from the second energy to the first energy.
G01N 23/06 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and measuring the absorption
45.
CONTROLLING INCIDENCE ANGLE OF ION BEAM BY SAMPLE BIASING
An ion beam milling system includes a vacuum chamber, an ion column for directing an ion beam toward a sample, and a stage disposed inside the vacuum chamber and configured for mounting a holder to support the sample. The stage includes a stage surface disposed at a first angle relative to an axis of the ion column. An electrical bias is applied to the stage to adjust an incident angle of the ion beam with respect to the stage surface. A method for milling a sample using an ion beam milling system includes providing the ion beam milling system applying an electrical bias to the stage for adjusting an incident angle of the ion beam with respect to the stage surface, and, after applying the electrical bias to the stage, milling a sample surface of the sample using the ion beam.
Systems, components, and methods are described for protecting a charged particle detector against damage. A filter can include a frame and a membrane of carbon material. The membrane can define a first surface, a second surface opposing the first surface, and an aperture extending through the membrane from the first surface to the second surface. The frame can be configured to couple with a charged particle detector disposed in a charged particle beam column, the charged particle detector defining an absorption surface oriented toward the first surface. The filter can be configured to shield the absorption surface from particles incident on the second surface. The particles can include electrons, ions, or photons.
Embodiments described herein relate to systems and/or methods for providing positional repeatability of closure of an opening of a scientific instrument and/or of alignment of samples relative to a coordinate system of the scientific instrument. A system can comprise a retaining member that receives a sample support cartridge, a first portion of a kinematic coupling that receives a second portion of a kinematic coupling, and the second portion of the kinematic coupling disposed at the retaining member, wherein at least the first portion of the kinematic coupling or the second portion of the kinematic coupling is disposed for joint movement with the sample support cartridge when coupled to the retaining member. A system can comprise a vacuum chamber body, a vacuum chamber door, and a kinematic coupling providing for adjustable alignment of a sample support cartridge at the vacuum chamber door relative to the vacuum chamber body.
Systems/techniques are provided for facilitating teaching of charged-particle microscopy robotic grippers via beamsplitting. In various embodiments, a system can access a charged-particle microscope having a vacuum chamber, wherein the vacuum chamber can comprise a robotic gripper and a microscopy grid receptacle. In various aspects, the system can teach the robotic gripper to angularly or translationally align its shaft-axis with a bore-axis of the microscopy grid receptacle, based on a beamsplitter-equipped light source coupled to the robotic gripper.
H01J 37/02 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof Details
49.
VACUUM SIMULATION FOR CHARGED-PARTICLE MICROSCOPY GRID RECEPTACLES
Systems/techniques are provided for facilitating vacuum simulation for charged-particle microscopy grid receptacles. In various embodiments, an apparatus can comprise a positioning mechanism configured to be coupled to a vacuum chamber of a charged-particle microscope. In various aspects, the apparatus can comprise an adjustable force applicator coupled to the positioning mechanism and configured to simulate a vacuum for a microscopy grid receptacle located on an inner surface of a load-lock door of the vacuum chamber by mechanically pressing against an outer surface of the load-lock door.
Methods identify phase characteristics of a sample. Methods comprise obtaining backscattered electron data of the sample using a direct charged particle detector. Direct charged particle detectors comprise an array of pixels and is configured to count the number of backscattered electrons, or to measure the energy of each backscattered electron, detected by each pixel of the array when an electron beam is incident upon the sample. Backscattered electron data sets comprise the number of, or the measured energies of, the backscattered electrons detected by each pixel of the array when the electron beam is incident upon a respective region of the sample. Methods further comprise determining, for each data set, a respective statistical electron characteristic or a respective electron energy spectrum, and identifying a respective phase characteristic for at least some of the regions of the sample, based on the determined statistical electron characteristics or the determined electron energy spectra.
Embodiments of charged particle beam systems, components, and methods for extracting charged particles from a gas are described. In a first aspect, A charged particle source includes a resonator. The resonator can include a dielectric substrate defining a first side and a second side, the second side opposite the first side. The resonator can include a first conductive layer disposed on the first side. The first conductive layer can be disposed in accordance with a pattern comprising a ring portion. The pattern can define a gap in the ring portion of the first conductive layer. The resonator can also include a second conductive layer disposed on the second side. The charged particle source can also include a source electrode. The source electrode can be disposed proximal to the first side. The source electrode can be offset from the dielectric substrate.
Embodiments of charged particle beam systems, components, and methods for extracting charged particles from a gas are described. In a first aspect, A charged particle source includes a resonator. The resonator can include a dielectric substrate defining a first side and a second side, the second side opposite the first side. The resonator can include a first conductive layer disposed on the first side. The first conductive layer can be disposed in accordance with a pattern comprising a ring portion. The pattern can define a gap in the ring portion of the first conductive layer. The resonator can also include a second conductive layer disposed on the second side. The charged particle source can also include a source electrode. The source electrode can be disposed proximal to the first side. The source electrode can be offset from the dielectric substrate.
Embodiments described herein relate to a process for multimodal signal acquisition, such as from a charged particle device or other scientific instrument, based on universal clock synchronization of the various multimodal signals. A system can comprise a memory that stores computer executable components; and a processor that executes the computer executable components stored in the memory, wherein the computer executable components comprise an identifying component that identifies a set of inputs and outputs of a scientific instrument, and a parameterizing component that tracks the inputs and outputs of the set based on a universal clock common to the inputs and outputs of the set.
A charged particle lens for focusing a beam of charged particles towards a sample mounted at a sample position. The charged particle lens comprises a first pole piece, a second pole piece, a lens coil and at least one voltage supply. The second pole piece is electrically insulated from the first pole piece and has a central aperture, wherein the second pole piece is arranged to be aligned with the first pole piece, which also has a central aperture, such that a central axis of the charged particle lens extends through the central aperture of the first pole piece and the second pole piece. The lens coil is arranged to generate a magnetic field at the first and second pole pieces, and the at least one voltage supply is arranged to apply a potential difference between the second pole piece and the sample to generate an electric field.
In an example, a method includes adjusting one or more optical elements such that a deflector plane of a beam deflector is conjugate to a diffraction plane and recording a diffracted beam pattern at the diffraction plane. In another example, a method includes directing a charged particle beam to a specimen. transitioning a beam blanker between blanked and unblanked states, and recording a beam pattern with a detector. The beam pattern includes one or more beam pattern features that are substantially stationary in a detector plane as the beam blanker transitions between the unblanked and blanked state. In another example, a CPM system includes a charged particle source, a beam deflector at a deflector plane, and a detector. The CPM system is configured such that a charged particle beam exhibits a beam crossover at the deflector plane and such that the deflector plane is imaged onto the detector.
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
56.
SUBTRACTIVE DEFECT LOCALIZATION FOR CHARGED-PARTICLE MICROSCOPY
Systems/techniques are provided for facilitating subtractive defect localization for charged-particle microscopy. In various embodiments, a system can access an image captured by a charged-particle microscope, wherein the image depicts a specimen. In various aspects, the system can localize one or more defective instantiations of a structure of interest of the specimen, based on execution of a first machine learning model that is trained to localize non-defective versions of the structure of interest.
G06V 10/26 - Segmentation of patterns in the image fieldCutting or merging of image elements to establish the pattern region, e.g. clustering-based techniquesDetection of occlusion
G06V 10/82 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using neural networks
A grid for sampling liquid specimens includes a mesh having a plurality of grid bars defining a plurality of openings, and a foil coupled to the mesh. The foil includes a plurality of sections, each section aligned with one of the plurality of openings. At least one of the plurality of sections includes a first portion including a plurality of holes, and a second portion surrounding the first portion and positioned between the first portion and the plurality of grid bars. The second portion is solid.
42 - Scientific, technological and industrial services, research and design
Goods & Services
Providing laboratory research services in the field of electron microscopy, namely, grid reparation, data collection, data assessment and scientific support of daily operation of electron microscopy workflows
Embodiments described herein relate to a process for image contour line extraction. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise an identifying component that identifies a contour line applied between regions of a pixelated image, and a subdividing component that subdivides the contour line into a set of barrier lines based on a parsing of contour line pixels of the contour line. In one or more embodiments, the parsing can be based on a quantity of neighbor pixels that are contiguous with the contour line pixels.
G06V 10/46 - Descriptors for shape, contour or point-related descriptors, e.g. scale invariant feature transform [SIFT] or bags of words [BoW]Salient regional features
G06T 5/20 - Image enhancement or restoration using local operators
G06T 11/60 - Editing figures and textCombining figures or text
G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
60.
ABERRATION CORRECTION IN CHARGED PARTICLE SPECTROSCOPY
A method for correcting aberrations in a charged particle spectrometer includes receiving, by the charged particle spectrometer, a charged particle beam along an axis and applying a first decapole field to the charged particle beam by a first optical correction element of the charged particle spectrometer. At least a portion of the first optical correction element is positioned before a line focus of the charged particle beam in a dispersion plane on the axis and a cross-over location on the axis such that the first decapole field partially attenuates a fourth order aberration associated with the charged particle beam. The method includes increasing a dispersion and applying a second decapole field to the charged particle beam by a second optical correction element of the spectrometer such that the second optical correction element is positioned after the cross-over such that the second decapole field further attenuates the fourth order aberration.
A focused ion beam system includes an ion source, an aperture plate having a reference aperture and a shaped aperture, a stigmator, an objective lens, and a controller. The controller directs the ion source to emit ions to form an ion beam; determines, while the ion beam passes through the reference aperture to form a reference beam, a reference stigmator voltage to minimize a dimension of the reference beam; and determines, while the ion beam passes through the shaped aperture to form a shaped working beam and while operating the stigmator using the reference stigmator voltage, a focus value of the objective lens to optimize a size of the shaped working beam. A shape of the shaped working beam is different from a shape of the reference beam and has a first dimension corresponding to the dimension of the reference beam and a second dimension larger than the first dimension.
A method of time-resolved charged particle microscopy comprises the step of providing a sample for charged particle microscopy, wherein said sample comprises a first particle and a second particle, and wherein said sample comprises a barrier material between said first particle and said second particle. The method further comprises the step of liquifying at least a part of the barrier material for enabling an interaction between the first particle and the second particle. Finally, the resulting interaction between the first particle and the second particle can be observed in a charged particle microscope.
The present disclosure describes systems, methods, algorithms, and non-transitory media storing computer-readable instructions for reducing the Boersch effect using dispersive optics, in various embodiments. A charged particle optical device can include a Wien filter disposed on a beam axis. The Wien filter can be configured to disperse particles of a beam of charged particles by energy in a dispersion plane. The dispersion plane can be parallel with the beam axis. The device an include an optical element disposed on the beam axis downstream of the Wien filter. The optical element can be configured to focus the beam of charged particles toward the beam axis. The device can also include a selector. The selector can be disposed on the beam axis at a position substantially corresponding to a third crossover plane downstream of the optical element.
A method for adaptive pixel dwell time usage in a microscope that includes scanning a beam emitted by a beam source over a sample in a scan pattern such that the beam interacts with the sample at a first scanning location according to the scan pattern. In some examples, the method includes monitoring, by at least using a detector of the microscope, a first cumulative number of particles associated with the first scanning location of the sample such that the first cumulative number of particles correspond to an interaction of the beam with the sample at the first scanning location. In some examples, the method includes moving, after a first dwell time and before a first dwell period elapses, the beam to a second scanning location of the sample according to the scan pattern if a signal criterion is met such that the signal criterion is based on the first cumulative number of particles.
A method for constructing an operational-settings prediction model, comprises: (I) setting one or more microscope operational parameters to respective initial values; (II) directing a charged particle beam onto a location of a specimen of a known sample class and imaging or analyzing the location using the most recently set microscope operational parameters while detecting emissions from the specimen; (III) repeatedly: (i) changing a value of at least one of the one or more operational parameters; (ii) directing the charged particle beam onto the location and imaging or analyzing the location using the most recently set microscope operational parameters while detecting emissions from the location; and (iii) recording the values of the microscope operational parameters and recording a value that is a measure of the detected emissions from the location; and (IV) constructing and storing a mathematical relationship, pertaining to the known sample class, between at least one variable that represents a microscope operational parameter and a variable that represents the detected emissions.
A method for constructing an optimal-setting prediction model, comprises: (1) setting one or more microscope operational parameters to respective initial values; (11) directing a charged particle beam onto a specimen of a first known sample type and imaging or analyzing the specimen using the most recently set microscope operational parameters while detecting emissions from the specimen; (III) repeatedly: (i) changing a value of at least one of the one or more operational parameters; (ii) directing the charged particle beam onto a different specimen of the first known sample type and imaging or analyzing the different specimen using the most recently set microscope operational parameters while detecting emissions from the different specimen; and (iii) recording the values of the microscope operational parameters and recording a value that is a measure of the detected emissions from the different specimen; and (IV) constructing and storing a mathematical relationship, pertaining to the first known sample type, between at least one variable that represents a microscope operational parameter and a variable that represents the detected emissions.
G01N 23/223 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
The invention relates to methods for determining a property of a sample before imaging in a charged particle microscope and samples prepared by such methods.
Methods for improving charged particle beam imaging may comprise a forming part, an acquiring part, and a producing part. In the forming part, a focused beam of charged particles may be formed through a spherical aberration (Cs) correction membrane. In the acquiring part, a plurality of first images of a sample on a sample stage may be acquired through a segmented detector, based upon an application of the focused beam of charged particles to the sample. In the producing part, one or more second images may be produced based upon the plurality of first images using an integrated differential phase contrast (iDPC) technique.
Techniques for preparing a sample are described. A method includes directing a beam of ions toward a first surface of a sample for a first exposure of the first surface. The sample can define the first surface and a second surface, opposing the first surface. The method can include rotating the sample through an angle, β, relative to a beam axis, B of the charged particle beam system, to orient the second surface to receive the beam of ions. The method can include directing the beam of ions toward the second surface of the sample. The method can include rotating the sample relative to the beam axis, B, to orient the first surface to receive the beam of ions. The method can also include directing the beam of ions toward the first surface of the sample for a second exposure of the first surface.
A method for correcting aberrations in a charged particle spectrometer includes receiving, by the charged particle spectrometer, a charged particle beam along an axis and applying a first decapole field to the charged particle beam by a first optical correction element of the charged particle spectrometer. At least a portion of the first optical correction element is positioned before a line focus of the charged particle beam in a dispersion plane on the axis and a cross-over location on the axis such that the first decapole field partially attenuates a fourth order aberration associated with the charged particle beam. The method includes increasing a dispersion and applying a second decapole field to the charged particle beam by a second optical correction element of the spectrometer such that the second optical correction element is positioned after the cross-over such that the second decapole field further attenuates the fourth order aberration.
The invention relates to method and system configured for material analysis and mineralogy. At least one image based on first emission from a sample is provided. First spectra of the sample based on second emissions from the second scan locations of the image are provided. A confidence score is calculated for every first spectrum, and second scan location(s) with confidence score(s) below a threshold value are selected. Second emissions from the selected second scan location(s) are acquired to provide new image and determine new second scan locations within the respective new image.
G01N 23/2206 - Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
G01N 23/223 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
G06V 10/143 - Sensing or illuminating at different wavelengths
G06V 10/26 - Segmentation of patterns in the image fieldCutting or merging of image elements to establish the pattern region, e.g. clustering-based techniquesDetection of occlusion
Methods and systems for automatically tuning a charged particle system are disclosed. This includes obtaining an initial image of a probe spot, generating a simulated probe spot to fit to the initial image of the probe spot, estimating a value of an aberration parameter based on the simulated probe spot, and tuning the charged particle system based on the value of the aberration parameter.
A device for preparing samples for use in a cryo-electron microscope. The device comprises a holder for holding a sample carrier, at least one jetting device that is arranged for providing a jet of cryogenic fluid to said sample carrier, and a transfer mechanism that is operably coupled to the holder for bringing the holder to a jetting position. In the jetting position the holder is located near the at least one jetting device for receiving said jet of cryogenic fluid. The device further comprises a plunging reservoir for receiving a volume of cryogenic fluid, wherein the transfer mechanism is additionally arranged for bringing the holder to a plunging position. In the plunging position the holder is positioned at least partly inside an internal volume of said plunging reservoir for bringing the sample carrier in contact with cryogenic fluid.
The present invention relates to a device for use with an electrical component, wherein the device is configured to surround at least a component portion of the electrical component at least partially around the axis thereby defining a region therebetween. The device comprises two members, wherein at least one of the members comprises at least one varying property that varies along an axis.
A method including performing, with a charged particle system having a first milling setting, a first milling operation on a sample at a first time, generating a first image of the sample based on the first milling operation, determining, based on the first image, a first set of tracking features of the sample, performing, with the charged particle system having the first milling setting, a second milling operation on the sample at a second time, generating a second image of the sample based on the second milling operation, determining, based on the second image, a first change to the first set of tracking features, and adjusting the first milling setting to a second milling setting based on the first change.
A charged particle beam system includes a source of charged particles and a charged particle beam column to focus the charged particles into a charged particle beam having a landing energy. A magnetic lens is formed in the charged particle beam column along an axis based on a magnetic lens excitation in the coils. The magnetic lens focuses the charged particle beam at a first crossover on the axis. An electrostatic lens is formed in the charged particle beam column along the axis based on a voltage applied to the booster tube. The electrostatic lens focuses the charged particle beam at a second crossover on the axis. The first crossover is based on the magnetic lens excitation. The introduction of an extra crossover overcomes previous limitations of the maximum working distance at very small landing energies and maximum field of view.
Disclosed herein are apparatuses, systems, methods, and computer-readable media relating to area selection in charged particle microscope (CPM) imaging. For example, in some embodiments, a CPM support apparatus may include: first logic to generate a first data set associated with an area of a specimen by processing data from a first imaging round of the area by a CPM; second logic to generate predicted parameters of the area; and third logic to determine whether a second imaging round of the area is to be performed by the CPM based on the predicted parameters of the area; wherein the first logic is to, in response to a determination by the third logic that a second imaging round of the area is to be performed, generate a second data set, including measured parameters, associated with the area by processing data from a second imaging round of the area by the CPM.
G06T 7/73 - Determining position or orientation of objects or cameras using feature-based methods
G06V 10/22 - Image preprocessing by selection of a specific region containing or referencing a patternLocating or processing of specific regions to guide the detection or recognition
G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
H01J 37/22 - Optical or photographic arrangements associated with the tube
H01J 37/26 - Electron or ion microscopesElectron- or ion-diffraction tubes
Methods and apparatus are disclosed for classifying regions of a substrate prior to performing an analytic procedure involving analyte particles supported on the substrate. Regions of the substrate are sparsely scanned using low-energy electron point projection (LEEPP) imaging. Regions are classified as suitable for the analytic procedure (or not) based on defects visible in the respective images. Given one suitable region, neighboring regions are scanned to increase the yield of suitable regions. Based on a distribution of suitable regions, a deposition pattern is planned, and analyte is deposited according to the plan. Following deposition, suitable regions are scanned again to identify or count visible analyte molecules visible. Based on numbers of analyte molecules found, regions are earmarked for analyte characterization, e.g. by low-energy electron holography and reconstruction. A trained machine learning classifier provides consistent, accurate image classification across a range of defect types.
Embodiments herein relate to a process for electron holography image aberration reduction. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a propagating component that reduces hologram aberration of an electron hologram (EH) image by modifying of a pair of sequenced parameters of an array upon which the EH image is constructed, resulting in a modified array, and a generating component that generates a propagated EH image using a propagator comprising the modified array.
G03H 5/00 - Holographic processes or apparatus using particles or using waves other than those covered by groups or for obtaining hologramsProcesses or apparatus for obtaining an optical image from them
81.
MAGNETIC SHIELDING OF THE PHOTOMULTIPLIER IN THE MAGNETIC IMMERSION FIELD
Charged-particle detectors using scintillators are situated in a vacuum chamber and include a photomultiplier tube (PMT) that is situated at or near a pole piece of a magnetic objective lens. To maintain satisfactory PMT operation, the PMT is situated within a PMT shield constructed of a high saturation value magnetic material. With the disclosed shields, PMT operation in strong magnetic fields is satisfactory, even for magnetic field magnitudes of at least 0.5 T.
Methods include producing a charged particle beam with a charged particle beam source and directing the charged particle beam along a beam axis of a charged particle beam column to a target, directing the charged particle beam through an elongated aperture that is situated by an offset with respect to the beam axis, and focusing the beam to the target to produce an asymmetric intensity cross-section for the beam, wherein the cross-section has a sharp intensity edge at the target based on the offset elongated aperture.
H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
83.
CHARGING ARTIFACT MITIGATION VIA SCANNING DIRECTION ROTATION
Systems/techniques are provided for facilitating charging artifact mitigation via scanning direction rotation. In various embodiments, a system can access a charged-particle microscope that is loaded with a specimen. In various aspects, the system can generate an aggregated image of the specimen, based on a plurality of images of the specimen that are captured by the charged-particle microscope according to a target scanning direction and a plurality of rotated scanning directions. In some instances, the plurality of rotated scanning directions and the target scanning direction can be uniformly distributed within a 360-degree range. In various cases, the specimen can charge non-homogeneously during scanning, each of the plurality of images can exhibit respective charging artifacts, and the aggregated image can exhibit no or reduced charging artifacts.
Methods of aligning specimen images of specimen sections situated on a substrate include obtaining an optical or SEM image of the substrate and locating and aligning optical or SEM images of each specimen section. The specimen sections are then imaged with an SEM to obtain preview images, and a region of interest (ROI) in at least one of the preview images is selected. The preview images are processed so that at least portions of the preview images proximate the ROI are aligned. Based on the alignment of the preview images, final SEM image of selected specimen sections are obtained so that a set of images aligned in three dimensions is available. Image alignment can use cross-correlation with a fixed or variable reference that can be updated as specimen section images are processed.
Scanning transmission electron microscope, STEM, having a sample plane, the STEM comprising a primary electron beam source arranged to provide a primary electron beam to a sample located at the sample plane of the STEM. A STEM detector, wherein the sample plane is located between the primary electron beam source and the STEM detector. A first secondary electron, SE, detector located between the primary electron beam source and the sample plane of the STEM. A second SE detector located between the sample plane and the STEM detector. Signal acquisition circuitry configured to acquire simultaneously a first signal from the first SE detector, a second signal from the second SE detector, and a third signal from the STEM detector. There is also a method for generating an image from the STEM.
G01N 23/00 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
87.
TEMPORAL CHARACTERIZATION OF OSCILLATOR SIGNALS IN CHARGED PARTICLE MICROSCOPY
G01J 11/00 - Measuring the characteristics of individual optical pulses or of optical pulse trains
G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
G01T 1/36 - Measuring spectral distribution of X-rays or of nuclear radiation
88.
SCANNING ELECTRON MICROSPCOPE FOR CAPTURING DIFFRACTION PATTERNS
An electron microscope is disclosed and comprises an electron beam source for producing an electron beam, a vacuum chamber and a sample holder disposed in the vacuum chamber to hold a sample intersecting the electron beam. An image detector is disposed in the vacuum chamber to capture a diffraction pattern formed by electrons received from a sample held in the sample holder and produce image data comprising the captured diffraction pattern. A computing device is disposed in the vacuum chamber, connected to the image detector and configured to process the image data to produce compacted data from the image data. The compacted data requires less storage or bandwidth than the image data. A data connection connects the computing device to a data transmission, storage or further computing device outside the vacuum chamber to make the compacted data available outside the vacuum chamber. A method of operating the electron microscope is also disclosed.
37 - Construction and mining; installation and repair services
Goods & Services
Advisory services relating to the installation of scientific and laboratory equipment being microscopes, namely, preparing, assessing, and optimizing laboratory and research environments for equipment installation; conducting site inspections for installation purposes, namely, inspection services in the course of construction of laboratories and the installation of scientific and laboratory equipment; turnkey installation services relating to the installation of scientific and laboratory equipment, namely, preparing installation sites, performing equipment infrastructure setup, installing and calibrating laboratory and imaging equipment being microscopes, and delivering fully operational systems ready for use
42 - Scientific, technological and industrial services, research and design
Goods & Services
Software as a service (SaaS) featuring software for operating, monitoring, and managing electron microscopy systems, for enabling remote operation and control of microscopes, for monitoring microscopy system performance, environmental conditions, and equipment utilization, for enhancing image resolution and data quality, and for providing analytics, diagnostics, and reporting on microscopy system health and productivity
The charged beam particle system including a first electron detector, a second electron detector, and a first scanning deflector positioned between the first electron detector and the second electron detector, where the first scanning deflector includes a deflector interior surface including a frustoconical shape.
Apparatus and methods are disclosed for a mechanically stable, long-life junction between hexaboride-containing and tantalum-containing components. Examples are used as a cold field emitter assembly which is compatible with ultra-high vacuum and occasional high-temperature flashing. A metal adapter is welded to a hexaboride electrode. Some embodiments use a tantalum adapter and a LaB6 microrod electrode with a nanorod emitter tip. Other material combinations are disclosed, as also usage in electron sources for electron microscopes. In variations, the adapter is deposited onto a filament and the electrode then welded to the adapter.
In one example, a method performed via a computing device for providing support to a charged particle beam system includes computing a drift estimate based at least in part on a first set of image frames acquired with a charged particle beam column and a detector from a first portion of a sample. The method also includes configuring the charged particle beam column and the detector to acquire a second set of image frames from a second portion of the sample. The method further includes performing drift compensation during acquisition of the second set of image frames based at least in part on the drift estimate.
Systems/techniques are provided for facilitating large language model assistance for charged-particle microscope operation. In various embodiments, a system can access a natural language instruction associated with a charged-particle microscope, where the natural language instruction can request that the charged-particle microscope undergo a configurable settings adjustment or perform an automated task. In various aspects, the system can cause, in response to the natural language instruction, the charged-particle microscope to capture, according to a default microscopy protocol, an image or an energy spectrum of a specimen that is currently loaded on a stage of the charged-particle microscope. In various instances, the system can execute a large language model on both the natural language instruction and the image or energy spectrum of the specimen, thereby yielding a natural language response that indicates how implementing the natural language instruction would affect the specimen.
G06F 40/274 - Converting codes to wordsGuess-ahead of partial word inputs
G10L 13/08 - Text analysis or generation of parameters for speech synthesis out of text, e.g. grapheme to phoneme translation, prosody generation or stress or intonation determination
H01J 37/26 - Electron or ion microscopesElectron- or ion-diffraction tubes
A method for mixed signal synchronization for a charged particle column includes generating an optical pulse signal from a light source that emits a light beam pulse towards a sample within the charged particle column, generating a radio frequency (RF) signal associated with a RF cavity that pulses a charged particle beam towards the sample, generating a composite signal using at least the RF signal and the optical pulse signal, and controlling, based at least in part on the composite signal, at least one of i) the light source or ii) RF signals for the RF cavity such that light beam pulses and charged particle beam pulses are synchronized at the sample.
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
96.
TEMPORAL CHARACTERIZATION OF OSCILLATOR SIGNALS IN CHARGED PARTICLE MICROSCOPY
A method for characterization of a light beam within a charged particle column, the method comprising: directing a light beam pulse towards a sample within the charged particle column; directing a charged particle beam pulse towards the sample; detecting charged particles that, based at least in part on the light beam pulse and the charged particle beam pulse, interacted with the sample; determining a time delay between the charged particle beam pulse and the light beam pulse based at least in part on the charged particles; and determining at least one characteristic of the light beam pulse based at least in part on the time delay.
Embodiments of the present disclosure improve the performance of charged particle beam systems during imaging and/or microanalysis, at least in part by permitting a system and/or user to account for the influence of electromagnetic interference on beam direction and/or shape. Techniques are described for identifying, tracking, and/or correcting electromagnetic interference-induced beam drifts, as well as techniques for localizing defects in integrated circuit devices.
Embodiments of the present disclosure improve the performance of charged particle beam systems during imaging and/or microanalysis, at least in part by permitting a system and/or user to account for the influence of electromagnetic interference on beam direction and/or shape. Techniques are described for identifying, tracking, and/or correcting electromagnetic interference-induced beam drifts, as well as techniques for localizing defects in integrated circuit devices.
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
A method for aligning a pulsed laser beam in microscopy may include directing a first pulsed photon beam toward a target, directing a charged particle beam towards the target, determining a diffraction pattern resulting from an interaction of the charged particle beam with the target, directing a second pulsed photon beam towards the target, and determining a deviation of the diffraction pattern based at least in part on the second pulsed photon beam. In some embodiments, the method may include controlling, based at least in part on the deviation, a direction of pulsed photon emission by a light source, directing a third pulsed photon beam toward the target, generating detector data based at least in part on charged particles that result from a second interaction with the target and the third pulsed photon beam, and determining a position of the third pulsed photon beam, relative to the charged particle beam using the detector data.
H01J 37/244 - DetectorsAssociated components or circuits therefor
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
A method for mixed signal synchronization for a charged particle column includes generating an optical pulse signal from a light source that emits a light beam pulse towards a sample within the charged particle column, generating a radio frequency (RF) signal associated 5 with a RF cavity that pulses a charged particle beam towards the sample, generating a composite signal using at least the RF signal and the optical pulse signal, and controlling, based at least in part on the composite signal, at least one of i) the light source or ii) RF signals for the RF cavity such that light beam pulses and charged particle beam pulses are synchronized at the sample.
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H01J 37/22 - Optical or photographic arrangements associated with the tube
