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Found results for
 patents
1.
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ION BEAM IMAGING
| Application Number |
US2008085212 |
| Publication Number |
2009/079195 |
| Status |
In Force |
| Filing Date |
2008-12-02 |
| Publication Date |
2009-06-25 |
| Owner |
ALIS CORPORATION (USA)
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| Inventor |
- Notte, John A., Iv
- Carousso, Stephen
- Ward, Billy W.
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Abstract
Disclosed are methods that include forming an image based on counting a number of detected pulses of secondary electrons (6030,6060) from a sample, the secondary electrons being produced by exposing the sample to an ion beam from a gas ion source, and each detected pulse exceeding a minimum pulse value (6080).
IPC Classes ?
- H01J 37/244 - DetectorsAssociated components or circuits therefor
- H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
- G01N 23/22 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material
- G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
- H01J 37/22 - Optical or photographic arrangements associated with the tube
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2.
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Ion sources, systems and methods
| Application Number |
11600873 |
| Grant Number |
07786452 |
| Status |
In Force |
| Filing Date |
2006-11-15 |
| First Publication Date |
2009-05-07 |
| Grant Date |
2010-08-31 |
| Owner |
ALIS Corporation (USA)
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| Inventor |
- Ward, Billy W.
- Notte, Iv, John A.
- Farkas, Iii, Louis S.
- Percival, Randall G.
- Hill, Raymond
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Abstract
Ion sources, systems and methods are disclosed.
IPC Classes ?
- H01J 49/10 - Ion sourcesIon guns
- H01J 27/02 - Ion sourcesIon guns
- H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
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3.
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DETERMINING DOPANT INFORMATION BY USE OF A HELIUM ION MICROSCOPE
| Application Number |
US2008074143 |
| Publication Number |
2009/035841 |
| Status |
In Force |
| Filing Date |
2008-08-25 |
| Publication Date |
2009-03-19 |
| Owner |
ALIS CORPORATION (USA)
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| Inventor |
Notte Iv, John A.
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Abstract
A helium ion microscope is used for determining dopant information of a sample. Such information embraces the dopant concentration and dopant location. Concerning the dopant location it is possible to determine lateral dimensions of specific areas as well as depth profiles with the disclosed method. The helium ion microscope is adapted to detect in an energy- and angle resolved manner different types of particles, such as scattered heliums ions, secondary electrons, scattered helium atoms. Furthermore, the energy of the incident helium ion beam and its incident angle with respect to the surface are varied.
IPC Classes ?
- G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
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