ALIS Corporation

United States of America

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H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources 22
H01J 27/02 - Ion sourcesIon guns 13
H01J 49/10 - Ion sourcesIon guns 13
G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes 11
B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices 9
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Found results for  patents

1.

Ion sources, systems and methods

      
Application Number 12364259
Grant Number 08110814
Status In Force
Filing Date 2009-02-02
First Publication Date 2009-07-16
Grant Date 2012-02-07
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond
  • Edinger, Klaus
  • Markwort, Lars
  • Aderhold, Dirk
  • Mantz, Ulrich

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 27/02 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 49/10 - Ion sourcesIon guns

2.

ION BEAM IMAGING

      
Application Number US2008085212
Publication Number 2009/079195
Status In Force
Filing Date 2008-12-02
Publication Date 2009-06-25
Owner ALIS CORPORATION (USA)
Inventor
  • Notte, John A., Iv
  • Carousso, Stephen
  • Ward, Billy W.

Abstract

Disclosed are methods that include forming an image based on counting a number of detected pulses of secondary electrons (6030,6060) from a sample, the secondary electrons being produced by exposing the sample to an ion beam from a gas ion source, and each detected pulse exceeding a minimum pulse value (6080).

IPC Classes  ?

  • H01J 37/244 - DetectorsAssociated components or circuits therefor
  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
  • G01N 23/22 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • H01J 37/22 - Optical or photographic arrangements associated with the tube

3.

Ion sources, systems and methods

      
Application Number 11600873
Grant Number 07786452
Status In Force
Filing Date 2006-11-15
First Publication Date 2009-05-07
Grant Date 2010-08-31
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/02 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

4.

DETERMINING DOPANT INFORMATION BY USE OF A HELIUM ION MICROSCOPE

      
Application Number US2008074143
Publication Number 2009/035841
Status In Force
Filing Date 2008-08-25
Publication Date 2009-03-19
Owner ALIS CORPORATION (USA)
Inventor Notte Iv, John A.

Abstract

A helium ion microscope is used for determining dopant information of a sample. Such information embraces the dopant concentration and dopant location. Concerning the dopant location it is possible to determine lateral dimensions of specific areas as well as depth profiles with the disclosed method. The helium ion microscope is adapted to detect in an energy- and angle resolved manner different types of particles, such as scattered heliums ions, secondary electrons, scattered helium atoms. Furthermore, the energy of the incident helium ion beam and its incident angle with respect to the surface are varied.

IPC Classes  ?

  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes

5.

Ion sources, systems and methods

      
Application Number 11599879
Grant Number 07554096
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-09-27
Grant Date 2009-06-30
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

6.

SYSTEMS AND METHODS FOR A HELIUM ION PUMP

      
Application Number US2007064398
Publication Number 2007/109666
Status In Force
Filing Date 2007-03-20
Publication Date 2007-09-27
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy, W.
  • Notte Iv, John, A.

Abstract

Ion pump systems and methods are disclosed.

IPC Classes  ?

  • H01J 41/12 - Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps

7.

Systems and methods for a gas field ion microscope

      
Application Number 11385215
Grant Number 07601953
Status In Force
Filing Date 2006-03-20
First Publication Date 2007-09-20
Grant Date 2009-10-13
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Farkas, Iii, Louis S.
  • Notte, Iv, John A.
  • Percival, Randall G.

Abstract

In one aspect the invention provides a gas field ion microscope that includes an ion source in connection with an optical column, such that an ion beam generated at the ion source travels through the optical column and impinges on a sample. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the invention provides methods for using the ion microscope to analyze samples and enhancing the performance of a gas field ion source.

IPC Classes  ?

  • H01J 37/26 - Electron or ion microscopesElectron- or ion-diffraction tubes

8.

Ion sources, systems and methods

      
Application Number 11600861
Grant Number 07557360
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-09-13
Grant Date 2009-07-07
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond
  • Markwort, Lars
  • Aderhold, Dirk

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

9.

Ion sources, systems and methods

      
Application Number 11600874
Grant Number 07557361
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-09-13
Grant Date 2009-07-07
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

10.

Ion sources, systems and methods

      
Application Number 11599935
Grant Number 07521693
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-09-06
Grant Date 2009-04-21
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond
  • Mcvey, Shawn
  • Bihr, Johannes

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

11.

Ion sources, systems and methods

      
Application Number 11600361
Grant Number 07485873
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-08-23
Grant Date 2009-02-03
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond
  • Edinger, Klaus
  • Markwort, Lars
  • Aderhold, Dirk
  • Mantz, Ulrich

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 27/02 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 49/10 - Ion sourcesIon guns

12.

Ion sources, systems and methods

      
Application Number 11600646
Grant Number 07518122
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-08-16
Grant Date 2009-04-14
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond
  • Mantz, Ulrich
  • Steigerwald, Michael

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

13.

Ion sources, systems and methods

      
Application Number 11599915
Grant Number 07554097
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-07-12
Grant Date 2009-06-30
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/02 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

14.

Ion sources, systems and methods

      
Application Number 11600515
Grant Number 07495232
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-07-12
Grant Date 2009-02-24
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

15.

Ion sources, systems and methods

      
Application Number 11600711
Grant Number 07557359
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-07-12
Grant Date 2009-07-07
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

16.

Ion sources, systems and methods

      
Application Number 11599954
Grant Number 07557358
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-07-12
Grant Date 2009-07-07
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

17.

Ion sources, systems and methods

      
Application Number 11600513
Grant Number 07511280
Status In Force
Filing Date 2006-11-15
First Publication Date 2007-07-12
Grant Date 2009-03-31
Owner ALIS Corporation (USA)
Inventor
  • Ward, Billy W.
  • Notte, Iv, John A.
  • Farkas, Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 49/10 - Ion sourcesIon guns
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 27/02 - Ion sourcesIon guns

18.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006043621
Publication Number 2007/067296
Status In Force
Filing Date 2006-11-08
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy W.
  • Notte, John A. Iv
  • Mcvey, Shawn
  • Farkas, Louis S. Iii
  • Percival, Randall G.
  • Groholski, Alexander
  • Comunale, Richard

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams

19.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044338
Publication Number 2007/067310
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy, W.
  • Notte, John, A., Iv
  • Farkas Iii, Louis, S.
  • Percival, Randall, G.
  • Hill, Raymond
  • Groholski, Alexander
  • Comunale, Richard

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

20.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044388
Publication Number 2007/067313
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy, W.
  • Notte Iv, John A.
  • Farkas Iii, Louis, S.
  • Percival, Randall G.
  • Hill, Raymond
  • Mantz, Ulrich
  • Steigerwald, Michael

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

21.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044389
Publication Number 2007/067314
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy, W.
  • Notte Iv, John, A.
  • Farkas Iii, Louis, S.
  • Percival, Randall, G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

22.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044440
Publication Number 2007/067316
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy W.
  • Notte Iv, John A.
  • Farkas Iii, Louis S.
  • Percival, Randall G.
  • Hill, Raymond
  • Markwort, Lars
  • Aderhold, Dirk

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

23.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044339
Publication Number 2007/067311
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy W.
  • Notte, John A., Iv
  • Farkas Iii, Louis, S.
  • Percival, Randall G.
  • Hill, Raymond
  • Edinger, Klaus
  • Markwort, Lars
  • Aderhold, Dirk
  • Mantz, Ulrich

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

24.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044439
Publication Number 2007/067315
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy W.
  • Notte Iv, John A.
  • Farkas Iii, Louis, S.
  • Percival, Randall G.
  • Hill, Raymond
  • Groholski, Alexander
  • Comunale, Richard
  • Mcvey, Shawn
  • Bihr, Johannes

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

25.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044441
Publication Number 2007/067317
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy, W.
  • Notte Iv, John, A.
  • Farkas, Louis, S., Iii
  • Percival, Randall, G.
  • Hill, Raymond
  • Markwort, Lars
  • Aderhold, Dirk

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

26.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044442
Publication Number 2007/067318
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy W.
  • Notte Iv, John A.
  • Farkas Iii, Louis, S.
  • Percival, Randall G.
  • Hill, Raymond
  • Groholski, Alexander
  • Comunale, Richard

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 37/26 - Electron or ion microscopesElectron- or ion-diffraction tubes
  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
  • H01J 37/20 - Means for supporting or positioning the object or the materialMeans for adjusting diaphragms or lenses associated with the support
  • B25J 7/00 - Micromanipulators

27.

ION SOURCES, SYSTEMS AND METHODS

      
Application Number US2006044729
Publication Number 2007/067328
Status In Force
Filing Date 2006-11-15
Publication Date 2007-06-14
Owner ALIS CORPORATION (USA)
Inventor
  • Ward, Billy W.
  • Notte, John, A., Iv
  • Farkas Iii, Louis, S.
  • Percival, Randall G.
  • Hill, Raymond

Abstract

Ion sources, systems and methods are disclosed.

IPC Classes  ?

  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
  • H01J 9/02 - Manufacture of electrodes or electrode systems
  • H01J 37/08 - Ion sourcesIon guns
  • H01J 37/252 - Tubes for spot-analysing by electron or ion beamsMicroanalysers
  • H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
  • B81B 1/00 - Devices without movable or flexible elements, e.g. microcapillary devices
  • G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
  • G12B 21/02 -
  • H01J 27/26 - Ion sourcesIon guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources