To utilize an existing sample stage as it is and increase the efficiency of sample transport, the present disclosure provides a charged particle beam system including: a sample exchange chamber for exchanging a sample transported to an observation chamber; and a computer configured to control transport of the sample from the sample exchange chamber to the observation chamber, in which the sample exchange chamber includes a multi-sample table that includes an extrusion mechanism for extruding a sample and on which a plurality of samples are placeable, and a transport mechanism configured to move the multi-sample table between the sample exchange chamber and the observation chamber, and the computer executes a process of controlling the transport mechanism to transport the multi-sample table into the observation chamber, a process of controlling the extrusion mechanism to place one sample on a sample placement portion of the observation chamber from the multi-sample table transported to the observation chamber, and a process of controlling the transport mechanism to retract the multi-sample table from the observation chamber to the sample exchange chamber after placing the one sample on the sample placement portion (refer to FIG. 2).
Provided is a deflector including an electron conversion electrode 141 provided to collide with a secondary electron emitted from a specimen due to emission of a primary electron beam, a first electrode 142 and a second electrode 143 facing each other and allowing transmission of an electron therethrough, and a third electrode 144 facing the first electrode with the second electrode interposed therebetween, the electron conversion electrode is segmented into a plurality of segmented electrodes, and a potential of the third electrode has a positive potential difference relative to a potential of the second electrode.
Provided are a container storage device, an analysis system, and a container transfer method. The container storage device can store QC specimen containers stably for a long period of time by cooling the QC specimen containers and increase the number of sample containers capable of being stored in a storage chamber, and is reduced in size by reducing the size particularly in a width direction. The container storage device includes: a housing which has a first side surface and a pair of second side surfaces respectively extending from both ends of the first side surface; a first conveyance path which is formed along the first side surface and through which a plurality of containers containing liquid are conveyable; a cylindrical storage chamber surrounded by the first conveyance path and the pair of second side surfaces and configured to store the plurality of containers; and a second conveyance path through which the containers are conveyable between a first reception position on the first conveyance path and a second reception position in the storage chamber. A straight line connecting the first reception position and the second reception position in a plan view is formed obliquely to the first conveyance path.
An object of the present invention is to provide an electrophoresis device that suppresses the degradation of analytical performance and ensures high freedom in selecting laser devices. To do this, the present invention provides an electrophoresis device that irradiates a laser light from both ends of a capillary array composed of a plurality of capillaries lined up and detects the light from a plurality of capillaries.
An object of the present invention is to provide an electrophoresis device that suppresses the degradation of analytical performance and ensures high freedom in selecting laser devices. To do this, the present invention provides an electrophoresis device that irradiates a laser light from both ends of a capillary array composed of a plurality of capillaries lined up and detects the light from a plurality of capillaries.
An optical isolator is provided on an optical path from a light source of the laser light to the capillary array. It is possible to suppress reflected return light without irradiating the laser slantwise to the capillary axis and provide an electrophoresis device with high analytical performance. Transmitted and reflected return light can be reliably suppressed, allowing greater freedom in selecting laser devices.
A charged particle beam device 10 capable of preventing etching in a plasma generation chamber 18, preventing heat generation of an electrostatic shield 4 formed inside the plasma generation chamber 18, and obtaining a stable charged particle beam is implemented. The charged particle beam device 10 includes: a cylindrical dielectric body 14 forming the plasma generation chamber 18 therein; a cylindrical outer shield 3 disposed to surround an outer surface of the cylindrical dielectric body 14; the inner shield 4 disposed inside the plasma generation chamber 18 and facing the outer shield 3 via the dielectric body 14; a coil 2 disposed on an outer periphery of the outer shield 3 and configured to generate a radio frequency to generate plasma in the plasma generation chamber 18; an envelope 9 surrounding the coil 2, the outer shield 3, and the dielectric body 14; an aperture electrode 7 in which a hole 6 for extracting ions from the plasma generation chamber 18 is formed; and an extraction electrode 8 to which a voltage for extracting ions from the plasma generation chamber 18 is applied. A plurality of slits are formed in each of the outer shield 3 and the inner shield 4.
To provide a technique capable of measuring an overlay deviation amount or the like with high accuracy. In a measurement system, a processor acquires an image (309) of a structure of a semiconductor device captured by a microscope, acquires a measurement area cursor generation rule (308) related to the structure, generates a measurement area cursor to be disposed with respect to the structure based on the image and the measurement area cursor generation rule, disposes the measurement area cursor with respect to the structure in the image, and performs measurement related to the structure using a portion of an image (313) in the measurement area cursor.
G01N 23/2206 - Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
7.
Automatic Analysis Device and Method for Allocating Analysis Tank
This automatic analysis device calculates, for each of a plurality of analysis tanks 106, a target number of uses of the analysis tank per predetermined period of time on the basis of the number of remaining executable measurements of an ion selective electrode 112 and a remaining period of time up to an expiration date thereof, and when there are a plurality of analysis tanks usable for an analysis request, determines a ratio of usage for each analysis tank on the basis of a ratio of the target number of uses of each of the plurality of analysis tanks usable for the analysis request. This allows as many of the number of remaining executable measurements as possible to be used in the automatic analysis device comprising the plurality of analysis tanks before the expiration date of the ion selective electrode.
The information processing system includes an operation target device; a detection apparatus including a camera to capture an image of the device; a control apparatus having a storage circuitry to store a task program prescribing operations of the operation target device, which contains parameters of a velocity, a trajectory and a position when the device moves, and a controller circuitry to operate the device, based on the task program; and a terminal apparatus having an displayer circuitry to display the image captured by the camera, and an input circuitry to accept a user input. The controller circuitry issues an instruction to stop the device operation based on the task program in accordance with the user input to the input circuitry when the device is operated based on the task program, and correcting the device operation prescribed by the task program.
G06F 3/0488 - Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser using a touch-screen or digitiser, e.g. input of commands through traced gestures
9.
PART MANAGEMENT SYSTEM, AUTOMATIC ANALYZER, AND PART MANAGEMENT METHOD
A part management system displays information about the part management system. For each of a plurality of analysis devices, an ID of the corresponding analysis device and state information indicating a state of the analysis device are stored in association with each other. An input unit receives a replacement request for the analysis device. A part management apparatus control unit that, when the input unit receives a replacement request for the analysis device, causes a display unit to display the ID of the analysis device whose state information satisfies a predetermined requirement and first state information about a position where the analysis device is used. Accordingly, provided are a part management system, an automatic analyzer, and a part management method capable of supporting the specification of a part to be removed even when parts of the same type are used in a plurality of uses or positions.
To improve the performance of an electron microscope. As a section for improving the performance of an electron microscope, an electron microscope is used that includes: a sample stage; a first cold finger arranged on an upstream side of an optical axis with respect to the sample stage; a second cold finger arranged on a downstream side of the optical axis with respect to the first cold finger with the sample stage interposed therebetween; and a movable mechanism configured to move the first cold finger and the second cold finger in an insertion and removal direction with respect to the optical axis. Here, the movable mechanism is configured to change a solid angle at which a sample placement portion of the sample stage is covered by one or both of the first cold finger and the second cold finger.
A distance measurement system evaluates whether a frequency sweep state of a light source is normal and includes: a light source that outputs FM light; a measurement optical system that splits one beam of the FM light into two beams, one beam of which is then split into two beams and outputs a measurement beat signal; and a reference optical system that splits the other beam of the two beams of FM light into two beams and outputs a reference beat signal. A calculation device performs processing on the measurement beat signal and the reference beat signal to calculate a distance to a measurement object based on the measurement beat signal. A beat signal processing unit processes the reference beat signal to generate a desired signal, and a determination of an abnormality of the light source is made by comparing the desired signal with a reference value.
G01S 17/34 - Systems determining position data of a target for measuring distance only using transmission of continuous waves, whether amplitude-, frequency-, or phase-modulated, or unmodulated using transmission of continuous, frequency-modulated waves while heterodyning the received signal, or a signal derived therefrom, with a locally-generated signal related to the contemporaneously transmitted signal
G01S 17/36 - Systems determining position data of a target for measuring distance only using transmission of continuous waves, whether amplitude-, frequency-, or phase-modulated, or unmodulated with phase comparison between the received signal and the contemporaneously transmitted signal
In order to provide an automatic analysis system with which it is possible to select an alarm notification at a prescribed time and select notification content for each user, the present invention has: an automatic analysis device for analyzing a patient sample; a storage unit for storing data pertaining to consumables of the automatic analysis device; a control unit for performing alarm control of the automatic analysis device and controlling data input/output processes into/from the storage unit; a display unit that issues a notification of an alarm upon receiving processing from the control unit; and an alarm setting unit that is capable of setting, for each user, an alarm notification timing.
Provided is an automatic analysis device comprising: a first object to be dried; a second object to be dried having a smaller diameter than the first object to be dried; a vacuum tank connected to a vacuum pump; and a drying tank for drying the first object to be dried and the second object to be dried. The drying tank has a tubular part into which the first object to be dried or the second object to be dried is inserted during drying. The tubular part has one end opened as a drying port for receiving the first object to be dried or the second object to be dried, and the other end connected to the vacuum tank. The inner diameter of a first region positioned on the side of the tubular part closer to the drying port is set to a first diameter corresponding to the diameter of the first object to be dried, and the inner diameter of a second region positioned on the side of the tubular part closer to the vacuum tank than the first region is set to a second diameter smaller than the first diameter in accordance with the diameter of the second object to be dried.
Provided is an automatic analysis device comprising: an ultrasonic transducer for outputting ultrasonic waves for stirring a liquid to be stirred; a drive circuit having a signal oscillator for outputting an electrical signal at an arbitrary drive frequency and an amplifier circuit for applying a voltage of electric power obtained by amplifying the electrical signal to the ultrasonic transducer; and a control device for performing ON/OFF control of the drive circuit. The control device sweeps the drive frequency of the electrical signal over a set frequency band including the resonance frequency of the ultrasonic transducer during each ON period of the ON/OFF control and controls the signal oscillator so that the amplitude of the electrical signal that is input to the amplifier circuit varies according to a change in the drive frequency being swept.
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
G01N 1/38 - Diluting, dispersing or mixing samples
15.
CHARGED PARTICLE BEAM APPARATUS AND USE METHOD FOR CHARGED PARTICLE BEAM APPARATUS
This charged particle beam apparatus is provided with: a sample observation device that is provided with a charged particle source which emits a charged particle beam, an electromagnetic lens which adjusts the charged particle beam, a sample table which holds a sample to be irradiated with the charged particle beam, a sample stage on which the sample table is mounted, and a detector which detects a signal of the charged particle beam; a sample exchange device that is separated from the sample observation device via a vacuum opening/closing part and that conveys the sample table to the sample stage; and a controller that has a stage control unit which is configured to control the sample stage, a column control unit which is configured to control the operations of the charged particle source, the electromagnetic lens, and the detector and which has an observation image generator for generating an observation image on the basis of the signal detected by the detector, and a sample exchange device control unit which is configured to control the sample exchange device. The sample exchange device is provided with a height measuring instrument that measures the height of a sample from directly above.
Provided is an automated analysis device wherein a liquid container can be attached/detached with a single touch at the time of replacement, and the work efficiency of container replacement is improved due to a small joint. The present invention has a connection component for flow passages that fluidically connect from a liquid container to an automated analysis device. The connection component comprises a first connection section that can fluidically connect to a flow passage, said flow passage being connected to the automated analysis device at one end and said first connection section being connected to the other end said flow passage, and a second connection section that is removably connected to the first connection section at one end and can fluidically connect to the liquid container at the other end. The first connection section has a protruding section that has a first flow passage in which the liquid flows formed therein. The second connection section has a recessed section that is formed on the side facing the first connection section, has a second flow passage capable of connecting to the first flow passage formed therein, the liquid flowing between the first flow passage and the second flow passage, and can connect to the protruding section by surface contact, a sealing member that is provided in the recessed section and is provided on a recessed section bottom surface that comes into surface contact with a tip end of the protruding section, and an engagement member that comes into contact with the protruding section and applies a force thereto in order to maintain the connection of the protruding section and the recessed section.
G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
F16L 37/22 - Couplings of the quick-acting type in which the connection is maintained by means of balls, rollers, or helical springs under radial pressure between the parts
F16L 37/086 - Couplings of the quick-acting type in which the connection between abutting or axially-overlapping ends is maintained by locking members combined with automatic locking by means of latching members pushed radially by spring-like elements
Depth information of a multilayer structure is acquired quickly and with high accuracy. An analysis system includes (a) acquiring a first captured image of a sample SAM viewed from a first direction by irradiating the sample SAM including a multilayer structure with an electron beam EB1 from the first direction, (b) acquiring a second captured image of the sample SAM viewed from a second direction by irradiating the sample SAM with the electron beam EB1 from the second direction, in which the second direction intersects the first direction, (c) acquiring depth information of the multilayer structure using information of the sample SAM including the first captured image, the second captured image, a number of layers of the multilayer structure, a thickness of one layer or a thickness of each layer of the multilayer structure, and a depth at which a first layer of the multilayer structure starts.
An evaluation system of an operation including a plurality of steps on an object having a surface for which a predetermined level of cleanliness is required, in which the evaluation includes calculating a total sum of a sum of a plurality of operation times required for the respective plurality of steps, and a product of the sum of the operation times and a coefficient obtained in advance indicating a degree of an occurrence of a defect due to a foreign matter deteriorating the level of cleanliness of the surface in the plurality of steps after the operation based on an evaluation result on a degree of diffusion or adhesion of the foreign matter, and the calculated result is displayed or notified on a display.
G01N 33/00 - Investigating or analysing materials by specific methods not covered by groups
B23P 19/04 - Machines for simply fitting together or separating metal parts or objects, or metal and non-metal parts, whether or not involving some deformationTools or devices therefor so far as not provided for in other classes for assembling or disassembling parts
A device including a DA conversion circuit includes at least: a processor 10P that outputs a DA conversion target value, a pre-stage circuit that receives the DA conversion target value from the processor, corrects the DA conversion target value according to correction data, and outputs the corrected DA conversion target value, a body circuit including one or more correction target DA converter elements and that performs DA conversion on the corrected DA conversion target value, and an AD converter. Here, the correction target DA converter element is a hybrid-type DA converter element that outputs, from an output terminal, an analog value obtained by adding an analog value output by a first type circuit segment in charge of an upper order and an analog value output by a second type circuit segment in charge of a lower order.
The purpose of the present invention is to provide a probe cleaning unit capable of accurately measuring the temperature of a cleaning solution, which is used for cleaning a dispenser probe, when heating the cleaning solution. A probe cleaning unit according to the present invention comprises a storage section for containing a cleaning solution, a cylinder section connected to the storage section, and a heater for heating the cleaning solution in the cylinder section. A temperature measuring device for measuring the temperature of the cylinder section is placed above the cylinder section.
A specimen state judging apparatus includes: an image input unit that receives an image obtained by imaging the vessel storing the specimen from the side surface of the vessel; a region detection unit that identifies a blood serum or blood plasma region from within the image; a state judgment properness information calculation unit that calculates state judgment properness information as information for evaluating a properness degree intended for the state judgment of the specimen for each partial region of the blood serum or blood plasma region identified by the region detection unit; a state judgment region selection unit that selects the partial region suitable for the state judgment of the specimen on the basis of the state judgment properness information; a state judgment unit that judges the state of the specimen by using the partial region selected by the state judgment region selection unit; and an output unit that outputs the state judgment result of the specimen judged by the state judgment unit and/or position information within the image of the partial region selected by the state judgment region selection unit.
An aberration corrector comprising a transfer lens disposed between a first multipole and a second multipole to control fourth-order coma aberration, includes: a first deflector, wherein the first and second multipoles generate a multipole field including a hexapole component, the first deflector adjusting at least one of: (i) the distance between the charged particle beam incident on the first multipole and the optical axis, and (ii) the azimuth angle of the beam incident on the first multipole; a second deflector adjusts at least one of: (i) the angle between the charged particle beam incident on an objective lens and the optical axis, and (ii) the azimuth angle of the beam incident on the objective lens; and a control unit configured to drive the first and second deflectors such that second-order coma aberration (B2) induced by the first deflector is at least partially cancelled by that induced by the second deflector.
The present invention provides a technology for efficiently determining a cause of fluctuations in reaction process data. An analysis system according to the present invention is provided with: an analysis unit for an automated analysis device that measures a mixed liquid in which a sample and a reagent are mixed; an acquisition unit that acquires reaction process data obtained through measurement by the analysis unit; a first determination unit that determines, by using standard reaction process data, which of a plurality of abnormality patterns is present or no abnormality is present in the reaction process data; a storage unit that stores the plurality of abnormality patterns, measurement-related information, and the result of determination by the first determination unit; and a second determination unit that, when the first determination unit has determined that an abnormality pattern is present in the reaction process data, determines which of the sample, the reagent, and the analysis unit has a cause of the abnormality on the basis of the measurement-related information and the determination result (see fig. 1).
Provided is an automatic analyzer capable of suppressing generation of bubbles in a cup into which a liquid fed by a tube pump is discharged. This automatic analyzer for analyzing a specimen is characterized by comprising a placement part on which a bottle that stores a liquid used for analyzing the specimen is placed, a tube pump that sends the liquid from the bottle downstream, and a nozzle that discharges the liquid into a cup, and in that at least a part between the tube pump and the nozzle is a soft tube elastically deformed by the pressure of the liquid.
An inspection system includes: an electron source which irradiates a sample with an inspection beam, a detector which detects secondary electrons and outputs a detection signal, a laser device which emits an action laser, an electron gun which emits an action electron beam, and a computer system which generates an image of the sample based on the detection signal. The computer system generates an inspection image based on the inspection beam, acquires the dimensions and the like related to a pattern on the sample based on the inspection image, generates an inspection image related to the emission of the action laser and the inspection beam, acquires the material characteristics related to the pattern based on the inspection image, generates an inspection image related to the emission of the action electron beam and the inspection beam, and acquires the electrical characteristics related to the pattern based on the inspection image.
A temperature control device includes a housing, a partition plate that partitions the housing into an upper part and a lower part, a temperature control unit, and an exhaust fan. The temperature control unit includes a temperature adjustment unit and a multi-well plate. The multi-well plate is disposed above the partition plate. The temperature adjustment unit is disposed below the partition plate. An air intake port for introducing outside air is provided on a side surface part of the housing at a predetermined portion located above the partition plate. The partition plate is provided with an exhaust port. The exhaust fan is disposed in such a manner as to discharge air from an exhaust path located below the partition plate to the outside of the housing. The multi-well plate is disposed between the air intake port and the exhaust port. The air flows into the housing from the air intake port, passes above the multi-well plate, and flows into the exhaust path from the exhaust port. Accordingly, variations in the amount of evaporation of a solution held in each of a plurality of wells provided in the multi-well plate can be reduced.
A sample measurement device includes: a light source configured to irradiate a sample including an insulating film with light; an excitation source configured to irradiate the sample with a primary beam to emit a charged particle; a detector configured to apply at least one of an electric field or a magnetic field to the charged particle to separate a trajectory according to energy of the charged particle, thereby outputting a detection signal depending on the energy of the charged particle; and a control device configured to process a detection signal of the charged particle obtained from the detector. The control device changes a light irradiation condition, and acquires detection signals by the detector under different irradiation conditions, and determines a material characteristic value of the insulating film based on the detection signals under the different irradiation conditions using information indicating a relationship between the detection signal and the material characteristic value, and outputs the material characteristic value.
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
A sample surface inspection device comprises: a sample holding member; a spindle motor that rotates the sample holding member; a turntable fixed to the spindle motor; and a focus drive mechanism that displaces the sample holding member. The focus drive mechanism comprises: several support members of which one end is fixed to the sample holding member and the other end is fixed to the turntable, the support members support the sample holding member to be displaceable in the focus direction that is the height direction with respect to the turntable; a yoke; a magnet that is fixed to the yoke; and a coil disposed to oppose the magnet. The yoke includes a yoke attachment extending in the vertical direction and connected to the sample holding member. The yoke attachment portion is fixed on a circumference that is a node of the primary nodal circular vibration mode of the sample holding member.
An object of the present invention is to reduce a replacement frequency of a probe cleaner in an automatic analysis device using a plurality of probe cleaners and a control method for the same. An automatic analysis device according to the present invention includes a dispensing probe that performs aspiration and discharge of at least one of a reagent and a sample and a liquid delivery mechanism that delivers each of a first probe cleaner and a second probe cleaner for cleaning the dispensing probe, a heterogeneous probe cleaner region in which the first probe cleaner and the second probe cleaner may exist, and a storage unit that stores a type of the probe cleaner existing in the heterogeneous probe cleaner region (see FIG. 5).
An automatic analyzer is capable of sensing abnormality occurred during a liquid dispensing action with ease and with high precision. The automatic analyzer and a method of determining abnormality in the automatic analyzer include: a probe for performing a dispensing action including a process of aspirating and/or discharging liquid; a syringe for generating pressure variations for allowing the probe to dispense liquid; a flow passage connecting the probe and the syringe; a sensor for measuring a pressure in the flow passage during liquid dispense; a calculator for calculating an attenuation rate of a time-varying waveform of pressure measured by the sensor after a predetermined action of the syringe; and a determination unit making, based on an attenuation rate calculated by the calculator, a determination whether or not an abnormality has occurred in a process during liquid dispense.
An object of the present invention is to provide an ion milling device in which a horizontal movable stage is placed on a sample rotation stage and power can be supplied to the horizontal movable stage. The ion milling device according to the present invention includes a rotation stage, a movable stage provided on an upper surface of the rotation stage, and a fixed base unit supporting the rotation stage. The rotation stage includes a first power transmission unit, the fixed base unit includes a second power transmission unit. The ion milling device further includes a member that exerts a force for pressing the first power transmission unit and the second power transmission unit against each other (see FIG. 1C).
The present invention includes: a plurality of specimen container holders each of which holds a single specimen container; a function module for performing processing accompanying an analysis of a specimen; a conveyance unit which is connected to the function module and conveys the specimen container held by the specimen container holder to the function module; and a control unit which, when it is determined that a plurality of specimen containers having the same identification information are present when acquiring analysis request items of the specimen, allocates request items for each of the specimen containers, or a control unit which, when it is determined that a plurality of specimen containers having the same identification information are present, controls the conveyance of the specimen containers having the same identification information on the basis of the conveyance status of the other specimen containers having the same identification information.
A compatibility determination device (100) comprises a processor and a memory. The memory stores a compatibility domain (25) that has been generated for a learning model (23) for image processing using first difference information that indicates the difference between input images for the learning model (23) that were used when the learning model (23) was trained by machine learning and other images, and the processor outputs, as compatibility information (26), the results of determining whether second difference information that indicates the difference between an application image that is inputted into the learning model (23) and an application image that is outputted is compatible with the compatibility domain (25).
The coating film 53 is formed on the base material 52 of a member for a plasma processing apparatus using a suspension plasma spraying method. The suspension liquid 63 used in suspension plasma spraying contains the solvent 62 containing fluorine, a plurality of yttrium fluoride particles, and a plurality of yttrium oxyfluoride particles.
Provided is an analysis device including a light-emitting diode (LED) light source capable of suppressing changes in an emission spectrum and a light amount and preventing condensation. The analysis device includes an LED light source (an excitation light LED 501, a phosphor 502, and an LED package 503) that generates light with which a sample is irradiated, an LED mounting board 504 on which the LED light source and a temperature sensor 505 are mounted, a lamp house 508 that surrounds a periphery of the LED mounting board 504 and contains the LED mounting board 504, a Peltier element 506 that absorbs heat of the LED mounting board 504 or dissipates heat to the LED mounting board 504, and a control unit that controls an output from the Peltier element 506 so that a temperature measured by the temperature sensor 505 becomes higher than a threshold temperature.
G01N 21/78 - Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
In order to increase luminance of an electron beam emitted from a photocathode including a photoelectric film, second pulsed light that has a longer wavelength than first pulsed light is radiated to the photocathode in addition to the first pulsed light. According to an aspect of an applied electron beam device, the applied electron beam device includes a photocathode 1, a first pulsed light source 7 configured to emit first pulsed light, a second pulsed light source 8 configured to emit second pulsed light having a ring-shaped light intensity distribution, an excitation light optical system 21 configured to emit the first pulsed light and the second pulsed light in a manner of combining an optical path of the first pulsed light and an optical path of the second pulsed light, a condensing lens 2 configured to condense, on the photocathode, the first pulsed light and the second pulsed light emitted from the excitation light optical system, and an electron optical system configured to irradiate a sample 20 with the electron beam emitted from the photocathode.
The present invention facilitates identification of the cause of an alarm and specification of a method for addressing the alarm. This automated analysis system comprises an inspection processing unit that executes at least one process for the purpose of inspection, and a management device that manages the inspection processing unit. The management device is provided with: an alarm detection unit that detects that an alarm indicating the occurrence of an abnormality in the inspection processing unit is being emitted; an alarm notification unit that, in accordance with the result of detection by the alarm detection unit, issues a notification to indicate that the alarm is being emitted; and a related alarm determination unit that determines, from among related alarms that are other alarms having a prescribed degree of relatedness to the alarm being emitted, a related alarm that is in an unaddressed state.
G06F 40/177 - Editing, e.g. inserting or deleting of tablesEditing, e.g. inserting or deleting using ruled lines
G16H 10/40 - ICT specially adapted for the handling or processing of patient-related medical or healthcare data for data related to laboratory analysis, e.g. patient specimen analysis
An inspection device for inspecting a sample having a surface formed of a transparent film and a non-transparent material, the inspection device including: a first optical unit configured to irradiate the sample with illumination light emitted from a light source and condense first reflected light reflected by the sample; a second optical unit configured to illuminate a reflecting mirror with the illumination light and condense second reflected light reflected by the reflecting mirror; an interference optical unit configured to cause the first reflected light and the second reflected light to interfere with each other to obtain interference light; a plurality of interference light sensors configured to detect a reflected light intensity of the interference light; and a signal processing device configured to process a detected light amount of the interference light sensor. The signal processing device identifies, based on the detected light amount of the interference light sensor and refractive indices of the transparent film and the non-transparent material, whether any coordinates of the sample indicate any of the transparent film and the non-transparent material, and measures a surface height or a film thickness of the sample at the coordinates by calculation.
An object of the present invention is to provide a charged particle beam device that includes an electrode short-circuit mechanism capable of suppressing a change in a lens effect generated between acceleration electrodes during a change in acceleration voltage and is operable while applying an acceleration voltage to the electrode short-circuit mechanism. In the charged particle beam device according to the present invention, while applying an acceleration voltage to a first acceleration electrode, a potential difference between a short-circuit electrode and a first multi-stage acceleration electrode is controlled such that discharge does not occur, and the first multi-stage acceleration electrode and the short-circuit electrode that have the above-described potential difference are connected to each other (refer to FIG. 1).
An automatic analyzer capable of reducing the installation area of a device and a method of reading information by the above automatic analyzer are provided. The automatic analyzer includes a sample disk that holds a sample container with a first tag for storing information about a liquid to be contained that is attached to the outer wall thereof. Provided are a holding area which is located within the sample disk for setting the sample container with the first tag attached, an area for setting a second tag for storing the information about the automatic analyzer, and a reader. The reader has a reading range that includes the holding area and the area for setting the second tag. Accordingly, the reader is disposed to read the information stored in the first tag and the second tag.
A battery state diagnosis method and a battery state diagnosis device are provided, which achieve a highly accurate battery capacity deterioration diagnosis when a diagnosis target is a battery system, such as a battery system using a LiFePO4-based active material for the positive electrode, that exhibits little voltage change in response to a change in the state-of-charge. A battery state diagnosis method is for diagnosing a deterioration state of a secondary battery mounted on equipment, and includes: a data acquisition step of acquiring pieces of data about a voltage, a current, and a temperature of the secondary battery from the equipment in operation; a table creation step of creating, based on the acquired pieces of data, a table including a state of health capacity and a state of health resistance of the secondary battery; and a diagnosis step of diagnosing, using the created table, a deterioration state of the secondary battery.
G01R 31/392 - Determining battery ageing or deterioration, e.g. state of health
G01R 31/36 - Arrangements for testing, measuring or monitoring the electrical condition of accumulators or electric batteries, e.g. capacity or state of charge [SoC]
G01R 31/367 - Software therefor, e.g. for battery testing using modelling or look-up tables
G01R 31/374 - Arrangements for testing, measuring or monitoring the electrical condition of accumulators or electric batteries, e.g. capacity or state of charge [SoC] with means for correcting the measurement for temperature or ageing
G01R 31/3842 - Arrangements for monitoring battery or accumulator variables, e.g. SoC combining voltage and current measurements
G01R 31/389 - Measuring internal impedance, internal conductance or related variables
42.
GAS SENSOR FET, GAS SENSOR, AND METHOD FOR MANUFACTURING GAS SENSOR FET
A gas sensor FET with improved gas detection sensitivity is provided. The gas sensor FET includes a semiconductor substrate and a gate electrode layer formed on the semiconductor substrate and functioning as a gas detection unit. The gate electrode layer has a catalytic metal layer including a side exposed to an atmosphere. A side exposed to an atmosphere of the catalytic metal layer has a structure in which a plurality of dendritic-shaped structures, each including a plurality of fine structure portions smaller and finer than a columnar portion formed on a surface of the columnar portion, are arranged two-dimensionally. The plurality of dendritic-shaped structures are electrically connected to each other.
Provided are a column cartridge and an analyzer by which an operator can safely and easily replace a separation column while preventing an increase in cost and environmental burden. The column cartridge according to the present invention includes: a separation column having a built-in stationary phase; a heat transfer body configured to transfer heat from a heating mechanism to the separation column; and a housing configured to accommodate the separation column and the heat transfer body. A heat insulating layer is formed between the heat transfer body and the housing. The heat insulating layer is preferably a gap formed at a position excluding a plurality of support portions that support the heat transfer body.
A charged particle beam device 10 has a stage 113, a holder 104, a position storage unit 118, and a controller 100. The holder 104 has placed thereon a sample to be provided on the stage 113. The position storage unit 118 stores: observation position information that indicates an observation position of a sample in the field of view for observing the sample; and stage information that indicates the position of the stage 113 associated with the observation position information. When moving the stage 113 in order to observe the sample at the observation position, the controller 100 calculates an error in the rotation direction of the stage 113 on the basis of the observation position information and the stage information, and then moves the stage 113 in at least one of the X direction and the Y direction so as to eliminate the calculated error.
The present disclosure proposes a charged particle beam system achieving both an improvement in throughput and measurement accuracy of a semiconductor pattern measurement process. The charged particle beam system includes: a charged particle beam apparatus including a charged particle source configured to emit a charged particle beam, a stage on which a sample is placed, a first deflector configured to deflect the charged particle beam, a second deflector configured to deflect a signal particle emitted from the sample, a detector configured to detect the signal particle, and a position detection device configured to detect a position of the sample or the stage; and a computer system configured to control an operation of the charged particle beam apparatus. The computer system performs output control of the second deflector based on positional information detected by the position detection device. (see FIG. 1).
In the present invention, a measurement-subject captured image in which a specimen is captured is converted to a measurement-subject dimension measurement image by a dimension measurement image conversion model, and the dimensions of a measurement pattern image included in the measurement-subject dimension measurement image are measured. The measurement-subject image conversion model is trained using teaching data that is a combination of a training captured image in which the specimen is captured and a training dimension measurement image that corresponds to the training captured image. The contrast between a measurement pattern image and a non-measurement pattern image present near the measurement pattern image in the training dimension measurement image is improved over the contrast between a measurement pattern image and a non-measurement pattern image in the training captured image. Alternatively, the non-measurement pattern image in the training captured image is removed from the training dimension measurement image.
A semiconductor device manufacturing system and method for estimating a processing result by inputting a parameter into a model corresponding to each step even though processing conditions have different numbers of steps or different step structures from processing conditions serving as training data, and including an application that executes a learning step of training model parameters of an integrated model obtained by integrating step models, and, by using the integrated model and training data, and estimating information about the processing result according to a desired processing condition using the trained integrated model, and outputting the estimated processing result, in which the integrated model outputs the information about a processing result by using a parameter value of the step corresponding to the step model as the input value, and the information about the processing result acquired in advance includes information about the processing result obtained by two or more steps.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
G06N 3/084 - Backpropagation, e.g. using gradient descent
48.
Gripping Mechanism, Storage Device, and Gripping Method
Provided are a gripping mechanism that can be reduced in size as compared in the related art, and that has improved reliability by detecting a state in which a stable gripping force is generated, a storage device, and a gripping method. The gripping mechanism includes: a first gripping arm 24a and a second gripping arm 24b disposed around a vertical axis and pivotally supported to be swingable along a horizontal support shaft and configured to grip an object at lower ends; a gripping spring 27 configured to apply a gripping force to the lower ends of the first gripping arm 24a and the second gripping arm 24b; a plurality of control arms 29a and 29b provided in pairs with the first gripping arm 24a and the second gripping arm 24b and configured to control an opening and closing operation of the first gripping arm 24a and the second gripping arm 24b; and an arm relative displacement detection plate 35a and an arm relative displacement detector 35b whose output signal changes when a distance between the first gripping arm 24a and the second gripping arm 24b and the control arms 29a and 29b is increased to a predetermined amount or more by gripping the object with a predetermined force by the first gripping arm 24a and the second gripping arm 24b.
To provide a gripping device and an automatic analyzer capable of discriminating more precisely compared to a prior art, three states of a state that a gripping member closes without gripping anything, a state that the gripping member opens without gripping anything, and a state that the gripping member grips a gripping object. An actuator sensor 248 detects either of a state that an actuator 243 is in an operation of opening gripping members 241, 242 or a state that the actuator 243 is in an operation of closing the gripping members, by shielding first detection light such that an actuator sensor light-shielding member 250 enters between a first light projecting unit and a first light receiving unit, and a gripping member sensor 247 detects either of a state that the gripping members 241, 242 are closed or a state that the gripping members are opened or gripping container, by shielding second detection light such that a gripping member sensor light-shielding member 249 enters between a second light projecting unit and a second light receiving unit.
In order to provide an automatic analyzer capable of improving the measurement stability, the following configuration is adopted. A control unit acquires a photometric waveform for each of a plurality of reaction cells held on a reaction disk from a photometry signal based on a photometry trigger signal, and sets a photometric value calculation period based on a time domain, the photometry signal being obtained by executing photometry of the plurality of reaction cells in an empty state or in a state where blank water is accommodated, the photometry trigger signal representing that each of the plurality of reaction cells crosses an optical axis of a light source, and the time domain representing a flat waveform obtained regarding the photometric waveform for each of the plurality of reaction cells.
A sample stage (104) is tiltable about a tilt axis (T) and rotates a sample (106) about a sample rotation axis (C) orthogonal to the tilt axis (T). A plurality of ion sources (101, 107, and 110) are adjusted by ion source movable mechanisms (102, 108, and 111) to which the ion sources (101, 107, and 110) are attached such that eccentricities, each of which is a distance between an ion beam center axis and the sample rotation axis (C) on a surface of the sample, are different from each other. A control unit (113) performs milling by irradiating the sample, which is rotated about the sample rotation axis (C) by the sample stage (104), with an unfocused ion beam from each of the plurality of ion sources (101, 107, and 110).
There is provided an automatic analysis apparatus including an analysis module configured to perform an analysis operation of a specimen, and a control device configured to control the analysis module. The analysis module includes a light source configured to emit light, a photometer configured to measure the light from the light source, which has passed through a reaction solution obtained by mixing the specimen with a reagent, a photometer temperature sensor configured to measure temperature of the photometer, an environmental temperature sensor installed in a housing of the analysis module and configured to measure an environmental temperature outside the housing, and a heater configured to heat the photometer. The control device is configured to calculate, based on a correlation between a stable temperature of the photometer and the environmental temperature, the stable temperature of the photometer from the environmental temperature measured by the environmental temperature sensor, and to control the heater only for a predetermined period of time using the stable temperature as a target value of the photometer temperature measured by the photometer temperature sensor.
G01N 21/27 - ColourSpectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection
G01K 3/14 - Thermometers giving results other than momentary value of temperature giving differences of valuesThermometers giving results other than momentary value of temperature giving differentiated values in respect of space
G05D 23/19 - Control of temperature characterised by the use of electric means
53.
Charged Particle Beam Apparatus and Sample Processing Method
To provide a technique capable of easily detecting an end point of cutting machining on a sample using an ion beam. A charged particle beam apparatus 100 includes a sample chamber 1, an ion beam barrel 2 configured to emit an ion beam IB, an electron beam barrel 4 configured to emit an electron beam EB1, a stage 6 on which a holder 40 holding a sample 30 is placeable, a probe configured to be in contact with the sample 30 placed on the stage 6, a switch configured to switch whether to electrically connect the stage 6 to a ground potential, and a control device C0 configured to control operations of these components.
The purpose of the present invention is to provide technology for nondestructively and contactlessly evaluating the state of a member for a plasma processing device, and showing evaluation results to a user of the plasma processing device. A plasma processing device according to the present invention is a plasma processing device in which a member having, on a surface thereof, a coating film containing Y and O is provided in a processing chamber for processing a wafer using plasma. The plasma processing device includes a control unit that reports that damage or wear of the coating film has reached a certain value or reports the life of the member when the absorption intensity of infrared rays of a predetermined wavelength detected from the surface of the coating film of the member is a minimal value.
In order to provide a wireless power supply device capable of stably supplying power even if an imbalance occurs in load power between variable loads connected to a plurality of power reception coils and a nucleic acid amplification device equipped with the wireless power supply device, the wireless power supply device is configured as follows. The wireless power supply device is characterized by comprising a power transmission coil, a plurality of power reception coils magnetically coupled to the power transmission coil, and a plurality of variable loads connected to the plurality of power reception coils, respectively, wherein a constant power load is connected, in parallel with a variable load, to at least the power reception coil having the largest coupling coefficient with the power transmission coil among the plurality of power reception coils. Also provided is a nucleic acid amplification device provided with the wireless power supply device.
The present invention provides an automated analysis device and an analysis method capable of predicting, with a high degree of accuracy, the time when an LED light source will need to be replaced, thereby enabling a reduction in equipment costs and workload associated with replacement of the LED light source. This automated analysis device comprises a container that accommodates a liquid, a light source that illuminates the liquid with light, a plurality of light detectors that detect the light in each of mutually different wavelength bands, a storage unit that records, over time, measurement data indicating measurement results of light intensity or photoelectric current, and an analyzing unit that diagnoses the state of the light source, wherein: the light source includes an LED light source; and the storage unit records, in association with each other, measurement data in a steady state of the LED light source, measured for light in one wavelength band detected by one of the plurality of light detectors, and energization time data indicating the energization time until the time of light detection. The analyzing unit and the analysis method obtain a correlation between the light intensity or the photoelectric current and the energization time on the basis of the measurement results and the energization time, and predict the replacement timing of the LED light source on the basis of the correlation.
The purpose of the present invention is to provide an automated analyzer capable of shortening the overall time required for reading a bar code affixed to a specimen container. To this end, an automated analyzer according to the present invention comprises: a placement unit on which a rack capable of holding a plurality of containers for accommodating specimens is placed; a reading unit that reads information stored in tags affixed to the containers and the rack; and a control unit that controls the reading unit. When the reading unit reads a first rack tag affixed to a first rack among the racks, the control unit performs control so as to read a first container tag affixed to a first container held in the first rack, and when the reading unit cannot read the first rack tag, the control unit performs control so as not to perform an operation for reading the first container tag.
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
58.
RADIONUCLIDE PRODUCTION SYSTEM AND RADIONUCLIDE PRODUCTION METHOD
Provided are a radionuclide production system and a radionuclide production method which make it possible to produce radionuclides with a compact, lightweight device with high safety and good efficiency. A radionuclide production system according to the present invention comprises: an electron beam accelerator that emits an electron beam; a bremsstrahlung radiation generation target that generates bremsstrahlung radiation with the emitted electron beam; and a radionuclide production target that includes a raw material which produces a radionuclide upon irradiation with the generated bremsstrahlung radiation. The thickness of the bremsstrahlung radiation generation target is set in the range in which the production rate of the radionuclide reaches a peak and with the condition that the amount of electron beam irradiation on the radionuclide production target is smallest within said range.
G21G 1/12 - Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation, or particle bombardment, e.g. producing radioactive isotopes outside of nuclear reactors or particle accelerators by electromagnetic irradiation, e.g. with gamma or X-rays
G21G 1/00 - Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation, or particle bombardment, e.g. producing radioactive isotopes
G21G 1/10 - Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation, or particle bombardment, e.g. producing radioactive isotopes outside of nuclear reactors or particle accelerators by bombardment with electrically-charged particles
G21G 4/08 - Radioactive sources other than neutron sources characterised by constructional features specially adapted for medical applications
A specimen condition assessing device includes a processor that executes a program for performing image processing on an image of a target specimen container and a memory for storing a result of the image processing. The processor performs processing of inputting the image, processing of detecting a boundary position from the image, processing of determining a type of upper and lower regions of each boundary position and determining a boundary position of each inclusion, and processing of assessing whether or not the target specimen container is testable on the basis of the boundary position of each inclusion.
Provided is a sample solution separation device affording minimal dead volume. A sample solution separation device includes a plurality of microchambers; a flow path connecting the plurality of microchambers; a first opening constituting an inlet through which the sample solution is introduced into the flow path; a valve provided between the first opening and the plurality of microchambers; a second opening provided on an opposite side to the first opening such that the plurality of microchambers are sandwiched between the first and second openings, the second opening being an inlet to a flow path of a separation liquid for separation between the plurality of microchambers in which the sample solution is stored; and a solid phase provided between the second opening and the plurality of microchambers, wherein the solid phase has air permeability, water repellency with respect to the sample solution, and permeability with respect to the separation liquid.
An optical foreign matter inspection device capable of realizing high accuracy in specifying a foreign matter position in a wide rotational speed range of a rotary stage, including a first head and a second head each detecting the graduations of an annular scale provided on the rotary stage and outputting a signal. A rotational speed range of the rotary stage which can be supported by the first head and a rotational speed range of the rotary stage which can be supported by the second head partially overlap and are relatively different. A calculation control circuit included in the optical foreign matter inspection device determines a head to be used to be either the first head or the second head, based on the rotational speed of the rotary stage, and determines the rotation angle of the rotary stage based on the signal from the head to be used.
This electron beam application device includes: an electron optical system for focusing, on a sample 11, a pulse electron beam 7 emitted from a pulse electron gun 25 having a photocathode; a detector 14 for detecting signal electrons 41 emitted when the sample is irradiated with the pulse electron beam; a probe 15 capable of coming into contact with a measurement region of the sample; a voltage source 17 for applying a periodically varying sample voltage to the sample via the probe; and a timing controller 18 for synchronously controlling the voltage source and the pulse electron gun and for controlling the timing of the irradiation with the pulse electron beam in one period of the sample voltage. The electron beam application device calculates a time constant of the measurement region of the sample on the basis of a detection signal amount resulting from the detector detecting signal electrons emitted when the measurement region to which the sample voltage is applied is irradiated with the pulse electron beam.
A technique capable of suitably managing a state of a charged particle beam device is provided. A storage resource stores reference data obtained by the charged particle beam device or simulation, with a sample as the target, the reference data including an imaging field coordinate of the charged particle beam device, a generation time of a reference image in which an observation region corresponding to the imaging field coordinate is captured, and a distribution of reference image quality evaluation values obtained from the reference image by an image quality evaluation function for each predetermined region. A computer (1) acquires an evaluation target image, which is obtained by the charged particle beam device, with the sample as the target and in which the observation region corresponding to the imaging field coordinate is captured, in an evaluation period including an evaluation time, (2) stores, in the storage resource, evaluation target data including the imaging field coordinate, the evaluation time, and a first distribution of image quality evaluation values obtained from the evaluation target image by the image quality evaluation function for each predetermined region, and (3) compares the reference data with the evaluation target data to calculate a distribution of temporal variations in the image quality evaluation values by the image quality evaluation function.
An automatic analyzer that can reduce the omission of procedures executed by a user compared to the prior art, and a guidance method in the automatic analyzer is disclosed. The automatic analyzer includes one or more mechanisms used for analysis of the specimen; a main cover, a reagent cover, and a specimen cover that cover one or more of the mechanisms; and open and close sensors and that sense opening and closing of the main cover, the reagent cover, and the specimen cover, in which when it is sensed by the open and close sensors that the main cover, the reagent cover, and the specimen cover are opened, a control unit displays guidance on a display unit so that a user performs the work necessary for the analysis.
Provided is an ion milling device capable of forming a processed surface in which an amorphous layer is suppressed. This ion milling device comprises: a sample chamber provided with a gas introduction port; a sample stage installed in the sample chamber; an ion gun that is attached to the sample chamber and emits an unfocused ion beam; an electrode that can be disposed so as to face a sample placement surface of the sample stage; and a power supply that applies a voltage between the electrode and the sample stage. The sample stage is provided with a magnetic circuit.
An automated analysis device according to the present invention includes: a rack conveyance path that transfers a sample tube rack storing a sample tube containing a sample; a camera provided on a side of the rack conveyance path; and a control unit that controls the rack conveyance path and the camera. The control unit is configured to: stop transfer of the sample tube rack to which the rack conveyance path is transferred; acquire a plurality of captured images of the sample tube by capturing an image sample tube stored in the sample tube rack in which transfer is stopped a plurality of times with the camera; create a difference image of a plurality of the captured images; and set a region having a largest area among regions having a temporal change in the difference image as a position of a liquid surface of the sample.
The method for continuously using a separation medium according to the present invention includes a separation medium filling step of filling a capillary with the separation medium, a first pre-run step of performing a pre-run, a first sample injection step of injecting a first-time sample into the capillary, a first electrophoretic step of applying a voltage to perform first electrophoresis, a second pre-run step of performing a pre-run after the first electrophoretic step, a second sample injection step of injecting a next-time sample into the capillary subjected to the second pre-run step, and a second electrophoretic step of performing next electrophoresis, and the method repeatedly performs the second pre-run step, the second sample injection step, and the second electrophoretic step a preliminarily set number of times.
Provided is a transport package that performs start-up and performance evaluation of a charged particle gun in the outside of a charged particle beam device.
Provided is a transport package that performs start-up and performance evaluation of a charged particle gun in the outside of a charged particle beam device.
A transport package for a charged particle gun includes an installation unit that is capable of installing a charged particle gun therein, vacuum evacuation equipment that is capable of making the inside of the charged particle gun into a vacuum state, in a state where the charged particle gun is installed in the installation unit, evaluation equipment that is capable of evaluating at least one of performance of the charged particle gun or performance of a charged particle beam irradiated from the charged particle gun in the state where the charged particle gun is installed in the installation unit. In the state where the charged particle gun is installed in the installation unit, the installation unit, the vacuum evacuation equipment, and the evaluation equipment can be moved together.
When an unanalyzable abnormality occurs in a certain specimen and a predetermined condition is satisfied, analyzable specimens can be analyzed even when a setting of collecting a rack loaded with the specimen is enabled. An automatic analysis device performs a preset first control or a second control. The first control is for, when a dispensing abnormality occurred in the specimen, continuing analysis scheduled for other specimens in the rack that carries the specimen container containing the specimen. The second control is for, when a dispensing abnormality occurred in the specimen, canceling analysis scheduled for other specimens in the rack that carries the specimen container containing the specimen and transporting the rack to the rack storage portion by the transport mechanism. The automatic analysis device performs the first control when a dispensing abnormality occurs in the specimen while the second control is set and a predetermined condition is satisfied.
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
The purpose of the present disclosure is to provide a technique capable of stably gripping an object when the gripping mechanism is not suitable for gripping the object by sandwiching the object. A gripping device according to the present disclosure is provided with a gripping part that grips an object having a first hole and a second hole. The gripping part is provided with: a first rod-shaped member that positions the object by being inserted into the first hole; and a second rod-shaped member that prevents the object from rotating by being inserted into the second hole (see
A mobile body control system in which a user can set an operation rule of a mobile robot so that the mobile robot can move without interfering with work performed at a specific place is provided. A mobile body control system 1 includes a first mobile body setting portion 121, a region setting portion 122 configured to set a first region 3 and a second region 5, a second mobile body detection unit 125 configured to acquire detection information of a second mobile body 4, an operation mode setting portion 123 configured to set an operation mode of a first mobile body 2, an operation mode selection rule setting portion 124 configured to set an operation mode selection rule, a setting information storage unit 150 configured to store setting information of the operation mode selection rule, a first mobile body position estimation unit 126 configured to estimate a position of the first mobile body, and a first mobile body control unit 127 configured to select the operation mode
In order to provide an automatic analyzer that can stably monitor, with high accuracy, a dispensing amount of a minute amount of liquid to be dispensed to the automatic analyzer, the invention includes a dispensing mechanism including a dispensing probe that dispenses a liquid, a reaction vessel into which the liquid is dispensed, and an automatic analyzer that measures an optical property of the liquid to analyze a reaction liquid. The automatic analyzer includes an imaging device 201 located at a place where a state in which a probe 113 discharges a liquid 1000 to a reaction cell 104 can be observed, an image processing unit 211 that extracts shape and contour information on the liquid using an image acquired by the imaging device 201, a storage unit 220 that stores information in which the image processing unit 211 and a measurement result of the optical property are associated with each other, and a calculation unit 212 that measures a liquid amount of the liquid using the image processing unit 211 and the storage unit 220.
A charged particle beam device 100 has an electron gun 102, a deflector 104, a detector 108, a sample stage 105 on which a sample 106 is placed, and a controller 109. Herein, the controller 109, upon receiving an instruction to create a captured image: (1) receives a VC method application region designation; (2) receives, from the detector, a secondary electron detection signal of the sample while sending a control signal generated on the basis of a predetermined scan trajectory to the deflector; and (3) generates a captured image on the basis of the secondary electron detection signal. The captured image includes a first partial region suitable for a VC method and a second partial region suitable for surface observation of the sample.
Provided are a mass spectrometer and a calibration method for a mass spectrometer capable of performing calibration more easily than one in the related art. A mass spectrometer 100 according to the present embodiment described above includes: an ion source 101 configured to ionize a sample; a detection unit 105 including a photomultiplier tube 105a and configured to analyze a mass of the sample ionized by the ion source 101; a vacuum chamber 102 configured to allow the ion source 101 to communicate with the detection unit 105; a vacuum gauge 106 configured to measure a vacuum degree inside the vacuum chamber 102; and a data analysis unit 112 and an analysis control unit 113 configured to calibrate setting of the photomultiplier tube 105a using electrons emitted from the vacuum gauge 106.
A system for managing a device that captures an image of a wafer and outputs a critical dimension value of a pattern includes an indicator value prediction model generation unit configured to generate, using training data including first and second training datasets, a model that outputs a predicted indicator value of received image data. The first training dataset is generated by associating the same first indicator value with a plurality of pieces of first image data obtained by capturing images of a first wafer with devices in a first device group where a critical dimension value difference for the same wafer is equal to or less than a predetermined reference value, the devices in the first device group are adjusted such that an indicator value is changed by a predetermined value from the first indicator value, and then the second training dataset is generated by associating a second indicator value, which is a value changed by the predetermined value from the first indicator value, with a plurality of pieces of second image data obtained by capturing images of the first wafer with the devices after adjustment. Accordingly, a plurality of devices can be managed without being affected by an individual difference among the devices.
Provided is a charged particle beam device for which the optical axis can be adjusted. The charged particle beam device comprises: a beam source that emits a charged particle beam with which a sample is irradiated; a deflector that deflects the charged particle beam; an objective lens that focuses the charged particle beam on a surface of the sample; a detector that detects secondary particles emitted from the sample in response to being irradiated with the charged particle beam; and a control unit that generates an observation image of the sample on the basis of a detection signal output from the detector and controls each unit. The charged particle beam device is characterized in that the control unit adjusts an optical axis of the charged particle beam on the basis of an aberration image obtained in a state in which a deflection pivot point, which is an intersection between the central axis of the objective lens and the optical axis of the charged particle beam, is separated from the objective lens.
Provided is a technique (a semiconductor device manufacturing method and a plasma processing method) capable of selectively forming a protective film on a mask top and a mask top corner peripheral region of a pattern to be a hard mask formed on a film to be etched. Provided is a technique including: a first step of forming a protective film on a hard mask formed on a film to be etched; a second step of, after the first step, selectively removing the protective film formed on the film to be etched and containing a carbon element, with respect to the protective film on an upper portion of the hard mask and the protective film on a side wall of the hard mask; a third step of, after the second step, forming an SiN film on the protective film; a fourth step of, after the third step, selectively removing the SiN film formed on the protective film on the side wall of the hard mask and the SiN film on the film to be etched, with respect to the SiN film formed on the protective film on the upper portion of the hard mask; and a fifth step of, after the fourth step, plasma-etching the film to be etched.
The purpose of the present invention is to provide a data processing system capable of easily comparing results of clot waveform analysis. To this end, a data processing device according to the present invention comprises: a measurement unit that measures changes in light amount over time due to a coagulation reaction of a blood specimen of a patient; an analysis unit that analyzes a waveform obtained from measurement data by the measurement unit and estimates the pathological condition of the patient; and a display unit that displays, on the same screen, the estimation results of the pathological conditions for a plurality of the blood specimens. Preferably, the display unit displays, on the same screen, identification information for identifying the blood sample and a breakdown of the probability that the blood sample corresponds to each pathological condition.
As an etching method of an object to be processed, which is capable of protecting pores in a porous film and a joint referred to as a seam present in the porous film without requiring replacement of a plurality of gases, a plasma processing method for plasma etching a Low-k film having a void is provided in which plasma generated by a mixed gas of a fluorine element containing gas and a carbon element containing gas is used to etch the Low-k film containing a silicon element.
A system and method for detecting a shape defect that cannot be obtained by only planar dimension data, including a server configured to control an etching parameter to obtain a desired processing result of a semiconductor manufacturing apparatus based on correlation data between the etching parameter of the semiconductor manufacturing apparatus and a change amount between a target value and a feature of an etched shape formed on a sample, and the feature is a value obtained based on secondary electron data from a surface of the sample or interference light data from the surface of the sample. The feature may be a value obtained from a dimension of the etched shape of the sample based on the secondary electron data or the interference light data. The change amount of the feature may be a value of a spatial or temporal change.
G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
An identifier creating device performs update of an identifier, identification basis analyzation, and analysis of a misidentification cause, updates the identifier using results of the analysis, and thus achieves creation of an identifier allowing an object in an image to be identified with high accuracy. The identifier creating device acquires an objective image, extracts, using an identifier, feature amount of the objective image from the objective image, identifies, using the identifier, the objective image from the feature amount and determines an identification value, determines an identification basis using the feature amount and the identification value, determines a portion to be improved using the identification basis and a teacher image, and updates the identifier based on the portion to be improved.
G06V 20/69 - Microscopic objects, e.g. biological cells or cellular parts
G06V 10/764 - Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
G06V 10/77 - Processing image or video features in feature spacesArrangements for image or video recognition or understanding using pattern recognition or machine learning using data integration or data reduction, e.g. principal component analysis [PCA] or independent component analysis [ICA] or self-organising maps [SOM]Blind source separation
G16H 30/20 - ICT specially adapted for the handling or processing of medical images for handling medical images, e.g. DICOM, HL7 or PACS
G16H 30/40 - ICT specially adapted for the handling or processing of medical images for processing medical images, e.g. editing
82.
DISTANCE MEASUREMENT METHOD, DISTANCE MEASUREMENT DEVICE, AND DISTANCE MEASUREMENT SYSTEM
Provided are a distance measurement device and a distance measurement method capable of reducing a distance error induced by polarization. A distance measurement method includes: branching light generated by a laser light source into a reference optical system and a measurement optical system; detecting a reference optical path measurement beat signal from reference light that passed through the reference optical system; detecting a measurement optical path measurement beat signal from measurement light obtained in the measurement optical system via a measurement target; and measuring a distance to the measurement target based on the measurement optical path measurement beat signal and the reference optical path measurement beat signal. A polarization-induced distance error reduction element is provided in one or both of the reference optical system and the measurement optical system.
G01S 17/32 - Systems determining position data of a target for measuring distance only using transmission of continuous waves, whether amplitude-, frequency-, or phase-modulated, or unmodulated
G01S 7/481 - Constructional features, e.g. arrangements of optical elements
83.
DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
A defect inspection device is provided including: a stage on which a sample is to be placed and moved; an illumination optical system configured to irradiate the sample with illumination light; a detection optical system configured to detect scattered light generated at the sample by forming an image of the scattered light on an image sensor; a control device configured to control the stage; and a signal processing device configured to process a signal output from the image sensor. The signal processing device stores detection signals obtained by scanning a predetermined region of interest on a surface of the sample a plurality of times along a scanning trajectory that has a shift amount of a non-integer multiple of a pixel pitch of the image sensor, estimates intensity distributions of the detection signals of the object in the region of interest in a plurality of scans, detects a shift amount of the scanning trajectory based on the intensity distributions, and aligns and synthesizes the intensity distributions in the plurality of scans based on the detected shift amount, and acquires a point spread function related to the object in a sub-pixel unit having a data interval smaller than the pixel pitch.
To estimate a defective consumable from among a plurality of consumables in a plunger pump, or to estimate a defective plunger pump from among a plurality of plunger pumps. A liquid chromatograph includes: a double plunger pump including a first plunger pump, a second plunger pump, and a plurality of consumables; a pressure sensor configured to detect a pressure of a solvent discharged by the double plunger pump; a dispensing unit; a separation column; and a control unit configured to estimate a defective consumable among the plurality of consumables based on a first pressure detected by the pressure sensor in a first section in which the first plunger pump discharges the solvent into a flow path and a second pressure detected by the pressure sensor in a second section in which the second plunger pump discharges the solvent into the flow path.
G01N 30/32 - Control of physical parameters of the fluid carrier of pressure or speed
G01M 3/28 - Investigating fluid tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipes, cables, or tubesInvestigating fluid tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipe joints or sealsInvestigating fluid tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for valves
A first liquid holding portion is provided for holding a liquid. A first hole is disposed at a bottom surface of the first liquid holding portion, and a second hole is disposed at a surface of the first liquid holding portion, the surface being separate from the bottom surface. A second liquid holding portion is in communication with the first liquid holding portion through the first hole, and a third liquid holding portion is in communication with the first liquid holding portion through the second hole. A first filter is disposed at the first hole, and a second filter is disposed at the second hole.
B01D 29/52 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in parallel connection
B01D 29/05 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups Filtering elements therefor with flat filtering elements supported
B01D 29/60 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups Filtering elements therefor integrally combined with devices for controlling the filtration
B01D 29/90 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups Filtering elements therefor having feed or discharge devices for feeding
B01D 36/00 - Filter circuits or combinations of filters with other separating devices
An electron beam application device according to the present invention is characterized by comprising: a photocathode 1 provided with a photoelectric film 10; a cathode heater 2 for heating the photocathode 1; an atomic hydrogen generating means 4 for generating atomic hydrogen by dissociating a hydrogen molecule; control means 7, 8 for controlling the surface cleaning of the surface of the photoelectric film 10; and a measuring means 18 for measuring the probe value of an electron beam probe 27 emitted from the photocathode 1. The present invention is further characterized in that, when the probe value measured by the measuring means 18 is lower than a predetermined value, the control means 7, 8 determine a surface cleaning condition of the photoelectric film 10, control the cathode heater 2 and the atomic hydrogen generating means 4 under the determined surface cleaning condition, and perform the surface cleaning of the surface of the photoelectric film 10.
A spectroscopic measurement device for a suspension liquid in the field of pharmaceutical products, foods, or chemistry which does not require taking out the suspension liquid from the inside of a pipe, and is capable of accurate measurement even when the device is attached to pipes of various shapes and materials; and a measurement condition adjustment method, The measurement device for measuring an optical spectrum of a liquid flowing in a pipe provided with a window material includes a measurement probe having a light irradiation unit and a light reception unit; and a movement mechanism for moving the measurement probe in rotation angle for changing the direction of the probe and a direction different from the axial direction of the pipe. The position of the measurement probe is adjusted using both or one of the S/N ratio and the intensity of the measured values at the wavelength of interest.
G01N 21/31 - Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
An object of the invention is to provide a technique capable of appropriately selecting a measure with a high economic effect and an implementation timing thereof as a measure to be implemented when a secondary battery deteriorates. A battery deterioration degree management system according to the invention calculates a cost necessary for implementing a measure against a decrease of a state of health of a battery based on cost data describing a cost along with implementation of the measure, and determines the measure having a high economic effect and an implementation timing thereof based on the cost (see FIG. 4).
G06Q 30/0201 - Market modellingMarket analysisCollecting market data
B60L 58/12 - Methods or circuit arrangements for monitoring or controlling batteries or fuel cells, specially adapted for electric vehicles for monitoring or controlling batteries responding to state of charge [SoC]
B60L 58/16 - Methods or circuit arrangements for monitoring or controlling batteries or fuel cells, specially adapted for electric vehicles for monitoring or controlling batteries responding to battery ageing, e.g. to the number of charging cycles or the state of health [SoH]
Provided is an automatic analyzer capable of accurately detecting an abnormality during aspiration even when an amount of a reagent used for analysis is small. An automatic analyzer includes: a dispensing mechanism configured to dispense a reagent from a reagent container to a reaction container; a control unit configured to control the dispensing mechanism to aspirate an amount of the reagent used for analysis, the amount including at least a second predetermined amount in addition to a first predetermined amount, then discharge the second predetermined amount of the reagent to the reagent container, and then discharge the first predetermined amount of the reagent to the reaction container; and a pressure sensor configured to measure pressure in the dispensing mechanism. The control unit determines whether the reagent is normally aspirated based on a measurement value of the pressure sensor when the dispensing mechanism aspirates the reagent. When the first predetermined amount is equal to or larger than a first predetermined amount threshold value that is predetermined in advance, the second predetermined amount is a constant value regardless of the first predetermined amount. When the first predetermined amount is smaller than the first predetermined amount threshold value, the second predetermined amount is larger than the constant value.
To provide a defect inspecting device and a defect inspecting method capable of performing the detection with high sensitivity by reducing an influence on a change in height of a sample surface. To achieve the above-mentioned object, a defect inspecting device includes: an illumination unit configured to irradiate a sample with light emitted from a light source; a detection unit configured to detect scattered light generated from the sample; a sample height detection unit configured to measure a variation amount of the sample in a direction perpendicular to a surface of the sample; a photoelectric conversion unit that converts the scattered light detected by the detection unit into an electric signal; and a signal processing unit configured to detect a defect of the sample by processing the electric signal converted by the photoelectric conversion unit, wherein the detection unit includes a mechanism that adjusts a position after an aperture is branched corresponding to the variation amount of the surface of the sample acquired by the sample height detection unit, and a mechanism that detects scattered light generated from the sample by branching the aperture at a plurality of detection elevation angles in a separated manner, and the signal processing unit includes a mechanism that corrects positions of a plurality of images formed by branching the aperture corresponding to the variation amount of the surface of the sample acquired by the sample height detection unit.
Provided is an electrical characteristic inspection apparatus capable of inspecting and measuring electrical characteristics of a sample under a condition of an arbitrary application voltage value (bias voltage value) or application current value (bias current value). The electrical characteristic inspection apparatus comprises: a charged particle source that irradiates a measurement point set on a sample with a charged particle beam under a prescribed optical condition; a detector that detects a secondary electron current emitted by the irradiation of the measurement point with the charged particle beam and that outputs a detection signal; and a calculation device that comprises a processor and a storage. The storage stores a first application voltage value or a first application current value which is a desired value for a voltage value or a current value to be applied to the measurement point. The processor calculates, on the basis of the detection signal from the detector, a second application voltage value or a second application current value which is a voltage value or a current value estimated as being applied to the measurement point. The processor changes the prescribed optical condition so that the difference between the first application voltage value and the second application voltage value or the difference between the first application current value and the second application current value becomes small.
The purpose of the present invention is to provide a charged-particle beam device capable of quickly identifying a defect position in an observed image of a sample to improve inspection throughput. The charged-particle beam device according to the present invention comprises a database describing such combinations of wavelengths and polarization directions of light that the contrast in an observed image of a defect that a sample has can be enhanced, wherein: the sample is irradiated with the light using at least one of the combinations; the observed image is generated for each of the combinations; and the defect is detected using the observed image (see FIG. 7).
A defect inspection device includes an illumination unit that irradiates a sample with illumination light emitted from a light source; a detection unit that is disposed in an oblique direction with respect to the sample and detects scattered light generated from the sample; a pupil division mechanism that divides pupil of the detection unit into a first detection angle and a second detection angle; a first photoelectric conversion unit that converts scattered light at the first detection angle detected by the detection unit into an electrical signal; a second photoelectric conversion unit that converts scattered light at the second detection angle detected by the detection unit into an electrical signal; and a signal processing unit that processes the electrical signals converted by the first photoelectric conversion unit and the second photoelectric conversion unit to detect a defect in the sample, in which the pupil division mechanism divides the pupil such that pupil allocation corresponds to an inspection target or inspection conditions.
The present invention comprises: an X-ray tube 5; an X-ray detector 4; and a scattered ray correction unit 13 that calculates a first scattered ray from X-ray projection data captured by an X-ray imaging device using a point-symmetric scattering kernel, and calculates a second scattered ray from the first scattered ray on the basis of the thickness of a subject to be imaged. The present invention calculates corrected X-ray projection data from the X-ray projection data and the second scattered ray, and reconstructs CT. The present invention thereby provides an arithmetic processing device, a radiation imaging device, an X-ray CT device, and a radiotherapy system with which it is possible to acquire X-ray projection data in which the degradation in image quality due to scattered rays is reduced without increasing calculation time compared to the prior arts.
A container storage device capable of reducing a burden on a worker related to carry-in and carry-out of a liquid is provided. The container storage device includes a storage unit that stores containers each storing a liquid, and a control unit that controls the storage unit. When a new container is to be carried-in, the control unit performs a control such that a container, which is a carry-out candidate, is selected from the containers stored in the storage unit, the selected container is carried-out, and the new container is carried-in.
This method for measuring a semiconductor device includes: preparing a semiconductor device 600 which includes a first structure 611 produced by a first manufacturing step, and a second structure 604 which is provided under the first structure 611 and is produced by a second manufacturing step performed after the first manufacturing step; removing the first structure 611 of the semiconductor device 600 by chemical reaction; irradiating the semiconductor device 600 from which the first structure 611 has been removed with a charged particle beam from above; and measuring a feature amount (amount of recess) of the second structure 604 using information acquired by the irradiation with the charged particle beam.
G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material
To implement a composite beam apparatus 10 capable of reducing a size of a gas ion beam lens barrel while removing neutral particles generated by a gas ion source. The composite beam apparatus 10 includes a focused ion beam device 14, an electron beam device 15, and a low-acceleration gas ion beam device 18. The low-acceleration gas ion beam device 18 includes a gas ion source 30, an ion beam deflection unit 31 connected to the gas ion source 30, and an ion beam housing 32 connected to the ion beam deflection unit 31 via a bent portion 26. The ion beam deflection unit 31 and the ion beam housing 32 are connected and inclined to each other via the bent portion 26.
H01J 37/30 - Electron-beam or ion-beam tubes for localised treatment of objects
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
The electrophoresis device includes a capillary, a container containing a sample, a stage, and a drive portion for driving the stage as well as an engagement member, and a toggle mechanism for toggling the states of the engagement member. Over a trajectory of the stage, one side includes a transfer area capable of transferring the container to the stage. The other side includes a connection area capable of connecting and removing the capillary to/from the container. The toggle mechanism toggles the states of the engagement member in conjunction with the movement of the stage. The disengaged state is activated when the stage is located on one side. The engaged state is activated when the stage is located on the other side. The stage moves horizontally while maintaining the engaged state on one side and maintaining the disengaged state on the other side.
An image processing device includes an input unit to receive an input image, a feature amount extraction unit to extract a feature amount from the input image, an object region detection unit to detect an object region in the image through use of the feature amount, an object end-point estimation unit to estimate coordinates of an end point of an object in the object region, an object bridging unit to calculate a trajectory complementing a space between end points in two object regions on the input image, a same-object determination unit to determine, from luminance value transition on the trajectory, whether the two object regions are included in the same object, an object region correction unit to correct the object region output by the object region detection unit based on a determination result output by the same-object determination unit, and an output unit to output the corrected object region.
G06V 10/26 - Segmentation of patterns in the image fieldCutting or merging of image elements to establish the pattern region, e.g. clustering-based techniquesDetection of occlusion
