To provide a technique capable of easily detecting an end point of cutting machining on a sample using an ion beam. A charged particle beam apparatus 100 includes a sample chamber 1, an ion beam barrel 2 configured to emit an ion beam IB, an electron beam barrel 4 configured to emit an electron beam EB1, a stage 6 on which a holder 40 holding a sample 30 is placeable, a probe configured to be in contact with the sample 30 placed on the stage 6, a switch configured to switch whether to electrically connect the stage 6 to a ground potential, and a control device C0 configured to control operations of these components.
A semiconductor device manufacturing system and method for estimating a processing result by inputting a parameter into a model corresponding to each step even though processing conditions have different numbers of steps or different step structures from processing conditions serving as training data, and including an application that executes a learning step of training model parameters of an integrated model obtained by integrating step models, and, by using the integrated model and training data, and estimating information about the processing result according to a desired processing condition using the trained integrated model, and outputting the estimated processing result, in which the integrated model outputs the information about a processing result by using a parameter value of the step corresponding to the step model as the input value, and the information about the processing result acquired in advance includes information about the processing result obtained by two or more steps.
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
G06N 3/084 - Rétropropagation, p. ex. suivant l’algorithme du gradient
3.
Automatic Analysis Apparatus and Method of Adjusting Temperature of Photometer
There is provided an automatic analysis apparatus including an analysis module configured to perform an analysis operation of a specimen, and a control device configured to control the analysis module. The analysis module includes a light source configured to emit light, a photometer configured to measure the light from the light source, which has passed through a reaction solution obtained by mixing the specimen with a reagent, a photometer temperature sensor configured to measure temperature of the photometer, an environmental temperature sensor installed in a housing of the analysis module and configured to measure an environmental temperature outside the housing, and a heater configured to heat the photometer. The control device is configured to calculate, based on a correlation between a stable temperature of the photometer and the environmental temperature, the stable temperature of the photometer from the environmental temperature measured by the environmental temperature sensor, and to control the heater only for a predetermined period of time using the stable temperature as a target value of the photometer temperature measured by the photometer temperature sensor.
G01N 21/27 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en utilisant la détection photo-électrique
G01K 3/14 - Thermomètres donnant une indication autre que la valeur instantanée de la température fournissant des différences de valeursThermomètres donnant une indication autre que la valeur instantanée de la température fournissant des valeurs différenciées par rapport à l'espace
G05D 23/19 - Commande de la température caractérisée par l'utilisation de moyens électriques
4.
Ion Milling Device and Processing Method Using Same
A sample stage (104) is tiltable about a tilt axis (T) and rotates a sample (106) about a sample rotation axis (C) orthogonal to the tilt axis (T). A plurality of ion sources (101, 107, and 110) are adjusted by ion source movable mechanisms (102, 108, and 111) to which the ion sources (101, 107, and 110) are attached such that eccentricities, each of which is a distance between an ion beam center axis and the sample rotation axis (C) on a surface of the sample, are different from each other. A control unit (113) performs milling by irradiating the sample, which is rotated about the sample rotation axis (C) by the sample stage (104), with an unfocused ion beam from each of the plurality of ion sources (101, 107, and 110).
In order to provide an automatic analyzer capable of improving the measurement stability, the following configuration is adopted. A control unit acquires a photometric waveform for each of a plurality of reaction cells held on a reaction disk from a photometry signal based on a photometry trigger signal, and sets a photometric value calculation period based on a time domain, the photometry signal being obtained by executing photometry of the plurality of reaction cells in an empty state or in a state where blank water is accommodated, the photometry trigger signal representing that each of the plurality of reaction cells crosses an optical axis of a light source, and the time domain representing a flat waveform obtained regarding the photometric waveform for each of the plurality of reaction cells.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
In the present invention, a measurement-subject captured image in which a specimen is captured is converted to a measurement-subject dimension measurement image by a dimension measurement image conversion model, and the dimensions of a measurement pattern image included in the measurement-subject dimension measurement image are measured. The measurement-subject image conversion model is trained using teaching data that is a combination of a training captured image in which the specimen is captured and a training dimension measurement image that corresponds to the training captured image. The contrast between a measurement pattern image and a non-measurement pattern image present near the measurement pattern image in the training dimension measurement image is improved over the contrast between a measurement pattern image and a non-measurement pattern image in the training captured image. Alternatively, the non-measurement pattern image in the training captured image is removed from the training dimension measurement image.
Provided are a gripping mechanism that can be reduced in size as compared in the related art, and that has improved reliability by detecting a state in which a stable gripping force is generated, a storage device, and a gripping method. The gripping mechanism includes: a first gripping arm 24a and a second gripping arm 24b disposed around a vertical axis and pivotally supported to be swingable along a horizontal support shaft and configured to grip an object at lower ends; a gripping spring 27 configured to apply a gripping force to the lower ends of the first gripping arm 24a and the second gripping arm 24b; a plurality of control arms 29a and 29b provided in pairs with the first gripping arm 24a and the second gripping arm 24b and configured to control an opening and closing operation of the first gripping arm 24a and the second gripping arm 24b; and an arm relative displacement detection plate 35a and an arm relative displacement detector 35b whose output signal changes when a distance between the first gripping arm 24a and the second gripping arm 24b and the control arms 29a and 29b is increased to a predetermined amount or more by gripping the object with a predetermined force by the first gripping arm 24a and the second gripping arm 24b.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
B25J 9/10 - Manipulateurs à commande programmée caractérisés par des moyens pour régler la position des éléments manipulateurs
To provide a gripping device and an automatic analyzer capable of discriminating more precisely compared to a prior art, three states of a state that a gripping member closes without gripping anything, a state that the gripping member opens without gripping anything, and a state that the gripping member grips a gripping object. An actuator sensor 248 detects either of a state that an actuator 243 is in an operation of opening gripping members 241, 242 or a state that the actuator 243 is in an operation of closing the gripping members, by shielding first detection light such that an actuator sensor light-shielding member 250 enters between a first light projecting unit and a first light receiving unit, and a gripping member sensor 247 detects either of a state that the gripping members 241, 242 are closed or a state that the gripping members are opened or gripping container, by shielding second detection light such that a gripping member sensor light-shielding member 249 enters between a second light projecting unit and a second light receiving unit.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
B25J 13/08 - Commandes pour manipulateurs au moyens de dispositifs sensibles, p. ex. à la vue ou au toucher
The present disclosure proposes a charged particle beam system achieving both an improvement in throughput and measurement accuracy of a semiconductor pattern measurement process. The charged particle beam system includes: a charged particle beam apparatus including a charged particle source configured to emit a charged particle beam, a stage on which a sample is placed, a first deflector configured to deflect the charged particle beam, a second deflector configured to deflect a signal particle emitted from the sample, a detector configured to detect the signal particle, and a position detection device configured to detect a position of the sample or the stage; and a computer system configured to control an operation of the charged particle beam apparatus. The computer system performs output control of the second deflector based on positional information detected by the position detection device. (see FIG. 1).
The purpose of the present invention is to provide an automated analyzer capable of shortening the overall time required for reading a bar code affixed to a specimen container. To this end, an automated analyzer according to the present invention comprises: a placement unit on which a rack capable of holding a plurality of containers for accommodating specimens is placed; a reading unit that reads information stored in tags affixed to the containers and the rack; and a control unit that controls the reading unit. When the reading unit reads a first rack tag affixed to a first rack among the racks, the control unit performs control so as to read a first container tag affixed to a first container held in the first rack, and when the reading unit cannot read the first rack tag, the control unit performs control so as not to perform an operation for reading the first container tag.
G01N 35/02 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet en utilisant une série de récipients à échantillons déplacés par un transporteur passant devant un ou plusieurs postes de traitement ou d'analyse
11.
PLASMA PROCESSING DEVICE, METHOD FOR OPERATING PLASMA PROCESSING DEVICE, INSPECTION DEVICE, AND INSPECTION METHOD
The purpose of the present invention is to provide technology for nondestructively and contactlessly evaluating the state of a member for a plasma processing device, and showing evaluation results to a user of the plasma processing device. A plasma processing device according to the present invention is a plasma processing device in which a member having, on a surface thereof, a coating film containing Y and O is provided in a processing chamber for processing a wafer using plasma. The plasma processing device includes a control unit that reports that damage or wear of the coating film has reached a certain value or reports the life of the member when the absorption intensity of infrared rays of a predetermined wavelength detected from the surface of the coating film of the member is a minimal value.
The present invention provides an automated analysis device and an analysis method capable of predicting, with a high degree of accuracy, the time when an LED light source will need to be replaced, thereby enabling a reduction in equipment costs and workload associated with replacement of the LED light source. This automated analysis device comprises a container that accommodates a liquid, a light source that illuminates the liquid with light, a plurality of light detectors that detect the light in each of mutually different wavelength bands, a storage unit that records, over time, measurement data indicating measurement results of light intensity or photoelectric current, and an analyzing unit that diagnoses the state of the light source, wherein: the light source includes an LED light source; and the storage unit records, in association with each other, measurement data in a steady state of the LED light source, measured for light in one wavelength band detected by one of the plurality of light detectors, and energization time data indicating the energization time until the time of light detection. The analyzing unit and the analysis method obtain a correlation between the light intensity or the photoelectric current and the energization time on the basis of the measurement results and the energization time, and predict the replacement timing of the LED light source on the basis of the correlation.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
13.
WIRELESS POWER SUPPLY DEVICE AND NUCLEIC ACID AMPLIFICATION DEVICE PROVIDED WITH SAME
In order to provide a wireless power supply device capable of stably supplying power even if an imbalance occurs in load power between variable loads connected to a plurality of power reception coils and a nucleic acid amplification device equipped with the wireless power supply device, the wireless power supply device is configured as follows. The wireless power supply device is characterized by comprising a power transmission coil, a plurality of power reception coils magnetically coupled to the power transmission coil, and a plurality of variable loads connected to the plurality of power reception coils, respectively, wherein a constant power load is connected, in parallel with a variable load, to at least the power reception coil having the largest coupling coefficient with the power transmission coil among the plurality of power reception coils. Also provided is a nucleic acid amplification device provided with the wireless power supply device.
H02J 50/40 - Circuits ou systèmes pour l'alimentation ou la distribution sans fil d'énergie électrique utilisant plusieurs dispositifs de transmission ou de réception
H02J 50/10 - Circuits ou systèmes pour l'alimentation ou la distribution sans fil d'énergie électrique utilisant un couplage inductif
14.
RADIONUCLIDE PRODUCTION SYSTEM AND RADIONUCLIDE PRODUCTION METHOD
Provided are a radionuclide production system and a radionuclide production method which make it possible to produce radionuclides with a compact, lightweight device with high safety and good efficiency. A radionuclide production system according to the present invention comprises: an electron beam accelerator that emits an electron beam; a bremsstrahlung radiation generation target that generates bremsstrahlung radiation with the emitted electron beam; and a radionuclide production target that includes a raw material which produces a radionuclide upon irradiation with the generated bremsstrahlung radiation. The thickness of the bremsstrahlung radiation generation target is set in the range in which the production rate of the radionuclide reaches a peak and with the condition that the amount of electron beam irradiation on the radionuclide production target is smallest within said range.
G21G 1/12 - Dispositions pour la conversion des éléments chimiques par rayonnement électromagnétique, radiations corpusculaires ou bombardement par des particules, p. ex. production d'isotopes radioactifs à l'extérieur des réacteurs nucléaires ou des accélérateurs de particules par irradiation électromagnétique, p. ex. de rayons gamma ou de rayons X
G21G 1/00 - Dispositions pour la conversion des éléments chimiques par rayonnement électromagnétique, radiations corpusculaires ou bombardement par des particules, p. ex. production d'isotopes radioactifs
G21G 1/10 - Dispositions pour la conversion des éléments chimiques par rayonnement électromagnétique, radiations corpusculaires ou bombardement par des particules, p. ex. production d'isotopes radioactifs à l'extérieur des réacteurs nucléaires ou des accélérateurs de particules par bombardement avec des particules électriquement chargées
G21G 4/08 - Sources radioactives autres que les sources de neutrons caractérisées par des aspects de leur structure spécialement adaptées aux applications médicales
Provided is a sample solution separation device affording minimal dead volume. A sample solution separation device includes a plurality of microchambers; a flow path connecting the plurality of microchambers; a first opening constituting an inlet through which the sample solution is introduced into the flow path; a valve provided between the first opening and the plurality of microchambers; a second opening provided on an opposite side to the first opening such that the plurality of microchambers are sandwiched between the first and second openings, the second opening being an inlet to a flow path of a separation liquid for separation between the plurality of microchambers in which the sample solution is stored; and a solid phase provided between the second opening and the plurality of microchambers, wherein the solid phase has air permeability, water repellency with respect to the sample solution, and permeability with respect to the separation liquid.
A specimen condition assessing device includes a processor that executes a program for performing image processing on an image of a target specimen container and a memory for storing a result of the image processing. The processor performs processing of inputting the image, processing of detecting a boundary position from the image, processing of determining a type of upper and lower regions of each boundary position and determining a boundary position of each inclusion, and processing of assessing whether or not the target specimen container is testable on the basis of the boundary position of each inclusion.
A technique capable of suitably managing a state of a charged particle beam device is provided. A storage resource stores reference data obtained by the charged particle beam device or simulation, with a sample as the target, the reference data including an imaging field coordinate of the charged particle beam device, a generation time of a reference image in which an observation region corresponding to the imaging field coordinate is captured, and a distribution of reference image quality evaluation values obtained from the reference image by an image quality evaluation function for each predetermined region. A computer (1) acquires an evaluation target image, which is obtained by the charged particle beam device, with the sample as the target and in which the observation region corresponding to the imaging field coordinate is captured, in an evaluation period including an evaluation time, (2) stores, in the storage resource, evaluation target data including the imaging field coordinate, the evaluation time, and a first distribution of image quality evaluation values obtained from the evaluation target image by the image quality evaluation function for each predetermined region, and (3) compares the reference data with the evaluation target data to calculate a distribution of temporal variations in the image quality evaluation values by the image quality evaluation function.
An optical foreign matter inspection device capable of realizing high accuracy in specifying a foreign matter position in a wide rotational speed range of a rotary stage, including a first head and a second head each detecting the graduations of an annular scale provided on the rotary stage and outputting a signal. A rotational speed range of the rotary stage which can be supported by the first head and a rotational speed range of the rotary stage which can be supported by the second head partially overlap and are relatively different. A calculation control circuit included in the optical foreign matter inspection device determines a head to be used to be either the first head or the second head, based on the rotational speed of the rotary stage, and determines the rotation angle of the rotary stage based on the signal from the head to be used.
This electron beam application device includes: an electron optical system for focusing, on a sample 11, a pulse electron beam 7 emitted from a pulse electron gun 25 having a photocathode; a detector 14 for detecting signal electrons 41 emitted when the sample is irradiated with the pulse electron beam; a probe 15 capable of coming into contact with a measurement region of the sample; a voltage source 17 for applying a periodically varying sample voltage to the sample via the probe; and a timing controller 18 for synchronously controlling the voltage source and the pulse electron gun and for controlling the timing of the irradiation with the pulse electron beam in one period of the sample voltage. The electron beam application device calculates a time constant of the measurement region of the sample on the basis of a detection signal amount resulting from the detector detecting signal electrons emitted when the measurement region to which the sample voltage is applied is irradiated with the pulse electron beam.
An automatic analyzer that can reduce the omission of procedures executed by a user compared to the prior art, and a guidance method in the automatic analyzer is disclosed. The automatic analyzer includes one or more mechanisms used for analysis of the specimen; a main cover, a reagent cover, and a specimen cover that cover one or more of the mechanisms; and open and close sensors and that sense opening and closing of the main cover, the reagent cover, and the specimen cover, in which when it is sensed by the open and close sensors that the main cover, the reagent cover, and the specimen cover are opened, a control unit displays guidance on a display unit so that a user performs the work necessary for the analysis.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
G01N 35/10 - Dispositifs pour transférer les échantillons vers, dans ou à partir de l'appareil d'analyse, p. ex. dispositifs d'aspiration, dispositifs d'injection
Provided is an ion milling device capable of forming a processed surface in which an amorphous layer is suppressed. This ion milling device comprises: a sample chamber provided with a gas introduction port; a sample stage installed in the sample chamber; an ion gun that is attached to the sample chamber and emits an unfocused ion beam; an electrode that can be disposed so as to face a sample placement surface of the sample stage; and a power supply that applies a voltage between the electrode and the sample stage. The sample stage is provided with a magnetic circuit.
Provided is a transport package that performs start-up and performance evaluation of a charged particle gun in the outside of a charged particle beam device.
Provided is a transport package that performs start-up and performance evaluation of a charged particle gun in the outside of a charged particle beam device.
A transport package for a charged particle gun includes an installation unit that is capable of installing a charged particle gun therein, vacuum evacuation equipment that is capable of making the inside of the charged particle gun into a vacuum state, in a state where the charged particle gun is installed in the installation unit, evaluation equipment that is capable of evaluating at least one of performance of the charged particle gun or performance of a charged particle beam irradiated from the charged particle gun in the state where the charged particle gun is installed in the installation unit. In the state where the charged particle gun is installed in the installation unit, the installation unit, the vacuum evacuation equipment, and the evaluation equipment can be moved together.
When an unanalyzable abnormality occurs in a certain specimen and a predetermined condition is satisfied, analyzable specimens can be analyzed even when a setting of collecting a rack loaded with the specimen is enabled. An automatic analysis device performs a preset first control or a second control. The first control is for, when a dispensing abnormality occurred in the specimen, continuing analysis scheduled for other specimens in the rack that carries the specimen container containing the specimen. The second control is for, when a dispensing abnormality occurred in the specimen, canceling analysis scheduled for other specimens in the rack that carries the specimen container containing the specimen and transporting the rack to the rack storage portion by the transport mechanism. The automatic analysis device performs the first control when a dispensing abnormality occurs in the specimen while the second control is set and a predetermined condition is satisfied.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
G01N 35/02 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet en utilisant une série de récipients à échantillons déplacés par un transporteur passant devant un ou plusieurs postes de traitement ou d'analyse
The purpose of the present disclosure is to provide a technique capable of stably gripping an object when the gripping mechanism is not suitable for gripping the object by sandwiching the object. A gripping device according to the present disclosure is provided with a gripping part that grips an object having a first hole and a second hole. The gripping part is provided with: a first rod-shaped member that positions the object by being inserted into the first hole; and a second rod-shaped member that prevents the object from rotating by being inserted into the second hole (see
A mobile body control system in which a user can set an operation rule of a mobile robot so that the mobile robot can move without interfering with work performed at a specific place is provided. A mobile body control system 1 includes a first mobile body setting portion 121, a region setting portion 122 configured to set a first region 3 and a second region 5, a second mobile body detection unit 125 configured to acquire detection information of a second mobile body 4, an operation mode setting portion 123 configured to set an operation mode of a first mobile body 2, an operation mode selection rule setting portion 124 configured to set an operation mode selection rule, a setting information storage unit 150 configured to store setting information of the operation mode selection rule, a first mobile body position estimation unit 126 configured to estimate a position of the first mobile body, and a first mobile body control unit 127 configured to select the operation mode
In order to provide an automatic analyzer that can stably monitor, with high accuracy, a dispensing amount of a minute amount of liquid to be dispensed to the automatic analyzer, the invention includes a dispensing mechanism including a dispensing probe that dispenses a liquid, a reaction vessel into which the liquid is dispensed, and an automatic analyzer that measures an optical property of the liquid to analyze a reaction liquid. The automatic analyzer includes an imaging device 201 located at a place where a state in which a probe 113 discharges a liquid 1000 to a reaction cell 104 can be observed, an image processing unit 211 that extracts shape and contour information on the liquid using an image acquired by the imaging device 201, a storage unit 220 that stores information in which the image processing unit 211 and a measurement result of the optical property are associated with each other, and a calculation unit 212 that measures a liquid amount of the liquid using the image processing unit 211 and the storage unit 220.
G01N 35/10 - Dispositifs pour transférer les échantillons vers, dans ou à partir de l'appareil d'analyse, p. ex. dispositifs d'aspiration, dispositifs d'injection
A charged particle beam device 100 has an electron gun 102, a deflector 104, a detector 108, a sample stage 105 on which a sample 106 is placed, and a controller 109. Herein, the controller 109, upon receiving an instruction to create a captured image: (1) receives a VC method application region designation; (2) receives, from the detector, a secondary electron detection signal of the sample while sending a control signal generated on the basis of a predetermined scan trajectory to the deflector; and (3) generates a captured image on the basis of the secondary electron detection signal. The captured image includes a first partial region suitable for a VC method and a second partial region suitable for surface observation of the sample.
Provided are a mass spectrometer and a calibration method for a mass spectrometer capable of performing calibration more easily than one in the related art. A mass spectrometer 100 according to the present embodiment described above includes: an ion source 101 configured to ionize a sample; a detection unit 105 including a photomultiplier tube 105a and configured to analyze a mass of the sample ionized by the ion source 101; a vacuum chamber 102 configured to allow the ion source 101 to communicate with the detection unit 105; a vacuum gauge 106 configured to measure a vacuum degree inside the vacuum chamber 102; and a data analysis unit 112 and an analysis control unit 113 configured to calibrate setting of the photomultiplier tube 105a using electrons emitted from the vacuum gauge 106.
A system for managing a device that captures an image of a wafer and outputs a critical dimension value of a pattern includes an indicator value prediction model generation unit configured to generate, using training data including first and second training datasets, a model that outputs a predicted indicator value of received image data. The first training dataset is generated by associating the same first indicator value with a plurality of pieces of first image data obtained by capturing images of a first wafer with devices in a first device group where a critical dimension value difference for the same wafer is equal to or less than a predetermined reference value, the devices in the first device group are adjusted such that an indicator value is changed by a predetermined value from the first indicator value, and then the second training dataset is generated by associating a second indicator value, which is a value changed by the predetermined value from the first indicator value, with a plurality of pieces of second image data obtained by capturing images of the first wafer with the devices after adjustment. Accordingly, a plurality of devices can be managed without being affected by an individual difference among the devices.
An automated analysis device according to the present invention includes: a rack conveyance path that transfers a sample tube rack storing a sample tube containing a sample; a camera provided on a side of the rack conveyance path; and a control unit that controls the rack conveyance path and the camera. The control unit is configured to: stop transfer of the sample tube rack to which the rack conveyance path is transferred; acquire a plurality of captured images of the sample tube by capturing an image sample tube stored in the sample tube rack in which transfer is stopped a plurality of times with the camera; create a difference image of a plurality of the captured images; and set a region having a largest area among regions having a temporal change in the difference image as a position of a liquid surface of the sample.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
The method for continuously using a separation medium according to the present invention includes a separation medium filling step of filling a capillary with the separation medium, a first pre-run step of performing a pre-run, a first sample injection step of injecting a first-time sample into the capillary, a first electrophoretic step of applying a voltage to perform first electrophoresis, a second pre-run step of performing a pre-run after the first electrophoretic step, a second sample injection step of injecting a next-time sample into the capillary subjected to the second pre-run step, and a second electrophoretic step of performing next electrophoresis, and the method repeatedly performs the second pre-run step, the second sample injection step, and the second electrophoretic step a preliminarily set number of times.
Provided is a charged particle beam device for which the optical axis can be adjusted. The charged particle beam device comprises: a beam source that emits a charged particle beam with which a sample is irradiated; a deflector that deflects the charged particle beam; an objective lens that focuses the charged particle beam on a surface of the sample; a detector that detects secondary particles emitted from the sample in response to being irradiated with the charged particle beam; and a control unit that generates an observation image of the sample on the basis of a detection signal output from the detector and controls each unit. The charged particle beam device is characterized in that the control unit adjusts an optical axis of the charged particle beam on the basis of an aberration image obtained in a state in which a deflection pivot point, which is an intersection between the central axis of the objective lens and the optical axis of the charged particle beam, is separated from the objective lens.
Provided is a technique (a semiconductor device manufacturing method and a plasma processing method) capable of selectively forming a protective film on a mask top and a mask top corner peripheral region of a pattern to be a hard mask formed on a film to be etched. Provided is a technique including: a first step of forming a protective film on a hard mask formed on a film to be etched; a second step of, after the first step, selectively removing the protective film formed on the film to be etched and containing a carbon element, with respect to the protective film on an upper portion of the hard mask and the protective film on a side wall of the hard mask; a third step of, after the second step, forming an SiN film on the protective film; a fourth step of, after the third step, selectively removing the SiN film formed on the protective film on the side wall of the hard mask and the SiN film on the film to be etched, with respect to the SiN film formed on the protective film on the upper portion of the hard mask; and a fifth step of, after the fourth step, plasma-etching the film to be etched.
The purpose of the present invention is to provide a data processing system capable of easily comparing results of clot waveform analysis. To this end, a data processing device according to the present invention comprises: a measurement unit that measures changes in light amount over time due to a coagulation reaction of a blood specimen of a patient; an analysis unit that analyzes a waveform obtained from measurement data by the measurement unit and estimates the pathological condition of the patient; and a display unit that displays, on the same screen, the estimation results of the pathological conditions for a plurality of the blood specimens. Preferably, the display unit displays, on the same screen, identification information for identifying the blood sample and a breakdown of the probability that the blood sample corresponds to each pathological condition.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
35.
Defect Inspecting Device, and Defect Inspecting Method
To provide a defect inspecting device and a defect inspecting method capable of performing the detection with high sensitivity by reducing an influence on a change in height of a sample surface. To achieve the above-mentioned object, a defect inspecting device includes: an illumination unit configured to irradiate a sample with light emitted from a light source; a detection unit configured to detect scattered light generated from the sample; a sample height detection unit configured to measure a variation amount of the sample in a direction perpendicular to a surface of the sample; a photoelectric conversion unit that converts the scattered light detected by the detection unit into an electric signal; and a signal processing unit configured to detect a defect of the sample by processing the electric signal converted by the photoelectric conversion unit, wherein the detection unit includes a mechanism that adjusts a position after an aperture is branched corresponding to the variation amount of the surface of the sample acquired by the sample height detection unit, and a mechanism that detects scattered light generated from the sample by branching the aperture at a plurality of detection elevation angles in a separated manner, and the signal processing unit includes a mechanism that corrects positions of a plurality of images formed by branching the aperture corresponding to the variation amount of the surface of the sample acquired by the sample height detection unit.
G01N 21/88 - Recherche de la présence de criques, de défauts ou de souillures
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
An identifier creating device performs update of an identifier, identification basis analyzation, and analysis of a misidentification cause, updates the identifier using results of the analysis, and thus achieves creation of an identifier allowing an object in an image to be identified with high accuracy. The identifier creating device acquires an objective image, extracts, using an identifier, feature amount of the objective image from the objective image, identifies, using the identifier, the objective image from the feature amount and determines an identification value, determines an identification basis using the feature amount and the identification value, determines a portion to be improved using the identification basis and a teacher image, and updates the identifier based on the portion to be improved.
G06V 20/69 - Objets microscopiques, p. ex. cellules biologiques ou pièces cellulaires
G06V 10/764 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant la classification, p. ex. des objets vidéo
G06V 10/77 - Traitement des caractéristiques d’images ou de vidéos dans les espaces de caractéristiquesDispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant l’intégration et la réduction de données, p. ex. analyse en composantes principales [PCA] ou analyse en composantes indépendantes [ ICA] ou cartes auto-organisatrices [SOM]Séparation aveugle de source
G16H 30/20 - TIC spécialement adaptées au maniement ou au traitement d’images médicales pour le maniement d’images médicales, p. ex. DICOM, HL7 ou PACS
G16H 30/40 - TIC spécialement adaptées au maniement ou au traitement d’images médicales pour le traitement d’images médicales, p. ex. l’édition
37.
DISTANCE MEASUREMENT METHOD, DISTANCE MEASUREMENT DEVICE, AND DISTANCE MEASUREMENT SYSTEM
Provided are a distance measurement device and a distance measurement method capable of reducing a distance error induced by polarization. A distance measurement method includes: branching light generated by a laser light source into a reference optical system and a measurement optical system; detecting a reference optical path measurement beat signal from reference light that passed through the reference optical system; detecting a measurement optical path measurement beat signal from measurement light obtained in the measurement optical system via a measurement target; and measuring a distance to the measurement target based on the measurement optical path measurement beat signal and the reference optical path measurement beat signal. A polarization-induced distance error reduction element is provided in one or both of the reference optical system and the measurement optical system.
G01S 17/32 - Systèmes déterminant les données relatives à la position d'une cible pour mesurer la distance uniquement utilisant la transmission d'ondes continues, soit modulées en amplitude, en fréquence ou en phase, soit non modulées
G01S 7/481 - Caractéristiques de structure, p. ex. agencements d'éléments optiques
38.
DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
A defect inspection device is provided including: a stage on which a sample is to be placed and moved; an illumination optical system configured to irradiate the sample with illumination light; a detection optical system configured to detect scattered light generated at the sample by forming an image of the scattered light on an image sensor; a control device configured to control the stage; and a signal processing device configured to process a signal output from the image sensor. The signal processing device stores detection signals obtained by scanning a predetermined region of interest on a surface of the sample a plurality of times along a scanning trajectory that has a shift amount of a non-integer multiple of a pixel pitch of the image sensor, estimates intensity distributions of the detection signals of the object in the region of interest in a plurality of scans, detects a shift amount of the scanning trajectory based on the intensity distributions, and aligns and synthesizes the intensity distributions in the plurality of scans based on the detected shift amount, and acquires a point spread function related to the object in a sub-pixel unit having a data interval smaller than the pixel pitch.
To estimate a defective consumable from among a plurality of consumables in a plunger pump, or to estimate a defective plunger pump from among a plurality of plunger pumps. A liquid chromatograph includes: a double plunger pump including a first plunger pump, a second plunger pump, and a plurality of consumables; a pressure sensor configured to detect a pressure of a solvent discharged by the double plunger pump; a dispensing unit; a separation column; and a control unit configured to estimate a defective consumable among the plurality of consumables based on a first pressure detected by the pressure sensor in a first section in which the first plunger pump discharges the solvent into a flow path and a second pressure detected by the pressure sensor in a second section in which the second plunger pump discharges the solvent into the flow path.
G01N 30/32 - Contrôle des paramètres physiques du fluide vecteur de la pression ou de la vitesse
G01M 3/28 - Examen de l'étanchéité des structures ou ouvrages vis-à-vis d'un fluide par utilisation d'un fluide ou en faisant le vide par mesure du taux de perte ou de gain d'un fluide, p. ex. avec des dispositifs réagissant à la pression, avec des indicateurs de débit pour tuyaux, câbles ou tubesExamen de l'étanchéité des structures ou ouvrages vis-à-vis d'un fluide par utilisation d'un fluide ou en faisant le vide par mesure du taux de perte ou de gain d'un fluide, p. ex. avec des dispositifs réagissant à la pression, avec des indicateurs de débit pour raccords ou joints d'étanchéité de tuyauxExamen de l'étanchéité des structures ou ouvrages vis-à-vis d'un fluide par utilisation d'un fluide ou en faisant le vide par mesure du taux de perte ou de gain d'un fluide, p. ex. avec des dispositifs réagissant à la pression, avec des indicateurs de débit pour soupapes
A first liquid holding portion is provided for holding a liquid. A first hole is disposed at a bottom surface of the first liquid holding portion, and a second hole is disposed at a surface of the first liquid holding portion, the surface being separate from the bottom surface. A second liquid holding portion is in communication with the first liquid holding portion through the first hole, and a third liquid holding portion is in communication with the first liquid holding portion through the second hole. A first filter is disposed at the first hole, and a second filter is disposed at the second hole.
B01D 29/52 - Filtres à éléments filtrants stationnaires pendant la filtration, p. ex. filtres à aspiration ou à pression, non couverts par les groupes Leurs éléments filtrants à plusieurs éléments filtrants caractérisés par leur agencement relatif montés en parallèle
B01D 29/05 - Filtres à éléments filtrants stationnaires pendant la filtration, p. ex. filtres à aspiration ou à pression, non couverts par les groupes Leurs éléments filtrants avec des éléments filtrants plats avec des supports
B01D 29/60 - Filtres à éléments filtrants stationnaires pendant la filtration, p. ex. filtres à aspiration ou à pression, non couverts par les groupes Leurs éléments filtrants combinés dans une même structure à des dispositifs de commande de la filtration
B01D 29/90 - Filtres à éléments filtrants stationnaires pendant la filtration, p. ex. filtres à aspiration ou à pression, non couverts par les groupes Leurs éléments filtrants comportant des dispositifs d'alimentation ou d'évacuation d'alimentation
B01D 36/00 - Circuits ou combinaisons de filtres avec d'autres dispositifs de séparation
An electron beam application device according to the present invention is characterized by comprising: a photocathode 1 provided with a photoelectric film 10; a cathode heater 2 for heating the photocathode 1; an atomic hydrogen generating means 4 for generating atomic hydrogen by dissociating a hydrogen molecule; control means 7, 8 for controlling the surface cleaning of the surface of the photoelectric film 10; and a measuring means 18 for measuring the probe value of an electron beam probe 27 emitted from the photocathode 1. The present invention is further characterized in that, when the probe value measured by the measuring means 18 is lower than a predetermined value, the control means 7, 8 determine a surface cleaning condition of the photoelectric film 10, control the cathode heater 2 and the atomic hydrogen generating means 4 under the determined surface cleaning condition, and perform the surface cleaning of the surface of the photoelectric film 10.
A spectroscopic measurement device for a suspension liquid in the field of pharmaceutical products, foods, or chemistry which does not require taking out the suspension liquid from the inside of a pipe, and is capable of accurate measurement even when the device is attached to pipes of various shapes and materials; and a measurement condition adjustment method, The measurement device for measuring an optical spectrum of a liquid flowing in a pipe provided with a window material includes a measurement probe having a light irradiation unit and a light reception unit; and a movement mechanism for moving the measurement probe in rotation angle for changing the direction of the probe and a direction different from the axial direction of the pipe. The position of the measurement probe is adjusted using both or one of the S/N ratio and the intensity of the measured values at the wavelength of interest.
G01N 21/31 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique
An object of the invention is to provide a technique capable of appropriately selecting a measure with a high economic effect and an implementation timing thereof as a measure to be implemented when a secondary battery deteriorates. A battery deterioration degree management system according to the invention calculates a cost necessary for implementing a measure against a decrease of a state of health of a battery based on cost data describing a cost along with implementation of the measure, and determines the measure having a high economic effect and an implementation timing thereof based on the cost (see FIG. 4).
G06Q 30/0201 - Modélisation du marchéAnalyse du marchéCollecte de données du marché
B60L 58/12 - Procédés ou agencements de circuits pour surveiller ou commander des batteries ou des piles à combustible, spécialement adaptés pour des véhicules électriques pour la surveillance et la commande des batteries en fonction de l'état de charge [SoC]
B60L 58/16 - Procédés ou agencements de circuits pour surveiller ou commander des batteries ou des piles à combustible, spécialement adaptés pour des véhicules électriques pour la surveillance et la commande des batteries en fonction du vieillissement de la batterie, p. ex. du nombre de cycles de charge ou de l'état de santé [SoH]
G06Q 30/0283 - Estimation ou détermination de prix
Provided is an automatic analyzer capable of accurately detecting an abnormality during aspiration even when an amount of a reagent used for analysis is small. An automatic analyzer includes: a dispensing mechanism configured to dispense a reagent from a reagent container to a reaction container; a control unit configured to control the dispensing mechanism to aspirate an amount of the reagent used for analysis, the amount including at least a second predetermined amount in addition to a first predetermined amount, then discharge the second predetermined amount of the reagent to the reagent container, and then discharge the first predetermined amount of the reagent to the reaction container; and a pressure sensor configured to measure pressure in the dispensing mechanism. The control unit determines whether the reagent is normally aspirated based on a measurement value of the pressure sensor when the dispensing mechanism aspirates the reagent. When the first predetermined amount is equal to or larger than a first predetermined amount threshold value that is predetermined in advance, the second predetermined amount is a constant value regardless of the first predetermined amount. When the first predetermined amount is smaller than the first predetermined amount threshold value, the second predetermined amount is larger than the constant value.
G01N 35/10 - Dispositifs pour transférer les échantillons vers, dans ou à partir de l'appareil d'analyse, p. ex. dispositifs d'aspiration, dispositifs d'injection
As an etching method of an object to be processed, which is capable of protecting pores in a porous film and a joint referred to as a seam present in the porous film without requiring replacement of a plurality of gases, a plasma processing method for plasma etching a Low-k film having a void is provided in which plasma generated by a mixed gas of a fluorine element containing gas and a carbon element containing gas is used to etch the Low-k film containing a silicon element.
A system and method for detecting a shape defect that cannot be obtained by only planar dimension data, including a server configured to control an etching parameter to obtain a desired processing result of a semiconductor manufacturing apparatus based on correlation data between the etching parameter of the semiconductor manufacturing apparatus and a change amount between a target value and a feature of an etched shape formed on a sample, and the feature is a value obtained based on secondary electron data from a surface of the sample or interference light data from the surface of the sample. The feature may be a value obtained from a dimension of the etched shape of the sample based on the secondary electron data or the interference light data. The change amount of the feature may be a value of a spatial or temporal change.
Provided is an electrical characteristic inspection apparatus capable of inspecting and measuring electrical characteristics of a sample under a condition of an arbitrary application voltage value (bias voltage value) or application current value (bias current value). The electrical characteristic inspection apparatus comprises: a charged particle source that irradiates a measurement point set on a sample with a charged particle beam under a prescribed optical condition; a detector that detects a secondary electron current emitted by the irradiation of the measurement point with the charged particle beam and that outputs a detection signal; and a calculation device that comprises a processor and a storage. The storage stores a first application voltage value or a first application current value which is a desired value for a voltage value or a current value to be applied to the measurement point. The processor calculates, on the basis of the detection signal from the detector, a second application voltage value or a second application current value which is a voltage value or a current value estimated as being applied to the measurement point. The processor changes the prescribed optical condition so that the difference between the first application voltage value and the second application voltage value or the difference between the first application current value and the second application current value becomes small.
The purpose of the present invention is to provide a charged-particle beam device capable of quickly identifying a defect position in an observed image of a sample to improve inspection throughput. The charged-particle beam device according to the present invention comprises a database describing such combinations of wavelengths and polarization directions of light that the contrast in an observed image of a defect that a sample has can be enhanced, wherein: the sample is irradiated with the light using at least one of the combinations; the observed image is generated for each of the combinations; and the defect is detected using the observed image (see FIG. 7).
A defect inspection device includes an illumination unit that irradiates a sample with illumination light emitted from a light source; a detection unit that is disposed in an oblique direction with respect to the sample and detects scattered light generated from the sample; a pupil division mechanism that divides pupil of the detection unit into a first detection angle and a second detection angle; a first photoelectric conversion unit that converts scattered light at the first detection angle detected by the detection unit into an electrical signal; a second photoelectric conversion unit that converts scattered light at the second detection angle detected by the detection unit into an electrical signal; and a signal processing unit that processes the electrical signals converted by the first photoelectric conversion unit and the second photoelectric conversion unit to detect a defect in the sample, in which the pupil division mechanism divides the pupil such that pupil allocation corresponds to an inspection target or inspection conditions.
The present invention comprises: an X-ray tube 5; an X-ray detector 4; and a scattered ray correction unit 13 that calculates a first scattered ray from X-ray projection data captured by an X-ray imaging device using a point-symmetric scattering kernel, and calculates a second scattered ray from the first scattered ray on the basis of the thickness of a subject to be imaged. The present invention calculates corrected X-ray projection data from the X-ray projection data and the second scattered ray, and reconstructs CT. The present invention thereby provides an arithmetic processing device, a radiation imaging device, an X-ray CT device, and a radiotherapy system with which it is possible to acquire X-ray projection data in which the degradation in image quality due to scattered rays is reduced without increasing calculation time compared to the prior arts.
A61B 6/00 - Appareils ou dispositifs pour le diagnostic par radiationsAppareils ou dispositifs pour le diagnostic par radiations combinés avec un équipement de thérapie par radiations
A container storage device capable of reducing a burden on a worker related to carry-in and carry-out of a liquid is provided. The container storage device includes a storage unit that stores containers each storing a liquid, and a control unit that controls the storage unit. When a new container is to be carried-in, the control unit performs a control such that a container, which is a carry-out candidate, is selected from the containers stored in the storage unit, the selected container is carried-out, and the new container is carried-in.
B65G 1/137 - Dispositifs d'emmagasinage mécaniques avec des aménagements ou des moyens de commande automatique pour choisir les objets qui doivent être enlevés
53.
Method for Measuring Semiconductor Device, System for Measuring Semiconductor Device, and Display Apparatus
This method for measuring a semiconductor device includes: preparing a semiconductor device 600 which includes a first structure 611 produced by a first manufacturing step, and a second structure 604 which is provided under the first structure 611 and is produced by a second manufacturing step performed after the first manufacturing step; removing the first structure 611 of the semiconductor device 600 by chemical reaction; irradiating the semiconductor device 600 from which the first structure 611 has been removed with a charged particle beam from above; and measuring a feature amount (amount of recess) of the second structure 604 using information acquired by the irradiation with the charged particle beam.
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
To implement a composite beam apparatus 10 capable of reducing a size of a gas ion beam lens barrel while removing neutral particles generated by a gas ion source. The composite beam apparatus 10 includes a focused ion beam device 14, an electron beam device 15, and a low-acceleration gas ion beam device 18. The low-acceleration gas ion beam device 18 includes a gas ion source 30, an ion beam deflection unit 31 connected to the gas ion source 30, and an ion beam housing 32 connected to the ion beam deflection unit 31 via a bent portion 26. The ion beam deflection unit 31 and the ion beam housing 32 are connected and inclined to each other via the bent portion 26.
H01J 37/30 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p. ex. dispositif électronoptique, dispositif ionoptique
The electrophoresis device includes a capillary, a container containing a sample, a stage, and a drive portion for driving the stage as well as an engagement member, and a toggle mechanism for toggling the states of the engagement member. Over a trajectory of the stage, one side includes a transfer area capable of transferring the container to the stage. The other side includes a connection area capable of connecting and removing the capillary to/from the container. The toggle mechanism toggles the states of the engagement member in conjunction with the movement of the stage. The disengaged state is activated when the stage is located on one side. The engaged state is activated when the stage is located on the other side. The stage moves horizontally while maintaining the engaged state on one side and maintaining the disengaged state on the other side.
An image processing device includes an input unit to receive an input image, a feature amount extraction unit to extract a feature amount from the input image, an object region detection unit to detect an object region in the image through use of the feature amount, an object end-point estimation unit to estimate coordinates of an end point of an object in the object region, an object bridging unit to calculate a trajectory complementing a space between end points in two object regions on the input image, a same-object determination unit to determine, from luminance value transition on the trajectory, whether the two object regions are included in the same object, an object region correction unit to correct the object region output by the object region detection unit based on a determination result output by the same-object determination unit, and an output unit to output the corrected object region.
G06V 10/26 - Segmentation de formes dans le champ d’imageDécoupage ou fusion d’éléments d’image visant à établir la région de motif, p. ex. techniques de regroupementDétection d’occlusion
G06V 10/60 - Extraction de caractéristiques d’images ou de vidéos relative aux propriétés luminescentes, p. ex. utilisant un modèle de réflectance ou d’éclairage
G06V 10/82 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant les réseaux neuronaux
57.
MEDICAL EXAMINATION TIME PREDICTION SYSTEM, MEDICAL EXAMINATION TIME PREDICTION METHOD FOR SAME, AND DISPLAY DEVICE
This medical examination time prediction system comprises: a storage device that stores, for each reception number, specimen attribute information of a subject patient, the progression of a plurality of steps from reception in a facility to calling in a medical examination, and result information relating to the specimen; and a processing device that calculates, using the specimen attribute information and a learning model constructed from the result information, a predicted time for each medical examination step including a medical examination calling time of the subject patient for whom a prediction is to be made. The result information for constructing the learning model includes urgency information indicating whether examination of the specimen is urgent, and the specimen attribute information includes the urgency information of the subject patient. When calculating the predicted time of the subject patient after receiving the specimen of the subject patient, the processing device inputs information including the subject patient urgency information to the learning model to calculate the predicted time, and stores the predicted time in the storage device.
G16H 40/20 - TIC spécialement adaptées à la gestion ou à l’administration de ressources ou d’établissements de santéTIC spécialement adaptées à la gestion ou au fonctionnement d’équipement ou de dispositifs médicaux pour la gestion ou l’administration de ressources ou d’établissements de soins de santé, p. ex. pour la gestion du personnel hospitalier ou de salles d’opération
58.
DATA PROCESSING METHOD, ANALYSIS SYSTEM, AND AUTOMATED ANALYZING DEVICE
An objective of the present invention is to provide a data processing method, an analysis system, and an automated analysis system capable of estimating coagulation ability with a high degree of accuracy. To this end, a data processing method according to the present invention comprises: an analysis value acquisition step for acquiring an analysis value relating to coagulation ability on the basis of measured data that change over time in association with a coagulation reaction of a patient's blood sample; and an analysis value adjustment step for adjusting the analysis value using characteristic information of the patient. Furthermore, an analysis system according to the present invention comprises an automated analysis device and a data processing device and the data processing device has: an analysis value acquiring unit that acquires an analysis value related to coagulation ability on the basis of the measured data received from the automated analysis device; and an analysis value adjusting unit that adjusts the analysis value using the characteristic information of the patient. Furthermore, an automated analyzing device according to the present invention comprises: an analyzing unit; an analysis value acquiring unit that acquires an analysis value relating to coagulation ability on the basis of the measured data from the analyzing unit; and an analysis value adjusting unit that adjusts the analysis value using the characteristic information of the patient.
G01N 33/86 - Analyse chimique de matériau biologique, p. ex. de sang ou d'urineTest par des méthodes faisant intervenir la formation de liaisons biospécifiques par ligandsTest immunologique faisant intervenir le temps de coagulation du sang
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Scientific research in the field of batteries; Scientific and technological services, namely, testing and research in the field of batteries; Research and development of new products for third parties in the field of plastic materials; Material testing and analysis; Quality control for others; Research and development of new products; Scientific and technological services, namely, analysis in the field of advanced materials and industrial manufacturing; Research in the field of artificial intelligence technology; Technology consultation in the field of artificial intelligence; Computer programming; Updating of computer software; Consultancy in the field of artificial intelligence (AI) technology; Providing temporary use of online non-downloadable computer software for analyzing data of scientific and technological , namely, patents, published papers, experimental data, manufacturing data and instrument-generated data in the field of advanced materials and industrial manufacturing; Artificial intelligence as a service (AIAAS) services featuring software using artificial intelligence (AI) for scientific and technological analysis; Software as a service (SAAS) services featuring software for analyzing scientific and technological data, namely, patents, published papers, experimental data, manufacturing data and instrument-generated data in the field of advanced materials and industrial manufacturing
60.
Charged Particle Beam Device and Method for Producing and Observing Sample Piece
Provided is a charged particle beam device which is capable of controlling a posture of a holder 6 capable of holding a plurality of carriers and which is capable of transporting the holder independently of a wafer stage 21. The charged particle beam device includes the wafer stage 21 configured to move with a wafer placed thereon, a needle configured to hold a sample piece separated and extracted from the wafer and transport the sample piece onto the plurality of carriers mounted on the holder, and a sub stage 22 configured to hold the holder and move independently of the wafer stage 21.
A mass spectroscope is capable of suppressing decreases in spectral sensitivity and resolution due to deformation during assembly of a multipole electrode. The mass spectroscope includes a multipole rod electrode having a plurality of rod pairs that are composed of pre-rods and main rods that are connected in the direction of an ion optical axis via an insulation member. In the multipole rod electrode, the pre-rods constitute pre-rod electrode portions, and the main rods constitute main rod electrode portions. The diameter of an inscribed circle on which the pre-rod electrode portions surround the ion optical axis is equal to the diameter of the inscribed circle on which the main rod electrode portions surround the ion optical axis, and the diameter of all of the pre-rods of the multipole rod electrode is greater than the diameter of the main rods connected to the pre-rods.
An automatic analyzer and a gripping apparatus are provided which include a gripping mechanism with reduced risks of breakage of components and a sample loss when reaction vessels filled with samples and reagents are transferred. An automatic analyzer 101 includes: a main body; an arm horizontally extending out from the main body and having a gripping unit located at a leading end thereof to grip a reaction vessel 122; and an abnormal downward movement sensing sensor 214 and an abnormal downward movement sensing plate 213 that detect whether the arm has caused a rotational movement vertically upward when the arm together with the main body moves downward.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
63.
Detector, Measurement Device, and Charged Particle Beam Apparatus
The detector includes a light emitting element configured to emit light due to collision of a quantum emitted from a sample by irradiating the sample with a beam, and a plurality of light receiving elements each configured to receive light generated by the light emitting element on a light receiving surface. The light receiving surface is disposed at a position farther from the beam than the light emitting element in a first direction intersecting an irradiation direction of the beam, the light receiving surface is disposed in a direction intersecting the irradiation direction of the beam, and the detector forms a first optical path that guides light in the first direction and a second optical path that guides light arriving via the first optical path toward the light receiving surface.
To provide an analyzing apparatus and a method of determining an abnormality capable of detecting abnormalities including defects and deterioration of replaceable components based on a potential difference generated between an ion selective electrode and a reference electrode, in an analyzing apparatus that measures a concentration of electrolytes in a sample, a waveform acquisition unit associates the acquired waveforms with each of driving timings, detects a peak of a waveform that appears in temporal vicinity of the driving timing, and calculates a feature amount. Here, the feature amount includes at least one of the electromotive force at the peak or a time period between a time of the driving timing and a time of occurrence of the peak. Then, the waveform analyzing unit determines an abnormality based on the feature amount.
The present invention provides a fuel cell that can secure an effective area of the fuel cell while suppressing a parasitic resistance of the fuel cell. In the fuel cell according to the present invention, a conductive substrate is disposed so as to contact a porous support layer at a location where a through-hole is not formed, and a structure allowing gas to flow in a direction orthogonal to an extending direction of the through-hole is formed at an interface between the conductive substrate and the porous support layer at the location (see FIG. 1).
H01M 8/0258 - CollecteursSéparateurs, p. ex. séparateurs bipolairesInterconnecteurs caractérisés par la configuration des canaux, p. ex. par le champ d’écoulement du réactif ou du réfrigérant
H01M 8/023 - CollecteursSéparateurs, p. ex. séparateurs bipolairesInterconnecteurs poreux et caractérisés par le matériau
H01M 8/0271 - Moyens d’étanchéité ou de support autour des électrodes, des matrices ou des membranes
66.
PRIMER, DNA DETECTION METHOD, AND DNA DETECTION KIT
The present invention relates to a primer, a DNA detection method, and a DNA detection kit for use in nucleic acid amplification, and particularly in asymmetric nucleic acid amplification. More specifically, this invention relates to a primer for introducing a mutation into a test nucleic acid and amplifying the test nucleic acid, the primer contains, in its sequence, a mutation to be introduced into the test nucleic acid, so as to increase a proportion of single-strand forming bases in a probe binding region of the nucleic acid amplified from the test nucleic acid, at a temperature of the binding of the nucleic acid amplified from the test nucleic acid with the probe; and, a DNA detection method and a DNA detection kit with use of such primer.
C12Q 1/686 - Réaction en chaine par polymérase [PCR]
C12Q 1/48 - Procédés de mesure ou de test faisant intervenir des enzymes, des acides nucléiques ou des micro-organismesCompositions à cet effetProcédés pour préparer ces compositions faisant intervenir une transférase
C12Q 1/6806 - Préparation d’acides nucléiques pour analyse, p. ex. pour test de réaction en chaîne par polymérase [PCR]
C12Q 1/6876 - Produits d’acides nucléiques utilisés dans l’analyse d’acides nucléiques, p. ex. amorces ou sondes
67.
SPECIMEN CONTAINER IMAGING DEVICE AND SPECIMEN PROCESSING APPARATUS
A sample tube imaging device and processing unit capable of imaging a sample tube and a sample while ensuring illuminance in a portion far from a light source of the sample tube are provided. A camera is provided on a side of a rack conveyor, which transfers a sample rack storing a sample tube, and captures an image of the sample tube. A light source is provided on a side of the rack conveyor on the same side as the camera and illuminates the sample tube from above. A reflective surface is located on a side opposite to the sample tube imaged by the camera with respect to an optical axis of the light source. The reflective surface folds back light emitted from the light source in a direction away from the sample tube and injects the light to a lower portion of the sample tube.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
An input unit (11) of a semiconductor knowledge provision system (100) receives input of question information related to a semiconductor-related device. A search unit (12) refers to a knowledge DB (13) storing semiconductor-related information about the semiconductor-related device, to acquire semiconductor-related information similar to the question information, and generates an extended prompt in which the question information and the semiconductor-related information are associated with each other. An answering LLM (14) refers to the semiconductor-related information about the semiconductor-related device on the basis of the generated extended prompt, and generates answer information to the question information. An output unit (15) outputs the generated answer information.
The present invention provides a communication resource planning method, a communication resource planning device, and a network system for control with which it is possible to improve communication efficiency, improve communication performance by reduction of communication overhead, and maintain, improve, and ensure reliability of an operating rate in response to changes in device configuration. The arrangement of a plurality of communication objects in a logical address space is planned as follows: on the basis of communication object configurations indicating a combination of two or more communication objects and defined by each of a plurality of control patterns indicating a series of operation patterns of one or more control devices, one communication object is selected on the basis of a predetermined criterion from among all the communication objects included in all the communication object configurations, the selected communication object is arranged in a logical address space, each of all the communication objects other than the arranged communication object is sequentially selected on the basis of a predetermined criterion and arranged in the logical address space so that the already arranged communication object has a position approximately at the center.
H04L 49/103 - Éléments de commutation de paquets caractérisés par la construction de la matrice de commutation en utilisant une mémoire tampon centrale partagéeÉléments de commutation de paquets caractérisés par la construction de la matrice de commutation en utilisant une mémoire partagée
Provided is an etching method which is suitable for the formation of a groove shape for a laminated film of a silicon oxide film and a silicon nitride film. This etching method includes: a step for mounting, on a wafer stage in a processing chamber, a wafer that is provided with a laminated film in which a silicon oxide films and a silicon nitride film are alternately laminated and in which a plurality of holes are formed; and a step for connecting the plurality of holes by supplying a hydrogen fluoride gas into the processing chamber and expanding the holes in the radial direction by etching the silicon oxide film and the silicon nitride film constituting the side walls of adjacent holes.
The present invention addresses the problem of specifying an abnormality occurrence place in a network of a distributed control system over a plurality of layers. In order to solve the problem, this distributed control system comprises: a plurality of master stations; a plurality of slave stations; hubs that connect master stations to each other; and a plurality of communication paths for connection between the master stations and the hubs, between the hubs, between the master stations and the slave stations, and between the slave stations, and is provided with a first network composed of the master stations and the hubs, and a second network composed of the master stations and the slave stations. An abnormality occurrence place of the first network is specified by sharing, between the master stations via the second network, communication state information including information relating to the master stations with which the master stations can communicate.
H04L 41/06 - Gestion des fautes, des événements, des alarmes ou des notifications
H04L 43/0811 - Surveillance ou test en fonction de métriques spécifiques, p. ex. la qualité du service [QoS], la consommation d’énergie ou les paramètres environnementaux en vérifiant la disponibilité en vérifiant la connectivité
72.
SPECIMEN CONVEYANCE DEVICE, CLEANING TOOL AND GRIPPING STATE CONFIRMATION TOOL USED IN SAME, AND GRIPPING STATE CONFIRMATION METHOD FOR SPECIMEN CONVEYANCE DEVICE
In order to provide a specimen conveyance device that minimizes the risk of tipping a specimen container and the like when transferring the specimen container, a cleaning tool and a gripping state confirmation tool for use in the specimen conveyance device, and a gripping state confirmation method for the specimen conveyance device, the present invention is configured as described below. This sample conveyance device is characterized by comprising: gripping parts that are brought into contact with a sample container when gripping the sample container; a plurality of gripping arms that grip the sample container and include the gripping parts; a gripping arm opening/closing mechanism that opens and closes the plurality of gripping arms; and a chuck movement mechanism that moves a sample container chuck mechanism in the vertical and horizontal directions. The specimen conveyance device is also characterized in that a cleaning tool having a cleaning member capable of sliding with the gripping parts is provided in a region in which the sample container chuck mechanism can be moved by the chuck movement mechanism at a position where the gripping parts are brought into contact with the cleaning tool when the gripping arm opening/closing mechanism closes the gripping arms.
Provided is an analyzer column cartridge that can control the temperature of an analysis column while saving resources and costs. An analyzer column cartridge 1 includes: metal blocks 7, 8 that accommodate an analysis column 10 used in a liquid chromatography; and housings 2, 3 that accommodate the metal blocks 7, 8. A plurality of holes 11A, 11B, 11C, 11D, and 11E that communicate with an accommodation space of the analysis column 10 are formed in the metal block 8. The housing has a plurality of windows 6A, 6B, 6C, 6D, and 6E formed at positions facing the plurality of holes 11A, 11B, 11C, 11D, and 11E formed in the metal block 8.
B01D 15/16 - Adsorption sélective, p. ex. chromatographie caractérisée par des caractéristiques de structure ou de fonctionnement relatives au conditionnement du fluide vecteur
An automatic analyzer includes a dispensing nozzle which dispenses a specimen or a reagent, and a nozzle washing tank which washes the dispensing nozzle. The nozzle washing tank includes a spraying portion spraying washing water to the dispensing nozzle and an opening for taking the dispensing nozzle in and out, and the opening is provided along a track in a horizontal plane of the dispensing nozzle on a side surface of the nozzle washing tank.
G01N 35/10 - Dispositifs pour transférer les échantillons vers, dans ou à partir de l'appareil d'analyse, p. ex. dispositifs d'aspiration, dispositifs d'injection
75.
SHAPE MEASUREMENT DEVICE AND SHAPE MEASUREMENT METHOD
The shape of an object is measured with high accuracy by a probe having a measurement light optical path switching element including a first surface on which the measurement light from an optical element is incident, a second surface that reflects the measurement light incident from the first surface, a third surface that emits the measurement light reflected by the second surface to an object, a fourth surface that is in contact with the second surface, and a fifth surface that emits the measurement light having passed through the second surface to the object. An angle between a normal of the second surface and a rotation axis of the probe is greater than 45 degrees, an angle between a normal of the third surface and the rotation axis is less than 90 degrees, and a normal of the fifth surface is not parallel to the rotation axis.
An object of the invention is to provide a technique capable of determining a state of a battery at high speed and in detail. A battery diagnosis device according to the invention determines whether a battery is in a first state based on a first difference in battery voltage within 4 msec from an end time point at which charging or discharging of the battery is ended, and further determines whether the battery is in a second state based on a second difference in battery voltage thereafter (see FIG. 3).
G01R 31/392 - Détermination du vieillissement ou de la dégradation de la batterie, p. ex. état de santé
G01R 31/374 - Dispositions pour le test, la mesure ou la surveillance de l’état électrique d’accumulateurs ou de batteries, p. ex. de la capacité ou de l’état de charge avec des moyens pour corriger la mesure en fonction de la température ou du vieillissement
G01R 31/3835 - Dispositions pour la surveillance de variables des batteries ou des accumulateurs, p. ex. état de charge ne faisant intervenir que des mesures de tension
G01R 31/389 - Mesure de l’impédance interne, de la conductance interne ou des variables similaires
H01M 10/42 - Procédés ou dispositions pour assurer le fonctionnement ou l'entretien des éléments secondaires ou des demi-éléments secondaires
There are provided a conveyance container provided with a permanent magnet, a plurality of coils that generate thrust for conveying the conveyance container, a drive unit that applies a voltage to each of the plurality of coils, a position detection unit that estimates a position of the conveyance container by estimating a position of the permanent magnet based on current information when a voltage pulse is applied to the coil, a sensing unit that detects the position of the conveyance container by a method other than magnetic field detection, and a control unit that controls the drive unit that drives based on position information of the conveyance container estimated by the position detection unit 30a or detected by the sensing unit. Accordingly, a conveyance device and a conveyance method capable of improving conveyance efficiency compared to a configuration in related art can be provided.
Provided is a technique capable of realizing more efficient inspection processing when an inspection system has a plurality of devices. An inspection in the inspection system is implemented as an inspection processing sequence performed by, for example, a first type device, a second type device, and a third type device. The first type device, the second type device, and the third type device each include one or more devices. As the inspection processing sequence, the inspection system produces a thin piece from a sample at each portion of the inspection, transfers the thin piece to a carrier, and performs processing related to the inspection for each of the thin pieces on the carrier. The inspection management system grasps a device status of each device based on communication with each device, and based on an inspection instruction and the device status, selects, from a plurality of devices, each type of devices to be used in the inspection processing sequence and a time to be used for the devices, and creates a plan of the inspection processing sequence including the selected devices and time.
An object of the disclosure is to provide an insulator capable of shortening a conditioning time and reducing a withstand voltage failure when a voltage difference between electrodes is about several 10 kV. The insulator according to the disclosure includes an insulating material portion and a glass film, and a boundary between the insulating material portion and an end portion of a cathode on a side facing an anode is covered with the glass film
The present invention provides an insulator and the like capable of withstanding an acceleration voltage of 100,000 electron volts or more without using an acceleration tube having a multi-stage structure. An insulator 1 comprises: an insulation member 10; a cathode and an anode that are provided to the insulation member 10; and a metal film 13 that is provided to the surface of the insulation member 10. The metal film 13 has one or a plurality of metal films 13b with a surface resistance of 1012 Ω/sq to 1015 Ω/sq between the cathode and the anode.
The invention provides a technique capable of improving efficiency and the like of inspection processing including a transfer processing operation for a plurality of sites of a plurality of wafers in an inspection system. An inspection system 1 performs an inspection processing sequence including processing of producing a thin piece from a sample (a wafer) for each side which is an inspection target location, transferring the thin piece to a carrier, and inspecting each thin piece on the carrier. An inspection management system 2 creates instruction information including an instruction of an order of transfer and the transfer destination carrier for a processing operation of taking out a plurality of the thin pieces from a plurality of the sites of a plurality of the samples and transferring the thin pieces to a plurality of the carriers, which is instruction information related to a processing operation of the inspection processing sequence of the inspection system 1.
This charged particle beam device includes: a charged particle gun (100) that comprises a charged particle source (101); and a charged particle optical system that focuses a charged particle beam (110) from the charged particle gun (100) onto a sample, wherein: the charged particle gun (100) comprises a first electrode (102) positioned below the charged particle source (101) and an acceleration electrode (104) positioned below the first electrode (102); an optic axis is included between the first electrode (102) and the acceleration electrode (104); and an equipotential space is formed that is equipotential to the voltage of the first electrode (102) in the traveling direction of the charged particles from the charged particle source (101) or has a constant voltage difference with respect to the voltage of the first electrode (102). The charged particle optical system comprises a magnetic field lens (105) disposed so that the primary surface thereof crosses the equipotential space.
This semiconductor device measurement method comprises: preparing model data 5 representing a semiconductor device 2, in which a first parameter 51 representing a characteristic of a lower layer structure 22 is known; preparing a plurality of measurement conditions A-C for a measurement device 3; performing a simulation per each of the plurality of measurement conditions using the model data 5, and acquiring simulation results (images A-C) including at least one among an image or a signal waveform obtained when the semiconductor device represented by the model data 5 is irradiated with a charged particle beam; and comparing the first parameter 51 and a plurality of second parameters A-C, corresponding to characteristics of the lower layer structure, derived from each of the plurality of simulation results, and presenting a recommended measurement condition, from among the plurality of measurement conditions, which is recommended for measuring the semiconductor device.
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p. ex. la microscopie électronique à balayage [SEM]
84.
Piercing Mechanism and Automatic Analyzer Provided With Same
According to the invention, a cut can be formed in a desired position range of a lid of a reagent bottle even in a state in which a distal end of a needle holder approaches an edge portion of the lid from a center of a recess of the lid of the reagent bottle. A piercing mechanism includes: a needle; and a cylindrical needle holder configured to allow the needle to pass therethrough and hold the needle to be slidable in an axial direction. The needle holder is brought into contact with a reagent bottle put into an automatic analyzer, the needle is caused to protrude from the needle holder, and the needle pierces the reagent bottle to form a cut. The needle has, on an outer peripheral surface thereof, a protrusion that protrudes outward in a radial direction and that slides on an inner peripheral surface of the needle holder. The protrusion has a shape such that the protrusion is in point contact with the inner peripheral surface of the needle holder at a contact point when viewed in a cross section taken along a plane passing through a center line of the needle, and the needle is tiltable with respect to the needle holder.
G01N 35/10 - Dispositifs pour transférer les échantillons vers, dans ou à partir de l'appareil d'analyse, p. ex. dispositifs d'aspiration, dispositifs d'injection
An object of the present disclosure is to avoid a decrease in liquid height measurement accuracy due to deviation of a measurement device and lens aberration when measuring a biological sample having one or more component regions. A biological sample measurement device according to the present disclosure acquires a distortion coefficient and a liquid height conversion coefficient from a captured image of a calibrator having a pattern shape on a surface thereof, and corrects a liquid height of a sample based on the distortion coefficient and the liquid height conversion coefficient (see FIG. 1).
G01F 25/20 - Test ou étalonnage des appareils pour la mesure du volume, du débit volumétrique ou du niveau des liquides, ou des appareils pour compter par volume des appareils pour mesurer le niveau des liquides
86.
Container Storage Device, Container Conveying Method, and Analysis System
To provide a container storage device that reduces a decrease in processing capacity of an automatic analyzer to be connected and a delay in a measurement result of a measurement request sample and efficiently conveys the sample. A container storage device 1 includes a buffer 21 in which a rack 23 configured to accommodate a first container 22 and a second container 22 is placed, and a control unit 101. The control unit 101 includes a reception unit 102 configured to receive conveying commands for the first container 22 and the second container 22 from an analyzer 11, is configured to confirm whether a predetermined time elapses since the reception unit 102 receives the conveying command for the first container 22, and is configured to perform control such that when the conveying command for the second container 22 is received before the predetermined time elapses, the rack 23 on which the first container 22 and the second container 22 are placed is conveyed to the analyzer 11 at a timing at which the conveying command for the second container 22 is received, and when the conveying command for the second container 22 is not received even after the predetermined time elapses, the rack 23 on which the first container 22 is placed is conveyed to the analyzer 11.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
87.
INSPECTION MEASUREMENT SYSTEM AND SAMPLE INSPECTION MEASUREMENT METHOD
According to the present invention, a first transient response waveform, which is a detection signal waveform output from a detection system by irradiating a reference acquisition position on a sample with a pulse primary beam under a predetermined irradiation condition, and a second transient response waveform, which is a detection signal waveform output from the detection system by irradiating a measurement point on the sample with the pulse primary beam under the predetermined irradiation condition, are acquired, a third transient response waveform is generated by correcting the second transient response waveform on the basis of the first transient response waveform, and a sample potential waveform at the measurement point is obtained from the third transient response waveform by using a model. The second transient response waveform is a detection signal waveform output by a charged particle detector having sensitivity to the sample potential or a charged particle detector in which a detection condition having sensitivity to the sample potential is set, and the first transient response waveform is a detection signal waveform output by a charged particle detector not having sensitivity to the sample potential or a charged particle detector in which a detection condition not having sensitivity to the sample potential is set.
The present invention relates to a semiconductor device on which is mounted a Test Element Group (TEG) for which electrical properties of a main element will be inspected by an inspection device. The TEG has an evaluation element, and the evaluation element includes a main element and a sub-element. A first terminal of the main element is opened so as to allow irradiation by a pulsed charged particle beam, a second terminal of the main element is connected to a first terminal of the sub-element, and a second terminal of the sub-element is grounded. The electrical properties of the sub-element are designed such that combined electrical properties obtained by combining the electrical properties of the main element and the electrical properties of the sub-element are within a range of electrical properties that can be inspected by the inspection device.
The present disclosure improves sensitivity for determining normality/defect of an evaluation element having a main element, which is an inspection target, and a sub-element electrically connected to the main element. According to the present disclosure, a change characteristic is analyzed in which the luminance of an image of the evaluation element in an image of a sample acquired by scanning a pulsed charged particle beam over the sample under a predetermined irradiation condition and a predetermined intermittent condition changes depending on the irradiation condition or the intermittent condition of the pulsed charged particle beam, and a first feature amount and a second feature amount are extracted from the change characteristic. A setting is made as to which of the first feature amount and the second feature amount is a feature amount having a correlation with an electrical characteristic of the main element, and normality/defect of the evaluation element is determined on the basis of whichever of the first feature amount and the second feature amount is set as having the correlation with the electrical characteristic of the main element.
The present invention comprises: a plurality of cores 24 that comprise magnetic bodies; a plurality of coils 25 that are respectively wound onto the plurality of cores 24; and a magnetic yoke 23 that is magnetically coupled to the plurality of cores 24, wherein a plurality of first direction magnetic yoke components, in each of which the magnetic yoke 23 and a plurality of the cores 24 are unified and said plurality of cores 24 are arranged in a row, and a plurality of second magnetic yoke components 233, which are arranged in a different direction from the first direction magnetic yoke components 231 and in each of which the magnetic yoke 23 and a plurality of the cores 24 are unified and said plurality of cores 24 are arranged in a row, are arranged in a lattice shape. Thus, provided are an electromagnetic conveyance tile, a conveyance device, and a conveyance system that have a structure with which the mass production workability of a set of electromagnets arranged in a lattice shape is improved in comparison to prior art, and highly accurate mass production is possible.
An input unit (11) of a semiconductor knowledge provision system (100) receives input of question information relating to a semiconductor-related device. A search unit (12) references a knowledge DB (13) in which semiconductor-related information regarding semiconductor-related devices is stored to acquire semiconductor-related information similar to the question information, and generates an extended prompt in which the question information and the semiconductor-related information are associated with each other. An answer LLM (14) refers to the semiconductor-related information regarding the semiconductor-related device on the basis of the generated extended prompt, and generates answer information for the question information. An output unit (15) outputs the generated answer information.
A charged particle beam apparatus processes a sample in which a plurality of layers including a specific layer are stacked. The charged particle beam apparatus includes a focused ion beam column, a charged particle beam column, and a processor. The charged particle beam apparatus executes processing of exposing the specific layer. The processor determines whether there is a defect based on reference data regarding the specific layer and the observation image after it is determined that the specific layer is exposed. When it is determined that there is a defect, the processor specifies a type of the defect based on an observation image of the sample by using a trained model. The charged particle beam apparatus executes different processing according to whether there is the defect and/or according to the specified type of the defect.
The present disclosure is directed to avoiding damaging an optical element during maintenance of a mass spectrometer, while enabling maintenance work. A mass spectrometer is provided with: a first vacuum chamber which houses a first multipolar electrode that transports sample ions ionized at an ion source; a second vacuum chamber which is adjacent to the first vacuum chamber and houses a second multipolar electrode that transports the sample ions output from the first vacuum chamber; a latter-stage vacuum chamber which houses at least a third multipolar electrode that transports the sample ions output from the second vacuum chamber; and a detector which is provided in the succeeding stage of the latter-stage vacuum chamber so as to detect the sample ions. This mass spectrometer is configured such that the first vacuum chamber can be separated from the second vacuum chamber, which is in the succeeding stage of the first vacuum chamber.
With a view to accurately sensing the abnormality of an abnormality monitored device, an abnormality sensing device that reads a first current value from a first current meter connected, between a physical path through which a voltage applied by a power source flows and the voltage source, in series with the physical path and the voltage source carries out a step (S103) for calculating a standard deviation of a first current value and a step (S104) for outputting occurrence of discharge at an insulated portion, which is a path other than the physical path, when the standard deviation is greater than a first threshold value which is a predetermined threshold value.
To provide a learning model matching region detection device, a learning model matching region detection method, and a learning model operation method that are suitable for verification and correction of a matching region of a learning model in machine learning. A learning model matching region detection device includes: an image quality improvement processing unit that converts a low-quality image into a quality-improved image as a high-quality image by using a learning model; a model matching region storage unit that stores a region of learned information as a model matching region in a learning step of the learning model; a model matching region accuracy verification unit that verifies accuracy of a measured value determined from the quality-improved image with reference to a measured value of the high-quality image; and a model matching region correction processing unit that corrects the model matching region in the model matching region storage unit by using the accuracy of accuracy improvement information detected by the model matching region accuracy verification unit.
An automatic analyzer executes automatic blank calibration to ensure device performance when automatic blank calibration is implemented, and measures change over time in a mixture liquid obtained by mixing a specimen and a reagent. The automatic analyzer has a reaction vessel capable of accommodating the specimen and the reagent, an analysis unit that measures the mixture liquid accommodated in the reaction vessel, and a control unit, wherein the control unit executes analysis preparation operations including a reaction chamber temperature detection operation for performing temperature control of the reaction vessel, and other operations, and confirms that the condition of the automatic analyzer is stable, before executing the automatic blank calibration.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
A placement table for placing the slide glass 1 transported by using a transport mechanism includes a base 21 having a flat plate shape, and a plurality of support portions 22 and a plurality of guide pins 23 provided on an upper surface of the base 21. The plurality of support portions 22 are provided to support a lower surface (1b) of the slide glass 1. The plurality of guide pins 23 are used to surround each side surface 1s of the slide glass 1 in a plan view. The plurality of guide pins 23 are each formed in a columnar shape, and are positioned closer to an outer peripheral side of the base 21 than the plurality of support portions 22.
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes Manipulation de matériaux à cet effet
To provide a nucleic acid quantification method and a reagent for quantifying nucleic acid that can quantify a proportion of a mutant-type base sequence to a wild-type base sequence contained in a sample with high accuracy, even when the mutant-type base sequence contained in the sample are present in extremely small amounts. A nucleic acid quantification method includes a step of amplifying polynucleotides using a wild-type primer set and a mutant-type primer set, and a step of fractionating the polynucleotides by electrophoresis, and a step of determining a proportion of the mutant-type polynucleotides to the wild-type polynucleotides. The wild-type forward primer has a base sequence complementary to a wild-type target base sequence at a 3′-terminal side, and the mutant-type forward primer has a base sequence complementary to a mutant target base sequence at a 3′-terminal side. The plurality of wild-type forward primers have mutually different molecular structures that result in different mobilities in the electrophoresis. The reagent for quantifying nucleic acid includes a plurality of wild-type forward primers, a mutant-type forward primer, and a reverse primer.
Provided is a charged particle beam device including: a sample chamber whose inside is in a vacuum state; a stage that is installed inside the sample chamber and holds a sample; a stage driving device that drives the stage; a charged particle beam irradiation optical system that irradiates the sample held on the stage with a charged particle beam; a needle that holds a sample piece extracted from the sample by the charged particle beam; and a manipulator that drives the needle, in which the manipulator includes a gripping mechanism that grips the needle, and an attachment and detachment driving device that drives the gripping mechanism to attach and detach the needle.
Provided is a charged particle beam device comprising: an image forming unit that forms a frame image, the frame image being a charged particle beam image based on a detection signal from a detector; and an image processing unit that performs image processing on the frame image, in which: the image forming unit acquires a plurality of frame images in an integration direction; and the image processing unit, for each pixel that constitutes the frame image, performs fitting using a model in which a change in an image brightness value of the pixel is designated, to obtain a brightness value change curve, and generates a fitted image in which the brightness values of the pixels are based on the brightness value change curve.
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
