J-solution Co., Ltd.

Republic of Korea

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        Patent 9
        Trademark 1
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        United States 7
        World 3
Date
2024 November 1
2024 1
2022 2
2021 2
2020 1
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IPC Class
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components 4
F16L 53/38 - Ohmic-resistance heating using elongate electric heating elements, e.g. wires or ribbons 2
B01D 53/00 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols 1
B01D 53/22 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by diffusion 1
B01D 53/34 - Chemical or biological purification of waste gases 1
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Status
Pending 1
Registered / In Force 9

1.

TOPUNI

      
Serial Number 98838591
Status Pending
Filing Date 2024-11-05
Owner J-solution Co,Ltd (Republic of Korea)
NICE Classes  ? 05 - Pharmaceutical, veterinary and sanitary products

Goods & Services

Odor neutralizing preparations for general use on various surfaces; Odor neutralizing preparations for use on shoes; Odor neutralizing sprays for shoes; Odor neutralizing wipes for shoes; Shoe deodorizers

2.

Gas leakage prevention cooling box for pipe flange connection and gas leakage sensing system

      
Application Number 17160799
Grant Number 11761841
Status In Force
Filing Date 2021-01-28
First Publication Date 2022-07-28
Grant Date 2023-09-19
Owner J-SOLUTION CO., LTD. (Republic of Korea)
Inventor Lee, Seungyong

Abstract

Disclosed is a gas leakage prevention cooling box for a pipe flange connection, which includes: a main body casing having an inner chamber in which connection flanges of a first pipe and a second pipe are located at a center portion of the main body casing, a pipe mounting hole in which the pipes connected around the flange are located on front and rear sides of the inner chamber, and a first half main body and a second half main body coupled to face to each other with the connection flanges of the first and second pipes therebetween and supported by the connection between the first pipe and the second pipe; and a cooling fan installed in the first half main body of the main body casing and configured to supply external air to the inner chamber.

IPC Classes  ?

  • G01M 3/04 - Investigating fluid tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
  • G08B 21/12 - Alarms for ensuring the safety of persons responsive to undesired emission of substances, e.g. pollution alarms

3.

Cobalt-carbon gas collection apparatus

      
Application Number 17139237
Grant Number 11517847
Status In Force
Filing Date 2020-12-31
First Publication Date 2022-06-30
Grant Date 2022-12-06
Owner J-SOLUTION CO., LTD. (Republic of Korea)
Inventor Lee, Seungyong

Abstract

Disclosed is a gas collection apparatus used in manufacturing a semiconductor. The apparatus includes: a housing having a chamber formed therein; a heating member installed in the housing to heat cobalt-carbon gas introduced into the chamber; a cobalt deposition member installed across the chamber of the housing to deposit cobalt composite; and a cooling member that induces carbon composite to be solidified and deposited while rapidly cooling the carbon composite.

IPC Classes  ?

  • B01D 8/00 - Cold trapsCold baffles
  • B01D 53/00 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
  • B01D 53/34 - Chemical or biological purification of waste gases
  • B01D 53/75 - Multi-step processes
  • B01D 53/81 - Solid phase processes

4.

Cooling water circulation system-integrated by-product collection apparatus

      
Application Number 17257401
Grant Number 11955351
Status In Force
Filing Date 2020-12-02
First Publication Date 2021-11-25
Grant Date 2024-04-09
Owner J-SOLUTION CO., LTD. (Republic of Korea)
Inventor Lee, Seungyong

Abstract

Disclosed is a by-product collection apparatus which collects a by-product generated during a manufacturing process of manufacturing a semiconductor or a semiconductor-like product. The apparatus includes: a by-product collection module connected to a pipeline in series and configured to collect a by-product from a by-product gas, wherein the by-product gas flows in the pipeline having an inlet pipe and an outlet pipe provided at upper and lower portions of a first casing; and a cooling water supply module including a cooling water tank and a cooling water pump in a second casing and configured to supply and recover cooling water to and from the by-product collection module through a cooling pipe.

IPC Classes  ?

  • B01D 53/22 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by diffusion
  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

5.

BYPRODUCT COLLECTION DEVICE INTEGRATED WITH COOLING WATER CIRCULATION SYSTEM

      
Application Number KR2020017495
Publication Number 2021/112569
Status In Force
Filing Date 2020-12-02
Publication Date 2021-06-10
Owner J-SOLUTION CO., LTD. (Republic of Korea)
Inventor Lee, Seungyong

Abstract

The present invention relates to a byproduct collection device capable of collecting byproducts generated during a manufacturing process of manufacturing semiconductors or semiconductor-like products, and to a byproduct collection device comprising: a byproduct collection module serially connected, by means of an inflow pipe and an outflow pipe respectively provided at the top and bottom of a first casing, to a pipe in which a byproduct gas flows, so as to collect byproducts from the byproduct gas; and a cooling water supply module including, in a second casing, a cooling water tank and a cooling water pump so as to supply the cooling water to the byproduct collection module through a cooling pipe and recover same.

IPC Classes  ?

  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
  • H01L 21/205 - Deposition of semiconductor materials on a substrate, e.g. epitaxial growth using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition

6.

Triple pipe heating device of easy installation for heating exhaust gas in semiconductor and LCD manufacturing process

      
Application Number 16607023
Grant Number 11480285
Status In Force
Filing Date 2018-03-27
First Publication Date 2020-02-13
Grant Date 2022-10-25
Owner J-SOLUTION CO., LTD. (Republic of Korea)
Inventor Lee, Seungyong

Abstract

The present invention relates to a triple pipe heating device for heating an exhaust gas in a semiconductor and LCD manufacturing process, which has a triple pipe structure capable of effectively heating an exhaust gas with only a small amount of heat without using nitrogen gas, is expandable and bendable so as to be easily installed, and is capable of quickly detecting exhaust gas leakage and overheating.

IPC Classes  ?

  • F16L 53/30 - Heating of pipes or pipe systems
  • F16L 53/38 - Ohmic-resistance heating using elongate electric heating elements, e.g. wires or ribbons
  • F16L 9/18 - Double-walled pipesMulti-channel pipes or pipe assemblies
  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

7.

TRIPLE PIPE HEATING DEVICE OF EASY INSTALLATION FOR HEATING EXHAUST GAS IN SEMICONDUCTOR AND LCD MANUFACTURING PROCESS

      
Application Number KR2018003617
Publication Number 2019/004566
Status In Force
Filing Date 2018-03-27
Publication Date 2019-01-03
Owner J-SOLUTION CO., LTD. (Republic of Korea)
Inventor Lee, Seungyong

Abstract

The present invention relates to a triple pipe heating device for heating an exhaust gas in a semiconductor and LCD manufacturing process, which has a triple pipe structure capable of effectively heating an exhaust gas with only a small amount of heat without using nitrogen gas, is expandable and bendable so as to be easily installed, and is capable of quickly detecting exhaust gas leakage and overheating.

IPC Classes  ?

  • H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
  • F16L 53/38 - Ohmic-resistance heating using elongate electric heating elements, e.g. wires or ribbons

8.

Energy-saving silencer assembly, a semiconductor manufacturing vacuum pump with same and method for heating nitrogen gas

      
Application Number 13978234
Grant Number 09422929
Status In Force
Filing Date 2011-12-28
First Publication Date 2013-10-31
Grant Date 2016-08-23
Owner J-SOLUTION CO., LTD. (Republic of Korea)
Inventor Lee, Seung Yong

Abstract

The disclosure relates to an energy-saving silencer assembly, which includes: a silencer connected to a discharge side of a pump section, which pumps reaction by-product gas into a vacuum pump, so as to pass the pumped reaction by-product gas from a rear end portion to a front end portion; an outer pipe surrounding the outer peripheral surface of the silencer at an interval so as to provide a heating space between the silencer and the outer pipe; a nitrogen gas supply section for supplying nitrogen gas to the heating space; and a nitrogen gas injection section for injecting heated nitrogen gas to the inside of the silencer by the contact with the outer peripheral surface of the silencer in the heating space.

IPC Classes  ?

  • F04B 39/00 - Component parts, details, or accessories, of pumps or pumping systems specially adapted for elastic fluids, not otherwise provided for in, or of interest apart from, groups
  • F24H 3/12 - Air heaters with additional heating arrangements
  • F01N 5/02 - Exhaust or silencing apparatus combined or associated with devices profiting by exhaust energy the devices using heat
  • F28D 7/02 - Heat-exchange apparatus having stationary tubular conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall the conduits being helically coiled
  • F04D 19/04 - Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
  • F04D 29/66 - Combating cavitation, whirls, noise, vibration, or the likeBalancing
  • F28D 7/10 - Heat-exchange apparatus having stationary tubular conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall the conduits being arranged one within the other, e.g. concentrically

9.

Exhaust pressure detector

      
Application Number 13087973
Grant Number 08383428
Status In Force
Filing Date 2011-04-15
First Publication Date 2012-10-18
Grant Date 2013-02-26
Owner J-Solution Co., Ltd. (Republic of Korea)
Inventor Lee, Seung Yong

Abstract

An exhaust pressure measuring device including a connection pipe connected to a middle of an exhaust line for carrying byproduct gas, the connection pipe having an opening formed in a middle of a body thereof; a chamber provided at an outer side of the connection pipe and communicating with an inside of the connection pipe through the opening, the chamber having a nitrogen supply line connected thereto, the nitrogen supply line allowing nitrogen gas to be supplied from the outside; and a pressure sensor installed to the chamber to measure pressure in the chamber, whereby a change of exhaust pressure in the exhaust line is measured from the measured pressure in the chamber.

IPC Classes  ?

  • H01L 21/00 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid-state devices, or of parts thereof

10.

ENERGY-SAVING SILENCER ASSEMBLY, A SEMICONDUCTOR MANUFACTURING VACUUM PUMP WITH SAME AND METHOD FOR HEATING NITROGEN GAS

      
Application Number KR2011010229
Publication Number 2012/093802
Status In Force
Filing Date 2011-12-28
Publication Date 2012-07-12
Owner J-SOLUTION CO., LTD. (Republic of Korea)
Inventor Lee, Seung Yong

Abstract

The present invention pertains to an energy-saving silencer assembly, a semiconductor manufacturing vacuum pump with the same and a method for heating nitrogen gas. Nitrogen gas is heated using the high temperature of the surface of a silencer and supplied to the inside of the silencer so as to resolve blockage problems due to the solidification of reaction by-products while saving energy costs due to the use of additional heat sources. The energy-saving silencer assembly in the present invention as above includes: a silencer connected to a discharge side of a pump section, which pumps reaction by-product gas into a vacuum pump, so as to pass the pumped reaction by-product gas from a rear end portion to a front end portion; an outer pipe surrounding the outer peripheral surface of the silencer at an interval so as to provide a heating space between the silencer and the outer pipe; a nitrogen gas supply section for supplying nitrogen gas to the heating space; and a nitrogen gas injection section for injecting heated nitrogen gas to the inside of the silencer by the contact with the outer peripheral surface of the silencer in the heating space.

IPC Classes  ?

  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof