Master Dynamic Limited

The Hong Kong Special Administrative Region of the People's Republic of China

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IPC Class
G04B 17/06 - Oscillators with hairsprings, e.g. balance 3
B42D 25/435 - Marking by removal of material using electromagnetic radiation, e.g. laser 2
A01N 33/12 - Quaternary ammonium compounds 1
A01N 37/02 - Saturated carboxylic acids or thio-analogues thereofDerivatives thereof 1
A01N 43/16 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atom with one hetero atom six-membered rings with oxygen as the ring hetero atom 1
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Status
Pending 4
Registered / In Force 9
Found results for  patents

1.

METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD

      
Application Number 18417804
Status Pending
Filing Date 2024-01-19
First Publication Date 2024-11-21
Owner Master Dynamic Limited (China)
Inventor
  • Yiu, Yau Chuen
  • Cheng, Ka Wing
  • Hui, Koon Chung

Abstract

A process of forming a non-optically detectable authentication marking (210,320, 410,535) in a diamond (200,300). Authentication marking (210,320,410,535) is formed adjacent the outer surface of an article formed from a diamond material having intrinsic optical centers. Method includes the step of applying an image of predesigned authentication marking (210,320,410,535) to a region (201,310,530) of a diamond (200,300) at or adjacent the surface of the diamond (200,300) by way of a direct laser writing; wherein the fluorescence background of the diamond material from intrinsic optical center is suppressed by authentication marking (210,320, 410, 535) under fluorescent imaging, such that the non-optically detectable identifiable authentication marking (210,320,410,535) is viewable against the fluorescence background at the region (201,310,530) of the diamond (200,300) where the authentication marking (210,320,410,535) is applied.

IPC Classes  ?

  • B23K 26/359 - Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
  • B23K 26/06 - Shaping the laser beam, e.g. by masks or multi-focusing
  • B23K 26/0622 - Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece
  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • G06V 20/80 - Recognising image objects characterised by unique random patterns

2.

IMAGING PROCESS AND SYSTEM

      
Application Number 17919406
Status Pending
Filing Date 2021-04-16
First Publication Date 2023-06-01
Owner MASTER DYNAMIC LIMITED (China)
Inventor
  • Yiu, Yau Chuen
  • Hui, Koon Chung
  • Mok, Yan Yan

Abstract

A system (300) for providing a three-dimensional computer tomography image of a gemstone, the system (300) comprising an X-ray source (330) for providing an X-ray towards a gemstone (320); an X-ray detector system for detecting X-rays transmitted through or diffracted by the gemstone (320). The X-ray detector system surrounds the gemstone (320) and detects a three-dimensional multi-angle X-ray diffraction pattern from the gemstone (320) upon rotation of the gemstone (320) within the X-ray field, and provides an output signal therefrom, wherein the output signal provides for invasive three-dimension multiangle X-ray diffraction reconstructed computed tomography from the three-dimension multiangle X-ray diffraction pattern.

IPC Classes  ?

  • G01N 33/38 - ConcreteLimeMortarGypsumBricksCeramicsGlass
  • G01N 23/046 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]
  • G01N 23/20025 - Sample holders or supports therefor

3.

PROTECTIVE MASK, AIR FILTRATION ELEMENT AND AIR TREATMENT ELEMENT

      
Application Number 17799103
Status Pending
Filing Date 2021-02-11
First Publication Date 2023-04-06
Owner MASTER DYNAMIC LIMITED (China)
Inventor
  • Yiu, Yau Chuen
  • Cheng, Juan
  • Au, Chak Yeung
  • Tang, Wing Chi
  • Kong, Ching Tom

Abstract

A layer for a protective mask (100a, 100b, 200a) comprises at least a first sublayer (122b, 218b), wherein the first sublayer (122b, 218b) includes a first substrate and a layer of a plurality of nanoparticles (124b, 7) of a nanomaterial provided on the first substrate. The protective mask (100a, 100b, 200a) includes an outer layer (120b, 230a) which is made of an organic fibular network bonded with nanomaterials. An air filtration element (900, 1070, 1240) for attenuation of airborne contaminants includes negatively charged nanodiamonds (920, 1320). A filter (1100, 1200, 1500, 1600) for an air conditioning system (1130, 1530) or an air purifier (1230, 1630) comprises the air filtration element (900, 1070, 1240). An air treatment element (1140,1300,1540,1640) comprises nanodiamonds (920,1320) including colour centers. The protective mask (100a, 100b, 200a), the air filtration element (900, 1070, 1240), the air treatment element (1140,1300,1540,1640) and the filter (1100, 1200, 1500, 1600) overcome or at least partially ameliorate some of the deficiencies as associated with those of the prior art.

IPC Classes  ?

  • B01D 39/16 - Other self-supporting filtering material of organic material, e.g. synthetic fibres
  • A41D 13/11 - Protective face masks, e.g. for surgical use, or for use in foul atmospheres
  • B01D 39/18 - Other self-supporting filtering material of organic material, e.g. synthetic fibres the material being cellulose or derivatives thereof
  • A62B 23/02 - Filters for breathing-protection purposes for respirators

4.

Method of marking a diamond, markings formed from such methods and diamonds marked according to such method

      
Application Number 17624332
Grant Number 12030217
Status In Force
Filing Date 2020-07-24
First Publication Date 2022-09-01
Grant Date 2024-07-09
Owner MASTER DYNAMIC LIMITED (China)
Inventor
  • Yiu, Yau Chuen
  • Cheng, Ka Wing
  • Hui, Koon Chung

Abstract

A process of forming a non-optically detectable authentication marking (110), includes the step of: applying a marking at a surface of a diamond (200) using a focused ion beam (FIB) writing process so as to provide a non-optically detectable authentication marking (110) which is formed by alteration in the optical characteristics of a portion of the diamond material at the outer surface of the diamond to form a marked portion; wherein the marking is optically invisible, and wherein the marking is viewable by an imaging method which provides an observable contrast between the portion of the diamond having altered optical characteristics and the non-marked portion of the diamond. The marking process can assist in the prevention of the counterfeiting of precious articles, and be of assistance in the incident of theft. A marking, a diamond, a process of viewing a marking on a diamond are further disclosed.

IPC Classes  ?

  • B28D 5/04 - Fine working of gems, jewels, crystals, e.g. of semiconductor materialApparatus therefor by tools other than of rotary type, e.g. reciprocating tools
  • B42D 25/324 - Reliefs
  • B42D 25/435 - Marking by removal of material using electromagnetic radiation, e.g. laser

5.

CANCER CELL DETECTION AND IMAGING SYSTEM, PROCESS AND PRODUCT

      
Application Number 17254736
Status Pending
Filing Date 2019-06-21
First Publication Date 2021-06-10
Owner MASTER DYNAMIC LIMITED (China)
Inventor
  • Cheng, Ka Wing
  • Hui, Koon Chung
  • Kong, Ching Tom

Abstract

A method of distinguishing cancerous cells and healthy cells of a subject from each other comprises the steps: (i) contacting a region of tissue of a subject suspected of including at least some cancer cells with a plurality of nanodiamonds, wherein the plurality of nanodiamonds comprise a first plurality of conjugates, wherein the conjugates of the first plurality of conjugates consist of first nanodiamonds and one or more cancer cell targeting agents, wherein the first nanodiamonds have a first type of colour center, and a second plurality of conjugates, wherein the conjugates of the second plurality of conjugates consist of second nanodiamonds and one or more healthy cell targeting agents, wherein the second nanodiamonds have a second type of colour center; and (ii) applying light of a first wavelength so as to excite the first type of colour center and applying light of a second wavelength so as to excite the second type of colour center, wherein upon contacting the region of tissue with the plurality of nanodiamonds, cancer cells are adhered to the first plurality of conjugates, and healthy cells are adhered to the second plurality of conjugates; wherein upon applying light to the region of tissue, the colour centers of the nanodiamonds of the first plurality of conjugates adhered to cancer cells emit fluorescence at a first wavelength, and the colour centers of the nanodiamonds of the second plurality of conjugates adhered to healthy cells emit fluorescence at a second wavelength; and wherein the colour contrast between the two wavelengths and the positions of respective conjugates delineate the area of cancer cells and the area of healthy cells from each other.

IPC Classes  ?

  • G01N 33/574 - ImmunoassayBiospecific binding assayMaterials therefor for cancer
  • G01N 21/64 - FluorescencePhosphorescence
  • G01N 33/58 - Chemical analysis of biological material, e.g. blood, urineTesting involving biospecific ligand binding methodsImmunological testing involving labelled substances

6.

Process of forming an identification marking, and an identification marking formed by way of such a process

      
Application Number 15616600
Grant Number 09950553
Status In Force
Filing Date 2017-06-07
First Publication Date 2017-12-14
Grant Date 2018-04-24
Owner Master Dynamic Limited (Hong Kong)
Inventor
  • Miao, Zhuonan
  • Wang, Yingnan
  • Kong, Ching Tom

Abstract

A process of forming an identification marking within article formed from an at least partially optically transparent material for identification and validation, said process including the steps of (i) forming an indicia with an at least partially optically transparent material by way of subsurface laser engraving (SSLE); and (ii) forming a plurality of defects within or adjacent indicia within said at least partially optically transparent material resultant of the step of forming the indicia and from localized heating and irregularities in said at least partially optically transparent material, wherein said plurality of defects forms said identification marking.

IPC Classes  ?

  • B41M 3/14 - Security printing
  • B42D 25/328 - Diffraction gratingsHolograms
  • B42D 25/435 - Marking by removal of material using electromagnetic radiation, e.g. laser
  • B23K 26/00 - Working by laser beam, e.g. welding, cutting or boring
  • B41M 5/26 - Thermography

7.

Method of forming a marking on an article, and an article having a mark thereon

      
Application Number 15387518
Grant Number 10165836
Status In Force
Filing Date 2016-12-21
First Publication Date 2017-07-06
Grant Date 2019-01-01
Owner Master Dynamic Limited (Hong Kong)
Inventor
  • Wang, Yingnan
  • Kong, Ching Tom
  • Miao, Zhuonan

Abstract

A mold for imparting a marking including a requisite optical element has two and a half dimensions (2.5D) to the outer surface of an article formed from a ductile material. The mold includes a marking surface for imparting the mark to an outer surface of the article. That imparting is done by localized plastic deformation of the material from which the article is formed upon the mold and the article being urged against each other. The marking surface includes a micro-structure formed by an arrangement plural micro meter sized recessed or protruded entities. The entities are arranged in a predetermined arrangement in relation to each other, and the entities are arranged as a micro-structure having two and a half dimensions (2.5D). The entities are arranged in an inverse arrangement compared to the optical element, and to provide the recesses extending from the marking surface into the mold.

IPC Classes  ?

  • B32B 3/00 - Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shapeLayered products comprising a layer having particular features of form
  • A44C 27/00 - Making jewellery or other personal adornments
  • B21C 51/00 - Measuring, gauging, indicating, counting, or marking devices specially adapted for use in the production or manipulation of material in accordance with subclasses
  • B22C 9/22 - Moulds for peculiarly-shaped castings
  • B22D 19/00 - Casting in, on, or around, objects which form part of the product
  • B22D 23/00 - Casting processes not provided for in groups
  • B44B 5/02 - DiesAccessories
  • G02B 5/18 - Diffracting gratings

8.

Method of marking a solid state material, and solid state materials marked according to such a method

      
Application Number 15304843
Grant Number 10457089
Status In Force
Filing Date 2015-04-16
First Publication Date 2017-06-29
Grant Date 2019-10-29
Owner Master Dynamic Limited (Hong Kong)
Inventor
  • Wang, Yingnan
  • Kong, Ching Tom

Abstract

A method of forming a non-optically detectable identifiable mark at an outer surface of an article formed from a solid state material, said method including the steps of forming a plurality of recesses within a predetermined region of a photoresist 5 applied to an outer surface of an article formed from a solid state material, wherein said plurality of recesses is formed by two-photon absorption lithography and wherein said one or more recesses extend at least partially through the photoresist and from an outer surface of the photoresist and towards said outer surface of the article 10 formed from a solid state material; and applying an etching process such that at least a portion of the outer surface of said article is exposed and etched so as to form a plurality of etched portions extending into said article from the outer surface of the article and corresponding to said plurality of recesses; wherein said predetermined region of said photoresist defines an identifiable mark to be applied to the outer 15 surface of said article; wherein said plurality of etched portions forms the nonoptically identifiable mark on the outer surface of said article; and wherein the maximum width of the etched portions of is less than 200 nm such that the identifiable mark is non-optically detectable in the visible light spectrum.

IPC Classes  ?

  • B44C 1/22 - Removing surface-material, e.g. by engraving, by etching
  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
  • B28D 5/00 - Fine working of gems, jewels, crystals, e.g. of semiconductor materialApparatus therefor
  • H01J 37/32 - Gas-filled discharge tubes

9.

Apparatus, device and process for coating of articles

      
Application Number 15185119
Grant Number 11247227
Status In Force
Filing Date 2016-06-17
First Publication Date 2016-12-22
Grant Date 2022-02-15
Owner Master Dynamic Limited (Hong Kong)
Inventor
  • Wang, Yingnan
  • Miao, Zhuonan
  • Kong, Ching Tom

Abstract

An apparatus for coating at least a first plurality of articles each article thereof having at least a first surface to be coated is disclosed. The apparatus includes an emission source for directing emission elements towards the first surfaces of the plurality of articles, at least one support member for supporting the first plurality of articles, wherein support member supports the first plurality of articles such that the first surface is exposed to the path of emission from said emission source, and a drive assembly for moving the support member such that the first plurality of articles is moveable with respect to the path of emission from said emission source.

IPC Classes  ?

  • C23C 14/30 - Vacuum evaporation by wave energy or particle radiation by electron bombardment
  • B05D 1/38 - Successively applying liquids or other fluent materials, e.g. without intermediate treatment with intermediate treatment
  • B05D 3/10 - Pretreatment of surfaces to which liquids or other fluent materials are to be appliedAfter-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
  • C23C 14/14 - Metallic material, boron or silicon
  • C23C 14/22 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C 14/02 - Pretreatment of the material to be coated
  • A01N 37/02 - Saturated carboxylic acids or thio-analogues thereofDerivatives thereof
  • A01N 43/16 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atom with one hetero atom six-membered rings with oxygen as the ring hetero atom
  • A01N 33/12 - Quaternary ammonium compounds
  • C23C 14/50 - Substrate holders
  • C23C 14/34 - Sputtering
  • C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
  • C23C 16/503 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
  • C23C 16/505 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
  • C23C 16/511 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
  • C07C 323/52 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
  • C08J 3/24 - Crosslinking, e.g. vulcanising, of macromolecules
  • C08J 3/28 - Treatment by wave energy or particle radiation
  • C08J 7/18 - Chemical modification with polymerisable compounds using wave energy or particle radiation
  • C08L 5/08 - ChitinChondroitin sulfateHyaluronic acidDerivatives thereof
  • C08L 39/00 - Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogenCompositions of derivatives of such polymers
  • B05D 1/36 - Successively applying liquids or other fluent materials, e.g. without intermediate treatment
  • B05D 1/18 - Processes for applying liquids or other fluent materials performed by dipping

10.

Silicon hairspring

      
Application Number 15045159
Grant Number 09903049
Status In Force
Filing Date 2016-02-16
First Publication Date 2016-08-18
Grant Date 2018-02-27
Owner Master Dynamic Limited (Hong Kong)
Inventor
  • Ching, Ho
  • Ko, Pui Hang

Abstract

A torque-restoring element for an oscillator for a mechanical timepiece and having an oscillator frequency, said torque restoring element comprising a spiral spring body having a number N turnings with an inner terminal end for engagement with a rotational inertial element via a collet, and an outer terminal for engagement with a stationary cock element, and having a width, a height and a total arc length; wherein the spiral spring body includes a core formed from mono-crystalline silicon wafer oriented along the crystallographic axis <110>; and wherein the spiral spring body includes at least one peripheral coating of a material having a thermal elastic constant different from that of the core of the spiral spring body so as to maintain the oscillator frequency an oscillator including the torque-restoring element substantially insensitive to variations of ambient temperature.

IPC Classes  ?

  • G04B 17/22 - Compensation of mechanisms for stabilizing frequency for the effect of variations of temperature
  • C30B 29/06 - Silicon
  • G04B 17/06 - Oscillators with hairsprings, e.g. balance
  • C30B 33/12 - Etching in gas atmosphere or plasma
  • G04B 1/14 - MainspringsBridles therefor

11.

Silicon overcoil balance spring

      
Application Number 14444918
Grant Number 09411312
Status In Force
Filing Date 2014-07-28
First Publication Date 2015-01-29
Grant Date 2016-08-09
Owner Master Dynamic Limited (Hong Kong)
Inventor
  • Wang, Ying Nan
  • Ching, Ho

Abstract

A method of producing unitary formed silicon balance spring having an overcoil portion for regulation of a mechanical timepiece, said method including the steps of providing a silicon balance spring having a main body portion, and an outer portion for formation as an overcoil portion, wherein the outer portion extends radially outward from an outermost turn of the main body portion, and wherein said main body portion and said outer portion are integrally formed from a silicon based material and are formed in a co-planar configuration; moving said outer portion in a direction relative to and out of the plane of said main body portion, and in a direction towards over said main body portion and towards the plane of the main body portion; and providing a stress relaxation process to the balance spring so as to relieve internal stresses induced within the balance spring from step (ii); wherein upon movement of said outer portion into the plane of said main body portion, the outer portion is located in an overcoil configuration relative to said main body portion.

IPC Classes  ?

  • G04B 17/06 - Oscillators with hairsprings, e.g. balance
  • G04B 17/32 - Component parts or constructional details, e.g. collet, stud
  • G04D 3/00 - Watchmakers' or watch-repairers' machines or tools for working materials

12.

Stress-relief elastic structure of hairspring collet

      
Application Number 14154055
Grant Number 08882341
Status In Force
Filing Date 2014-01-13
First Publication Date 2014-07-17
Grant Date 2014-11-11
Owner Master Dynamic Limited (Hong Kong)
Inventor
  • Chu, Siu Kay
  • Ching, Ho
  • Ko, Pui Hang

Abstract

A hairspring collet for a hairspring for interference engagement and an interference fit with the cylindrical outer surface of the staff of a balance wheel for a timepiece movement, the hairspring collet portion comprising a plurality of circumferentially extending elastically deformable interconnected arm portions, the arm portions forming an annulus having a central axis and providing an aperture therebetween, wherein each arm portion including a curved concave engagement portion for engagement with the outer surface of a staff of a balance wheel, wherein each engagement portion has substantially the same radius of curvature as each other and are equally spaced from the central axis at a first distance and wherein the first distance is less than the radius of the staff of the balance wheel; the engagement portions have a radius of curvature such that upon deformation of the arm portions and engagement with the outer surface of the staff the engagement portions substantially conform with the outer surface of the staff and an interference fit is formed therebetween, wherein stress induced from said interference fit is transferred and distributed from along the engagement portions to the arm portions adjacent the engagement portions and distributed therein; and wherein the interference fit of the engagement portions with the staff substantially prevents relative movement between the hairspring collet and the staff of the balance wheel upon application of load from a hairspring in use in a timepiece movement.

IPC Classes  ?

  • G04B 17/04 - Oscillators acting by spring tension
  • G04B 17/34 - Component parts or constructional details, e.g. collet, stud for fastening the hairspring onto the balance

13.

Hairspring for a time piece and hairspring design for concentricity

      
Application Number 13944554
Grant Number 09658598
Status In Force
Filing Date 2013-07-17
First Publication Date 2014-01-23
Grant Date 2017-05-23
Owner MASTER DYNAMIC LIMITED (Hong Kong)
Inventor Ching, Ho

Abstract

A method of increasing concentricity in use of a spiral hairspring mechanical timepiece; the hairspring having an inner terminal end portion for engagement with a collet, an outer terminal end portion for engagement with a stud, a first limb portion extending from the inner terminal end portion towards the outer terminal end portion, and a stiffening portion positioned at the outer turn of the hairspring and having a cross-sectional second moment of area different to that of the first limb portion such that bending stiffness of the stiffening portion has a greater bending stiffness than the single limb portion. The method includes modifying cross-sectional second moments of an area of the first limb portion and the stiffening portion by minimizing a cost function throughout the amplitude of the rotation of hairspring in use, the cost function being correlated to the net concentricity of the hairspring.

IPC Classes  ?

  • G04B 17/06 - Oscillators with hairsprings, e.g. balance