A process of forming a non-optically detectable authentication marking (210,320, 410,535) in a diamond (200,300). Authentication marking (210,320,410,535) is formed adjacent the outer surface of an article formed from a diamond material having intrinsic optical centers. Method includes the step of applying an image of predesigned authentication marking (210,320,410,535) to a region (201,310,530) of a diamond (200,300) at or adjacent the surface of the diamond (200,300) by way of a direct laser writing; wherein the fluorescence background of the diamond material from intrinsic optical center is suppressed by authentication marking (210,320, 410, 535) under fluorescent imaging, such that the non-optically detectable identifiable authentication marking (210,320,410,535) is viewable against the fluorescence background at the region (201,310,530) of the diamond (200,300) where the authentication marking (210,320,410,535) is applied.
B23K 26/359 - Travail par rayon laser, p. ex. soudage, découpage ou perçage pour le traitement de surface en formant une ligne ou un motif linéaire, p. ex. une ligne en pointillés d'amorce de rupture
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/08 - Dispositifs comportant un mouvement relatif entre le faisceau laser et la pièce
B23K 26/082 - Systèmes de balayage, c.-à-d. des dispositifs comportant un mouvement relatif entre le faisceau laser et la tête du laser
G06V 20/80 - Reconnaissance des objets d’image caractérisés par des motifs aléatoires uniques
A system (300) for providing a three-dimensional computer tomography image of a gemstone, the system (300) comprising an X-ray source (330) for providing an X-ray towards a gemstone (320); an X-ray detector system for detecting X-rays transmitted through or diffracted by the gemstone (320). The X-ray detector system surrounds the gemstone (320) and detects a three-dimensional multi-angle X-ray diffraction pattern from the gemstone (320) upon rotation of the gemstone (320) within the X-ray field, and provides an output signal therefrom, wherein the output signal provides for invasive three-dimension multiangle X-ray diffraction reconstructed computed tomography from the three-dimension multiangle X-ray diffraction pattern.
G01N 23/046 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux en utilisant la tomographie, p. ex. la tomographie informatisée
G01N 23/20025 - Porte-échantillons ou leurs supports
3.
PROTECTIVE MASK, AIR FILTRATION ELEMENT AND AIR TREATMENT ELEMENT
A layer for a protective mask (100a, 100b, 200a) comprises at least a first sublayer (122b, 218b), wherein the first sublayer (122b, 218b) includes a first substrate and a layer of a plurality of nanoparticles (124b, 7) of a nanomaterial provided on the first substrate. The protective mask (100a, 100b, 200a) includes an outer layer (120b, 230a) which is made of an organic fibular network bonded with nanomaterials. An air filtration element (900, 1070, 1240) for attenuation of airborne contaminants includes negatively charged nanodiamonds (920, 1320). A filter (1100, 1200, 1500, 1600) for an air conditioning system (1130, 1530) or an air purifier (1230, 1630) comprises the air filtration element (900, 1070, 1240). An air treatment element (1140,1300,1540,1640) comprises nanodiamonds (920,1320) including colour centers. The protective mask (100a, 100b, 200a), the air filtration element (900, 1070, 1240), the air treatment element (1140,1300,1540,1640) and the filter (1100, 1200, 1500, 1600) overcome or at least partially ameliorate some of the deficiencies as associated with those of the prior art.
B01D 39/16 - Autres substances filtrantes autoportantes en substance organique, p. ex. fibres synthétiques
A41D 13/11 - Masques de protection du visage, p. ex. pour utilisation chirurgicale ou pour utilisation en atmosphère polluée
B01D 39/18 - Autres substances filtrantes autoportantes en substance organique, p. ex. fibres synthétiques la substance étant la cellulose ou ses dérivés
A62B 23/02 - Filtres en vue de la protection des voies respiratoires pour appareils respiratoires
4.
Method of marking a diamond, markings formed from such methods and diamonds marked according to such method
A process of forming a non-optically detectable authentication marking (110), includes the step of: applying a marking at a surface of a diamond (200) using a focused ion beam (FIB) writing process so as to provide a non-optically detectable authentication marking (110) which is formed by alteration in the optical characteristics of a portion of the diamond material at the outer surface of the diamond to form a marked portion; wherein the marking is optically invisible, and wherein the marking is viewable by an imaging method which provides an observable contrast between the portion of the diamond having altered optical characteristics and the non-marked portion of the diamond. The marking process can assist in the prevention of the counterfeiting of precious articles, and be of assistance in the incident of theft. A marking, a diamond, a process of viewing a marking on a diamond are further disclosed.
B28D 5/04 - Travail mécanique des pierres fines, pierres précieuses, cristaux, p. ex. des matériaux pour semi-conducteursAppareillages ou dispositifs à cet effet par outils autres que ceux du type rotatif, p. ex. par des outils animés d'un mouvement alternatif
A method of distinguishing cancerous cells and healthy cells of a subject from each other comprises the steps: (i) contacting a region of tissue of a subject suspected of including at least some cancer cells with a plurality of nanodiamonds, wherein the plurality of nanodiamonds comprise a first plurality of conjugates, wherein the conjugates of the first plurality of conjugates consist of first nanodiamonds and one or more cancer cell targeting agents, wherein the first nanodiamonds have a first type of colour center, and a second plurality of conjugates, wherein the conjugates of the second plurality of conjugates consist of second nanodiamonds and one or more healthy cell targeting agents, wherein the second nanodiamonds have a second type of colour center; and (ii) applying light of a first wavelength so as to excite the first type of colour center and applying light of a second wavelength so as to excite the second type of colour center, wherein upon contacting the region of tissue with the plurality of nanodiamonds, cancer cells are adhered to the first plurality of conjugates, and healthy cells are adhered to the second plurality of conjugates; wherein upon applying light to the region of tissue, the colour centers of the nanodiamonds of the first plurality of conjugates adhered to cancer cells emit fluorescence at a first wavelength, and the colour centers of the nanodiamonds of the second plurality of conjugates adhered to healthy cells emit fluorescence at a second wavelength; and wherein the colour contrast between the two wavelengths and the positions of respective conjugates delineate the area of cancer cells and the area of healthy cells from each other.
G01N 33/58 - Analyse chimique de matériau biologique, p. ex. de sang ou d'urineTest par des méthodes faisant intervenir la formation de liaisons biospécifiques par ligandsTest immunologique faisant intervenir des substances marquées
6.
Process of forming an identification marking, and an identification marking formed by way of such a process
A process of forming an identification marking within article formed from an at least partially optically transparent material for identification and validation, said process including the steps of (i) forming an indicia with an at least partially optically transparent material by way of subsurface laser engraving (SSLE); and (ii) forming a plurality of defects within or adjacent indicia within said at least partially optically transparent material resultant of the step of forming the indicia and from localized heating and irregularities in said at least partially optically transparent material, wherein said plurality of defects forms said identification marking.
A mold for imparting a marking including a requisite optical element has two and a half dimensions (2.5D) to the outer surface of an article formed from a ductile material. The mold includes a marking surface for imparting the mark to an outer surface of the article. That imparting is done by localized plastic deformation of the material from which the article is formed upon the mold and the article being urged against each other. The marking surface includes a micro-structure formed by an arrangement plural micro meter sized recessed or protruded entities. The entities are arranged in a predetermined arrangement in relation to each other, and the entities are arranged as a micro-structure having two and a half dimensions (2.5D). The entities are arranged in an inverse arrangement compared to the optical element, and to provide the recesses extending from the marking surface into the mold.
B32B 3/00 - Produits stratifiés comprenant une couche ayant des discontinuités ou des rugosités externes ou internes, ou une couche de forme non planeProduits stratifiés comprenant une couche ayant des particularités au niveau de sa forme
A44C 27/00 - Confection de bijoux ou d'autres articles de parure personnelle
B21C 51/00 - Dispositifs de mesure, de calibrage, d'indication, de comptage ou de marquage, spécialement conçus pour être utilisés dans la production ou la manipulation des matériaux concernés par les sous-classes
B22C 9/22 - Moules pour pièces de forme particulière
B22D 19/00 - Coulée dans, sur, ou autour d'objets formant partie intégrante du produit final
B22D 23/00 - Procédés de coulée non prévus dans les groupes
A method of forming a non-optically detectable identifiable mark at an outer surface of an article formed from a solid state material, said method including the steps of forming a plurality of recesses within a predetermined region of a photoresist 5 applied to an outer surface of an article formed from a solid state material, wherein said plurality of recesses is formed by two-photon absorption lithography and wherein said one or more recesses extend at least partially through the photoresist and from an outer surface of the photoresist and towards said outer surface of the article 10 formed from a solid state material; and applying an etching process such that at least a portion of the outer surface of said article is exposed and etched so as to form a plurality of etched portions extending into said article from the outer surface of the article and corresponding to said plurality of recesses; wherein said predetermined region of said photoresist defines an identifiable mark to be applied to the outer 15 surface of said article; wherein said plurality of etched portions forms the nonoptically identifiable mark on the outer surface of said article; and wherein the maximum width of the etched portions of is less than 200 nm such that the identifiable mark is non-optically detectable in the visible light spectrum.
B44C 1/22 - Enlèvement superficiel de matière, p. ex. par gravure, par eaux fortes
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
B28D 5/00 - Travail mécanique des pierres fines, pierres précieuses, cristaux, p. ex. des matériaux pour semi-conducteursAppareillages ou dispositifs à cet effet
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
9.
Apparatus, device and process for coating of articles
An apparatus for coating at least a first plurality of articles each article thereof having at least a first surface to be coated is disclosed. The apparatus includes an emission source for directing emission elements towards the first surfaces of the plurality of articles, at least one support member for supporting the first plurality of articles, wherein support member supports the first plurality of articles such that the first surface is exposed to the path of emission from said emission source, and a drive assembly for moving the support member such that the first plurality of articles is moveable with respect to the path of emission from said emission source.
C23C 14/30 - Évaporation sous vide par énergie éléctromagnétique ou par rayonnement corpusculaire par bombardement d'électrons
B05D 1/38 - Applications successives de liquides ou d'autres matériaux fluides, p. ex. sans traitement intermédiaire avec traitement intermédiaire
B05D 3/10 - Traitement préalable des surfaces sur lesquelles des liquides ou d'autres matériaux fluides doivent être appliquésTraitement ultérieur des revêtements appliqués, p. ex. traitement intermédiaire d'un revêtement déjà appliqué, pour préparer les applications ultérieures de liquides ou d'autres matériaux fluides par d'autres moyens chimiques
C23C 14/14 - Matériau métallique, bore ou silicium
C23C 14/22 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le procédé de revêtement
A01N 37/02 - Acides carboxyliques saturés ou leurs thio-analoguesLeurs dérivés
A01N 43/16 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un ou plusieurs atomes d'oxygène ou de soufre comme uniques hétéro-atomes du cycle avec un hétéro-atome des cycles à six chaînons avec l'oxygène comme hétéro-atome du cycle
C23C 16/458 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour supporter les substrats dans la chambre de réaction
C23C 16/503 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges à courant continu ou alternatif
C23C 16/505 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges à radiofréquence
C23C 16/511 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges à micro-ondes
C07C 323/52 - Thiols, sulfures, hydropolysulfures ou polysulfures substitués par des halogènes, des atomes d'oxygène ou d'azote ou par des atomes de soufre ne faisant pas partie de groupes thio contenant des groupes thio et des groupes carboxyle liés au même squelette carboné ayant les atomes de soufre des groupes thio liés à des atomes de carbone acycliques du squelette carboné le squelette carboné étant acyclique et saturé
C08J 3/24 - Réticulation, p. ex. vulcanisation, de macromolécules
C08J 3/28 - Traitement par ondes énergétiques ou par rayonnement de particules
C08J 7/18 - Modification chimique par des composés polymérisables en utilisant des ondes énergétiques ou le rayonnement de particules
C08L 5/08 - ChitineSulfate de chondroïtineAcide hyaluroniqueLeurs dérivés
C08L 39/00 - Compositions contenant des homopolymères ou des copolymères de composés possédant un ou plusieurs radicaux aliphatiques non saturés, chacun ne contenant qu'une seule liaison double carbone-carbone et l'un au moins étant terminé par une liaison simple ou double à l'azote ou par un hétérocycle contenant de l'azoteCompositions contenant des dérivés de tels polymères
B05D 1/36 - Applications successives de liquides ou d'autres matériaux fluides, p. ex. sans traitement intermédiaire
B05D 1/18 - Procédés pour appliquer des liquides ou d'autres matériaux fluides aux surfaces par immersion
A torque-restoring element for an oscillator for a mechanical timepiece and having an oscillator frequency, said torque restoring element comprising a spiral spring body having a number N turnings with an inner terminal end for engagement with a rotational inertial element via a collet, and an outer terminal for engagement with a stationary cock element, and having a width, a height and a total arc length; wherein the spiral spring body includes a core formed from mono-crystalline silicon wafer oriented along the crystallographic axis <110>; and wherein the spiral spring body includes at least one peripheral coating of a material having a thermal elastic constant different from that of the core of the spiral spring body so as to maintain the oscillator frequency an oscillator including the torque-restoring element substantially insensitive to variations of ambient temperature.
A method of producing unitary formed silicon balance spring having an overcoil portion for regulation of a mechanical timepiece, said method including the steps of providing a silicon balance spring having a main body portion, and an outer portion for formation as an overcoil portion, wherein the outer portion extends radially outward from an outermost turn of the main body portion, and wherein said main body portion and said outer portion are integrally formed from a silicon based material and are formed in a co-planar configuration; moving said outer portion in a direction relative to and out of the plane of said main body portion, and in a direction towards over said main body portion and towards the plane of the main body portion; and providing a stress relaxation process to the balance spring so as to relieve internal stresses induced within the balance spring from step (ii); wherein upon movement of said outer portion into the plane of said main body portion, the outer portion is located in an overcoil configuration relative to said main body portion.
A hairspring collet for a hairspring for interference engagement and an interference fit with the cylindrical outer surface of the staff of a balance wheel for a timepiece movement, the hairspring collet portion comprising a plurality of circumferentially extending elastically deformable interconnected arm portions, the arm portions forming an annulus having a central axis and providing an aperture therebetween, wherein each arm portion including a curved concave engagement portion for engagement with the outer surface of a staff of a balance wheel, wherein each engagement portion has substantially the same radius of curvature as each other and are equally spaced from the central axis at a first distance and wherein the first distance is less than the radius of the staff of the balance wheel; the engagement portions have a radius of curvature such that upon deformation of the arm portions and engagement with the outer surface of the staff the engagement portions substantially conform with the outer surface of the staff and an interference fit is formed therebetween, wherein stress induced from said interference fit is transferred and distributed from along the engagement portions to the arm portions adjacent the engagement portions and distributed therein; and wherein the interference fit of the engagement portions with the staff substantially prevents relative movement between the hairspring collet and the staff of the balance wheel upon application of load from a hairspring in use in a timepiece movement.
A method of increasing concentricity in use of a spiral hairspring mechanical timepiece; the hairspring having an inner terminal end portion for engagement with a collet, an outer terminal end portion for engagement with a stud, a first limb portion extending from the inner terminal end portion towards the outer terminal end portion, and a stiffening portion positioned at the outer turn of the hairspring and having a cross-sectional second moment of area different to that of the first limb portion such that bending stiffness of the stiffening portion has a greater bending stiffness than the single limb portion. The method includes modifying cross-sectional second moments of an area of the first limb portion and the stiffening portion by minimizing a cost function throughout the amplitude of the rotation of hairspring in use, the cost function being correlated to the net concentricity of the hairspring.