Abstract

The present invention relates to a carbon-based electron-emission device and an apparatus equipped therewith. The electron-emission device, according to an embodiment of the present invention, is an electron-emission device included in a cold cathode-type electron-beam apparatus that emits electrons supplied from a cathode toward an anode while regulating electron emission on the basis of the voltage applied to a mesh-structured gate electrode having a plurality of gate holes, wherein the electron-emission device comprises: a substrate; and emitter groups provided on the substrate, each having carbon-based emitters spaced apart from each other, wherein a plurality of the emitter groups are arranged, spaced apart from each other, in a corresponding region on the substrate that corresponds to one gate hole.

IPC Classes  ?

• H01J 1/304 - Field-emissive cathodes
• H01J 35/06 - Cathodes

Abstract

The present invention relates to an electron beam-based extreme ultraviolet light source device. A light source device according to one embodiment of the present invention outputs an extreme ultraviolet light source on the basis of an electron beam, and comprises: a chamber; an electron beam emission unit that generates an electron beam inside the chamber and comprises a cathode, a plurality of emitters including a carbon-based material and disposed spaced apart on the cathode, and a gate electrode disposed above the plurality of emitters and spaced apart from the plurality of emitters; and an anode which is located inside the chamber and spaced apart from the electron beam emission unit, and which becomes ionized and generates plasma when struck by the electron beam, whereby extreme ultraviolet rays are generated from the plasma. The anode includes, on the surface thereof, a silicon-based radiating material that generates the plasma.

IPC Classes  ?

• H05G 2/00 - Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
• G03F 7/20 - ExposureApparatus therefor

Abstract

An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal radiator. The electron beam-emitting unit comprises: a cathode electrode; a plurality of emitters located on the cathode electrode and including a carbon-based material; and a gate electrode which is located on the plurality of emitters at a distance therefrom and to which a pulse voltage is applied.

IPC Classes  ?

• H01J 31/04 - Cathode-ray tubesElectron-beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused with only one or two output electrodes
• H01J 29/04 - Cathodes
• H01J 29/58 - Arrangements for focusing or reflecting ray or beam
• H05G 2/00 - Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma