Abrégé

The present invention relates to a carbon-based electron-emission device and an apparatus equipped therewith. The electron-emission device, according to an embodiment of the present invention, is an electron-emission device included in a cold cathode-type electron-beam apparatus that emits electrons supplied from a cathode toward an anode while regulating electron emission on the basis of the voltage applied to a mesh-structured gate electrode having a plurality of gate holes, wherein the electron-emission device comprises: a substrate; and emitter groups provided on the substrate, each having carbon-based emitters spaced apart from each other, wherein a plurality of the emitter groups are arranged, spaced apart from each other, in a corresponding region on the substrate that corresponds to one gate hole.

Classes IPC  ?

• H01J 1/304 - Cathodes à émission d'électrons de champ
• H01J 35/06 - Cathodes

Abrégé

The present invention relates to an electron beam-based extreme ultraviolet light source device. A light source device according to one embodiment of the present invention outputs an extreme ultraviolet light source on the basis of an electron beam, and comprises: a chamber; an electron beam emission unit that generates an electron beam inside the chamber and comprises a cathode, a plurality of emitters including a carbon-based material and disposed spaced apart on the cathode, and a gate electrode disposed above the plurality of emitters and spaced apart from the plurality of emitters; and an anode which is located inside the chamber and spaced apart from the electron beam emission unit, and which becomes ionized and generates plasma when struck by the electron beam, whereby extreme ultraviolet rays are generated from the plasma. The anode includes, on the surface thereof, a silicon-based radiating material that generates the plasma.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma
• G03F 7/20 - ExpositionAppareillages à cet effet

Abrégé

An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal radiator. The electron beam-emitting unit comprises: a cathode electrode; a plurality of emitters located on the cathode electrode and including a carbon-based material; and a gate electrode which is located on the plurality of emitters at a distance therefrom and to which a pulse voltage is applied.

Classes IPC  ?

• H01J 31/04 - Tubes à rayons cathodiquesTubes à faisceau électronique à une ou plusieurs électrodes de sortie susceptibles d'être frappées sélectivement par le rayon ou le faisceau, celui-ci pouvant être dévié ou défocalisé vers, à partir de ou sur ces électrodes ne comprenant pas plus d'une ou deux électrodes de sortie
• H01J 29/04 - Cathodes
• H01J 29/58 - Dispositifs de focalisation ou de réflexion du rayon ou du faisceau
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma