ASML Netherlands B.V.
Netherlands
New patents and trademarks in the last week
Last updated : 2026-09-05
Summary
Patents |
Trademarks |
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16 | 0 |
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0 | 0 |
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11 | 0 |
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Viewing 1 - 27 of 27
trademarks
patents
| # | ID | Jurisdiction | Title |
|---|---|---|---|
| 1 | 19490001 |
|
METHOD OF MANUFACTURING AN ELECTRODE FOR AN OBJECT HOLDER |
| 2 | 18873382 |
|
SEMICONDUCTOR CHARGED PARTICLE DETECTOR AND METHODS THEREOF |
| 3 | 18878606 |
|
SYSTEM AND METHOD FOR IMAGE DISTURBANCE COMPENSATION |
| 4 | 18875996 |
|
SUPERCONDUCTIVE MAGNET ASSEMBLY, PLANAR MOTOR AND LITHOGRAPHIC APPARATUS |
| 5 | 18842649 |
|
RETICLE STAGE |
| 6 | 19474259 |
|
METHOD FOR EFFICIENT DYNAMIC SAMPLING PLAN GENERATION AND ACCURATE PROBE DIE LOSS PROJECTION |
| 7 | 18718415 |
|
METHOD AND COMPUTER PROGRAM FOR GROUPING PATTERN FEATURES OF A SUBSTANTIALLY IRREGULAR PATTERN LAYOUT |
| 8 | 19164947 |
|
GAS MIXTURE FOR HOLLOW CORE FIBER USED IN GENERATING BROADBAND RADIATION |
| 9 | EP2026052228 |
|
MODEL-BASED AUTOMATIC DEFECT CLASSIFICATION DURING WAFER INSPECTION |
| 10 | EP2026052660 |
|
DEVICE AND METHOD FOR ADJUSTING FLOW DYNAMIC IN A RADIATION SOURCE SYSTEM |
| 11 | EP2026052827 |
|
COMPUTATIONAL LITHOGRAPHY SIMULATION USING A VECTOR SCATTER MODEL |
| 12 | EP2026051777 |
|
A SUBSTRATE SUPPORT ASSEMBLY, EXPOSURE APPARTUS COMPRISING A SUBSTRATE SUPPORT ASSEMBLY, AND METHOD |
| 13 | EP2026051947 |
|
LINKAGE FOR AN ACTUATOR |
| 14 | EP2026052982 |
|
METHOD FOR ENHANCED DEFECTIVE DIE CLASSIFICATION AND EARLY WAFER YIELD DETECTION |
| 15 | 18876006 |
|
METHOD TO STABILIZE A WAVELENGTH OF A TUNABLE LASER DEVICE, TUNABLE LASER DEVICE, AND POSITION MEASUREMENT SYSTEM PROVIDED WITH THE TUNABLE LASER DEVICE |
| 16 | 18876017 |
|
DYNAMIC SWITCHING OF A DETECTOR SWITCH MATRIX |
| 17 | 19163307 |
|
EUV RADIATION SOURCE AND POSITION-CONTROLLABLE MIRROR |
| 18 | 18876190 |
|
REGION-DENSITY BASED MISALIGNMENT INDEX FOR IMAGE ALIGNMENT |
| 19 | 18873056 |
|
APPARATUS FOR BROADBAND RADIATION GENERATION |
| 20 | 18877850 |
|
PARTICLE DETECTOR WITH REDUCED INTER-SYMBOL INTERFERENCE |
| 21 | 18877822 |
|
SWITCH MATRIX CONFIGURATION FOR IMPROVED BANDWIDTH PERFORMANCE |
| 22 | 18871457 |
|
SUPPRESSING SPECULAR REFLECTION OF MASK ABSORBER AND ON- RESOLUTION FIELD STITCHING |
| 23 | EP2026051363 |
|
IMPROVEMENTS TO LITHOGRAPHIC METHODS AND APPARATUS |
| 24 | EP2026051548 |
|
EXPOSURE METHOD AND APPARATUS |
| 25 | EP2026052638 |
|
ELECTROSTATIC CLAMP WITH WEAKLY CONDUCTIVE DIELECTRIC LAYER |
| 26 | EP2026051977 |
|
ALIGNMENT METROLOGY MARKS, SYSTEMS, AND METHODS FOR SEMICONDUCTOR MANUFACTURING |
| 27 | EP2026051840 |
|
SYSTEM AND METHOD FOR ALIGNMENT WITH A TUNABLE LIGHT SOURCE |
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