ASML Netherlands B.V.
Pays‑Bas
Nouveaux brevets et marques déposées la semaine dernière
Dernière mise à jour : 2026-07-11
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Viewing 1 - 16 of 16
marques
brevets
| # | ID | Juridiction | Title |
|---|---|---|---|
| 1 | 18868800 |
|
CALIBRATION METHOD AND APPARATUS |
| 2 | 19131091 |
|
SYSTEMS AND METHODS FOR SEQUENTIAL AND PARALLEL OPTICAL DETECTION OF ALIGNMENT MARKS |
| 3 | 19133067 |
|
CONTAMINATION CONTROL |
| 4 | 19128783 |
|
A DROPLET STREAM ALIGNMENT MECHANISM AND METHOD THEREOF |
| 5 | 18868798 |
|
INTEGRATED OPTICAL SYSTEM FOR SCALABLE AND ACCURATE INSPECTION SYSTEMS |
| 6 | 19135347 |
|
MASKING DEVICE AND CONTROLLING METHOD THEREOF |
| 7 | 19133192 |
|
CHARGED PARTICLE DEVICE AND CHARGED PARTICLE APPARATUS |
| 8 | EP2025086972 |
|
SYSTEMS AND METHODS FOR COMPENSATING EFFECTS OF CHARGE SHARING IN CHARGED PARTICLE DETECTORS |
| 9 | EP2025087278 |
|
EVENT-BASED METROLOGY SYSTEMS AND METHODS |
| 10 | 19133649 |
|
OBJECT HOLDER |
| 11 | 19559265 |
|
METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
| 12 | 19134440 |
|
OPTICAL SYSTEM |
| 13 | EP2025084439 |
|
CONTROLLING CONTAMINATION BY TARGET MATERIAL IN AN EUV RADIATION SOURCE |
| 14 | EP2025085147 |
|
MOTION SYSTEM |
| 15 | EP2025085101 |
|
COMPUTATIONAL LITHOGRAPHY SIMULATION USING A RESIST MODEL WITH A CURVATURE TERM |
| 16 | EP2025085099 |
|
METHOD FOR IMAGING-METRIC-MAPPING AWARE SOURCE-MASK OPTIMIZATION |
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