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2024
|
Invention
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Leveraged poromeric polishing pad.
The invention provides a porous polyurethane polishing pad th... |
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Invention
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Polishing pad with endpoint window.
A polishing pad for chemical mechanical polishing comprising... |
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|
Invention
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Polishing pad with endpoint detection window.
A polishing pad for chemical mechanical polishing ... |
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2023
|
Invention
|
Micro-layer cmp polishing subpad.
The polishing pad has a polymeric matrix, a polishing surface ... |
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|
Invention
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Dual-layer cmp polishing subpad.
The invention provides a porous subpad for a chemical mechanica... |
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Invention
|
Aqueous inkjet inks containing silanized silica particles.
The present disclosure pertains an aq... |
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Invention
|
Chemical mechanical polishing pad with fluorinated polymer and multimodal groove pattern.
A poli... |
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Invention
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Cmp polishing pad with polishing elements on supports.
A polishing pad useful in chemical mechan... |
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2022
|
Invention
|
Polishing composition and method of polishing a substrate having enhanced defect reduction. An aq... |
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|
Invention
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Method of enhancing the removal rate of polysilicon.
A method of enhancing the removal rate of p... |
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|
Invention
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Chemical mechanical polishing pad.
A chemical mechanical polishing pad is provided containing a ... |
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2021
|
Invention
|
Chemical mechanical polishing pad and preparation thereof. The present invention concerns a chemi... |
|
|
Invention
|
Cmp polishing pad.
A polishing pad has a polishing layer comprising a polymer matrix comprising ... |
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|
Invention
|
Formulations for chemical mechanical polishing pads with high planarization efficiency and cmp pa... |
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|
Invention
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Formulations for high porosity chemical mechanical polishing pads with high hardness and cmp pads... |
|
|
Invention
|
Method of manufacture of polishing pads having two or more endpoint detection windows.
A chemica... |
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2020
|
Invention
|
Chemical mechanical polishing method for tungsten.
A process for chemical mechanical polishing a... |
|
|
Invention
|
Biased pulse cmp groove pattern.
The polishing pad is suitable for polishing or planarizing a wa... |
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|
Invention
|
Chemical mechanical polishing compositions having stabilized abrasive particles for polishing die... |
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2019
|
Invention
|
Chemical mechanical polishing composition and method of polishing silcon dioxide over silicon nit... |
|
|
Invention
|
Gelling reduction tool for grooving chemical mechanical planarization polishing pads.
The presen... |
|
|
Invention
|
Chemical mechanical polishing pad. A chemical mechanical polishing pad is provided containing a p... |
|
|
Invention
|
Chemical mechanical polishing composition and method of polishing silicon nitride over silicon di... |
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|
Invention
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Chemical mechanical polishing method for cobalt with high cobalt removal rates and reduced cobalt... |
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|
Invention
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Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorph... |
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2018
|
Invention
|
Polishing pad with pad wear indicator. The invention provides a polishing pad suitable for polish... |
|
|
Invention
|
Chemical mechanical polishing composition and method for tungsten. A composition and method for c... |
|
|
Invention
|
Chemical mecahnical polishing composition and method of polishing silcon dioxide over silicon nit... |
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|
Invention
|
Buffered cmp polishing solution.
The aqueous solution is useful for chemical mechanical polishin... |
|
|
Invention
|
Aliphatic polyurethane optical endpoint detection windows and cmp polishing pads containing them.... |
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2017
|
Invention
|
Cmp slurry compositions containing silica with trimethylsulfoxonium cations.
The present inventi... |
|
|
Invention
|
Aliphatic uv cured polyurethane optical endpoint detection windows with high uv transparency for ... |
|
|
Invention
|
Chemical mechanical polishing method for tungsten using polyglycols and polyglycol derivatives. A... |
|
|
Invention
|
Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow tren... |
|
|
Invention
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Low-abrasive cmp slurry compositions with tunable selectivity. The present invention provides aqu... |
|
|
Invention
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Chemical mechanical polishing pads for improved removal rate and planarization. The present inven... |
|
|
Invention
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Methods of making chemical mechanical polishing layers having improved uniformity. The present in... |
|
|
Invention
|
Chemical mechanical polishing pad.
The present invention provides methods of CMP polishing a met... |
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|
Invention
|
Cationic particle containing slurries and methods of using them for cmp of spin-on carbon films. ... |
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2016
|
Invention
|
Methods for making chemical mechanical planarization (cmp) polishing pads having integral windows... |
|
|
Invention
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Cmp polishing composition comprising positive and negative silica particles.
The present inventi... |
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|
Invention
|
Chemical mechanical polishing method for tungsten. A process for chemical mechanical polishing a ... |
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|
Invention
|
Method of chemical mechanical polishing a semiconductor substrate. A process for chemical mechani... |
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|
Invention
|
Method of chemical mechanical polishing a substrate. A process for chemical mechanical polishing ... |
