|
2024
|
Invention
|
Methods of forming semiconductor cladding layers for source and drain contacts and sidewall metal... |
|
|
Invention
|
Multiple input post mix showerhead. Aspects of the present disclosure provide an apparatus, which... |
|
|
Invention
|
Surface relief grating performance and cost enhancements for augmented reality applications. Aspe... |
|
|
Invention
|
Method of forming a memory device in a recessed feature. A method of forming a memory device on a... |
|
|
Invention
|
Wafer bow metrology system. Aspects of the present disclosure provide a metrology system for meas... |
|
|
Invention
|
Method and system for plasma process. A method for a plasma process includes generating plasma wi... |
|
|
Invention
|
Selective passivation of photoresists. A method of processing a substrate includes forming a phot... |
|
|
Invention
|
System and method for plasma processing. A method for plasma processing includes biasing a substr... |
|
|
Invention
|
Circuit design modeling for bonding integrated circuits. A method includes receiving a first layo... |
|
|
Invention
|
Flow stability control in drying liquid between plates. A method of flow control is provided. The... |
|
|
Invention
|
Metrology integrated with vacuum processing. A system includes a vacuum chamber having a wafer ch... |
|
|
Invention
|
In-situ fluorescence-based chamber and wafer monitoring. A system and a method directed to a moni... |
|
|
Invention
|
Hardmask integration for high aspect ratio applications. A method for fabricating semiconductor d... |
|
|
Invention
|
Methods and devices for improving bond strength of diffusion barriers. Semiconductor devices and ... |
|
|
Invention
|
Fiber bundle based optical spot size selector. An optical apparatus is provided. The optical appa... |
|
|
Invention
|
Gas cabinet with reduced gas emissions and exhaust flow rate. Embodiments of improved gas cabinet... |
|
|
Invention
|
Systems and methods that use infrared (ir) spectroscopy to monitor process chemicals utilized in ... |
|
|
Invention
|
Multi-material chuck. Conformal semiconductor chucks are disclosed. The semiconductor chucks can ... |
|
|
Invention
|
Methods and structures for improving etch profile of underlying layers. Semiconductor devices and... |
|
|
Invention
|
Method for semiconductor processing. A method for semiconductor processing includes forming a fir... |
|
|
Invention
|
Method of via filling. A method of processing a substrate includes exposing the substrate to a bo... |
|
|
Invention
|
Method for area selective deposition on extreme ultra-violet (euv) photoresists. Embodiments of p... |
|
|
Invention
|
Tunable patterned surface uniformity using direct current bias. A high aspect ratio etching metho... |
|
|
Invention
|
Expandable wafer bonder. Expandable semiconductor chucks are disclosed. The semiconductor chucks ... |
|
|
Invention
|
Methods for wet atomic layer etching of molybdenum. Systems and methods are provided for etching ... |
|
|
Invention
|
Method for plasma processing. A method for multitone plasma processing includes providing a subst... |
|
|
Invention
|
Semiconductor devices and methods of manufacturing the same. A method includes providing a semico... |
|
|
Invention
|
Method to selectively etch silicon nitride to silicon oxide using surface alkylation. Embodiments... |
|
|
Invention
|
Etch selectivity modulation by fluorocarbon treatment. A method of fabricating a field effect tra... |
|
|
Invention
|
Hybrid x-ray and optical metrology and navigation. A method of characterizing a device under test... |
|
|
Invention
|
Fully self-aligned via with graphene cap. A method of processing a substrate that includes: formi... |
|
|
Invention
|
Method of preventing pattern collapse. A method of microfabrication includes forming a sacrificia... |
|
|
Invention
|
Formation of sub-lithographic mandrel patterns using reversible overcoat. A method includes formi... |
|
|
Invention
|
Processing substrates with plasma modulated by dc magnetic fields. A method for plasma processing... |
|
|
Invention
|
Process system, method, and substrate chuck. An embodiment apparatus includes a processing chambe... |
|
|
Invention
|
Plasma processing method and apparatus. An embodiment plasma processing apparatus includes a plas... |
|
|
Invention
|
Atomic layer deposition of passivation layer. A method for processing a substrate that includes: ... |
|
|
Invention
|
Methods for controlling spin-on self-assembled monolayer (sam) selectivity. Various embodiments o... |
|
|
Invention
|
Integrated metrology for process controls in wafer bonding system. Aspects of the present disclos... |
|
|
Invention
|
Hybrid modeling for film metrology. A method of film thickness modeling includes receiving optica... |
|
|
Invention
|
Optical sensor for film thickness measurement. A method of film thickness measurement includes il... |
|
|
Invention
|
Selective atomic layer etch of si-based materials. A method of processing a substrate that includ... |
|
|
Invention
|
Systems and methods for depositing metal. An embodiment method includes depositing, in a processi... |
|
|
Invention
|
Method for lateral etch with bottom passivation. A method of processing a substrate that includes... |
|
|
Invention
|
Apparatus and method for plasma processing. An apparatus for plasma processing a substrate, where... |
|
|
Invention
|
Method of deposition in high aspect ratio (har) features. A method for processing a substrate tha... |
|
2023
|
Invention
|
Methods for protecting to reuse silicon carrier wafer based on ir laser lift-off process. Semicon... |
|
|
Invention
|
Release layer for ir laser lift-off process. A method of processing a substrate that includes: fo... |
|
2019
|
G/S
|
Semiconductor manufacturing support services, namely, repair
or maintenance of semiconductor man... |
|
|
G/S
|
Semiconductor manufacturing support services, namely, technical support services in the nature of... |
