2025
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G/S
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3D X-ray inspection and metrology tool in the field of
semiconductor measurement and control sol... |
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Invention
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Optical system and lithography system.
An optical system for a lithography system comprises: a n... |
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Invention
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Optical system and projection exposure apparatus.
An optical system for a projection exposure ap... |
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Invention
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Euv collector.
An EUV collector is used to collect EUV used light eminating from a source area. ... |
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Invention
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Method and device for mask inspection.
A method and a device for mask inspection, wherein the ma... |
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Invention
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Mirror socket, optical system and projection exposure apparatus.
A mirror socket for an optical ... |
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Invention
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Mirror arrangement for absorbing radiation, and lithography system.
A mirror arrangement, such a... |
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Invention
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Mirror arrangement with cooled mirror elements and lithography system.
A mirror arrangement, for... |
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Invention
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Optical system, lithography apparatus comprising an optical system, and arrangement comprising an... |
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Invention
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Euv optics module for an euv projection exposure apparatus.
An EUV optics module (35) for an EUV... |
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Invention
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Projection exposure apparatus with manipulators.
A microlithographic projection exposure apparat... |
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Invention
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Assembly for an optical system.
An assembly for an optical system having a mirror array having a... |
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Invention
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Editing of deep, multi-layered structures.
An improved system and method for circuit edit or rep... |
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Invention
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Production control method for a projection exposure apparatus, projection exposure apparatus, and... |
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Invention
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Sensor fusion for thin film segmentation.
Certain examples provide methods of performing semicon... |
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Invention
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Mirror element, lithography system, and method for providing a mirror element.
A mirror element ... |
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Invention
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Optical system and lithography apparatus having an optical system.
An optical system for a litho... |
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Invention
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Adaptive mirror with mechanical mediator layer and microlithographic projection exposure apparatu... |
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G/S
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Instruments and applications for the correction of wafer forms; laser system to correct distorsio... |
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G/S
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instruments and applications for the correction of wafer forms; laser system to correct distorsio... |
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Invention
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Method for coating a substrate.
Disclosed is a method for coating a substrate with at least one ... |
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Invention
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Method for qualifying a defect structure on an object utilizable in projection lithography.
To q... |
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Invention
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Computer implemented method, computer-readable medium, computer program product and corresponding... |
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Invention
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Method of wavefront correction in a semiconductor technology apparatus. The invention relates to ... |
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G/S
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3D X-ray inspection and metrology tool in the field of semiconductor measurement and control solu... |
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Invention
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Apparatus, holding device, arrangement, system and method for holding an optical element; lithogr... |
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Invention
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Method for detecting optical properties of a microscope, method for restoring the imaging quality... |
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Invention
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Image generation with improved scanning lines for smart charge distribution.
A method of generat... |
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Invention
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Highly flexible conduit element and method for producing a flexible conduit element. The inventio... |
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Invention
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Method for improving an imaging quality of an arrangement of optical elements, and corresponding ... |
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Invention
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Method for reducing acoustic vibrations, connection element, and projection exposure system. The ... |
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Invention
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Assembly for semiconductor apparatuses to suppress acoustic wave propagation within a semiconduct... |
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Invention
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Method for regulating the temperature of an optical module for microlithography. A method for reg... |
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Invention
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Method for operating an optical system, and optical system.
A method for operating an optical sy... |
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Invention
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Contamination handling in metrology systems. The present disclosure relates to a metrology system... |
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Invention
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Method and apparatus for determining an optical reflectivity of a curved surface of an optical te... |
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Invention
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Reference image for distortion correction. The application relates to a method for generating dis... |
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Invention
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Method for operating an euv mirror system, euv mirror system, and microlithographic projection ex... |
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Invention
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Measuring assembly for determining the position of a component. The invention relates to a measur... |
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Invention
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Method, device and computer program for determining and correcting a concentricity error when rot... |
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Invention
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Organohalogen precursors for particle beam-induced mask repair. The present invention relates, in... |
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Invention
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Mirror, in particular for a microlithographic projection exposure system. The invention relates t... |
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Invention
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Measurement arrangement for determining the position of a movable component. A measurement arrang... |
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Invention
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Method for producing a substrate, an optical system, and a light source arrangement for a lithogr... |
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Invention
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Method for spatially limiting material removal, optical element and semiconductor technology syst... |
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Invention
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Method and device for determining a topography contrast and/or a material contrast of a sample.
... |
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Invention
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Method and apparatus for atomic layer deposition of a fluoride layer, optical element and optical... |
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Invention
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Assembly of a microlithographic projection system, a vacuum chamber and a wall element arranged i... |
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Invention
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Apparatus and method for coating a substrate of an optical element. The invention relates to an a... |
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Invention
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Method for producing an optical imaging system for a microlithography system. In a method for pro... |
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Invention
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Method and system for producing a lithography apparatus or one of its components and/or for adjus... |
2024
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Invention
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Residual gas analysis method and residual gas analysis system. auxiliary gasiii) for the residual... |
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G/S
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Applications and instruments in the field of semiconductor
measurement and inspection solutions ... |
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G/S
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Applications and instruments in the field of semiconductor
measurement and inspection solutions. |
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G/S
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applications and instruments in the field of semiconductor measurement and inspection solutions. |
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G/S
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Electro-optical instruments for use in inspection and measurement of industrial components, namel... |
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G/S
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Downloadable computer application software for use in semiconductor measurement and semiconductor... |
2022
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G/S
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Recorded data; web applications and server software;
utility, security and cryptographic softwar... |
2020
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G/S
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Focused ion beam workstations, comprising of scanning ion and electron microscopes, computer soft... |
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G/S
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Focused ion beam systems/instruments for scientific
purposes; software for focused ion beam syst... |
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G/S
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Focused ion beam apparatus comprised of computer hardware and recorded computer software to perfo... |
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G/S
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Software platform for the visualization and analysis of
semiconductor image data. |
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G/S
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Apparatus and instruments for aerial photogrammetry of
lithography photomasks in the field of se... |
2019
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G/S
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Apparatus and instruments for aerial photogrammetry of lithography photomasks in the field of sem... |
2018
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G/S
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Microscopes and parts thereof; x-ray microscopes and parts thereof; downloadable software used fo... |
2014
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G/S
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Maintenance, repairing, installation and replacement of
hardware for semiconductor equipment. Ma... |
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G/S
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Installation, maintenance and repair of semiconductor equipment for others; replacement of worn o... |
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G/S
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Server for linking instruments used in the semiconductor field and for analyzing and evaluating d... |
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G/S
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Computer server for linking instruments used in the
semiconductor field and for analyzing and ev... |
2011
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G/S
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Laser apparatus for correcting the precision in the position
of photomask structures. |
2009
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G/S
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Optical inspection apparatus, namely, semiconductor mask inspection apparatus and parts thereof |
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G/S
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Mask inspection systems. |
2008
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G/S
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measuring instruments to measure positions of structures on photomasks; computer software for use... |
2005
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G/S
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Apparatus for repair of masks used for manufacturing
semi-conductor structures and their parts (... |
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G/S
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mask repair tools used in the semiconductor industry |
2002
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G/S
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Optical apparatus and instruments, lenses for the semiconductor industry, apparatus and instrumen... |
1998
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G/S
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Optical apparatus and instruments; objectives. Lighting devices. |
1997
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G/S
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lens objectives for use with wafersteppers and illuminators |