Carl Zeiss SMT GmbH

Allemagne

 
Quantité totale PI 2 886
Quantité totale incluant filiales 3 156 (+ 270 pour les filiales)
Rang # Quantité totale PI 420
Note d'activité PI 3,9/5.0    1 648
Rang # Activité PI 430
Parent Carl Zeiss AG
Classe Nice dominante Appareils et instruments scienti...

Brevets

Marques

1 465 10
0 1
1 392 13
5
 
Dernier brevet 2025 - Method for operating a microlith...
Premier brevet 1999 - Illumination system particularly...
Dernière marque 2025 - NLX
Première marque 1997 - STARLITH

Filiales

3 subsidiaries with IP (270 patents, 0 trademarks)

1 subsidiaries without IP

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Industrie (Classification de Nice)

Derniers inventions, produits et services

2025 P/S 3D X-ray inspection and metrology tool in the field of semiconductor measurement and control solu...
2024 Invention Imaging euv optical unit for imaging an object field into an image field. An imaging EUV optical...
Invention Method for compensating actuator effects of actuators. A method for driving an actuator for a co...
Invention Method for heating an optical element, and optical system. A method for heating an optical eleme...
Invention Illumination optical unit for a mask inspection system. An illumination optical unit is part of ...
Invention Method for operating a projection exposure system, and projection exposure system. A method of o...
Invention Method for producing a substrate for an optical element, and reflective optical element. A refle...
Invention Catadioptric projection objective, projection illumination system and projection illumination met...
Invention Dual beam systems and methods for decoupling the working distance of a charged particle beam devi...
Invention Mirror, in particular for a microlithographic projection exposure system. A mirror, in particula...
Invention Illumination system, projection illumination facility and projection illumination method. An ill...
Invention Optical element, and assembly and optical system therewith. An optical element for incorporation...
Invention Optical system, lithography apparatus having an optical system, and method for producing an optic...
Invention Component for a system of semiconductor technology and method for producing a component for a sys...
Invention Method for operating a microlithographic projection exposure apparatus, microlithographic mask an...
Invention Micro-electromechanical system with fixation. The invention relates to a micro-electromechanical ...
Invention Beam angle rotation and sample rotation. A method for operating an ion beam device comprises det...
Invention Device and method for releasably connecting at least one mobile clean room to at least one second...
Invention Measurement device and method for operating the measurement device. The invention relates to a me...
Invention High-resolution low-distortion imaging using charged-particle scanning microscope. Techniques are...
Invention Method for operating a control device, control device, optical system and lithography apparatus. ...
Invention Method and device for mask repair. The present invention relates to a method for repairing a defe...
Invention Method for producing an optical system for a lithography apparatus, substrate for an optical comp...
Invention Readout circuit for a capacitive sensor. S1S2S1S2out1out2excdetdet) from the interference detecti...
P/S Applications and instruments in the field of semiconductor measurement and inspection solutions ...
P/S Applications and instruments in the field of semiconductor measurement and inspection solutions.
Invention Measurement system, measurement method with the aid of such a measurement system, and projection ...
Invention Optical system for a projection exposure apparatus, and method for specifying an illumination pup...
Invention Illumination optical unit, and method for measuring the dependence of an intensity of illuminatio...
Invention Facet mirror for an illumination optical unit for projection lithography suitable for use as firs...
Invention Illumination optical unit for projection lithography, and method for monitoring such an illuminat...
Invention Projection exposure apparatus for semiconductor lithography comprising a connecting element. The ...
Invention Projection exposure apparatus comprising an element comprising an elastic material. The invention...
Invention Stabilization of a repaired region of an object for lithography. The present invention relates in...
Invention Computer implemented method for simulating an aerial image of a model of a photolithography mask ...
Invention Method and device for correcting an imaging error of a particle beam during sample processing. Th...
Invention Method for securing a mems micromirror unit and mems micromirror unit. The invention relates to a...
Invention Method of operating a microlithographic projection exposure apparatus. A method of operating a mi...
Invention Vibration-correction unit, method for operating a vibration-correction unit, sensor and lithograp...
Invention Measurement arrangement for determining the position of a movable component. A measurement arrang...
Invention Handling system for microlithographic photomasks, inspection system and processing system having ...
Invention Securing device. The invention relates to a securing device (24) for securing a functional compon...
Invention Mems micromirror unit and production thereof. The invention relates to a method for producing a M...
Invention Optical system comprising an euv mirror and method for operating an optical system. An optical s...
Invention Method for reducing the effects of parasitic forces and/or moments on the imaging quality of a pr...
Invention Method for reworking an optical element, optical element and optical system. The invention relate...
Invention Method and device for determining a position of a leak on a component. The invention relates to a...
Invention Support structure for an illumination optical unit of a projection exposure apparatus. A support ...
Invention Processing an optical element for a projection printing plant. 122. The invention also relates to...
Invention Lithography system comprising a measurement device. The invention relates to a lithography system...
Invention Optical system for microlithography and sensor adapter. The invention relates to an optical syste...
P/S applications and instruments in the field of semiconductor measurement and inspection solutions.
P/S Applications and instruments in the field of semiconductor measurement and inspection solutions
P/S Electro-optical instruments for use in inspection and measurement of industrial components, namel...
2023 Invention Ion beam inspection and repair with increased secondary electron yield. An ion beam system capab...
2022 P/S Recorded data; web applications and server software; utility, security and cryptographic softwar...
2020 P/S Focused ion beam workstations, comprising of scanning ion and electron microscopes, computer soft...
P/S Focused ion beam systems/instruments for scientific purposes; software for focused ion beam syst...
P/S Focused ion beam apparatus comprised of computer hardware and recorded computer software to perfo...
P/S Software platform for the visualization and analysis of semiconductor image data.
P/S Apparatus and instruments for aerial photogrammetry of lithography photomasks in the field of se...
2019 P/S Apparatus and instruments for aerial photogrammetry of lithography photomasks in the field of sem...
2018 P/S Microscopes and parts thereof; x-ray microscopes and parts thereof; downloadable software used fo...
2014 P/S Maintenance, repairing, installation and replacement of hardware for semiconductor equipment. Ma...
P/S Installation, maintenance and repair of semiconductor equipment for others; replacement of worn o...
P/S Server for linking instruments used in the semiconductor field and for analyzing and evaluating d...
P/S Computer server for linking instruments used in the semiconductor field and for analyzing and ev...
2011 P/S Laser apparatus for correcting the precision in the position of photomask structures.
2009 P/S Optical inspection apparatus, namely, semiconductor mask inspection apparatus and parts thereof
P/S Mask inspection systems.
2008 P/S measuring instruments to measure positions of structures on photomasks; computer software for use...
2005 P/S Apparatus for repair of masks used for manufacturing semi-conductor structures and their parts (...
P/S mask repair tools used in the semiconductor industry
2002 P/S Optical apparatus and instruments, lenses for the semiconductor industry, apparatus and instrumen...
1998 P/S Optical apparatus and instruments; objectives. Lighting devices.
1997 P/S lens objectives for use with wafersteppers and illuminators