Air Liquide Advanced Materials LLC

United States of America

 
Total IP 9
Total IP Rank # 171,507
IP Activity Score 0/5.0    0
IP Activity Rank # 1,659,438
Dominant Nice Class Chemical and biological material...

Patents

Trademarks

1 2
0 0
6 0
0
 
Last Patent 2018 - Short inorganic trisilylamine-ba...
First Patent 2016 - Si-containing film forming compo...
Last Trademark 2004 - IMPROVING SEMICONDUCTOR PERFORMANCE
First Trademark 2004 - IMPROVING SEMICONDUCTOR PERFORMANCE

Industry (Nice Classification)

Latest Inventions, Goods, Services

2017 Invention Short inorganic trisilylamine-based polysilazanes for thin film deposition. Disclosed are Si-C fr...
Invention N-h free and si-rich perhydridopolysilzane compositions, their synthesis, and applications. 3x2yy...
Invention Short inorganic trisilylamine-based polysilazanes for thin film deposition. 6 hydrocarbyl group.
2016 Invention Vapor deposition processes for forming silicon- and oxygen-containing thin films. ALD processes f...
Invention Vapor deposition processes for forming silicon- and nitrogen-containing thin films. ALD processes...
Invention Si-containing film forming compositions and methods of using the same. Mono-substituted TSA precu...
Invention Catalyst dehydrogenative coupling of carbosilanes with ammonia, amnines and amidines. Si-containi...
2004 G/S Chemicals used in the manufacture of semiconductors and photovoltaic devices