Fujimi Incorporated

Japan


 
Total IP 707
Total IP incl. subs 710 (+ 4 for subs)
Total IP Rank # 1,846
IP Activity Score 3.3/5.0    410
IP Activity Rank # 1,735
IP AS incl. subs 3/5.0    412
Stock Symbol 53840 (tse)
ISIN JP3820900003
Market Cap. 186259755000.0  (JPY)
Industry Semiconductor Equipment & Materials
Sector Technology
Dominant Nice Class Cosmetics and toiletries; cleani...

Patents

Trademarks

291 2
7 0
407 0
0
 
Last Patent 2025 - Cmp slurries
First Patent 1989 - Polishing composition
Last Trademark 1991 - FUJIMI
First Trademark 1991 - FUJIMI

Subsidiaries

2 subsidiaries with IP (4 patents, 0 trademarks)

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Industry (Nice Classification)

Latest Inventions, Goods, Services

2024 Invention Cmp slurries. The present technology generally relates to compositions and methods for polishing...
Invention Polishing composition and polishing method using the same. Provided is a polishing composition t...
Invention Polishing composition and polishing method using same. The present invention provides a means for...
Invention Thermal spraying powder. Provided is a technology that enhances the uniformity of components in a...
Invention Powder for thermal spraying. The present invention provides a technique for improving the uniform...
Invention Polishing composition, method for producing same, and polishing method. There are provided a pol...
Invention Polishing composition, and polishing method using same. 5050) of greater than 1.0 µm and a primar...
Invention Method for producing polishing composition. The present invention provides a method for producing...
Invention Polishing composition. The present invention provides a polishing composition capable of improvin...
Invention Polishing composition. The present invention provides a polishing composition with which friction...
Invention Polishing composition. Provided is a polishing composition with which surface roughness after pol...
Invention Polishing composition, polishing method and method for producing semiconductor substrate. To pro...
Invention Composition for surface treatment, surface treatment method, and method for producing semiconduct...
Invention Polishing composition, method for producing same, and polishing method. Provided are a high-perfo...
Invention Polishing composition. Provided is a polishing composition with which it is possible to achieve h...
Invention Polishing composition, polishing method, and method for producing semiconductor substrate. The p...
Invention Polishing composition, concentrated liquid of polishing composition, and polishing method. The pr...
Invention Method for manufacturing silica sol. A method for manufacturing a silica sol according to an emb...
Invention Molybdenum polishing compositions and methods. Molybdenum polishing compositions and methods acc...
Invention Silicon oxynitride removal enhancers and methods of use thereof. The present disclosure relates ...
Invention Powder for thermal spraying. YAlYavYY] values for all of the positions by n, is 7.0% or less.
Invention Polishing and washing method, washing agent, and set of polishing composition and washing agent. ...
Invention Polishing composition. The present invention provides a polishing composition with which it is po...
Invention Powder for thermal spraying. 105050 at which the cumulative particle volume from the smallest par...
Invention Silica sol. A silica sol which does not gelate, has a high purity, and contains a high concentra...
Invention Polishing composition, polishing method using the polishing composition, and method for producing...
Invention Polishing composition, polishing method, and method of manufacturing semiconductor substrate. Th...
2023 Invention Polishing composition, polishing method, and method for producing semiconductor substrate. An ob...
Invention Method for producing silica sol. Provided is a method for producing a silica sol. A gel-like mat...
Invention Polishing composition. C2.  [C]
Invention Composition and method for enhancing silicon nitride polishing rate selectivity. 22222 polishing ...
Invention Surface treatment composition, surface treatment method, and method for producing semiconductor s...
Invention Powder material for additive manufacturing and method for producing said powder material. The pre...
2022 Invention Polishing composition. Provided is a polishing composition that can improve the surface quality ...
Invention Polishing composition. A polishing composition that can achieve an excellent polishing removal r...
Invention Sliding apparatus and method for manufacturing same. There is provided a sliding apparatus havin...
Invention Polishing composition, polishing composition production method, polishing method, and semiconduct...
Invention Method for producing resin member used in production process of electronic devices. There is pro...
Invention Polishing composition, method for producing polishing composition, and polishing method. Provide...
Invention Powder material for additive manufacturing and method for manufacturing additive-manufactured pro...
Invention Plate-like titanium pyrophosphate and method for producing the same. The present invention enabl...
Invention Polishing pad and polishing method. Provided is a polishing pad having a high following performa...
Invention Polishing composition. Provided is a polishing composition containing an abrasive, permanganate,...
Invention Polishing method and polishing composition. Provided are a polishing method and a polishing comp...
Invention Polishing composition. Provided is a polishing composition that can reduce increase in temperatu...
2021 Invention Powder, filler, composition, and method for producing filler. Provided is a powder having a high...
1991 G/S abrasives and polishing agents in the form of powders, pastes, slurries, colloids, and pellets fo...
G/S abrasives and polishing agents in the form of powder, paste, slurry, colloids, and pellets abrasi...