Park Systems Corp.

République de Corée

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Type PI
        Brevet 27
        Marque 4
Juridiction
        États-Unis 23
        International 8
Date
Nouveautés (dernières 4 semaines) 4
2025 janvier 4
2025 (AACJ) 4
2023 6
2022 5
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Classe IPC
G01Q 10/04 - Balayage ou positionnement fin 4
G01Q 60/38 - Sondes, leur fabrication ou leur instrumentation correspondante, p. ex. supports 4
G01N 23/00 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou 3
G01Q 20/02 - Contrôle du mouvement ou de la position de la sonde par des moyens optiques 3
G01Q 70/02 - Supports de sondes 3
Voir plus
Statut
En Instance 6
Enregistré / En vigueur 25

1.

WHITE LIGHT INTERFEROMETRY USING SINUSOIDAL INTERPOLATION AND SINUSOIDAL INTERPOLATION METHOD OF WHITE LIGHT INTERFEROMETRY

      
Numéro d'application KR2024009502
Numéro de publication 2025/009913
Statut Délivré - en vigueur
Date de dépôt 2024-07-04
Date de publication 2025-01-09
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Lee, Minjeung
  • Kim, Hyoju
  • Ahn, Byoung-Woon
  • Park, Sang-Il

Abrégé

Disclosed are: white light interferometry using sinusoidal interpolation in which interference fringes generated by measurement light and reflected light can be expressed naturally; and a sinusoidal interpolation method of the white light interferometry. The white light interferometry using sinusoidal interpolation comprises: a charge coupled device (CCD) image sensor for capturing interference fringes to generate a plurality of interference fringe images; and an image analysis processor for accumulating the plurality of interference fringe images to generate a white light interference fringe signal (WLI fringe signal, I[n]).

Classes IPC  ?

  • G01B 9/0209 - Interféromètres à faible cohérence
  • G01B 9/02001 - Interféromètres caractérisés par la commande ou la génération des propriétés intrinsèques du rayonnement
  • G01B 11/24 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer des contours ou des courbes
  • G06F 17/10 - Opérations mathématiques complexes
  • G01B 21/08 - Dispositions pour la mesure ou leurs détails, où la technique de mesure n'est pas couverte par les autres groupes de la présente sous-classe, est non spécifiée ou est non significative pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur

2.

CONDUCTIVE ATOMIC MICROSCOPE

      
Numéro d'application KR2024009538
Numéro de publication 2025/009920
Statut Délivré - en vigueur
Date de dépôt 2024-07-05
Date de publication 2025-01-09
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Ahn, Byoung-Woon
  • Park, Sang-Il

Abrégé

Disclosed is a conductive atomic microscope in which the current flowing in a sample and a probe can be maintained constant by adjusting the voltage supplied to the sample on the basis of the current flowing in the probe. The conductive atomic microscope comprises: a voltage supply device for supplying voltage to a sample; a current detection device for detecting the current generated by the supplied voltage; and a controller for adjusting the voltage value supplied to the sample by the voltage supply device on the basis of the current value detected by the current detection device.

Classes IPC  ?

3.

SLIDING-TYPE WHITE LIGHT INTERFEROMETER

      
Numéro d'application KR2024009584
Numéro de publication 2025/009931
Statut Délivré - en vigueur
Date de dépôt 2024-07-05
Date de publication 2025-01-09
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Ahn, Byoung-Woon
  • Kim, Hyuntae

Abrégé

Disclosed is a sliding-type white light interferometer configured to continuously photograph an interference pattern through a scanning assembly which is inclined at a predetermined angle with respect to a sample, thereby acquiring the shape of the sample at a more improved speed. The sliding-type white light interferometer includes a light source, a stage, a mirror, a beam splitter, a stage moving assembly, a CCD image sensor, and an image analysis processor. The beam splitter makes a path change such that the path of white light provided to the sample has a predetermined angle with the sample. The stage moving assembly moves the stage in the X-axis direction in which the sample is scanned while the path of white light maintains at a predetermined angle with the sample. The CCD image sensor continuously photographs an interference pattern generated by measured light reflected from the surface of the sample and reflected light reflected from the mirror while the stage is moved in the X-axis direction, thereby generating a plurality of interference pattern images.

Classes IPC  ?

  • G01B 9/0209 - Interféromètres à faible cohérence
  • G01B 9/02 - Interféromètres
  • G01B 11/24 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer des contours ou des courbes
  • G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
  • G06T 7/50 - Récupération de la profondeur ou de la forme

4.

CONDUCTIVE ATOMIC FORCE MICROSCOPE

      
Numéro d'application KR2024009536
Numéro de publication 2025/009919
Statut Délivré - en vigueur
Date de dépôt 2024-07-05
Date de publication 2025-01-09
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Ahn, Byoung-Woon
  • Park, Sang-Il

Abrégé

Disclosed is a conductive atomic force microscope capable of measuring the electric capacity of a sample by providing alternating current power to the sample. The conductive atomic force microscope includes: a voltage provision device for providing a voltage to a sample; a current detection device for detecting a current generated by the provided voltage; and a characteristic calculation device for calculating IV characteristics of the sample on the basis of the detected current, wherein the voltage provision device provides an alternating current (AC) voltage to the sample and the characteristic calculation device calculates the electric capacity of the sample on the basis of the detected current.

Classes IPC  ?

  • G01R 19/165 - Indication de ce qu'un courant ou une tension est, soit supérieur ou inférieur à une valeur prédéterminée, soit à l'intérieur ou à l'extérieur d'une plage de valeurs prédéterminée
  • G01R 27/26 - Mesure de l'inductance ou de la capacitanceMesure du facteur de qualité, p. ex. en utilisant la méthode par résonanceMesure de facteur de pertesMesure des constantes diélectriques
  • G01R 23/165 - Analyse de spectreAnalyse de Fourier en utilisant des filtres
  • G01R 31/28 - Test de circuits électroniques, p. ex. à l'aide d'un traceur de signaux
  • G01Q 60/32 - Mode vibrant

5.

METHOD FOR MEASURING, BY MEASUREMENT DEVICE, CHARACTERISTICS OF SURFACE OF OBJECT TO BE MEASURED, ATOMIC FORCE MICROSCOPE FOR PERFORMING SAME METHOD, AND COMPUTER PROGRAM STORED IN STORAGE MEDIUM TO PERFORM SAME METHOD

      
Numéro d'application 18026814
Statut En instance
Date de dépôt 2021-09-24
Date de la première publication 2023-10-12
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Baik, Seung Hun
  • Yun, Seonghun
  • Ahn, Byoung-Woon
  • Park, Sang-Il

Abrégé

The present invention relates to a method for measuring, by a measurement device, characteristics of a surface of an object to be measured. The method includes an approach step of positioning the tip to come into contact with a specific position of the surface of the object to be measured and a lift step of separating the contacted tip from the surface of the object are repeatedly performed with respect to a plurality of positions of the surface of the object. The tip is controlled to vibrate in a portion or the entirety of the approach step and the lift step, and a movement characteristic of the tip is controlled according to a change of the vibration characteristic of the tip.

Classes IPC  ?

  • G01Q 60/38 - Sondes, leur fabrication ou leur instrumentation correspondante, p. ex. supports
  • G01Q 20/02 - Contrôle du mouvement ou de la position de la sonde par des moyens optiques
  • G01Q 70/10 - Forme ou cônicité

6.

METHOD FOR MEASURING CHARACTERISTICS OF SURFACE OF OBJECT TO BE MEASURED BY MEANS OF MEASURING APPARATUS USING VARIABLE SET POINT SETTING, ATOMIC MICROSCOPE FOR PERFORMING METHOD, AND COMPUTER PROGRAM STORED IN STORAGE MEDIUM FOR PERFORMING METHOD

      
Numéro d'application 18026822
Statut En instance
Date de dépôt 2021-09-24
Date de la première publication 2023-10-12
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Baik, Seung Hun
  • Yun, Seonghun
  • Ahn, Byoung-Woon
  • Park, Sang-Il

Abrégé

Disclosed is a method for measuring the characteristics of the surface of the object to be measured by means of a measuring apparatus for measuring the characteristics of the surface of the object to be measured by measuring an interaction between a tip and the surface of the object to be measured. Disclosed is a method for measuring the characteristics of the surface of the object to be measured by means of a measuring apparatus for measuring the characteristics of the surface of the object to be measured by measuring an interaction between a tip and the surface of the object to be measured. The method, according to an embodiment of the present invention is a method for measuring the characteristics of the surface of the object to be measured by repeating an approaching operation of bringing the tip close to and in contact with the surface of the object to be measured and a lifting operation. The approaching operation is performed by controlling such that a characteristic value reaches a set point, and the set point is variably set on the basis of the state of the point on which the approaching operation is performed.

Classes IPC  ?

  • G01Q 60/38 - Sondes, leur fabrication ou leur instrumentation correspondante, p. ex. supports

7.

APPARATUS AND METHOD FOR IDENTIFYING TARGET POSITION IN ATOMIC FORCE MICROSCOPE

      
Numéro d'application 17561731
Statut En instance
Date de dépôt 2021-12-24
Date de la première publication 2023-06-29
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • An, Jeonghun
  • Cho, Yongsung
  • Park, Sang-Il

Abrégé

Provided are an apparatus and a method for identifying a target position in an atomic microscope. An apparatus is configured to acquire result data identifying the cantilever from an image using an identification model learned to identify the cantilever based on the image photographed by a photographing unit, and calculate a target position from the cantilever using the acquired result data, in which the result data include at least one of bounding box data representing a bounding box including a boundary of the cantilever and segmentation data obtained by segmenting the cantilever and an object other than the cantilever.

Classes IPC  ?

  • G01Q 60/38 - Sondes, leur fabrication ou leur instrumentation correspondante, p. ex. supports
  • G01Q 70/08 - Caractéristiques des sondes
  • G01Q 20/02 - Contrôle du mouvement ou de la position de la sonde par des moyens optiques

8.

Measuring method for measuring heat distribution of specific space using SThM probe, method and device for detecting beam spot of light source

      
Numéro d'application 18103474
Numéro de brevet 12038455
Statut Délivré - en vigueur
Date de dépôt 2023-01-30
Date de la première publication 2023-06-15
Date d'octroi 2024-07-16
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Park, Sang-Il
  • Ahn, Byoung-Woon
  • Jo, Ahjin
  • Choi, Soobong

Abrégé

The present disclosure provides a measuring method for measuring heat distribution of a specific space using an SThM probe, and a method and device for detecting a beam spot of a light source. The method according to an embodiment of the present disclosure is the measuring method for measuring heat distribution of a specific space, the measuring method includes: linearly moving a SThM probe that may measure a temperature change in the specific space; and calculating heat distribution of the specific space using continuous temperature change values obtained from the SThM probe during the moving step. According to the measuring method, and the method and device for detecting a beam spot of a light source, it is possible to map temperature distribution in a small space using a SThM probe and it is possible to accurately detect a beam spot using the temperature distribution.

Classes IPC  ?

  • G01Q 60/58 - Microscopie thermique à balayage SThM [Scanning Thermal Microscopy] ou appareils à cet effet, p. ex. sondes SThM
  • G01K 3/00 - Thermomètres donnant une indication autre que la valeur instantanée de la température
  • G01K 13/00 - Thermomètres spécialement adaptés à des fins spécifiques

9.

Atomic force microscope equipped with optical measurement device and method of acquiring information on surface of measurement target using the same

      
Numéro d'application 17535695
Numéro de brevet 11619649
Statut Délivré - en vigueur
Date de dépôt 2021-11-26
Date de la première publication 2023-04-04
Date d'octroi 2023-04-04
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Park, Sang-Il
  • Ahn, Byoung-Woon
  • Han, Seung-Ho
  • Cho, Sang-Joon

Abrégé

An atomic force microscope equipped with an optical measurement device is disclosed. An atomic force microscope equipped with an optical measurement device which acquires characteristics of a surface of a measurement target by moving a probe along the surface of the measurement target while scanning the measurement target on an XY plane using an XY scanner for supporting the measurement target, includes: an optical measurement device including a lighting unit configured to allow light to enter the surface of the measurement target, and a detection unit configured to detect light reflected by the surface of the measurement target, the optical measurement device being configured to acquire the characteristics of the surface of the measurement target by the scanning by the XY scanner; and a control device configured to control an operation of the atomic force microscope and an operation of the optical measurement device.

Classes IPC  ?

  • G01Q 30/02 - Dispositifs d'analyse d’un type autre que la microscopie à sonde à balayage SPM, p. ex. microscope électronique à balayage SEM [Scanning Electron Microscope], spectromètre ou microscope optique
  • G01Q 10/04 - Balayage ou positionnement fin
  • G01Q 60/40 - Sondes conductrices

10.

METHOD FOR OBTAINING CHARACTERISTICS OF SURFACE TO BE MEASURED, BY USING INCLINED TIP, ATOMIC FORCE MICROSCOPE FOR PERFORMING METHOD, AND COMPUTER PROGRAM STORED IN STORAGE MEDIUM IN ORDER TO PERFORM METHOD

      
Numéro d'application 17792731
Statut En instance
Date de dépôt 2020-12-18
Date de la première publication 2023-02-16
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Park, Sang-Il
  • Ahn, Byoung-Woon
  • Baik, Seung Hun

Abrégé

The present invention relates to a method for acquiring a surface characteristic of a measuring object using a tilted tip, an atomic force microscope for carrying out the method, and a computer program stored on a storage medium for carrying out the method, capable of acquiring an image deeply to the inside of an undercut structure and easily separating a tip from the inside of the undercut structure. The method according to an exemplary embodiment of the present invention is a method for acquiring a surface characteristic of a measuring object using a measuring device including a tip interacting with the surface of the measuring object. The method includes a normal measuring step of acquiring a surface characteristic of the measuring object while relatively moving the tip in a first direction with respect to the surface of the measuring object using a first control method, a separating step of controlling the tip to deviate from an abnormal state by a second control method set based on a predefined shape of the surface of the measuring object when it is determined as the abnormal state in which at least one characteristic value obtained by the tip is out of a specific range during the normal measuring step, and a step of performing the normal measuring step again after the separating step.

Classes IPC  ?

11.

PARK NANOSTANDARD

      
Numéro de série 97717170
Statut En instance
Date de dépôt 2022-12-14
Propriétaire Park Systems Corp. (République de Corée)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

Scanning probe microscopes for semiconductor processing; scanning probe microscopes; magnetic measuring apparatus and instruments used to generate and measure magnetic fields; electron microscopes; precision measuring apparatus for high-resolution measurement of nanometer-sized particles, nanostructures, and surface characteristics, as well as for measuring the particle sizes of semiconductors, nanosensors, and nanostructures; surface roughness testing machines and instruments; microscopes

12.

PARK SMARTANALYSIS

      
Numéro de série 97717187
Statut En instance
Date de dépôt 2022-12-14
Propriétaire Park Systems Corp. (République de Corée)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

Scanning probe microscopes for semiconductor processing; scanning probe microscopes; magnetic measuring apparatus and instruments used to generate and measure magnetic fields; electron microscopes; precision measuring apparatus for high-resolution measurement of nanometer-sized particles, nanostructures, and surface characteristics, as well as for measuring the particle sizes of semiconductors, nanosensors, and nanostructures; surface roughness testing machines and instruments; microscopes

13.

Method and apparatus for identifying sample position in atomic force microscope

      
Numéro d'application 17561920
Numéro de brevet 11761981
Statut Délivré - en vigueur
Date de dépôt 2021-12-24
Date de la première publication 2022-06-30
Date d'octroi 2023-09-19
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • An, Jeonghun
  • Cho, Yongsung
  • Park, Sang-Il

Abrégé

An apparatus and a method for identifying a sample position in an atomic force microscope according to an exemplary embodiment of the present disclosure are provided. The method for identifying a sample position in an atomic force microscope includes receiving a vision image including a subject sample through a vision unit; determining a subject sample region in the vision image using a prediction model which is configured to output the subject sample region by receiving the vision image as an input; and determining a position of the subject sample based on the subject sample region.

Classes IPC  ?

  • G01Q 30/02 - Dispositifs d'analyse d’un type autre que la microscopie à sonde à balayage SPM, p. ex. microscope électronique à balayage SEM [Scanning Electron Microscope], spectromètre ou microscope optique
  • G05B 13/02 - Systèmes de commande adaptatifs, c.-à-d. systèmes se réglant eux-mêmes automatiquement pour obtenir un rendement optimal suivant un critère prédéterminé électriques
  • G01Q 30/20 - Dispositifs ou procédés de manipulation d'échantillons
  • G01Q 60/24 - Microscopie à forces atomiques AFM [Atomic Force Microscopy] ou appareils à cet effet, p. ex. sondes AFM

14.

METHOD FOR MEASURING CHARACTERISTICS OF SURFACE OF OBJECT TO BE MEASURED BY MEANS OF MEASURING APPARATUS USING VARIABLE SET POINT SETTING, ATOMIC MICROSCOPE FOR PERFORMING METHOD, AND COMPUTER PROGRAM STORED IN STORAGE MEDIUM FOR PERFORMING METHOD

      
Numéro d'application KR2021013060
Numéro de publication 2022/065926
Statut Délivré - en vigueur
Date de dépôt 2021-09-24
Date de publication 2022-03-31
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Baik, Seung Hun
  • Yun, Seonghun
  • Ahn, Byoung-Woon
  • Park, Sang-Il

Abrégé

The present invention relates to a method for measuring the characteristics of the surface of an object to be measured by variably setting a strength-set point on the basis of the state of a point being approached during an approaching operation of a pin point mode, an atomic microscope for performing the method, and a computer program stored in a storage medium for performing the method. The method, according to an embodiment of the present invention for solving the problem, is a method for measuring the characteristics of the surface of the object to be measured by means of a measuring apparatus for measuring the characteristics of an object to be measured by measuring an interaction between a tip and the surface of the object to be measured, and a method for measuring the characteristics of the surface of the object to be measured by repeating an approaching operation of bringing the tip close to and in contact with the surface of the object to be measured and a lifting operation. The approaching operation is performed by controlling such that a characteristic value reaches a set point, and the set point is variably set on the basis of the state of the point on which the approaching operation is performed.

Classes IPC  ?

  • G01Q 20/00 - Contrôle du mouvement ou de la position de la sonde
  • G01B 7/012 - Têtes de contact de palpeurs pour de telles machines
  • G01B 7/00 - Dispositions pour la mesure caractérisées par l'utilisation de techniques électriques ou magnétiques
  • G01B 7/26 - Dispositions pour la mesure caractérisées par l'utilisation de techniques électriques ou magnétiques pour mesurer une profondeur
  • G01Q 10/04 - Balayage ou positionnement fin

15.

METHOD FOR MEASURING, BY MEASUREMENT DEVICE, CHARACTERISTICS OF SURFACE OF OBJECT TO BE MEASURED, ATOMIC FORCE MICROSCOPE FOR PERFORMING SAME METHOD, AND COMPUTER PROGRAM STORED IN STORAGE MEDIUM TO PERFORM SAME METHOD

      
Numéro d'application KR2021013064
Numéro de publication 2022/065928
Statut Délivré - en vigueur
Date de dépôt 2021-09-24
Date de publication 2022-03-31
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Baik, Seung Hun
  • Yun, Seonghun
  • Ahn, Byoung-Woon
  • Park, Sang-Il

Abrégé

The present invention relates to: a method for measuring, by a measurement device, characteristics of a surface of an object to be measured, wherein the method achieves a faster measurement speed, can reduce wearing of a tip, and is suitable for measuring a deep and narrow trench structure; an atomic force microscope for performing the method; and a computer program stored in a storage medium to perform the method. The method according to an embodiment of the present invention to solve the problem above is a method for measuring characteristics of a surface of an object to be measured, by a measurement device which measures characteristics of the surface of the object, by measuring an interaction between a tip and the surface of the object. In the present method, an approach step of positioning the tip to come into contact with a specific position of the surface of an object to be measured and a lift step of separating the contacted tip from the surface of the object are repeatedly performed with respect to a plurality of positions of the surface of the object, wherein the tip is controlled to vibrate in a portion or the entirety of the approach step and the lift step, and a movement characteristic of the tip is controlled according to a change of a vibration characteristic of the tip.

Classes IPC  ?

  • G01Q 20/00 - Contrôle du mouvement ou de la position de la sonde
  • G01B 7/012 - Têtes de contact de palpeurs pour de telles machines
  • G01B 7/00 - Dispositions pour la mesure caractérisées par l'utilisation de techniques électriques ou magnétiques
  • G01Q 10/04 - Balayage ou positionnement fin

16.

Measuring method for measuring heat distribution of specific space using SThM probe, method and device for detecting beam spot of light source

      
Numéro d'application 17335094
Numéro de brevet 11598788
Statut Délivré - en vigueur
Date de dépôt 2021-06-01
Date de la première publication 2021-12-02
Date d'octroi 2023-03-07
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Park, Sang-Il
  • Ahn, Byoung-Woon
  • Jo, Ahjin
  • Choi, Soobong

Abrégé

The present disclosure provides a measuring method for measuring heat distribution of a specific space using an SThM probe, and a method and device for detecting a beam spot of a light source. The method according to an embodiment of the present disclosure is the measuring method for measuring heat distribution of a specific space, the measuring method includes: linearly moving a SThM probe that may measure a temperature change in the specific space; and calculating heat distribution of the specific space using continuous temperature change values obtained from the SThM probe during the moving step. According to the measuring method, and the method and device for detecting a beam spot of a light source, it is possible to map temperature distribution in a small space using a SThM probe and it is possible to accurately detect a beam spot using the temperature distribution.

Classes IPC  ?

  • G01Q 60/58 - Microscopie thermique à balayage SThM [Scanning Thermal Microscopy] ou appareils à cet effet, p. ex. sondes SThM
  • G01K 3/00 - Thermomètres donnant une indication autre que la valeur instantanée de la température
  • G01K 13/00 - Thermomètres spécialement adaptés à des fins spécifiques

17.

METHOD FOR OBTAINING CHARACTERISTICS OF SURFACE TO BE MEASURED, BY USING INCLINED TIP, ATOMIC FORCE MICROSCOPE FOR PERFORMING METHOD, AND COMPUTER PROGRAM STORED IN STORAGE MEDIUM IN ORDER TO PERFORM METHOD

      
Numéro d'application KR2020018707
Numéro de publication 2021/145578
Statut Délivré - en vigueur
Date de dépôt 2020-12-18
Date de publication 2021-07-22
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ahjin
  • Park, Sang-Il
  • Ahn, Byoung-Woon
  • Baik, Seung Hun

Abrégé

The present invention relates to: a method for obtaining characteristics of a surface to be measured, by using an inclined tip, the method being capable of deeply obtaining an image up to the inside of an undercut structure and enabling the tip to easily exit the inside of the undercut structure; an atomic force microscope for performing this method; and a computer program stored in a storage medium in order to perform this method. A method, according to one embodiment of the present invention, for accomplishing the task is a method for obtaining the characteristics of a surface to be measured, by using a measurement device including a tip that interacts with the surface to be measured. The method comprises: a normal-measurement step of obtaining the characteristics of the surface to be measured while relatively moving, using a first control scheme, the tip in a first direction with respect to the surface to be measured; an exiting step in which the tip is controlled so as to leave an abnormal state by means of a second control scheme configured on the basis of a predefined shape of the surface to be measured, when at least one characteristic value obtained by the tip deviates from a specific range and is determined to be in the abnormal state during the normal-measurement step; and a step of performing the normal-measurement step again after the exiting step.

Classes IPC  ?

  • G01Q 70/10 - Forme ou cônicité
  • G01Q 60/00 - Types particuliers de microscopie à sonde à balayage SPM [Scanning-Probe Microscopy] ou appareils à cet effetComposants essentiels de ceux-ci

18.

Chip carrier exchanging device and atomic force microscopy apparatus having same

      
Numéro d'application 16897091
Numéro de brevet 11175308
Statut Délivré - en vigueur
Date de dépôt 2020-06-09
Date de la première publication 2020-12-10
Date d'octroi 2021-11-16
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Park, Sang-Il
  • Lee, Yonghan
  • Jo, Ahjin

Abrégé

A chip carrier exchanging device receives a used chip carrier from a head of a scanning probe microscope that performs measurement by using the chip carrier configured such that a measurement means is attached to a carrier made of a magnetic material, and the chip carrier exchanging device supplies a new chip carrier to the head. The chip carrier exchanging device includes: a permanent magnet; a magnetism flow connecting unit made of a magnetic material that allow magnetism to flow therethrough, the magnetism flow connecting unit being configured to fix the chip carrier by exerting a magnetic effect on the carrier; and a drive unit configured to operate the permanent magnet to change magnetic force between the carrier and the magnetism flow connecting unit.

Classes IPC  ?

  • G01Q 70/02 - Supports de sondes
  • G01Q 60/38 - Sondes, leur fabrication ou leur instrumentation correspondante, p. ex. supports

19.

Measurement apparatus and method with adaptive scan rate

      
Numéro d'application 14841650
Numéro de brevet 09645169
Statut Délivré - en vigueur
Date de dépôt 2015-08-31
Date de la première publication 2016-12-08
Date d'octroi 2017-05-09
Propriétaire PARK SYSTEMS CORPORATION (République de Corée)
Inventeur(s)
  • Jo, Ah Jin
  • Lee, Ju Suk
  • Cho, Yong Sung
  • Chung, Sang Han
  • Park, Sang-Il

Abrégé

A measurement method in which a sensing unit acquires surface data of a measurement target while scanning the surface of the measurement target and at least one of the sensing unit and the measurement target is moved in order for the sensing unit to scan the surface along a plurality of fast scan lines on the surface of the measurement target, includes: a first step in which the sensing unit scans a surface along any one fast scan line of the plurality of fast scan lines to acquire the surface data along the any one fast scan line; and a second step in which the sensing unit acquires a surface data along a fast scan line most adjacent to the any one fast scan line while at least one of the sensing unit and the measurement target is moved along the most adjacent fast scan line, after the first step.

Classes IPC  ?

  • G01Q 10/04 - Balayage ou positionnement fin
  • G01Q 30/06 - Dispositifs d'affichage ou de traitement de données pour compensation d'erreurs
  • G01Q 10/06 - Circuits ou algorithmes à cet effet

20.

Head limiting movement range of laser spot and atomic force microscope having the same

      
Numéro d'application 14757519
Numéro de brevet 09645168
Statut Délivré - en vigueur
Date de dépôt 2015-12-23
Date de la première publication 2016-06-30
Date d'octroi 2017-05-09
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Park, Sang-Il
  • Kim, Dongryul
  • Ahn, Byoung Woon
  • Chung, Sang Han

Abrégé

Provided are a head having improved usability by limiting a movement range of a laser spot and an atomic force microscope having the same. A head according to an exemplary embodiment of the present disclosure is a head measuring bending of a cantilever by using a laser beam reflected on the surface of the cantilever in order to acquire information on a sample surface by using a tip of the cantilever. The head includes: a spot moving means configured to move a laser spot so as to position the laser spot on the surface of the cantilever; and a movement limiting means configured to limit a movement range of the laser spot moved by the spot moving means in a predetermined range.

Classes IPC  ?

  • G01Q 20/02 - Contrôle du mouvement ou de la position de la sonde par des moyens optiques
  • B82Y 35/00 - Procédés ou appareils pour la mesure ou l’analyse des nanostructures

21.

Image acquiring method and image acquiring apparatus using the same

      
Numéro d'application 14650237
Numéro de brevet 10133052
Statut Délivré - en vigueur
Date de dépôt 2014-06-26
Date de la première publication 2015-10-22
Date d'octroi 2018-11-20
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ah Jin
  • Lee, Ju Suk
  • Chung, Sang Han
  • Noh, Han Aul

Abrégé

An image acquiring method for acquiring an image using a measurement apparatus including an image acquiring means which acquires an image of a surface of a target to be measured in the unit of predetermined size pixels and a moving means capable of moving the target to be measured, the image acquiring method includes: acquiring an image of a first region from the surface of the target to be measured through the image acquiring means; acquiring an image of a second region, which is different from the first region, by moving the target to be measured, through the moving means; acquiring a differential image by subtracting, from either the image of the first region or the image of the second region, the other image; and overlapping the differential image multiple times.

Classes IPC  ?

  • G02B 21/36 - Microscopes aménagés pour la photographie ou la projection
  • G01N 21/95 - Recherche de la présence de criques, de défauts ou de souillures caractérisée par le matériau ou la forme de l'objet à analyser
  • G06T 5/50 - Amélioration ou restauration d'image utilisant plusieurs images, p. ex. moyenne ou soustraction
  • G06T 7/00 - Analyse d'image

22.

IMAGE ACQUIRING METHOD AND IMAGE ACQUIRING APPARATUS USING SAME

      
Numéro d'application KR2014005714
Numéro de publication 2014/209043
Statut Délivré - en vigueur
Date de dépôt 2014-06-26
Date de publication 2014-12-31
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Inventeur(s)
  • Jo, Ah Jin
  • Lee, Ju Suk
  • Chung, Sang Han
  • Noh, Han Aul

Abrégé

The present invention relates to an image acquiring method, which can more specifically image defects of a flat surface of a target to be measured such as a wafer, and an image acquiring apparatus using the same. An image acquiring method according to one embodiment of the present invention acquires an image by using a measurement apparatus including an image acquiring means which acquires an image of a surface of a target to be measured in the unit of predetermined size pixels and a movement means which can move the target to be measured. The method comprises the steps of: acquiring an image of a first region from the surface of the target to be measured, through the image acquiring means; acquiring an image of a second region, which is different from the first region, by moving the target to be measured, through the movement means; acquiring a differential image by subtracting, from either the image of the first region or the image of the second region, the other image; and overlapping the differential image multiple times.

Classes IPC  ?

  • G01N 21/88 - Recherche de la présence de criques, de défauts ou de souillures
  • G06T 5/50 - Amélioration ou restauration d'image utilisant plusieurs images, p. ex. moyenne ou soustraction
  • G01Q 30/00 - Moyens auxiliaires destinés à assister ou améliorer les techniques ou les appareils à sonde à balayage, p. ex. dispositifs d’affichage ou de traitement de données

23.

Leveling apparatus and atomic force microscope including the same

      
Numéro d'application 14243728
Numéro de brevet 09081272
Statut Délivré - en vigueur
Date de dépôt 2014-04-02
Date de la première publication 2014-10-09
Date d'octroi 2015-07-14
Propriétaire Park Systems Corp. (République de Corée)
Inventeur(s)
  • Kim, Suk Hyun
  • Noh, Han Aul
  • Jo, Ah Jin

Abrégé

The present invention relates to a leveling apparatus that levels an object to be leveled with a surface of a substrate by measuring the force applied to the object, and an atomic force microscope including the leveling apparatus. A leveling apparatus according to the present invention, which levels an object with a substrate such that one side of the object is brought in parallel contact with the surface of the substrate, includes: force sensors disposed to measure force at at least three points on the other side of the object; an angle adjusting unit disposed to adjust the angle between the object and the surface of the substrate; and a controller connecting with the force sensors and the angle adjusting unit to drive the angle adjusting unit on the basis of data from the force sensors. The controller obtains the data on force applied to the force sensors by bringing one side of the object in contact with the surface of the substrate at a predetermined angle, calculates the degree of relative inclination between the object and the surface of the substrate from the data on force, and levels the object with the surface of the substrate by adjusting the angle of the object or the substrate with the angle adjusting unit on the basis of the degree of relative inclination.

Classes IPC  ?

  • G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
  • B82Y 10/00 - Nanotechnologie pour le traitement, le stockage ou la transmission d’informations, p. ex. calcul quantique ou logique à un électron
  • G01Q 70/02 - Supports de sondes
  • G01Q 70/06 - Réseaux de pointes de sondes
  • G01Q 80/00 - Applications des techniques de sonde à balayage, autres que les techniques SPM

24.

Scanning probe microscope with drift compensation

      
Numéro d'application 12773587
Numéro de brevet 08402560
Statut Délivré - en vigueur
Date de dépôt 2010-05-04
Date de la première publication 2011-11-10
Date d'octroi 2013-03-19
Propriétaire Park Systems Corp. (République de Corée)
Inventeur(s)
  • Park, Sang-Il
  • Noh, Hanaul

Abrégé

A scanning probe microscope compensates for relative drift between its upper structure that includes a probe and a scanner that scans the probe in a straight line and a lower structure that includes a sample stage and a scanner that scans the sample stage in a plane. A light beam from the upper structure is initially aligned with a center of a position sensitive photo detector (PSPD) disposed on the lower structure at a predetermined position of the sample stage and any subsequent misalignments of the light beam with the center of the PSPD at the predetermined position of the sample stage are determined to be caused by drift and compensated by the scanning probe microscope.

Classes IPC  ?

  • G01Q 10/00 - Dispositions pour le balayage ou le positionnement, c.-à-d. dispositions pour commander de manière active le mouvement ou la position de la sonde

25.

Scanning probe microscope capable of measuring samples having overhang structure

      
Numéro d'application 12705301
Numéro de brevet 08209766
Statut Délivré - en vigueur
Date de dépôt 2010-02-12
Date de la première publication 2010-07-01
Date d'octroi 2012-06-26
Propriétaire Park Systems Corp. (République de Corée)
Inventeur(s)
  • Park, Sang-Il
  • Chung, Sang Han
  • Ahn, Byoung-Woon

Abrégé

A scanning probe microscope tilts the scanning direction of a z-scanner by a precise amount and with high repeatability using a movable assembly that rotates the scanning direction of the z-scanner with respect to the sample plane. The movable assembly is moved along a curved guide by a rack-and-pinion drive system and has grooves that engage with corresponding ceramic balls formed on a stationary frame to precisely position the movable assembly at predefined locations along the curved guide. The grooves are urged against the ceramic balls via a spring force and, prior to movement of the movable assembly, a pneumatic force is applied to overcome the spring force and disengage the grooves from the ceramic balls.

Classes IPC  ?

  • G01N 13/16 -
  • H01J 37/20 - Moyens de support ou de mise en position de l'objet ou du matériauMoyens de réglage de diaphragmes ou de lentilles associées au support

26.

Scanning probe microscope with automatic probe replacement function

      
Numéro d'application 12569680
Numéro de brevet 08099793
Statut Délivré - en vigueur
Date de dépôt 2009-09-29
Date de la première publication 2010-02-11
Date d'octroi 2012-01-17
Propriétaire Park Systems Corp. (République de Corée)
Inventeur(s)
  • Jo, Hyeong Chan
  • Lim, Hong Jae
  • Shin, Seung Jun
  • Kim, Joon Hui
  • Kim, Yong Seok
  • Park, Sang-Il

Abrégé

An automatic probe exchange system for a scanning probe microscope (SPM) exchanges probes between a probe mount on the SPM and a probe mount on a probe tray based on differential magnetic force. When the magnetic force on the SPM side is greater, the probe is attached to the probe mount on the SPM. When the magnetic force on the probe tray side is greater, the probe is attached to the probe mount on the probe tray. The magnetic force on the probe tray side is varied by moving the magnets that generate the magnetic force on the probe tray side closer to or further from the probe.

Classes IPC  ?

  • H01J 37/00 - Tubes à décharge pourvus de moyens permettant l'introduction d'objets ou d'un matériau à exposer à la décharge, p. ex. pour y subir un examen ou un traitement

27.

Scanning probe microscope with automatic probe replacement function

      
Numéro d'application 11872614
Numéro de brevet 07709791
Statut Délivré - en vigueur
Date de dépôt 2007-10-15
Date de la première publication 2008-06-26
Date d'octroi 2010-05-04
Propriétaire Park Systems Corp. (République de Corée)
Inventeur(s)
  • Jo, Hyeong Chan
  • Lim, Hong Jae
  • Shin, Seung Jun
  • Kim, Joon Hui
  • Kim, Yong Seok
  • Park, Sang-Il

Abrégé

Provided is a scanning probe microscope (SPM), a probe of which can be automatically replaced and the replacement probe can be attached onto an exact position. The SPM includes a first scanner that has a carrier holder, and changes a position of the carrier holder in a straight line; a second scanner changing a position of a sample on a plane; and a tray being able to store a spare carrier and a spare probe attached to the spare carrier. The carrier holder includes a plurality of protrusions.

Classes IPC  ?

  • G01N 23/00 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou
  • G21K 7/00 - Microscopes à rayons gamma ou à rayons X

28.

Scanning probe microscope capable of measuring samples having overhang structure

      
Numéro d'application 11601144
Numéro de brevet 07644447
Statut Délivré - en vigueur
Date de dépôt 2006-11-17
Date de la première publication 2008-04-03
Date d'octroi 2010-01-05
Propriétaire Park Systems Corp. (République de Corée)
Inventeur(s)
  • Park, Sang-Il
  • Kim, Yong-Seok
  • Kim, Jitae
  • Chung, Sang Han
  • Shin, Hyun-Seung
  • Lee, Jung-Rok
  • Hwang, Euichul

Abrégé

Provided is a scanning probe microscope capable of precisely analyzing characteristics of samples having an overhang surface structure. The scanning probe microscope comprises a first probe, a first scanner changing a position of the first probe along a straight line, and a second scanner changing a position of a sample in a plane, wherein the straight line in which the position of the first probe is changed by using the first scanner is non-perpendicular to the plane in which the position of the sample is changed by using the second scanner.

Classes IPC  ?

  • G01N 23/00 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou

29.

Scanning probe microscope for measuring angle and method of measuring a sample using the same

      
Numéro d'application 11591794
Numéro de brevet 07514679
Statut Délivré - en vigueur
Date de dépôt 2006-11-01
Date de la première publication 2008-03-27
Date d'octroi 2009-04-07
Propriétaire Park Systems Corp. (République de Corée)
Inventeur(s)
  • Shin, Hyun Seung
  • Kim, Young Doo
  • Kim, Yong Seok
  • Park, Sang-Il

Abrégé

Provided are a scanning probe microscope (SPM) that prevents a distortion of an image caused by alignment errors of scanners and a method of measuring a sample using the same. The scanning probe microscope comprises a probe; a first scanner changing a position of the probe along a straight line; a second scanner changing a position of a sample in a plane; and an adjusting device adjusting a position of the second scanner or the first scanner so that the straight line where the position of the probe is changed using the first scanner is perpendicular to the plane in which the position of the sample is changed using the second scanner.

Classes IPC  ?

  • G01N 23/00 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou
  • G02B 27/64 - Systèmes pour donner des images utilisant des éléments optiques pour la stabilisation latérale et angulaire de l'image
  • H01J 3/14 - Dispositifs pour la focalisation ou la réflexion du rayon ou du faisceau

30.

PARK SYSTEMS

      
Numéro de série 77245006
Statut Enregistrée
Date de dépôt 2007-08-02
Date d'enregistrement 2008-09-02
Propriétaire Park Systems Corp. (République de Corée)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

instruments for carrying out microscale and nanoscale measurements and analyses, namely, scanning probe microscopes and atomic force microscopes

31.

PARK SYSTEMS

      
Numéro de série 77130080
Statut Enregistrée
Date de dépôt 2007-03-13
Date d'enregistrement 2009-01-06
Propriétaire PARK SYSTEMS CORP. (République de Corée)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

Biological microscopes; Metallurgical microscopes; Microscopes; Microscopes and parts thereof; Precision instruments for manipulation and positioning of microscopic objects