Abstract

Disclosed are: white light interferometry using sinusoidal interpolation in which interference fringes generated by measurement light and reflected light can be expressed naturally; and a sinusoidal interpolation method of the white light interferometry. The white light interferometry using sinusoidal interpolation comprises: a charge coupled device (CCD) image sensor for capturing interference fringes to generate a plurality of interference fringe images; and an image analysis processor for accumulating the plurality of interference fringe images to generate a white light interference fringe signal (WLI fringe signal, I[n]).

IPC Classes  ?

• G01B 9/0209 - Low-coherence interferometers
• G01B 9/02001 - Interferometers characterised by controlling or generating intrinsic radiation properties
• G01B 11/24 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
• G06F 17/10 - Complex mathematical operations
• G01B 21/08 - Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness

Abstract

Disclosed is a conductive atomic microscope in which the current flowing in a sample and a probe can be maintained constant by adjusting the voltage supplied to the sample on the basis of the current flowing in the probe. The conductive atomic microscope comprises: a voltage supply device for supplying voltage to a sample; a current detection device for detecting the current generated by the supplied voltage; and a controller for adjusting the voltage value supplied to the sample by the voltage supply device on the basis of the current value detected by the current detection device.

IPC Classes  ?

• G01Q 60/40 - Conductive probes
• G01Q 70/08 - Probe characteristics

Abstract

Disclosed is a sliding-type white light interferometer configured to continuously photograph an interference pattern through a scanning assembly which is inclined at a predetermined angle with respect to a sample, thereby acquiring the shape of the sample at a more improved speed. The sliding-type white light interferometer includes a light source, a stage, a mirror, a beam splitter, a stage moving assembly, a CCD image sensor, and an image analysis processor. The beam splitter makes a path change such that the path of white light provided to the sample has a predetermined angle with the sample. The stage moving assembly moves the stage in the X-axis direction in which the sample is scanned while the path of white light maintains at a predetermined angle with the sample. The CCD image sensor continuously photographs an interference pattern generated by measured light reflected from the surface of the sample and reflected light reflected from the mirror while the stage is moved in the X-axis direction, thereby generating a plurality of interference pattern images.

IPC Classes  ?

• G01B 9/0209 - Low-coherence interferometers
• G01B 9/02 - Interferometers
• G01B 11/24 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
• G01B 11/06 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness for measuring thickness
• G06T 7/50 - Depth or shape recovery

Abstract

Disclosed is a conductive atomic force microscope capable of measuring the electric capacity of a sample by providing alternating current power to the sample. The conductive atomic force microscope includes: a voltage provision device for providing a voltage to a sample; a current detection device for detecting a current generated by the provided voltage; and a characteristic calculation device for calculating IV characteristics of the sample on the basis of the detected current, wherein the voltage provision device provides an alternating current (AC) voltage to the sample and the characteristic calculation device calculates the electric capacity of the sample on the basis of the detected current.

IPC Classes  ?

• G01R 19/165 - Indicating that current or voltage is either above or below a predetermined value or within or outside a predetermined range of values
• G01R 27/26 - Measuring inductance or capacitanceMeasuring quality factor, e.g. by using the resonance methodMeasuring loss factorMeasuring dielectric constants
• G01R 23/165 - Spectrum analysisFourier analysis using filters
• G01R 31/28 - Testing of electronic circuits, e.g. by signal tracer
• G01Q 60/32 - AC mode

Abstract

The present invention relates to a method for measuring, by a measurement device, characteristics of a surface of an object to be measured. The method includes an approach step of positioning the tip to come into contact with a specific position of the surface of the object to be measured and a lift step of separating the contacted tip from the surface of the object are repeatedly performed with respect to a plurality of positions of the surface of the object. The tip is controlled to vibrate in a portion or the entirety of the approach step and the lift step, and a movement characteristic of the tip is controlled according to a change of the vibration characteristic of the tip.

IPC Classes  ?

• G01Q 60/38 - Probes, their manufacture or their related instrumentation, e.g. holders
• G01Q 20/02 - Monitoring the movement or position of the probe by optical means
• G01Q 70/10 - Shape or taper

Abstract

Disclosed is a method for measuring the characteristics of the surface of the object to be measured by means of a measuring apparatus for measuring the characteristics of the surface of the object to be measured by measuring an interaction between a tip and the surface of the object to be measured. Disclosed is a method for measuring the characteristics of the surface of the object to be measured by means of a measuring apparatus for measuring the characteristics of the surface of the object to be measured by measuring an interaction between a tip and the surface of the object to be measured. The method, according to an embodiment of the present invention is a method for measuring the characteristics of the surface of the object to be measured by repeating an approaching operation of bringing the tip close to and in contact with the surface of the object to be measured and a lifting operation. The approaching operation is performed by controlling such that a characteristic value reaches a set point, and the set point is variably set on the basis of the state of the point on which the approaching operation is performed.

IPC Classes  ?

• G01Q 60/38 - Probes, their manufacture or their related instrumentation, e.g. holders

Abstract

Provided are an apparatus and a method for identifying a target position in an atomic microscope. An apparatus is configured to acquire result data identifying the cantilever from an image using an identification model learned to identify the cantilever based on the image photographed by a photographing unit, and calculate a target position from the cantilever using the acquired result data, in which the result data include at least one of bounding box data representing a bounding box including a boundary of the cantilever and segmentation data obtained by segmenting the cantilever and an object other than the cantilever.

IPC Classes  ?

• G01Q 60/38 - Probes, their manufacture or their related instrumentation, e.g. holders
• G01Q 70/08 - Probe characteristics
• G01Q 20/02 - Monitoring the movement or position of the probe by optical means

Abstract

The present disclosure provides a measuring method for measuring heat distribution of a specific space using an SThM probe, and a method and device for detecting a beam spot of a light source. The method according to an embodiment of the present disclosure is the measuring method for measuring heat distribution of a specific space, the measuring method includes: linearly moving a SThM probe that may measure a temperature change in the specific space; and calculating heat distribution of the specific space using continuous temperature change values obtained from the SThM probe during the moving step. According to the measuring method, and the method and device for detecting a beam spot of a light source, it is possible to map temperature distribution in a small space using a SThM probe and it is possible to accurately detect a beam spot using the temperature distribution.

IPC Classes  ?

• G01Q 60/58 - SThM [Scanning Thermal Microscopy] or apparatus therefor, e.g. SThM probes
• G01K 3/00 - Thermometers giving results other than momentary value of temperature
• G01K 13/00 - Thermometers specially adapted for specific purposes

Abstract

An atomic force microscope equipped with an optical measurement device is disclosed. An atomic force microscope equipped with an optical measurement device which acquires characteristics of a surface of a measurement target by moving a probe along the surface of the measurement target while scanning the measurement target on an XY plane using an XY scanner for supporting the measurement target, includes: an optical measurement device including a lighting unit configured to allow light to enter the surface of the measurement target, and a detection unit configured to detect light reflected by the surface of the measurement target, the optical measurement device being configured to acquire the characteristics of the surface of the measurement target by the scanning by the XY scanner; and a control device configured to control an operation of the atomic force microscope and an operation of the optical measurement device.

IPC Classes  ?

• G01Q 30/02 - Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
• G01Q 10/04 - Fine scanning or positioning
• G01Q 60/40 - Conductive probes

Abstract

The present invention relates to a method for acquiring a surface characteristic of a measuring object using a tilted tip, an atomic force microscope for carrying out the method, and a computer program stored on a storage medium for carrying out the method, capable of acquiring an image deeply to the inside of an undercut structure and easily separating a tip from the inside of the undercut structure. The method according to an exemplary embodiment of the present invention is a method for acquiring a surface characteristic of a measuring object using a measuring device including a tip interacting with the surface of the measuring object. The method includes a normal measuring step of acquiring a surface characteristic of the measuring object while relatively moving the tip in a first direction with respect to the surface of the measuring object using a first control method, a separating step of controlling the tip to deviate from an abnormal state by a second control method set based on a predefined shape of the surface of the measuring object when it is determined as the abnormal state in which at least one characteristic value obtained by the tip is out of a specific range during the normal measuring step, and a step of performing the normal measuring step again after the separating step.

IPC Classes  ?

• G01Q 70/02 - Probe holders
• G01Q 70/10 - Shape or taper

Goods & Services

Scanning probe microscopes for semiconductor processing; scanning probe microscopes; magnetic measuring apparatus and instruments used to generate and measure magnetic fields; electron microscopes; precision measuring apparatus for high-resolution measurement of nanometer-sized particles, nanostructures, and surface characteristics, as well as for measuring the particle sizes of semiconductors, nanosensors, and nanostructures; surface roughness testing machines and instruments; microscopes

Goods & Services

Scanning probe microscopes for semiconductor processing; scanning probe microscopes; magnetic measuring apparatus and instruments used to generate and measure magnetic fields; electron microscopes; precision measuring apparatus for high-resolution measurement of nanometer-sized particles, nanostructures, and surface characteristics, as well as for measuring the particle sizes of semiconductors, nanosensors, and nanostructures; surface roughness testing machines and instruments; microscopes

Abstract

An apparatus and a method for identifying a sample position in an atomic force microscope according to an exemplary embodiment of the present disclosure are provided. The method for identifying a sample position in an atomic force microscope includes receiving a vision image including a subject sample through a vision unit; determining a subject sample region in the vision image using a prediction model which is configured to output the subject sample region by receiving the vision image as an input; and determining a position of the subject sample based on the subject sample region.

IPC Classes  ?

• G01Q 30/02 - Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
• G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
• G01Q 30/20 - Sample handling devices or methods
• G01Q 60/24 - AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes

Abstract

The present invention relates to a method for measuring the characteristics of the surface of an object to be measured by variably setting a strength-set point on the basis of the state of a point being approached during an approaching operation of a pin point mode, an atomic microscope for performing the method, and a computer program stored in a storage medium for performing the method. The method, according to an embodiment of the present invention for solving the problem, is a method for measuring the characteristics of the surface of the object to be measured by means of a measuring apparatus for measuring the characteristics of an object to be measured by measuring an interaction between a tip and the surface of the object to be measured, and a method for measuring the characteristics of the surface of the object to be measured by repeating an approaching operation of bringing the tip close to and in contact with the surface of the object to be measured and a lifting operation. The approaching operation is performed by controlling such that a characteristic value reaches a set point, and the set point is variably set on the basis of the state of the point on which the approaching operation is performed.

IPC Classes  ?

• G01Q 20/00 - Monitoring the movement or position of the probe
• G01B 7/012 - Contact-making feeler heads therefor
• G01B 7/00 - Measuring arrangements characterised by the use of electric or magnetic techniques
• G01B 7/26 - Measuring arrangements characterised by the use of electric or magnetic techniques for measuring depth
• G01Q 10/04 - Fine scanning or positioning

Abstract

The present invention relates to: a method for measuring, by a measurement device, characteristics of a surface of an object to be measured, wherein the method achieves a faster measurement speed, can reduce wearing of a tip, and is suitable for measuring a deep and narrow trench structure; an atomic force microscope for performing the method; and a computer program stored in a storage medium to perform the method. The method according to an embodiment of the present invention to solve the problem above is a method for measuring characteristics of a surface of an object to be measured, by a measurement device which measures characteristics of the surface of the object, by measuring an interaction between a tip and the surface of the object. In the present method, an approach step of positioning the tip to come into contact with a specific position of the surface of an object to be measured and a lift step of separating the contacted tip from the surface of the object are repeatedly performed with respect to a plurality of positions of the surface of the object, wherein the tip is controlled to vibrate in a portion or the entirety of the approach step and the lift step, and a movement characteristic of the tip is controlled according to a change of a vibration characteristic of the tip.

IPC Classes  ?

• G01Q 20/00 - Monitoring the movement or position of the probe
• G01B 7/012 - Contact-making feeler heads therefor
• G01B 7/00 - Measuring arrangements characterised by the use of electric or magnetic techniques
• G01Q 10/04 - Fine scanning or positioning

Abstract

The present disclosure provides a measuring method for measuring heat distribution of a specific space using an SThM probe, and a method and device for detecting a beam spot of a light source. The method according to an embodiment of the present disclosure is the measuring method for measuring heat distribution of a specific space, the measuring method includes: linearly moving a SThM probe that may measure a temperature change in the specific space; and calculating heat distribution of the specific space using continuous temperature change values obtained from the SThM probe during the moving step. According to the measuring method, and the method and device for detecting a beam spot of a light source, it is possible to map temperature distribution in a small space using a SThM probe and it is possible to accurately detect a beam spot using the temperature distribution.

IPC Classes  ?

• G01Q 60/58 - SThM [Scanning Thermal Microscopy] or apparatus therefor, e.g. SThM probes
• G01K 3/00 - Thermometers giving results other than momentary value of temperature
• G01K 13/00 - Thermometers specially adapted for specific purposes

Abstract

The present invention relates to: a method for obtaining characteristics of a surface to be measured, by using an inclined tip, the method being capable of deeply obtaining an image up to the inside of an undercut structure and enabling the tip to easily exit the inside of the undercut structure; an atomic force microscope for performing this method; and a computer program stored in a storage medium in order to perform this method. A method, according to one embodiment of the present invention, for accomplishing the task is a method for obtaining the characteristics of a surface to be measured, by using a measurement device including a tip that interacts with the surface to be measured. The method comprises: a normal-measurement step of obtaining the characteristics of the surface to be measured while relatively moving, using a first control scheme, the tip in a first direction with respect to the surface to be measured; an exiting step in which the tip is controlled so as to leave an abnormal state by means of a second control scheme configured on the basis of a predefined shape of the surface to be measured, when at least one characteristic value obtained by the tip deviates from a specific range and is determined to be in the abnormal state during the normal-measurement step; and a step of performing the normal-measurement step again after the exiting step.

IPC Classes  ?

• G01Q 70/10 - Shape or taper
• G01Q 60/00 - Particular types of SPM [Scanning-Probe Microscopy] or apparatus thereforEssential components thereof

Abstract

A chip carrier exchanging device receives a used chip carrier from a head of a scanning probe microscope that performs measurement by using the chip carrier configured such that a measurement means is attached to a carrier made of a magnetic material, and the chip carrier exchanging device supplies a new chip carrier to the head. The chip carrier exchanging device includes: a permanent magnet; a magnetism flow connecting unit made of a magnetic material that allow magnetism to flow therethrough, the magnetism flow connecting unit being configured to fix the chip carrier by exerting a magnetic effect on the carrier; and a drive unit configured to operate the permanent magnet to change magnetic force between the carrier and the magnetism flow connecting unit.

IPC Classes  ?

• G01Q 70/02 - Probe holders
• G01Q 60/38 - Probes, their manufacture or their related instrumentation, e.g. holders

Abstract

A measurement method in which a sensing unit acquires surface data of a measurement target while scanning the surface of the measurement target and at least one of the sensing unit and the measurement target is moved in order for the sensing unit to scan the surface along a plurality of fast scan lines on the surface of the measurement target, includes: a first step in which the sensing unit scans a surface along any one fast scan line of the plurality of fast scan lines to acquire the surface data along the any one fast scan line; and a second step in which the sensing unit acquires a surface data along a fast scan line most adjacent to the any one fast scan line while at least one of the sensing unit and the measurement target is moved along the most adjacent fast scan line, after the first step.

IPC Classes  ?

• G01Q 10/04 - Fine scanning or positioning
• G01Q 30/06 - Display or data processing devices for error compensation
• G01Q 10/06 - Circuits or algorithms therefor

Abstract

Provided are a head having improved usability by limiting a movement range of a laser spot and an atomic force microscope having the same. A head according to an exemplary embodiment of the present disclosure is a head measuring bending of a cantilever by using a laser beam reflected on the surface of the cantilever in order to acquire information on a sample surface by using a tip of the cantilever. The head includes: a spot moving means configured to move a laser spot so as to position the laser spot on the surface of the cantilever; and a movement limiting means configured to limit a movement range of the laser spot moved by the spot moving means in a predetermined range.

IPC Classes  ?

• G01Q 20/02 - Monitoring the movement or position of the probe by optical means
• B82Y 35/00 - Methods or apparatus for measurement or analysis of nanostructures

Abstract

An image acquiring method for acquiring an image using a measurement apparatus including an image acquiring means which acquires an image of a surface of a target to be measured in the unit of predetermined size pixels and a moving means capable of moving the target to be measured, the image acquiring method includes: acquiring an image of a first region from the surface of the target to be measured through the image acquiring means; acquiring an image of a second region, which is different from the first region, by moving the target to be measured, through the moving means; acquiring a differential image by subtracting, from either the image of the first region or the image of the second region, the other image; and overlapping the differential image multiple times.

IPC Classes  ?

• G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
• G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
• G06T 5/50 - Image enhancement or restoration using two or more images, e.g. averaging or subtraction
• G06T 7/00 - Image analysis

Abstract

The present invention relates to an image acquiring method, which can more specifically image defects of a flat surface of a target to be measured such as a wafer, and an image acquiring apparatus using the same. An image acquiring method according to one embodiment of the present invention acquires an image by using a measurement apparatus including an image acquiring means which acquires an image of a surface of a target to be measured in the unit of predetermined size pixels and a movement means which can move the target to be measured. The method comprises the steps of: acquiring an image of a first region from the surface of the target to be measured, through the image acquiring means; acquiring an image of a second region, which is different from the first region, by moving the target to be measured, through the movement means; acquiring a differential image by subtracting, from either the image of the first region or the image of the second region, the other image; and overlapping the differential image multiple times.

IPC Classes  ?

• G01N 21/88 - Investigating the presence of flaws, defects or contamination
• G06T 5/50 - Image enhancement or restoration using two or more images, e.g. averaging or subtraction
• G01Q 30/00 - Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices

Abstract

The present invention relates to a leveling apparatus that levels an object to be leveled with a surface of a substrate by measuring the force applied to the object, and an atomic force microscope including the leveling apparatus. A leveling apparatus according to the present invention, which levels an object with a substrate such that one side of the object is brought in parallel contact with the surface of the substrate, includes: force sensors disposed to measure force at at least three points on the other side of the object; an angle adjusting unit disposed to adjust the angle between the object and the surface of the substrate; and a controller connecting with the force sensors and the angle adjusting unit to drive the angle adjusting unit on the basis of data from the force sensors. The controller obtains the data on force applied to the force sensors by bringing one side of the object in contact with the surface of the substrate at a predetermined angle, calculates the degree of relative inclination between the object and the surface of the substrate from the data on force, and levels the object with the surface of the substrate by adjusting the angle of the object or the substrate with the angle adjusting unit on the basis of the degree of relative inclination.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• B82Y 10/00 - Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• G01Q 70/02 - Probe holders
• G01Q 70/06 - Probe tip arrays
• G01Q 80/00 - Applications, other than SPM, of scanning-probe techniques

Abstract

A scanning probe microscope compensates for relative drift between its upper structure that includes a probe and a scanner that scans the probe in a straight line and a lower structure that includes a sample stage and a scanner that scans the sample stage in a plane. A light beam from the upper structure is initially aligned with a center of a position sensitive photo detector (PSPD) disposed on the lower structure at a predetermined position of the sample stage and any subsequent misalignments of the light beam with the center of the PSPD at the predetermined position of the sample stage are determined to be caused by drift and compensated by the scanning probe microscope.

IPC Classes  ?

• G01Q 10/00 - Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe

Abstract

A scanning probe microscope tilts the scanning direction of a z-scanner by a precise amount and with high repeatability using a movable assembly that rotates the scanning direction of the z-scanner with respect to the sample plane. The movable assembly is moved along a curved guide by a rack-and-pinion drive system and has grooves that engage with corresponding ceramic balls formed on a stationary frame to precisely position the movable assembly at predefined locations along the curved guide. The grooves are urged against the ceramic balls via a spring force and, prior to movement of the movable assembly, a pneumatic force is applied to overcome the spring force and disengage the grooves from the ceramic balls.

IPC Classes  ?

• G01N 13/16 -
• H01J 37/20 - Means for supporting or positioning the object or the materialMeans for adjusting diaphragms or lenses associated with the support

Abstract

An automatic probe exchange system for a scanning probe microscope (SPM) exchanges probes between a probe mount on the SPM and a probe mount on a probe tray based on differential magnetic force. When the magnetic force on the SPM side is greater, the probe is attached to the probe mount on the SPM. When the magnetic force on the probe tray side is greater, the probe is attached to the probe mount on the probe tray. The magnetic force on the probe tray side is varied by moving the magnets that generate the magnetic force on the probe tray side closer to or further from the probe.

IPC Classes  ?

• H01J 37/00 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Abstract

Provided is a scanning probe microscope (SPM), a probe of which can be automatically replaced and the replacement probe can be attached onto an exact position. The SPM includes a first scanner that has a carrier holder, and changes a position of the carrier holder in a straight line; a second scanner changing a position of a sample on a plane; and a tray being able to store a spare carrier and a spare probe attached to the spare carrier. The carrier holder includes a plurality of protrusions.

IPC Classes  ?

• G01N 23/00 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or
• G21K 7/00 - Gamma ray or X-ray microscopes

Abstract

Provided is a scanning probe microscope capable of precisely analyzing characteristics of samples having an overhang surface structure. The scanning probe microscope comprises a first probe, a first scanner changing a position of the first probe along a straight line, and a second scanner changing a position of a sample in a plane, wherein the straight line in which the position of the first probe is changed by using the first scanner is non-perpendicular to the plane in which the position of the sample is changed by using the second scanner.

IPC Classes  ?

• G01N 23/00 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or

Abstract

Provided are a scanning probe microscope (SPM) that prevents a distortion of an image caused by alignment errors of scanners and a method of measuring a sample using the same. The scanning probe microscope comprises a probe; a first scanner changing a position of the probe along a straight line; a second scanner changing a position of a sample in a plane; and an adjusting device adjusting a position of the second scanner or the first scanner so that the straight line where the position of the probe is changed using the first scanner is perpendicular to the plane in which the position of the sample is changed using the second scanner.

IPC Classes  ?

• G01N 23/00 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or
• G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
• H01J 3/14 - Arrangements for focusing or reflecting ray or beam

Goods & Services

instruments for carrying out microscale and nanoscale measurements and analyses, namely, scanning probe microscopes and atomic force microscopes

Goods & Services

Biological microscopes; Metallurgical microscopes; Microscopes; Microscopes and parts thereof; Precision instruments for manipulation and positioning of microscopic objects