Abrégé

A seed laser system for an EUV radiation source, the seed laser system comprising a laser configured to emit a pulsed laser beam, at least one electro-optic modulator located downstream of the laser, and an optical amplifier located downstream of the at least one electro-optic modulator, wherein the seed laser system further comprises an additional electro-optic modulator located downstream of the optical amplifier.

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation
• H01S 3/107 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation par commande de dispositifs placés dans la cavité utilisant des dispositifs électro-optiques, p.ex. produisant un effet Pockels ou Kerr
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes

Abrégé

An optical amplifier comprises: an amplification chamber; a first pump; a first heat exchanger; a second pump; and a new catalyst module. The amplification chamber is configured to receive a laser beam and output an amplified laser beam. The first pump is configured to pump a gain medium around a gain medium system. The second pump is configured to pump a cooling fluid through the first heat exchanger. The first heat exchanger is arranged to transfer heat from the gain medium to a cooling fluid after the gain medium has passed through the amplification chamber. The new catalyst module comprises: a body and a catalyst disposed within the body. The body forms part of the gain medium system and is disposed downstream of the amplification chamber and upstream of the first heat exchanger. In use, the gain medium is adjacent to, or in contact with, the catalyst.

Classes IPC  ?

• H01S 3/03 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet - Détails de structure des tubes laser à décharge dans le gaz
• H01S 3/04 - Dispositions pour la gestion thermique
• H01S 3/036 - Moyens pour obtenir ou maintenir la pression désirée du gaz à l'intérieur du tube, p.ex. au moyen d'un getter ou d'une réactivation; Moyens pour faire circuler le gaz, p.ex. pour uniformiser la pression à l'intérieur du tube
• H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
• H01S 3/104 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation par commande du milieu actif, p.ex. par commande des procédés ou des appareils pour l'excitation dans des lasers à gaz
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes

Abrégé

There is described a gas-based laser comprising a heat exchanger for cooling compressed gas from a first temperature to a second temperature being lower than said first temperature, wherein said heat exchanger comprises at least two heat exchanging elements, characterized in that the first of the at least two heat exchanging elements is arranged to cool compressed gas from said first temperature to an intermediate temperature lower than said first temperature, and a second of the at least two heat exchanging elements is arranged to cool the compressed gas from said intermediate temperature to the second temperature being lower than said intermediate temperature, wherein the first and second heat exchanging elements are located in two mutually exclusive heat transfer circuits, and wherein an inlet temperature of a coolant in a first heat transfer circuit is lower than an inlet temperature of a coolant in a second heat transfer circuit. Also described is a lithographic apparatus including such a gas-based laser, a method of improving the efficiency of a gas-based laser, as well as the use of such a gas-based laser, lithographic apparatus or method in a lithographic method or apparatus.

Classes IPC  ?

• H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
• H01S 3/036 - Moyens pour obtenir ou maintenir la pression désirée du gaz à l'intérieur du tube, p.ex. au moyen d'un getter ou d'une réactivation; Moyens pour faire circuler le gaz, p.ex. pour uniformiser la pression à l'intérieur du tube
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/04 - Dispositions pour la gestion thermique

Abrégé

A method for generating laser pulses includes generating first laser pulses and second laser pulses using at least one laser source, and amplifying the first laser pulses and second laser pulses using an optical amplifier. Each respective second laser pulse passes through the optical amplifier offset in time in relation to a respective first laser pulse by a time offset. The method further includes separating the first laser pulses from the second laser pulses using an optical beam splitter based on at least one beam property, and passing the first laser pulses through a retardation unit. A time duration for each respective first laser pulse to pass through a retardation section of the retardation unit corresponds to the time offset. The method further includes superimposing the first laser pulses with the second laser pulses using a superposition unit to form superimposed laser pulses.

Classes IPC  ?

• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• G02B 27/14 - Systèmes divisant ou combinant des faisceaux fonctionnant uniquement par réflexion
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

A method for changing a polarization of a working laser beam includes generating the working laser beam in a working laser source, and irradiating a Verdet medium of a Faraday rotator using the working laser beam. The method further includes changing a charge carrier density of the Verdet medium by irradiating the Verdet medium using an excitation laser beam, and/or applying an electric field to the Verdet medium using an electrode, and/or changing a temperature of the Verdet medium using a heating element and/or a cooling element.

Classes IPC  ?

• B23K 26/064 - Mise en forme du faisceau laser, p.ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p.ex lentilles, miroirs ou prismes
• G02B 5/30 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles Éléments polarisants

Abrégé

A focusing device for focusing at least two laser beams onto a moving target material in a target region for generating extreme ultraviolet (EUV) radiation is provided. The focusing device includes a first focusing element for focusing a first laser beam onto the target material at a first position in the target region, a second focusing element for focusing a second laser beam onto the target material at a second position in the target region, and a reflective optical element for reflecting the EUV radiation generated by the target material. An optical axis of the first focusing element and/or an optical axis of the second focusing element are aligned approximately parallel or congruently with respect to an optical axis of the reflective optical element.

Classes IPC  ?

• G02B 27/16 - Systèmes divisant ou combinant des faisceaux utilisés comme moyens auxiliaires pour la mise au point
• G02B 27/10 - Systèmes divisant ou combinant des faisceaux

Abrégé

An optical amplifier configured to amplify a laser beam, the optical amplifier comprising: an optical path of the laser beam, the optical path comprising a first part and a second part and a reflector configured to reflect the laser beam so as to direct the laser beam between the first and second parts of the optical path, the reflector being configured to reflect the laser beam such that the laser beam reflected by the reflector is parallel to the laser beam incident on the reflector.

Classes IPC  ?

• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/07 - Structure ou forme du milieu actif consistant en une pluralité de parties, p.ex. segments
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to an electrooptical modulator (14) for adjusting the polarisation (P2) of a laser beam (16). An end face (40) of the electrooptical modulator (14), through which end face the laser beam (16) can be radiated into the electrooptical modulator (14), is oriented so as to be inclined at an acute first inclination angle (NW1) with respect to a first lateral face (38a) of the electrooptical modulator (14), wherein the first lateral face (38a) adjoins the end face (40).

Classes IPC  ?

• G02F 1/03 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur basés sur des céramiques ou des cristaux électro-optiques, p.ex. produisant un effet Pockels ou un effet Kerr
• H01S 3/107 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation par commande de dispositifs placés dans la cavité utilisant des dispositifs électro-optiques, p.ex. produisant un effet Pockels ou Kerr
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

A CO2 beam source includes a discharge tube in which a laser gas serves as a laser medium, a fan for supplying the laser gas into the discharge tube via a supply element and for removing the laser gas from the discharge tube via a removal element in a closed laser gas circuit, and a catalyst for catalysing oxidation of dissociation products formed upon excitation of the laser gas. The catalyst includes precious metal nanoparticles applied to a substrate. The catalyst is arranged with clearance from the discharge tube in the flow direction of the laser gas within the closed laser gas circuit in order to reduce deposition of degradation products formed in the discharge tube upon excitation of the laser gas compared to an arrangement within the discharge tube. A temperature of the at least one catalyst during operation of the CO2 beam source is at least 60° C.

Classes IPC  ?

• H01S 3/036 - Moyens pour obtenir ou maintenir la pression désirée du gaz à l'intérieur du tube, p.ex. au moyen d'un getter ou d'une réactivation; Moyens pour faire circuler le gaz, p.ex. pour uniformiser la pression à l'intérieur du tube
• H01S 3/04 - Dispositions pour la gestion thermique
• H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes

Abrégé

The invention relates to a beam diaphragm (10) comprising: a diaphragm opening (12) for allowing the passage of a laser beam (14); a deflection unit (16) for deflecting a portion of the laser beam (14) not allowed to pass through the diaphragm opening (12); a reflection unit (18) for reflecting the deflected portions of the laser beam (14); and a sensor unit (20) for detecting the reflex (21) of the deflected portions of the laser beam (14). The invention also relates to an EUV light source (39) having such a beam diaphragm (10), and to a method for operating such an EUV light source (39).

Classes IPC  ?

• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• G02B 5/00 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

An EUV excitation light source includes a laser source configured to emit a laser beam. The laser beam includes two partial beams having different wavelengths. The EUV excitation light source further includes a separating optical element for separating the two partial beams of the laser beam into two separated beams, and a superposition unit for superimposing the two separated beams at a predefined superposition location with a predefined superposition angle. The separating optical element includes a first reflective diffraction grating.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

A EUV light source includes a prepulse laser source for emitting a prepulse laser beam at a prepulse wavelength, a main pulse laser source for emitting a main pulse laser beam at a main pulse wavelength, a prepulse beam guiding device for feeding the prepulse laser beam into a radiation generating chamber for irradiation of a target material with a prepulse, and a main pulse beam guiding device for feeding the main pulse laser beam into the radiation generating chamber for irradiation of the target material with a main pulse. The target material is configured to emit EUV radiation on account of the irradiation with the prepulse and the main pulse. The prepulse beam guiding device has a separation device configured to reflect disturbing radiation in a wavelength range that does not include the prepulse wavelength back into the radiation generating chamber or into at least one beam trap.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to an assembly (14a, 14b) for laser protection with an optical element (16a, 16b) for reflecting and/or absorbing a laser beam (18), and with a sensor (30a, 30b) which is arranged on the optical element (16a, 16b) or spaced apart from the optical element (16a, 16b), in order to detect trans-illumination of the laser beam (18) through the optical element (16a, 16b). The sensor (30a, 30b) has a substrate (42) with a conductor track (44a, 44b) which is arranged on the surface of the substrate (42), wherein the conductor track (44a, 44b) is routed in a labyrinth shape.

Classes IPC  ?

• B23K 26/70 - Opérations ou équipement auxiliaires
• B23K 37/00 - Dispositifs ou procédés auxiliaires non spécialement adaptés à un procédé couvert par un seul des autres groupes principaux de la présente sous-classe
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

The invention relates to a beam-forming arrangement (10) with an absorber (12). The absorber (12) has a beam dump (14) with an optical axis. The beam dump (14) has an annular gap that is rotationally symmetrical relative to the optical axis, preferably tapers and extends radially outwardly. Particularly preferably, the absorption faces of the annular gap facing one another are, at least in some regions, preferably to a large degree, parabolic when viewed in the longitudinal section through the beam dump (14). The absorber (12) can have a through-opening for irradiating a stop (28) with a forward-running light beam (32), said stop being downstream of the absorber (12). The arrangement of absorber (12) and stop (28) can be shortened by an intermediate piece (36) arranged between absorber (12) and stop (28), said intermediate piece having a funnel-shaped intermediate piece through-opening. The forward-running light beam (32), here in the form of a laser beam, can be used to irradiate target material (40) to generate EUV radiation (42).

Classes IPC  ?

• G02B 5/00 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles

Abrégé

The invention relates to an optical apparatus (10), in particular for generating EUV radiation (12), comprising a measuring device (30). The invention also relates to the use of a measuring device (30) in an optical apparatus (10) for generating EUV radiation (12). The measuring device (30) has at least two optical elements (36, 38), which separate a near-field beam path from a far-field beam path and image both a near-field plane and a far-field plane on a target (34). The far-field beam path is preferably generated reflection-free, the near-field beam path is preferably generated by multiple reflection, in particular in only one of the optical elements (36, 38).

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• G02F 1/33 - Dispositifs de déflexion acousto-optique
• H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a device (10) for correcting the astigmatism of a laser beam (12) which interacts with the device (10). The device (10) has an optical element (14) and two deformation elements (22a, 22b) which in particular exert a pushing and/or pulling force on the optical element (14) in order to deform same. The optical element (14) is equipped with four supports (16a – 16d) which are arranged along an imaginary circle (18) in order to prevent a movement of the optical element (14) at least in the direction of the forces exerted thereon by the deformation elements (22a, 22b). The supports (16a – 16d) are arranged opposite one another in pairs with respect to the center (24) of the circle (18) which runs through the supports (16a – 16d). The two deformation elements (22a, 22b) likewise lie opposite each other with respect to the center (24) of the circle (18) which runs through the supports (16a – 16d). The deformation elements (22a, 22b) are arranged on a straight line running through the center (24) of the circle (18), said straight line dividing opposing angles in half, wherein each angle is defined by adjacent supports (16a – 16d) and the center (24) of the circle (18) which runs through the supports (16a – 16d).

Classes IPC  ?

• G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
• G02B 27/00 - Systèmes ou appareils optiques non prévus dans aucun des groupes ,
• G02B 26/06 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la phase de la lumière
• G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs

Abrégé

The invention relates to a method (12) for monitoring a laser lens system (16). At least one sensor (24) measures the vibrations, the structure-borne sound and/or the sound emitted by the laser lens system (16). The measurement can be limited to a modulation frequency of a laser beam (18) directed through the laser lens system (16). Alternatively or additionally, the measurement can be compared with a measurement carried out during optimal operation. The invention further relates to a laser apparatus (10), in particular for carrying out such a method (12).

Classes IPC  ?

• G01N 29/14 - Recherche ou analyse des matériaux par l'emploi d'ondes ultrasonores, sonores ou infrasonores; Visualisation de l'intérieur d'objets par transmission d'ondes ultrasonores ou sonores à travers l'objet utilisant des techniques d'émission acoustique
• G01M 11/00 - Test des appareils optiques; Test des structures ou des ouvrages par des méthodes optiques, non prévu ailleurs
• G01N 21/958 - Inspection de matériaux transparents
• G01N 29/24 - Sondes
• G01N 29/34 - Génération des ondes ultrasonores, sonores ou infrasonores
• G01N 29/42 - Détection du signal de réponse par filtrage en fréquence
• G01N 29/44 - Traitement du signal de réponse détecté
• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques
• G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
• G03F 7/00 - Production par voie photomécanique, p.ex. photolithographique, de surfaces texturées, p.ex. surfaces imprimées; Matériaux à cet effet, p.ex. comportant des photoréserves; Appareillages spécialement adaptés à cet effet

Abrégé

The invention relates to a device (10) and to a method (12) for generating EUV radiation (14) by irradiating target material (15) with at least one laser beam (18). The at least one laser beam (18) is formed by a beam-forming arrangement (20) which has a focusing unit (22). Arranged upstream of the focusing unit (22) is a beam rotator (28) in order for it to be possible to compensate for different image field rotations of different types of beam-forming arrangements (20). As a result, identical optical components can be located upstream of types of beam-forming arrangements (20), in particular upstream of the beam rotator (28).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a method (24) for monitoring a laser system (17) and to a laser system (17) which can be monitored. The laser system (17) has a laser unit (1, 1a) with a blower (12) for moving laser gas (11). The performance of the blower (12) can be inferred from a blower parameter value. According to the invention, the blower parameter value is compared to a reference value of the blower parameter. If the deviation of the blower parameter value from the reference value exceeds a prescribed tolerance value, a warning message (23) is output. This allows a leak to be detected without the laser unit (1, 1a) having to be shut down. If a leak is detected, the laser unit (1, 1a) can be repaired in the course of planned maintenance work, so that unplanned shutdowns can be avoided.

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/036 - Moyens pour obtenir ou maintenir la pression désirée du gaz à l'intérieur du tube, p.ex. au moyen d'un getter ou d'une réactivation; Moyens pour faire circuler le gaz, p.ex. pour uniformiser la pression à l'intérieur du tube
• H01S 3/07 - Structure ou forme du milieu actif consistant en une pluralité de parties, p.ex. segments
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a back reflection protection by means of destructive interference of a returning laser pulse. A forward laser pulse (30) is subdivided, a first forward laser pulse portion (30a) passes, unlike a second forward laser pulse portion (30b), through a first beam path (19). The two laser pulse portions (30a, b) are superimposed at least in part. Subsequently, the forward laser pulse (30) is reflected, and the reflected, returning laser pulse passes mainly through the same path as the forward laser pulse (30), but a returning first laser pulse portion is phase-shifted, when passing through the first beam path (19), in such a way that, on its way to the laser beam source (14), it is destructively superimposed at least in part, in particular in full, with a returning second laser pulse portion, so that the laser beam source (14) is protected against the returning laser pulse.

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• G02F 1/21 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur par interférence
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a device (1) for optically modulating a laser beam (2), comprising a device housing (3) and a cooling device. The device housing (3) comprises a housing wall (4) and an optical element (6), situated in the interior of the device housing (3), for laser beam modulation. The cooling device removes heat from the device housing (3), which heat is generated owing to the laser beam (2) incident on the optical element (6) for laser beam modulation. For this purpose, the cooling device comprises a heatsink (5) that is structurally separate from the device housing (3), which heatsink is arranged outside the device housing (3) and is thermally coupled to the device housing (3) by the heatsink (5) being in contact with the device housing (3) via the housing wall (4) of the device housing (3).

Classes IPC  ?

• G02B 6/42 - Couplage de guides de lumière avec des éléments opto-électroniques
• G03B 21/16 - Refroidissement; Prévention de la surchauffe
• H04N 9/31 - Dispositifs de projection pour la présentation d'images en couleurs
• G02B 7/18 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs
• H01S 3/04 - Dispositions pour la gestion thermique

Abrégé

The invention relates to an EUV light source (1), comprising a providing device (3) for providing a target material (4), at least one pulsed laser source (5, 6) for emitting at least one pulsed laser beam (9, 10), and a beam-guiding device (7) for the feeding of the at least one pulsed laser beam (9, 10) from the at least one pulsed laser source (5, 6) into a radiation generation chamber (2) and for the focused irradiation of the target material (4) with the at least one pulsed laser beam (9, 10) within the radiation generation chamber (2), wherein the target material (4) is designed to emit EUV radiation (11) as a result of the irradiation. The beam-guiding device (7) has, for the adjustment of the spatial position of the at least one pulsed laser beam (9, 10), at least one beam-position adjustment device (14, 15), which comprises four mirrors in the form of two mirror pairs, wherein the four mirrors can be rotated about exactly one axis of rotation each, the axes of rotation of the two mirrors of the first mirror pair being oriented in a first spatial direction and the axes of rotation of the two mirrors of the second mirror pair being oriented in a second spatial direction.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière

Abrégé

An optical assembly is for polarizing a laser beam. The optical assembly has a plurality of plate-shaped optical elements having a beam entry surface and a beam exit surface, and a holder configured to joint fix the plate-shaped optical elements. At least three spacers are arranged between each two adjacent ones of the plate-shaped optical elements. Each of the spacers is configured to provide punctiform contact with the respective beam exit surface of a first plate-shaped optical element, of the plate-shaped optical elements, and to provide punctiform contact with the respective beam entry surface of a second adjacent plate-shaped optical element, of the plate-shaped optical elements.

Classes IPC  ?

• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques
• G02B 5/20 - Filtres
• G02B 5/30 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles Éléments polarisants
• G02B 7/02 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour lentilles
• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs

Abrégé

An adjustable optical arrangement includes an optics mount, an optical element held at the optics mount, a holding structure having a ball joint for receiving the optics mount, a ball joint holding the optics mount at the holding structure, a first adjustment device configured to pivot the optics mount with respect to the holding structure about a first axis, and a second adjustment device configured to pivot the optics mount with respect to the holding structure about a second axis. The ball joint is disposed between the optical element and the first and the second adjustment device.

Classes IPC  ?

• G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

The invention relates to a method (12) for producing superimposed laser pulses (30a, b), which are each at least composed of first laser pulses (16a, b) and second laser pulses (18a, b). The first and second laser pulses (16a, b, 18a, b) are amplified with different properties. Following amplification, the first laser pulses (16a, b) are delayed vis-à-vis the second laser pulses (18a, b) in order to be superimposed on the second laser pulses (18a, b). The superimposed laser pulses (30a, b) are preferably used for producing extreme ultraviolet (EUV) radiation (38). The invention also relates to a device (10) for producing superimposed laser pulses (30a, b).

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a method for changing the polarization of a working-laser beam (12). The working-laser beam (12) is emitted from a working-laser source (22) toward a Faraday rotator (14). The Faraday rotator (14) has a Verdet medium (20) and a magnet (16), the magnetic field of which penetrates the Verdet medium (20). The method is characterized in that the density of the free charge carriers in the Verdet medium (20) and thus the Verdet constant of the Verdet medium (20) are changed. For this purpose, an electric field and/or a temperature change in the Verdet medium (20) is brought about by means of an excitation-laser beam (26) directed at the Verdet medium (20), an electrode disposed on the Verdet medium (20) and/or a heating/cooling element (28) disposed on the Verdet medium (20).

Classes IPC  ?

• G02F 1/00 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire
• G02F 1/09 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur basés sur des éléments magnéto-optiques, p.ex. produisant un effet Faraday

Abrégé

A beam guide guides a laser beam on a device for extreme ultraviolet lithography. The beam guide has a scraper mirror for coupling out laser radiation and a positioning device for positioning the scraper mirror in a positioning plane defined by first and second positioning axes. The positioning device contains first and second positioning units assigned to the first and second positioning axes, respectively. The first positioning unit has a first linear guide and a first positioning drive. By the first positioning drive, the scraper mirror is moved together with the mirror-side guide element of the first linear guide relative to the mirror-remote guide element of the first linear guide along the first positioning axis into a target position. The second positioning unit has a second linear guide and a second positioning drive, the second linear guide has a mirror-side guide element and a mirror-remote guide element.

Classes IPC  ?

• G03F 7/20 - Exposition; Appareillages à cet effet

Abrégé

The invention relates to a focusing device (10), in particular for producing EUV radiation. The focusing device (10) is designed to illuminate target material (12) on a target plane (14). The focusing device (10) comprises at least one beam-shaping element (26, 28), the optical axes (30, 32) of which are perpendicular to the target plane (14). As a result, the image plane of laser beams (18, 20) which are guided through at least one of the focusing elements (26, 28) is aligned parallel to the target plane (14). This enables the efficient irradiation of the target material (12). Completely distortion-free imaging of at least one laser beam (18, 20) can be obtained by way of an offset of the main axis of this laser beam (18, 20) with respect to the optical axis (30, 32) of the focusing element (26, 28) through which this laser beam (18, 20) is guided. A third laser beam (50) for intermediate irradiation of the target material (12) can be guided through one of the focusing elements (26, 28).

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/105 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation par commande de la position relative ou des propriétés réfléchissantes des réflecteurs de la cavité
• G02B 19/00 - Condenseurs

Abrégé

1222 beam source (1) is operated.

Classes IPC  ?

• H01S 3/036 - Moyens pour obtenir ou maintenir la pression désirée du gaz à l'intérieur du tube, p.ex. au moyen d'un getter ou d'une réactivation; Moyens pour faire circuler le gaz, p.ex. pour uniformiser la pression à l'intérieur du tube
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/04 - Dispositions pour la gestion thermique
• H01S 3/07 - Structure ou forme du milieu actif consistant en une pluralité de parties, p.ex. segments

Abrégé

The invention relates to an EUV excitation light source (A) comprising: a laser source (B) that is configured to emit a laser beam (1), the laser beam (1) comprising two partial beams (1´, 1´´) having different wavelengths (λ1, λ2), a separating optical element (C) for separating the two partial beams (1´, 1´´) of the laser beam (1) into two separated beams (2´, 2´´), and a superposition unit (D) for superimposing the two separated beams (2´, 2´´) at a predefined superposition location (3) with a predefined superposition angle (α), wherein the separating optical element is a first reflective diffraction grating (C). The invention also relates to an EUV light source (S), comprising: an EUV excitation light source (A) as described above, a vacuum chamber (T) comprising an irradiation region (4), and a focusing unit (U) for focusing the first separated beam (2') and the second separated beam (2'') in the irradiation region (4).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

VVVV), in a focused manner back into the beam generation chamber (2) or in a focused manner into at least one beam dump (24).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

To produce a housing base (3) of a housing provided for receiving and for defined positioning of at least one optical component, a blank wall of a housing base blank, provided for a base wall, is created with a first blank wall part provided for a first base wall part (28), with a second blank wall part provided for a second base wall part (29) and extending at an angle to the first blank wall part, and with a blank abutment surface provided for a base-side abutment surface (9). A first attachment surface (20, 21, 22, 23, 24, 25, 26) and a second attachment surface (20, 21, 22, 23, 24, 25, 26) for at least one optical component are then produced by machining of the first and the second blank wall part using a separating tool. The blank abutment surface on the blank wall is created with an abutment surface profile, on the basis of which the blank wall is recessed in regions which lie opposite the region of the first blank wall part provided for the first attachment surface (20, 21, 22, 23, 24, 25, 26) along a first work axis of the separating tool and opposite the region of the second blank wall part provided for the second attachment surface (20, 21, 22, 23, 24, 25, 26) along a second work axis of the separating tool. In the context of producing a housing for receiving and for defined positioning of at least one optical component, a housing base (3) of the housing is produced according to the above method. A housing for receiving and for defined positioning of at least one optical component is accordingly formed.

Classes IPC  ?

• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques
• G02B 27/28 - Systèmes ou appareils optiques non prévus dans aucun des groupes , pour polariser
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

The invention relates to a device (10) and to a method for simple introduction of a plurality of optical elements (18a-c) into a beam path, in particular into the beam path of an EUV-generation system. The device (10) preferably comprises a stepped pulley (32) that has at least one step designed to move the optical elements (18a-c) indirectly or directly into the beam path. More preferably, springs (36a-c) are provided, which indirectly or directly move the optical elements (18a-c) out of the beam path when the step(s) does/do not indirectly or directly act upon the optical elements (18a-c). The stepped pulley (32) can in particular be indirectly or directly rotated by a flexible shaft (28). Levers (34a-c) may be provided, each of which can be acted upon at one end by the step(s) and comprises at the other end the optical elements (18a-c). The strength of the optical effect of the optical elements (18a-c) increases with respect to an other of the optical elements (18a-c), preferably by the same factor, in particular by a factor of two.

Classes IPC  ?

• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques

Abrégé

A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).

Classes IPC  ?

• G03F 7/00 - Production par voie photomécanique, p.ex. photolithographique, de surfaces texturées, p.ex. surfaces imprimées; Matériaux à cet effet, p.ex. comportant des photoréserves; Appareillages spécialement adaptés à cet effet
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates in summary to a laser amplifier (2) having a laser discharge tube (3). The laser discharge tube (3) is situated between two electrodes (15). The electrodes (15) are preferably situated between two magnets (17). The two magnets (17) are preferably oriented parallel to each other so that the north poles and south poles of the two magnets (17) are directly opposite each other. The invention also relates to a gas laser (1) having such a laser amplifier (2) and to a method for operating a laser amplifier (2) in which the field lines (18, 19) of the electric and magnetic fields intersect, in particular at least partially perpendicularly, in the laser discharge tube (3).

Classes IPC  ?

• H01S 3/032 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet - Détails de structure des tubes laser à décharge dans le gaz pour le confinement de la décharge, p.ex. par des caractéristiques particulières du tube pour la contraction de la décharge
• H01S 3/0975 - Procédés ou appareils pour l'excitation, p.ex. pompage par décharge dans le gaz d'un laser à gaz utilisant une excitation inductive ou capacitive
• H01S 3/036 - Moyens pour obtenir ou maintenir la pression désirée du gaz à l'intérieur du tube, p.ex. au moyen d'un getter ou d'une réactivation; Moyens pour faire circuler le gaz, p.ex. pour uniformiser la pression à l'intérieur du tube
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes

Abrégé

A method for adjusting a laser beam includes, following passage of the laser beam through a beam-shaping device, measuring, via a detector of a detector device, a beam profile of the laser beam. The method further includes determining a beam quality property of the laser beam based on the measured beam profile and altering an adjustable optical unit for modifying at least one property of the laser beam prior to the entry into the beam-shaping device. For adjusting the laser beam, the adjustable optical unit is altered based on the determined beam quality property.

Classes IPC  ?

• H01S 3/13 - Stabilisation de paramètres de sortie de laser, p.ex. fréquence ou amplitude
• H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/106 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation par commande de dispositifs placés dans la cavité
• H01S 3/16 - Matériaux solides
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/225 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes comprenant un excimer ou un exciplex

Abrégé

The invention relates to an adjustable optical assembly (10), comprising an optical mounting (12), an optical element (14), which is retained on the optical mounting (12), and a retaining structure (16), wherein the optical mounting (12) is retained in a ball joint (18) on the retaining structure (16), wherein a first adjustment device (20) is provided for pivoting the optical mounting (12) about a first axis relative to the retaining structure (16), wherein a second adjustment device (22) is provided for pivoting the optical mounting (12) about a second axis relative to the retaining structure (16), and wherein the ball joint (18) is disposed between the optical element (14) and the first and second adjustment devices (20, 22).

Classes IPC  ?

• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques
• G02B 7/02 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour lentilles
• G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs
• H01S 3/086 - Structure ou forme des résonateurs optiques ou de leurs composants un ou plusieurs réflecteurs ayant des propriétés ou positions variables pour le réglage initial du résonateur

Abrégé

An arrangement monitors an optical element. The arrangement includes: a light source configured to emit radiation onto a surface of the optical element; a detector configured to detect the radiation that has been at least partially reflected at the surface of the optical element; and a holder for the optical element, in which the light source and the detector are integrated. The holder has a cooling region through which a cooling liquid is configured to flow, the cooling region being in contact with the optical element. The holder has a reservoir, through which a beam path between the light source and the detector extends. The reservoir is configured to receive the cooling liquid leaking out at the optical element in case of a leakage.

Classes IPC  ?

• H01S 3/04 - Dispositions pour la gestion thermique

Abrégé

The invention relates to an optical arrangement (20) for filtering laser radiation. The arrangement (20) has a wavelength-selective element (28), a first Fabry-Pérot interferometer (10), a polariser (36), and an A/4 phase shifter (38). The optical axis of the Fabry-Pérot interferometer (10) is oriented at an angle greater than 0° and less than 6° with respect to the laser beam incident on the Fabry-Pérot interferometer (10). The Fabry-Pérot interferometer (10) is designed both to couple out unwanted radiation portions (30) of the primary laser beam (24) incident on the Fabry-Pérot interferometer (10) and to couple out unwanted radiation portions (52) of the secondary laser beam (46) reflected by a laser beam target (40). Preferably, the arrangement (20) comprises at least one further Fabry-Pérot interferometer. Particularly preferably, the arrangement (20) comprises a telescope arrangement for expanding the primary laser beam (24) incident on the Fabry-Pérot interferometer (10). The invention also relates to a laser system comprising such an arrangement (20). Preferably, the laser system comprises an amplifier system which is located between two arrangements (20). Particularly preferably, the laser system is designed to generate EUV radiation. To this end, the laser beam target (40) can be in the form of a droplet.

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes

Abrégé

A focusing device for focusing a laser beam in a target area. The focusing device includes a paraboloid mirror configured to widen the laser beam; an ellipsoid mirror or a hyperboloid mirror configured to focus the widened laser beam at a focal position within the target area; and a movement device. The movement device is configured to move the ellipsoid mirror or the hyperboloid mirror relative to the paraboloid mirror, or together with the paraboloid mirror, to change the focal position within the target area.

Classes IPC  ?

• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• G02B 17/06 - Systèmes catoptriques, p.ex. systèmes redressant et renversant une image utilisant uniquement des miroirs
• G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

A reflective optical element includes a first, inner surface region for reflecting a first inner beam portion of a light beam impinging on the reflective optical element in order to form a first reflected light beam, and at least one second, outer surface region for reflecting at least one second outer beam portion of the impinging light beam for forming at least one second reflected light beam. The second surface region is designed to reduce a beam cross section of the second reflected light beam by comparison to the first reflected light beam such that the second reflected light beam extends along a superposition length completely within the first reflected light beam. In addition a beam guiding device has at least one such reflective optical element and an EUV-beam generating device has such a beam guiding device.

Classes IPC  ?

• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

A Faraday rotator includes: a disk-shaped magneto-optical solid-state medium, a magnet generator configured to generate a magnetic field in the magneto-optical solid-state medium, a heat sink with a support surface for the magneto-optical solid-state medium, a reflector mounted between the heat sink and the magneto-optical solid-state medium and configured to reflect a laser beam entering the magneto-optical solid-state medium in a first impingement region on a first side of the magneto-optical solid-state medium facing away from the support surface, and a deflector configured to deflect the laser beam emerging from the magneto-optical solid-state medium back to a second impingement region at least partly overlapping with the first impingement region on the first side. An optical isolator can have at least one such Faraday rotator. A driver laser arrangement can have at least one such optical isolator. An EUV radiation generation apparatus can have such a driver laser arrangement.

Classes IPC  ?

• G02F 1/09 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur basés sur des éléments magnéto-optiques, p.ex. produisant un effet Faraday
• G02B 1/12 - Revêtements optiques obtenus par application sur les éléments optiques ou par traitement de la surface de ceux-ci par traitement de la surface, p.ex. par irradiation

Abrégé

A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: • - a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); • - a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

The invention relates to a method for adjusting a laser beam (1), having the steps of: measuring a beam profile of the laser beam (1) after passing through a beam-shaping device (4) using at least one preferably spatially resolving detector (6a) of a detector device (6), ascertaining a beam quality property (D) of the laser beam (1) using the measured beam profile, and adjusting an adjustable optical unit (5) in order to change at least one property of the laser beam (1) prior to entering the beam-shaping device (4). In order to adjust the laser beam (1), the adjustable optical unit (5) is adjusted multiple times in particular on the basis of the ascertained beam quality property (D), preferably until the beam quality property (D) reaches a specified value (Ds). The invention also relates to a device (3a) for providing an adjusted laser beam (1) and to an EUV radiation generating device.

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/101 - Lasers munis de moyens pour changer l'origine ou la direction du rayonnement émis
• H01S 3/106 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation par commande de dispositifs placés dans la cavité
• B23K 26/06 - Mise en forme du faisceau laser, p.ex. à l’aide de masques ou de foyers multiples
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/16 - Matériaux solides

Abrégé

The invention relates to an arrangement (1) for monitoring an optical element (2), comprising: a light source (5) for emitting radiation (9) onto a surface (8) of the optical element (2); a detector (6) for detecting the radiation (9) reflected at least in part on the surface (8) of the optical element (2); and a holder (7) for the optical element (2), in which the light source (5) and the detector (6) are integrated. The holder (7) has a cooling region (10) through which a cooling liquid (12) can flow and which is in contact with the optical element (2). The holder (7) also comprises a reservoir (13) for receiving cooling liquid (12) escaping in the event of a leak on the optical element (2), through which reservoir the beam path (14) extends between the light source (5) and the detector (6). The invention also relates to a laser source and an EUV radiation generation apparatus having such an arrangement (1).

Classes IPC  ?

• G01M 11/00 - Test des appareils optiques; Test des structures ou des ouvrages par des méthodes optiques, non prévu ailleurs
• G01N 21/55 - Réflexion spéculaire
• G01M 3/38 - Examen de l'étanchéité des structures ou ouvrages vis-à-vis d'un fluide par utilisation de la lumière
• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques
• B23K 26/70 - Opérations ou équipement auxiliaires
• G02B 6/42 - Couplage de guides de lumière avec des éléments opto-électroniques

Abrégé

A polarizer arrangement for polarizing a laser beam includes: multiple plate-shaped optical elements which are arranged in a beam path of the laser beam and each of which includes a beam entry surface for the laser beam and a beam exit surface for the laser beam, in which the beam entry surface of a respective plate-shaped optical element is oriented at the Brewster angle relative to the laser beam. The beam entry surfaces and the beam exit surfaces of the plate-shaped optical elements are in each case oriented at least at one wedge angle relative to one another. An EUV radiation generating device may include such a polarizer arrangement.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• B23K 26/064 - Mise en forme du faisceau laser, p.ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p.ex lentilles, miroirs ou prismes
• G02B 5/30 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles Éléments polarisants

Abrégé

The invention relates to an optical assembly (23), in particular for polarization of a laser beam (30), comprising a plurality of plate-shaped optical elements (5, 6,…) having a beam entry surface (5a, 6a,...) and a beam exit surface (5b, 6b,...), and a holder (1) for jointly fixing the plate-shaped optical elements (5, 6,...). Between each two adjacent plate-shaped optical elements (5, 6,...), at least three spacers (11a, 11b,…) are arranged, each designed for punctiform attachment on a beam exit surface (5a, 6a,...) of a first plate-shaped optical element (5), and for punctiform attachment on a beam entry surface (6b, 7b,...) of a second, adjacent plate-shaped optical element (6). The invention further relates to an EUV radiation generating device comprising at least one such optical assembly (23).

Classes IPC  ?

• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques
• G02B 5/30 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles Éléments polarisants
• G02B 27/28 - Systèmes ou appareils optiques non prévus dans aucun des groupes , pour polariser
• H01S 3/22 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz

Abrégé

B1, . . . ) in a beam path of the laser beam.

Classes IPC  ?

• G01J 1/42 - Photométrie, p.ex. posemètres photographiques en utilisant des détecteurs électriques de radiations
• G02B 7/16 - Tourelles rotatives
• B23K 26/064 - Mise en forme du faisceau laser, p.ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p.ex lentilles, miroirs ou prismes
• B23K 26/402 - Enlèvement de matière en tenant compte des propriétés du matériau à enlever en faisant intervenir des matériaux non métalliques, p.ex. des isolants
• G01M 11/06 - Test de l'alignement des dispositifs d'éclairage des phares des véhicules

Abrégé

The invention relates to a focusing device (15) for focusing a laser beam (3) in a target region (5), in particular for generating EUV radiation (7), comprising: a paraboloidal mirror (16) for expanding the laser beam (3), an ellipsoidal or hyperboloidal mirror (17) for focusing the expanded laser beam (3) at a focus position (P2) within the target region (5), and a movement device (19), which is designed to move the ellipsoidal or hyperboloidal mirror (17) relative to the paraboloidal mirror (16) and/or together with the paraboloidal mirror (16) in order to change the focus position (P2) within the target region (5). The invention also relates to an EUV radiation generating device (1) that comprises a focusing device (15) of this type.

Classes IPC  ?

• G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs

Abrégé

The invention relates to a reflective optical element (16), comprising: a first, inner surface region (18a) for reflecting a first inner beam portion (20a) of a light beam (3) impinging on the reflective optical element (16) in order to form a first reflected light beam (21a), and at least one second, outer surface region (18b) for reflecting at least one second outer beam portion (20b) of the impinging light beam (3) for forming at least one second reflected light beam (21b), the second surface region (18b) being designed to reduce a beam cross section (D2) of the second reflected light beam (21b) by comparison to the first reflected light beam (21a) such that the second reflected light beam (21a) extends along a superposition length (L) completely within the first reflected light beam (21a). The invention also relates to a beam guiding device (4) having at least one such reflective optical element (16) and to an EUV-beam generating device (1) having such a beam guiding device (4).

Classes IPC  ?

• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a Faraday rotator (4), comprising: a disk-shaped magneto-optic solid-state medium (6), a magnet arrangement (11) for generating a magnetic field (B) in the magneto-optic solid-state medium (6), a heatsink (9) with a support area (10) for the magneto-optic solid-state medium (6), a reflector (13), attached between the heatsink (9) and the magneto-optic solid-state medium (6), for reflecting a laser beam (5) that enters the magneto-optic solid-state medium (6) at an impact region (12) at a first side (6a) facing away from the support area (10), and a deflection device (18) which is embodied to deflect the reflected laser beam (5) emerging from the magneto-optic solid-state medium (6) back to the first side (6a) of the magneto-optic solid-state medium (6). The deflection device (18) is embodied to deflect the laser beam (5) back to an impact region (12) at the first side (6a) of the magneto-optic solid-state medium (6), this impact region at least partly overlapping with, in particular being identical to, the impact region (12). The invention also relates to an optical isolator comprising at least one such Faraday rotator (4), a driver laser arrangement comprising at least one such optical isolator and an EUV radiation generation apparatus comprising such a driver laser arrangement.

Classes IPC  ?

• G02F 1/09 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur basés sur des éléments magnéto-optiques, p.ex. produisant un effet Faraday
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes

Abrégé

122) relative to one another. The invention further relates to an EUV radiation generating device comprising such a polariser arrangement (1).

Classes IPC  ?

• G02B 5/30 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles Éléments polarisants
• H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation
• G02B 27/28 - Systèmes ou appareils optiques non prévus dans aucun des groupes , pour polariser
• B23K 26/064 - Mise en forme du faisceau laser, p.ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p.ex lentilles, miroirs ou prismes

Abrégé

Driver laser systems for EUV radiation producing apparatuses are disclosed that include a beam source for producing laser radiation propagating in a first direction, an amplifier arrangement comprising at least one optical amplifier for amplifying the laser radiation propagating in the first direction, and at least one optical isolator. The optical isolator includes a chamber filled with a gas, through which chamber the laser radiation propagating in the first direction passes, and a plasma generating device configured for the pulsed ignition of a plasma in the gas of the chamber to suppress passage of laser radiation propagating in a second direction, opposite to the first direction, through the chamber. EUV radiation producing apparatuses that include such driver laser systems are also disclosed.

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• G03F 7/20 - Exposition; Appareillages à cet effet
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés

Abrégé

Methods, devices, and systems for amplifying laser pulses having different wavelengths in a drive laser assembly for an extreme ultraviolet (EUV) radiation generating device are provided. The drive laser assembly includes a radiation source configured to generate a first laser pulse having a first wavelength and a second laser pulse having a second wavelength, and an amplifier assembly having at least one optical amplifier for amplifying the first laser pulse and the second laser pulse. The amplifier assembly has at least one wavelength-selective optical element configured to attenuate the first laser pulse at the first wavelength more strongly than the second laser pulse at the second wavelength.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• G03F 7/20 - Exposition; Appareillages à cet effet
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés

Abrégé

Methods, devices and systems for linear polarization of a laser beam are provided. In one aspect, a polarization system includes: a first polarizer having a first polarizer surface for linear polarization of a laser beam propagating in a first direction and striking the first polarizer surface at a first angle, a phase shifter configured to rotate a polarization direction of the linearly polarized laser beam transmitted at the first polarizer surface by a predetermined rotation angle, and a second polarizer having a second polarizer surface, the linearly polarized laser beam striking the second polarizer surface at a second angle after having passed through the phase shifter and being transmitted by the second polarizer surface. An incidence plane of the laser beam striking the second polarizer surface is rotated by the predetermined rotation angle relative to an incidence plane of the laser beam striking the first polarizer surface.

Classes IPC  ?

• G02B 27/28 - Systèmes ou appareils optiques non prévus dans aucun des groupes , pour polariser
• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• G02B 5/30 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles Éléments polarisants

Abrégé

The disclosure relates to a beam trap including: a reflector for reflecting a beam, in particular a laser beam, that is incident on a surface of the reflector, and an absorber device for absorbing the beam reflected at the surface of the reflector. The surface of the reflector is segmented and has a plurality of reflector regions that are configured for reflecting a respective partial beam of the incident beam into an absorber region of the absorber device that is associated with the respective reflector region. The disclosure also relates to a beam guide device having a beam trap of this type, an EUV radiation generation apparatus having a beam guide device of this type, and an associated method for absorbing a beam, in particular for absorbing a laser beam.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• G02B 5/00 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles
• B23K 26/70 - Opérations ou équipement auxiliaires

Abrégé

Beam guiding devices for guiding a laser beam, in particular in a direction towards a target region for producing extreme ultraviolet (EUV) radiation, include an adjustment device for adjusting a beam diameter and an aperture angle of the laser beam. The adjustment device includes a first mirror having a first curved reflecting surface, a second mirror having a second curved reflecting surface, a third mirror having a third curved reflecting surface, a fourth mirror having a fourth curved reflecting surface, and a movement device configured to adjust the beam diameter and the aperture angle of the laser beam by moving the first reflecting surface and the fourth reflecting surface relative to one another and, independently thereof, moving the second reflecting surface and the third reflecting surface together relative to the first reflecting surface and the fourth reflecting surface.

Classes IPC  ?

• G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs
• G02B 5/10 - Miroirs à surfaces courbes
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• G02B 17/06 - Systèmes catoptriques, p.ex. systèmes redressant et renversant une image utilisant uniquement des miroirs
• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• G02B 19/00 - Condenseurs
• B23K 26/06 - Mise en forme du faisceau laser, p.ex. à l’aide de masques ou de foyers multiples
• G02B 5/08 - Miroirs

Abrégé

The invention relates to a driver laser arrangement (12) for an EUV-radiation-producing device (1), comprising: a radiation source (2) for producing laser radiation (7) propagating in a first direction (R1), an amplifier arrangement (3) comprising at least one optical amplifier (4a-e) for amplifying the laser radiation (7) propagating in the first direction (R1), as well as at least one optical isulator (13). The optical insulator (13) comprises a chamber filled with gas (20), through which the laser radiation (7) propagating in the first direction (R1) passes. The optical insulator (13) also comprises a plasma-generating device (16, 17) designed for the pulsed ignition of a plasma (21) in the gas (20) of the chamber (14), in order to suppress the passage of laser radiation (7a) propagating in a second direction (R2) opposing the first direction, through the chamber (14). The invention also relates to an EUV-radiation-emitting device (1) comprising such a driver laser arrangement (12), a vacuum chamber (11) in which a target material (8) can be arranged, and a beam-guiding device (5) for guiding the laser radiation (7, 7a) propagating in the first direction (R1), from the driver laser arrangement (12) to the target material (8).

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes

Abrégé

The invention relates to an optical isolator comprising: a stop (1) which has an aperture (3) for passing laser radiation (5), said laser radiation passing through the aperture (3) in a first direction (R1), wherein the stop (1) serves to influence a plasma ignition threshold (IP1, IP2) for igniting a plasma in order to suppress the passage of laser radiation propagating in a second direction, opposite to the first, through the aperture (3). For laser radiation which impinges on the second side (2b) of the stop (1) in a vicinity (6b) of the aperture (3), the stop (1) has a lower plasma ignition threshold (IP2 ឬ IP1) than for laser radiation (5) which impinges on the first side (2a) of the stop (1) in a vicinity (6a) of the aperture (3). The invention also relates to a driver laser arrangement and an EUV radiation production apparatus comprising at least one of such optical isolator.

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés

Abrégé

Methods, devices, and systems for elongating a beam path of a light beam, in particular of a laser beam, are provided. An example method includes coupling the light beam into an interspace between a plurality of first reflective surfaces and a plurality of second reflective surfaces facing the first reflective surfaces, multiply reflecting the light beam between the first reflective surfaces and the second reflective surfaces to elongate the beam path of the light beam, and coupling out the light beam from the interspace. The light beam undergoes the steps of coupling in, repeated reflecting and coupling out at least a first time with a first pass and a second time with a second pass, and the light beam traverses a different beam path in the interspace during the first pass in comparison with during the second pass.

Classes IPC  ?

• G02B 17/00 - Systèmes avec surfaces réfléchissantes, avec ou sans éléments de réfraction
• G02B 17/02 - Systèmes catoptriques, p.ex. systèmes redressant et renversant une image
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• G01N 21/03 - Dispositions ou appareils pour faciliter la recherche optique - Détails de structure des cuvettes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• G01N 21/39 - Couleur; Propriétés spectrales, c. à d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p.ex. spectrométrie d'absorption atomique en utilisant des lasers à longueur d'onde réglable

Abrégé

The invention relates to a driver laser arrangement (12) for an EUV radiation generating device (1), comprising: a beam source (2) configured to generate a first laser pulse (11a) having a first wavelength (λ1) and a second laser pulse (11b) having a second wavelength (λ2), and an amplifier arrangement (3) having at least one optical amplifier (4a-c) for amplifying the first laser pulse (11a) and the second laser pulse (11b). The amplifier arrangement (3) comprises at least one wavelength-selective optical element (13a, 13b) configured to attenuate the first laser pulse (11a) at the first wavelength (λ1) to a greater extent than the second laser pulse (11b) at the second wavelength (λ2).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

Systems, methods, and apparatus, including non-transitory computer-readable storage medium, for amplifying pulsed laser radiation in an EUV laser driver are provided. An example EUV laser driver includes a beam source configured to produce the pulsed laser radiation with at least one laser frequency, an amplifier arrangement with at least one optical amplifier for amplifying the pulsed laser radiation, the at least one optical amplifier having a frequency-dependent gain with a maximum gain at a maximum frequency, at least one frequency shifter configured to produce a frequency shift for the laser frequency of the pulsed laser radiation relative to the maximum frequency, and a controller configured to set the frequency shift such that a gain of the at least one optical amplifier for the pulsed laser radiation is reduced to less than a percentage, e.g., 90%, 70%, or 50%, of the maximum gain.

Classes IPC  ?

• H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

The invention relates to a driver laser assembly (12) for an EUV radiation-generating device (1), comprising the following: a radiation source (2) for generating laser pulses (11) and an amplifier assembly (3) with at least one optical amplifier (4a-c) for amplifying the laser pulses (11). The driver laser assembly (12) has at least one absorber device (14a, 14b) which comprises a saturable absorber in order to suppress spontaneous amplified emissions (13), wherein the laser pulses (11) pass through the absorber. The invention also relates to an EUV radiation-generating device (1) comprising such a driver laser assembly (12) and to a method for amplifying laser pulses (11) in at least one optical amplifier (4a-c) of a driver laser assembly (12).

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/034 - Dispositifs optiques placés à l'intérieur du tube ou en faisant partie, p.ex. fenêtres, miroirs

Abrégé

A water-cooled breadboard (1) according to the invention for mounting components, in particular optical components, comprises two aluminum cover plates (2, 3), a fin structure (4) that is placed between the two cover plates (2, 3), is made of extruded aluminum and is integrally bonded to the two cover plates (2, 3) in at least some sections, and one or more cooling water pipes (5) which extend between the two cover plates (2, 3) and are fastened to the fin structure (4).

Classes IPC  ?

• G01M 11/04 - Bancs optiques à cet effet
• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques

Abrégé

The invention relates to a polarizer assembly (1) comprising the following: a first polarizer device (2) with a first polarizer surface (8) for linearly polarizing a laser beam (5) which propagates in a first direction (R1) and which strikes the first polarizer surface (8) at a first angle; a phase-shifting device (4) for rotating a polarization direction of the linearly polarized laser beam (5a) transmitted to the first polarizer surface (8) by a specified rotational angle; and a second polarizer device (3) with a second polarizer surface (11) which is struck by the linearly polarized laser beam (5a) transmitted to the second polarizer surface (11) at a second angle after the laser beam passes through the phase-shifting device (4), wherein a plane of incidence of the laser beam (5a) striking the second polarizer surface (11) is rotated by the specified rotational angle relative to a plane of incidence of the laser beam (5) striking the first polarizer surface (8). The invention also relates to an EUV radiation generating device comprising at least one such polarizer assembly and to a method for generating a linearly polarized laser beam (5b) which propagates in a first direction and optionally for reflecting a laser beam which propagates in a second direction opposite the first direction.

Classes IPC  ?

• G02B 27/28 - Systèmes ou appareils optiques non prévus dans aucun des groupes , pour polariser
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• G02B 5/30 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles Éléments polarisants

Abrégé

A device includes a driver laser arrangement including a beam source for generating a laser beam and an amplifier arrangement for amplifying the laser beam. The device also includes an apparatus for monitoring the laser beam that includes a transmissive optical element having a normal direction oriented at a tilt angle with respect to a beam axis of the laser beam. The apparatus also includes a spatially resolving detector for registering laser radiation reflected backwards by the transmissive optical element. The transmissive optical element has first and second sides that are oriented at a wedge angle with respect to one another and through which the laser beam passes. The first and second sides reflect first and second partial beams of the incident laser beam. The apparatus has an optical filter that prevents one of the reflected first and second partial beams from reaching the detector.

Classes IPC  ?

• H01S 3/13 - Stabilisation de paramètres de sortie de laser, p.ex. fréquence ou amplitude
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés

Abrégé

The invention relates to a beam trap (20), comprising: a reflector (21) for reflecting a beam impinging on a surface of the reflector (21), in particular a laser beam (5), and an absorbing apparatus (22) for absorbing the beam reflected on the surface (21a) of the reflector (21). The surface of the reflector (21) is segmented and has a plurality of reflector regions (23a-g) which are each designed to reflect a partial beam (25a-g) of the impinging beam in an absorber region (26a-g) of the absorber apparatus (22) allocated to the respective reflector region (23a-g). The invention further relates to a beam guiding device having such a beam trap (20), to an EUV radiation generating apparatus (1) having such a radiation guiding device, and to a related method for absorbing a beam, in particular for absorbing a laser beam (5).

Classes IPC  ?

• B23K 26/70 - Opérations ou équipement auxiliaires
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• G02B 5/00 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles
• G21K 1/10 - Dispositifs de diffusion; Dispositifs d'absorption
• B23K 101/00 - Objets fabriqués par brasage, soudage ou découpage

Abrégé

The invention relates to a beam guidance device (3) for guiding a laser beam (5), in particular in the direction of a target region (B), for generating EUV radiation (14), comprising: an adjustment device (15) for adjusting a beam diameter (d) and an aperture angle of the laser beam (5), the adjustment device (15) comprising: a first mirror (16) with a first curved reflecting surface (16a), a second mirror (17) with a second curved reflecting surface (17a), a third mirror (18) with a third curved reflecting surface (18a), a fourth mirror (19) with a fourth curved reflecting surface (19a), and a movement device (20) which, for the purposes of adjusting the beam diameter (d) and the aperture angle of the laser beam (5), is embodied to move the first reflecting surface (16a) and the fourth reflecting surface (19a) relative to one another and, independently thereof, to move the second reflecting surface (17a) and the third reflecting surface (18a) together relative to the first reflecting surface (16a) and the fourth reflecting surface (19a). The invention also relates to an EUV beam generation device (1) comprising such an adjustment device (15) and to an associated method.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• G02B 17/06 - Systèmes catoptriques, p.ex. systèmes redressant et renversant une image utilisant uniquement des miroirs
• B23K 26/06 - Mise en forme du faisceau laser, p.ex. à l’aide de masques ou de foyers multiples

Abrégé

A beam guiding apparatus includes a vacuum chamber that includes a target region arranged to receive a target material for generating EUV radiation. The vacuum chamber includes a first and second opening for receiving into the vacuum chamber a first and second laser beam, respectively. The first and second laser beam have different wavelengths. The beam guiding apparatus further includes a superposition apparatus arranged to superpose the first and second laser beams entering into the vacuum chamber through the first and second openings, respectively, for common beam guidance in the direction of the target region. The superposition apparatus comprises a first optical element configured to seal the first opening of the vacuum chamber in a gas-tight manner and transmit the first laser beam, or a second optical element configured to seal off the second opening of the vacuum chamber in a gas-tight manner and transmit the second laser beam.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• G02B 1/11 - Revêtements antiréfléchissants
• G02B 7/08 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour lentilles avec mécanisme de mise au point ou pour faire varier le grossissement adaptés pour fonctionner en combinaison avec un mécanisme de télécommande
• G02B 13/14 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous à utiliser avec des radiations infrarouges ou ultraviolettes
• G02B 27/10 - Systèmes divisant ou combinant des faisceaux
• G02B 27/14 - Systèmes divisant ou combinant des faisceaux fonctionnant uniquement par réflexion
• H05H 7/14 - Chambres à vide
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

In one implementation, a beam guiding apparatus includes a vacuum chamber that includes a target region arranged to receive a target material for generating EUV radiation. The vacuum chamber further includes a first opening for receiving into the vacuum chamber a first laser beam and a second opening for receiving into the vacuum chamber a second laser beam. The vacuum chamber also includes a superposition apparatus arranged to superpose the first laser beam having a first wavelength and a second laser beam having a second wavelength for common beam guidance in the direction of the target region. The vacuum chamber also includes a beam shaping apparatus arranged upstream of the superposition apparatus in the beam path of the second laser beam, wherein the beam shaping apparatus is configured to set a ring-shaped beam profile of the second laser beam, The first and second laser beam have different wavelengths.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• G02B 27/10 - Systèmes divisant ou combinant des faisceaux
• G02B 27/14 - Systèmes divisant ou combinant des faisceaux fonctionnant uniquement par réflexion
• G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs

Abrégé

An extreme ultraviolet radiation generating device includes a source operable to generate a first and second entrance beam, and a beam unit operable to modify at least one of a direction and a beam divergence of the first and second entrance beam, in which the beam unit includes: a beam splitter to receive the first and second entrance beam, the beam splitter being configured to reflect the first entrance beam as a first exit beam and to transmit the second entrance beam; and a mirror in the beam path of the transmitted, second entrance beam to reflect the second entrance beam to form a second exit beam that is transmitted by the beam splitter and that is at least partially superposed on the first exit beam, in which the beam unit is configured to modify an angle and/or beam divergence between the first and second exit beam.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

The invention relates to a method for elongating a travel path of a light beam, in particular a laser beam, having the following steps: coupling the light beam into an intermediate space (20) between a plurality of first reflective surfaces (18) and a plurality of second reflective surfaces (19) which face the first reflective surfaces (18), reflecting the light beam multiple times between the first reflective surfaces (18) and the second reflective surfaces (19) in order to elongate the travel path of the light beam (7), and coupling the light beam out of the intermediate space (20), wherein the light beam undergoes the steps of being incoupled, reflected multiple times, and outcoupled for at least one first pass and a second pass, and the light beam traverses a different beam path in the intermediate space (20) during the first pass than the beam path during the second pass.

Classes IPC  ?

• G02B 17/00 - Systèmes avec surfaces réfléchissantes, avec ou sans éléments de réfraction

Abrégé

The device relates to a driver laser arrangement (12) for an EUV radiation generation apparatus (1), comprising: a radiation source (2) for generating pulsed laser radiation (7) having a laser frequency (fL), and an amplifier arrangement (3) comprising at least one optical amplifier (4a-c) for amplifying pulsed laser radiation (7). The driver laser arrangement (12) is characterised by at least one frequency shift device (13a-c) for generating a frequency shift of the laser frequency (fL) of the laser radiation (7) relative to a maximum frequency of a frequency-dependent amplification of the at least one optical amplifier (4a-c), and a control device (14), which is designed to set the frequency shift (∆f) such that the amplification (VRED) of the optical amplifier (4a-c) for the laser radiation (7) is reduced to less than 90 %, preferably to less than 70 %, especially preferably to less than 50 % of a maximum amplification (VMAX) of the optical amplifier (4a-c). The invention also relates to an associated method and a computer program product.

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

The invention relates to a device comprising a drive laser assembly having a beam source for generating a laser beam (7) and having an amplifying assembly for amplifying the laser beam (7), and comprising a unit (15) for monitoring the laser beam (7), having a transmitting optical element (12), in particular a plane-parallel plate, the normal direction (12a), in relation to the beam axis (7a) of the laser beam (7), of which element is arranged at a tilt angle (ß), and a position-sensing detector (16) for detecting laser radiation (13a, 13b) reflecting back on the optical element (12). The optical element (12) has a first side (14a) and a second side (14b) which are arranged at a wedge angle to one another, and through which the laser beam (7) passes, said first side (14a) reflecting a first sub-beam (13a) and the second side (14b) reflecting a second sub-beam (13b) of the incident laser beam (7). The unit (15) has an optical filter (20) that prevents one of the two reflected sub-beams (13b) from reaching the detector (16). The invention also relates to a corresponding method for monitoring a laser beam (7).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to an amplifier arrangement (10), more particularly for a driver laser arrangement of an EUV light source, comprising: an optical amplifier (6) for amplifying pulsed laser radiation (4a), at least one reflective element, more particularly a target material of the EUV light source or a diaphragm (5a, 5b), at which part of the laser radiation (4a, 4b) emerging from the optical amplifier (6) is reflected back to the optical amplifier (6), and at least one optical isolator (1) arranged in the beam path of the laser radiation (4a, 4b) and comprising a polarizer device (2) for suppressing a polarization component of the laser radiation (4a, 4b) and a phase shifting device (3a, 3b) arranged between the polarizer device (2) and the reflective element (5a, 5b), wherein at least the polarizer device (2) of the optical isolator (1) is positioned at a location at which the laser radiation (4a, 4b) has a laser power of more than 500 W. The invention also relates to a driver laser arrangement for an EUV light source comprising such an amplifier arrangement (10).

Classes IPC  ?

• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes

Abrégé

The invention relates to a beam guiding apparatus (6), comprising: a vacuum chamber (12), in which a target material (8) is introducible into a target region (7) for generating EUV radiation, wherein the vacuum chamber (12) includes a first opening (13) for the entrance of a first laser beam (3) and a second opening (14) for the entrance of a second laser beam (5), wherein the first laser beam (3) and the second laser beam (5) have different wavelengths (λ1, λ2), and a superposition apparatus (18) for superposing the two laser beams (3, 5) entering into the vacuum chamber (12) through the first and the second openings (13, 14) for a common beam guidance in the direction of the target region (7). An optical element (22) closing off the first opening (13) of the vacuum chamber (12) in a gas-tight manner and transmitting the first laser beam (3) or an optical element (19) closing off the second opening (14) of the vacuum chamber (12) in a gas-tight manner and transmitting the second laser beam (5) is preferably embodied as superposition apparatus (18). The invention also relates to an EUV beam generating device (1) comprising such a beam guiding apparatus (6).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a beam guiding apparatus (6), comprising: a vacuum chamber (12), in which a target material (8) is introducible into a target region (7) for generating EUV radiation, wherein the vacuum chamber (12) includes a first opening (13) for the entrance of a first laser beam (3) and a second opening (14) for the entrance of a second laser beam (5), wherein the first laser beam (3) and the second laser beam (5) have different wavelengths (λ-ι, λ2), and a superposition apparatus (24) for superposing the two laser beams (3, 5) entering into the vacuum chamber (12) through the first and the second openings (13, 14) for a common beam guidance in the direction of the target region (7). The superposition apparatus is preferably embodied as a reflecting optical element (24) arranged in the vacuum chamber (12), which optical element includes a first surface region for reflecting the first laser beam (3) and a second surface region, surrounding the first surface region in a ring-shaped manner, for reflecting the second laser beam (5). The invention also relates to an EUV beam generating device (1) comprising such a beam guiding apparatus (6).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a beam guiding apparatus (3) for guiding a laser beam (4) from a radiation source (2) towards a target area (5) in which a target material (6) for generating EUV radiation (7) can be placed, comprising: a focussing apparatus (10) for focussing the laser beam (4) in the target area (5), and a deflection apparatus (8, 19) designed to split the laser beam (4) into a deflected first partial beam (4a) and a second partial beam (4b) which are focussed onto two different focal positions (F1, F2) within the target area (5). The invention also relates to EUV radiation generating equipment (1) incorporating such a beam guiding apparatus (3).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to an EUV radiation generating device (30), comprising: at least one radiation source (31) for generating a first and second entrance beam (3a, 3b), and a beam influencing optical unit (1) for influencing the first and the second entrance beams (3a, 3b), the second entrance beam being at least partly superimposed on the first, with regard to beam direction and/or beam divergence, the beam influencing optical unit (1) comprising: a beam splitter (2) designed to reflect the first entrance beam (3a) as first exit beam (4a) and to transmit the second entrance beam (3b), and a mirror element (6) arranged in the beam path of the transmitted second entrance beam (3b), said mirror element reflecting the second entrance beam (3b) back to the beam splitter (2) in order to form a second exit beam (4b) which is transmitted by the beam splitter (2) and is at least partly superimposed on the first exit beam (4a). The beam influencing optical unit (1) is designed for influencing an angle between the first and the second exit beams (4a, 4b) and/or for influencing the beam divergence of the first and/or second exit beam(s) (4a, 4b).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to a beam-guiding device (3) for guiding a laser beam (5) from a driving laser device (2) in the direction of a target position (6), in order to generate EUV radiation, comprising: a device (14) for increasing or reducing the beam diameter (d1) of the laser beam (5), having: a first off-axis parabolic mirror (15) that has a first convexly curved reflective surface (15a), and a second off-axis parabolic mirror (16) that has a second, concavely curved reflective surface (16b). The beam-guiding device (3) comprises a motion device (20) which is designed to alter the opening angle (a) of the laser beam (5) and alter a distance between the first and the second reflective surface (15a, 16a). The invention also relates to a method for adjusting an opening angle (a) of a laser beam (5) in such a beam-guiding device (3).

Classes IPC  ?

• G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs

Abrégé

The invention relates to extreme ultraviolet “EUV” radiation generating systems that include a vacuum chamber where a target material can be positioned at a target position for generation of EUV radiation, and a beam guiding chamber for guiding a laser beam from a driver laser device towards the target position. The EUV radiation generating apparatus includes an intermediate chamber which is arranged between the vacuum chamber and the beam guiding chamber, a first window which seals the intermediate chamber in a gas-tight manner for entry of the laser beam from the beam guiding chamber and a second window which seals the intermediate chamber in a gas-tight manner for exit of the laser beam into the vacuum chamber. The invention also relates to a method for operating the EUV radiation generating apparatus.

Classes IPC  ?

• G01N 21/00 - Recherche ou analyse des matériaux par l'utilisation de moyens optiques, c. à d. en utilisant des ondes submillimétriques, de la lumière infrarouge, visible ou ultraviolette
• G01N 21/33 - Couleur; Propriétés spectrales, c. à d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p.ex. spectrométrie d'absorption atomique en utilisant la lumière ultraviolette
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

Beam guides for guiding a laser beam from a driver laser device in the direction of a target position for generating extreme ultraviolet (“EUV”) radiation are disclosed. The beam guides include a device for increasing or decreasing the beam diameter of the laser beam. The device includes a first off-axis parabolic mirror having a first convex curved reflecting surface and a second off-axis parabolic mirror having a second concave curved reflecting surface. The beam guides also include a moving device arranged to change a distance between the first and the second reflecting surfaces to change the opening angle (α), e.g., the convergence or divergence angle, of the laser beam. Methods for adjusting an opening angle (α) of a laser beam using such beam guides are also disclosed.

Classes IPC  ?

• G02B 5/10 - Miroirs à surfaces courbes
• G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs
• G02B 5/08 - Miroirs
• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to an EUV radiation generating device (1), comprising: a vacuum chamber (4), in which a target material (12) can be arranged in a target position (Z) in order to generate EUV radiation (14), and a beam guiding chamber (3) for guiding a laser beam (5) from a driver laser device (2) towards the target position (Z). The EUV radiation generating device (1) comprises an intermediate chamber (18), which is arranged between the vacuum chamber (4) and the beam guiding chamber (3), a first window (19), which seals the intermediate chamber (18) off to gas and which allows the laser beam (5) to enter from the beam guiding chamber (3), and a second window (20), which seals the intermediate chamber (18) off to gas and which allows the laser beam (5) to escape into the vacuum chamber (4). The invention also relates to a method for operating the EUV radiation generating device (1).

Classes IPC  ?

• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

Abrégé

The invention relates to an optical arrangement which comprises: an optical module that has a first carrier body on which at least one, particularly a reflective, optical element and a plurality of first bearing elements (7a) are mounted; a housing (8), particularly a vacuum housing, that has a second carrier body for at least one further, particularly a reflective, optical element, a plurality of second bearing elements (18a) being mounted on said carrier body; as well as a movement device for displacing the first carrier body relative to the second carrier body in a, particularly vertical, movement direction (23) between a removal position (E) from which the optical module may be removed from said housing (8), and a bearing position (G) in which the movement device presses the first bearing elements (7a) against the second bearing elements (18a). The invention also relates to an optical module as well as to a method for correctly positioning an optical module in a housing (8).

Classes IPC  ?

• G03F 7/20 - Exposition; Appareillages à cet effet
• G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques

Abrégé

The invention relates to an optical arrangement comprising an optical module having a first carrier body to which there are attached at least one optical element and a plurality of first mounting elements, and a housing having a second carrier body for at least one further optical element, wherein a plurality of second mounting elements is attached to the carrier body. Also comprised is a movement device for displacing the first carrier body relative to the second carrier body in a movement direction between a removal position from which the optical module can be removed from the housing and a mounting position in which the movement device presses the first mounting elements against the second mounting elements. The invention relates also to an optical module and to a method for correctly positioning an optical module in a housing.

Classes IPC  ?

• G06K 7/10 - Méthodes ou dispositions pour la lecture de supports d'enregistrement par radiation corpusculaire
• G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
• G02B 26/10 - Systèmes de balayage
• G02B 26/12 - Systèmes de balayage utilisant des miroirs à facettes multiples
• G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs
• G02B 27/00 - Systèmes ou appareils optiques non prévus dans aucun des groupes ,
• G03F 7/20 - Exposition; Appareillages à cet effet

Abrégé

An Extreme Ultra-Violet (EUV) excitation light source has a beam guide device for manipulating at least one laser beam is provided. The beam guide device comprises at least one beam splitter for generating at least two separated beams from at least one laser beam, at least one mirror or a lens for manipulating at least one of the separated beams, a superposition mirror for superposing the at least two separated beams, and a focusing appliance for generating a respective focus for each of the at least two separated beams. At least two focuses can be generated at one identical location or at two different locations by the beam guide device.

Classes IPC  ?

• G21K 5/04 - Dispositifs d'irradiation avec des moyens de formation du faisceau
• G02B 27/09 - Mise en forme du faisceau, p.ex. changement de la section transversale, non prévue ailleurs
• G02B 27/10 - Systèmes divisant ou combinant des faisceaux
• H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
• B23K 26/067 - Division du faisceau en faisceaux multiples, p.ex. foyers multiples
• H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p.ex. agencement en série de deux milieux actifs séparés
• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

A dichroic beam splitter module is disclosed for separating a main pulse laser beam from a pre-pulse laser beam each traversing a common beam path. In one embodiment, two dichroic elements are physically aligned along the beam path and are configured to pass the pre-pulse, a laser light having a first wavelength, to target material located near an irradiation site yet reflect the main pulse, a laser light having a second wavelength. The reflected main pulse is then further reflected by two reflective elements or mirrors from the first dichroic element to the second dichroic element and then on to the irradiation site. In alternative embodiments, the first mirror is deformable to alter beam characteristics of the reflected main pulse beam and the second mirror is adjustable to align the main pulse beam to the irradiation site.

Classes IPC  ?

• G02B 27/14 - Systèmes divisant ou combinant des faisceaux fonctionnant uniquement par réflexion

Abrégé

A dichroic beam splitter module Is disclosed for separating a main pulse laser -beam from, a pre-pul.se laser beam each, traversing a common beam path, In one embodiment two dichroic elements are physically aligned along the beam path and are configured to pass the pre-pulse, a laser light having a first wavelength, to target materia! located, near an irradiation site yet reiiect the main pulse, a laser light haying a second wavelength. The reflected main pulse is then further reflected by two reflective elements or mirrors from the first dichroic element to the second dichroic element and then on to the irradiation site. In alternative embodiments, the first mirror is deformable. to alter beam characteristics of the reflected main, pulse beam and the second mirror is adjustable to align the main pulse- beam to the irradiation site.

Classes IPC  ?

• H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet

Abrégé

A device for amplifying a laser beam is provided. The device includes at least one amplifier chamber in which a laser-active material is provided, at least one transmitting optical member delimiting the amplifier chamber and being arranged at a tilt angle, α, with respect to a plane oriented perpendicularly with respect to an optical axis of the laser beam, and at least one detection unit. The laser beam is reflected by the transmitting optical member into a back reflected laser beam, and the detection unit is arranged such that it detects the back reflected laser beam.

Classes IPC  ?

• H01S 3/07 - Structure ou forme du milieu actif consistant en une pluralité de parties, p.ex. segments
• H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation
• H01S 3/034 - Dispositifs optiques placés à l'intérieur du tube ou en faisant partie, p.ex. fenêtres, miroirs
• H01S 3/223 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c. à d. contenant plusieurs atomes