A method for manufacturing a semiconductor substrate, includes applying a composition for forming a resist underlayer film directly or indirectly to a substrate to form a resist underlayer film. The composition for forming a resist underlayer film includes: a polymer including a repeating unit represented by formula (1); and a solvent. Ar1 is a divalent group having an aromatic ring structure having 5 to 40 ring atoms, Z is a divalent group having an alicyclic structure having 3 to 20 carbon atoms, and at least one of Ar1 or Z comprises at least one group selected from the group consisting of a group represented by formula (2-1) and a group represented by formula (2-2). R7 is each independently a divalent organic group having 1 to 20 carbon atoms or a single bond, and * is a bond with another structure in the polymer.
A method for manufacturing a semiconductor substrate, includes applying a composition for forming a resist underlayer film directly or indirectly to a substrate to form a resist underlayer film. The composition for forming a resist underlayer film includes: a polymer including a repeating unit represented by formula (1); and a solvent. Ar1 is a divalent group having an aromatic ring structure having 5 to 40 ring atoms, Z is a divalent group having an alicyclic structure having 3 to 20 carbon atoms, and at least one of Ar1 or Z comprises at least one group selected from the group consisting of a group represented by formula (2-1) and a group represented by formula (2-2). R7 is each independently a divalent organic group having 1 to 20 carbon atoms or a single bond, and * is a bond with another structure in the polymer.
An embodiment of the present invention relates to a light scattering film, said light scattering film having a resin layer having a sea-island structure, wherein: the total light transmittance at a wavelength of 940 nm is 50% or more; the resin layer contains a thermoplastic resin (A), which forms a sea part, and a thermoplastic resin (B), which forms an island part; the content ratio (% by mass) of the resin (A) in the resin layer is greater than the content ratio (% by mass) of the resin (B); the absolute value of the refractive index difference (Δn) between the resin (A) and the resin (B) is 0.04 or more; the Mw of the resin (A) in terms of polystyrene as measured by a GPC method is 40,000 or more; the tensile break strength of the resin (A) as measured in accordance with JIS K7127:1999 is 40 MPa or more; and the Mw of the resin (B) in terms of polystyrene as measured by the GPC method is 10,000 or more.
A radiation-sensitive composition comprising a polymer, the solubility of which in a developer is changed by the action of an acid, wherein the polymer and/or a component other than the polymer comprises, in an identical component or different components: a partial structure comprising an anion and a radiation-sensitive onium cation having an aromatic heterocycle; and an iodine group. The aromatic heterocycle is directly bonded to an atom having a number of bonds that is greater than its standard number of bonds by one.
A spintronics element (10) comprises: a channel layer (30); a free layer (21) laminated on the channel layer (30); a barrier layer (22) laminated on the free layer (21); and a reference layer (23) laminated on the barrier layer (22). The direction of magnetization in the reference layer (23) is fixed. The direction of magnetization in the free layer (21) changes due to spin-orbit torque, which is generated by a write current that flows through the channel layer (30). The channel layer (30) is formed of a tungsten alloy containing at least one of iron and nickel in an amount of 35at% or less.
A radiation-sensitive composition according to the present invention comprises a polymer (FP) including a structural unit (Uh) which has a carbon atom that does not form an aromatic ring and a hydroxyl group that is bonded to the carbon atom and which is derived from a monomer (Mh) that has a pKa of not more than 12.4. The composition satisfies at least one of requirements 1A and 1B, satisfies at least one of requirements 2A and 2B, and comprises an iodonium cation which has at least one selected from the group consisting of halogeno group-containing groups and halogeno groups. Requirement 1A: The composition further comprises a polymer (A) including a structural unit which has an acid-dissociable group. Requirement 1B: The polymer (FP) further includes a structural unit which has an acid-dissociable group. Requirement 2A: The polymer (FP) further includes a structural unit which is derived from a radiation-sensitive onium salt. Requirement 2B: The composition further comprises a radiation-sensitive onium salt (C) which is not a polymer.
The purpose of the present invention is to provide: a radiation-sensitive composition from which it is possible to obtain a resist film that can exhibit, at sufficient levels, sensitivity, CDU, pattern circularity, pattern rectangularity, exposure latitude, and depth of focus; a pattern-forming method; and a compound. This radiation-sensitive composition includes: a polymer (A) including a structure unit (I) having a phenolic hydroxyl group; a compound (C) represented by formula (1); a crosslinking agent (Q); and a solvent (E). (In said formula (1), R1represents a monovalent organic group having 1-40 carbon atoms (excluding a group including an aromatic hydrocarbon). R21and R22each independently represent a monovalent organic group having 1-40 carbon atoms. R23and R24each independently represent a monovalent organic group having 1-40 carbon atoms, or R23and R24 are combined with each other to form, together with a nitrogen atom which is bonded thereto, a cyclic structure having 3-10 ring members.)
This radiation-sensitive composition comprises: a polymer (A) which contains a structural unit having an acid-dissociable group; and a first onium salt represented by formula (1), and satisfies at least one among a first requirement and a second requirement, wherein at least one selected from the group consisting of a structural unit derived from a radiation-sensitive onium salt in the polymer (A) contained in said composition, the first onium salt, and a second onium salt contains an iodonium cation. X1is a carboxy group or –COO-. c among a X1s in the formula are –COO-. R2is a substituent different from a carboxy group and –COO-. First requirement: The polymer (A) further contains a structural unit derived from a radiation-sensitive onium salt. Second requirement: The second onium salt, which is a non-polymer and is a radiation-sensitive onium salt different from the first onium salt, is further contained.
C07D 317/70 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3 condensés en ortho ou en péri avec des carbocycles ou avec des systèmes carbocycliques condensés avec des systèmes cycliques contenant au moins deux cycles déterminants
A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit which includes an acid-dissociable group; and a solvent. In the formula (1), W is an organic group having 3 to 40 carbon atoms and having at least one cyclic structure; L is a (r+1)-valent linking group, and r is an integer of 1 to 3; when r is 1, p and q are each independently an integer of 1 to 3, and when r is 2 or 3, each of a plurality of p's and a plurality of q's are each independently an integer of 0 to 3, provided that when r is 2 or 3, at least one of a plurality of p's is 1 or more and at least one of a plurality of q's is 1 or more; M+ is a monovalent onium cation.
A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit which includes an acid-dissociable group; and a solvent. In the formula (1), W is an organic group having 3 to 40 carbon atoms and having at least one cyclic structure; L is a (r+1)-valent linking group, and r is an integer of 1 to 3; when r is 1, p and q are each independently an integer of 1 to 3, and when r is 2 or 3, each of a plurality of p's and a plurality of q's are each independently an integer of 0 to 3, provided that when r is 2 or 3, at least one of a plurality of p's is 1 or more and at least one of a plurality of q's is 1 or more; M+ is a monovalent onium cation.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03F 7/038 - Composés macromoléculaires rendus insolubles ou sélectivement mouillables
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
G03F 7/32 - Compositions liquides à cet effet, p. ex. développateurs
9.
METHOD FOR PRODUCING POLYETHYLENE-BASED RESIN FOAM SHEET
The present invention addresses the problem of developing a method for producing a polyethylene-based resin foam sheet which exhibits stable foaming properties and excellent productivity even when a foam sheet is produced using recycled raw materials. This method for producing a polyethylene-based resin foam sheet is a production method in which a foam sheet is obtained by kneading and extrusion foaming a polyethylene-based resin and a foaming agent. A virgin low density polyethylene (A) and a recycled polyethylene material (B) are used as said polyethylene-based resin. The recycled polyethylene material (B) contains 0.01 mass% or more of ash. On a DSC curve obtained through thermal flux differential scanning calorimetric measurements of the polyethylene-based resin, the ratio (Y/X) of the heat of fusion (Y) on a high temperature side above a peak temperature of a maximum endothermic peak relative to the heat of fusion (X) on a low temperature side below the peak temperature of the maximum endothermic peak is 0.2-0.5.
C08J 9/04 - Mise en œuvre de substances macromoléculaires pour produire des matériaux ou objets poreux ou alvéolairesLeur post-traitement utilisant des gaz de gonflage produits par un agent de gonflage introduit au préalable
10.
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD
The purpose of the present invention is to provide: a radiation-sensitive composition from which it is possible to form a resist film that can exhibit, at sufficient levels, sensitivity, exposure latitude, depth of focus, pattern rectangularity, storage stability, development defect performance, and dry-etching resistance; and a pattern formation method. This radiation-sensitive composition comprises: a polymer (A) having a structural unit (I) that has a phenolic hydroxyl group and a structural unit (II) represented by formula (2); a compound (B) represented by formula (1); a crosslinking agent (Q); and a solvent (E). (In formula (1), R11, R14, R15, and R18each independently represent a hydrogen atom or a monovalent organic group having 1-40 carbon atoms. R12and R13each independently represent a hydrogen atom or a monovalent organic group having 1-40 carbon atoms, or R12and R13are bonded together and form, together with a carbon atom bonded thereto, an alicyclic structure having 3-10 carbon atoms. R16and R17each independently represent a hydrogen atom or a monovalent organic group having 1-40 carbon atoms, or R16and R17are bonded together and form, together with a carbon atom bonded thereto, an alicyclic structure having 3-10 carbon atoms. R21represents a halogen atom, a cyano group, a nitro group, a hydroxy group, or a monovalent organic group having 1-40 carbon atoms. When R21exists in a quantity of more than one, such R21s are identical to each other or are different from each other. n represents an integer of 1-5. p represents 0 or 1. R2222-, or -CO-.) (In formula (2), RA1represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. n1 represents an integer of 0-5. X1represents a halogen atom, a cyano group, a nitro group, an alkyl group, a carboxy group, or a fluorinated alkyl group. When X1exists in a quantity of more than one, such X1s are identical to each other or are different from each other.)
Disclosed is a radiation-sensitive composition which comprises a polymer (A) that contains a structural unit having an acid dissociable group, and which satisfies one or more of requirement 1A and requirement 1B. One or more of a structural unit derived from a radiation-sensitive onium salt in the polymer (A) and a radiation-sensitive onium salt (C) contain an iodonium cation, and one or more of requirement 2A and requirement 2B are satisfied. Requirement 1A: The polymer (A) additionally contains a structural unit derived from a radiation-sensitive onium salt. Requirement 1B: A radiation-sensitive onium salt (C) of a non-polymer is additionally contained. Requirement 2A: A compound (D) that has a pKa of 12.4 or less, comprises a carbon atom to which a hydrogen atom is not bonded, and a hydroxyl group which is bonded to the carbon atom, and does not comprise a carboxy group is additionally contained. Requirement 2B: The radiation-sensitive onium salt (C) contains an anion that has a partial structure derived from the compound (D).
C07D 317/70 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3 condensés en ortho ou en péri avec des carbocycles ou avec des systèmes carbocycliques condensés avec des systèmes cycliques contenant au moins deux cycles déterminants
Provided are: a composition for chemical mechanical polishing; and a polishing method using the same. The composition allows rapid polishing of a polishing surface that contains a silver material for wiring, and makes it possible to obtain a polished surface having a high reflective property. This composition for chemical mechanical polishing comprises (A) abrasive grains, (B) a liquid medium, (C) an oxidizing agent, and (D) a nitrogen-containing hetrocyclic compound. The absolute value of the zeta potential of the (A) component of the composition for chemical mechanical polishing is 10 mV or more. When the content of the (C) component is noted as Mc (mass %) and the content of the (D) component is noted as Md (mass %), Mc/Md is 10 to 200.
A method for separating extracellular vesicles comprises: bringing a sample containing extracellular vesicles into contact with a carrier comprising a ligand for capturing extracellular vesicles; and bringing the carrier after being brought into contact with the sample into contact with a buffer containing a saccharide, wherein the saccharide is at least one saccharide selected from the group consisting of glucose, glucosamine, N-acetylglucosamine, and oligosaccharides and polysaccharides derived therefrom, and the ligand is capable of binding to the saccharide.
G01N 33/543 - Tests immunologiquesTests faisant intervenir la formation de liaisons biospécifiquesMatériaux à cet effet avec un support insoluble pour l'immobilisation de composés immunochimiques
14.
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND
This radiation-sensitive composition comprises a polymer that, when reacted with an acid, exhibits a change in solubility in a developing solution. At least one of the polymer and a component other than the polymer has a partial structure represented by formula (1).
C07C 65/21 - Composés comportant des groupes carboxyle liés à des atomes de carbone de cycles aromatiques à six chaînons et contenant l'un des groupes OH, O-métal, —CHO, cétone, éther, des groupes , des groupes ou des groupes contenant des groupes éther, des groupes , des groupes ou des groupes
C07C 309/06 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'halogène ou des groupes nitro ou nitroso liés au squelette carboné
C07C 309/09 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy éthérifiés liés au squelette carboné
C07C 309/11 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy éthérifiés liés au squelette carboné avec l'atome d'oxygène d'au moins un des groupes hydroxy éthérifiés lié de plus à un atome de carbone d'un cycle aromatique à six chaînons
C07C 309/12 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy estérifiés liés au squelette carboné
C07C 309/17 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des groupes carboxyle liés au squelette carboné
C07C 309/39 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone de cycles aromatiques à six chaînons d'un squelette carboné contenant des atomes d'halogène liés au squelette carboné
C07C 309/41 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone de cycles aromatiques à six chaînons d'un squelette carboné contenant des atomes d'oxygène, liés par des liaisons simples, liés au squelette carboné
C07C 309/58 - Groupes acide carboxylique ou leurs esters
C07C 317/22 - SulfonesSulfoxydes ayant des groupes sulfone ou sulfoxyde et des atomes d'oxygène, liés par des liaisons simples, liés au même squelette carboné avec des groupes sulfone ou sulfoxyde liés à des atomes de carbone de cycles aromatiques à six chaînons du squelette carboné
C07D 317/44 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3 condensés en ortho ou en péri avec des carbocycles ou avec des systèmes carbocycliques
C07D 317/56 - Radicaux substitués par des atomes de soufre
Provided are: a radiation-sensitive composition having good storage stability and having excellent sensitivity, CDU, and under-exposure CDU when forming a pattern; a pattern formation method; and an onium salt compound. This radiation-sensitive composition comprises a solvent and a polymer including a structural unit (I) having an acid-dissociable group. The polymer includes an iodo group. Further, at least the radiation-sensitive composition contains an onium salt compound including a partial structure (a) represented by formula (a), or the polymer includes a structural unit (II) including the partial structure (a) represented by formula (a).
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
This radiation-sensitive composition comprises: a compound represented by formula (1) and a radiation-sensitive acid-generating body formed from a radiation-sensitive cation and an organic anion having a steroid skeleton or a 9,10-ethanoanthracene skeleton. In formula (1), R11, R12, and R13 are each independently, a C1-20 monovalent aliphatic hydrocarbon group.
This compound is represented by formula (1A), formula (1B), formula (2-1), or formula (2-2). The explanation for each substituent in the formulae is as described in the specification.
C07C 25/24 - Hydrocarbures aromatiques halogénés à chaînes latérales non saturées
C07C 2/64 - Addition sur un atome de carbone d'un cycle aromatique à six chaînons
C07C 13/19 - Hydrocarbures monocycliques ou leurs dérivés hydrocarbonés acycliques à cycle hexagonal à cycle du cyclohexane substitué par des groupes hydrocarbonés non saturés
C07C 13/567 - FluorènesFluorènes complètement ou partiellement hydrogénés
C07C 17/266 - Préparation d'hydrocarbures halogénés par des réactions comportant un accroissement du nombre des atomes de carbone dans le squelette par des réactions de condensation d'hydrocarbures et d'hydrocarbures halogénés
C08G 61/00 - Composés macromoléculaires obtenus par des réactions créant une liaison carbone-carbone dans la chaîne principale de la macromolécule
18.
RESIN COMPOSITION, CURED PRODUCT, PREPREG, COPPER-CLAD LAMINATE, AND INTERLAYER INSULATING FILM
Disclosed is a resin composition which contains: a polymer (A) that has an ethylenically unsaturated double bond, and has a weight average molecular weight (Mw) of 1,500-500,000; and a compound (B) that has two or more groups represented by formula (Y) and satisfies conditions (α1), (α2), and (α3). In formula (Y), R31 represents a hydrogen atom or an alkyl group having 1-5 carbon atoms, and * represents a bond with another moiety in the compound (B). (α1) The molecular weight is 1,000 or less. (α2) The solubility in toluene at 25°C is 20 mass% or more. (α3) The 1% weight loss temperature is more than 130°C as determined by simultaneous thermogravimetric-differential thermal analysis (TG/DTA).
B32B 5/28 - Produits stratifiés caractérisés par l'hétérogénéité ou la structure physique d'une des couches caractérisés par la présence de plusieurs couches qui comportent des fibres, filaments, grains ou poudre, ou qui sont sous forme de mousse ou essentiellement poreuses une des couches étant fibreuse ou filamenteuse imprégnée de matière plastique ou enrobée dans une matière plastique
B32B 15/08 - Produits stratifiés composés essentiellement de métal comprenant un métal comme seul composant ou comme composant principal d'une couche adjacente à une autre couche d'une substance spécifique de résine synthétique
C08J 5/24 - Imprégnation de matériaux avec des prépolymères pouvant être polymérisés en place, p. ex. fabrication des "prepregs"
19.
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND
A radiation-sensitive composition contains: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; an anion represented by formula (1); and a radiation-sensitive onium cation containing an aromatic ring and at least one fluorine atom or fluorine atom-containing group bonded to the aromatic ring. Ar1 represents a group obtained by removing one hydrogen atom from a substituted or unsubstituted aromatic ring; n is an integer of 1 to 3; R1 represents a single bond or a substituted or unsubstituted divalent hydrocarbon group; L1 represents —O—, (*)n—R2—O—, or —NR3—, wherein in a case in which n is no less than 2, L1 represents (*)n—R2—O—; * denotes a site bonding to Ar1; R2 represents a substituted or unsubstituted hydrocarbon group having a valency of (n+1); and R3 represents a hydrogen atom or a monovalent hydrocarbon group.
A radiation-sensitive composition contains: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; an anion represented by formula (1); and a radiation-sensitive onium cation containing an aromatic ring and at least one fluorine atom or fluorine atom-containing group bonded to the aromatic ring. Ar1 represents a group obtained by removing one hydrogen atom from a substituted or unsubstituted aromatic ring; n is an integer of 1 to 3; R1 represents a single bond or a substituted or unsubstituted divalent hydrocarbon group; L1 represents —O—, (*)n—R2—O—, or —NR3—, wherein in a case in which n is no less than 2, L1 represents (*)n—R2—O—; * denotes a site bonding to Ar1; R2 represents a substituted or unsubstituted hydrocarbon group having a valency of (n+1); and R3 represents a hydrogen atom or a monovalent hydrocarbon group.
A radiation sensitive resin composition includes: a resin including a repeating unit A which includes an acid-dissociable group; an onium salt including an organic acid anion moiety and an onium cation moiety; and a solvent. The onium salt includes at least one group selected from the group consisting of a pentafluorosulfanyl group, a pentafluorosulfanyloxy group, and a pentafluorosulfanylthio group.
JAPAN AS REPRESENTED BY DIRECTOR-GENERAL NATIONAL INSTITUTE OF INFECTIOUS DISEASES (Japon)
Inventeur(s)
Aoto, Yoshimasa
Masuda, Kanae
Isayama, Jun
Kawasaki, Hiroshi
Kawakami, Eiryo
Amagai, Masayuki
Sugai, Motoyuki
Hisatsune, Junzo
Yu, Liansheng
Abrégé
The present invention addresses the problem of providing a method for determining a person showing responsiveness to bleach therapy. The present invention encompasses a method for determining responsiveness to bleach therapy, the method involving a determination step a in which, when a bacterium contained in a subject sample has one or more selected from the base sequences described in SEQ ID NO:1 to SEQ ID NO:173 and base sequences showing 80% or greater identity with said base sequences, it is determined that the subject shows responsiveness to bleach therapy.
The present invention provides: a semiconductor substrate manufacturing method using a film-forming composition which has good storage stability and can form a film that is excellent in terms of film formation properties, etching resistance and basic liquid resistance; and a film-forming composition. This semiconductor substrate manufacturing method includes a step for coating a substrate with a film-forming composition. The film-forming composition contains a solvent and a metal compound which is composed of at least a metal atom and a polyhydric alcohol, the metal atom being at least one metal that is selected from the group consisting of magnesium, calcium, strontium, barium, scandium, yttrium, zirconium, hafnium, manganese, cobalt, nickel, zinc, aluminum, gallium, indium, tin, and lead.
G03F 7/11 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p. ex. couches d'ancrage
C08G 65/34 - Composés macromoléculaires obtenus par des réactions créant une liaison éther dans la chaîne principale de la macromolécule à partir de composés hydroxylés ou de leurs dérivés métalliques
23.
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, POLYMER, AND COMPOUND
Provided are: a radiation-sensitive composition capable of exhibiting sensitivity, CDU, overexposure CDU, and development defect suppressing properties at levels equal to or greater than conventional levels, when forming a pattern; a pattern formation method; a polymer; and a compound. This radiation-sensitive composition comprises a first polymer having a structural unit (I) containing an acid-dissociable group, a second polymer different from the first polymer, and a solvent, wherein: the second polymer has a structural unit (i) containing an amide bond, an ester bond, and a fluorine atom; and the weight-average molecular weight of the second polymer in terms of polystyrene is at most 20,000.
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C07C 233/49 - Amides d'acides carboxyliques ayant des atomes de carbone de groupes carboxamide liés à des atomes d'hydrogène ou à des atomes de carbone acycliques ayant l'atome d'azote d'au moins un des groupes carboxamide lié à un atome de carbone d'un radical hydrocarboné substitué par des groupes carboxyle avec le radical hydrocarboné substitué lié à l'atome d'azote du groupe carboxamide par un atome de carbone acyclique ayant l'atome de carbone du groupe carboxamide lié à un atome de carbone d'un squelette carboné acyclique non saturé
C07C 255/16 - Nitriles d'acides carboxyliques ayant des groupes cyano liés à des atomes de carbone acycliques contenant des groupes cyano et des atomes d'oxygène, liés par des liaisons simples, liés au même atome de carbone d'un squelette carboné acyclique
C07C 271/22 - Esters des acides carbamiques ayant des atomes d'oxygène de groupes carbamate liés à des atomes de carbone acycliques avec les atomes d'azote des groupes carbamate liés à des atomes d'hydrogène ou à des atomes de carbone acycliques à des atomes de carbone de radicaux hydrocarbonés substitués par des groupes carboxyle
C07C 275/28 - Dérivés d'urée, c.-à-d. composés contenant l'un des groupes les atomes d'azote ne faisant pas partie de groupes nitro ou nitroso ayant des atomes d'azote de groupes urée liés à des atomes de carbone de cycles aromatiques à six chaînons d'un squelette carboné
A method for producing expanded beads that have excellent in-mold moldability and produce a molded article of polyethylene-based resin expanded beads having a low shrinkage rate while increasing a biomass degree is provided. In the method, the polyethylene-based resin particles is composed of a mixed resin, which is obtained by kneading linear low-density polyethylene and branched low-density polyethylene, wherein the branched low-density polyethylene has a biomass degree of 30% or more and a heat of fusion of 95 J/g or more; a blending amount of the branched low-density polyethylene in the mixed resin is 5% by mass or more and less than 40% by mass, where a total of the linear low-density polyethylene and the branched low-density polyethylene is 100% by mass; and a heat of fusion of the polyethylene-based resin particle is 90 J/g or more.
A radiation-sensitive composition includes: a polymer including a first structural unit including a partial structure obtained by substituting a hydrogen atom of a carboxy group or a hydrogen atom of a phenolic hydroxyl group, with an acid-labile group represented by formula (1); and a compound including an anionic moiety and a radiation-sensitive onium cationic moiety. The anionic moiety includes one anion group and an aromatic ring in which at least one hydrogen atom is substituted with an iodine atom. Ar1 represents a group obtained by removing one hydrogen atom from an aromatic ring in which at least one hydrogen atom is substituted with an iodine atom.
A radiation-sensitive composition includes: a polymer including a first structural unit including a partial structure obtained by substituting a hydrogen atom of a carboxy group or a hydrogen atom of a phenolic hydroxyl group, with an acid-labile group represented by formula (1); and a compound including an anionic moiety and a radiation-sensitive onium cationic moiety. The anionic moiety includes one anion group and an aromatic ring in which at least one hydrogen atom is substituted with an iodine atom. Ar1 represents a group obtained by removing one hydrogen atom from an aromatic ring in which at least one hydrogen atom is substituted with an iodine atom.
Provided are a method for forming a resist pattern that demonstrates excellent performance in sensitivity, resolution, etc. in an exposure step when a next-generation exposure technique is applied, and a radiation-sensitive resin composition. The method for forming a resist pattern includes step (1) of forming a resist film in which a content of a radiation-sensitive acid generator (C) is 0.1% by mass or less, step (2) of exposing the resist film to EUV or an electron beam (EB), and step (3) of developing the resist film exposed in the step (2).
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C08F 220/18 - Esters des alcools ou des phénols monohydriques des phénols ou des alcools contenant plusieurs atomes de carbone avec l'acide acrylique ou l'acide méthacrylique
Provided are: a method for producing an organoid, the method comprising a step for culturing somatic stem cells in a culture medium containing an agonist of the interferon-γ receptor; and a culture medium for producing an organoid, the culture medium containing an agonist of the interferon-γ receptor.
Provided are: a method for producing a semiconductor substrate using a composition capable of forming a film having excellent embedding properties and flatness; and a composition for forming a resist underlayer film. The method for producing a semiconductor substrate comprises: a step for directly or indirectly coating a substrate with a composition for forming a resist underlayer film; a step for forming a resist pattern directly or indirectly on the resist underlayer film formed by the coating step; and a step for performing etching using the resist pattern as a mask. The composition for forming a resist underlayer film contains a nitrogen-containing compound and a solvent, and the nitrogen-containing compound comprises a partial structure that is represented by formula (1). (In formula (1), Ar1is a substituted or unsubstituted aromatic ring having 3 to 40 carbon atoms. Ar2 is a substituted or unsubstituted divalent aromatic ring having 3 to 40 carbon atoms. Each ＊ is a bond with another structure in the nitrogen-containing compound.)
G03F 7/11 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p. ex. couches d'ancrage
C07D 215/14 - Radicaux substitués par des atomes d'oxygène
Provided is an electronic device in which an electronic component group is simply and satisfactorily bonded. A first electronic component (10) having a first insulator (12) and a first conductor (13) on a first-surface (10a) side, and a second electronic component (20) having a second insulator (22) and a second conductor (23) on a second-surface (20a) side, are prepared. A bonding layer (30) composed of an organic compound is provided to the first insulator (12), and the first surface (10a) and the second surface (20a) are made to face each other with the bonding layer (30) interposed therebetween such that the first insulator (12) and the second insulator (22) face each other and the first conductor (13) and the second conductor (23) face each other. Heat treatment is performed, the first insulator (12) and the second insulator (22) are bonded by the bonding layer (30), and the first conductor (13) and the second conductor (23) are brought into contact and bonded within the bonding layer (30) by thermal expansion. There is thereby obtained an electronic device (1) in which the first electronic component (10) and the second electronic component (20) are bonded.
H01L 21/60 - Fixation des fils de connexion ou d'autres pièces conductrices, devant servir à conduire le courant vers le ou hors du dispositif pendant son fonctionnement
H01L 21/768 - Fixation d'interconnexions servant à conduire le courant entre des composants distincts à l'intérieur du dispositif
H01L 21/3205 - Dépôt de couches non isolantes, p. ex. conductrices ou résistives, sur des couches isolantesPost-traitement de ces couches
H01L 23/522 - Dispositions pour conduire le courant électrique à l'intérieur du dispositif pendant son fonctionnement, d'un composant à un autre comprenant des interconnexions externes formées d'une structure multicouche de couches conductrices et isolantes inséparables du corps semi-conducteur sur lequel elles ont été déposées
H05K 1/14 - Association structurale de plusieurs circuits imprimés
H05K 1/18 - Circuits imprimés associés structurellement à des composants électriques non imprimés
30.
METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND METHOD FOR PRODUCING COMPOUND
Provided are: a method for producing a semiconductor substrate that can form a film that exhibits excellent embedding properties, an excellent heat resistance, an excellent etching resistance, and an excellent bending resistance; a composition; and a method for producing a compound. The method for producing a semiconductor substrate comprises: a step for directly or indirectly applying a resist underlayer film-forming composition on a substrate; a step for directly or indirectly forming a resist pattern on the resist underlayer film formed in the application step; and a step for carrying out etching by using the resist pattern as a mask. The resist underlayer film-forming composition contains a solvent and a compound represented by formula (1A) or (1B). (In formula (1A), Ar1Aand Ar2Aare each independently a substituted or unsubstituted C3-20 aromatic ring. Y is a single bond, an oxygen atom, a sulfur atom, or a methylene group. X is an n-valent organic group having an aromatic ring. A bond extending from X extends from the aromatic ring in X. n is an integer from 1-10. In formula (1B), Ar1Band Ar2B are each independently an unsubstituted C3-20 monovalent aromatic ring group or a C3-20 monovalent aromatic ring group substituted by a group selected from the group consisting of the hydroxy group and halogen atoms. X and n are defined as for formula (1A)).
G03F 7/11 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p. ex. couches d'ancrage
C07C 2/86 - Préparation d'hydrocarbures à partir d'hydrocarbures contenant un plus petit nombre d'atomes de carbone par condensation d'un hydrocarbure et d'un non-hydrocarbure
C07C 37/16 - Préparation de composés comportant des groupes hydroxyle ou O-métal liés à un atome de carbone d'un cycle aromatique à six chaînons par des réactions augmentant le nombre d'atomes de carbone par condensation impliquant des groupes hydroxyle de phénols ou d'alcools, ou leurs groupes éther ou ester minéral
C07C 39/23 - Composés comportant au moins un groupe hydroxyle ou O-métal lié à un atome de carbone d'un cycle aromatique à six chaînons polycycliques contenant des cycles aromatiques à six chaînons et d'autres cycles avec une insaturation autre que celle des cycles aromatiques
C07C 41/30 - Préparation d'éthers par des réactions ne formant pas de liaisons sur l'oxygène de la fonction éther par augmentation du nombre d'atomes de carbone, p. ex. par oligomérisation
C07C 43/21 - Éthers une liaison sur l'oxygène de la fonction éther étant sur un atome de carbone d'un cycle aromatique à six chaînons contenant des cycles autres que des cycles aromatiques à six chaînons
C07C 67/28 - Préparation d'esters d'acides carboxyliques par modification de la partie hydroxyle de l'ester sans introduction d'un groupe ester
C07C 67/035 - Préparation d'esters d'acides carboxyliques par réaction d'acides carboxyliques ou d'anhydrides symétriques avec des hydrocarbures saturés
This radiation-sensitive composition comprises a polymer (P) including a structural unit having an acid-dissociable group, satisfies at least one among a first requirement, a second requirement, and a third requirement, and includes a specific cation having an acid-dissociable group or the like and an iodine group in at least one of a structural unit derived from a radiation-sensitive onium salt in the polymer (P), a structural unit derived from a radiation-sensitive onium salt in a polymer (Q1), and a radiation-sensitive onium salt (C). First requirement: The polymer (P) includes a structural unit derived from a radiation-sensitive onium salt. Second requirement: A polymer different from the polymer (P) and including a structural unit derived from a radiation-sensitive onium salt is contained. Third requirement: A radiation-sensitive onium salt (C) that is non-polymeric is contained.
C07C 309/10 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy éthérifiés liés au squelette carboné avec l'atome d'oxygène d'au moins un des groupes hydroxy éthérifiés lié de plus à un atome de carbone acyclique
C07C 309/12 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy estérifiés liés au squelette carboné
C07C 309/17 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des groupes carboxyle liés au squelette carboné
C07C 309/42 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone de cycles aromatiques à six chaînons d'un squelette carboné contenant des atomes d'oxygène, liés par des liaisons simples, liés au squelette carboné ayant les groupes sulfo liés à des atomes de carbone de cycles aromatiques à six chaînons non condensés
C07D 309/12 - Atomes d'oxygène uniquement des atomes d'hydrogène et un atome d'oxygène liés directement aux atomes de carbone du cycle, p. ex. éthers du tétrahydropyranne
C07D 317/08 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3
C07D 317/70 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3 condensés en ortho ou en péri avec des carbocycles ou avec des systèmes carbocycliques condensés avec des systèmes cycliques contenant au moins deux cycles déterminants
C07D 321/10 - Cycles à sept chaînons condensés avec des carbocycles ou avec des systèmes carbocycliques
C08F 212/02 - Monomères contenant un seul radical aliphatique non saturé
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
Provided is a radiation-sensitive composition which contains a polymer (A) that includes: a first structural unit that is at least one type selected from the group consisting of a structural unit represented by formula (1-1) and a structural unit represented by formula (1-2); a second structural unit represented by formula (2); and a third structural unit having an acid-dissociable group, and which satisfies one or more of a first requirement, a second requirement and a third requirement. At least one selected from the group consisting of the polymer (A), a structural unit (b1) and a radiation-sensitive onium salt (C) has an iodine atom. First requirement: the polymer (A) also includes a fourth structural unit derived from a radiation-sensitive onium salt. Second requirement: a polymer (E1) which is different from the polymer (A) and which includes the structural unit (b1) derived from a radiation-sensitive onium salt is also contained. Third requirement: a non-polymer radiation-sensitive onium salt (C) is also contained.
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
C08F 232/08 - Copolymères de composés cycliques ne contenant pas de radicaux aliphatiques non saturés dans une chaîne latérale et contenant une ou plusieurs liaisons doubles carbone-carbone dans un système carbocyclique contenant des cycles condensés
This radiation-sensitive composition contains: a polymer (F) comprising a structural unit having a fluorine atom and an alkali dissociable group; and a compound represented by formula (1). In formula (1), R11, R12, and R13 are each independently a C1-20 monovalent aliphatic hydrocarbon group.
This radiation-sensitive composition contains: a polymer containing at least one structural unit selected from the group consisting of structural units represented by formula (1-1) to formula (1-3); and a compound represented by formula (2). In the formulae, A1represents an (n1+n2+1)-valent aromatic ring group. R2is an acid-dissociable group. A2is a substituted or unsubstituted aromatic ring group. R5and R6are alkyl groups having 1 to 10 carbon atoms, or are combined with each other to represent an aliphatic ring structure constituted together with carbon atoms to which R5and R6are bonded. However, R8and R9are combined with each other to form an aliphatic ring structure, and either the aliphatic ring structure has an ethylenically unsaturated bond or R10has an ethylenically unsaturated bond. R11, R12and R13 are monovalent aliphatic hydrocarbon groups having 1 to 20 carbon atoms.
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
35.
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND METHOD FOR PRODUCING NITROGEN-CONTAINING COMPOUND
The present invention provides: a method for manufacturing a semiconductor substrate, in which a composition that is capable of forming a film having excellent embedding properties and excellent flatness is used; a composition for forming a resist underlayer film; and a method for producing a nitrogen-containing compound. This method for manufacturing a semiconductor substrate includes: a step for directly or indirectly coating a substrate with a composition for forming a resist underlayer film; a step for forming a resist pattern directly or indirectly on the resist underlayer film formed by the coating step; and a step for performing etching using the resist pattern as a mask. The composition for forming a resist underlayer film contains a nitrogen-containing compound and a solvent. The nitrogen-containing compound includes a partial structure that is represented by formula (1). (In formula (1), Ar1is a substituted or unsubstituted aromatic ring having 3 to 40 carbon atoms. Ar2 is a substituted or unsubstituted divalent aromatic ring having 3 to 40 carbon atoms. X is a divalent organic group having 1 to 40 carbon atoms. Each * indicates an atomic bond with another structure in the nitrogen-containing compound.)
G03F 7/11 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p. ex. couches d'ancrage
C07D 239/74 - QuinazolinesQuinazolines hydrogénées avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés aux atomes de carbone de l'hétéro-cycle
C07D 239/82 - Atomes d'oxygène avec un radical aryle lié en position 4
C07D 413/14 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes d'azote et d'oxygène comme uniques hétéro-atomes du cycle contenant au moins trois hétérocycles
G03F 7/26 - Traitement des matériaux photosensiblesAppareillages à cet effet
Provided is a method for producing a foamed particle molded body enabling a reduction in the amount of steam supplied into a mold and an improvement in energy loss during in-mold molding. The method involves filling a cavity (10) of a split mold (100) composed of a first mold (30A) and a second mold (30B) with thermoplastic resin foam particles (50) and performing heating using steam to carry out in-mold molding. The first mold (30A) and/or the second mold (30B) have an exhaust chamber (20) provided so as to allow ventilation from the cavity (10). The method includes: a pressurizing step of supplying a pressurizing gas other than steam into the cavity (10) to adjust the pressure in the cavity (10) filled with the foam particles (50) to a pressure (P1) higher than atmospheric pressure; and a heating step of heating the foam particles (50) by supplying steam at a pressure (P2) higher than the pressure (P1) into the cavity (10) adjusted to the pressure (P1) in the pressurizing step, and exhausting the steam supplied into the cavity (10) to the exhaust chamber (20). In the heating step, the steam at the pressure (P2) is supplied into the cavity (10) while adjusting the pressure in the exhaust chamber (20) to a pressure (P3) higher than atmospheric pressure and lower than the pressure (P2).
Provided are: a diffractive optical element that is thin, realizes high mass productivity, has a high light-condensing performance which makes it possible to cope with a minute pixel pitch, and is capable of condensing light of a plurality of wavelengths; and a method for manufacturing the diffractive optical element. The diffractive optical element comprises: a base board which allows entering light to pass therethrough; and a resin layer which is formed from a curable resin composition, forms recesses and projections on a main surface of the base board, and also forms a diffraction pattern that is substantially concentrical when viewed in a direction orthogonal to the main surface of the base board. The diffraction pattern is divided into a plurality of pattern regions in the circumferential direction. The plurality of pattern regions at least include: a first pattern region which has a shape of a Fresnel zone plate, and which corresponds to light that is included in the entering light and that belongs to a first wavelength range; and a second pattern region which has a shape of a Fresnel zone plate, and which corresponds to light that is included in the entering light and that belongs to a second wavelength range different from the first wavelength range.
This radiation-sensitive composition contains a polymer that has: a structural unit that contains an acid-dissociable group; and a structural unit that contains a radiation-sensitive onium cation and a sulfonate anion. The radiation-sensitive composition additionally contains a carboxy group-containing compound different from the polymer.
Provided are an improved method and device for treating polymer beads by applying pressure. A polymer bead treatment method according to the present invention applies pressure to polymer beads having closed cells under a specific pressure condition in a specific pressure container. The polymer bead treatment method comprises: a step for acquiring at least one parameter related to the deformation behavior during application of pressure to the polymer beads; and a step for using the parameter related to the deformation behavior to determine gas information, which indicates at least one selected from the concentration, amount, and pressure of a gas in the closed cells of the polymer beads, during application of pressure to the polymer beads.
Provided is a method that allows selective modification of a substrate surface using an environmentally friendly component. This method for producing a surface-treated substrate comprises: a vaporizing step for vaporizing a nitrogen-containing compound; and a step for selectively modifying the surface of the substrate by causing contact between the substrate and the nitrogen-containing compound, the surface of the substrate including a first region and a second region made from a material different from the first region.
C23C 16/04 - Revêtement de parties déterminées de la surface, p. ex. au moyen de masques
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
C23C 26/00 - Revêtements non prévus par les groupes
H01L 21/285 - Dépôt de matériaux conducteurs ou isolants pour les électrodes à partir d'un gaz ou d'une vapeur, p. ex. condensation
H01L 21/31 - Traitement des corps semi-conducteurs en utilisant des procédés ou des appareils non couverts par les groupes pour former des couches isolantes en surface, p. ex. pour masquer ou en utilisant des techniques photolithographiquesPost-traitement de ces couchesEmploi de matériaux spécifiés pour ces couches
41.
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
The present invention provides: a radiation-sensitive composition which is excellent in terms of sensitivity, CDU, and process margin during the formation of a pattern; and a pattern forming method. This radiation-sensitive composition contains a solvent and a polymer which has an iodine group and contains a structural unit (I) that has an acid dissociable group. At least the radiation-sensitive composition contains a radiation-sensitive acid generator which includes a partial structure represented by formula (a), or the polymer contains a structural unit (II) that includes a partial structure represented by formula (a). (In formula (a), R1is a nitro group, a cyano group, a carboxy group, an iodine atom, an amino group, an alkyl group, an acyl group, or an alkoxycarbonyl group; in cases where there are a plurality of R1moieties, the plurality of R1moieties are the same as or different from each other; L1212122 ≤ 2m + 4 is satisfied; * is an atomic bond in the corresponding polymer or radiation-sensitive acid generator to another moiety; and Z+ is a monovalent onium cation.)
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit which includes an acid-dissociable group, and a solvent. R1, R2, and R3 each independently represent a monovalent chain organic group having 1 to 10 carbon atoms; R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; Rf1 represents a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 represents an integer of 0 to 8; m2 represents an integer of 1 to 4; and Z+ represents a monovalent radiation-sensitive onium cation.
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit which includes an acid-dissociable group, and a solvent. R1, R2, and R3 each independently represent a monovalent chain organic group having 1 to 10 carbon atoms; R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; Rf1 represents a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 represents an integer of 0 to 8; m2 represents an integer of 1 to 4; and Z+ represents a monovalent radiation-sensitive onium cation.
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C08F 220/18 - Esters des alcools ou des phénols monohydriques des phénols ou des alcools contenant plusieurs atomes de carbone avec l'acide acrylique ou l'acide méthacrylique
C08F 220/28 - Esters contenant de l'oxygène en plus de l'oxygène de la fonction carboxyle ne contenant pas de cycles aromatiques dans la partie alcool
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
Provided is a copper film forming composition and a method, for manufacturing a glass substrate equipped with a through electrode, where a seed layer also having properties of an adhesion layer can be formed on a glass wall surface in a through-hole of the glass substrate. The method for manufacturing a glass substrate equipped with a through electrode comprises: a seed layer forming step for bringing a copper film forming composition directly into contact with a glass wall surface in at least a through-hole of a glass substrate having the through-hole, and forming a seed layer on the glass wall surface in the through-hole; and a through electrode forming step for forming a through electrode in the through-hole in which the seed layer was formed. The copper film forming composition contains a copper compound, a nitrogen-containing organic compound, and a solvent.
H05K 1/11 - Éléments imprimés pour réaliser des connexions électriques avec ou entre des circuits imprimés
C23C 18/08 - Revêtement chimique par décomposition soit de composés liquides, soit de solutions des composés constituant le revêtement, ne laissant pas de produits de réaction du matériau de la surface dans le revêtementDépôt par contact par décomposition thermique caractérisée par le dépôt d'un matériau métallique
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1); a resin including a structural unit (I) represented by formula (2); and a solvent. R1, R2, and R3 are each independently a monovalent organic group having 1 to 10 carbon atoms, or two or three of R1, R2, and R3 taken together represent a monovalent or divalent group containing a cyclic structure having 3 to 20 carbon atoms together with the carbon atom to which the two or three of R1, R2, and R3 are bonded. R4 and R5 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group. R10 is a monovalent group including at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1); a resin including a structural unit (I) represented by formula (2); and a solvent. R1, R2, and R3 are each independently a monovalent organic group having 1 to 10 carbon atoms, or two or three of R1, R2, and R3 taken together represent a monovalent or divalent group containing a cyclic structure having 3 to 20 carbon atoms together with the carbon atom to which the two or three of R1, R2, and R3 are bonded. R4 and R5 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group. R10 is a monovalent group including at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C08F 212/32 - Monomères contenant un seul radical aliphatique non saturé contenant plusieurs cycles
C08F 220/18 - Esters des alcools ou des phénols monohydriques des phénols ou des alcools contenant plusieurs atomes de carbone avec l'acide acrylique ou l'acide méthacrylique
C08F 220/28 - Esters contenant de l'oxygène en plus de l'oxygène de la fonction carboxyle ne contenant pas de cycles aromatiques dans la partie alcool
C08F 220/36 - Esters contenant de l'azote contenant de l'oxygène en plus de l'oxygène de la fonction carboxyle
C08F 224/00 - Copolymères de composés contenant un ou plusieurs radicaux aliphatiques non saturés, chaque radical ne contenant qu'une seule liaison double carbone-carbone et l'un au moins étant terminé par un hétérocycle contenant de l'oxygène
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A radiation-sensitive resin composition includes: an onium salt compound (1) represented by formula (1); an onium salt compound (2) different from the onium salt compound (1); a resin including a structural unit which includes an acid-dissociable group; and a solvent. W is a monovalent chain organic group having 1 to 40 carbon atoms, a monovalent cyclic organic group having 5 or less carbon atoms, or a monovalent group obtained by combining a monovalent chain organic group having 1 to 40 carbon atoms and a cyclic structure having 5 or less carbon atoms; R1 and R2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; R3, R4, and R5 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 is an integer of 1 to 8; and Z+ is a monovalent radiation-sensitive onium cation.
A radiation-sensitive resin composition includes: an onium salt compound (1) represented by formula (1); an onium salt compound (2) different from the onium salt compound (1); a resin including a structural unit which includes an acid-dissociable group; and a solvent. W is a monovalent chain organic group having 1 to 40 carbon atoms, a monovalent cyclic organic group having 5 or less carbon atoms, or a monovalent group obtained by combining a monovalent chain organic group having 1 to 40 carbon atoms and a cyclic structure having 5 or less carbon atoms; R1 and R2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; R3, R4, and R5 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 is an integer of 1 to 8; and Z+ is a monovalent radiation-sensitive onium cation.
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03F 7/038 - Composés macromoléculaires rendus insolubles ou sélectivement mouillables
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
46.
CHROMATOGRAPHIC SUPPORT FOR PURIFYING FC FUSION PROTEIN AND FC FUSION PROTEIN PURIFICATION METHOD USING SAME
The present invention provides a chromatographic support for purifying an Fc fusion protein and an Fc fusion protein purification method using said chromatographic support. The chromatographic support comprises porous particles to which a ligand is immobilized, wherein: the porous particles are synthetic polymer-based or natural polymer-based porous particles; the ligand is at least one substance selected from the group consisting of protein A, protein G, protein L, and related substances of these; and the average pore diameter of the porous particles to which the ligand is immobilized is 75-120 nm. The Fc fusion protein purification method comprises: (step 1) a step for passing a solution containing an Fc fusion protein through a column that is provided with said chromatographic support and causing the Fc fusion protein to bind with the support; (step 2) a step for washing the support; and (step 3) a step for collecting the Fc fusion protein from the support.
C07K 1/16 - ExtractionSéparationPurification par chromatographie
B01D 15/20 - Adsorption sélective, p. ex. chromatographie caractérisée par des caractéristiques de structure ou de fonctionnement relatives au conditionnement de la matière adsorbante ou absorbante
B01J 20/281 - Absorbants ou adsorbants spécialement adaptés pour la chromatographie préparative, analytique ou de recherche
C07K 16/00 - Immunoglobulines, p. ex. anticorps monoclonaux ou polyclonaux
The purpose of the present invention is to provide: a radiation-sensitive composition having excellent sensitivity and LWR when forming a pattern; a pattern formation method; and a radiation-sensitive acid generator. This radiation-sensitive composition comprises: a polymer (A) which contains a structural unit (I) having an acid-dissociable group and has an iodine group; and a solvent (D), wherein said radiation-sensitive composition contains a radiation-sensitive acid generator (B) represented by formula (1), or the polymer (A) contains a structural unit (II) represented by formula (1'). (In formula (1), R1is a C1-C40 monovalent organic group. When a plurality of R2s are present, the plurality of R2s are each independently a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxy group, a thiol group, a halogen atom, or a monovalent organic group, or a C3-C20 divalent cyclic group composed of two R2s aligned with each other and a carbon atom to which the two R2s are bonded. n is an integer of 0-20. W represents a ring structure with 5-8 membered rings which is formed together with a carbon atom and a nitrogen atom to which W is bonded.) (In formula (1'), R1ais a C1-C40 divalent organic group. Rais a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. R2, n, and W have the same meanings as those in formula (1).)
C07D 207/404 - Pyrrolidines-2, 5 diones avec uniquement des atomes d'hydrogène ou des radicaux ne contenant que des atomes d'hydrogène et de carbone, liés directement aux autres atomes de carbone du cycle, p. ex. succinimide
C07D 209/48 - Iso-indolesIso-indoles hydrogénés avec des atomes d'oxygène en positions 1 et 3, p. ex. phtalimide
C07D 209/80 - Systèmes cycliques contenant au moins trois cycles condensés en [b, c] ou [b, d]
C07D 317/70 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3 condensés en ortho ou en péri avec des carbocycles ou avec des systèmes carbocycliques condensés avec des systèmes cycliques contenant au moins deux cycles déterminants
A radiation-sensitive composition contains a polymer having a partial structure represented by formula (1), and a radiation-sensitive acid generating substance. The radiation-sensitive composition satisfies one or more of requirement 1, requirement 2, and requirement 3. requirement 1: the partial structure represented by the formula (1) has two or more iodine atoms. requirement 2: the radiation-sensitive acid generating substance contains an onium salt having two or more iodine atoms. requirement 3: the partial structure represented by the formula (1) has an iodine atom, and the radiation-sensitive acid generating substance contains an onium salt having an iodine atom. In the formula (1), Y1 represents a divalent group represented by formula (2-1) or formula (2-2).
A radiation-sensitive composition contains a polymer having a partial structure represented by formula (1), and a radiation-sensitive acid generating substance. The radiation-sensitive composition satisfies one or more of requirement 1, requirement 2, and requirement 3. requirement 1: the partial structure represented by the formula (1) has two or more iodine atoms. requirement 2: the radiation-sensitive acid generating substance contains an onium salt having two or more iodine atoms. requirement 3: the partial structure represented by the formula (1) has an iodine atom, and the radiation-sensitive acid generating substance contains an onium salt having an iodine atom. In the formula (1), Y1 represents a divalent group represented by formula (2-1) or formula (2-2).
C07C 309/12 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy estérifiés liés au squelette carboné
C07C 323/09 - Thiols, sulfures, hydropolysulfures ou polysulfures substitués par des halogènes, des atomes d'oxygène ou d'azote ou par des atomes de soufre ne faisant pas partie de groupes thio contenant des groupes thio et des atomes d'halogène ou des groupes nitro ou nitroso liés au même squelette carboné ayant des atomes de soufre de groupes thio liés à des atomes de carbone de cycles aromatiques à six chaînons du squelette carboné
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
C08F 220/18 - Esters des alcools ou des phénols monohydriques des phénols ou des alcools contenant plusieurs atomes de carbone avec l'acide acrylique ou l'acide méthacrylique
The present invention provides: a radiation-sensitive composition which has excellent storage stability and is capable of exhibiting sensitivity, LWR, pattern rectangularity, CDU, and pattern circularity at sufficient levels when a pattern is formed; a pattern forming method; and an onium salt. This radiation-sensitive composition contains: an onium salt that is represented by formula (1-1) or (1-2); a polymer that contains a structural unit (I) having an acid-dissociable group; and a solvent. [Chemical formula 1] (In formulae (1-1) and (1-2), Ar11and Ar2122 + 1)-valent aromatic ring having 5 to 20 ring atoms. Ar1233 + 1)-valent aromatic ring having 5 to 20 ring atoms. Ar22312311 is 1, R111 is 2 or more, the plurality of R1s are the same as the R111 is 1, or two among the plurality of R1s combine with each other to form a cyclic structure having 3 to 10 carbon atoms, together with two carbon atoms of the ring in the formula to which the moieties are bonded. The plurality of R122 is 1, R2is the same as the R1122 is 2 or more, the plurality of R2s are the same as the R1133 is 1, R3is the same as the R1133 is 2 or more, the plurality of R3s are the same as the R1122-, -O-, or -S-. Y is a single bond or a divalent linking group. The bonds expressed by the formula are each independently a single bond or a double bond. [Chemical formula 2] In the formula, Z- is an organic acid anion having 2 or more carbon atoms.)
C07D 335/04 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome de soufre comme unique hétéro-atome du cycle condensés avec des carbocycles ou avec des systèmes carbocycliques
Provided are a semiconductor substrate production method and a composition for forming a resist underlayer film that make it possible to form a resist underlayer film capable of exhibiting excellent pattern rectangularity and pattern defect suppression when forming a resist pattern. The semiconductor substrate production method comprises: a step in which a substrate is directly or indirectly coated with the composition for forming a resist underlayer film; a step in which a resist film is formed on the resist underlayer film formed by the step in which coating is performed with the composition for forming a resist underlayer film; a step in which the resist film is exposed to radiation; and a step in which at least the exposed resist film is developed. The composition for forming a resist underlayer film contains a polymer and a solvent. The polymer includes a repeating unit (1) represented by formula (1). (In formula (1), R1represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1-20 carbon atoms. L1represents a single bond or a divalent linking group. R2 is a monovalent group containing an atom selected from the group consisting of silicon, zinc, aluminum, germanium, tin, titanium, zirconium, and hafnium.)
G03F 7/11 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p. ex. couches d'ancrage
C08F 30/04 - Homopolymères ou copolymères de composés contenant un ou plusieurs radicaux aliphatiques non saturés, chaque radical ne contenant qu'une seule liaison double carbone-carbone et contenant du phosphore, du sélénium, du tellure ou un métal contenant un métal
An organometallic precursor solution comprising an organic solvent, a radiation sensitive organometallic precursor composition with hydrolysable metal ligands, and a radical scavenger additive is described. The radical scavenger additive or a blend of radical scavenger additives can provide for improvements to the stability of an organometallic precursor solution, such as improvements to storage stability, shelf-life, and/or batch-to-batch reproducibility through mitigation of the effects of reactive compounds in the environment, such as oxygen. A structure having a substrate, a radiation patternable organometallic coating composition, and a radical scavenging additive is also described. The radical scavenger additive or a blend thereof can result in patterning improvements, such as by improving coating quality and reducing patterning variability. Methods of using a radical scavenging additive in the formation of a structure comprising a radiation patternable organometallic film are described. Methods of producing a container of a stabilized organometallic precursor composition are also described.
C07C 43/23 - Éthers une liaison sur l'oxygène de la fonction éther étant sur un atome de carbone d'un cycle aromatique à six chaînons contenant des groupes hydroxyle ou O-métal
52.
RESIST UNDERLAYER FILM-FORMING COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
A composition includes a compound including an iodine atom, and a solvent. The compound including an iodine atom is a polymer including a repeating unit represented by formula (1), an aromatic ring-containing compound including an iodine atom and having a molecular weight of 750 or more and 3,000 or less, or a combination thereof. A content ratio of the compound including an iodine atom to components other than the solvent in the composition for forming an underlayer film is 50% by mass or more. In the formula (1), Ar1 is a divalent group including an aromatic ring having 5 to 40 ring atoms; and R0 is a hydrogen atom or a monovalent organic group having 1 to 40 carbon atoms, R1 is a monovalent organic group having 1 to 40 carbon atoms, and at least one of Ar1, R0 or R1 includes an iodine atom.
A composition includes a compound including an iodine atom, and a solvent. The compound including an iodine atom is a polymer including a repeating unit represented by formula (1), an aromatic ring-containing compound including an iodine atom and having a molecular weight of 750 or more and 3,000 or less, or a combination thereof. A content ratio of the compound including an iodine atom to components other than the solvent in the composition for forming an underlayer film is 50% by mass or more. In the formula (1), Ar1 is a divalent group including an aromatic ring having 5 to 40 ring atoms; and R0 is a hydrogen atom or a monovalent organic group having 1 to 40 carbon atoms, R1 is a monovalent organic group having 1 to 40 carbon atoms, and at least one of Ar1, R0 or R1 includes an iodine atom.
G03F 7/11 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p. ex. couches d'ancrage
H01L 21/027 - Fabrication de masques sur des corps semi-conducteurs pour traitement photolithographique ultérieur, non prévue dans le groupe ou
H01L 21/308 - Traitement chimique ou électrique, p. ex. gravure électrolytique en utilisant des masques
53.
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND METHOD FOR PRODUCING NITROGEN-CONTAINING COMPOUND
Provided are: a method for manufacturing a semiconductor substrate using a composition capable of forming a film excellent in embedding properties and flatness; a composition for forming a resist underlayer film; and a method for producing a nitrogen-containing compound. This method for manufacturing a semiconductor substrate includes: a step for directly or indirectly coating a substrate with a composition for forming a resist underlayer film; a step for forming a resist pattern directly or indirectly on the resist underlayer film formed by the coating step; and a step for performing etching using the resist pattern as a mask. The composition for forming a resist underlayer film contains a nitrogen-containing compound and a solvent. The nitrogen-containing compound includes a substructure represented by formula (1). (In formula (1), Ar1 is a substituted or unsubstituted aromatic ring having 5-40 rings and containing the carbon-carbon double bond in the formula. Each * is a bond with another structure in the nitrogen-containing compound.)
G03F 7/11 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p. ex. couches d'ancrage
G03F 7/26 - Traitement des matériaux photosensiblesAppareillages à cet effet
54.
METHOD FOR PRODUCING ALIPHATIC POLYESTER RESIN COMPOSITION, ALIPHATIC POLYESTER RESIN COMPOSITION, AND MARINE DEGRADATION PROMOTER
Provided is a method for producing an aliphatic polyester resin composition by heating and kneading an aliphatic polyester resin and a nitrogen compound, wherein the solubility of the nitrogen compound in water at 20℃ is 50 g/100 mL or less. Also provided are: a method for producing an aliphatic polyester resin composition that makes it possible to obtain an aliphatic polyester resin composition having marine degradability and excellent durability to moisture; an aliphatic polyester resin composition; and a marine degradation accelerator.
C08K 5/32 - Composés contenant de l'azote lié à l'oxygène
C08K 5/521 - Esters des acides phosphoriques, p. ex. de H3PO4
C08K 5/523 - Esters des acides phosphoriques, p. ex. de H3PO4 avec des composés hydroxyaryliques
C08L 67/00 - Compositions contenant des polyesters obtenus par des réactions créant une liaison ester carboxylique dans la chaîne principaleCompositions contenant des dérivés de tels polymères
C08L 101/16 - Compositions contenant des composés macromoléculaires non spécifiés les composés macromoléculaires étant biodégradables
55.
EXPANDED BEAD PRODUCTION METHOD, AND EXPANDED BEADS
A method for producing expanded beads having a bulk density of 10 to 240 kg/m3, the method including expanding resin particles containing a mixed resin of at least two linear low-density polyethylenes as a base resin, wherein the mixed resin contains polyethylene A having a biomass degree of 50% or more and a melt flow rate (MFR) of 0.1 to 3 g/10 min and polyethylene B; a difference between the MFR of A and the MFR of B is 0 to 2 g/10 min; a mass ratio of A to B is 5/95 to 95/5; the mixed resin has a biomass degree of 5% or more; the expanded bead has a crystal structure where a melting peak intrinsic to the linear low-density polyethylene and a high-temperature peak on a higher temperature side appear on a DSC curve; and a heat of fusion at the high-temperature peak is 10 to 50 J/g.
A radiation-sensitive composition containing: a polymer that undergoes a change in solubility in a developing solution when subjected to the action of an acid; and a compound represented by formula (1).
C07C 65/21 - Composés comportant des groupes carboxyle liés à des atomes de carbone de cycles aromatiques à six chaînons et contenant l'un des groupes OH, O-métal, —CHO, cétone, éther, des groupes , des groupes ou des groupes contenant des groupes éther, des groupes , des groupes ou des groupes
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
C08F 220/18 - Esters des alcools ou des phénols monohydriques des phénols ou des alcools contenant plusieurs atomes de carbone avec l'acide acrylique ou l'acide méthacrylique
Provided are a diffractive optical element that is thin and highly amenable to mass production, and that has high light condensing performance and is applicable to fine pixel pitch, and a method for manufacturing the diffractive optical element. The diffractive optical element causes diffraction of incident light in a wavelength range of 410-1,100 nm, and comprises: a substrate that transmits incident light; and a light shielding resin layer that forms unevenness on the main surface of the substrate and forms a diffraction pattern that is substantially concentric when viewed in a direction orthogonal to the main surface of the substrate, the light shielding resin layer being formed by a curable resin composition and shielding at least some wavelengths of light in the incident light.
An organometallic precursor solution comprising an organic solvent, a radiation sensitive organometallic precursor composition with hydrolysable metal ligands, and a radical scavenger additive is described. The radical scavenger additive or a blend of radical scavenger additives can provide for improvements to the stability of an organometallic precursor solution, such as improvements to storage stability, shelf-life, and/or batch-to-batch reproducibility through mitigation of the effects of reactive compounds in the environment, such as oxygen. A structure having a substrate, a radiation patternable organometallic coating composition, and a radical scavenging additive is also described. The radical scavenger additive or a blend thereof can result in patterning improvements, such as by improving coating quality and reducing patterning variability. Methods of using a radical scavenging additive in the formation of a structure comprising a radiation patternable organometallic film are described. Methods of producing a container of a stabilized organometallic precursor composition are also described.
This wiring board comprises a barrier film disposed directly or indirectly on a substrate including copper wiring, and the barrier film contains flaky titanium oxide or a flaky titanium-metal composite oxide.
H05K 3/28 - Application de revêtements de protection non métalliques
H01L 21/768 - Fixation d'interconnexions servant à conduire le courant entre des composants distincts à l'intérieur du dispositif
H01L 23/532 - Dispositions pour conduire le courant électrique à l'intérieur du dispositif pendant son fonctionnement, d'un composant à un autre comprenant des interconnexions externes formées d'une structure multicouche de couches conductrices et isolantes inséparables du corps semi-conducteur sur lequel elles ont été déposées caractérisées par les matériaux
60.
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, POLYMER, AND COMPOUND
The purpose of the present invention is to provide a radiation-sensitive composition and a pattern formation method that enable formation of a resist film that, when a next-generation technology is applied, can exhibit sufficient levels of sensitivity and CDU and suppress development defects. Another purpose of the present invention is to provide a polymer and a compound applicable to the radiation-sensitive composition. The present invention relates to a radiation-sensitive composition containing a solvent and a polymer containing a structural unit (I) having an acid-dissociable group and a structural unit (II) represented by formula (1). (In the formula (1), R1is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. R2is a divalent organic group having 1 to 50 carbon atoms. Z is an amide bond. R3is a single bond or an organic group having 1 to 5 carbon atoms. Rf1and Rf2are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group, and at least one thereof is a fluorine atom or a fluorinated hydrocarbon group. When there are multiple Rf1s and multiple Rf2s, the multiple Rf1s and the multiple Rf2s are each the same or different. n is an integer of 1 to 3. M+ is a monovalent onium cation.)
C07C 309/17 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des groupes carboxyle liés au squelette carboné
The purpose of the present invention is to provide: a photosensitive composition which has a high refractive index, has little change in viscosity and resolution even after a certain period of time has elapsed, has excellent storage stability, does not solidify when a coating slit nozzle or the like is used, has good coating properties over time, and has high resolution; a cured film which is formed from the photosensitive composition, and a method for producing the cured film; a display element which is provided with the cured film; and an imaging element which is provided with the cured film. The present invention relates to a photosensitive composition for forming an optical member, the photosensitive composition containing: (A) particles which each have a reactive group, an acidic group that is different from the reactive group, and at least one group that is selected from the group consisting of an oxygen atom-containing or oxygen atom-free alkyl group having 2-30 carbon atoms and an oxygen atom-containing or oxygen atom-free alkylene group having 2-30 carbon atoms; (B) a radically polymerizable compound; and (C) a photoradical generator.
A radiation-sensitive resin composition includes a solvent and a resin including a structural unit A which includes an acid-dissociable group and a structural unit D which includes an aromatic ring. The aromatic ring has a phenolic hydroxy group and an alkyl group which is adjacent to the phenolic hydroxy group. The radiation-sensitive resin composition satisfies Condition 1 and/or Condition 2. Condition 1: the resin further includes a structural unit B which includes an organic acid anion moiety and an onium cation moiety including an aromatic ring structure having a fluorine atom. Condition 2: the radiation-sensitive resin composition further includes an onium salt which includes an organic acid anion moiety and an onium cation moiety including an aromatic ring structure having a fluorine atom.
G03F 7/038 - Composés macromoléculaires rendus insolubles ou sélectivement mouillables
C08F 220/18 - Esters des alcools ou des phénols monohydriques des phénols ou des alcools contenant plusieurs atomes de carbone avec l'acide acrylique ou l'acide méthacrylique
C08F 220/28 - Esters contenant de l'oxygène en plus de l'oxygène de la fonction carboxyle ne contenant pas de cycles aromatiques dans la partie alcool
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
A radiation-sensitive composition includes a polymer including: an acid-labile side chain including an acid-labile group; and an iodo group-containing side chain including two or more iodo groups and one or more radiation-sensitive onium cation structure(s). A method of forming a resist pattern includes: applying the radiation-sensitive composition directly or indirectly on a substrate to form a resist film; exposing the resist film; and developing the resist film exposed. A polymer includes: an acid-labile side chain including an acid-labile group; and an iodo group-containing side chain including two or more iodo groups and one or more radiation-sensitive onium cation structure(s). A monomer is a vinyl compound including two or more iodo groups and one or more radiation-sensitive onium cation structure(s).
C07C 309/12 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy estérifiés liés au squelette carboné
C07C 321/30 - Sulfures ayant l'atome de soufre d'au moins un groupe thio lié à deux atomes de carbone de cycles aromatiques à six chaînons
C07C 323/09 - Thiols, sulfures, hydropolysulfures ou polysulfures substitués par des halogènes, des atomes d'oxygène ou d'azote ou par des atomes de soufre ne faisant pas partie de groupes thio contenant des groupes thio et des atomes d'halogène ou des groupes nitro ou nitroso liés au même squelette carboné ayant des atomes de soufre de groupes thio liés à des atomes de carbone de cycles aromatiques à six chaînons du squelette carboné
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
C08F 220/18 - Esters des alcools ou des phénols monohydriques des phénols ou des alcools contenant plusieurs atomes de carbone avec l'acide acrylique ou l'acide méthacrylique
Provided are: a radiation-sensitive composition which exhibits excellent sensitivity and CDU when a pattern is formed, and which exhibits good storage stability; and a method for forming a pattern. This radiation-sensitive composition contains: a polymer containing a structural unit (I) having an acid-dissociable group; a radiation-sensitive acid generator which contains a second organic acid anion and a second onium cation that is free from the second organic acid anion and which, upon exposure to light, generates an acid that dissociates the acid-dissociable group; an acid diffusion control agent which contains a third organic acid anion and a third onium cation that is free from the third organic acid anion and which, upon exposure to light, generates an acid that does not dissociate the acid-dissociable group; and a solvent. The radiation-sensitive acid generator contains a compound represented by formula (1). The polymer includes, at least, a first organic acid anion and an iodonium cation that is free from the first organic acid anion and includes a structural unit (II) that includes an acid-generating structure which, upon exposure to light, generates an acid that dissociates the acid-dissociable group, or at least a part of the second onium cation or the third onium cation is an iodonium cation. [Chemical formula 1] In formula (1), W is a 5- to 20-membered aromatic ring having a valency of (p+q+1). In a case where multiple W moieties are present, the multiple W moieties may be the same as, or different from, each other. L is a linking group having a valency of (r+1). r is an integer between 1 and 3. p is an integer between 0 and 3. In a case where multiple p values occur, the multiple p values may be the same as, or different from, each other. q is an integer between 1 and 3. In a case where multiple q values occur, the multiple q values may be the same as, or different from, each other. M+ is a monovalent onium cation.
C07C 25/00 - Composés contenant au moins un halogène lié à un cycle aromatique à six chaînons
C07C 309/12 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy estérifiés liés au squelette carboné
C07C 309/17 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des groupes carboxyle liés au squelette carboné
C07D 317/24 - Radicaux substitués par des atomes d'oxygène ou de soufre liés par des liaisons simples estérifiés
C07D 317/30 - Radicaux substitués par des atomes de carbone comportant trois liaisons à des hétéro-atomes, avec au plus une liaison à un halogène, p. ex. radicaux ester ou nitrile
C07D 317/70 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3 condensés en ortho ou en péri avec des carbocycles ou avec des systèmes carbocycliques condensés avec des systèmes cycliques contenant au moins deux cycles déterminants
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
A method for producing a geopolymer foam, comprising obtaining a reaction slurry containing aluminosilicate, alkali metal silicate, aggregate, and water, adding a foaming agent to the reaction slurry to form a foaming slurry, and heating the foaming slurry, wherein the aggregate used is mica with an average particle size of 50 to 500 μm and a volume fraction (X) of particles with a particle size of 10 μm or less of 3% or less, and wherein the viscosity of the reaction slurry at 23° C. is 3000 to 15000 mPa·s.
C04B 28/00 - Compositions pour mortiers, béton ou pierre artificielle, contenant des liants inorganiques ou contenant le produit de réaction d'un liant inorganique et d'un liant organique, p. ex. contenant des ciments de polycarboxylates
A method for forming a resist pattern, includes: forming a metal-containing resist film directly or indirectly on a substrate; laminating a protective film on the metal-containing resist film by applying a composition for forming a protective film; exposing to light the metal-containing resist film on which the protective film is laminated; and removing a portion of the exposed metal-containing resist film to form a pattern.
G03F 7/09 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires
G03F 7/11 - Matériaux photosensibles caractérisés par des détails de structure, p. ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p. ex. couches d'ancrage
G03F 7/32 - Compositions liquides à cet effet, p. ex. développateurs
67.
RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND
A polymer containing a structural unit represented by formula (1) is included in this radiation-sensitive composition. In formula (1), R1is a hydrogen atom, a fluoro group, a methyl group, or a trifluoromethyl group. Ar1is a group obtained by removing (a+2) hydrogen atoms from an aromatic ring. R233 -or COO-. Provided that, R2is bonded to an atom adjacent to the bonding site with the main chain or is bonded to an atom also adjacent to an atom adjacent to the bonding site with the main chain among the atoms constituting the aromatic ring in Ar1. R3is a substituent. Mb+ is a b-valent cation.
An expanded bead containing a linear low-density polyethylene as a base resin, wherein the linear low-density polyethylene has a biomass degree of 40% or more as measured according to ASTM D 6866; the expanded bead has a crystal structure where a melting peak intrinsic to the linear low-density polyethylene (intrinsic peak) and at least one melting peak on a higher temperature side than the intrinsic peak (high-temperature peak) appear on a DSC curve drawn by heating the expanded bead from 23° C. to 200° C. at a heating rate of 10° C./min; a total heat of fusion of the expanded bead is 70 J/g or more and 100 J/g or less; and a heat of fusion at the high-temperature peak is 10 J/g or more and 50 J/g or less.
Provided are: a radiation-sensitive composition capable of exhibiting sensitivity, CDU, LWR, water repellency, and development defect suppression at sufficient levels during pattern formation, while reducing fluorine in a surface modifier; a pattern forming method; and a compound. This radiation-sensitive composition comprises: a first polymer including a structural unit (I) having an acid dissociable group; a second polymer including a structural unit (i) derived from a compound represented by formula (F1); and a solvent. (In formula (F1): W is a polymerizable group; L is a single bond or an (n+1)-valent linking group; R1is a divalent hydrocarbon group having 1-10 carbon atoms; X1, X2, and X3are each independently a hydrogen atom or a fluorine atom, provided that at least one selected from the group consisting of X1, X2, and X3is a fluorine atom; n is an integer from 1 to 3, provided that when L is a single bond, n is 1; and when n is 2 or more, each of the multiple R1s, X1s, X2s, and X3s are the same or different from one another.)
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C08L 33/10 - Homopolymères ou copolymères des esters de l'acide méthacrylique
C08L 33/14 - Homopolymères ou copolymères des esters d'esters contenant des atomes d'halogène, d'azote, de soufre ou d'oxygène en plus de l'oxygène du radical carboxyle
The purpose of the present invention is to provide: a radiation-sensitive composition capable of forming a resist film that can exhibit sensitivity, LWR, DOF, EL, PED, CDU, and pattern circularity at sufficient levels; and a pattern formation method. The purpose of the present invention is also to provide a radiation-sensitive acid generator that can be applied to said radiation-sensitive composition. The radiation-sensitive composition comprises a polymer (A) containing a structural unit (I) having an acid-dissociable group, and a solvent (E), wherein at least the radiation-sensitive composition contains a radiation-sensitive acid generator (B) containing a partial structure represented by formula (a), or the polymer (A) contains a structural unit (VII) containing a partial structure represented by formula (a). (In formula (a): R1is a hydrogen atom, a nitro group, a hydroxy group, a cyano group, a carboxy group, a thiol group, or a monovalent fluorine-free organic group; when there are multiple R1s, the multiple R1s are the same or different from one another; R2and R3are each independently a hydrogen atom, a nitro group, a hydroxy group, a cyano group, a carboxy group, a thiol group, a halogen atom, or a monovalent organic group, or form a divalent alicyclic group which has 3 to 20 carbon atoms and which is formed from R2and R3combined with each other together with carbon atoms binding thereto; when there are multiple R2s and multiple R3s, the multiple R2s and the multiple R3s are the same or different from one another; L is *-C(=O)O-, *-C(=O)NR5-, or *-OC(=O)O-; R5is a hydrogen atom or a monovalent hydrocarbon group having 1-10 carbon atoms; * represents a bonding site on the R41side; R41is a divalent organic group having a cyclic structure and having a hetero atom; m is an integer of 1-5; n is an integer of 0-4; ** is a bonding site with the other moiety of the corresponding polymer (A) or radiation-sensitive acid generator (B); and M+ is a monovalent onium cation.)
C07C 309/12 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy estérifiés liés au squelette carboné
C07D 209/42 - Atomes de carbone comportant trois liaisons à des hétéro-atomes, avec au plus une liaison à un halogène, p. ex. radicaux ester ou nitrile
C07D 211/62 - Atomes de carbone comportant trois liaisons à des hétéro-atomes, avec au plus une liaison à un halogène, p. ex. radicaux ester ou nitrile liés en position 4
C07D 295/15 - Composés hétérocycliques contenant des cycles polyméthylène imine d'au moins cinq chaînons, des cycles aza-3 bicyclo [3.2.2] nonane, piperazine, morpholine ou thiomorpholine, ne comportant que des atomes d'hydrogène liés directement aux atomes de carbone du cycle avec des radicaux hydrocarbonés substitués liés aux atomes d'azote du cycle substitués par des atomes de carbone comportant trois liaisons à des hétéro-atomes avec au plus une liaison à un halogène, p. ex. radicaux ester ou nitrile avec les atomes d'azote du cycle et les atomes de carbone comportant trois liaisons à des hétéro-atomes liés à la même chaîne carbonée, qui n'est pas interrompue par des carbocycles à une chaîne acyclique saturée
C07D 305/06 - Composés hétérocycliques contenant des cycles à quatre chaînons comportant un atome d'oxygène comme unique hétéro-atome du cycle non condensés avec d'autres cycles ne comportant pas de liaisons doubles entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes du cycle
C07D 307/00 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant un atome d'oxygène comme unique hétéro-atome du cycle
C07D 317/08 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3
C07D 321/10 - Cycles à sept chaînons condensés avec des carbocycles ou avec des systèmes carbocycliques
C07D 327/08 - Cycles à six chaînons condensés en [b, e] avec deux carbocycles à six chaînons
C07D 333/38 - Atomes de carbone comportant trois liaisons à des hétéro-atomes avec au plus une liaison à un halogène, p. ex. radicaux ester ou nitrile
C07D 333/46 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant un atome de soufre comme unique hétéro-atome du cycle non condensés avec d'autres cycles substitués sur l'atome de soufre du cycle
C07D 333/54 - Benzo [b] thiophènesBenzo [b] thiophènes hydrogénés avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone de l'hétérocycle
C07D 335/02 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome de soufre comme unique hétéro-atome du cycle non condensés avec d'autres cycles
C07D 407/12 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes d'oxygène comme uniques hétéro-atomes du cycle, non prévus par le groupe contenant deux hétérocycles liés par une chaîne contenant des hétéro-atomes comme chaînons
The purpose of the present invention is to provide a radiation-sensitive composition whereby it is possible to form a resist film capable of exhibiting sensitivity, LWR, MEEF, CDU, development defect performance, pattern rectangularity, and pattern circularity at adequate levels, and a pattern formation method. Another purpose of the present invention is to provide a radiation-sensitive acid generation agent that can be applied to the radiation-sensitive composition. This radiation-sensitive composition contains: a polymer (A) including a structural unit (I) with an acid-dissociable group; a radiation-sensitive acid generation agent (B) represented by formula (1); and a solvent (E). Chemical Formula 1 (In formula (1), R1is a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxy group, a methyl group, or an ethyl group. When there are a plurality of R1, the plurality of R1are each the same or different from each other. R2and R3are each independently a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxy group, a thiol group, a halogen atom, a monovalent organic group, or a divalent alicyclic group that has 3 to 20 carbon atoms and is formed together with carbon atoms bonding together R2and R3when combined. When there are a plurality of R2and R3, the plurality of R2and R3are the same or different from each other. L is a divalent linking group. R4is a monovalent linear organic group having 3 or more carbon atoms or a monovalent branched organic group having 5 or more carbon atoms. m is an integer of 1 to 5. n is an integer of 0 to 4. M+ is a monovalent onium cation.)
C07C 309/12 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy estérifiés liés au squelette carboné
C07C 309/17 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des groupes carboxyle liés au squelette carboné
C07D 327/08 - Cycles à six chaînons condensés en [b, e] avec deux carbocycles à six chaînons
C07D 333/46 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant un atome de soufre comme unique hétéro-atome du cycle non condensés avec d'autres cycles substitués sur l'atome de soufre du cycle
C07D 333/54 - Benzo [b] thiophènesBenzo [b] thiophènes hydrogénés avec uniquement des atomes d'hydrogène, des radicaux hydrocarbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone de l'hétérocycle
C07D 335/02 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome de soufre comme unique hétéro-atome du cycle non condensés avec d'autres cycles
A method for producing polypropylene-based resin expanded beads includes dispersion, blowing agent impregnation, and foaming steps. Beads used in the dispersion step include a core layer having a polypropylene-based resin as a base material resin, and a fusion-bonding layer covering core layer; the beads fusion-bonding layer includes carbon black and a NOR-type hindered amine; a carbon black blending ratio is adjusted to 0.5 wt % or more and 5 wt % or less; and an amine blending ratio of the beads is adjusted to 0.03 wt % or more and 0.5 wt % or less; the polypropylene-based resin expanded beads have a surface on which a fusion-bonding layer is located; the fusion-bonding layer includes the carbon black and hindered amine; a carbon black blending ratio is 0.5 wt % or more and 5 wt % or less; and a blending ratio of the hindered amine is 0.03 wt % or more and 0.5 wt % or less.
C08J 9/18 - Fabrication de particules expansibles par imprégnation des particules du polymère avec l'agent de gonflage
B29B 9/06 - Fabrication de granulés par division de matière préformée sous forme de filaments, p. ex. combinée avec l'extrusion
B29C 48/05 - Moulage par extrusion, c.-à-d. en exprimant la matière à mouler dans une matrice ou une filière qui lui donne la forme désiréeAppareils à cet effet caractérisées par la forme à l’extrusion de la matière extrudée filamentaire, p. ex. fils
B29C 48/21 - Articles comprenant au moins deux composants, p. ex. couches coextrudées les composants étant des couches les couches étant jointes à leurs surfaces
B29C 48/36 - Moyens pour plastifier ou homogénéiser la matière à mouler ou pour la forcer dans la filière ou la matrice
B29K 23/00 - Utilisation de polyalcènes comme matière de moulage
The present invention provides a radiation-sensitive composition that makes it possible to exhibit satisfactory levels of sensitivity, CDU, LWR, water repellency, and development defect suppression performance in pattern formation while achieving reduction in fluorine in a surface modifier, a pattern formation method, and a compound. This radiation-sensitive composition contains: a first polymer including a structural unit (I) having an acid-dissociable group; a second polymer including a structural unit (i) derived from a compound represented by formula (F1); and a solvent. (In formula (F1), W is a polymerizable group. L111+1)-valent linking group. When L122H is –COO-*22H side. Note that L111 is an integer from 1 to 3.)
Provided are a radiation-sensitive composition, a pattern formation method, and a compound, which are capable of exhibiting sufficient levels of development defect suppression, water repellency, LWR, CDU, and sensitivity when forming a pattern, while reducing fluorine in a surface modifier. This radiation-sensitive composition contains: a first polymer including a structural unit (I) having an acid dissociable group; a second polymer including a structural unit (i) derived from a compound represented by formula (F1); and a solvent. (In formula (F1), W represents a polymerizable group. n represents 0 or 1. When n represents 0, L represents a linking group having a valance of (m+1) and having one or more carbon atoms. When n represents 1, L represents a linking group having a valance of (m+1) and having three or more carbon atoms. m represents an integer of 1-3. When m represents 2, L represents a trivalent linking group having four or more carbon atoms.)
To provide a radiation-sensitive composition and a pattern forming method capable of exhibiting sensitivity, pattern rectangularity, pattern circularity, exposure margin, focal depth, development defect suppression property, LWR and CDU at sufficient levels when forming a resist pattern, and having good storage stability. A radiation-sensitive composition contains an onium salt compound represented by formula (1), a polymer, and a solvent. In formula (1), Rfis a halogen atom or a cyano group. n is an integer of 0 to 4. When n is 2 or more, multiple Rfgroups are the same or different from each other. R1is a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom, a cyano group or a fluorinated alkyl group that binds to a carbon atom to which R1is bonded via *-COO-, *-OCO-, *22-, *-S-, *-CO-, *-O-CO-O-, *-CONR'- or *-NR'CO-. Each R' independently is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. *is a bond with a carbon atom to which R1is bonded. Provided that, when n is 0, R1is a halogen atom or a cyano group. R2is a hydroxy group, a nitro group, an amino group, a carboxy group, or a monovalent organic group having 1 to 20 carbon atoms. m is an integer of 0 to 4. When m is 2 or more, multiple R222-. Provided that when X is a methylene group, the aromatic ring of Ar is directly bonded to S+in the formula, and R1does not include a polymerizable group. R41, R42, R43, R44, R45and R48are each independently a hydrogen atom, a hydroxy group, a halogen atom or a monovalent organic group having 1 to 20 carbon atoms. R46and R47are each independently a hydrogen atom, a hydroxy group, a halogen atom, or a monovalent organic group having 1 to 20 carbon atoms, or R46and R47 are combined to represent a ring structure having 3 to 10 ring members together with two carbon atoms to which they are bonded.
C07C 309/39 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone de cycles aromatiques à six chaînons d'un squelette carboné contenant des atomes d'halogène liés au squelette carboné
C07C 309/42 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone de cycles aromatiques à six chaînons d'un squelette carboné contenant des atomes d'oxygène, liés par des liaisons simples, liés au squelette carboné ayant les groupes sulfo liés à des atomes de carbone de cycles aromatiques à six chaînons non condensés
C07C 309/48 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone de cycles aromatiques à six chaînons d'un squelette carboné contenant des atomes d'azote, ne faisant pas partie de groupes nitro ou nitroso, liés au squelette carboné le squelette carboné étant substitué de plus par des atomes d'halogène
C07C 309/58 - Groupes acide carboxylique ou leurs esters
C07C 317/14 - SulfonesSulfoxydes ayant des groupes sulfone ou sulfoxyde liés à des atomes de carbone de cycles aromatiques à six chaînons
C07D 307/00 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant un atome d'oxygène comme unique hétéro-atome du cycle
C07D 307/33 - Atomes d'oxygène en position 2, l'atome d'oxygène étant sous la forme céto ou énol non substituée
C07D 317/18 - Radicaux substitués par des atomes d'oxygène ou de soufre liés par des liaisons simples
C07D 335/02 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome de soufre comme unique hétéro-atome du cycle non condensés avec d'autres cycles
C07D 337/04 - Cycles à sept chaînons non condensés avec d'autres cycles
C07D 409/04 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre comme uniques hétéro-atomes du cycle contenant deux hétérocycles liés par une liaison directe de chaînon cyclique à chaînon cyclique
C07D 409/06 - Composés hétérocycliques contenant plusieurs hétérocycles, au moins un cycle comportant des atomes de soufre comme uniques hétéro-atomes du cycle contenant deux hétérocycles liés par une chaîne carbonée contenant uniquement des atomes de carbone aliphatiques
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
The purpose of the present invention is to provide: a radiation-sensitive composition with which it is possible to form a resist film capable of exhibiting sensitivity, LWR, pattern rectangularity, CDU, pattern circularity, and development defect performance at sufficient levels; and a pattern formation method. Additionally, the purpose of the present invention is to provide a radiation-sensitive acid generator that can be applied to the radiation-sensitive composition. This radiation-sensitive composition contains a polymer (A) that contains a structural unit (I) having an acid-dissociable group, a radiation-sensitive acid generator (B) that is represented by formula (1), and a solvent (E). Formula (1) (In formula (1), R1is a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxy group, a thiol group, a halogen atom, or a monovalent organic group. When there are multiple R1, the R1are each the same or different. R2is a C1-40 monovalent organic group. m1 is an integer from 1 to 5. M+ is a monovalent onium cation.)
C07C 309/03 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé
C07C 309/17 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des groupes carboxyle liés au squelette carboné
C07D 327/08 - Cycles à six chaînons condensés en [b, e] avec deux carbocycles à six chaînons
C07D 333/46 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant un atome de soufre comme unique hétéro-atome du cycle non condensés avec d'autres cycles substitués sur l'atome de soufre du cycle
C07D 335/02 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome de soufre comme unique hétéro-atome du cycle non condensés avec d'autres cycles
Provided are polyolefin-based resin foamed particles with which it is possible to easily mold a polyolefin-based resin foamed particle molded article exhibiting high flame retardancy as well as exceptional fusion properties and surface properties. These polyolefin-based resin foamed particles comprise a foam layer. The foam layer contains a base material resin, a phosphonic-acid-ester-based compound, and a NOR-type hindered-amine-based compound. The base material resin is configured from a polyolefin-based resin. The blending amount of the phosphonic-acid-ester-based compound in the foam layer is 5-25 parts by mass per 100 parts by mass of the base material resin. The blending amount of the NOR-type hindered-amine-based compound in the foam layer is 0.3-5 parts by mass per 100 parts by mass of the base material resin. The closed cell ratio of the foamed particles is 60% or greater.
A method for producing foamable polyamide-based resin particles according to the present invention includes impregnating polyamide-based resin particles with an inorganic physical foaming agent in a gas phase, wherein the polyamide-based resin particles have a water content of at least 2.5 mass % and contain 0.5-10 mass % of carbon black. Foamed polyamide-based resin particles are obtained by heating and foaming the foamable polyamide resin particles.
The present invention provides a method for easily producing a chromatographic carrier that has a high dynamic binding capacity to antibodies or fragments thereof, inhibits the leakage of protein ligands during isolation, and inhibits the aggregation of carriers. Provided is a production method for a chromatographic carrier comprising the ligand binding step, ligand-bound carrier bed forming step, ligand-bound carrier flushing and cleaning step, and ligand-bound carrier stirring and cleaning step described hereafter. Ligand binding step: a step in which a protein ligand is bound to a solid phase carrier. Ligand-bound carrier bed forming step: a step in which a container is filled with the ligand-bound carrier obtained in the ligand binding step to form a ligand-bound carrier bed. Ligand-bound carrier flushing and cleaning step: a step in which the ligand-bound carrier bed formed in the ligand-bound carrier bed forming step is cleaned one or more times by flushing the bed with a cleaning liquid. Ligand-bound carrier stirring and cleaning step: a step in which the ligand-bound carrier after the ligand-bound carrier flushing and cleaning step is cleaned one or more times by stirring in a cleaning liquid.
Provided are a radiation-sensitive composition capable of exhibiting sufficient levels of sensitivity, CDU performance, and development defect suppression property during pattern formation while achieving a reduction of fluorine in a surface modifier, and a pattern formation method. The radiation-sensitive composition comprises: a first polymer having a structural unit containing an acid-dissociable group; a second polymer different from the first polymer; at least one selected from the group consisting of a radiation-sensitive acid generator containing an iodine group, and an acid diffusion control agent containing an iodine group; and a solvent. The content ratio of the second polymer to the total mass of the first polymer and the second polymer is 0.1-20 mass% inclusive. The second polymer includes a partial structure represented by formula (i), and has a structural unit (B1) not containing a fluorine atom. (In formula (i), R1, R2, and R3 are each independently an alkyl group having 1 to 10 carbon atoms, and * is a bond to a structure other than the partial structure in the structural unit (B1).)
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C08F 12/14 - Monomères ne contenant qu'un seul radical aliphatique non saturé contenant un seul cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
The purpose of the present invention is to provide: a radiation-sensitive composition capable of forming a resist film that can exhibit sensitivity and CDU at satisfactory levels when next-generation technology is applied and can suppress development defects; and a pattern formation method. The purpose of the present invention is also to provide a radiation-sensitive acid generator that can be applied to said radiation-sensitive composition. The present invention relates to a radiation-sensitive composition containing: a polymer (A) containing a structural unit (I) having an acid-dissociable group; a radiation-sensitive acid generator (B) represented by formula (1); and a solvent (C). (In formula (1): A is an (n1+n2+n3+1)-valent aromatic ring; R1is a nitro group, a cyano group, a hydroxy group, an amino group, or a monovalent organic group; when there are multiple R1s, the multiple R1s are the same or different from one another; n1 is an integer of 1-5; n2 is an integer of 1-5; n3 is an integer of 0-5; m2 is an integer of 1-3; L is a single bond or an (m2+1)-valent linking group; Rf1and Rf2are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1-20 carbon atoms; Rf3and Rf4are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1-20 carbon atoms, or a monovalent fluorinated hydrocarbon group having 1-20 carbon atoms; when there are multiple Rf3s and multiple Rf4s, the multiple Rf3s and the multiple Rf4s may each be the same or different from one another; m1 is an integer of 0-10; and M+ is a monovalent onium cation.
C07C 309/11 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy éthérifiés liés au squelette carboné avec l'atome d'oxygène d'au moins un des groupes hydroxy éthérifiés lié de plus à un atome de carbone d'un cycle aromatique à six chaînons
C07D 317/70 - Composés hétérocycliques contenant des cycles à cinq chaînons comportant deux atomes d'oxygène comme uniques hétéro-atomes du cycle comportant les hétéro-atomes en positions 1, 3 condensés en ortho ou en péri avec des carbocycles ou avec des systèmes carbocycliques condensés avec des systèmes cycliques contenant au moins deux cycles déterminants
The present invention provides a method for easily producing a chromatographic carrier that has a high dynamic binding capacity to antibodies or fragments thereof, inhibits the leakage of protein ligands during isolation, and inhibits the aggregation of carriers. Provided is a production method for a chromatographic carrier comprising the solid phase carrier cleaning step, ligand binding step, and ligand-bound carrier cleaning step described hereafter. Solid phase carrier cleaning step: a step in which a solid phase carrier is cleaned using at least one cleaning liquid selected from cleaning liquids containing hydrogen peroxide, cleaning liquids containing peracetic acid, and cleaning liquids (other than cleaning liquids containing hydrogen peroxide and cleaning liquids containing peracetic acid) having a pH of 0-3 or a pH of higher than 12.5 to 14, and the surface of the solid phase carrier is made hydrophilic. Ligand binding step: a step in which a protein ligand is bound to the solid phase carrier cleaned in the solid phase carrier cleaning step. Ligand-bound carrier cleaning step: a step in which the carrier obtained in the ligand binding step is cleaned.
What is provided is a therapeutic agent that is effective for the treatment of ovarian clear cell carcinoma. A therapeutic agent for ovarian clear cell carcinoma includes, as an active ingredient, a proteasome inhibitor. Furthermore, in the therapeutic agent for ovarian clear cell carcinoma, the proteasome inhibitor is a substance that reversibly or irreversibly binds to a 20s proteasome-β5 subunit and inhibits a chymotrypsin-like activity. Moreover, in the therapeutic agent for ovarian clear cell carcinoma, the proteasome is a 26s proteasome. In addition, in the therapeutic agent for ovarian clear cell carcinoma, a content proportion of the proteasome inhibitor is 80% by mass or more, 90% by mass or more, or 100% by mass.
Provided are a radiation-sensitive composition which has excellent sensitivity and CDU and good storage stability, and a pattern formation method. This radiation-sensitive composition comprises a polymer which contains a structural unit (I) that has an acid-dissociable group, an acid diffusion control agent which includes a third organic acid anion and a third onium cation and which, when exposed to light, generates an acid that does not dissociate the acid-dissociable group, and a solvent, wherein at least: the polymer includes a structural unit (II) which has a first organic acid anion and an iodonium cation and which includes an acid generation structure that, when exposed to light, generates an acid that dissociates the acid-dissociable group; the radiation-sensitive composition contains a radiation-sensitive acid generation agent which contains a second organic acid anion and an iodonium cation and which, when exposed to light, generates an acid that dissociates the acid-dissociable group; or the third onium cation is an iodonium cation, the third organic acid anion of the acid diffusion control agent includes an aromatic ring, -COO-is bound to one of the ring-forming atoms of the aromatic ring, -OH is bound to each of two ring-forming atoms which are adjacent to the one ring-forming atom, and the solvent includes a compound represented by formula (H). (In formula (H), R1to R3 are each independently a substituted or unsubstituted C1-20 monovalent aliphatic hydrocarbon group.)
One embodiment of the present invention pertains to a resin composition, a cured object, or an electronic component. The resin composition contains: a polymer (A) having a structural unit represented by formula (a1-1); and a hydrogenated styrene-based thermoplastic elastomer (B). In formula (a1-1), Ra1represents a divalent group represented by formula (a2), and Ra2represents a substituted or unsubstituted divalent aromatic heterocyclic group. In formula (a2), Ara1and Ara2each independently represent a substituted or unsubstituted aromatic hydrocarbon group, L represents a single bond, -O-, -S-, -N(R822-, -P(O)-, or a divalent organic group, y represents an integer of 0-5, and Ra6and Ra7 each independently represent a single bond, a methylene group, or an alkylene group having 2-4 carbon atoms.
C08L 71/10 - Polyéthers dérivés de composés hydroxylés ou de leurs dérivés métalliques de phénols
C08G 65/40 - Composés macromoléculaires obtenus par des réactions créant une liaison éther dans la chaîne principale de la macromolécule à partir de composés hydroxylés ou de leurs dérivés métalliques dérivés des phénols à partir des phénols et d'autres composés
C08L 15/00 - Compositions contenant des dérivés du caoutchouc
87.
POLYOLEFIN-BASED RESIN FOAM PARTICLE, FOAM PARTICLE MOLDED BODY OBTAINED BY IN-MOLD MOLDING OF SAID FOAM PARTICLE, METHOD FOR PRODUCING SAID FOAM PARTICLE, AND METHOD FOR ASSESSING FLAME RETARDANCY OF SAID FOAM PARTICLE
215235215tot215235 to t to t is a numerical value that indicates the mass percentage of phosphorus in the foam particle, and falls within the range 0.001-0.06.
A method for producing a molded article of thermoplastic resin expanded beads that includes cracking filling and in-mold molding. The expanded beads have a columnar shape and a defective portion that is a through hole and/or a groove. A ratio Ca/A of an average cross-sectional area Ca per defective portion to an average cross-sectional area A of a cut surface of the expanded bead obtained by cutting the expanded bead at a center in an axial direction along a plane perpendicular to the axial direction is 0.01 or more and 0.20 or less, and a ratio Ct/A of a total cross-sectional area Ct of the defective portion to the average cross-sectional area A of the expanded bead is 0.02 or more and 0.20 or less. When the mold is completely closed, a filling rate F of the expanded beads is 125% or more and 220% or less.
B29C 44/34 - Éléments constitutifs, détails ou accessoiresOpérations auxiliaires
B29C 44/02 - Moulage par pression interne engendrée dans la matière, p. ex. par gonflage ou par moussage pour la fabrication d'objets de longueur définie, c.-à-d. d'objets séparés
B29C 44/44 - Alimentation en matière à mouler dans une cavité de moulage fermée, c.-à-d. pour la fabrication d'objets de longueur définie sous forme de particules ou de grains expansibles
A method for producing a molded article of thermoplastic resin expanded beads includes a cracking filling step and an in-mold molding step. Expanded beads to be used in the cracking filling step each have a columnar shape and each have one or more defective portions of one or two kinds, the defective portions being selected from the group consisting of through holes and grooves. A molding cavity of a mold has a first portion having a length in an opening/closing direction of the mold greater than an average length LA and a second portion shorter than the average length LA. In the cracking filling step, a difference P2max−P1min between a minimum value P1min of the compression rate of the first portion and a maximum value P2max of the compression rate of the second portion is 5% or more and 100% or less.
B29C 39/00 - Moulage par coulée, c.-à-d. en introduisant la matière à mouler dans un moule ou entre des surfaces enveloppantes sans pression significative de moulageAppareils à cet effet
B29C 39/10 - Moulage par coulée, c.-à-d. en introduisant la matière à mouler dans un moule ou entre des surfaces enveloppantes sans pression significative de moulageAppareils à cet effet pour la fabrication d'objets de longueur définie, c.-à-d. d'objets séparés en incorporant des parties ou des couches préformées, p. ex. coulée autour d'inserts ou sur des objets à recouvrir
A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. R1, R2, and R3 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. Rf represents a fluorine atom or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. When a represents 2 or more, a plurality of R1 are the same or different, and a plurality of R2 are the same or different. M+ represents a monovalent cation.
A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. R1, R2, and R3 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. Rf represents a fluorine atom or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. When a represents 2 or more, a plurality of R1 are the same or different, and a plurality of R2 are the same or different. M+ represents a monovalent cation.
A radiation-sensitive composition includes: a first polymer comprising a structural unit (I) having an acid-dissociable group; a second polymer comprising a structural unit (i) represented by formula (f1); and a solvent. The acid-dissociable group has an iodo group. RK1 is a hydrogen atom, a fluorine atom, or the like; LY1 is a divalent hydrocarbon group having 1 to 10 carbon atoms; LY2 is —COO—* or —OCO—*, *is a bond on an Rf1 side; Rf1 is a monovalent hydrocarbon group having 1 to 10 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; Rf2 and Rf3 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; s is an integer of 0 to 3, and when Rf1 is the monovalent hydrocarbon group having 1 to 10 carbon atoms, s is an integer of 1 to 3.
A radiation-sensitive composition includes: a first polymer comprising a structural unit (I) having an acid-dissociable group; a second polymer comprising a structural unit (i) represented by formula (f1); and a solvent. The acid-dissociable group has an iodo group. RK1 is a hydrogen atom, a fluorine atom, or the like; LY1 is a divalent hydrocarbon group having 1 to 10 carbon atoms; LY2 is —COO—* or —OCO—*, *is a bond on an Rf1 side; Rf1 is a monovalent hydrocarbon group having 1 to 10 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; Rf2 and Rf3 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; s is an integer of 0 to 3, and when Rf1 is the monovalent hydrocarbon group having 1 to 10 carbon atoms, s is an integer of 1 to 3.
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C08L 25/18 - Homopolymères ou copolymères de monomères aromatiques contenant des éléments autres que le carbone et l'hydrogène
C08L 33/06 - Homopolymères ou copolymères des esters d'esters ne contenant que du carbone, de l'hydrogène et de l'oxygène, l'oxygène, faisant uniquement partie du radical carboxyle
C08L 33/16 - Homopolymères ou copolymères d'esters contenant des atomes d'halogène
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
An inorganic foam comprising an inorganic polymer having leucite crystal structure as a base material, the area of the peak derived from leucite crystal in the X-ray diffraction spectrum of the inorganic foam satisfies the following formula (1): D(geo)/D(pur)≥0.5 (1). In formula (1), D(geo) represents the area of the peak located at 2θ=27.3° derived from leucite crystal in the X-ray diffraction spectrum of the inorganic foam, and D(pur) represents the area of the peak located at 2θ=27.3° derived from leucite crystal in the X-ray diffraction spectrum of leucite pure material.
C04B 38/10 - Mortiers, béton, pierre artificielle ou articles de céramiques poreuxLeur préparation en utilisant des agents moussants
C04B 35/18 - Produits céramiques mis en forme, caractérisés par leur compositionCompositions céramiquesTraitement de poudres de composés inorganiques préalablement à la fabrication de produits céramiques à base d'oxydes à base de silicates autres que l'argile riches en oxyde d'aluminium
NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM (Japon)
JSR CORPORATION (Japon)
Inventeur(s)
Sato, Kazuhide
Shimada, Mibuko
Abrégé
This complex for use in tumor chemodynamic therapy comprises: nanoparticles that enclose iron oxide and include a hydrophilic polymer in a surface layer thereof; and target recognition molecules that bind to the nanoparticles and can bind to target molecules of the tumor cells.
A61K 39/395 - AnticorpsImmunoglobulinesImmunsérum, p. ex. sérum antilymphocitaire
A61K 47/36 - PolysaccharidesLeurs dérivés, p. ex. gommes, amidon, alginate, dextrine, acide hyaluronique, chitosane, inuline, agar-agar ou pectine
A61K 47/68 - Préparations médicinales caractérisées par les ingrédients non actifs utilisés, p. ex. les supports ou les additifs inertesAgents de ciblage ou de modification chimiquement liés à l’ingrédient actif l’ingrédient non actif étant chimiquement lié à l’ingrédient actif, p. ex. conjugués polymère-médicament l’ingrédient non actif étant un agent de modification l’agent de modification étant un anticorps, une immunoglobuline ou son fragment, p. ex. un fragment Fc
A61K 49/18 - Préparations de contraste pour la résonance magnétique nucléaire [RMN]Préparations de contraste pour l'imagerie par résonance magnétique [IRM] caractérisées par un aspect physique particulier, p. ex. émulsions, microcapsules, liposomes
A radiation-sensitive composition contains: (A) a polymer, and (B) a radiation-sensitive acid-generator formed of an onium cation and an organic anion having 4 or more iodine atoms, the onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excluding a fluoro group in the fluoroalkyl group).
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
95.
METHOD FOR PRODUCING ABRASIVE GRAINS, COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, AND POLISHING METHOD
The present invention provides: a composition for chemical mechanical polishing, a polishing method which uses this composition for chemical mechanical polishing, and a method for producing abrasive grains which are used therein. The present invention also provides: a composition for chemical mechanical polishing, the composition being capable of polishing a silicon oxide film at a high polishing rate, while having excellent storage stability; a polishing method which uses this composition for chemical mechanical polishing; and a method for producing abrasive grains which are used therein. A method for producing abrasive grains according to the present invention comprises a step in which particles each having a surface to which a hydroxyl group (—OH) is immobilized via a covalent bond, an alkoxysilane having an epoxy group, and a basic compound are mixed and heated.
The present invention provides: a composition and a food/beverage item which can promote the elongation of pili of an intestinal bacterium and exhibits an anti-bacterial activity; and a method for assisting the examination and diagnosis of a disease caused by a pathogenic bacterium or a pathogenic fungus. The present invention provides a composition containing a bacterium capable of producing 3-phenylpropionic acid (PPA) or 3-(4-hydroxyphenyl)propionic acid (4OHPPA). The present invention also provides a food/beverage item containing PPA or 4OHPPA. The present invention further provides a method for assisting the examination and diagnosis of a disease caused by a pathogenic bacterium or a pathogenic fungus. The method comprises: quantifying the amount of PPA or the amount of 4OHPPA in feces from a subject by using 2-nitrophenylhydrazine; and comparing a value obtained by the quantification of the amount of PPA or the amount of 4OHPPA with a reference value. When the value obtained by the quantification of the amount of PPA or the amount of 4OHPPA is smaller than the reference value, it is determined that the subject is possibly affected by the disease.
C12Q 1/68 - Procédés de mesure ou de test faisant intervenir des enzymes, des acides nucléiques ou des micro-organismesCompositions à cet effetProcédés pour préparer ces compositions faisant intervenir des acides nucléiques
G01N 33/50 - Analyse chimique de matériau biologique, p. ex. de sang ou d'urineTest par des méthodes faisant intervenir la formation de liaisons biospécifiques par ligandsTest immunologique
97.
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE
A photosensitive resin composition includes a polymer (A), a photoacid generator (B), and an organic solvent (C). The polymer (A) includes: a structural unit having a phenolic hydroxy group; and a (meth)acrylate-derived structural unit having an acid-dissociable group. The organic solvent (C) includes 3-ethoxyethyl propionate. A solid content concentration of the photosensitive resin composition is 30 mass % or more.
C08K 5/45 - Composés hétérocycliques comportant du soufre dans le cycle
C09D 133/06 - Homopolymères ou copolymères d'esters d'esters ne contenant que du carbone, de l'hydrogène et de l'oxygène, l'atome d'oxygène faisant uniquement partie du radical carboxyle
C09D 161/18 - Polymères de condensation obtenus uniquement à partir d'aldéhydes ou de cétones avec des hydrocarbures aromatiques ou leurs dérivés halogénés
A radiation-sensitive composition contains: (A) a polymer including a structural unit (U) represented by the following formula (1); and (B) a radiation-sensitive acid-generator formed of an onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excepting a fluoro group in the fluoroalkyl group) and an organic anion having an iodine atom. In formula (1), R1 represents a hydrogen atom, a methyl group, or the like. X1 represents a single bond, an ether bond, an ester bond, or the like. Ar1 represents a cyclic group bound to X1 via an aromatic ring. A hydroxy group or group —ORY is bound to an atom adjacent to the atom bound to X1, among the atoms forming the aromatic group in Ar1. RY represents an acid-releasable group.
A radiation-sensitive composition contains: (A) a polymer including a structural unit (U) represented by the following formula (1); and (B) a radiation-sensitive acid-generator formed of an onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excepting a fluoro group in the fluoroalkyl group) and an organic anion having an iodine atom. In formula (1), R1 represents a hydrogen atom, a methyl group, or the like. X1 represents a single bond, an ether bond, an ester bond, or the like. Ar1 represents a cyclic group bound to X1 via an aromatic ring. A hydroxy group or group —ORY is bound to an atom adjacent to the atom bound to X1, among the atoms forming the aromatic group in Ar1. RY represents an acid-releasable group.
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
C08F 220/18 - Esters des alcools ou des phénols monohydriques des phénols ou des alcools contenant plusieurs atomes de carbone avec l'acide acrylique ou l'acide méthacrylique
C08F 220/28 - Esters contenant de l'oxygène en plus de l'oxygène de la fonction carboxyle ne contenant pas de cycles aromatiques dans la partie alcool
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
G03F 7/038 - Composés macromoléculaires rendus insolubles ou sélectivement mouillables
99.
INFORMATION PROCESSING SYSTEM, PROGRAM, AND INFORMATION PROCESSING METHOD
NATIONAL CEREBRAL AND CARDIOVASCULAR CENTER (Japon)
Inventeur(s)
Takahashi, Shouadnas
Sawada, Katsutoshi
Fujioka, Masayasu
Kobayashi, Nobutoshi
Nakaoka, Yoshikazu
Asano, Ryotaro
Moriuchi, Kenji
Abrégé
An information processing system (1) according to an embodiment comprises a determination unit (102) that inputs pulse information relating to the heartbeat of a subject and attribute information pertaining to the subject to a trained model and thereby generates a determination result indicating the presence/absence and the degree of heart disease in the subject. The trained model is trained using, for a plurality of providers who provide training data, pulse information relating to the heartbeat of the provider, attribute information pertaining to the provider, and diagnosis information indicating the state of cardiac function of the provider.
A61B 5/352 - Détection des crêtes de l'onde R, p. ex. pour la synchronisation d'appareils de diagnosticEstimation de l’intervalle entre crêtes R
G16H 50/20 - TIC spécialement adaptées au diagnostic médical, à la simulation médicale ou à l’extraction de données médicalesTIC spécialement adaptées à la détection, au suivi ou à la modélisation d’épidémies ou de pandémies pour le diagnostic assisté par ordinateur, p. ex. basé sur des systèmes experts médicaux
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
Produits et services
Chemicals for use in industry; industrial chemicals for use
in the manufacture of semiconductors; photoresists; chemical
compositions for developing photographs; chemical
preparations for use in photography; photographic
sensitizers; photographic developers.
