The present invention refers to a proximity sensor for electron backscatter diffraction (EBSD) systems, particularly, a proximity sensor for collision avoidance between an EBSD sensor of an EBSD system and a stage of a scanning electron microscope (SEM) equipped with the EBSD system, and a corresponding method for proximity monitoring. The proximity sensor comprises emitter(s) to provide a light beam or light curtain which is basically directed parallel to an active area of the EBSD sensor and transmitted across the active area of the EBSD sensor at a distance selected as an alerting distance for the proximity sensor during collision monitoring; and receiver(s) located opposite to the emitter with respect to the active area of the EBSD sensor, configured to detect the light beam or light curtain and to provide a signal corresponding to the intensity of the light beam or light curtain for collision monitoring.
G01N 23/20058 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffraction des électrons, p.ex.la diffraction d’électrons lents [LEED] ou la diffraction d’électrons de haute énergie en incidence rasante [RHEED]
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
G01V 8/10 - Détection, p.ex. en utilisant des barrières de lumière
2.
HYBRID INTEGRATED SILICON DRIFT DETECTOR AND METHOD FOR FABRICATION THEREOF
The present invention refers to a hybrid integrated silicon drift detector (HiSDD) for X-ray detection, particularly to a HiSDD combining a silicon drift detector (SDD) with a low-noise preamplifier on a SDD sensor chip to improve the electrical and structural properties of the detector assembly. The invention further refers to a corresponding method for the fabrication of a HiSDD. A HiSDD according to the invention hybridly integrates a silicon drift detector, SDD, sensor chip and a preamplifier module; wherein electrically conductive paths are formed on a surface of the SDD sensor chip, having first ends configured for flip chip bonding and second ends configured for wire bonding; wherein the preamplifier module having contacts disposed on a surface of the preamplifier module, and wherein the first ends of the electrically conductive paths are flip chip bonded to the contacts of the preamplifier module.
09 - Appareils et instruments scientifiques et électriques
Produits et services
Software for operating probe-based instruments in the fields
of industrial production and scientific research; Hardware
for facilitating a mode of operation sold as an integral
part of probe-based instruments, namely scanning probe
microscopes and atomic force microscopes.
4.
INSPECTION APPARATUS AND METHOD FOR INSPECTING A COMPONENT
An apparatus and method for an inspection apparatus for inspecting a component. The inspection apparatus including a robotic arm. A micro-XRF instrument having an instrument head coupled to the robotic arm. A seat supporting the component within a scanning area during inspection; and a computer in communication with the robotic arm and the micro-XRF instrument.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 35/00 - Analyse automatique non limitée à des procédés ou à des matériaux spécifiés dans un seul des groupes ; Manipulation de matériaux à cet effet
The present invention refers to a detector and a method for obtaining Kikuchi images by using electron backscatter diffraction (EBSD) or transmission Kikuchi diffraction (TKD) technique. In particular, the present invention refers to a detector comprising a detector body, a detector head with a scintillation screen and a photodetector with a active surface for detecting Kikuchi patterns, and means configured to move the detector head with respect to the detector body. The method comprises obtaining a first and a second Kikuchi pattern, and moving the detector head after obtaining the first Kikuchi pattern and prior obtaining the second Kikuchi pattern.
H01J 37/244 - Détecteurs; Composants ou circuits associés
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
H01J 37/28 - Microscopes électroniques ou ioniques; Tubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
System, method and computer program product for determining mass fractions of one or more elements in a test sample based on a measurement with a wave-length dispersive x-ray fluorescence (WDX) spectrometer measuring gross intensities associated with respective elements with to-be-determined mass fractions (MFi) in the test sample. A mass fraction module determines mass fractions (MFi) by using a calibration equation (CE1) with the respective measured gross intensity and a respective calculated scattering efficiency as inputs. The calibration equation (CE1) associates net intensities of characteristic fluorescence lines of the sample elements with respective mass fractions. The net intensity for a particular peak is obtained by subtracting a respective calculated scattering efficiency times a scaling factor from the calibration equation (CE1) from the measured gross intensity of the particular peak. The elemental composition of the test sample is determined either via an iteration module or via an EDX quantification module.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/2202 - Préparation d’échantillons à cet effet
7.
METHOD FOR DETERMINING AN ELEMENT CONCENTRATION OF AN EDS/WDS SPECTRUM OF AN UNKNOWN SAMPLE AND A CORRESPONDING DEVICE
The present invention discloses method and device for determining an element concentration of an EDS/WDS spectrum of an unknown sample. The method comprises performing a preliminary quantification of the EDS/WDS spectrum of the unknown sample and identify a plurality of elements in the unknown sample; identify at least one pre-stored standard sample including the plurality of elements; determine, for each element of the plurality of elements, a similarity score for the corresponding element in each identified standard sample; select, for each element of the plurality of elements, the one standard sample among the at least one standard sample by using the determined similarity score and identify the concentration of the corresponding element in the selected standard sample; and perform quantification of the EDS/WDS spectrum of the unknown sample by using, for each element of the plurality of elements, the identified concentration of the respectively selected standard sample.
G01N 23/2209 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant la spectroscopie dispersive en longueur d’onde [WDS]
09 - Appareils et instruments scientifiques et électriques
Produits et services
Software for operating probe-based instruments in the fields of industrial production and scientific research; Hardware for facilitating a mode of operation sold as an integral part of probe-based instruments, namely Scanning probe microscopes and Atomic force microscopes.
9.
System and method for improved measurement of peak intensities in pulse height spectra obtained by wave-length dispersive x-ray fluorescence spectrometers
Techniques for estimating peak intensities in pulse height spectra obtained by a wave-length dispersive x-ray fluorescence spectrometer are disclosed. A pulse height spectrum is obtained from a sample. A model generator generates a pulse height spectrum model by creating a plurality of diffraction order profiles with predefined profile shapes at photon energy positions corresponding to respective diffraction orders of a monochromator of a spectrometer. For each created diffraction order profile where the corresponding photon energy is higher than the edge energy of the detector material of the detector, a respective escape profile is added. A model adjustment module adjusts pulse-height-to-energy-mapping parameters and contribution area of each diffraction order profile ensemble of the pulse height spectrum model using a fitting algorithm. An intensity module provides the contribution area of the first order profile ensemble as the intensity of the energy to be determined by the wavelength-dispersive X-ray fluorescence spectrometer.
A closure device for the gas-tight closing of the input opening of a sample chamber of an x-ray analysis apparatus includes a slider having a closure plate and a carriage that is configured to be displaced in a lateral movement over the input opening on a linear guide arranged on a baseplate connected fixedly to the sample chamber. The closure plate is connected in an articulated manner to the carriage via deflecting elements that, upon butting against end stops connected rigidly to the baseplate, deflect the lateral movement of the carriage into a movement perpendicular thereto to press the closure plate over the input opening. A drive motor connected to the carriage via a drive means displaces the slider to provide the lateral movement on the linear guide.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/2204 - Supports d’échantillons à cet effet; Moyens de transport des échantillons à cet effet
11.
HYBRID INTEGRATED SILICON DRIFT DETECTOR AND METHOD FOR FABRICATION THEREOF
The present invention refers to a hybrid integrated silicon drift detector (HiSDD) for X-ray detection, particularly to a HiSDD combining a silicon drift detector (SDD) with a low-noise preamplifier on a SDD sensor chip to improve the electrical and structural properties of the detector assembly. The invention further refers to a corresponding method for the fabrication of a HiSDD. A HiSDD according to the invention hybridly integrates a silicon drift detector, SDD, sensor chip (100) and a preamplifier module (200); wherein electrically conductive paths (32) are formed on a surface of the SDD sensor chip (100), having first ends configured for flip chip bonding and second ends configured for wire bonding; wherein the preamplifier module (200) having contacts disposed on a surface of the preamplifier module (200), and wherein the first ends of the electrically conductive paths (32) are flip chip bonded to the contacts of the preamplifier module (200).
G01T 1/17 - Dispositions de circuits non adaptés à un type particulier de détecteur
G01T 1/29 - Mesure effectuée sur des faisceaux de radiations, p.ex. sur la position ou la section du faisceau; Mesure de la distribution spatiale de radiations
12.
Method of determining the three-dimensional structure of molecules in crystalline inclusion complexes
The invention is directed to a method for elucidating the three-dimensional structure of compounds by X-ray diffraction (X-ray SCD) characterized in that the compound is co-analyte crystallized with tetraaryladamantanes according to general formula I Wherein R and R′ are identical or different residues selected from the group consisting of O—R1, S—R1, NHR1, NR1R2, F, Cl, Br or I and R1, R2 stand for identical or different, substituted on not substituted aliphatic or aromatic residues having 1 to 25 carbon atoms and the the three-dimensional structure of the compound is obtained by X-ray diffraction (X-ray SCD).
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
C30B 7/06 - Croissance des monocristaux à partir de solutions en utilisant des solvants liquides à la température ordinaire, p.ex. à partir de solutions aqueuses par évaporation du solvant en utilisant des solvants non aqueux
A collimator assembly for an x-ray optical system having a Soller slit for collimation of x-ray radiation with respect to a direction of an axis (z) of the Soller slit, wherein the Soller slit has a plurality of lamellae spaced apart from one another and having lamella planes parallel to one another, is characterized in that the Soller slit comprises a plurality of segments which are arranged along the axis and are separated from one another. The arrangement also has a collimator frame for enclosing and guiding the plurality of segments, and at least one of the plurality of segments is displaceable with respect to the collimator frame and relative to other segments. A simple but nonetheless accurate adjustment of the spectral resolution of an x-ray spectrometer to a respective different analytical application is thus enabled in a compact and cost-effective manner.
G21K 1/04 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant des diaphragmes, des collimateurs utilisant des diaphragmes à ouverture variable, des obturateurs, des hacheurs
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G21K 1/02 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant des diaphragmes, des collimateurs
14.
Arrangement Having a Measuring Apparatus for a Scanning Probe Microscope, Scanning Probe Microscope, and Method for Operating
The invention relates to an arrangement having a measuring apparatus for a scanning probe microscope, comprising: a sample receptacle, which is designed to receive a measurement sample for an examination by scanning probe microscopy; a measuring probe, which is received on a probe holder; a relocating device, which has a drive and is designed to relocate the sample receptacle and the probe holder having the measuring probe relative to each another by means of the drive for the examination by scanning probe microscopy; and an active counterweight device having a counterweight and a drive device associated with the counterweight, the active counterweight device being designed to move the counterweight during the measuring operation by means of the drive device, counter to the movement of the probe holder having the measuring probe. The invention furthermore relates to a method for operating the arrangement.
09 - Appareils et instruments scientifiques et électriques
Produits et services
Software for operating probe-based instruments in the fields
of manufacturing and scientific research; hardware for
facilitating a mode of operation sold as integral part of
probe-based instruments, namely scanning probe microscopes
and atomic force microscopes.
A method for improving the quality/integrity of an EBSD/TKD map, wherein each data point is assigned to a corresponding grid point of a sample grid and represents crystal information based on a Kikuchi pattern detected for the grid point; comprising determining a defective data point of the EBSD/TKD map and a plurality of non-defective neighboring data points, comparing the position of Kikuchi bands of a Kikuchi pattern detected for a grid point corresponding to the defective data point with the positions of bands in at least one simulated Kikuchi pattern corresponding to crystal information of the neighboring data points and assigning the defective data point the crystal information of one of the plurality of neighboring data point based on the comparison.
G01N 23/20008 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux - Détails de construction des appareils d’analyse, p.ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons X; Leurs accessoires; Préparation d’échantillons à cet effet
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/20025 - Porte-échantillons ou leurs supports
G01N 23/20058 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffraction des électrons, p.ex.la diffraction d’électrons lents [LEED] ou la diffraction d’électrons de haute énergie en incidence rasante [RHEED]
G01N 23/20091 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant le spectre de dispersion d’énergie [EDS] du rayonnement diffracté
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
G01N 23/205 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en utilisant des caméras de diffraction
G01N 23/2055 - Analyse des diagrammes de diffraction
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p.ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
G01N 23/2252 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p.ex. la microscopie électronique à balayage [SEM] en mesurant les rayons X émis, p.ex. microanalyse à sonde électronique [EPMA]
G01N 23/2254 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p.ex. la microscopie électronique à balayage [SEM] en mesurant la cathodoluminescence
G06V 10/48 - Extraction de caractéristiques d’images ou de vidéos en cartographiant les valeurs caractéristiques du motif en espace paramétrique, p.ex. transformation de Hough
A tool is provided for assembling a specimen carrier assembly in an electron imaging apparatus, the assembly comprising a specimen holder, an object grid containing a sample during measurement, and a C-shaped resilient fixing ring for removably fixing the object grid into a groove of the specimen holder. The tool comprises an elongate hollow handling device with a holding sleeve surrounding a cylindrical pin that is translatory movable within the holding sleeve in both directions between a first position in which the pin protrudes from the holding sleeve at its lower end and a second position in which the pin is retracted into the holding sleeve. The hollow handling device is configured such that the C-shaped fixing ring can be pushed into the specimen holder groove by moving the cylindrical pin into its first position. This allows the object grid to be conveniently and reliably fixed in the carrier assembly.
The present invention refers to a method of processing an energy-dispersive X-ray (EDX)/X-ray fluorescence (XRF) map (1), comprising selecting a data point (dp) among a plurality of data points of the EDX/XRF map (1), wherein each of the data points comprise a local measured value (m) and a local dispersion value (v) of a measured variable; determine a first modified mean value (M[1]) based on the local measured value (m) of the selected data point (dp) and the local measured value of at least one neighboring data point neighboring the selected data point (dp) and determine a first modified dispersion value (V[1]) based on the local dispersion value (v) of the selected data point (dp) and the dispersion value of the at least one neighboring data point, when mTH[1].
e) have an equal distance R0 from the sample position (3). The measuring arrangement according to the invention can be implemented having flat detector modules, in particular semiconductor detector modules, and is less susceptible to measurement errors.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
20.
GRAPHENE ENCAPSULATION OF BIOLOGICAL MOLECULES FOR SINGLE MOLECULE IMAGING
In a method of preparing a single molecule sample of a biological material for use in an imaging experiment, the single molecule sample is deposited on a graphene substrate using a method such as nanopipetting. Excess bulk fluid surrounding the molecule is then removed, for example, by mechanical blotting or controlled evaporation. An enclosing layer of graphene is then deposited and sealed to the graphene substrate so as to encapsulate the molecule. This sealing may include floating the enclosing layer in a water bath and moving it into contact with the graphene substrate. The molecule of interest may be deposited directly on the substrate, or a linker molecule may be first deposited to provide an attachment between the substrate and the molecule of interest.
09 - Appareils et instruments scientifiques et électriques
Produits et services
microscopes, namely, measuring, imaging, and scanning probe microscopes; recorded and downloadable software for operating microscopes; atomic force microscopes
09 - Appareils et instruments scientifiques et électriques
Produits et services
Software for operating probe-based instruments in the fields of manufacturing and scientific research; hardware for facilitating a mode of operation sold as integral part of probe-based instruments, namely scanning probe microscopes and atomic force microscopes.
23.
Detector, methods for operating a detector and detector pixel circuit
A pixelated sensor comprises a semiconductor substrate chip with a plurality of sensor pixels and a detector chip with a plurality of detector pixels. Each of the sensor pixels is configured as a photodiode and is electrically connected to an input node of one of the detector pixels. The detector pixels are further configured to convert and output the sensor input to an analog to digital converter. The detector chip further comprises first and second macropixels and a plurality of second macropixels, wherein each first macropixel is formed by subset of detector pixels switchably interconnected via a first conducting grid and wherein each second macropixel is formed by a subset of first macropixels switchably interconnected via a second conducting grid.
G01J 1/46 - Circuits électriques utilisant une capacité
H04N 25/42 - Extraction de données de pixels provenant d'un capteur d'images en agissant sur les circuits de balayage, p.ex. en modifiant le nombre de pixels ayant été échantillonnés ou à échantillonner en commutant entre différents modes de fonctionnement utilisant des résolutions ou des formats d'images différents, p.ex. entre un mode d'images fixes et un mode d'images vidéo ou entre un mode entrelacé et un mode non entrelacé
H04N 25/75 - Circuits pour fournir, modifier ou traiter des signaux d'image provenant de la matrice de pixels
An X-ray laser has a target anode of a crystalline material that emits X-ray radiation in response to excitation and that is located on a thermally conductive substrate. An X-ray source provides an input X-ray beam that illuminates a predetermined volume of the target anode at a predefined angle relative to a surface of the anode so as to induce a Borrmann mode standing wave in the predetermined volume. An electron source outputs an electron beam that is incident on the Borrmann mode region so as to cause electron impact ionization of the crystalline material and thereby induce stimulated emission of a coherent output X-ray beam.
H01S 4/00 - Dispositifs utilisant l’émission stimulée de rayonnement électromagnétique dans des gammes d’ondes autres que celles couvertes par les groupes , ou , p.ex. masers à phonon, lasers à rayons X ou lasers gamma
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
25.
Compensating control signal for raster scan of a scanning probe microscope
The invention relates to a measuring device for a scanning probe microscope that includes a sample receptacle which is configured to receive a measurement sample to be examined, a measuring probe which is arranged on a probe holder and has a probe tip with which the measurement sample can be measured. A displacement device is configured to move the measuring probe and the sample receptacle relative to each other, in order to measure the measurement sample, such that the measuring probe, in order to measure the measurement sample, executes a raster movement relative to said measurement sample in at least one spatial direction. Movement measurement signals indicating a first movement component in a first spatial direction that disrupts the raster movement and a second movement component in a second spatial direction that disrupts the raster movement, which second spatial direction extends transversely to the first spatial direction. Compensating control signal components cause a first countermovement which substantially compensates for the first disruptive movement component in the first spatial direction, and/or cause a second countermovement which substantially compensates for the second disruptive movement component in the second spatial direction.
D=γ*C+(1−γ)*D wherein
Z. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.
H01J 37/244 - Détecteurs; Composants ou circuits associés
H01J 37/20 - Moyens de support ou de mise en position de l'objet ou du matériau; Moyens de réglage de diaphragmes ou de lentilles associées au support
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
27.
Stimulated X-ray emission source with crystalline resonance cavity
An X-ray laser has a target anode of a crystalline material that emits X-ray radiation in response to excitation and that is located on a thermally conductive substrate. An X-ray source provides an input X-ray beam that illuminates a predetermined volume of the target anode at a predefined angle relative to a surface of the anode so as to induce a Borrmann mode standing wave in the predetermined volume. An electron source outputs an electron beam that is incident on the Borrmann mode region so as to cause electron impact ionization of the crystalline material and thereby induce stimulated emission of a coherent output X-ray beam.
H01S 3/30 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet utilisant des effets de diffusion, p.ex. l'effet Brillouin ou Raman stimulé
H01S 4/00 - Dispositifs utilisant l’émission stimulée de rayonnement électromagnétique dans des gammes d’ondes autres que celles couvertes par les groupes , ou , p.ex. masers à phonon, lasers à rayons X ou lasers gamma
H01S 3/0959 - Procédés ou appareils pour l'excitation, p.ex. pompage utilisant le pompage par des particules de haute énergie par un faisceau d'électrons
A method comprises the steps of: (a) Obtaining a measured X-ray spectrum for the coated sample, for determining characteristics for the sample and for a coating material; (b) Determining a simulated X-ray spectrum for the sample based on an initial sample composition; (c) Determining an adapted sample composition that improves a match between the characteristics of the sample and an adapted simulated X ray spectrum; (d) Determining an adapted coating thickness for the coating material based on the adapted sample composition and characteristics of the coating; and (e) Repeating the steps (b) to (d) using the adapted sample composition and the adapted coating thickness of the coating material instead of the initial values, wherein the coating thickness is used for determining an absorption of X-rays.
G01N 23/2252 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p.ex. la microscopie électronique à balayage [SEM] en mesurant les rayons X émis, p.ex. microanalyse à sonde électronique [EPMA]
G01B 15/02 - Dispositions pour la mesure caractérisées par l'utilisation d'ondes électromagnétiques ou de radiations de particules, p.ex. par l'utilisation de micro-ondes, de rayons X, de rayons gamma ou d'électrons pour mesurer l'épaisseur
A detector for Kikuchi diffraction comprising a detector body and a detector head mountable to each other. The detector body comprises a body part which is enclosing a photodetector configured for detecting incident radiation and further comprises a vacuum window arranged upstream the photodetector with respect to a propagation direction of the incident radiation, a first body mounting portion configured to be mounted to a SEM chamber port and a second body mounting portion. The detector head comprises a scintillation screen and a head mounting portion configured to be mounted to the second body mounting portion.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01T 1/20 - Mesure de l'intensité de radiation avec des détecteurs à scintillation
H01J 37/244 - Détecteurs; Composants ou circuits associés
H01J 37/28 - Microscopes électroniques ou ioniques; Tubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
30.
MEASURING ARRANGEMENT FOR X-RAY RADIATION HAVING REDUCED PARALLAX EFFECTS
A measuring arrangement (20) for x-ray radiation, comprising - a sample position (3), which can be illuminated by x-ray radiation (2) and - an x-ray detector (13) for detecting x-ray radiation emitted from the sample position (3), comprising at least one detector module (21-24), wherein the detector module (21-24) has a plurality of sensor elements (14; 14a-14e) arranged successively in a measuring direction (MR), each sensor element having a centroid (18), wherein the sensor elements (14; 14a-14e) are arranged in a common sensor plane (16) of the detector module (21-24), is characterized in that at least a majority of the sensor elements (14; 14a-14e) of the detector module (21-24), preferably all the sensor elements (14; 14a-14e) of the detector module (21-24), are designed as uniformly spaced sensor elements (14; 14a-14e), wherein the centroids (18) of the sensor elements (14; 14a-14e) have an equal distance R0 from the sample position (3). The measuring arrangement according to the invention can be implemented having flat detector modules, in particular semiconductor detector modules, and is less susceptible to measurement errors.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
A beamstop arrangement for an x-ray-optical system is adjustable in an xy plane perpendicular to a z-direction for optimizing a ratio of useful radiation reaching a surface to interfering radiation of an x-ray beam in the z-direction. The beamstop arrangement comprises a plurality of beamstops of differing size and/or geometry arranged on an exchanging mount, which is installed on a carriage displaceable in the xy plane by means of a drive unit having at least one positioning motor. The multiple beamstops can be located in a vacuum, while the drive motors and all electronic components can be positioned outside the vacuum, so that no heat development takes place in the measurement region. Corruption of the measurement result due to a changed measurement background is thus avoided.
G01N 23/201 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffusion sous un petit angle, p.ex. la diffusion des rayons X sous un petit angle [SAXS]
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G21K 1/10 - Dispositifs de diffusion; Dispositifs d'absorption
G01N 23/20008 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux - Détails de construction des appareils d’analyse, p.ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons X; Leurs accessoires; Préparation d’échantillons à cet effet
32.
Measuring device for a scanning probe microscope and method for scanning probe microscopy of a measurement sample by means of a scanning probe microscope
A measuring device for a scanning probe microscope including a sample receptacle configured to receive a sample; a measuring probe which is arranged on a probe holder and has a probe tip; a displacement device which moves the measuring probe and the sample receptacle relative to each other; a control device which is connected to the displacement device and controls the relative movement between the measuring probe and the sample receptacle; and a sensor device which is configured to detect, movement measurement signals during an absolute measurement for a movement of the measuring probe and/or a movement of the sample receptacle. The movement measurement signals are relayed to the control device. The control device is configured to control the relative movement. The invention also provides a scanning probe microscope, as well as a method for examining a sample.
The invention relates to an arrangement having a measuring apparatus (20) for a scanning probe microscope, comprising: a sample receptacle (26), which is designed to receive a measurement sample (27) for an examination by scanning probe microscopy; a measuring probe (23), which is received on a probe holder (21); a relocating device, which has a drive (24; 25) and is designed to relocate the sample receptacle (26) and the probe holder (21) having the measuring probe (23) relative to each other by means of the drive (24; 25) for the examination by scanning probe microscopy; and an active counterweight device (30) having a counterweight (32) and a drive device (31) associated with the counterweight (32), the active counterweight device (30) being designed to move the counterweight (32) during measuring operation by means of the drive device (31), counter to the movement of the probe holder (21) having the measuring probe (23). The invention furthermore relates to a method for operating the arrangement.
The present invention refers to a method for improving the quality/integrity of an EBSD/TKD map (30) that is comprising a plurality of data points (31, 32), wherein each data point (31, 32) is assigned to a corresponding grid point of a sample grid and represents crystal information based on a Kikuchi pattern (20) detected for the grid point. The method of the invention comprises the steps of: determining a defective data point (31) of the EBSD/TKD map (30) and a plurality of non-defective neighboring data points (32, 33) of the defective data point (31), comparing the position of Kikuchi bands (21) of a Kikuchi pattern (20) detected for a grid point corresponding to the defective data point (31) with the positions of bands in at least one simulated Kikuchi pattern corresponding to crystal information of the neighboring data points (32, 33), and assigning the defective data point (31) the crystal information of one of the plurality of neighboring data point (32, 33) based on the comparison. The invention further relates to a method for determining a sample structure and a measurement system.
G01N 23/20058 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffraction des électrons, p.ex.la diffraction d’électrons lents [LEED] ou la diffraction d’électrons de haute énergie en incidence rasante [RHEED]
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
G01N 23/20091 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant le spectre de dispersion d’énergie [EDS] du rayonnement diffracté
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p.ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
G01N 23/2252 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p.ex. la microscopie électronique à balayage [SEM] en mesurant les rayons X émis, p.ex. microanalyse à sonde électronique [EPMA]
35.
A SYSTEM AND METHOD FOR DIFFRACTION-BASED STRUCTURE DETERMINATION WITH SIMULTANEOUS PROCESSING MODULES
A diffraction system for determining a crystalline structure of a sample collects a series of diffraction frames from a crystal sample illuminated by a beam of photonic or particulate radiation, such as X-rays. A plurality of software modules for processing the detected diffraction frames perform different tasks in refining the collected diffraction data, such as harvesting, indexing, scaling, integration, and structure determination. Output parameters from certain modules are used as input parameters in others, and are exchanged between the modules as they become available. The modules operate simultaneously, and generate successive versions of output parameters as corresponding input parameters are changed until a final result is achieved. This provides a system of structure determination that is fast and efficient.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/2055 - Analyse des diagrammes de diffraction
G06F 9/00 - Dispositions pour la commande par programme, p.ex. unités de commande
G05B 13/00 - Systèmes de commande adaptatifs, c. à d. systèmes se réglant eux-mêmes automatiquement pour obtenir un rendement optimal suivant un critère prédéterminé
G06F 13/00 - Interconnexion ou transfert d'information ou d'autres signaux entre mémoires, dispositifs d'entrée/sortie ou unités de traitement
36.
MEASUREMENT ARRANGEMENT FOR X-RAY RADIATION FOR GAP-FREE 1D MEASUREMENT
The present invention relates to an x-ray detector (21) having a plurality of detector modules (1, 1a-1g), each comprising dead zones (6) without x-ray sensitivity and active zones (3, 3a-3c) having x-ray sensitivity, which is spatially resolved in a measurement direction (MR), wherein the detector modules (1, 1a-1g) are designed to be successive and overlapping along the measurement direction (MR), such that, in overlapping regions (23a-23e), the dead zone (6) of a detector module (1, 1a-1g) is bridged by an active zone (3, 3a-3c) of another detector module (1, 1a-1g). The overlapping detector modules (1, 1a-1g) are arranged adjacent to one another in the transverse direction (QR) in the overlapping regions (23a-23e), wherein the transverse direction (QR) extends crosswise to the local measurement direction (MR) and crosswise to a local connection direction (VR) to a sample position (91). A gapless, one-dimensional piece of measurement information, particularly x-ray diffraction information, can be easily obtained by the x-ray detector (21) from a measurement sample (96) at the sample position (91).
G01N 23/20008 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux - Détails de construction des appareils d’analyse, p.ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons X; Leurs accessoires; Préparation d’échantillons à cet effet
37.
GRAPHENE ENCAPSULATION OF BIOLOGICAL MOLECULES FOR SINGLE MOLECULE IMAGING
In a method of preparing a single molecule sample of a biological material for use in an imaging experiment, the single molecule sample is deposited on a graphene substrate using a method such as nanopipetting. Excess bulk fluid surrounding the molecule is then removed, for example, by mechanical blotting or controlled evaporation. An enclosing layer of graphene is then deposited and sealed to the graphene substrate so as to encapsulate the molecule. This sealing may include floating the enclosing layer in a water bath and moving it into contact with the graphene substrate. The molecule of interest may be deposited directly on the substrate, or a linker molecule may be first deposited to provide an attachment between the substrate and the molecule of interest.
An electron diffraction imaging system for imaging the three-dimensional structure of a single target molecule of a sample uses an electron source that emits a beam of electrons toward the sample, and a two-dimensional detector that detects electrons diffracted by the sample and generates an output indicative of their spatial distribution. A sample support is transparent to electrons in a region in which the sample is located, and is rotatable and translatable in at least two perpendicular directions. The electron beam has an operating energy between 5 keV and 30 keV, and beam optics block highly divergent electrons to limit the beam diameter to no more than three times the size of the sample molecule and provide a lateral coherence length of at least 15 nm. An adjustment system adjusts the sample support position in response to the detector output to center the target molecule in the beam.
G01N 23/20058 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffraction des électrons, p.ex.la diffraction d’électrons lents [LEED] ou la diffraction d’électrons de haute énergie en incidence rasante [RHEED]
G01N 23/20008 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux - Détails de construction des appareils d’analyse, p.ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons X; Leurs accessoires; Préparation d’échantillons à cet effet
39.
Electron diffraction imaging system for determining molecular structure and conformation
An electron diffraction imaging system for imaging the three-dimensional structure of a single target molecule of a sample uses an electron source that emits a beam of electrons toward the sample, and a two-dimensional detector that detects electrons diffracted by the sample and generates an output indicative of their spatial distribution. A sample support is transparent to electrons in a region in which the sample is located, and is rotatable and translatable in at least two perpendicular directions. The electron beam has an operating energy between 5 keV and 30 keV, and beam optics block highly divergent electrons to limit the beam diameter to no more than three times the size of the sample molecule and provide a lateral coherence length of at least 15 nm. An adjustment system adjusts the sample support position in response to the detector output to center the target molecule in the beam.
The present invention refers to an apparatus (100) and a method for detecting characteristics of a probe. In an embodiment, the apparatus (100) comprises a vacuum chamber (104) and a beam generator (102) adapted to generate a beam of charged particles within the vacuum chamber (104). When the beam of charged particles falls onto the probe, interaction particles and/or interaction radiation are generated. The apparatus (100) further comprises an electromechanical unit (114) within the vacuum chamber (104) and a detector (110) comprising a plurality of detection units and being arranged on the electromechanical unit (114) allowing for the detector (110) to move from a first position (302) with respect to the beam generator (102) to a second position (304) with respect to the beam generator (102) and vice versa, upon a corresponding actuation of the electromechanical unit (114) performable from outside of the vacuum chamber (104).
The present invention relates to a pixelated sensor (100)comprising a semiconductor substrate chip (10) with a plurality of sensor pixels (11) and a detector chip (20) with a plurality of detector pixels (21).Therein, each of the plurality of sensor pixels (11) is configured as a photodiode and is electrically connected to an input node (22) of one of the detector pixels (21). Each of the detector pixels (21) is configured to receive a sensor input from the connected sensor pixel (11), to convert the sensor input into a detector output and to output the detector output to an analog to digital converter (40). According to the invention, the detector chip (20) further comprises a plurality of macropixels (30), wherein each macropixel (30) isformed by a subset of detector pixels (21) that are interconnected by at least one conducting grid (50), whereineach detector pixel (21) of the subset isconfigured to be switchable connected to the at least one conducting grid (50).Theinvention further relates to adetector pixel circuit (70) for a detector chip (20) of a pixelated detector (100)of the invention and to methods for operating a pixelateddetector (100) according to the invention.
H04N 5/369 - Transformation d'informations lumineuses ou analogues en informations électriques utilisant des capteurs d'images à l'état solide [capteurs SSIS] circuits associés à cette dernière
G01T 1/29 - Mesure effectuée sur des faisceaux de radiations, p.ex. sur la position ou la section du faisceau; Mesure de la distribution spatiale de radiations
H04N 5/343 - Extraction de données de pixels provenant d'un capteur d'images en agissant sur les circuits de balayage, p.ex. en modifiant le nombre de pixels ayant été échantillonnés ou à échantillonner en commutant entre différents modes de fonctionnement utilisant des résolutions ou des formats d'images différents, p.ex. entre un mode d'images fixes et un mode d'images vidéo ou entre un mode entrelacé et un mode non entrelacé
H04N 5/378 - Circuits de lecture, p.ex. circuits d’échantillonnage double corrélé [CDS], amplificateurs de sortie ou convertisseurs A/N
A two-dimensional X-ray diffractometer uses an X-ray source that emits a divergent beam toward a sample under test. The divergent beam has a substantially fixed width in a first direction perpendicular to its propagation direction, and a thickness in a second direction perpendicular to the propagation direction that increases proportionally to a distance from the source. An aperture may be used to block a portion of the beam in the second direction, and the sample is positioned so that the beam illuminates a two-dimensional area of the sample surface. The detector detects an X-ray signal diffracted from the sample across a two-dimensional detection area, and may use a one-dimensional detector array that collects diffracted X-ray signal at a number of different positions. The source, detector and sample may be mounted to a goniometer to maintain them in a desired relative orientation.
G01N 23/00 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
X-ray spectrometer comprising an X-ray source emitting X-ray radiation onto a sample, a collimator arrangement for collimating X-ray radiation that has passed through a diaphragm arrangement, the collimator arrangement comprising a modified Soller slit with mutually parallel lamellae forming a plurality of slit-shaped passages, at least a portion of the slit-shaped passages having partition walls aligned substantially perpendicularly to the slit-shaped passages, the partition walls being non-transmissive to X-ray radiation and restricting the transverse divergence of the X-ray radiation passing through the collimator arrangement in a direction transversely with respect to the diffraction plane of the X-ray radiation coming from the sample. Significantly faster spatially resolved measurements can thus be carried out.
G01N 23/20091 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant le spectre de dispersion d’énergie [EDS] du rayonnement diffracté
G21K 1/02 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant des diaphragmes, des collimateurs
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
44.
Measuring device for a scanning probe microscope, scanning probe microscope and method for operating the scanning probe microscope
The invention relates to a measuring device for a scanning probe microscope including a measuring probe a first probe holding device on which the measuring probe is arranged, a detection device including a measurement light source which is adapted to provide light beams directed toward the measuring probe, a sensor device which is adapted, during the operation to receive measurement light beams reflected from the measuring probe. A first measuring arrangement in which the first probe holding device with the measuring probe is arranged in a first position spaced from the detection device, and a second measuring arrangement is formed in which a lengthening device is changeably arranged between the detection device and the measuring probe which lengthens the respective optical beam path for the light beams and the measurement light beams in such a manner that the first probe holding device or a second probe holding device which is different from the first probe holding device is arranged with the measuring probe at a second position spacing from the detection device which is greater than the first position spacing.
An X-ray source uses excitation of a liquid metal beam of ions or ionized droplets to produce an X-ray output with higher brightness than conventional sources. The beam may be accelerated from a liquid metal source using an extraction electrode. The source may have an emitter tip, and the acceleration of the liquid metal may include field emission from a Taylor cone. An electrostatic or electromagnetic focusing electrode may be used to reduce a cross-sectional diameter of the beam. The liquid metal beam has a relatively high velocity as it does not suffer from flow turbulence, thus allowing for a more energetic excitation and a correspondingly higher brightness. A beam dump may also be used to collect the liquid metal beam after excitation, and may be concave with no direct sight lines to either an electron beam cathode or to X-ray windows of an enclosure for the source.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
H01J 35/22 - Tubes conçus spécialement pour laisser passer un courant d'intensité très élevée pendant un intervalle de temps très court, p.ex. tube éclair
H05G 1/04 - Montage du tube à rayons X à l'intérieur d'une gaine fermée
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma
46.
Optical emission spectrometer with cascaded charge storage devices
An optical emission spectrometer has an excitation device for a sample to be examined, a dispersive element for spectrally decomposing light emitted by an excited sample, a multiplicity of photodiodes, which are arranged such that different spectral components of the emitted, decomposed light are detectable with different photodiodes, and a multiplicity of electronic readout systems for the photodiodes. A respective electronic readout system has a charge storage assembly comprising a plurality of individual charge storage devices, wherein the charge storage devices are interconnectable in cascading fashion, with the result that charges flowing in from an associated photodiode successively fill the charge storage devices. The respective electronic readout system can be used to read the charges of the individual charge storage devices of the charge storage assembly and/or the charges of subsets of the charge storage devices of the charge storage assembly.
The present invention relates to an X-ray fluorescence, XRF, spectrometer, for measuring X-ray fluorescence emitted by a target, wherein the XRF spectrometer comprises an X-ray tube with an anode to emit a divergent X-ray beam, a capillary lens that is configured to focus the divergent X-ray beam on the target, an aperture system that is positioned between the anode of the X-ray tube and the capillary lens and comprises at least one pinhole, and a detector that is configured for detecting X-ray fluorescence radiation emitted by the target, wherein the at least one pinhole is configured for being inserted into the divergent X-ray beam and for reducing a beam cross section of the divergent X-ray beam between the anode and the capillary lens. The present invention further relates to an aperture system for a spectrometer, to the use of an aperture system for adjusting the focal depth of a spectrometer and to a method for adjusting the focal depth of as spectrometer.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G21K 1/04 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant des diaphragmes, des collimateurs utilisant des diaphragmes à ouverture variable, des obturateurs, des hacheurs
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
48.
Analytical X-ray tube with high thermal performance
An analytical X-ray tube with an anode target material that emits characteristic X-rays in response to excitation by an electron beam may include any of several advantageous features. The target material is deposited on a diamond substrate layer, and a metal carbide intermediate layer may be provided between the target material and substrate that provides enhanced bonding therebetween. An interface layer may also be used that provides an acoustic impedance matching between the target material and the substrate. For a low thermal conductivity target material, a heat dissipation layer of a higher thermal conductivity material may also be included between the target material and substrate to enhance thermal transfer. The target material may have a thickness that corresponds to a maximum penetration depth of the electrons of the electron beam, and the structure may be such that a predetermined temperature range is maintained at the substrate interface.
An indirect, photon-counting X-ray detector capable of detecting the low-energy X-rays includes a scintillator screen that is directly coupled to a two-dimensional optical sensor. A signal filter receives an electrical output signal from the optical sensor and removes high intensity signal contributions therefrom that are indicative of direct interaction between said X-ray signal and said optical sensor. The scintillator screen has a sufficient thickness to ensure a high absorption of incident X-ray photons, and uses phosphor grains with a relatively small grain size. A cooling apparatus in thermal communication with the optical sensor may be used to control its temperature. The signal filter maintains a running average of changes in measured pixel output values for consecutive measurements, and replaces a measured value caused by a direct interaction event with a value equal to a previous measured value plus said running average.
3 is maintained at a constant tilt angle during the entire X-ray diffraction stress analysis, thereby avoiding the significant error associated to the movement of a cradle track of a goniometer used for the X-ray diffraction stress analysis and on which measurements at a low 2θ angle are highly sensitive.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/20025 - Porte-échantillons ou leurs supports
A method and apparatus for performing an X-ray diffraction measurement with a diffractometer having an X-ray beam directed at a sample and a two-dimensional X-ray detector includes the performance of a physical scan during which the detector is moved through a scanning range in an angular direction about the sample position. To provide a uniform exposure time, the detector, when located at an extreme of the scanning range, is controlled to progressively change the portion of the detected X-ray energy that is used at a rate that maintains a uniform exposure time for each angular position in the scanning range. Alternatively, when located at an extreme of the range, the detector is kept stationary until a desired minimum exposure time is obtained for each angular position, after which the collected diffraction data is normalized relative to exposure time.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
52.
X-ray apparatus having a motor-driven torque compensation at the detector circle of the goniometer
For an x-ray apparatus comprising a goniometer with a detector circle rotatable about a goniometer axis, an actuator coupled to the detector circle for the motor-driven rotation thereof, a source arrangement with an x-ray source, a detector arrangement fastened to the detector circle and including an x-ray detector, and a sample position for a sample to be examined towards which the source arrangement and the detector arrangement are oriented, a compensation apparatus is provided that compensates for a torque about the goniometer axis produced by the weight of the detector arrangement on the detector circle. The compensation apparatus comprises a compensation motor coupled to the detector circle and a control device that actuates the compensation motor depending on a current position of the detector arrangement to apply a torque at least substantially equal and opposite to the torque produced by the detector arrangement.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
The invention relates to a photon detector (10), in particular an x-ray detector, in the form of a measurement finger, which extends along a detector axis (23) and has a detector head (11) at a first end of the measurement finger, wherein the detector head (11) comprises a plurality of at least two detector modules (22), each comprising a sensor chip (12) sensitive to photon radiation (14), in particular x-radiation, said sensor chip having an exposed end face (13) and a face facing away from the end face (13), wherein the detector modules (22) are arranged around the detector axis (23) in a plane (24) extending orthogonally to the detector axis (23).
G01T 1/24 - Mesure de l'intensité de radiation avec des détecteurs à semi-conducteurs
H01J 37/244 - Détecteurs; Composants ou circuits associés
G01N 23/2252 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p.ex. la microscopie électronique à balayage [SEM] en mesurant les rayons X émis, p.ex. microanalyse à sonde électronique [EPMA]
54.
Method and system for determining the position of a radiation source
i) and the incidence direction for each of the plurality of pixels. The invention further refers to a system, a computer-related product and a sample (8) for performing such method and to the use of a pixel detector (2) for determining a position of a divergent radiation source (1).
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
G01B 15/00 - Dispositions pour la mesure caractérisées par l'utilisation d'ondes électromagnétiques ou de radiations de particules, p.ex. par l'utilisation de micro-ondes, de rayons X, de rayons gamma ou d'électrons
G01T 1/29 - Mesure effectuée sur des faisceaux de radiations, p.ex. sur la position ou la section du faisceau; Mesure de la distribution spatiale de radiations
55.
Measurement chamber for a compact goniometer in an x-ray spectrometer
A measurement chamber of an x-ray spectrometer for analyzing x-ray fluorescence radiation from a measuring sample has an entrance opening for the entry of x-ray fluorescence radiation into the measurement chamber, a first goniometer arm for holding and adjusting an analyzer crystal, and a second goniometer arm for holding and adjusting an x-ray detector. The measurement chamber and entrance opening are sealed in a vacuum-tight manner by way of a window. The chamber contains a bearing block for receiving and holding both goniometer arms in a concentric and rotatable manner, the arms each being mechanically adjustable by means of a piezo-motor, which is securely connected to the bearing block or a drive plate of the respective goniometer arm. The measurement chamber contains all mechanical components of the goniometer and allows for a more compact, lighter and more stable x-ray spectrometer with a rotatable goniometer and little heat influx into the system.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/2209 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant la spectroscopie dispersive en longueur d’onde [WDS]
56.
Two-dimensional X-ray detector position calibration and correction with diffraction pattern
A method of determining the spatial orientation of a two-dimensional detector in an X-ray diffractometry system, and calibrating the detector position in response thereto, uses diffraction patterns from a powder sample collected at a plurality of detector swing angles. The overlapping of the detected patterns indicates relative errors in the detector orientation. In particular, intersection points between the different diffraction patterns may be located, and their relative locations may be used to identify errors. Such errors may be in the detector position, or they may be errors in different rotational directions, such as roll, pitch or yaw. Determination and correction of the detector orientation using this method may be part of a calibration routine for the diffractometry system. Roll error may also be determined using a single measurement with the detector at a swing angle perpendicular to the X-ray beam.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 33/00 - Recherche ou analyse des matériaux par des méthodes spécifiques non couvertes par les groupes
57.
Device for sorting materials, in particular scrap particles, by means of X-ray fluorescence
A device for identifying materials on a conveyor belt by means of X-ray fluorescence comprises an X-ray source, from which X-ray radiation is guided onto material parts, a detector head containing an X-ray detector with a multiplicity of detector elements arranged in a planar fashion for receiving X-ray radiation and converting it into electrical charge signals, and an electronic unit for reading out and processing the charge signals, which comprises for each individual detector element a signal channel having a discriminator unit with a plurality of energy thresholds and a counting unit apparatus for converting the signals into digital counting events, wherein the electronic units are interconnected such that simultaneous occurrence of signals on more than one detector element can be identified and treated separately.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01T 1/167 - Mesure du contenu radioactif des objets, p.ex. contamination
B07C 5/342 - Tri en fonction d'autres propriétés particulières selon les propriétés optiques, p.ex. la couleur
B07C 5/34 - Tri en fonction d'autres propriétés particulières
B07C 5/346 - Tri en fonction d'autres propriétés particulières selon les propriétés radioactives
09 - Appareils et instruments scientifiques et électriques
Produits et services
X-ray apparatus not for medical purposes; X-ray fluorescence analysers, other than for medical purposes; X-ray spectroscopy apparatus, namely, total reflection X-ray fluorescence spectrometer other than for medical use; X-ray spectrometers; Computer software for controlling X-ray spectrometry; Accessories for sample preparations for X-ray spectrometry, namely, analytical sample laboratory trays, drying equipment for analyical laboratory samples; Accessories for storage of samples for X-ray spectrometry, namely, laboratory storage containers
59.
Method for collecting accurate X-ray diffraction data with a scanning two-dimensional detector
An X-ray diffraction system uses a two-dimensional detector to detect diffracted X-ray energy at a plurality of radial positions surrounding a sample location, the results at each position being combined to form a final diffraction image. To minimize smearing in the final image, the detector pixel intensities at each position are reapportioned among the pixel locations prior to being combined with the intensities collected at other positions. A two-dimensional pixel array space of the detector is projected onto a cylinder to form a projected pixel array space, and a virtual cylindrical detection surface representative of an ideal cylindrical detector is determined. An overlap between the pixels of the projected pixel array space and the pixels of the virtual cylindrical detection surface is determined, and pixel intensities are reapportioned accordingly. The reapportionment may include dividing each pixel space into subpixels and redistributing the subpixels among adjacent pixels.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
60.
X-ray optics assembly with switching system for three beam paths, and associated X-ray diffractometer
An X-ray optics assembly for an X-ray diffractometer is provided, comprising a multilayer mirror, in particular a Goebel mirror, and a switching system with which beam paths for an X-ray beam are selectable. The X-ray optics assembly includes a monochromator, in particular a channel-cut crystal, and three beam paths for the X-ray beam are selectable using the switching system. A first beam path in a first position of the switching system leads past the multilayer mirror and leads past the monochromator, a second beam path in a second position of the switching system contains the multilayer mirror and leads past the monochromator, and a third beam path in a third position of the switching system contains the multilayer mirror and contains the monochromator. The invention provides an X-ray optics assembly and an X-ray diffractometer which may be used even more universally for various measurement geometries in a simple manner.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
61.
Method and arrangement for identifying crystalline phases, a corresponding computer program, and a corresponding computer-readable storage medium
Methods and arrangements identify crystalline phases in a polycrystalline sample by determining a normalized vector p(i) for the chemical composition of the expected crystal structure, at each measurement point of the sample, recording a spectrum by means of energy-dispersive X-ray spectroscopy and determining the chemical composition, and recording an electron diffraction image and determining of the diffraction bands. The methods and arrangements also determine a normalized vector v for the chemical composition, compare the normalized vector v with each of the normalized vectors p(i) of the expected crystal structures and outputting an evaluation factor s(i) for the similarity of the vectors in each case, compare the diffraction bands with those of the expected crystal structures and outputting an evaluation factor n(i), and determining an overall quality from the two evaluation factors and identifying the crystal structure with the highest overall quality as belonging to the measurement point.
G01N 23/22 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p.ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
G01N 23/2252 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p.ex. la microscopie électronique à balayage [SEM] en mesurant les rayons X émis, p.ex. microanalyse à sonde électronique [EPMA]
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
62.
Method for scanning a sample by means of X-ray optics and an apparatus for scanning a sample
G01N 23/00 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou
G01N 23/20008 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux - Détails de construction des appareils d’analyse, p.ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons X; Leurs accessoires; Préparation d’échantillons à cet effet
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
G21K 7/00 - Microscopes à rayons gamma ou à rayons X
09 - Appareils et instruments scientifiques et électriques
Produits et services
X-ray apparatus not for medical purposes; X-ray analysers, other than for medical purposes; X-ray spectroscopy apparatus [other than for medical use]; X-ray spectrometers; Computer software for X-ray spectrometry; Accessories for sample preparations for X-ray spectrometry; Accessories for storage of samples for X-ray spectrometry.
64.
Optical base body for a spectrometer, method for producing an optical base body for a spectrometer and spectrometer comprising such optical base body
A optical base body for a spectrometer for mounting other components of a spectrometer, wherein the optical base body is produced as a sandwich construction from at least three flat elements layered on top of each other and interconnected, in particular bonded, wherein each of the flat elements has a low coefficient of thermal expansion which is substantially isotropic, at least in one isotropic plane and wherein the flat elements are layered on top of each other and interconnected such that their isotropic planes run substantially parallel to one another.
The invention relates to a method (90) for scanning a sample (99) by means of x-ray optics (100) for irradiating the sample (99) with x-rays (107a), comprising the following steps: (a) displacing a measuring point (106), defined by an optical initial point (108) of the x-ray optics (100), in the sample (99) in a first scanning direction (92) by means of swiveling the x-ray optics (100) about a first swivel axis (336); (b) detecting radiation (107b) emanating from the sample (99) at at least two measuring points (106) along the first scanning direction (92); (c) combining measured values correlating with the detected radiation (107b) to form an overall scan. Moreover, the invention relates to an apparatus (96) for scanning a sample (99), comprising: x-ray optics (100) for irradiating a sample (99) with x-rays (107a); a goniometer mechanism (300) connected to the x-ray optics (100), wherein the goniometer mechanism (300) is configured to carry out a swiveling of the x-ray optics (100) about a first swivel axis (336); at least one actuator (117) which is embodied to actuate the goniometer mechanism (300); and a control device (97) which is embodied to carry out the method as claimed in one of the preceding claims.
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
b) in any direction (x, y, z) is at least a factor of 1.5 smaller than the extension of the target (4). An x-ray apparatus is thereby provided with simplified alignment of the x-ray optics with respect to a microfocus x-ray source.
H01J 35/30 - Tubes, dans lesquels le point d'impact du rayon cathodique sur l'anode ou l'anticathode est déplaçable par rapport à la surface de celles-ci par déviation du rayon cathodique
H01J 35/14 - Dispositifs de concentration, de focalisation ou d'orientation du rayon cathodique
H05G 1/58 - Dispositions de commutation permettant de passer d'un mode de fonctionnement à un autre, p.ex. de la radioscopie à la radiographie, de la radioscopie à irradiation
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
68.
X-ray detector operable in a mixed photon-counting/analog output mode
A method for X-ray detection using a charge-integrating X-ray detector including a photodetector array of pixels, each of which converts incident radiation into accumulated charge during an X-ray exposure, is provided. The method includes, for each pixel, reading out the accumulated charge from the pixel and determining an X-ray charge value from the read out accumulated charge. If the X-ray charge value is less than a photon counting threshold, the X-ray charge value is replaced with a quantized charge value representative of an estimated photon count and recording the quantized charge value as a recorded charge value. If, however, the X-ray charge is equal to or greater than the photon counting threshold, the X-charge value is recorded as the recorded charge value. The method allows operating a charge-integrating X-ray detector in a mixed photon-counting/analog output mode.
The invention relates to a device (98) for the spatial alignment of X-ray optics (100) with an entry point (104) and an exit point (108). The device (98) comprises a parallel displacement mechanism (200) for gauging the entry point (104) of the X-ray optics (100) to a first predetermined point (100) by parallel displacement of the X-ray optics (100). Further, the device (98) comprises a goniometer mechanism (300) for gauging the exit point (108) of the X-ray optics (100) to a second predetermined point (106) by at least approximate pivoting of the X-ray optics (100) around the entry point (104). Further, the invention relates to an apparatus (96) which comprises the device (98) and X-ray optics (100).
A61B 6/08 - Moyens auxiliaires pour diriger le faisceau de radiations sur un point particulier, p.ex. en utilisant des faisceaux lumineux
G02B 7/02 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour lentilles
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
G01N 21/57 - Réflexion spéculaire en mesurant le brillant
70.
X-RAY DETECTOR OPERABLE IN A MIXED PHOTON-COUNTING/ANALOG OUTPUT MODE
A method for X-ray detection using a charge-integrating X-ray detector (10) including a photodetector array (12) of pixels (14), each of which converts incident radiation into accumulated charge during an X-ray exposure, is provided. The method includes, for each pixel, reading out the accumulated charge from the pixel and determining an X-ray charge value from the read out accumulated charge. If the X- ray charge value is less than a photon counting threshold, the X-ray charge value is replaced with a quantized charge value representative of an estimated photon count and recording the quantized charge value as a recorded charge value. If, however, the X-ray charge is equal to or greater than the photon counting threshold, the X-charge value is recorded as the recorded charge value. The method allows operating a charge-integrating X-ray detector in a mixed photon- counting/analog output mode.
A method for performing an X-ray diffraction analysis of a crystal sample using a multi-dimensional detector that integrates an X-ray diffraction signal while the position of the sample relative to an X-ray source is changed along a scan direction. The resulting image is compressed along the scan direction, but may be collected very quickly. The capture of both on-axis and off-axis reflections in a single image provides a common spatial frame of reference for comparing the reflections. This may be used in the construction of a reciprocal space map, and is useful for analyzing a sample with multiple crystal layers, such as a crystal substrate with a crystalline film deposited thereupon.
G01T 1/29 - Mesure effectuée sur des faisceaux de radiations, p.ex. sur la position ou la section du faisceau; Mesure de la distribution spatiale de radiations
G01B 9/10 - Goniomètres pour mesurer des angles entre des surfaces
G01B 15/00 - Dispositions pour la mesure caractérisées par l'utilisation d'ondes électromagnétiques ou de radiations de particules, p.ex. par l'utilisation de micro-ondes, de rayons X, de rayons gamma ou d'électrons
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 15/02 - Recherche de la dimension ou de la distribution des dimensions des particules
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
A method for performing an X-ray diffraction analysis of a crystal sample (112) using a two-dimensional detector (114) that integrates an X-ray diffraction signal while the position of the sample (112) relative to an X-ray source (102) is changed along a scan direction, such as a rocking scanning curve. The resulting image is compressed along the scan direction, but may be collected very quickly. The capture of both on-axis and off-axis reflections in a single image provides a common spatial frame of reference for comparing the reflections. This may be used in the construction of a reciprocal space map, and is useful for analyzing a sample with multiple crystal layers, such as a crystal substrate with a crystalline film deposited thereupon.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
73.
METHOD AND ARRANGEMENT FOR IDENTIFYING CRYSTALLINE PHASES, A CORRESPONDING COMPUTER PROGRAM, AND A CORRESPONDING COMPUTER-READABLE STORAGE MEDIUM
The invention relates to a method for identifying crystalline phases in a polycrystalline sample, comprising the method steps: a) for each crystal structure that is suspected in the sample, determining a normalized vector p(i) for the chemical composition of the crystal structure, wherein the basis of the vector represents elements and/or compounds and thus the coordinates of the vector comprise details about the concentration of the elements and/or compounds inside the crystal structure; b) at each measurement point of the sample, (i) recording of a spectrum by means of energy-dispersive X-ray spectroscopy (EDX spectrum) and determining of the chemical composition and (ii) recording of an electron diffraction image and determining of the diffraction bands; c) determining of a normalized vector v for the chemical composition at the measurement point, the coordinates whereof comprise details about the concentration of the elements and/or compounds at the measurement point; d) comparison of the normalized vector v for the chemical composition at the measurement point with each of the normalized vectors p(i) of the suspected crystal structures by issuing an evaluation factor s(i) for correlating each vector; e) comparison of the diffraction bands determined at the measurement point with the diffraction bands of the suspected crystal structures by issuing an evaluation factor n(i) for correlating the diffraction bands; and f) determining an overall quality from the two evaluation factors s(i) and n(i) and attributing the crystal structure with the highest overall quality to the measurement point.
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
G01N 23/22 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux
G01N 23/225 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques
74.
Method of conducting an X-ray diffraction-based crystallography analysis
A method of X-ray diffraction-based analysis for determining the structure of a crystal sample is provided. The method comprises conducting pre-experiment to collect a first set of diffraction images including reflections at corresponding intensities. The method also comprises conducting a main experiment to collect a second set of diffraction images, the diffraction images of the second set including the reflections with higher relative intensities than those produced during the first experiment, at least some of the diffraction images of the second set including topped reflections resulting from detector saturation. The method also includes a step of replacing intensities of the topped reflections from the second set of images with intensities obtained for the corresponding reflections from the first set of images.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/205 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en utilisant des caméras de diffraction
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
75.
Method for identifying a crystallographic candidate phase of a crystal
According to the invention a method is provided for identifying a crystallographic candidate phase of a crystal in an EBSD diffraction pattern, which includes the following steps: Sorting and indexing of the bands of the diffraction pattern in order of decreasing intensity. Providing of indices of the diffraction bands of candidate phases, which are to be expected as a result of the EBSD pattern acquisition, in a database, wherein all the indices provided can, in each case, be assigned to a candidate phase. Identification of the expected bands with the bands measured in the diffraction pattern for each candidate phase. Comparison of the intensities of bands of the measured diffraction pattern with intensities which were predicted for the diffraction bands of the candidate phases, which are to be expected as a result of the EBSD pattern acquisition, the indices of said candidate phases being stored in the database. In addition, a corresponding computer program and a computer-readable storage medium are provided, on which a computer program according to the invention is stored.
H01J 37/26 - Microscopes électroniques ou ioniques; Tubes à diffraction d'électrons ou d'ions
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
76.
METHOD OF CONDUCTING AN X-RAY DIFFRACTION-BASED CRYSTALLOGRAPHY ANALYSIS
A method of X-ray diffraction-based analysis for determining the structure of a crystal sample is provided. The method comprises conducting pre-experiment to collect a first set of diffraction images including reflections at corresponding intensities. The method also comprises conducting a main experiment to collect a second set of diffraction images, the diffraction images of the second set including the reflections with higher relative intensities than those produced during the first experiment, at least some of the diffraction images of the second set including topped reflections resulting from detector saturation. The method also includes a step of replacing intensities of the topped reflections from the second set of images with intensities obtained for the corresponding reflections from the first set of images.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
The invention relates to a photon detector (10), in particular an x-ray detector, in the form of a measurement finger, which extends along a detector axis (23) and has a detector head (11) at a first end of the measurement finger, wherein the detector head (11) comprises a plurality of at least two detector modules (22), each comprising a sensor chip (12) sensitive to photon radiation (14), in particular x-radiation, said sensor chip having an exposed end face (13) and a face facing away from the end face (13), wherein the detector modules (22) are arranged around the detector axis (23) in a plane (24) extending orthogonally to the detector axis (23).
G01N 23/00 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou
G01T 1/24 - Mesure de l'intensité de radiation avec des détecteurs à semi-conducteurs
G01N 23/225 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques
H01J 37/244 - Détecteurs; Composants ou circuits associés
78.
X-RAY DIFFRACTION BASED CRYSTAL CENTERING METHOD USING AN ACTIVE PIXEL ARRAY SENSOR IN ROLLING SHUTTER MODE
[0040] A method of centering a single crystal sample in the X- ray beam of a diffractometer, as necessary for single crystal diffractometry, uses detection of diffraction spots with an active pixel sensor operated in rolling shutter mode. A sample (112) is mounted in the automated goniometer (110) head of the diffractometer and an approximate center of the sample (112) found through which three perpendicular sample axes pass. With a first sample axis perpendicular to a center axis of the X-ray beam (108), the sample (112) is moved along the first axis from a first position outside of the beam (108), through the beam (108) and then to a second position outside of the beam (108). The positions at which first the presence and then the absence of diffraction spots are detected are determined, and the steps repeated for each of the other two perpendicular directions. A precise center may then be found by determining the centroid of the six coordinates thereby obtained.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
79.
X-ray diffraction based crystal centering method using an active pixel array sensor in rolling shutter mode
A method of centering a single crystal sample in the X-ray beam of a diffractometer uses detection of diffraction spots with an active pixel sensor operated in rolling shutter mode. A sample is mounted in the automated goniometer head of the diffractometer and an approximate center of the sample found through which three perpendicular sample axes pass. With a first sample axis perpendicular to a center axis of the X-ray beam, the sample is moved along the first axis from a first position outside of the beam, through the beam and then to a second position outside of the beam. The positions at which first the presence and then the absence of diffraction spots are detected are determined, and the steps repeated for each of the other two perpendicular directions. A precise center may then be found by determining the centroid of the six coordinates thereby obtained.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
80.
LENS MAIN PART FOR SPECTROMETER, METHOD FOR PRODUCING A LENS MAIN PART FOR A SPECTROMETER AND SPECTROMETER COMPRISING A LENS MAIN PART OF THIS TYPE
The invention relates to a lens main part (10) for a spectrometer for mounting other components (18, 24, 28) of a spectrometer, the lens main part being produced as a sandwich construction from at least three flat elements (12, 14, 16) arranged one on top of the other and interconnected, in particular bonded, each of said flat elements (12, 14, 16) having a low coefficient of thermal expansion which is substantially isotropic, at least on one isotropic plane. The flat elements (12, 14, 16) are arranged on top of one another and interconnected such that their isotropic planes run substantially parallel to one another.
In an X-ray detector operating in a rolling shutter read out mode, by precisely synchronizing sample rotation with the detector readout, the effects of timing skew on the image intensities and angular positions caused by the rolling shutter read out can be compensated by interpolation or calculation, thus allowing the data to be accurately integrated with conventional software. In one embodiment, the reflection intensities are interpolated with respect to time to recreate data that is synchronized to a predetermined time. This interpolated data can then be processed by any conventional integration routine to generate a 3D model of the sample. In another embodiment a 3D integration routine is specially adapted to allow the time-skewed data to be processed directly and generate a 3D model of the sample.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01T 1/24 - Mesure de l'intensité de radiation avec des détecteurs à semi-conducteurs
G06F 17/17 - Opérations mathématiques complexes Évaluation de fonctions par des procédés d'approximation, p.ex. par interpolation ou extrapolation, par lissage ou par le procédé des moindres carrés
82.
X-ray diffraction-based defective pixel correction method using an active pixel array sensor
A method for correcting erroneous intensity measurements caused by defective pixels of the detector for a single-crystal X-ray diffraction system uses collected diffraction images and a defective pixel list to modify three-dimensional reflection profiles by replacing profile elements affected by the defective pixels with corresponding profile elements from a model profile. Reflection positions on the detector are predicted using an orientation matrix for the crystal and a three-dimensional observed profile is constructed for each reflection. A model profile is constructed using normalized profile data from multiple reflection profiles. The observed profiles are compared with the defective pixel list to determine which profile elements are affected by defective pixels, and those elements are replaced by corresponding elements from the model profile. If the replaced elements represent more than a predetermined percentage of the overall reflection intensity, the data for that reflection is omitted from an overall dataset for the crystal.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01D 18/00 - Test ou étalonnage des appareils ou des dispositions prévus dans les groupes
G01T 7/00 - MESURE DES RADIATIONS NUCLÉAIRES OU DES RAYONS X - Détails des instruments de mesure des radiations
83.
X-RAY DIFFRACTION-BASED DEFECTIVE PIXEL CORRECTION METHOD USING AN ACTIVE PIXEL ARRAY SENSOR
A method for correcting erroneous intensity measurements caused by defective pixels of the detector for a single-crystal X-ray diffraction system uses collected diffraction images and a defective pixel list to modify three-dimensional reflection profiles by replacing profile elements affected by defective pixels with corresponding profile elements from a model profile. Reflection positions on the detector are predicted using a crystal orientation matrix and a three-dimensional observed profile is constructed for each reflection. A model profile is constructed using normalized data from multiple reflection profiles. The observed profiles are compared with the defective pixel list to determine which profile elements are affected by defective pixels, and those elements are replaced by corresponding elements from the model profile. If the replaced elements represent more than a predetermined percentage of the overall reflection intensity, the data for that reflection is omitted from an overall dataset for the crystal.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
The invention relates to an energy dispersive detection method for X-radiation, comprising the following steps: irradiating a sample (20) with a primary electron beam (11) while exciting an emission of X-radiation (13) and back-scattered electrons (12); providing a means (34) for reducing the back-scattered electrons (12), said means comprising at least two windows (33) with different transmission properties for back-scattered electrons (12); positioning one of the at least two windows between an X-ray detection element (31) and a sample (20); and detecting the X-radiation (13) by means of the X-ray detection element (31). According to the invention, the one of the at least two windows (33) is selected such that in a predetermined energy range in at least one characteristic X-ray peak the transmittance Tx for X-rays is at a maximum and the transmittance TBSE for back-scattered electrons is not more than 0.1.
H01J 37/252 - Tubes analyseurs à spot par faisceaux électroniques ou ioniques; Micro-analyseurs
H01J 37/244 - Détecteurs; Composants ou circuits associés
G01N 23/225 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques
85.
ONE-DIMENSIONAL X-RAY DETECTOR WITH CURVED READOUT STRIPS
A detector for a small-angle x-ray diffraction system uses curved readout strips shaped to correspond to the expected intensity distribution of x-rays scattered by the system. This expected intensity distribution may be a series of concentric circles, and each of the strips has a shape that approximates a section of an annulus. The strips may be positioned on a substrate such that a center of curvature of the curved strips is located along an edge of a readout region within which the strips are located or, alternatively, at a geometric center of the readout region. The detector may have a signal readout system that uses a delay line or, alternatively, a multichannel readout system. The detector may make use of electron generation via interaction of the diffracted x-ray beam with gas in a gas chamber, or through interaction of the diffracted beam with a semiconductor material.
G01N 23/201 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffusion sous un petit angle, p.ex. la diffusion des rayons X sous un petit angle [SAXS]
86.
One-dimensional x-ray detector with curved readout strips
A detector for a small-angle x-ray diffraction system uses curved readout strips shaped to correspond to the expected intensity distribution of x-rays scattered by the system. This expected intensity distribution may be a series of concentric circles, and each of the strips has a shape that approximates a section of an annulus. The strips may be positioned on a substrate such that a center of curvature of the curved strips is located along an edge of a readout region within which the strips are located or, alternatively, at a geometric center of the readout region. The detector may have a signal readout system that uses a delay line or, alternatively, a multichannel readout system. The detector may make use of electron generation via interaction of the diffracted x-ray beam with a gas in a gas chamber, or through interaction of the diffracted beam with a semiconductor material.
G01N 23/201 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffusion sous un petit angle, p.ex. la diffusion des rayons X sous un petit angle [SAXS]
87.
X-ray analyzing system for x-ray scattering analysis
b) has at least three hybrid slit elements (7), each hybrid slit element (7) having a single crystal substrate (8) bonded to a base (9) with a taper angle α≠0. The single crystal substrates (8) of the hybrid slit elements (7) limit the aperture and the hybrid slit elements (7) are staggered with an offset along the transmission axis (3). The X-ray analyzing system has improved resolution and signal to noise ratio.
G01N 23/201 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffusion sous un petit angle, p.ex. la diffusion des rayons X sous un petit angle [SAXS]
G21K 1/04 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant des diaphragmes, des collimateurs utilisant des diaphragmes à ouverture variable, des obturateurs, des hacheurs
88.
DEVICE FOR SPATIALLY ORIENTING AN X-RAY OPTICAL UNIT AND APPARATUS HAVING SUCH A DEVICE
The invention relates to a device (98) for spatially orienting an x-ray optical unit (100) having an input point (104) and an output point (108). The device (98) comprises a parallel-displacement mechanism (200) for moving the input point (104) of the x-ray optical unit (100) to a first predetermined point by means of parallel displacement of the x-ray optical unit (100). In addition, the device (98) comprises a goniometer mechanism (300) for moving the output point (108) of the x-ray optical unit (100) to a second predetermined point (108) by means of at least approximate pivoting of the x-ray optical unit (100) about the input point (104). The invention further relates to an apparatus (96), which comprises the device (98) and an x-ray optical unit (100).
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
89.
XRF measurement apparatus for detecting contaminations on the bevel of a wafer
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 21/95 - Recherche de la présence de criques, de défauts ou de souillures caractérisée par le matériau ou la forme de l'objet à analyser
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
90.
METHOD AND APPARATUS FOR SURFACE MAPPING USING IN-PLANE GRAZING INCIDENCE DIFFRACTION
An apparatus for examining the surface of a crystalline sample uses in-plane grazing incidence diffraction with a position-sensitive detector. The x-ray source illuminates an extended region of the sample and, for crystal sections having the appropriate lattice orientation, an elongated diffraction signal is produced. The relative position of the sample and the x-ray beam may then be changed to illuminate different regions of the sample so that the diffraction signal corresponds to these other regions. By scanning across the entire sample, a spatial profile of the sample surface may be generated. The system may be used to locate crystal boundaries, defects, or the presence of attenuating materials on the sample surface.
G01N 23/201 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffusion sous un petit angle, p.ex. la diffusion des rayons X sous un petit angle [SAXS]
91.
Method and apparatus for surface mapping using in-plane grazing incidence diffraction
An apparatus for examining the surface of a crystalline sample uses in-plane grazing incidence diffraction with a position-sensitive detector. The x-ray source illuminates an extended region of the sample and, for crystal sections having the appropriate lattice orientation, an elongated diffraction signal is produced. The relative position of the sample and the x-ray beam may then be changed to illuminate different regions of the sample so that the diffraction signal corresponds to these other regions. By scanning across the entire sample, a spatial profile of the sample surface may be generated. The system may be used to locate crystal boundaries, defects, or the presence of attenuating materials on the sample surface.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/201 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffusion sous un petit angle, p.ex. la diffusion des rayons X sous un petit angle [SAXS]
The invention relates to a photon detector (10), in particular an x-ray detector, in the form of a measurement finger, which extends along a detector axis (23) and has a detector head (11) at a first end of the measurement finger, wherein the detector head (11) comprises a plurality of at least two detector modules (22), each comprising a sensor chip (12) sensitive to photon radiation (14), in particular x-radiation, said sensor chip having an exposed end face (13) and a face facing away from the end face (13), wherein the detector modules (22) are arranged around the detector axis (23) in a plane (24) extending orthogonally to the detector axis (23).
09 - Appareils et instruments scientifiques et électriques
Produits et services
Microscopes, namely, Scanning Probe Microscopes and Atomic Force Microscopes for analyzing and manipulating surfaces at the nanometer scale by means of an atomically fine tip that scans over the surface of a sample
94.
Device and method for combustion analysis by means of induction furnaces and protective element for induction furnaces for the combustion analysis
With a device for combustion analysis, comprising an induction furnace with a furnace chamber, in which carrier gas can flow during operation via at least one gas inlet to a gas outlet, and in which a sample to be analyzed can be arranged and burned in a sample container, a hollow protective element is provided and, with normal operation of the device, is arranged in the furnace chamber directly above the sample in such a way that the end of the protective element facing towards the sample, together with the sample container, forms a constriction for the carrier gas flow, wherein the protective element is desgned to convey gases produced during the combustion of the sample through the protective element and to the gas outlet.
Readout noise for each pixel in a CMOS Active Pixel Sensor is reduced by a five step process in which the pixel charge data from the sensor is nondestructively sampled at a plurality of times during a sensor frame time period and corrected for gain variation and nonlinearity. Then fixed pattern 5 and dark current noise is estimated and subtracted from the corrected pixel charge data. Next, reset noise is estimated and subtracted from the pixel charge data. In step four, a model function of charge versus time is fit to the corrected pixel charge data samples. Finally, the fitted model function is evaluated at frame boundary times.
G01N 23/00 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
96.
Multiply-sampled CMOS sensor for X-ray diffraction measurements with corrections for non-ideal sensor behavior
Readout noise for each pixel in a CMOS Active Pixel Sensor is reduced by a five step process in which the pixel charge data from the sensor is non-destructively sampled at a plurality of times during a sensor frame time period and corrected for gain variation and nonlinearity. Then fixed pattern and dark current noise is estimated and subtracted from the corrected pixel charge data. Next, reset noise is estimated and subtracted from the pixel charge data. In step four, a model function of charge versus time is fit to the corrected pixel charge data samples. Finally, the fitted model function is evaluated at frame boundary times.
In an X-ray detector operating in a rolling shutter read out mode, by precisely synchronizing sample rotation with the detector readout, the effects of timing skew on the image intensities and angular positions caused by the rolling shutter read out can be compensated by interpolation or calculation, thus allowing the data to be accurately integrated with conventional software. In one embodiment, the reflection intensities are interpolated with respect to time to recreate data that is synchronized to a predetermined time. This interpolated data can then be processed by any conventional integration routine to generate a 3D model of the sample. In another embodiment a 3D integration routine is specially adapted to allow the time- skewed data to be processed directly and generate a 3D model of the sample.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
98.
Method for correcting timing skew in X-ray data read out of an X-ray detector in a rolling shutter mode
In an X-ray detector operating in a rolling shutter read out mode, by precisely synchronizing sample rotation with the detector readout, the effects of timing skew on the image intensities and angular positions caused by the rolling shutter read out can be compensated by interpolation or calculation, thus allowing the data to be accurately integrated with conventional software. In one embodiment, the reflection intensities are interpolated with respect to time to recreate data that is synchronized to a predetermined time. This interpolated data can then be processed by any conventional integration routine to generate a 3D model of the sample. In another embodiment a 3D integration routine is specially adapted to allow the time-skewed data to be processed directly and generate a 3D model of the sample.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
The invention relates to a spectrometer comprising a hollow main optical body having at least one light channel, a light source, a diffraction grating having a grating central point, a light inlet opening, and a detector unit, which are arranged in such a way that the focal curve of the spectrometer satisfies the back focus equation. In order to create a spectrometer having sufficient spectral resolution from a low-price, light, and easy-to-process material, which spectrometer is able to operate in a large temperature interval even without thermostatic control, according to the invention the light inlet opening is arranged on a compensation body, the compensation body is arranged in the light channel and fastened to the main optical body between the light source and the diffraction grating, and the compensation body is dimensioned in such a way that the compensation body changes the distance between the light inlet opening and the grating central point when the main optical body thermally expands.
The invention relates to a device (10) for combustion analysis with an induction furnace having a furnace chamber (11), in which during operation carrier gas can flow via at least one gas inlet to a gas outlet (33), and in which a sample to be analyzed can be arranged and burned in a sample container (24). The device is provided with a hollow protective element (32), which, when the device is in the proper operational state, is arranged in the furnace chamber (11) directly above the sample such that the end of the protective element (32) facing the sample, together with the sample container, forms a constriction for the carrier gas flow, wherein the protective element is designed to conduct the gases generated during the combustion of the sample through the protective element to the gas outlet (33).
