Reflectometer, spectrophotometer, ellipsometer or polarimeter system including sample imaging system that simultaneously meet the scheimpflug condition and overcomes keystone error
An imaging system, and method of its use, for viewing a sample surface at an inclined angle, preferably in functional combination with a sample investigating reflectometer, spectrophotometer, ellipsometer or polarimeter system; wherein the imaging system provides that a sample surface and multi-element imaging detector surface are oriented with respect to one another to meet the Scheimpflug condition, and wherein a telecentric lens system is simultaneously positioned between the sample surface and the input surface of the multi-element imaging detector such that an image of the sample surface produced by said multi-element imaging detector is both substantially in focus over the extent thereof, and such that substantially no keystone error is demonstrated in said image.
An ellipsometer, polarimeter and the like system operating in the infrared spectral range (0.75 μm to 1000 μm), utilizing a tunable quantum cascade laser (QCL) source with the capability if reducing speckle and standing wave effects, dual-rotatable optical elements, a single-point detector, as well as optional means of reducing the size of the probe beam at the measurement surface and optional chopper for lock-in detection.
An ellipsometer, polarimeter and the like system operating in the infrared spectral range (0.75 μm to 1000 μm), utilizing a tunable quantum cascade laser (QCL) source in combination with dithering capability to reduce speckle and standing wave effects, dual-rotating optical elements, a single-point detector, as well as optional means of reducing the size of the probe beam at the measurement surface and optional chopper for lock-in detection.
Reflectometer, spectrophotometer, ellipsometer and polarimeter system with a super continuum laser source of a beam of electromagnetism, and improved detector system
Reflectometer, spectrophotometer, ellipsometer, and polarimeter systems having a supercontinuum laser source of coherent electromagnetic radiation over a range of between 400 nm to between 4400 nm and 18000 nm, and another source of wavelengths to provide between 400 nm and as high as at least 50000 nm; a stage for supporting a sample and a detector of electromagnetic radiation, wherein the source provides a beam of electromagnetic radiation which interacts with a sample and enters a detector system optionally incorporating a wavelength modifier, where the detector system can be functionally incorporated with combinations of gratings and/or combination dichroic beam splitter-prisms, which can be optimized as regards wavelength dispersion characteristics to direct wavelengths in various ranges to various detectors that are well suited to detect them.
09 - Appareils et instruments scientifiques et électriques
Produits et services
Optics equipment, namely, ellipsometer-based apparatus for measuring thickness and optical properties of semiconductors, disk drives, magnetic data storage media, optical media storage media, thin films and multiple layer films on substrates and coatings, and recorded computer software programs for operating and controlling the ellipsometer-based apparatus and for analyzing ellipsometric data
6.
Reflectometer, spectrophotometer, ellipsometer and polarimeter systems including a wavelength modifier
Ellipsometer, polarimeter, reflectometer and spectrophotometer systems including one or more wavelength modifiers which convert wavelengths provided by a source of electromagnetic radiation to different wavelengths for use in investigating a sample, and/or which a detector thereof can detect.
Ellipsometer, polar imeter, reflactometer and spectrophotometer systems including one or more wavelength modifiers which convert wavelengths provided by a source of electromagnetic radiation to different wavelengths for use in investigating a sample, and/or which a detector thereof can detect.
G01N 21/35 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge
G01J 3/00 - SpectrométrieSpectrophotométrieMonochromateursMesure de la couleur
A snapshot ellipsometer or polarimeter which does not require temporally modulated element(s) to measure a sample, but instead uses one or more spatially varying compensators, (eg. microretarder arrays and compound prisms), to vary the polarization state within a measurement beam of electromagnetic radiation. Analysis of an intensity profile of the beam after interaction with the spatially varying compensator(s) and the sample, and after having source beam wavelength content determined using a digital light processor, and/or being directed by a digital light processor elements toward elements in the detector, allows sample parameters to be characterized.
09 - Appareils et instruments scientifiques et électriques
Produits et services
Equipment, devices and apparatus, for measuring fluctuations in light polarization, for use in measuring the thickness and optical properties of semi-conductors, disk-drives, magnetic data storage media, optical data storage media, films, thin films, and of multiple layer films, including on substrates and coatings; computer programs for controlling the aforesaid apparatus and for use in recording, storing, transmitting and analysing data acquired by the aforesaid apparatus.
10.
Reflectometer, spectrophotometer, ellipsometer and polarimeter system with a super continuum laser source of a beam of electromagnetism, and improved detector system
Reflectometer, spectrophotometer, ellipsometer, and polarimeter systems having a supercontinuum laser source of coherent electromagnetic radiation over a range of about 400-about 2500 nm, a stage for supporting a sample and a detector of electromagnetic radiation, wherein the supercontinuum source provides a coherent beam of electromagnetic radiation which interacts with a sample, and the detector system comprises functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics, directs wavelengths in various ranges to various detectors that are well suited to detect them.
A method of applying a reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with reduced effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved.
Materials comprising metamaterials exhibiting form-induced birefringence and anisotropic optical properties are provided. The disclosed articles comprise structures with critical dimensions which are on the order of or smaller than the wavelength for the gigahertz and terahertz spectral range. Methods of preparing same using stereolithography are disclosed. In a further aspect, the disclosed methods pertain to spectroscopic ellipsometry methods comprising a biaxial (orthorhombic) layer homogenization approach is to analyze the terahertz ellipsometric data obtained at three different sample azimuth orientations. The disclosed articles and methods demonstrate provide an avenue to fabricate metamaterials for the terahertz spectral range and allows tailoring of the polarizability and anisotropy of the host material. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
B29C 64/135 - Procédés de fabrication additive n’utilisant que des matériaux liquides ou visqueux, p. ex. dépôt d’un cordon continu de matériau visqueux utilisant des couches de liquide à solidification sélective caractérisés par la source d'énergie à cet effet, p. ex. par irradiation globale combinée avec un masque la source d’énergie étant concentrée, p. ex. lasers à balayage ou sources lumineuses focalisées
B33Y 70/00 - Matériaux spécialement adaptés à la fabrication additive
B33Y 80/00 - Produits obtenus par fabrication additive
G02B 1/00 - Éléments optiques caractérisés par la substance dont ils sont faitsRevêtements optiques pour éléments optiques
G02B 1/04 - Éléments optiques caractérisés par la substance dont ils sont faitsRevêtements optiques pour éléments optiques faits de substances organiques, p. ex. plastiques
B29L 11/00 - Éléments optiques, p. ex. lentilles, prismes
B29K 33/00 - Utilisation de polymères d'acides non saturés ou de leurs dérivés comme matière de moulage
13.
Reflectometer, spectrophotometer, ellipsometer or polarimeter system including sample imaging system that simultaneously meets scheimpflug condition and overcomes keystone error
An imaging system, and method of its use, for viewing a sample surface at an inclined angle, preferably in functional combination with a sample investigating reflectometer, spectrophotometer, ellipsometer or polarimeter system; wherein the imaging system provides that a sample surface and multi-element imaging detector surface are oriented with respect to one another to meet the Scheimpflug condition, and wherein a telecentric lens system is simultaneously positioned between the sample surface and the input surface of the multi-element imaging detector such that an image of the sample surface produced by said multi-element imaging detector is both substantially in focus over the extent thereof, and such that substantially no keystone error is demonstrated in said image.
G01N 21/25 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes
G01J 3/02 - SpectrométrieSpectrophotométrieMonochromateursMesure de la couleur Parties constitutives
14.
THETA-THETA SAMPLE POSITIONING STAGE WITH APPLICATION TO SAMPLE MAPPING USING A REFLECTOMETER, SPECTROPHOTOMETER OR ELLIPSOMETER SYSTEM
A sample positioning system having two rotation elements with offset therebetween, to the second of which rotation elements is affixed a sample supporting stage, The rotation axes of the two rotation element are parallel, or substantially so. The sample positioning system finds application in the mapping of samples by Metrology systems such as Reflectometer, Spectrophotometer and Ellipsometer systems.
G01N 21/25 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes
15.
Ellipsometer or polarimeter system having at least one rotating element which is driven by a motor comprising air bearing
F16C 32/06 - Paliers non prévus ailleurs comprenant un élément mobile supporté par un coussinet de fluide engendré, au moins en grande partie, autrement que par la rotation de l'arbre, p. ex. paliers hydrostatiques à coussinet d'air
16.
Systems and methods for producing a more uniform intensity wavelength dispersed beam of electromagnetic radiation entering a multielement detector, while maintaining information content therein
Reflectometer, Spectrophotometer, Ellipsometer and Polarimeter Systems that utilize 1) electromagnetic radiation energy absorbing or reflecting material of spatially distributed different optical densities and 2) wavelength dependent electromagnetic radiation energy aperturing, or both, placed near the entry to said multi-element detector, to improve detector capability to monitor intensity vs. wavelength spectra entered thereinto and provide more uniform detector output, while preferably maintaining beam information content.
A snapshot ellipsometer or polarimeter which does not require temporally modulated element(s) to measure a sample, but instead uses one or more spatially varying compensators, (eg. microretarder arrays and compound prisms), to vary the polarization state within a measurement beam of electromagnetic radiation. Analysis of the intensity profile of the beam after interaction with the spatially varying compensator(s) and the sample allows sample parameters to be characterized without any moving optics.
A snapshot ellipsometer or polarimeter which does not require temporally modulated element (s) to measure a sample, but instead uses one or more spatially varying compensators, (eg. microretarder arrays and compound prisms), to vary the polarization state within a measurement beam of electromagnetic radiation. Analysis of the intensity profile of the beam after interaction with the spatially varying compensator (s ) and the sample allows sample parameters to be characterized without any moving optics.
Systems and methods for producing a more uniform intensity wavelength dispersed beam of electromagnetic radiation entering a multi-element detector, while maintaining information content therein
Methods and systems that utilize 1) electromagnetic radiation energy absorbing or reflecting material of spatially distributed different optical densities and 2) wavelength dependent electromagnetic radiation energy aperturing, or both, placed near the entry to said multi-element detector, to improve detector capability to monitor intensity vs. wavelength spectra entered thereinto and provide more uniform detector output, while preferably maintaining beam angle and plane of incidence.
A retarder that comprises at least two plates, each of which comprise two surfaces that are parallel to, or substantially parallel to one another, said plates being tipped with respect to one another so that the surfaces of one thereof are not parallel to the surfaces of the other, each said plate further comprising a biased fast axis that is neither parallel to, or perpendicular to surfaces of said plates.
Methodology of characterizing surface properties and determining refractive index and extinction coefficient of a prism shaped material, including simultaneously for a multiplicity of wavelengths, using an easy to practice technique.
A sample positioning system having two rotation elements with offset therebetween, to the second of which rotation elements is affixed a sample supporting stage. The rotation axes of the two rotation element are parallel, or substantially so. The sample positioning system finds application in the mapping of samples by Metrology systems such as Reflectometer, Spectrophotometer and Ellipsometer systems.
G01N 21/31 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique
23.
Reflectometer, spectrophotometer, ellipsometer and polarimeter systems with a super continuum laser source of a beam of electromagnetism, and improved detector system
Reflectometer, spectrophotometer, ellipsometer, and polarimeter systems having a supercontinuum laser source of coherent electromagnetic radiation over a range of about 400-about 2500 nm, a stage for supporting a sample and a detector of electromagnetic radiation, wherein the supercontinuum source provides a coherent beam of electromagnetic radiation which interacts with a sample, and the detector system comprises functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics, directs wavelengths in various ranges to various detectors that are well suited to detect them.
In ellipsometer and polarimeter systems, reflective optics including both convex and a concave mirrors that have beam reflecting surfaces, as well as aperture control of beam size to optimize operation with respect to aberration and diffraction effects while achieve the focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved, and further including detectors of electromagnetic radiation that enable optimization of the operation thereof for application over various specific wavelength ranges, involving functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics.
09 - Appareils et instruments scientifiques et électriques
Produits et services
IDENTIFIES EQUIPMENT, NAMELY, ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA
26.
Enhanced detector operation made possible by application of a functional plurality of gratings and combination dichroic beam splitter-prisms
Application of detectors of electromagnetic radiation and systems for enabling the optimization thereof for application over various specific wavelength ranges, involving functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics.
and can demonstrate neutral density characteristics outside the specified range of wavelengths. The combination of a focusing element, and a filtering element can optionally be present in an ellipsometer or polarimeter system.
Methodology of characterizing pore size distribution in a porous thin film having a surface, or in a surface region of a porous semi-infinite bulk substrate having a surface, involving applying a mathematical model of a sample based on effective medium approaches, such as the Bruggeman effective medium approach.
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
G01J 4/04 - Polarimètres utilisant des moyens de détection électriques
29.
Reflectometer, spectrophometer, ellipsometer and polarimeter system with a super continuum laser-source of a beam of electromagnetism and improved detector system
Reflectometer, spectrophotometer, ellipsometer, and polarimeter systems having a supercontinuum laser source of coherent electromagnetic radiation over a range of about 400-about 2500 nm, a stage for supporting a sample and a detector of electromagnetic radiation, wherein the supercontinuum source provides a coherent beam of electromagnetic radiation which interacts with a sample, and the detector system comprises functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics, directs wavelengths in various ranges to various detectors that are well suited to detect them.
BOARD OF REGENTS FOR THE UNIVERSITY OF NEBRASKA (USA)
J.A. WOOLLAM CO., INC. (USA)
Inventeur(s)
Schubert, Mathias M.
Hofmann, Tino
Hage, David S.
Pfaunmiller, Erika
Herzinger, Craig M.
Woollam, John A.
Schoeche, Stefan
Abrégé
Ellipsometers and polarimeters or the like to investigate analyte containing fluids applied to a substrate-stage having a multiplicity of nano-structures that project non-normal to a surface thereof, including dynamics of interaction therewith, to the end of evaluating and presenting at least partial Jones or Mueller Matricies corresponding to a multiplicity of locations over an imaged area.
G01J 4/04 - Polarimètres utilisant des moyens de détection électriques
31.
Integrated vacuum-ultraviolet, mid and near-ultraviolet, visible, near, mid and far infrared and terahertz optical hall effect (OHE) instrument, and method of use
BOARD OF REGENTS FOR THE UNIVERSITY OF NEBRASKA (USA)
J.A. WOOLLAM CO., INC. (USA)
Inventeur(s)
Hofmann, Tino
Schubert, Mathias M.
Schoeche, Stefan
Kuehne, Philipp
Herzinger, Craig M.
Woollam, John A.
Pribil, Gregory K.
Tiwald, Thomas E.
Knight, Sean R.
Abrégé
Optical Hall Effect (OHE) method for evaluating such as free charge carrier effective mass, concentration, mobility and free charge carrier type in a sample utilizing a permanent magnet at room temperature.
A system for providing variable wavelength intensity attenuation to said focused beams by application of an aperture-like element that comprises at least two regions of “filter” material, or comprises different materials graded into one another, which different materials that have different responses to different wavelengths, wherein said system is applied to reduce differences in wavelength intensity levels when applied in collimated portions of a beam as a Spectral Angle Adjustor (SAA) or to preserve information in a beam while changing said beam effective diameter as a Spectral Aperture Stop (SAS); or to affect a Spectral Field Stop (SFS) that controls source image size when applied at a convergent/divergent beam focal point as a Spectrally Varying Aperture, (SVA) the end result depending on where in a beam it is applied.
A substantially achromatic multiple element compensator system for use in a wide spectral range, (for example 190-1700 nm), rotating compensator spectroscopic ellipsometer or polarimeter or the like system, which does not require external surface coatings at locations whereat total internal reflections occur. Multiple total internal reflections enter retardance into an entered beam of electromagnetic radiation. Berek-type retarders on both input and output sides of the multiple elements are oriented to minimize changes in the net retardance vs. wavelength via adjustment of Berek-type retarders. Berek-type retarders.
G02B 7/00 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques
G02B 17/00 - Systèmes avec surfaces réfléchissantes, avec ou sans éléments de réfraction
34.
Combined use of oscillating means and ellipsometry to determine uncorrelated effective thickness and optical constants of material deposited at or etched from a working electrode that preferrably comprises non-normal oriented nanofibers
THE BOARD OF REGENTS OF THE UNIVERSITY OF NEBRASKA (USA)
Inventeur(s)
Schubert, Mathias M.
Hofmann, Tino
Woollam, John A.
Lai, Rebecca Y.
Abrégé
Disclosed are systems and methods that enable determination of uncorrelated thickness of a working electrode and surface region optical constants in settings involving electrochemical processing at a working electrodes in a Piezoelectric Balance system, by simultaneous application of an Ellipsometer system, the working electrode optionally having a multiplicity of nanofibers that are oriented non-normally to a surface of said working electrode. Further disclosed is, simultaneous with said determinations, the monitoring of electrochemical processes at a piezoelectric balance working electrode driven by electrical energy applied between said working electrode and counter electrode.
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
G01N 27/42 - Mesure du dépôt ou de la libération de matériaux d'un électrolyteCoulométrie, c.-à-d. mesure de l'équivalent de Coulomb du matériau dans un électrolyte
G01N 27/27 - Association de plusieurs systèmes ou cellules de mesure, chacun mesurant un paramètre différent, dans laquelle les résultats des mesures peuvent être, soit utilisès indépendamment, les systèmes ou les cellules étant physiquement associés, soit combinés pour produire une valeur représentative d'un autre paramètre
BOARD OF REGENTS OF THE UNIVERSITY OF NEBRASKA (USA)
J. A. WOOLLAM CO., INC. (USA)
Inventeur(s)
Hofmann, Tino
Schubert, Mathias M.
Kasputis, Tadas
Pannier, Angela K.
Herzinger, Craig M.
Woollam, John A.
Abrégé
Anisotropic contrast methodology in combination with use of sample investigating polarized electromagnetic radiation to provide Jones or Mueller Matrix imaging data corresponding to areas on samples.
A method of applying a reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved.
Methodology of characterizing pore size and distribution in a porous thin film having a surface, or in a surface region of a porous semi-infinite bulk substrate having a surface, involving applying a mathematical model of a sample based on a Bruggerman effective medium.
G06F 17/17 - Évaluation de fonctions par des procédés d'approximation, p. ex. par interpolation ou extrapolation, par lissage ou par le procédé des moindres carrés
G01J 4/04 - Polarimètres utilisant des moyens de détection électriques
G06G 7/30 - Dispositions pour l'exécution d'opérations de calcul, p. ex. amplificateurs spécialement adaptés à cet effet pour interpolation ou extrapolation
09 - Appareils et instruments scientifiques et électriques
Produits et services
Equipment, namely, ellipsometer based apparatus for measuring thickness and optical properties of semiconductor, disk drive, magnetic data storage media, optical data storage media, thin films and multiple layer films on substrates and coatings, and computer programs necessary for controlling the ellipsometer based apparatus and for analyzing acquired ellipsometric data
39.
Method of characterizing a beam of electromagnetic radiation in ellipsometer and the like systems
An approach to characterizing beams of electromagnetic radiation such as are applied in ellipsometer and the like systems, involving considering the beam to be comprised of a number of spatially distributed beam rays, each of which is represented mathematically as an effectively independent source.
An ellipsometer system with polarization state generator and polarization state analyzer components inside at least one internal environment supporting encasement, said at least one encasement being present inside said environmental chamber.
A retarder system that comprises at least two plates, each of which comprise two surfaces that are parallel to, or substantially parallel to one another, said plates being tipped with respect to one another so that the surfaces of one thereof are not parallel to the surfaces of the other, each said plate further comprising a biased fast axis that is neither parallel to, or perpendicular to surfaces of said plates.
A reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved. This invention is also a combination of a focusing element and a filtering element that provides an optimum electromagnetic beam cross-sectional area based on optimizing the beam cross-sectional area in view of conflicting effects of aberration and diffraction inherent in said focusing element, which, for each wavelength, vary oppositely to one another with electromagnetic beam cross-sectional area.
System Stage, and Optical Hall Effect (OHE) system method for evaluating such as free charge carrier effective mass, concentration, mobility and free charge carrier type in a sample utilizing a permanent magnet at room temperature.
G01N 21/3586 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge en utilisant la lumière de l'infrarouge lointainCouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge en utilisant un rayonnement térahertz par spectroscopie térahertz dans le domaine temporel [THz-TDS]
G01N 27/72 - Recherche ou analyse des matériaux par l'emploi de moyens électriques, électrochimiques ou magnétiques en recherchant des variables magnétiques
G01J 4/04 - Polarimètres utilisant des moyens de détection électriques
44.
SYSTEM AND METHOD FOR INVESTIGATING CHANGE IN OPTICAL PROPERTIES OF A POROUS EFFECTIVE SUBSTRATE SURFACE AS A FUNCTION OF A SEQUENCE OF SOLVENT PARTIAL PRESSURES AT ATMOSPHERIC PRESSURE
A system for and method of investigating changes in optical properties of a porous effective substrate surface related to, for instance, effective surface depth and refractive index, pore size, pore volume and pore size distribution at atmospheric pressure.
Methodology of characterizing surface properties and determining refractive index and extinction coefficient of a prism shaped material, including simultaneously for a multiplicity of wavelengths, using an easy to practice technique.
G01N 21/00 - Recherche ou analyse des matériaux par l'utilisation de moyens optiques, c.-à-d. en utilisant des ondes submillimétriques, de la lumière infrarouge, visible ou ultraviolette
G01N 21/41 - RéfringencePropriétés liées à la phase, p. ex. longueur du chemin optique
09 - Appareils et instruments scientifiques et électriques
Produits et services
EQUIPMENT, NAMELY, ELLIPSOMETER BASED APPARATUS FOR MEASURINGTHICKNESS, TEMPERATURE CAUSED EFFECTS, AND OPTICAL PROPERTIES OFSEMICONDUCTORS, DISK DRIVES, MAGNETIC DATA STORAGE MEDIA, OPTICALDATA STORAGE MEDIA, THIN FILMS, MULTIPLE LAYER FILMS AND COATINGS ONSUBSTRATES, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLLING THEELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRICDATA
09 - Appareils et instruments scientifiques et électriques
Produits et services
ellipsometer based apparatus for measuring thickness and optical properties of semi conductor, disk drive, magnetic data storage media, optical data storage media, thin films and multiple layer films on substrates and coatings, and computer programs necessary for controlling the ellipsometer data
48.
System and method for investigating change in optical properties of a porous effective substrate surface as a function of a sequence of solvent partial pressures at atmospheric pressure
A system for and method of investigating changes in optical properties of a porous effective substrate surface related to, for instance, effective surface depth and refractive index, pore size, pore volume and pore size distribution at atmospheric pressure.
G01N 15/00 - Recherche de caractéristiques de particulesRecherche de la perméabilité, du volume des pores ou de l'aire superficielle effective de matériaux poreux
G01N 15/08 - Recherche de la perméabilité, du volume des pores ou de l'aire superficielle des matériaux poreux
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
LABORATORY RESEARCH, NAMELY, INVESTIGATING SAMPLES WITH AND WITHOUT SURFACE LAYERS BY USING ELLIPSOMETERS, POLARIMETERS, AND REFLECTOMETERS WHICH UTILIZE ELECTROMAGNETIC RADIATION IN THE FIELD OF INSULATING, SEMICONDUCTING AND CONDUCTIVE MATERIALS
A method of calibrating a reflective focusing optics to provide a system that minimizes the effect of multiple beam reflections therewithin on polarization state reflective optics system that preferably requires the presence of both convex and a concave mirrors that have beam reflecting surfaces, the application of which achieves focusing of a beam of electromagnetic radiation onto a sample, (which can be along a locus differing from that of an input beam), with minimized effects on a polarization state of an input beam state of polarization based on adjusted angles of incidence and reflections from the various mirrors involved.
Methodology for determining optical functions of thin films with enhanced sensitivity to “p” polarized electromagnetic radiation reflected from both interfaces of an absorbing film.
A system for easily determining average ellipsometric parameters based on data obtained from two different locations on a planar or non-planar shaped object, along with its method of use.
A system for monitoring, in real time, relatively large samples as they are caused to pass by an ellipsometer or the like system, and method of its use.
G01J 4/00 - Mesure de la polarisation de la lumière
G01B 11/14 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la distance ou la marge entre des objets ou des ouvertures espacés
G01J 3/02 - SpectrométrieSpectrophotométrieMonochromateursMesure de la couleur Parties constitutives
G01J 1/02 - Photométrie, p. ex. posemètres photographiques Parties constitutives
G01N 21/01 - Dispositions ou appareils pour faciliter la recherche optique
A reflective optics system that preferably requires the presence of both convex and a concave mirrors that have beam reflecting surfaces, the application of which achieves focusing of a beam of electromagnetic radiation onto a sample, (which can be along a locus differing from that of an input beam), with minimized effects on a polarization state of an input beam state of polarization based on adjusted angles of incidence and reflections from the various mirrors involved.
A reflective optics system (RFO) that preferably requires the presence of both convex (M3) and concave (M4) mirrors that have beam reflecting surfaces, the application of which achieves focusing of a beam of electromagnetic radiation onto a sample (OB), (which can be along a locus differing from that of an input beam (IB)), with minimized effects on a polarization state of an input beam state of polarization based on adjusted angles of incidence and reflections from the various mirrors involved (M1) (M2) (M3) (M4).
In the context of an ellipsometer or the like, positioning a camera other than directly above a sample being investigated by an electromagnetic beam, while said camera provides an optical view of a surface of said sample which is in focus over the entire viewed extent of the sample, and wherein a contrast improving system involving two beams provided by a beam splitting system is utilized.
BOARD OF REGENTS OF THE UNIVERSITY OF NEBRASKA (USA)
Inventeur(s)
Herzinger, Craig M.
Schubert, Mathias M.
Hofmann, Tino
Liphardt, Martin M.
Woollam, John A.
Abrégé
A dual scanning and FTIR system for application in the Terahertz and broadband blackbody frequency range including sources for providing Thz and broadband blackbody range and electromagnetic radiation, at least one detector of electromagnetic radiation in the THZ and broadband blackbody ranges, and at least one rotating element between the source and detector.
G01N 21/3581 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge en utilisant la lumière de l'infrarouge lointainCouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge en utilisant un rayonnement térahertz
Methodology for determining uncertainty in a data set which characterizes a sample involving elimination of the influence of sample alteration drift caused by data set acquisition, and/or elimination of the influence of system drift during data acquisition.
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
G01J 4/04 - Polarimètres utilisant des moyens de détection électriques
G01N 21/00 - Recherche ou analyse des matériaux par l'utilisation de moyens optiques, c.-à-d. en utilisant des ondes submillimétriques, de la lumière infrarouge, visible ou ultraviolette
59.
System for viewing samples that are undergoing ellipsometric investigation in real time
In the context of an ellipsometer or the like, positioning a camera other than directly above a sample being investigated by an electromagnetic beam, while said camera provides an optical view of a surface of said sample which is in focus over the entire viewed extent of the sample.
A terahertz ellipsometer, the basic preferred embodiment being a sequential system having a backward wave oscillator (BWO); a first rotatable polarizer that includes a wire grid (WGP1); a rotating polarizer that includes a wire grid (RWGP); a stage (STG) for supporting a sample (S); a rotating retarder (RRET) comprising first (RP), second (RM1), third (RM2) and fourth (RM3) elements; a second rotatable polarizer that includes a wire grid (WGP2); and a Golay cell detector (DET).
G01N 21/3581 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge en utilisant la lumière de l'infrarouge lointainCouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge en utilisant un rayonnement térahertz
G01J 5/20 - Pyrométrie des radiations, p. ex. thermométrie infrarouge ou optique en utilisant des détecteurs électriques de radiations en utilisant des éléments résistants, thermorésistants ou semi-conducteurs sensibles aux radiations, p. ex. des dispositifs photoconducteurs
G01J 5/42 - Pyrométrie des radiations, p. ex. thermométrie infrarouge ou optique en utilisant l'allongement ou la dilatation de solides ou de fluides en utilisant des cellules Golay
G01N 21/35 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge
Computer driven systems and methods involving at least one electromagnetic beam focuser and digital light processor that in combination serve to position selected wavelengths in a spectroscopic electromagnetic beam onto a small spot on a sample, and direct the one or more selected wavelengths reflected by the sample into, while diverting other wavelengths away from, a detector.
Methodology of determining refractive index and extinction coefficient of a prism shaped material, including simultaneously for a multiplicity of wavelengths using an easy to practice technique.
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
LABORATORY RESEARCH, NAMELY, INVESTIGATING SAMPLES WITH AND WITHOUT SURFACE LAYERS BY USING ELLIPSOKETERS, POLARIMETERS AND REFLECTOMETERS WHICH UTILIZE ELECTOMAGNETIC RADIATION
64.
Terahertz-infrared ellipsometer system, and method of use
Methodology for determining uncertainty in a data set which characterizes a sample involving elimination of the influence of sample alteration drift caused by data set acquisition, and/or elimination of the influence of system drift during data acquisition.
G01J 4/04 - Polarimètres utilisant des moyens de détection électriques
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
66.
System and method for compensating detector non-idealities
Compensating for imperfections in electromagnetic radiation detectors, and more particularly to a system and method for compensating for polarization state sensitivity and/or beam non-uniformity or the like with application in spectroscopic ellipsometers and polarimeters.
An ellipsometer system comprising a small internal volume cell having fluid entry, and exit ports wherein bubble traps are present in a bifurcated fluid pathway continuous with the fluid exit port. There further being present input and output apertures, for entering and exiting electromagnetic radiation, positioned to allow causing a beam of electromagnetic radiation to impinge on a sample substrate at a location thereon at which, during use, fluid contacts; as well as methodology of its use.
A small internal volume cell having fluid entry, and exit ports wherein at least one bubble trap is present in a fluid pathway which is continuous with the fluid exit port. There further being present an input/output aperture, for entering and exiting electromagnetic radiation, positioned to allow causing an input beam of electromagnetic radiation to impinge on a sample substrate at a location thereon at which, during use, fluid contacts; and a mirror for directing electromagnetic radiation which reflects from said sample substrate, toward and out of said input/output aperture; as well as methodology of its use.
A terahertz ellipsometer, the basic preferred embodiment being a sequential system having a backward wave oscillator (BWO); a first rotatable polarizer that includes a wire grid (WGP1); a rotating polarizer that includes a wire grid (RWGP); a stage (STG) for supporting a sample (S); a rotating retarder (RRET) comprising first (RP), second (RM1), third (RM2) and fourth (RM3) elements; a second rotatable polarizer that includes a wire grid (WGP2); and a Golay cell detector (DET).
A combination of a focusing element, and a filtering element which naturally adjusts the cross-sectional area of a beam of electromagnetic radiation passed through the focusing element as a function of wavelength, optionally as an element of an ellipsometer or polarimeter system.
An improved system and method for investigation of a wobbling surface of a sample with an electromagnetic beam, involving application of a beam directing dual reflection surface “prism” system, which, while effecting beam locus direction rotation of 90 degrees also preserves beam polarization state. The system allows causing an electromagnetic beam to access an otherwise difficult to access sample in, for instance, a vacuum deposition chamber, and enables achieving very closely spaced incident and spherical mirror reflected points of beam reflection from a sample surface in use.
A lens system which allows easy relative adjustment of the position of at least two elements therein to minimize the effects of aberration, having particularly relevant application in ellipsometers, polarimeters, reflectometers and spectrophotometers finite size source is imaged onto a sample.
A terahertz ellipsometer, the basic preferred embodiment being a sequential system having a backward wave oscillator (BWO); a first rotatable polarizer that includes a wire grid (WGP1); a rotating polarizer that includes a wire grid (RWGP); a stage (STG) for supporting a sample (S); a rotating retarder (RRET) comprising first (RP), second (RM1), third (RM2) and fourth (RM3) elements; a second rotatable polarizer that includes a wire grid (WGP2); and a Golay cell detector (DET).
A combination of a focusing means, and a filtering means which naturally adjusts the cross-sectional area of a beam of electromagnetic radiation passed to the focusing means as a function of wavelength, optionally as an element of an ellipsometer or polarimeter system.
Application of digital light processor (DLP) systems in an imaging ellipsometer or imaging polarimeter with a focusing means, sample and detector arranged to meet the Scheimpflug condition.
A system for and method of allowing visual observation of a sample being subject to investigation by an electromagnetic beam, to identify where thereupon a beam of sample investigating electromagnetic radiation is caused to impinge, in combination with a data detector of the beam of sample investigating electromagnetic radiation after it interacts with the sample.
G01J 4/00 - Mesure de la polarisation de la lumière
G01N 21/00 - Recherche ou analyse des matériaux par l'utilisation de moyens optiques, c.-à-d. en utilisant des ondes submillimétriques, de la lumière infrarouge, visible ou ultraviolette
A system for and method of allowing visual observation of a sample being subject to investigation by an electromagnetic beam, to identify where thereupon a beam of sample investigating electromagnetic radiation is caused to impinge, in combination with a data detector of the beam of sample investigating electromagnetic radiation after it interacts with the sample.
G01J 4/00 - Mesure de la polarisation de la lumière
G01N 21/00 - Recherche ou analyse des matériaux par l'utilisation de moyens optiques, c.-à-d. en utilisant des ondes submillimétriques, de la lumière infrarouge, visible ou ultraviolette
and preferably including at least one odd-bounce polarization state image rotating system, and optionally including a polarizer, at least one compensator and/or modulator, in addition to an analyzer.
G01N 21/35 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p. ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge
G01J 5/20 - Pyrométrie des radiations, p. ex. thermométrie infrarouge ou optique en utilisant des détecteurs électriques de radiations en utilisant des éléments résistants, thermorésistants ou semi-conducteurs sensibles aux radiations, p. ex. des dispositifs photoconducteurs
G01J 5/42 - Pyrométrie des radiations, p. ex. thermométrie infrarouge ou optique en utilisant l'allongement ou la dilatation de solides ou de fluides en utilisant des cellules Golay
81.
UV-IR range variable angle spectroscopic ellipsometer
An ellipsometer, polarimeter, reflectometer, spectrophotometer or scatterometer system for use in the UV and infrared range of wavelengths, characterized by the combination of a fiber optic capable of transmitting wavelengths from below 2.2 micron up to at least 3.5 microns, and a beam collimator formed from a combination of two off-axis concave astigmatism reducing spherical mirrors capable of operating between about 190 nm up to 5.5 microns.
A system for and method of mapping process samples which are present in an environmental control chamber at a plurality of “X”-“Y” locations on the surface thereof, wherein the system includes a shield between windows for entering and exiting a beam of electromagnetic radiation, and a process sample.
A method of applying spectroscopic ellipsometry to arrive at accurate values of optical and physical properties for thin films on samples having rough or textured surfaces.
A method of applying an ellipsometer or polarimeter system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz; wherein the ellipsometer or polarimeter system includes a source such as a backward wave oscillator, a Smith-Purcell cell, a free electron laser, an FTIR source or a solid state device; and a detector such as a Golay cell a bolometer or a solid state detector; and preferably includes at least one odd-bounce polarization state image rotating system and a polarizer, and at least one compensator and/or modulator, in addition to an analyzer.
A system and method for improving data provided by ellipsometer, polarimeter and the like systems involving diminishing the effects of undesirable noise in the intensity of a beam of electromagnetic radiation caused by, for instance, random variations in intensity of a source provided beam of electromagnetic radiation and/or periodic or non-periodic variations in beam intensity resulting from wobble/wander of a moving sample, during investigation of the sample by the beam of electromagnetic radiation.
Control of the angle-of-incidence of a beam of electromagnetic radiation provided by a horizontally oriented arc-lamp in ellipsometer, polarimeter, spectrophotometer, reflectometer, Mueller matrix measuring, or the like systems.
09 - Appareils et instruments scientifiques et électriques
Produits et services
ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETER DATA
A system and method of use thereof that enables determining and setting sample alignment based on the location of, and geometric attributes of a monitored image formed by reflection of an electromagnetic beam from a sample and into an image monitor, which beam is directed to be incident onto the sample along a locus which is substantially normal to the surface of the sample.
A spectroscopic system for adjusting spacing between an adjacent source/detector as a unit, and a sample, and a reflecting means for directing an incident beam which reflects from said sample back onto said sample and then into the detector along a locus which is in a plane of incidence that is offset from that of the incident beam, or directly from the reflecting means into the detector, including means for reducing reflections of a beam of electromagnetic from the back of a sample, including methodology of use.
A small internal volume cell having fluid entry, and exit ports wherein at least one bubble trap is present in a fluid pathway which is continuous with the fluid exit port. There further being present an input/output aperture, for entering and exiting electromagnetic radiation, positioned to allow causing an input beam of electromagnetic radiation to impinge on a sample substrate at a location thereon at which, during use, fluid contacts; and a mirror for directing electromagnetic radiation which reflects from said sample substrate, toward and out of said input/output aperture; as well as methodology of its use.
A system, method of configuring, and application a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems.
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
technical services performed in the field of design of ellipsometers, polarimeters and spectrophotometers which utilize electromagnetic radiation to investigate samples
93.
Automatic sample alignment system and method of use
A system which automatically reduces change in effective angle and plane of incidence of a reflected focused beam of electromagnetic radiation entering a detector, via use of a detector with dimensions less than is the spatial spread of a reflected focused beam at a location distal to the location on said sample from which it is caused to reflect, preferably after passing through a collimating lens. The basis of operation is that the portion of a reflected focused beam intercepted by the detector changes with change in sample position and/or orientation.
09 - Appareils et instruments scientifiques et électriques
Produits et services
equipment, namely, ellipsometer based apparatus for measuring thickness, temperature caused effects, and optical properties of semiconductors, disk drives, magnetic data storage media, optical data storage media, thin films, multiple layer films and coatings on substrates, and computer programs necessary for controlling the ellipsometer based apparatus and for analyzing acquired ellipsometric data
UNIVERSITY OF NEBRASKA BOARD OF REGENTS VARNER HALL (USA)
Inventeur(s)
Herzinger, Craig M.
Schubert, Mathias M.
Hofmann, Tino.
Liphardt, Martin M.
Woollam, John, A.
Abrégé
The present invention relates to ellipsometer and polarimeter systems, and more particularly is an ellipsometer or polarimeter or the like system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz, including: a source such as a backward wave oscillator (BWO); a Smith-Purcell (SP) cell; a free electron laser (FE), or an FTIR source and a solid state device; and a detector such as a Golay cell (GC); a bolometer (BOL) or a solid state detector; and preferably including at least one odd-bounce polarization state image rotating system (OBIRS), and optionally including a polarizer (P), at least one compensator (C) and/or modulator (MOD), in addition to an analyzer (A).
G01J 4/00 - Mesure de la polarisation de la lumière
97.
System for controlling intensity of a beam of electromagnetic radiation and method for investigating materials with low specular reflectance and/or are depolarizing
Disclosed is a system for controlling focus, angle of incidence and intensity of an electromagnetic beam over a spectrum of wavelengths, and methodology for optimizing investigation of samples which demonstrate low specular reflectance and/or are depolarizing of a polarized beam of electromagnetic radiation, such as solar cells.
A system and method of substantially achromatically controlling the intensity of a spectroscopic beam with application in spectrophotometers, reflectometers, ellipsometers, polarimeters or the like systems.
and preferably including at least one odd-bounce polarization state image rotating system, and optionally including a polarizer, at least one compensator and/or modulator, in addition to an analyzer.
UNIVERISTY OF NEBRASKA BOARD OF REGENTS VARNER HALL (USA)
Inventeur(s)
Herzinger, Craig, M.
Schubert, Mathias, M.
Hofmann, Tino
Liphardt, Martin, M.
Woollam, John, A.
Abrégé
The present invention relates to ellipsoineter and polarimeter systems, and more particularly is an ellipsometer or polarimeter or the like system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz, including: a source such as a backward wave oscillator (BWO); a Smith-Purcell cell (PC); a free electron (FE) laser, or an FTIR source and a solid state device; and a detector such as a golay cell (GC); a bolometer (BOL) or a solid state detector; and preferably including at least one odd-bounce (OB) polarization state image rotating system, and optionally including a polarizer (P), at least one compensator (C) (C') and/or modulator (MOD), in addition to an analyzer A).
