Abrégé

A system and method is disclosed that reliably determines the transmissivity of a substrate. By determining the transmissivity of a calibration substrate, for instance, a temperature measuring device can be calibrated. The method and system are particularly well suited for use in thermal processing chambers that process semiconductor wafers used for forming integrated circuit chips.

Classes IPC  ?

• G01K 11/18 - Mesure de la température basée sur les variations physiques ou chimiques, n'entrant pas dans les groupes , , ou utilisant le changement de couleur, de translucidité ou de réflectance de matériaux qui changent la translucidité
• G01K 15/00 - Test ou étalonnage des thermomètres
• F27D 21/00 - Aménagement des dispositifs de surveillanceAménagement des dispositifs de sécurité

Produits et services

Machines for the treatment of substrates, semiconductor substrates, silicon discs and wafers for semiconductor chip manufacturing and for making semiconductor film or layer structures (expitaxial-reactors). Apparatuses, devices, machines and systems consisting thereof for the thermal treatment of substrates, semiconductor substrates, silicon discs and wafers for the production of semiconductor chips; rapid heating apparatuses for the treatment and production of semiconductors, in particular on the basis of halogen lamps and arc lamps. Maintenance and installation of the goods mentioned above. Developing the goods mentioned above.

Produits et services

Machines for the treatment of substrates, semiconductor substrates, silicon discs and wafers for semiconductor chip manufacturing and for making semiconductor film or layer structures (expitaxial-reactors). Apparatuses, devices, machines and systems consisting thereof for the thermal treatment of substrates, semiconductor substrates, silicon discs and wafers for the production of semiconductor chips; rapid heating apparatuses for the treatment and production of semiconductors, in particular on the basis of halogen lamps and arc lamps. Maintenance and installation of the goods mentioned above. Developing the goods mentioned above.

Produits et services

Machines, apparatuses and devices and systems consisting thereof for the thermal treatment of substrates, semiconductor substrates, silicon discs and wafers for the production of semiconductor chips. Rapid heating apparatuses for the treatment and production of semiconductors; epitaxial reactors for epitaxial processing. Maintenance and installation of the goods mentioned in classes 7 and 11. Developing the goods mentioned in classes 7 and 11.

Produits et services

Machines, apparatus and instrument for manufacturing semi-conductors and/or semi-conductor substrates, and/or semi-conductor wafer/chip processing, namely thermal reactors, expitaxial reactors, quick-heating apparatus, and systems composed thereof for expitaxial layer deposition and/or for thermal treatment of non-semi-conductor substrates, semiconductor substrates, silicon discs and wafers installation and maintenance of machines, apparatus and instruments, and systems composed thereof, for expitaxial layer deposition and/or thermal treatment of substrates, semi-conductor substrates, silicon discs and wafers for semi-conductor chip manufacturing [ Development of machines, apparatus and instruments, and systems composed thereof, for expitaxial layer deposition and/or thermal treatment of substrates, semi-conductor substrates, silicon discs and wafers for semi-conductor chip manufacturing ]