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2008
|
Invention
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Calibration substrate and method of calibration therefor. A system and method is disclosed that r... |
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2006
|
P/S
|
Machines for the treatment of substrates, semiconductor
substrates, silicon discs and wafers for... |
|
2004
|
Invention
|
Method for the thermal treatment of disk-shaped substrates. For the purposes of reducing the numb... |
|
|
Invention
|
Determining the position of a semiconductor substrate on a rotation device. A device for determin... |
|
|
Invention
|
A process for the production of a nitrogenous layer on a semiconductor or metal surface. A first ... |
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2003
|
Invention
|
Method for determining the temperature of a semiconductor wafer in a rapid thermal processing sys... |
|
|
Invention
|
Ultrasonic levitation in a rapid thermal processing plant for wafers. The aim of the invention is... |
|
|
Invention
|
Device for accommodating disk-shaped objects and apparatus for handling objects. A device for rec... |
|
|
Invention
|
Method for producing a calibration wafer. The aim of the invention is to provide a calibration wa... |
|
|
Invention
|
Device and method for thermally treating semiconductor wafers. A device for thermally treating se... |
|
|
P/S
|
Machines, apparatuses and devices and systems consisting
thereof for the thermal treatment of su... |
|
|
P/S
|
Machines, apparatus and instrument for manufacturing semi-conductors and/or semi-conductor substr... |
|
|
Invention
|
Method and device for thermally treating objects. The invention relates to a method and to a devi... |
|
2002
|
Invention
|
Method for thermally treating a substrate that comprises several layers. The aim of the invention... |
|
|
Invention
|
Method and device for the thermal treatment of substrates. The object of the invention is to meas... |
|
|
Invention
|
Device for receiving plate-shaped objects. A device for receiving plate-shaped objects, preferabl... |
|
|
Invention
|
Method and device for thermally treating substrates. The invention relates to a simple and econom... |
|
|
Invention
|
Method and device for the production of process gases. The aim of the invention is the simple and... |
|
|
Invention
|
Method for minimizing tungsten oxide evaporation during selective sidewall oxidation of tungsten-... |
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2001
|
Invention
|
Device for thermally treating substrates. The aim of the invention is to enable substrates to be ... |
|
|
Invention
|
Apparatus and method for reducing contamination on thermally processed semiconductor substrates. ... |
|
|
Invention
|
Adjusting defect profiles in crystal or crystalline structures. The invention relates to a method... |
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1997
|
Invention
|
Apparatus and method for rapid thermal processing (rtp) of a plurality of semiconductor wafers. A... |
