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2019
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Invention
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Local dry etching apparatus. A local dry etching apparatus includes a vacuum chamber that has a p... |
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2017
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Invention
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Grinding fluid. The purpose of the present invention is to provide a grinding fluid having relati... |
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Invention
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Abrasive material. The purpose of the present invention is to provide an abrasive material which ... |
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Invention
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Local dry etching apparatus.
A local dry etching apparatus includes a vacuum chamber, a nozzle o... |
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2015
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Invention
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Local dry etching apparatus.
A local dry etching apparatus includes a single vacuum chamber, a p... |
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2014
|
Invention
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Local dry etching apparatus and local dry etching fabrication method.
A local dry etching appara... |
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Invention
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Local dry etching device and local dry etching processing method. The present invention addresses... |
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2013
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Invention
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Circumferential polishing device for disc-shaped workpieces. [Problem] To provide a circumferenti... |
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2009
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Invention
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Polishing composition for semiconductor wafer.
A polishing composition for semiconductor wafer p... |
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Invention
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Colloidal silica for semiconductor wafer polishing and production method thereof.
Colloidal sili... |
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Invention
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Colloidal silica consisting of silica particles fixing nitrogen contained alkaline compound.
A c... |
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2008
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P/S
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Abrasive paper, abrasive cloth, abrasive sand, artificial
pumice stone, polishing paper, polishi... |
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Invention
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Polishing composition for semiconductor wafer and polishing method. The present invention relates... |
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Invention
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Composition for polishing semiconductor wafer, and method of producing the same.
A composition f... |
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2007
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Invention
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Polishing composition for semiconductor wafer, production method thereof, and polishing method.
... |
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2006
|
Invention
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Thickness control method and double side polisher. The object of the present invention is to prov... |
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2005
|
Invention
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Carrier for holding an object to be polished.
To provide a diamond-like carbon coated carrier fo... |
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2003
|
Invention
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Multi-step local dry etching method for soi wafer. A local dry etching method for a SOI wafer cap... |
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|
Invention
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Local dry etching method. This invention provides a local dry etching method comprising the step ... |
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|
Invention
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Local dry etching method. In a local dry etching method, position-thickness data of a semiconduct... |
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Invention
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Wafer edge polishing system. Disclosed is a wafer edge polishing system which improves the throug... |
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2002
|
Invention
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Polishing method for removing corner material from a semi-conductor wafer. In the polishing appar... |
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Invention
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Local dry etching method. In a local dry etching method of the invention, a surface of a represen... |
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Invention
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Apparatus for polishing periphery of device wafer and polishing method. When a device wafer is ch... |
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Invention
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Wafer table for local dry etching apparatus. To resolve a problem that an etching rate profile is... |
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Invention
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Local etching method. To improve a problem that according to a conventional technology, an accura... |
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Invention
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Nanotopography removing method. To remove nanotopography (unevenness of wavelength: 0.2 mm throug... |
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2001
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Invention
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Apparatus of and method for polishing the outer circumferential portions of a circular plate-shap... |
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Invention
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Discharge tube for a local etching apparatus and a local etching apparatus using the discharge tu... |
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|
Invention
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Method for manufacturing a semiconductor wafer. In the semiconductor wafer manufacturing method o... |
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|
Invention
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Apparatus for removing deposited film. An edge face of a deposited film at an edge portion of a d... |
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2000
|
Invention
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Corrosion-resistant system and method for a plasma etching apparatus. A corrosion-resistant syste... |
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1999
|
Invention
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Cleaning device for surface plate correcting dresser. To provide a cleaning apparatus capable of ... |
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|
Invention
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Apparatus for polishing outer periphery of workpiece. To provide a small polishing means featurin... |
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Invention
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Carriers and polishing apparatus. A carrier and a polishing apparatus are designed to improve the... |
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|
Invention
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Polishing compound and a method for polishing. The present invention is a polishing compound comp... |
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|
Invention
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Surface polishing apparatus and method of taking out workpiece. A workpiece can be simply taken o... |
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Invention
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Single side work polishing apparatus. A single side work polishing apparatus rectifies the surfac... |
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Invention
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Work-loading method and surface-grinding apparatus with work position deviation-adjusting mechani... |
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Invention
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Surface grinding machine and carrier used therefor. In order to take a ground work W out of a wor... |
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Invention
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Slurry circulation type surface polishing machine. The bottom of each collection groove for colle... |
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Invention
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Combined cmp and plasma etching wafer flattening system. A wafer flattening process designed to f... |
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Invention
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Carrier and cmp apparatus. A carrier comprising a disk-shaped body portion having fluid circulati... |
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Invention
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Wafer flattening process and storage medium. A wafer flattening process designed to flatten the e... |
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Invention
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Slurry recycling system of cmp apparatus and method of same. A slurry recycling system of a CMP a... |
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1998
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Invention
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Work unloading method and surface polishing apparatus with work unloading mechanism. The present ... |
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Invention
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Method and apparatus for specular-polishing of work edges. A polishing apparatus comprises a rota... |
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Invention
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Method and apparatus for mirror-polishing of workpiece edges. Two cylindrical polishing drums 2 a... |
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Invention
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Dresser and dressing apparatus. A dresser and a dressing apparatus able to reduce the labor invol... |
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Invention
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Plasma etching method and plasma etching system for carrying out the same. Plasma etching method ... |
