|
2025
|
Invention
|
Devices for depositing a coating in a cvd reactor.
A coating is deposited on a substrate in a CV... |
|
|
Invention
|
Method and device for cleaning a cvd reactor. The invention relates to a device and a method for ... |
|
|
Invention
|
Cvd reactor and method of use thereof and device. The CVD reactor (1) according to the invention ... |
|
|
Invention
|
Method and device for depositing n-doped sic. 244-containing first growth gas flow (Q1) and an HC... |
|
|
Invention
|
Method and apparatus for coating a structured substrate, and substrate for carrying out the metho... |
|
|
Invention
|
Method and device for determining the processability of a substrate. The invention relates to a m... |
|
|
Invention
|
Observation tube incorporating curved gas connection conduits. The invention relates to an observ... |
|
|
Invention
|
Method for depositing a iii-v layer sequence containing a thin layer, and device configured there... |
|
2024
|
Invention
|
Method and device for separating n-doped sic. 322433Si-containing second growth gas flow (Q2) flo... |
|
|
Invention
|
Method and device for depositing a iii-v semiconductor layer in a process chamber having a surfac... |
|
|
Invention
|
Method and device for depositing n-doped sic. 322433Si-containing second growth gas flow (Q2) flo... |
|
|
Invention
|
Cover plate for covering the susceptor side facing the process chamber of a device for depositing... |
|
|
Invention
|
Loading and unloading cycle for a cvd reactor system. The invention relates to a device and a met... |
|
|
Invention
|
Crystalline/amorphous 2d-2d diffusion barrier. The invention relates to a device for preventing t... |
|
|
Invention
|
Device and method for individually influencing the layer growth of a layer deposited on a substra... |
|
|
P/S
|
Reactor machines for the production of semiconductors, namely, industrial chemical vapor depositi... |
|
|
P/S
|
Machines for the production of semiconductors. |
|
|
P/S
|
Machines for the production of semiconductors |
|
|
Invention
|
Method of providing a process gas for a cvd reactor and corresponding apparatus. The invention re... |
|
|
P/S
|
Semiconductor manufacturing machines; Semiconductor wafer processing machines; Semiconductor wafe... |
|
|
P/S
|
Machines for the production of semiconductors, namely, chemical vapor deposition equipment for th... |
|
|
Invention
|
Gas inlet for a cvd reactor. The invention relates to a device for feeding a process gas into a p... |
|
2023
|
Invention
|
Apparatus and method for treating substrates. The invention relates to a device and a method for ... |
|
|
Invention
|
Method for avoiding incorrect operation of a cvd reactor. The invention relates to a method for o... |
|
|
Invention
|
Method for depositing gallium nitride gan on silicon si. The invention relates to a method for de... |
|
|
Invention
|
Method and device for depositing sic layers on a substrate. A method for depositing a layer on a ... |
|
|
Invention
|
Device for depositing sic layers on a substrate, comprising an adjustable gas outlet element. The... |
|
|
Invention
|
Method for setting up a cvd reactor. λii qii qii λii Si,ji,j qii λii Si,ji,j qii qii i ), by mean... |
|
|
Invention
|
Cvd reactor having a removable process-chamber housing. The invention relates to a CVD reactor ha... |
|
|
Invention
|
Methods for thermal treatment of substrates.
In the thermal treatment of substrates, a susceptor... |
|
|
Invention
|
Method for using shield plate in a cvd reactor. A CVD reactor includes a gas inlet member having ... |
|
|
Invention
|
Device and method for treating a substrate.
A device for thermally treating a substrate with a h... |
|
|
Invention
|
Device and method for treating a substrate. The invention relates to a device for thermally treat... |
|
|
P/S
|
Chemical vapour deposition (CVD) reactors; drive mechanisms
and apparatus for use in the coating... |
|
|
Invention
|
Cvd apparatus and method of cleaning a process chamber of a cvd apparatus. The invention relates ... |
|
|
Invention
|
Method for emissivity-corrected pyrometry.
A method for coating a substrate, in which emissivity... |
|
|
Invention
|
Method for emissivity-corrected pyrometry. E,nR,nE,nR,nERE,nR,nR,n) oscillating over time t diffe... |
|
|
Invention
|
Method for emissivity-corrected pyrometry.
A method for coating a substrate with at least one la... |
|
|
Invention
|
Method for emissivity-corrected pyrometry. E,nR,nERCE,nR,niE,nR,niiii)) is determined that is use... |
|
2022
|
Invention
|
Method and device for depositing a layer containing a group five element in a process chamber and... |
|
|
Invention
|
Method and device for depositing a layer containing a group five element in a process chamber, an... |
|
|
Invention
|
Cvd reactor with a supporting ring, and supporting ring for a substrate.
A supporting ring is ar... |
|
|
Invention
|
Cvd reactor with a supporting ring, and supporting ring for a substrate. The invention relates to... |
|
|
Invention
|
Method and assembly for providing process gas to a cvd reactor.
An assembly for providing a proc... |
|
|
Invention
|
Evaporation source for a cvd reactor. The invention relates to an assembly for providing a proces... |
|
|
Invention
|
Gas-inlet element for a cvd reactor.
A gas-inlet element for a CVD reactor includes a gas distri... |
|
|
Invention
|
Cvd reactor comprising a process chamber floor rising in a feeder zone.
A CVD reactor comprising... |
|
2021
|
Invention
|
Method for emissivity-corrected pyrometry. A substrate is coated with a multilayer structure whic... |
|
|
Invention
|
Gas inlet element of a cvd reactor with two infeed points.
In a device and a method for depositi... |
|
|
Invention
|
Cvd reactor with temperature-controllable gas inlet region.
A CVD reactor includes a reactor hou... |
|
|
Invention
|
Device and method for evaporating an organic powder.
In a method for evaporating a non-gaseous s... |
|
|
Invention
|
Method for ascertaining the end of a cleaning process for a process chamber of a mocvd reactor.
... |
|
|
Invention
|
Cvd reactor and method for controlling the surface temperature of the substrates. In a CVD reacto... |
|
2020
|
Invention
|
Gas inlet device for a cvd reactor.
A gas distribution device has a plurality of gas inlet regio... |
|
|
Invention
|
Use of a cvd reactor for depositing two-dimensional layers.
A two-dimensional layer is deposited... |
|
|
Invention
|
Apparatus and method for depositing carbon-containing structures. An apparatus deposits carbon-co... |
|
2018
|
P/S
|
Mechanical tools and equipment for manufacturing
semiconductors and semiconductor components, in... |
|
2017
|
P/S
|
Machines for the production of semiconductors; motors and
engines, drive units, parts of machine... |
|
|
P/S
|
Machines for the production of semiconductors; Motors and engines, drive units, parts of machines... |
|
|
P/S
|
Machines for the manufacture of semiconductors; machines for
gas phase deposition; machines for ... |
|
2016
|
P/S
|
Machines for the manufacture of semiconductors; machines for gasphase deposition; Machines for th... |
|
2015
|
P/S
|
Machines for the manufacture of semiconductors; separating
machines; separating machines, namely... |
|
|
P/S
|
Machines for the production of semiconductors; Separating machines; Separating machines, Namely m... |
|
2012
|
P/S
|
Machines and installations for chemical and/or plasma
enhanced vapour deposition of polymers ont... |
|
|
P/S
|
Machines and installations for chemical and/or plasma-enhanced vapour deposition of polymers onto... |
|
2004
|
P/S
|
Machines for manufacturing semiconductors and parts for such
machines. |
|
|
P/S
|
Machines for manufacturing semiconductors and parts for such machines |
|
|
P/S
|
Machines for manufacturing semiconductors and parts for such machines. |
|
2003
|
P/S
|
CONTROL SYSTEM SOFTWARE FOR USE IN OPERATING CHEMICAL VAPOR DEPOSITION REACTORS THAT MANUFACTURE ... |
|
|
P/S
|
Control system software for use in operating chemical vapor
deposition reactors that manufacture... |
|
|
P/S
|
Control software for operating CVD reactors for the manufacture of semiconductors and superconduc... |
|
2002
|
P/S
|
Chemical vapour deposition (CVD) reactors; drive mechanisms and apparatus for use in the coating ... |
|
|
P/S
|
Machine tools and equipment for semiconductor manufacturing, in particular CVD reactors. Computer... |
|
2001
|
P/S
|
machines used to control chemical vapor |
|
1999
|
P/S
|
Mechanical tools and equipment for manufacturing semiconductors and semiconductor component parts... |
|
1993
|
P/S
|
machines used to control chemical vapor deposition of solid state layers and coatings |
|
|
P/S
|
laboratory apparatus used to control vapor deposition of solid state layers and coatings |
