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2025
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Invention
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Method and apparatus for coating a structured substrate, and substrate for carrying out the metho... |
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Invention
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Method and device for determining the processability of a substrate. The invention relates to a m... |
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Invention
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Observation tube incorporating curved gas connection conduits. The invention relates to an observ... |
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Invention
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Method for depositing a iii-v layer sequence containing a thin layer, and device configured there... |
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2024
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Invention
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Method and device for separating n-doped sic. 322433Si-containing second growth gas flow (Q2) flo... |
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Invention
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Method and device for depositing a iii-v semiconductor layer in a process chamber having a surfac... |
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Invention
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Method and device for depositing n-doped sic. 322433Si-containing second growth gas flow (Q2) flo... |
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Invention
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Cover plate for covering the susceptor side facing the process chamber of a device for depositing... |
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Invention
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Loading and unloading cycle for a cvd reactor system. The invention relates to a device and a met... |
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Invention
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Crystalline/amorphous 2d-2d diffusion barrier. The invention relates to a device for preventing t... |
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Invention
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Device and method for individually influencing the layer growth of a layer deposited on a substra... |
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G/S
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Reactor machines for the production of semiconductors, namely, industrial chemical vapor depositi... |
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G/S
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Machines for the production of semiconductors. |
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G/S
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Machines for the production of semiconductors |
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Invention
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Method of providing a process gas for a cvd reactor and corresponding apparatus. The invention re... |
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G/S
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Semiconductor manufacturing machines; Semiconductor wafer processing machines; Semiconductor wafe... |
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G/S
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Machines for the production of semiconductors, namely, chemical vapor deposition equipment for th... |
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Invention
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Gas inlet for a cvd reactor. The invention relates to a device for feeding a process gas into a p... |
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2023
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Invention
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Apparatus and method for treating substrates. The invention relates to a device and a method for ... |
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Invention
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Method for avoiding incorrect operation of a cvd reactor. The invention relates to a method for o... |
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Invention
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Method for depositing gallium nitride gan on silicon si. The invention relates to a method for de... |
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Invention
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Method and device for depositing sic layers on a substrate. A method for depositing a layer on a ... |
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Invention
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Device for depositing sic layers on a substrate, comprising an adjustable gas outlet element. The... |
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Invention
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Method for setting up a cvd reactor. λii qii qii λii Si,ji,j qii λii Si,ji,j qii qii i ), by mean... |
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Invention
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Cvd reactor having a removable process-chamber housing. The invention relates to a CVD reactor ha... |
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Invention
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Methods for thermal treatment of substrates.
In the thermal treatment of substrates, a susceptor... |
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Invention
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Method for using shield plate in a cvd reactor. A CVD reactor includes a gas inlet member having ... |
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Invention
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Device and method for treating a substrate. The invention relates to a device for thermally treat... |
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G/S
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Chemical vapour deposition (CVD) reactors; drive mechanisms
and apparatus for use in the coating... |
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Invention
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Cvd apparatus and method of cleaning a process chamber of a cvd apparatus. The invention relates ... |
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Invention
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Method for emissivity-corrected pyrometry.
A method for coating a substrate, in which emissivity... |
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Invention
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Method for emissivity-corrected pyrometry. E,nR,nE,nR,nERE,nR,nR,n) oscillating over time t diffe... |
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Invention
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Method for emissivity-corrected pyrometry.
A method for coating a substrate with at least one la... |
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Invention
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Method for emissivity-corrected pyrometry. E,nR,nERCE,nR,niE,nR,niiii)) is determined that is use... |
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2022
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Invention
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Method and device for depositing a layer containing a group five element in a process chamber and... |
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Invention
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Method and device for depositing a layer containing a group five element in a process chamber, an... |
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Invention
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Cvd reactor with a supporting ring, and supporting ring for a substrate.
A supporting ring is ar... |
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Invention
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Cvd reactor with a supporting ring, and supporting ring for a substrate. The invention relates to... |
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Invention
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Evaporation source for a cvd reactor. The invention relates to an assembly for providing a proces... |
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Invention
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Method and device for forming bundles of nanofilaments.
A device can be used as an electrode for... |
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Invention
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Gas-inlet element for a cvd reactor.
A gas-inlet element for a CVD reactor includes a gas distri... |
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Invention
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Gas-inlet element for a cvd reactor. The invention relates to a gas-inlet element (2) for a CVD r... |
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Invention
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Cvd reactor comprising a process chamber floor rising in a feeder zone.
A CVD reactor comprising... |
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2021
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Invention
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Method for emissivity-corrected pyrometry.
A substrate is coated with a multilayer structure whi... |
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Invention
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Gas inlet element of a cvd reactor with two infeed points.
In a device and a method for depositi... |
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Invention
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Cvd reactor with temperature-controllable gas inlet region.
A CVD reactor includes a reactor hou... |
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Invention
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Device and method for evaporating an organic powder.
In a method for evaporating a non-gaseous s... |
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Invention
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Method for ascertaining the end of a cleaning process for a process chamber of a mocvd reactor.
... |
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Invention
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Cvd reactor and method for controlling the surface temperature of the substrates. In a CVD reacto... |
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2020
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Invention
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Gas inlet device for a cvd reactor.
A gas distribution device has a plurality of gas inlet regio... |
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Invention
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Wall-cooled gas-inlet element for a cvd reactor.
A gas inlet element for a CVD reactor includes ... |
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Invention
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Use of a cvd reactor for depositing two-dimensional layers.
A two-dimensional layer is deposited... |
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Invention
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Method for depositing a two-dimensional coating and cvd reactor.
A coating is deposited on a sub... |
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Invention
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Apparatus and method for depositing carbon-containing structures. An apparatus deposits carbon-co... |
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Invention
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Method and apparatus for depositing organic layers.
An apparatus for depositing organic layers o... |
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Invention
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Gas-inlet element for a cvd reactor. A gas outlet surface of a gas inlet element for a CVD reacto... |
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2018
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G/S
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Mechanical tools and equipment for manufacturing
semiconductors and semiconductor components, in... |
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2017
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G/S
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Machines for the production of semiconductors; motors and engines, except for land vehicles; driv... |
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G/S
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Machines for the production of semiconductors; motors and
engines, drive units, parts of machine... |
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G/S
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Machines for the production of semiconductors; Motors and engines, drive units, parts of machines... |
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G/S
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Machines for the manufacture of semiconductors; machines for
gas phase deposition; machines for ... |
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2016
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G/S
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Machines for the manufacture of semiconductors; machines for gasphase deposition; Machines for th... |
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2015
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G/S
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Machines for the manufacture of semiconductors; separating
machines; separating machines, namely... |
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G/S
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Machines for the production of semiconductors; Separating machines; Separating machines, Namely m... |
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2012
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G/S
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Machines and installations for chemical and/or plasma
enhanced vapour deposition of polymers ont... |
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G/S
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Machines and installations for chemical and/or plasma-enhanced vapour deposition of polymers onto... |
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2004
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G/S
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Machines for manufacturing semiconductors and parts for such
machines. |
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G/S
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Machines for manufacturing semiconductors and parts for such machines |
|
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G/S
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Machines for manufacturing semiconductors and parts for such machines. |
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2003
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G/S
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CONTROL SYSTEM SOFTWARE FOR USE IN OPERATING CHEMICAL VAPOR DEPOSITION REACTORS THAT MANUFACTURE ... |
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G/S
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Control system software for use in operating chemical vapor
deposition reactors that manufacture... |
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G/S
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Control software for operating CVD reactors for the manufacture of semiconductors and superconduc... |
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2002
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G/S
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Chemical vapour deposition (CVD) reactors; drive mechanisms and apparatus for use in the coating ... |
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G/S
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Machine tools and equipment for semiconductor manufacturing, in particular CVD reactors. Computer... |
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2001
|
G/S
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machines used to control chemical vapor |
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1999
|
G/S
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Mechanical tools and equipment for manufacturing semiconductors and semiconductor component parts... |
|
1993
|
G/S
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machines used to control chemical vapor deposition of solid state layers and coatings |
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G/S
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laboratory apparatus used to control vapor deposition of solid state layers and coatings |
