FNS Tech Co., Ltd.

République de Corée

 
Quantité totale PI 9
Rang # Quantité totale PI 171 171
Note d'activité PI 0,4/5.0    1
Rang # Activité PI 927 970
Symbole boursier 083500 (kosdaq)
Capitalisation 68.533B  (KRW)

Brevets

Marques

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0 0
0 0
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Dernier brevet 2020 - Recycled polishing pad
Premier brevet 2000 - Polishing pads useful in chemica...

Derniers inventions, produits et services

2019 Invention Recycled polishing pad. A recycled polishing pad includes an upper layer pad and a supplementary ...
2016 Invention Porous polishing pad and preparing method of the same. The present disclosure relates to a porou...
Invention Polishing pad and preparing method thereof. The present disclosure relates to a porous polishing ...
2014 Invention Polishing pad having micro-grooves on the pad surface. A polishing pad is provided herein, which ...
Invention Multi-layered chemical-mechanical planarization pad. The present disclosure relates to a chemical...
2013 Invention Chemical-mechanical planarization pad including patterned structural domains. An aspect of the pr...
Invention Method of manufacturing a chemical mechanical planarization pad. The present disclosure relates ...
2010 Invention Method of grooving a chemical-mechanical planarization pad. 2), wherein (X) has a value in the ra...
2009 Invention Fabric containing non-crimped fibers and methods of manufacture. A chemical-mechanical planarizat...
2008 Invention Chemical-mechanical planarization pad. The present disclosure relates to a polishing pad includin...
Invention Chemical-mechanical planarization pad. The present disclosure relates to a polishing pad. The pol...
Invention Three-dimensional network in cmp pad. 3, and wherein the interconnecting elements have a length b...
Invention Polishing pad with controlled void formation. A chemical-mechanical planarization polishing pad i...
Invention Chemical mechanical planarization pad with void network. A polishing pad and a method of producin...
Invention Chemical-mechanical planarization pad having end point detection window. A chemical mechanical po...
Invention Polishing pad. An improved polishing pad for polishing semi-conductors and other planar substrate...
2003 Invention Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry ...