- All sections
- C - Chemistrymetallurgy
- C01B - Non-metallic elementscompounds thereof
- C01B 32/186 - Preparation by chemical vapour deposition [CVD]
Patent holdings for IPC class C01B 32/186
Total number of patents in this class: 388
10-year publication summary
|
20
|
36
|
42
|
53
|
41
|
52
|
42
|
41
|
27
|
3
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Electron Limited | 12127 |
22 |
| Paragraf Limited | 75 |
22 |
| Samsung Electronics Co., Ltd. | 139302 |
20 |
| Commonwealth Scientific and Industrial Research Organisation | 1675 |
7 |
| General Graphene Corp. | 18 |
7 |
| Corning Incorporated | 10139 |
6 |
| Imam Abdulrahman Bin Faisal University | 475 |
6 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 40644 |
5 |
| Massachusetts Institute of Technology | 9921 |
5 |
| National Taiwan University | 1172 |
5 |
| Aixtron SE | 306 |
5 |
| Heiq Materials AG | 74 |
5 |
| Versarien PLC | 52 |
5 |
| Dickinson Corporation | 22 |
5 |
| Centre National de La Recherche Scientifique | 10124 |
4 |
| California Institute of Technology | 3935 |
4 |
| Purdue Research Foundation | 3483 |
4 |
| National University of Singapore | 2373 |
4 |
| Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences | 298 |
4 |
| Seoul National University R&db Foundation | 3324 |
4 |
| Other owners | 239 |