- All sections
- C - Chemistrymetallurgy
- C07F - Acyclic, carbocyclic, or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium
- C07F 7/10 - Compounds having one or more C—Si linkages containing nitrogen
Patent holdings for IPC class C07F 7/10
Total number of patents in this class: 1247
10-year publication summary
104
|
75
|
80
|
81
|
89
|
72
|
45
|
72
|
48
|
31
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Versum Materials US, LLC | 642 |
61 |
Shin-Etsu Chemical Co., Ltd. | 5662 |
50 |
LG Chem, Ltd. | 17638 |
34 |
Rohm and Haas Electronic Materials Korea Ltd. | 330 |
32 |
Entegris, Inc. | 1869 |
25 |
FUJIFILM Corporation | 29399 |
21 |
Dnf Co.,Ltd. | 76 |
21 |
L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude | 3985 |
21 |
The University of Tokyo | 4179 |
19 |
Dow Silicones Corporation | 1929 |
18 |
Idemitsu Kosan Co., Ltd. | 4220 |
17 |
Merck Patent GmbH | 5823 |
15 |
3m Innovative Properties Company | 17819 |
13 |
Samsung Display Co., Ltd. | 34798 |
12 |
Bridgestone Corporation | 7237 |
11 |
JNC Corporation | 1561 |
11 |
Konica Minolta, Inc. | 8742 |
10 |
The University of North Carolina at Chapel Hill | 2039 |
10 |
Evonik Operations GmbH | 4110 |
10 |
Incyte Holdings Corporation | 660 |
9 |
Other owners | 827 |